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DE1242427B - Galvanic tin bath for depositing bright to shiny coatings - Google Patents

Galvanic tin bath for depositing bright to shiny coatings

Info

Publication number
DE1242427B
DE1242427B DESCH33772A DESC033772A DE1242427B DE 1242427 B DE1242427 B DE 1242427B DE SCH33772 A DESCH33772 A DE SCH33772A DE SC033772 A DESC033772 A DE SC033772A DE 1242427 B DE1242427 B DE 1242427B
Authority
DE
Germany
Prior art keywords
tin
acid
formalin
shiny
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DESCH33772A
Other languages
German (de)
Inventor
Dr-Ing Joachim Korpiun
Friedrich Sedlacek
Dr Rer Nat Joachim Steeg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Ing Max Schloetter GmbH and Co KG
Original Assignee
Dr Ing Max Schloetter GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL124247D priority Critical patent/NL124247C/xx
Priority to NL134963D priority patent/NL134963C/xx
Application filed by Dr Ing Max Schloetter GmbH and Co KG filed Critical Dr Ing Max Schloetter GmbH and Co KG
Priority to DESCH33772A priority patent/DE1242427B/en
Priority to DESCH35588A priority patent/DE1246346B/en
Priority to GB34585/64A priority patent/GB1022746A/en
Priority to US391790A priority patent/US3361652A/en
Priority to FR986150A priority patent/FR1405752A/en
Priority to NL6409945A priority patent/NL6409945A/xx
Priority to CH1121664A priority patent/CH449372A/en
Priority to BE652405D priority patent/BE652405A/xx
Publication of DE1242427B publication Critical patent/DE1242427B/en
Priority to NL6801713A priority patent/NL6801713A/xx
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/06—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
    • C07D233/08—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms
    • C07D233/12—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D233/14—Radicals substituted by oxygen atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electromechanical Clocks (AREA)

Description

Galvanisches Zinnbad zum Abscheiden blanker bis glänzender tYberziige Die Erfindung betrifft ein galvanisches Zinnbad zum Abscheiden blanker bis glänzender Überzüge.Galvanic tin bath for depositing bright to shiny surfaces The invention relates to an electroplating tin bath for depositing bright to shiny ones Coatings.

Es ist bekannt, zur elektrolytischen Abscheidung blanker bis glänzender Zinnschichten Elektrolyte zu verwenden, die durch Zusätze von Netzmitteln, Holzteer oder Holzteerfraktionen zu freie Säure enthaltenden Zinnsalzlösungen erhalten werden. Diese Bäder haben jedoch den Nachteil, daß man sie nur schwierig auf einem für technische Zwecke brauchbaren gleichmäßigen Betriebszustand halten kann.It is known for electrolytic deposition to be shiny to shiny Tin layers use electrolytes, by adding wetting agents, wood tar or wood tar fractions are obtained into tin salt solutions containing free acid. However, these baths have the disadvantage that they are difficult to use for technical purposes Purposes can keep usable steady operating state.

Um eine Verbesserung bei der galvanischen Abscheidung von Metallüberzügen aus wäßrigen Metallsalzlösungen, insbesondere im Hinblick auf den Glanz und die Beständigkeit der Überzüge zu erhalten, wird in der französischen Patentschrift 1185 579 vorgeschlagen, eine oder mehrere organische Säuren mit mindestens einer nicht gesättigten Bindung zuzufügen. To improve the electrodeposition of metal coatings from aqueous metal salt solutions, especially with regard to the gloss and the Maintaining durability of the coatings is described in the French patent 1185 579 suggested one or more organic acids with at least one not adding saturated bond.

Als solche Säuren wurden beispielsweise Crotonsäure, Acrylsäure, Glyoxalsäure, Zimtsäure u. a. vorgeschlagen. Derartige Zusätze sollen die Niederschläge aller elektrolytisch abscheidbaren Metalle, wie Kupfer, Zink, Cadmium, Nickel usw., verbessern, obgleich in dieser Patentschrift lediglich ein sich auf Nickelüberzüge beziehendes Beispiel beschrieben ist. Über den Betriebszustand derartiger Bäder nach längerem Einsatz ist dieser Veröffentlichung nichts zu entnehmen.Such acids were, for example, crotonic acid, acrylic acid, glyoxalic acid, Cinnamic acid and others suggested. Such additives are supposed to keep the rainfall down all Electrolytically depositable metals such as copper, zinc, cadmium, nickel, etc., improve, although in this patent there is only one reference to nickel coatings Example is described. About the operating condition of such baths after a long time Use is not to be found in this publication.

Es ist daher das Ziel der Erfindung ; ein galvanisches Bad zu schaffen, welches über längere Zeit einen gleichmäßig guten Betriebszustand aufweist. Ein störungsfrei arbeitendes galvanisches Bad zr elektrolytischen Abscheidung blanker bis glänzender Zinnschichten auf der Kathode, welches aus einerim wesentlichen-vinnsalw, freie Säure und Netzmittel enthaltenden wäßrigen Lösung besteht, zeichnet sich erfindungsgemäß dadurch aus, daß dieser Lösung Formalin und ungesättigte Verbindungen der allgemeinen Formel X-CH=CH-Y zugesetzt werden, wobei X einen isocyclischen oder heterocyclischen, gegebenenfalls substituierten Ring, Y eine der Atomgruppen H, CHO, COOH, CH2OH, R, CO-R und R einen Alkyl-oder Alkylenrest mit gegebenenfalls weiteren funktionellen Gruppen bedeutet. It is therefore the aim of the invention; to create a galvanic bath, which has a consistently good operating condition over a longer period of time. A Trouble-free working galvanic bath for electrolytic deposition of bare until shiny layers of tin on the cathode, which consists of an essentially vinnsalw, An aqueous solution containing free acid and wetting agent is distinguished according to the invention characterized in that this solution formalin and unsaturated compounds of the general Formula X-CH = CH-Y are added, where X is an isocyclic or heterocyclic, optionally substituted ring, Y one of the atomic groups H, CHO, COOH, CH2OH, R, CO-R and R are an alkyl or alkylene radical with optionally further functional ones Groups means.

Bei einer bevorzugten Ausführungsform des galvanischen Bades werden ein-oder mehrfach substituierte ungesättigte Acetone zusammen mit Formalin als Zusatz verwendet. Verbindungen der neben Formalin als Zusatz zu Zinnbädern beanspruchten Art sind beispielsweise die folgenden : Styrol C6H5 #CH=CH2 Zimtalkohol C6H5 CH = CH#CH2OH Zimtsäure C6H,-CH = CH-COOH Zimtaldehyd C6Hs CH = CH CHO o-Methoxy-Zimtsäure C6H4(OCH2)#CH=CH#COOH Furylacrylsäure C4H30 #CH=CH#COOH Benzalaceton C6H5 # CH=CH#CO#CH3 Curcumin IC6H, (OH) (OCH3)-CH=CH#CO]2:CH2 Furfurylidenaceton C4II30 O-CH = CH-CO-CH, Benzalacetonsulfonsäure C6H4(SO3H)#CH=CH#CO#CH3 Dibenzalacetondisulfonsäure (C6H4 (SO3H)-CH = CH) s : CO Benzylidenheptenal-7 CgHg. CH = CH. (CHJs-CHO 4-Oxy-3-methoxy-benzalaceton C6H3 (OH) (OCH3) = CH-CO-CH3 Pyridylidenaceton C5H4N#CH=CH#CO#CH3 Diese Auswahl begrenzt keineswegs die Zahl der ur die Abscheidung blanker bis glänzender Zinn- schichten brauchbaren Verbindungen, sondern dient als Beweis dafür, dal3 verschiedenartige Verbindungen der genannten allgemeinen Formel zur Herstellung eines gut arbeitenden Bades gemäß der Erfindung verwendet werden können. In a preferred embodiment of the electroplating bath mono- or poly-substituted unsaturated acetones together with formalin as an additive used. Compounds that are claimed as an additive to tin baths in addition to formalin Kinds are for example the following: styrene C6H5 # CH = CH2 cinnamon alcohol C6H5 CH = CH # CH2OH cinnamic acid C6H, -CH = CH-COOH cinnamic aldehyde C6Hs CH = CH CHO o-methoxy-cinnamic acid C6H4 (OCH2) # CH = CH # COOH furylacrylic acid C4H30 # CH = CH # COOH benzalacetone C6H5 # CH = CH # CO # CH3 Curcumin IC6H, (OH) (OCH3) -CH = CH # CO] 2: CH2 furfurylidene acetone C4II30 O-CH = CH-CO-CH, Benzalacetone sulfonic acid C6H4 (SO3H) # CH = CH # CO # CH3 Dibenzalacetone disulfonic acid (C6H4 (SO3H) -CH = CH) s: CO Benzylidenheptenal-7 CgHg. CH = CH. (CHJs-CHO 4-Oxy-3-methoxy-benzalacetone C6H3 (OH) (OCH3) = CH-CO-CH3 pyridylidene acetone C5H4N # CH = CH # CO # CH3 This selection does not in any way limit the number of pewter that can be deposited layers useful compounds, but serves as evidence that different Compounds of the general formula mentioned for the preparation of a well-working Bath can be used according to the invention.

Der Zinngehalt und Gehalt an freier Säure der Elektrolyte kann in weiten Grenzen variiert werden, wobei im Einzelfall die zweckmäßigsten Konzentrationen der einzelnen Badbestandteile aufeinander abzustimmen sind. Elektrolyte mit 10 bis 100 g/l Zinn und 20 bis 200 g/l freier Säure, berechnet als Schwefelsäure, können in Anwesenheit von Netzmitteln mit Formalin und den beanspruchten Verbindungen der allgemeinen Formel X-CH = CH-Y bei geeigneten Arbeitsbedingungen, wie geeigneter Temperatur und Stromdichte, kathodisch blanke bis glänzende Zinniederschläge liefern. The tin content and free acid content of the electrolytes can be in can be varied within wide limits, the most expedient concentrations in individual cases the individual bathroom components are to be coordinated with one another. Electrolytes with 10 to 100 g / l tin and 20 to 200 g / l free acid, calculated as sulfuric acid, can in the presence of wetting agents with formalin and the claimed compounds of general formula X-CH = CH-Y under suitable working conditions, such as more suitable Temperature and current density, deliver cathodically bright to shiny tin deposits.

Netzmittel vom nichtionogenen Typ haben sich für das erfindungsgemäße Bad als besonders geeignet erwiesen, wobei solche mit 10 bis 30 C2H4O-Gruppen im Molekül bevorzugt werden. Wetting agents of the nonionic type have been found for the invention Bath proved to be particularly suitable, with those with 10 to 30 C2H4O groups in the Molecule are preferred.

Die Grundelektrolyte der verwendeten Bäder können auf der für die Herstellung von Zinnbädern bekannten Basis Schwefelsäure, Fluoborsäure oder Phenolsulfosäure aufgebaut werden. Es lassen sich aber auch Elektrolyte verwenden, die mehrere der genannten Anionen gemeinsam enthalten. The basic electrolytes of the baths used can be based on the Production of tin baths known based on sulfuric acid, fluoroboric acid or phenol sulfonic acid being constructed. But it can also use electrolytes that contain several of the included anions mentioned together.

Die Variationsmöglichkeit des galvanischen Zinnbades nach der Erfindung zur Herstellung blanker bis glänzender Zinnüberzüge zeigen folgende Beispiele verschiedener Zusammensetzungen zur Herstellung der entsprechenden Elektrolyte : Beispiel 1 60 g/l Zinnsulfat, 100 g/l Schwefelsäure, 1 g/l Formalin, 1 g/1 nichtionogenes Netzmittel mit etwa 30 C2H4O-Gruppen im Molekül, 1 g/l Styrol. The possibility of varying the galvanic tin bath according to the invention for the production of bright to shiny tin coatings, the following examples show various Compositions for the production of the corresponding electrolytes: Example 1 60 g / l tin sulfate, 100 g / l sulfuric acid, 1 g / l formalin, 1 g / 1 non-ionic wetting agent with about 30 C2H4O groups in the molecule, 1 g / l styrene.

Das Bad ist zunächst trübe, klärt sich aber im Verlauf von etwa 1 Tag. The bath is cloudy at first, but clears up in the course of about 1 Day.

Arbeitstemperatur........... 20 bis 30°C Stromdichte................. 1 bis 2, 5 A/dmS Beispiel 2 60 g/l Zinnsulfat, 100 g/l Schwefelsäure, 1, 5 g/l Formalin, 2 g/l nichtionogenes Netzmittel mit etwa 25 C2H4O-Gruppen im Molekül, 1 g/l Zimtalkohol. Working temperature ........... 20 to 30 ° C Current density ................. 1 to 2.5 A / dmS Example 2 60 g / l tin sulfate, 100 g / l sulfuric acid, 1.5 g / l formalin, 2 g / l non-ionic wetting agent with about 25 C2H4O groups in the molecule, 1 g / l cinnamon alcohol.

Arbeitsbedingungen wie im Beispiel 1. Working conditions as in example 1.

Beispiel 3 80 g/1 Zinnsulfat, 80 g/l Schwefelsäure, 0, 8 g/l Formalin, 6 g/l nichtionogenes Netzmittel mit etwa 11 C2H40-Gruppen im Molekül, 0, 35 g/l Furfurylidenaceton. Example 3 80 g / 1 tin sulfate, 80 g / l sulfuric acid, 0.8 g / l formalin, 6 g / l non-ionic wetting agent with about 11 C2H40 groups in the molecule, 0.35 g / l Furfurylidene acetone.

Arbeitstemperatur........... 15 bis 30°C Stromdichte ................ 0, 8 bis 4 A/dm2 Beispiel 4 80 g/l Zinnsulfat, 120 g/l Schwefelsäure, 1, 6 g/l Formalin, 5 g/l nichtionogenes Netzmittel mit etwa 11 C2H40-Gruppen im Molekül, 0, 65 g/l o-Methoxy-Zimtsäure. Working temperature ........... 15 to 30 ° C Current density ................ 0.8 to 4 A / dm2 Example 4 80 g / l tin sulfate, 120 g / l sulfuric acid, 1.6 g / l formalin, 5 g / l non-ionic wetting agent with about 11 C2H40 groups in the molecule, 0.65 g / l o-methoxycinnamic acid.

Arbeitstemperatur........ 20 bis 30°C Stromdichte............ 1 bis 2, 5 A/dms Beispiel 5 60 g/l Zinnsulfat, 80 g/l Schwefelsäure, 0, 8 g/l Formalin, 6 g/l nichtionogenes Netzmittel mit etwa 15 C2H4O-Gruppen im Molekül, 1, 3 g/l Furylacrylsäure. Working temperature ........ 20 to 30 ° C Current density ............ 1 to 2.5 A / dms Example 5 60 g / l tin sulfate, 80 g / l sulfuric acid, 0.8 g / l formalin, 6 g / l non-ionic wetting agent with about 15 C2H4O groups in the molecule, 1.3 g / l furylacrylic acid.

Arbeitstemperatur....... 18 bis 30°C Stromdichte............... 0, 7 bis 3, 5 A/dm' Beispiel 6 70 g/l Zinnsulfat, 160 g/l Schwefelsäure, 5 g/l Formalin, 6 g/l nichtionogenes Netzmittel mit etwa 11 C2H40-Gruppen im Molekül, 0, 35 g/l Benzalaceton. Working temperature ....... 18 to 30 ° C Current density ............... 0, 7 to 3.5 A / dm 'Example 6 70 g / l tin sulfate, 160 g / l sulfuric acid, 5 g / l formalin, 6 g / l non-ionic wetting agent with about 11 C2H40 groups in the molecule, 0.35 g / l Benzalacetone.

Arbeitsbedingungen wie bei Beispiel 5. Working conditions as in example 5.

Beispiel 7 60 g/I Zinnsulfat, 120 g/1 Schwefelsäure, 0, 8 g/l Formalin, 6 g/l nichtionogenes Netzmittel mit 15 C2H4O-Gruppen im Molekül, 0, 32 g/l Benzylidenheptenal-7. Example 7 60 g / l tin sulfate, 120 g / l sulfuric acid, 0.8 g / l formalin, 6 g / l non-ionic wetting agent with 15 C2H4O groups in the molecule, 0.32 g / l benzylidene heptenal-7.

Arbeitsbedingungen wie bei Beispiel 4. Working conditions as in example 4.

Beispiel 8 80 g/1 Zinnsulfat, 100 g/1 Schwefelsäure, 1 g/1 Formalin, 4 g/l nichtionogenes Netzmittel mit 15 C2H4O-Gruppen im Molekül, 0, 4 g/l Pyridylidenaceton. Example 8 80 g / 1 tin sulfate, 100 g / 1 sulfuric acid, 1 g / 1 formalin, 4 g / l non-ionic wetting agent with 15 C2H4O groups in the molecule, 0.4 g / l pyridylidene acetone.

Arbeitstemperatur........... 15 bis 30°C Stromdichte................ 1 bis 3, 5 A/dms Beispiel 9 45 g/l Zinn als Fluoborat, 90 g/1 Fluoborsäure, 2 g/1 nichtionogenes Netzmittel mit 11 C2H4O-Gruppen im Molekül, 1 g/l Formalin, 0, 5 g/1 Zimtaldehyd. Working temperature ........... 15 to 30 ° C Current density ................ 1 to 3.5 A / dms Example 9 45 g / l tin as fluoborate, 90 g / l fluoboric acid, 2 g / l Non-ionic wetting agent with 11 C2H4O groups in the molecule, 1 g / l formalin, 0.5 g / 1 cinnamaldehyde.

Arbeitstemperatur............. 20 bis 35°C Stromdichte............... 1 bis 4 A/dms Beispiel 10 Wie Beispiel 9, jedoch an Stelle von Zimtaldehyd 0, 2 g/l Benzalaceton. Arbeitsbedingungen wie Beispiel 9. Working temperature ............. 20 to 35 ° C Current density ............... 1 to 4 A / dms Example 10 As Example 9, but instead of cinnamaldehyde 0.2 g / l benzalacetone. Working conditions as in example 9.

Beispiel 11 60 g/l Zinnsulfat, 260 g/l Kresolsulfonsäure, 2 g/l Formalin, 2 g/l nichtionogenes Netzmittel mit 11 C2H40-Gruppen im Molekül, 0, 4 g/l Benzalaceton. Example 11 60 g / l tin sulfate, 260 g / l cresol sulfonic acid, 2 g / l formalin, 2 g / l non-ionic wetting agent with 11 C2H40 groups in the molecule, 0.4 g / l benzalacetone.

Arbeitstemperatur.......... 20 bis 30°C Stromdichte........ 1 bis 4 A/dma Patentansprüche : 1. Galvanisches Zinnbad zum Abscheiden blanker bis glänzender Überzüge, bestehend aus einer Zinnsalz, freie Säure und Netzmittel enthaltenden wäßrigen Losung, dadurch gek e n n z e i c h n e t, daß die Lösung Formalin und ungesättigte Verbindungen der allgemeinen Formel X-CH=CH-Y enthält, wobei X einen isocyclischen oder heterocyclischen, gegebenenfalls substituierten Ring, Y eine der Atomgruppen-H,-CHO,-COOH, -CHOH,-R,-CO-R und R einen Alkyl-oder Alkylenrest mit gegebenenfalls weiteren funktionellen Gruppen bedeutet. Working temperature .......... 20 to 30 ° C Current density ........ 1 to 4 A / dma claims: 1. Galvanic tin bath for depositing bright to shiny Coatings consisting of a tin salt, containing free acid and wetting agents aqueous solution, in that the solution is formalin and unsaturated Contains compounds of the general formula X-CH = CH-Y, where X is an isocyclic one or heterocyclic, optionally substituted ring, Y one of the atomic groups -H, -CHO, -COOH, -CHOH, -R, -CO-R and R are an alkyl or alkylene radical with optionally further functional ones Groups means.

Claims (1)

2. Bad nach Anspruch 1, dadurch gekennzeichnet, daß es ein-oder mehrfach substituierte ungesättigte Acetone zusammen mit Formalin enthält. 2. Bath according to claim 1, characterized in that it is one or more times Contains substituted unsaturated acetones together with formalin. In Betracht gezogene Druckschriften : Französische Patentschrift Nr. 1185 579. Documents considered: French patent specification No. 1185 579.
DESCH33772A 1963-08-28 1963-08-28 Galvanic tin bath for depositing bright to shiny coatings Pending DE1242427B (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
NL124247D NL124247C (en) 1963-08-28
NL134963D NL134963C (en) 1963-08-28
DESCH33772A DE1242427B (en) 1963-08-28 1963-08-28 Galvanic tin bath for depositing bright to shiny coatings
DESCH35588A DE1246346B (en) 1963-08-28 1964-08-05 Galvanic tin bath for depositing bright to shiny tin coatings
US391790A US3361652A (en) 1963-08-28 1964-08-24 Electrodeposition of bright tin
GB34585/64A GB1022746A (en) 1963-08-28 1964-08-24 Electrodeposition of bright tin
FR986150A FR1405752A (en) 1963-08-28 1964-08-25 Galvanic bath for the electrolytic deposition of bright to shiny tin layers
NL6409945A NL6409945A (en) 1963-08-28 1964-08-27
CH1121664A CH449372A (en) 1963-08-28 1964-08-27 Galvanic bath
BE652405D BE652405A (en) 1963-08-28 1964-08-28
NL6801713A NL6801713A (en) 1963-08-28 1968-02-07

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DESCH33772A DE1242427B (en) 1963-08-28 1963-08-28 Galvanic tin bath for depositing bright to shiny coatings
DESCH35588A DE1246346B (en) 1963-08-28 1964-08-05 Galvanic tin bath for depositing bright to shiny tin coatings

Publications (1)

Publication Number Publication Date
DE1242427B true DE1242427B (en) 1967-06-15

Family

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DESCH33772A Pending DE1242427B (en) 1963-08-28 1963-08-28 Galvanic tin bath for depositing bright to shiny coatings
DESCH35588A Pending DE1246346B (en) 1963-08-28 1964-08-05 Galvanic tin bath for depositing bright to shiny tin coatings

Family Applications After (1)

Application Number Title Priority Date Filing Date
DESCH35588A Pending DE1246346B (en) 1963-08-28 1964-08-05 Galvanic tin bath for depositing bright to shiny tin coatings

Country Status (6)

Country Link
US (1) US3361652A (en)
BE (1) BE652405A (en)
CH (1) CH449372A (en)
DE (2) DE1242427B (en)
GB (1) GB1022746A (en)
NL (4) NL6409945A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1621173B1 (en) * 1967-07-27 1970-12-23 Parker Ste Continentale Galvanic tin bath and process for tinning
US3755096A (en) * 1971-07-01 1973-08-28 M & T Chemicals Inc Bright acid tin plating
FR2509756A1 (en) * 1981-07-14 1983-01-21 Edinen Zentar Chim ELECTROLYTE FOR THE DEPOSITION OF BRILLIANT TIN COATINGS

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL128321C (en) * 1965-02-13
NL6505921A (en) * 1965-05-11 1966-11-14
NL151449B (en) * 1966-09-14 1976-11-15 Philips Nv PROCESS FOR THE PREPARATION OF AN ACID BATH FOR THE ELECTROLYTIC DEPOSITION OF TIN.
NL6910903A (en) * 1969-07-16 1971-01-19
US3785939A (en) * 1970-10-22 1974-01-15 Conversion Chem Corp Tin/lead plating bath and method
US3875029A (en) * 1974-02-19 1975-04-01 R O Hull & Company Inc Plating bath for electrodeposition of bright tin and tin-lead alloy
US4207148A (en) * 1975-11-28 1980-06-10 Minnesota Mining And Manufacturing Company Electroplating bath for the electrodeposition of tin and tin/cadmium deposits
DE2650572C2 (en) * 1976-11-04 1978-09-14 Siemens Ag, 1000 Berlin Und 8000 Muenchen Method for monitoring the quantity of a wetting agent in an electrolyte for the surface treatment of metals
US4139425A (en) * 1978-04-05 1979-02-13 R. O. Hull & Company, Inc. Composition, plating bath, and method for electroplating tin and/or lead
PL120216B1 (en) * 1979-01-11 1982-02-27 Politechnika Warszawska Process for electrochemical manufacture of bright tin coatingsovjannykh pokrytijj
DE3854551T2 (en) * 1987-12-10 1996-04-18 Lea Ronal Inc Tin, lead and tin-lead alloy electrolytes for high-speed electroplating.
US5174887A (en) * 1987-12-10 1992-12-29 Learonal, Inc. High speed electroplating of tinplate
US4844780A (en) * 1988-02-17 1989-07-04 Maclee Chemical Company, Inc. Brightener and aqueous plating bath for tin and/or lead
US8440065B1 (en) 2009-06-07 2013-05-14 Technic, