DE1295031B - Anordnung parallel ausgerichteter, elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm - Google Patents
Anordnung parallel ausgerichteter, elektrischer Dipole fuer Wellenlaengen unterhalb 1 mmInfo
- Publication number
- DE1295031B DE1295031B DES90548A DES0090548A DE1295031B DE 1295031 B DE1295031 B DE 1295031B DE S90548 A DES90548 A DE S90548A DE S0090548 A DES0090548 A DE S0090548A DE 1295031 B DE1295031 B DE 1295031B
- Authority
- DE
- Germany
- Prior art keywords
- arrangement
- semiconductor material
- rods
- arrangement according
- reflected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 15
- 238000002310 reflectometry Methods 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 10
- 229910016964 MnSb Inorganic materials 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 6
- 229910002056 binary alloy Inorganic materials 0.000 claims description 3
- 230000005496 eutectics Effects 0.000 claims description 3
- 230000005294 ferromagnetic effect Effects 0.000 claims description 3
- 230000010287 polarization Effects 0.000 description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000374 eutectic mixture Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
- H01Q15/14—Reflecting surfaces; Equivalent structures
- H01Q15/22—Reflecting surfaces; Equivalent structures functioning also as polarisation filter
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
- H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
- H01Q15/0013—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
- H01Q15/02—Refracting or diffracting devices, e.g. lens, prism
- H01Q15/12—Refracting or diffracting devices, e.g. lens, prism functioning also as polarisation filter
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Optical Elements Other Than Lenses (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polarising Elements (AREA)
- Optical Filters (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
Die Hauptpatentanmeldung betrifft eine Anordnung elektrischer Dipole für Wellenlängen unterhalb
1 mm, bestehend aus elektrisch gut leitenden, parallel ausgerichteten Stäbchen mit Längen unterhalb
1 mm, die in ein elektrisch schlecht leitendes Medium (Trägersubstanz) eingebettet sind, wobei die Trägersubstanz
ein Halbleitermaterial ist und mit den Stäbchen ein Eutektikum eines binären oder quasi-binären
Systems bildet. Zur Herstellung ist in der Hauptpatentanmeldung vorgeschlagen worden, Halbleitermaterial,
wie Indiumantimonid (InSb), und einen zur Kristallisation in Stäbchenform neigenden Stoff,
wie Nickelantimonid (NiSb), Manganantimonid (MnSb) usw., zusammenzuschmelzen und anschließend
einem Erstarrungsprozeß zu unterwerfen, bei dem die Stäbchen ausgerichtet werden. In einer
eutektischen Mischung von InSb und NiSb beträgt der Anteil an NiSb etwa 1,8 Gewichtsprozent.
Nach der Hauptpatentanmeldung ist eine solche Anordnung als Polarisationsfilter geeignet. Ein nach
dem genannten früheren Verfahren hergestelltes dünnes Scheibchen aus beispielsweise InSb mit parallel
zur Scheibchenfläche und zueinander parallel ausgerichteten NiSb-Stäbchen, läßt nämlich vom auffallenden
Licht im wesentlichen nur den Anteil durch, dessen Schwingungsebene (elektrisches Feld)
senkrecht zur Längsrichtung der Stäbchen liegt.
Wird nach dem Verfahren nach der Hauptpatentanmeldung eine Anordnung elektrischer Dipole hergestellt,
in der die Anzahl der Dipole pro Volumeinheit wesentlich höher liegt als in der Anordnung
nach der Hauptpatentanmeldung, so erhält man erfindungsgemäß eine Anordnung mit ausgeprägtem
Reflexionsvermögen. Das Reflexionsvermögen ist. definiert als das Verhältnis der Intensität der reflektierten
zur auffallenden Strahlung.
Gegenstand der vorliegenden Erfindung ist eine Anordnung parallel ausgerichteter elektrischer Dipole
für Wellenlängen unterhalb 1 mm, bestehend aus elektrisch gut leitenden Stäbchen mit Längen
unterhalb 1 mm in einem Halbleitermaterial, das mit den Stäbchen ein Eutektikum eines binären oder
quasi-binären Systems bildet. Dabei besteht die weitere Ausgestaltung des Gegenstandes der Hauptpatentanmeldung
darin, daß die seitlichen Abstände der Stäbchen in der Größenordnung oder kleiner als
die Wellenlänge der zu reflektierenden Wellen in dem Halbleitermaterial sind, derart, daß die Anordnung
für die zu reflektierenden Wellen ein metallähnliches Reflexionsvermögen besitzt.
