DE1256202B - Process for producing homogeneous, rod-shaped crystals from a melt - Google Patents
Process for producing homogeneous, rod-shaped crystals from a meltInfo
- Publication number
- DE1256202B DE1256202B DEN18903A DEN0018903A DE1256202B DE 1256202 B DE1256202 B DE 1256202B DE N18903 A DEN18903 A DE N18903A DE N0018903 A DEN0018903 A DE N0018903A DE 1256202 B DE1256202 B DE 1256202B
- Authority
- DE
- Germany
- Prior art keywords
- crystal
- crucible
- growing
- rod
- directions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims description 54
- 239000000155 melt Substances 0.000 title claims description 8
- 238000000034 method Methods 0.000 title claims 4
- 230000008018 melting Effects 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 6
- 230000006911 nucleation Effects 0.000 claims description 5
- 238000010899 nucleation Methods 0.000 claims description 5
- 238000004857 zone melting Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000007711 solidification Methods 0.000 claims description 4
- 230000008023 solidification Effects 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 229910002804 graphite Inorganic materials 0.000 claims 2
- 239000010439 graphite Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/34—Single-crystal growth by zone-melting; Refining by zone-melting characterised by the seed, e.g. by its crystallographic orientation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/14—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method characterised by the seed, e.g. its crystallographic orientation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/36—Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/901—Levitation, reduced gravity, microgravity, space
- Y10S117/902—Specified orientation, shape, crystallography, or size of seed or substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
Β U JN ΏΆSKISJ* U BL1IK. DiSUISUIiJL1AJMJΒ U JN ΏΆ SKISJ * U BL 1 IK. DiSUISUIiJL 1 AJMJ
DEUTSCHESGERMAN
PATENTAMTPATENT OFFICE
AUSLEGESCHRIFTEDITORIAL
int. ui.:int. ui .:
JtJUl]JtJUl]
Deutsche Kl.: 12 g-17/06 German class: 12 g- 17/06
Nummer: 1256 202Number: 1256 202
Aktenzeichen: N18903IV c/12 gFile number: N18903IV c / 12 g
Anmeldetag: 14. September 1960Filing date: September 14, 1960
Auslegetag: 14. Dezember 1967Opened on: December 14, 1967
Ein stabförmiger Kristall aus halbleitendem Material mit Diamantstruktur soll bei Verwendung in Transistoren, Dioden oder Photozellen hinsichtlich seines spezifischen Widerstandes möglichst homogen sein. Es hat sich herausgestellt, daß bei einem solchen stabförmigen, durch Ziehen aus einer Schmelze oder durch Zonenschmelzen hergestellten Kristall vielfach der spezifische Widerstand in den Querrichtungen nicht homogen ist und daß insbesondere in einem im allgemeinen zentral liegenden, sich in der Längsrichtung des Kristalls erstreckenden Teil der spezifische Widerstand sich erheblich von dem in den angrenzenden Teilen unterscheidet. Infolge dieser Erscheinung, die nachstehend als »Kernbildung« bezeichnet wird, können die spezifischen Widerstände, wenn sie an unterschiedlichen Stellen auf einem Querschnitt des Kristalls gemessen werden, relative Unterschiede von mehr als 30%, sogar von 50% und mehr aufweisen. Unter dem relativen Unterschied zwischen zwei spezifischen Widerständen wird hier das in Prozenten ausgedrückte Verhältnis zwischen der Differenz und der Hälfte der Summe dieser spezifischen Widerstände verstanden. Der Grund dieser Kembildung war nicht bekannt. Es wurde bereits vorgeschlagen, diese Erscheinung dadurch zu verringern, daß der anwachsende Kristall in Drehung und/oder in Schwingung versetzt wurde, aber es hat sich herausgestellt, daß dabei diese Erscheinung nicht ausreichend unterdrückt wird.A rod-shaped crystal made of semiconducting material with a diamond structure is said to be used in Transistors, diodes or photocells are as homogeneous as possible with regard to their specific resistance be. It has been found that in such a rod-shaped, by pulling from a melt or crystal produced by zone melting often has the specific resistance in the transverse directions is not homogeneous and that in particular in a generally centrally located, extending in the longitudinal direction of the crystal extending part the resistivity differs significantly from that in the adjacent Sharing is different. As a result of this phenomenon, hereinafter referred to as "nucleation" the resistivities can if they are in different places on one Cross-section of the crystal can be measured, relative differences of more than 30%, even 50% and have more. Below the relative difference between two resistivities becomes here the ratio, expressed as a percentage, between the difference and half of the sum of these understood specific resistances. The reason for this core formation was not known. It was already proposed to reduce this phenomenon by rotating the growing crystal and / or vibrated, but it has been found that doing so is not sufficiently suppressed.
Weiter ist bereits vorgeschlagen worden, bei der Herstellung einkristalliner Halbleiterstäbe durch Zonenschmelzen den Keimkristall so anzuschmelzen, daß dessen [lll]-Richtung von der Wachstumsrichtung des Kristalls verschieden ist. It has also already been proposed to use single-crystal semiconductor rods in the production Zone melting to melt the seed crystal in such a way that its [III] direction is different from the direction of growth of the crystal.
Um nun die Homogenität eines stabförmigen Einkristalle, insbesondere hinsichtlich seines spezifischen Widerstandes, zu steigern und das Auftreten jeder Kernbildung zu verhüten, wird beim Herstellen stabförmiger Kristalle aus einer halbleitendes Material mit Diamantstruktur enthaltenden Schmelze durch Anwachsen eines Einkristalls, dessen [lll]-Richtungen von der Anwachsrichtung des Kristalls verschieden sind, erfindungsgemäß der Keimkristall so orientiert, daß auch die [100]- und [110]-Richtungen, ebenso wie die [111 !-Richtungen um Winkel von wenigstens 5° von der Anwachsrichtung des Kristalls abweichen.To now the homogeneity of a rod-shaped single crystal, especially with regard to its specific Resistance to increase and to prevent the occurrence of any nucleation becomes more rod-shaped in manufacturing Crystals from a semiconducting material with diamond structure containing melt through Growing of a single crystal whose [III] directions are different from the growing direction of the crystal are, according to the invention, the seed crystal is oriented so that the [100] and [110] directions, as well as the [111! directions deviate by angles of at least 5 ° from the direction of growth of the crystal.
Die Erfindung wird nachstehend an Hand der Zeichnung näher erläutert, in derThe invention is explained in more detail below with reference to the drawing, in which
Fig. 1 eine Vorrichtung zum Anwachsen eines Keimkristalls durch tiegelfreies Zonenschmelzen,1 shows a device for growing a seed crystal by zone melting without a crucible,
Fig. 2 die Orientierung des in Fig. 1 dargestellten Kristalls,Fig. 2 shows the orientation of the crystal shown in Fig. 1,
Verfahren zum Herstellen homogener
stabförmiger Kristalle aus einer SchmelzeMethod of making more homogeneous
rod-shaped crystals from a melt
Anmelder:Applicant:
N. V. Philips' Gloeilampenfabrieken,N. V. Philips' Gloeilampenfabrieken,
Eindhoven (Niederlande)Eindhoven (Netherlands)
Vertreter:Representative:
Dipl.-Ing. E. E. Walther, Patentanwalt,
Hamburg 1, Mönckebergstr. 7Dipl.-Ing. EE Walther, patent attorney,
Hamburg 1, Mönckebergstr. 7th
Als Erfinder benannt:Named as inventor:
Johannes Aloysius Maria Dikhoff,Johannes Aloysius Maria Dikhoff,
Eindhoven (Niederlande)Eindhoven (Netherlands)
Beanspruchte Priorität:Claimed priority:
Niederlande vom 18. September 1959 (243 511)Netherlands 18 September 1959 (243 511)
Fig. 3 eine Vorrichtung zum Aufziehen eines Kristalls aus einer Schmelze,3 shows a device for pulling up a crystal from a melt,
Fig. 4 die Orientierung des in Fig. 3 dargestellten Kristalls,4 shows the orientation of the crystal shown in FIG. 3,
F i g. 5 eine Vorrichtung zum. Zonenschmelzen in einem langgestreckten Tiegel undF i g. 5 a device for. Zone melting in an elongated crucible and
F i g. 6 die Orientierung des in F i g. 5 dargestellten Keimkristalls schematisch darstellt.F i g. 6 the orientation of the in F i g. 5 schematically represents the seed crystal shown.
In F i g. 1 bezeichnet 1 einen Siliciumkeimkristall, der an der Oberseite in einem Halter 2 befestigt ist, der sich mit einer Geschwindigkeit von 100 Umdrehungen in der Minute um seine vertikale Achse X dreht. Ein vertikal gemäß der ΑΓ-Achse angeordneter Siliciumstab 3 ist unten in einem Halter 4 befestigt. Zwischen dem Stab 3 und dem Kristall 1 befindet sich eine Schmelzzone 5, die mittels einer diese Zone symmetrisch umgebenden Hochfrequenzspule 6 erzeugt wird, wobei infolge der hohen Oberflächenspannung das geschmolzene Material nicht herunterfließt. Die Hochfrequenzspule wird mit einer Geschwindigkeit von 1 mm in der Minute in der durch einen Pfeil angegebenen Richtung herabbewegt, wobei der Stab 3 allmählich abschmilzt und der Kristall 1 allmählich in vertikaler Richtung zu einem Stab anwächst. Die Erstarrungsfront 7 zwischen dem anwachsenden Keimkristall 1 und der Schmelzzone 5 hat eine etwas gekrümmte, gegenüber der X-Achse nahezu symmetrische Gestalt. Die Orientierung des Kristalls 1 ist in F i g. 2 mittels eines Würfels 8 dargestellt, dessenIn Fig. 1 denotes 1 a silicon seed crystal which is fixed at the top in a holder 2 which rotates about its vertical axis X at a speed of 100 revolutions per minute. A silicon rod 3 arranged vertically along the ΑΓ axis is fastened in a holder 4 at the bottom. Between the rod 3 and the crystal 1 there is a melting zone 5, which is generated by means of a high-frequency coil 6 symmetrically surrounding this zone, the molten material not flowing down due to the high surface tension. The high-frequency coil is moved downward at a speed of 1 mm per minute in the direction indicated by an arrow, the rod 3 gradually melting and the crystal 1 gradually growing into a rod in the vertical direction. The solidification front 7 between the growing seed crystal 1 and the melting zone 5 has a somewhat curved shape that is almost symmetrical with respect to the X axis. The orientation of the crystal 1 is shown in FIG. 2 shown by means of a cube 8, whose
709 708/370709 708/370
Claims (3)
Behälters 14 angebracht ist und sich durch einen Der Tiegel 30 (Fig. 5) wird jetzt so angeordnet, stabförmigen Zwischenteil 20, der durch eine daß die Hochfrequenzspule 31 die Berührungsstelle Öffnung 21 in der Scheibe 12 hindurchgeführt ist, zwischen dem Stab 32 und dem Keimkristall 33 umerstreckt, ist der Behälter 14 mit dem Innern des gibt, wonach durch Erregung der Spule an dieser Tiegels 11 verbunden. Das Ganze ist durch eine 35 Stelle eine Schmelzzone 37 erzeugt wird. Dann wird Hochfrequenzspule 22 umgeben, so daß es erhitzt der Tiegel mit einer Geschwindigkeit von 2 mm pro werden kann. Durch das Vorhandensein der Graphit- Minute in bezug auf die Spule in der durch einen scheibe 12 mit dem Rand 13 und der Hohlräume 15 Pfeil angegebenen Richtung verschoben, so daß die und 16 kann dem Boden des Tiegels 11 zusätzliche Schmelzzone den Stab 32 in dessen Längsrichtung Wärme zugeführt werden. Der Behälter 14 und der 40 durchläuft, wobei dieser Stab allmählich abschmilzt Kanal 19 sind ganz mit einer Schmelze 23 aus Ger- und zu einem stabförmigen Kristall mit einer Orienmanium gefüllt, die auch den Tiegel 11 bis zu einer tierung nach Fig. 6 wird. Weil die Erhitzung an der Höhe von nur 6 mm, vom Boden des Tiegels ge- Oberseite der Zone 37 (F i g. 5) stärker als an der rechnet, füllt. Ein stabförmig anwachsender Germa- Unterseite ist, ist die Zone an der Oberseite breiter niumkristall 24 mit einem Durchmesser von 2 cm, 45 als an der Unterseite, wodurch die Erstarrungsfront der durch teilweises Anwachsen eines vororientier- 38 gegenüber der Längsachse des anwachsenden ten Keimkristalls erhalten ist, wird mit einer gleich- Teils des Kristalls eine unsymmetrische Gestalt aufmäßigen Geschwindigkeit von 1 mm in der Minute weist und auf ihrer Unterseite nahezu senkrecht zur vertikal aus der Schmelze im Tiegel aufgezogen, Richtung 39 verläuft, in der der Kristall anwächst, während er sich mit einer Geschwindigkeit von 50 aber an der Oberseite stark von dieser Lage ab-50 Umdrehungen in der Minute um seine Γ-Achse weicht. Dadurch, daß die [Hl]-Richtung 36 des dreht, wobei er allmählich weiter anwächst. Dadurch, Keimkristalls in bezug auf die Anwachsrichtung 39 daß der Kolben 18 allmählich gehoben wird, wird (Fig. 6) um einen Winkel von 10° nach unten abder Pegel der Schmelze im Tiegel auf konstanter weicht, verläuft sie nirgendwo senkrecht zur Er-Höhegehalten. 55 starrungsfront 38 (Fig. 5), so daß im wachsendenMelt, in which 11 is a crucible made of graphite, a germanium rod 32 is located in the crucible of the crucible so that its [111! -direction that there is an angle of 10 ° with the longitudinal direction of the 14 two cavities 15 and 16 between the crucible 11 and the container. The crucible 30 includes. The orientation of such holder 14 consists of a cylinder 17 with an arranged seed crystal is again piston 18 in FIG des 30 [HI] direction is denoted by 36.
Container 14 is attached and through a The crucible 30 (Fig. 5) is now arranged, rod-shaped intermediate part 20, which is passed through an opening 21 in the disc 12 that the high-frequency coil 31, the contact point between the rod 32 and the seed crystal 33, the container 14 is connected to the interior of the crucible 11, after which the coil is excited. The whole thing is created by a melting zone 37. Then high frequency coil 22 is surrounded so that it can be heated the crucible at a rate of 2 mm per. Due to the presence of the graphite minute with respect to the coil in the direction indicated by a disk 12 with the edge 13 and the cavities 15 arrow, so that the and 16 can the bottom of the crucible 11 additional melting zone the rod 32 in its longitudinal direction Heat can be supplied. The container 14 and the 40 passes through, this rod gradually melting. Channel 19 are completely filled with a melt 23 of Ger- and to a rod-shaped crystal with an orienmanium, which also becomes the crucible 11 up to an orientation according to FIG. Because the heating at the height of only 6 mm from the bottom of the crucible fills the top of zone 37 (FIG. 5) more than at the calculated. A rod-shaped growing Germa underside is, the zone on the upper side is wider niumkristall 24 with a diameter of 2 cm, 45 than on the underside, whereby the solidification front is obtained by the partial growth of a pre-oriented 38 relative to the longitudinal axis of the growing seed crystal , with an equal part of the crystal has an asymmetrical shape at a constant speed of 1 mm per minute and is pulled up on its underside almost perpendicular to the vertical from the melt in the crucible, direction 39, in which the crystal grows while it moves with it a speed of 50 but strongly deviates from this position at the top - 50 revolutions per minute around its Γ-axis. In that the [Hl] -direction 36 of the rotates, whereby it gradually increases further. Because the seed crystal is gradually raised in relation to the direction of growth 39, the piston 18 is gradually raised (FIG. 6) by an angle of 10 ° downwards from the level of the melt in the crucible at a constant level, it is nowhere perpendicular to the height of the Er. 55 starrungsfront 38 (Fig. 5), so that in the growing
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL243511 | 1959-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1256202B true DE1256202B (en) | 1967-12-14 |
Family
ID=19751930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEN18903A Pending DE1256202B (en) | 1959-09-18 | 1960-09-14 | Process for producing homogeneous, rod-shaped crystals from a melt |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3194691A (en) |
| DE (1) | DE1256202B (en) |
| GB (1) | GB931992A (en) |
| NL (2) | NL243511A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2109874A1 (en) * | 1970-03-02 | 1971-09-16 | Hitachi Ltd | Semiconductor device with a monocrystalline silicon body |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL295683A (en) * | 1962-07-24 | |||
| GB1060474A (en) * | 1963-03-27 | 1967-03-01 | Siemens Ag | The production of monocrystalline semiconductor bodies of silicon or germanium |
| DE1251721B (en) * | 1963-10-28 | 1967-10-12 | Siemens Aktiengesellschaft, Berlin und München München | Method for producing semiconductor stalls, preferably semiconductor stalls with adjustable, for example constant, foreign matter concentration |
| US3329884A (en) * | 1964-06-08 | 1967-07-04 | Bell Telephone Labor Inc | Frequency multiplier utilizing a hybrid junction to provide isolation between the input and output terminals |
| DE1619994B2 (en) * | 1967-03-09 | 1976-07-15 | Siemens AG, 1000 Berlin und 8000 München | PROCESS FOR GROWING A ROD-SHAPED, DISPLACEMENT-FREE SINGLE CRYSTAL OF SILICON BY CRUCIBLE-FREE ZONE MELTING |
| US3776703A (en) * | 1970-11-30 | 1973-12-04 | Texas Instruments Inc | Method of growing 1-0-0 orientation high perfection single crystal silicon by adjusting a focus coil |
| IT943198B (en) * | 1970-12-11 | 1973-04-02 | Philips Nv | PROCEDURE FOR THE MANUFACTURE OF SEMICONDUCTOR MONOCRYSTALS |
| JPS5027480B1 (en) * | 1971-07-28 | 1975-09-08 | ||
| DE2234512C3 (en) * | 1972-07-13 | 1979-04-19 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Process for the production of (reoriented semiconductor single crystal rods with a specific resistance thawing towards the center of the rod |
| JPS6379790A (en) * | 1986-09-22 | 1988-04-09 | Toshiba Corp | Crystal pulling up device |
| US5069743A (en) * | 1990-04-11 | 1991-12-03 | Hughes Aircraft Company | Orientation control of float-zone grown TiC crystals |
| JPH042683A (en) * | 1990-04-16 | 1992-01-07 | Chichibu Cement Co Ltd | Production of rutile single crystal |
| DE4323793A1 (en) * | 1993-07-15 | 1995-01-19 | Wacker Chemitronic | Process for the production of rods or blocks from semiconductor material which expands on solidification by crystallizing a melt produced from granules, and device for carrying it out |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2651831A (en) * | 1950-07-24 | 1953-09-15 | Bell Telephone Labor Inc | Semiconductor translating device |
| US3018539A (en) * | 1956-11-06 | 1962-01-30 | Motorola Inc | Diffused base transistor and method of making same |
| US2981875A (en) * | 1957-10-07 | 1961-04-25 | Motorola Inc | Semiconductor device and method of making the same |
-
0
- NL NL104644D patent/NL104644C/xx active
- NL NL243511D patent/NL243511A/xx unknown
-
1960
- 1960-09-02 US US53692A patent/US3194691A/en not_active Expired - Lifetime
- 1960-09-14 DE DEN18903A patent/DE1256202B/en active Pending
- 1960-09-15 GB GB31807/60A patent/GB931992A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2109874A1 (en) * | 1970-03-02 | 1971-09-16 | Hitachi Ltd | Semiconductor device with a monocrystalline silicon body |
Also Published As
| Publication number | Publication date |
|---|---|
| NL243511A (en) | |
| US3194691A (en) | 1965-07-13 |
| GB931992A (en) | 1963-07-24 |
| NL104644C (en) |
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