Licht mit einer in Luft gemessenen Wellenlänge von 16 μ hat, z. B. in InSb eine Wellenlänge von
etwa 4 μ. Vorteilhaft kann als Halbleitermaterial, das auch als »Trägersubstanz« bezeichnet wird, eine
A111Bv-Verbindung verwendet werden. Bei der Herstellung
der Anordnung wird der Trägersubstanz (Halbleitermaterial) vorzugsweise ein elektrisch gut
leitender ferromagnetischer Stoff beigegeben, der in der geschmolzenen Trägersubstanz zur Kristallisation
in Stäbchenform (Nadelform) neigt. Je nach Herstellungweise und Material der Anordnung ist das an
dieser reflektierte Licht für bestimmte mehr oder weniger weite Frequenzbereiche polarisiert. Daher ist
eine solche Anordnung z. B. als Reflexionsmaterial für Lichtverstärker (Laser) geeignet.
Die erfmdungsgemäße Anordnung kann beispielsweise aus der Trägersubstanz InSb bestehen, in die
parallel ausgerichtete Stäbchen (Dipole) aus Manganantimonid (MnSb) eingeschlossen sind. MnSb ist
ferromagnetisch. Eine solche aus der eutektischen Mischung InSb—MnSb mit etwa 6 Gewichtsprozent
MnSb hervorgegangene Anordnung zeigt ein metallähnliches Reflexionsvermögen und eine Polarisation
des Reflexionsvermögens für Licht mit Wellenlängen zwischen 10 und 25 μ. Damit verbunden ist ein
Anstieg des Reflexionsvermögens nach den längeren Wellenlängen hin.
Für ein Beispiel der Erfindung sind Meßkurven gezeichnet, die durch Reflexionsmessungen an einer
erfindungsgemäßen InSb-MnSb-Anordnung aufgenommen wurden.
Die Figur zeigt für die Wellenlängen 10,5; 12; 14; 20 und 24 μ der auffallenden Strahlung des Reflexionsvermögen
R (in Prozent) in Abhängigkeit vom Azimut ψ der Polarisationsebene. Das in der Abszisse
aufgetragen Azimut ψ gibt den Winkel zwischen der Polarisationsebene (Ebene des magnetischen
Vektors) der reflektierten elektromagnetischen Strahlung und der Richtung der parallelen MnSb-Dipole
an.
Aus der Figur entnimmt man nicht nur, daß das an der erfindungsgemäßen Anordnung reflektierte
Licht (im angegebenen Beispiel ultrarotes Licht) polarisiert ist, sondern auch,, daß das (mittlere) Reflexionsvermögen
mit der Wellenlänge des auffallenden Lichtes zunimmt. Diese Abhängigkeit des Reflexionsvermögens
von der Wellenlänge ist bei InSb-MnSb-Anordnungen mindestens oberhalb einer Wellenlänge
von 14 μ ähnlich wie bei Metallen.
Claims (5)
1. Anordnung parallel ausgerichteter, elektrischer Dipole für Wellenlängen unterhalt* 1 mm,
bestehend aus elektrisch gut leitenden Stäbchen mit Längen unterhalb 1 mm in einem Halbleitermaterial,
das mit den Stäbchen ein Eutektikum eines binären oder quasi-binären Systems bildet,
nach Patentanmeldung P 14 41 877.0 (deutsche Auslegeschrift 1288651), dadurchgekennzeichnet,
daß die seitlichen Abstände der Stäbchen in der Größenordnung oder kleiner als die Wellenlänge der zu reflektierenden Wellen in
dem Halbleitermaterial sind, derart, daß die Anordnung für die zu reflektierenden Wellen ein
metallähriliches Reflexionsvermögen besitzt.
2. Anordnung nach Anspruch 1, dadurch gekennzeichnet, daß das Stäbchenmaterial ein elektrisch
gut leitender, ferromagnetischer Stoff und das Halbleitermaterial eine im Wellenbereich
unterhalb 1 mm gut durchlässige AniBv-Verbindung
ist.
3. Anordnung nach den Ansprüchen 1 und 2, dadurch gekennzeichnet, daß das Stäbchenmaterial
aus MnSb und das Halbleitermaterial aus InSb bestehen.
4. Anwendung der Anordnung nach den Ansprüchen 1 bis 3 zur Erzeugung von polarisiertem
Licht durch Reflexion.
5. Anwendung der Anordnung nach den Ansprüchen 1 bis 4 als Reflexionsmaterial in Lichtverstärkern
(Laser). L
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES85922A DE1288651B (de) | 1963-06-28 | 1963-06-28 | Anordnung elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm und Verfahren zur Herstellung einer derartigen Anordnung |
| NL6403001A NL6403001A (de) | 1963-06-28 | 1964-03-20 | |
| FR970190A FR1389946A (fr) | 1963-06-28 | 1964-04-08 | Dispositif électrique dipôle et procédé de montage d'un tel dispositif |
| DES90548A DE1295031B (de) | 1963-06-28 | 1964-04-15 | Anordnung parallel ausgerichteter, elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm |
| NL6406386A NL6406386A (de) | 1963-06-28 | 1964-06-05 | |
| US378025A US3439973A (en) | 1963-06-28 | 1964-06-25 | Polarizing reflector for electromagnetic wave radiation in the micron wavelength |
| US377800A US3443854A (en) | 1963-06-28 | 1964-06-25 | Dipole device for electromagnetic wave radiation in micron wavelength ranges |
| GB26879/64A GB1072366A (en) | 1963-06-28 | 1964-06-29 | An arrangement utilising electric dipoles and processes for the production of such an arrangement |
| FR995419A FR86737E (fr) | 1963-06-28 | 1964-11-18 | Dispositif électrique dipôle et procédé de montage d'un tel dispositif |
| CH367865A CH436510A (de) | 1963-06-28 | 1965-03-16 | Polarisierendes Reflexionsfilter |
| AT246065A AT251653B (de) | 1964-04-15 | 1965-03-18 | Polarisierendes Reflexionsfilter |
| BE662307D BE662307A (de) | 1963-06-28 | 1965-04-09 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES85922A DE1288651B (de) | 1963-06-28 | 1963-06-28 | Anordnung elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm und Verfahren zur Herstellung einer derartigen Anordnung |
| DES90548A DE1295031B (de) | 1963-06-28 | 1964-04-15 | Anordnung parallel ausgerichteter, elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1295031B true DE1295031B (de) | 1969-05-14 |
Family
ID=25997287
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DES85922A Pending DE1288651B (de) | 1963-06-28 | 1963-06-28 | Anordnung elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm und Verfahren zur Herstellung einer derartigen Anordnung |
| DES90548A Pending DE1295031B (de) | 1963-06-28 | 1964-04-15 | Anordnung parallel ausgerichteter, elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DES85922A Pending DE1288651B (de) | 1963-06-28 | 1963-06-28 | Anordnung elektrischer Dipole fuer Wellenlaengen unterhalb 1 mm und Verfahren zur Herstellung einer derartigen Anordnung |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US3443854A (de) |
| BE (1) | BE662307A (de) |
| CH (1) | CH436510A (de) |
| DE (2) | DE1288651B (de) |
| GB (1) | GB1072366A (de) |
| NL (2) | NL6403001A (de) |
Families Citing this family (163)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3540793A (en) * | 1968-07-03 | 1970-11-17 | Corning Glass Works | Photochromic polarizing glasses |
| US3653741A (en) * | 1970-02-16 | 1972-04-04 | Alvin M Marks | Electro-optical dipolar material |
| NL7802454A (nl) * | 1978-03-07 | 1979-09-11 | Philips Nv | Gasontladingslaser voor het opwekken van lineair gepolariseerde straling. |
| DE3337049A1 (de) * | 1983-10-12 | 1985-05-09 | Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt | Feststoff mit besonderen elektrischen eigenschaften und verfahren zur herstellung eines solchen feststoffes |
| JPS60212706A (ja) * | 1984-04-07 | 1985-10-25 | Saiteku Kk | 偏光板又は偏光フイルムの製造方法 |
| US5835255A (en) * | 1986-04-23 | 1998-11-10 | Etalon, Inc. | Visible spectrum modulator arrays |
| US6674562B1 (en) * | 1994-05-05 | 2004-01-06 | Iridigm Display Corporation | Interferometric modulation of radiation |
| US7460291B2 (en) * | 1994-05-05 | 2008-12-02 | Idc, Llc | Separable modulator |
| US20010003487A1 (en) * | 1996-11-05 | 2001-06-14 | Mark W. Miles | Visible spectrum modulator arrays |
| US6040937A (en) * | 1994-05-05 | 2000-03-21 | Etalon, Inc. | Interferometric modulation |
| US7550794B2 (en) | 2002-09-20 | 2009-06-23 | Idc, Llc | Micromechanical systems device comprising a displaceable electrode and a charge-trapping layer |
| US8014059B2 (en) * | 1994-05-05 | 2011-09-06 | Qualcomm Mems Technologies, Inc. | System and method for charge control in a MEMS device |
| US7123216B1 (en) | 1994-05-05 | 2006-10-17 | Idc, Llc | Photonic MEMS and structures |
| US6710908B2 (en) | 1994-05-05 | 2004-03-23 | Iridigm Display Corporation | Controlling micro-electro-mechanical cavities |
| US7297471B1 (en) | 2003-04-15 | 2007-11-20 | Idc, Llc | Method for manufacturing an array of interferometric modulators |
| US6680792B2 (en) * | 1994-05-05 | 2004-01-20 | Iridigm Display Corporation | Interferometric modulation of radiation |
| US7138984B1 (en) | 2001-06-05 | 2006-11-21 | Idc, Llc | Directly laminated touch sensitive screen |
| US7907319B2 (en) | 1995-11-06 | 2011-03-15 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with optical compensation |
| US7532377B2 (en) | 1998-04-08 | 2009-05-12 | Idc, Llc | Movable micro-electromechanical device |
| WO1999052006A2 (en) | 1998-04-08 | 1999-10-14 | Etalon, Inc. | Interferometric modulation of radiation |
| US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
| WO2003007049A1 (en) | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
| JP2001125047A (ja) * | 1999-10-27 | 2001-05-11 | Minebea Co Ltd | 光アイソレータ |
| US6589625B1 (en) | 2001-08-01 | 2003-07-08 | Iridigm Display Corporation | Hermetic seal and method to create the same |
| US6794119B2 (en) * | 2002-02-12 | 2004-09-21 | Iridigm Display Corporation | Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
| US6574033B1 (en) | 2002-02-27 | 2003-06-03 | Iridigm Display Corporation | Microelectromechanical systems device and method for fabricating same |
| US7781850B2 (en) | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
| TWI289708B (en) | 2002-12-25 | 2007-11-11 | Qualcomm Mems Technologies Inc | Optical interference type color display |
| TW200413810A (en) | 2003-01-29 | 2004-08-01 | Prime View Int Co Ltd | Light interference display panel and its manufacturing method |
| TW594360B (en) | 2003-04-21 | 2004-06-21 | Prime View Int Corp Ltd | A method for fabricating an interference display cell |
| TW570896B (en) | 2003-05-26 | 2004-01-11 | Prime View Int Co Ltd | A method for fabricating an interference display cell |
| US7221495B2 (en) * | 2003-06-24 | 2007-05-22 | Idc Llc | Thin film precursor stack for MEMS manufacturing |
| TWI231865B (en) | 2003-08-26 | 2005-05-01 | Prime View Int Co Ltd | An interference display cell and fabrication method thereof |
| TW593126B (en) | 2003-09-30 | 2004-06-21 | Prime View Int Co Ltd | A structure of a micro electro mechanical system and manufacturing the same |
| US7012726B1 (en) | 2003-11-03 | 2006-03-14 | Idc, Llc | MEMS devices with unreleased thin film components |
| US7161728B2 (en) * | 2003-12-09 | 2007-01-09 | Idc, Llc | Area array modulation and lead reduction in interferometric modulators |
| US7342705B2 (en) | 2004-02-03 | 2008-03-11 | Idc, Llc | Spatial light modulator with integrated optical compensation structure |
| US7532194B2 (en) * | 2004-02-03 | 2009-05-12 | Idc, Llc | Driver voltage adjuster |
| US7119945B2 (en) * | 2004-03-03 | 2006-10-10 | Idc, Llc | Altering temporal response of microelectromechanical elements |
| US7706050B2 (en) | 2004-03-05 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
| US7060895B2 (en) * | 2004-05-04 | 2006-06-13 | Idc, Llc | Modifying the electro-mechanical behavior of devices |
| US7476327B2 (en) | 2004-05-04 | 2009-01-13 | Idc, Llc | Method of manufacture for microelectromechanical devices |
| US7164520B2 (en) * | 2004-05-12 | 2007-01-16 | Idc, Llc | Packaging for an interferometric modulator |
| US7256922B2 (en) * | 2004-07-02 | 2007-08-14 | Idc, Llc | Interferometric modulators with thin film transistors |
| KR101354520B1 (ko) | 2004-07-29 | 2014-01-21 | 퀄컴 엠이엠에스 테크놀로지스, 인크. | 간섭 변조기의 미소기전 동작을 위한 시스템 및 방법 |
| US7719500B2 (en) | 2004-09-27 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | Reflective display pixels arranged in non-rectangular arrays |
| US7554714B2 (en) | 2004-09-27 | 2009-06-30 | Idc, Llc | Device and method for manipulation of thermal response in a modulator |
| US7453579B2 (en) | 2004-09-27 | 2008-11-18 | Idc, Llc | Measurement of the dynamic characteristics of interferometric modulators |
| US7302157B2 (en) | 2004-09-27 | 2007-11-27 | Idc, Llc | System and method for multi-level brightness in interferometric modulation |
| US7429334B2 (en) | 2004-09-27 | 2008-09-30 | Idc, Llc | Methods of fabricating interferometric modulators by selectively removing a material |
| US7561323B2 (en) * | 2004-09-27 | 2009-07-14 | Idc, Llc | Optical films for directing light towards active areas of displays |
| US7368803B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | System and method for protecting microelectromechanical systems array using back-plate with non-flat portion |
| US7289259B2 (en) | 2004-09-27 | 2007-10-30 | Idc, Llc | Conductive bus structure for interferometric modulator array |
| US20060076634A1 (en) | 2004-09-27 | 2006-04-13 | Lauren Palmateer | Method and system for packaging MEMS devices with incorporated getter |
| US7813026B2 (en) * | 2004-09-27 | 2010-10-12 | Qualcomm Mems Technologies, Inc. | System and method of reducing color shift in a display |
| US20060066596A1 (en) * | 2004-09-27 | 2006-03-30 | Sampsell Jeffrey B | System and method of transmitting video data |
| US7420725B2 (en) | 2004-09-27 | 2008-09-02 | Idc, Llc | Device having a conductive light absorbing mask and method for fabricating same |
| US7373026B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | MEMS device fabricated on a pre-patterned substrate |
| US7359066B2 (en) * | 2004-09-27 | 2008-04-15 | Idc, Llc | Electro-optical measurement of hysteresis in interferometric modulators |
| US7317568B2 (en) | 2004-09-27 | 2008-01-08 | Idc, Llc | System and method of implementation of interferometric modulators for display mirrors |
| US7349141B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | Method and post structures for interferometric modulation |
| US7701631B2 (en) | 2004-09-27 | 2010-04-20 | Qualcomm Mems Technologies, Inc. | Device having patterned spacers for backplates and method of making the same |
| US7492502B2 (en) | 2004-09-27 | 2009-02-17 | Idc, Llc | Method of fabricating a free-standing microstructure |
| US7750886B2 (en) | 2004-09-27 | 2010-07-06 | Qualcomm Mems Technologies, Inc. | Methods and devices for lighting displays |
| US7372613B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | Method and device for multistate interferometric light modulation |
| US7653371B2 (en) * | 2004-09-27 | 2010-01-26 | Qualcomm Mems Technologies, Inc. | Selectable capacitance circuit |
| US7369294B2 (en) * | 2004-09-27 | 2008-05-06 | Idc, Llc | Ornamental display device |
| US7936497B2 (en) | 2004-09-27 | 2011-05-03 | Qualcomm Mems Technologies, Inc. | MEMS device having deformable membrane characterized by mechanical persistence |
| US7289256B2 (en) | 2004-09-27 | 2007-10-30 | Idc, Llc | Electrical characterization of interferometric modulators |
| US7684104B2 (en) | 2004-09-27 | 2010-03-23 | Idc, Llc | MEMS using filler material and method |
| US7898521B2 (en) | 2004-09-27 | 2011-03-01 | Qualcomm Mems Technologies, Inc. | Device and method for wavelength filtering |
| US7668415B2 (en) * | 2004-09-27 | 2010-02-23 | Qualcomm Mems Technologies, Inc. | Method and device for providing electronic circuitry on a backplate |
| US7710632B2 (en) * | 2004-09-27 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Display device having an array of spatial light modulators with integrated color filters |
| US7161730B2 (en) | 2004-09-27 | 2007-01-09 | Idc, Llc | System and method for providing thermal compensation for an interferometric modulator display |
| US7424198B2 (en) | 2004-09-27 | 2008-09-09 | Idc, Llc | Method and device for packaging a substrate |
| US20060176487A1 (en) * | 2004-09-27 | 2006-08-10 | William Cummings | Process control monitors for interferometric modulators |
| US7405861B2 (en) | 2004-09-27 | 2008-07-29 | Idc, Llc | Method and device for protecting interferometric modulators from electrostatic discharge |
| US7417735B2 (en) * | 2004-09-27 | 2008-08-26 | Idc, Llc | Systems and methods for measuring color and contrast in specular reflective devices |
| US7808703B2 (en) | 2004-09-27 | 2010-10-05 | Qualcomm Mems Technologies, Inc. | System and method for implementation of interferometric modulator displays |
| US7349136B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | Method and device for a display having transparent components integrated therein |
| US7807488B2 (en) * | 2004-09-27 | 2010-10-05 | Qualcomm Mems Technologies, Inc. | Display element having filter material diffused in a substrate of the display element |
| US7583429B2 (en) | 2004-09-27 | 2009-09-01 | Idc, Llc | Ornamental display device |
| US7564612B2 (en) | 2004-09-27 | 2009-07-21 | Idc, Llc | Photonic MEMS and structures |
| US7944599B2 (en) | 2004-09-27 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
| US7535466B2 (en) * | 2004-09-27 | 2009-05-19 | Idc, Llc | System with server based control of client device display features |
| US7405924B2 (en) | 2004-09-27 | 2008-07-29 | Idc, Llc | System and method for protecting microelectromechanical systems array using structurally reinforced back-plate |
| US7259449B2 (en) * | 2004-09-27 | 2007-08-21 | Idc, Llc | Method and system for sealing a substrate |
| US8008736B2 (en) | 2004-09-27 | 2011-08-30 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device |
| US7586484B2 (en) | 2004-09-27 | 2009-09-08 | Idc, Llc | Controller and driver features for bi-stable display |
| US7527995B2 (en) | 2004-09-27 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Method of making prestructure for MEMS systems |
| US7130104B2 (en) * | 2004-09-27 | 2006-10-31 | Idc, Llc | Methods and devices for inhibiting tilting of a mirror in an interferometric modulator |
| US7304784B2 (en) | 2004-09-27 | 2007-12-04 | Idc, Llc | Reflective display device having viewable display on both sides |
| US7692839B2 (en) * | 2004-09-27 | 2010-04-06 | Qualcomm Mems Technologies, Inc. | System and method of providing MEMS device with anti-stiction coating |
| US20060103643A1 (en) * | 2004-09-27 | 2006-05-18 | Mithran Mathew | Measuring and modeling power consumption in displays |
| US7299681B2 (en) | 2004-09-27 | 2007-11-27 | Idc, Llc | Method and system for detecting leak in electronic devices |
| US7553684B2 (en) | 2004-09-27 | 2009-06-30 | Idc, Llc | Method of fabricating interferometric devices using lift-off processing techniques |
| US7630119B2 (en) | 2004-09-27 | 2009-12-08 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
| US7327510B2 (en) | 2004-09-27 | 2008-02-05 | Idc, Llc | Process for modifying offset voltage characteristics of an interferometric modulator |
| US7417783B2 (en) | 2004-09-27 | 2008-08-26 | Idc, Llc | Mirror and mirror layer for optical modulator and method |
| US7355780B2 (en) * | 2004-09-27 | 2008-04-08 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
| US7415186B2 (en) | 2004-09-27 | 2008-08-19 | Idc, Llc | Methods for visually inspecting interferometric modulators for defects |
| US20060077126A1 (en) * | 2004-09-27 | 2006-04-13 | Manish Kothari | Apparatus and method for arranging devices into an interconnected array |
| US7460246B2 (en) | 2004-09-27 | 2008-12-02 | Idc, Llc | Method and system for sensing light using interferometric elements |
| US7343080B2 (en) * | 2004-09-27 | 2008-03-11 | Idc, Llc | System and method of testing humidity in a sealed MEMS device |
| US7321456B2 (en) | 2004-09-27 | 2008-01-22 | Idc, Llc | Method and device for corner interferometric modulation |
| US7916103B2 (en) * | 2004-09-27 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | System and method for display device with end-of-life phenomena |
| US7920135B2 (en) | 2004-09-27 | 2011-04-05 | Qualcomm Mems Technologies, Inc. | Method and system for driving a bi-stable display |
| US7893919B2 (en) | 2004-09-27 | 2011-02-22 | Qualcomm Mems Technologies, Inc. | Display region architectures |
| US7710629B2 (en) * | 2004-09-27 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | System and method for display device with reinforcing substance |
| US7369296B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator |
| US20060132383A1 (en) * | 2004-09-27 | 2006-06-22 | Idc, Llc | System and method for illuminating interferometric modulator display |
| US8124434B2 (en) * | 2004-09-27 | 2012-02-28 | Qualcomm Mems Technologies, Inc. | Method and system for packaging a display |
| TW200628877A (en) | 2005-02-04 | 2006-08-16 | Prime View Int Co Ltd | Method of manufacturing optical interference type color display |
| US20060277486A1 (en) * | 2005-06-02 | 2006-12-07 | Skinner David N | File or user interface element marking system |
| KR20080041663A (ko) | 2005-07-22 | 2008-05-13 | 콸콤 인코포레이티드 | Mems 장치를 위한 지지 구조물 및 그 방법들 |
| US7630114B2 (en) | 2005-10-28 | 2009-12-08 | Idc, Llc | Diffusion barrier layer for MEMS devices |
| US7795061B2 (en) | 2005-12-29 | 2010-09-14 | Qualcomm Mems Technologies, Inc. | Method of creating MEMS device cavities by a non-etching process |
| US7636151B2 (en) | 2006-01-06 | 2009-12-22 | Qualcomm Mems Technologies, Inc. | System and method for providing residual stress test structures |
| US7916980B2 (en) | 2006-01-13 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | Interconnect structure for MEMS device |
| US7382515B2 (en) | 2006-01-18 | 2008-06-03 | Qualcomm Mems Technologies, Inc. | Silicon-rich silicon nitrides as etch stops in MEMS manufacture |
| US7603001B2 (en) * | 2006-02-17 | 2009-10-13 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing back-lighting in an interferometric modulator display device |
| US7582952B2 (en) * | 2006-02-21 | 2009-09-01 | Qualcomm Mems Technologies, Inc. | Method for providing and removing discharging interconnect for chip-on-glass output leads and structures thereof |
| US7547568B2 (en) | 2006-02-22 | 2009-06-16 | Qualcomm Mems Technologies, Inc. | Electrical conditioning of MEMS device and insulating layer thereof |
| US7550810B2 (en) | 2006-02-23 | 2009-06-23 | Qualcomm Mems Technologies, Inc. | MEMS device having a layer movable at asymmetric rates |
| US7450295B2 (en) | 2006-03-02 | 2008-11-11 | Qualcomm Mems Technologies, Inc. | Methods for producing MEMS with protective coatings using multi-component sacrificial layers |
| US7643203B2 (en) | 2006-04-10 | 2010-01-05 | Qualcomm Mems Technologies, Inc. | Interferometric optical display system with broadband characteristics |
| US7903047B2 (en) * | 2006-04-17 | 2011-03-08 | Qualcomm Mems Technologies, Inc. | Mode indicator for interferometric modulator displays |
| US7527996B2 (en) | 2006-04-19 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
| US7417784B2 (en) | 2006-04-19 | 2008-08-26 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing a porous surface |
| US7711239B2 (en) | 2006-04-19 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device and method utilizing nanoparticles |
| US7623287B2 (en) | 2006-04-19 | 2009-11-24 | Qualcomm Mems Technologies, Inc. | Non-planar surface structures and process for microelectromechanical systems |
| US8004743B2 (en) | 2006-04-21 | 2011-08-23 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing brightness control in an interferometric modulator (IMOD) display |
| US7369292B2 (en) | 2006-05-03 | 2008-05-06 | Qualcomm Mems Technologies, Inc. | Electrode and interconnect materials for MEMS devices |
| US7321457B2 (en) | 2006-06-01 | 2008-01-22 | Qualcomm Incorporated | Process and structure for fabrication of MEMS device having isolated edge posts |
| US7405863B2 (en) | 2006-06-01 | 2008-07-29 | Qualcomm Mems Technologies, Inc. | Patterning of mechanical layer in MEMS to reduce stresses at supports |
| US7649671B2 (en) | 2006-06-01 | 2010-01-19 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device with electrostatic actuation and release |
| US7471442B2 (en) * | 2006-06-15 | 2008-12-30 | Qualcomm Mems Technologies, Inc. | Method and apparatus for low range bit depth enhancements for MEMS display architectures |
| US7766498B2 (en) * | 2006-06-21 | 2010-08-03 | Qualcomm Mems Technologies, Inc. | Linear solid state illuminator |
| US7835061B2 (en) | 2006-06-28 | 2010-11-16 | Qualcomm Mems Technologies, Inc. | Support structures for free-standing electromechanical devices |
| US7385744B2 (en) | 2006-06-28 | 2008-06-10 | Qualcomm Mems Technologies, Inc. | Support structure for free-standing MEMS device and methods for forming the same |
| US7388704B2 (en) * | 2006-06-30 | 2008-06-17 | Qualcomm Mems Technologies, Inc. | Determination of interferometric modulator mirror curvature and airgap variation using digital photographs |
| US7527998B2 (en) | 2006-06-30 | 2009-05-05 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
| US7763546B2 (en) | 2006-08-02 | 2010-07-27 | Qualcomm Mems Technologies, Inc. | Methods for reducing surface charges during the manufacture of microelectromechanical systems devices |
| US7566664B2 (en) | 2006-08-02 | 2009-07-28 | Qualcomm Mems Technologies, Inc. | Selective etching of MEMS using gaseous halides and reactive co-etchants |
| US8872085B2 (en) | 2006-10-06 | 2014-10-28 | Qualcomm Mems Technologies, Inc. | Display device having front illuminator with turning features |
| WO2008045200A2 (en) | 2006-10-06 | 2008-04-17 | Qualcomm Mems Technologies, Inc. | Optical loss structure integrated in an illumination apparatus of a display |
| JP5492571B2 (ja) * | 2007-02-20 | 2014-05-14 | クォルコム・メムズ・テクノロジーズ・インコーポレーテッド | Memsのエッチングを行うための機器および方法 |
| US7719752B2 (en) | 2007-05-11 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same |
| WO2009036215A2 (en) * | 2007-09-14 | 2009-03-19 | Qualcomm Mems Technologies, Inc. | Etching processes used in mems production |
| US7949213B2 (en) | 2007-12-07 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Light illumination of displays with front light guide and coupling elements |
| US8068710B2 (en) | 2007-12-07 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | Decoupled holographic film and diffuser |
| US8049951B2 (en) | 2008-04-15 | 2011-11-01 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
| US20100195310A1 (en) * | 2009-02-04 | 2010-08-05 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
| US8172417B2 (en) * | 2009-03-06 | 2012-05-08 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
| KR20120090772A (ko) | 2009-05-29 | 2012-08-17 | 퀄컴 엠이엠에스 테크놀로지스, 인크. | 조명장치 및 그의 제조방법 |
| US20110032214A1 (en) * | 2009-06-01 | 2011-02-10 | Qualcomm Mems Technologies, Inc. | Front light based optical touch screen |
| WO2011126953A1 (en) | 2010-04-09 | 2011-10-13 | Qualcomm Mems Technologies, Inc. | Mechanical layer of an electromechanical device and methods of forming the same |
| US8848294B2 (en) | 2010-05-20 | 2014-09-30 | Qualcomm Mems Technologies, Inc. | Method and structure capable of changing color saturation |
| US8670171B2 (en) | 2010-10-18 | 2014-03-11 | Qualcomm Mems Technologies, Inc. | Display having an embedded microlens array |
| US8963159B2 (en) | 2011-04-04 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
| US9134527B2 (en) | 2011-04-04 | 2015-09-15 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
| US8591076B2 (en) * | 2012-03-02 | 2013-11-26 | Osram Sylvania Inc. | Phosphor sheet having tunable color temperature |
| RU2633538C1 (ru) * | 2016-12-09 | 2017-10-13 | Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук (ФГБУН ФИАН) | Магниточувствительный композит |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2224214A (en) * | 1937-12-28 | 1940-12-10 | Polaroid Corp | Light polarizing body |
| US2281100A (en) * | 1938-02-24 | 1942-04-28 | Polaroid Corp | Method of manufacturing light polarizers |
| US2643336A (en) * | 1942-01-29 | 1953-06-23 | Valensi George | Artificial crystal for polarization of electromagnetic waves |
| US2992425A (en) * | 1945-10-12 | 1961-07-11 | Du Pont | Nondirectional, metal-backed, electromagnetic radiation-absorptive films |
| GB735901A (en) * | 1953-02-06 | 1955-08-31 | Marconi Wireless Telegraph Co | Improvements in or relating to hybrid junction arrangements for use on micro radio waves |
| US2954349A (en) * | 1956-08-14 | 1960-09-27 | Jr James R Jenness | Neutral filter for near ultraviolet, visible, and near infrared radiation |
| US2987959A (en) * | 1957-05-28 | 1961-06-13 | Siemens Ag | Device for controlling electromagnetic radiation |
| NL295918A (de) * | 1962-07-31 |
-
1963
- 1963-06-28 DE DES85922A patent/DE1288651B/de active Pending
-
1964
- 1964-03-20 NL NL6403001A patent/NL6403001A/xx unknown
- 1964-04-15 DE DES90548A patent/DE1295031B/de active Pending
- 1964-06-05 NL NL6406386A patent/NL6406386A/xx unknown
- 1964-06-25 US US377800A patent/US3443854A/en not_active Expired - Lifetime
- 1964-06-25 US US378025A patent/US3439973A/en not_active Expired - Lifetime
- 1964-06-29 GB GB26879/64A patent/GB1072366A/en not_active Expired
-
1965
- 1965-03-16 CH CH367865A patent/CH436510A/de unknown
- 1965-04-09 BE BE662307D patent/BE662307A/xx unknown
Non-Patent Citations (1)
| Title |
|---|
| None * |
Also Published As
| Publication number | Publication date |
|---|---|
| CH436510A (de) | 1967-05-31 |
| BE662307A (de) | 1965-08-02 |
| GB1072366A (en) | 1967-06-14 |
| US3443854A (en) | 1969-05-13 |
| US3439973A (en) | 1969-04-22 |
| DE1288651B (de) | 1969-02-06 |
| NL6406386A (de) | 1965-10-18 |
| NL6403001A (de) | 1964-12-29 |
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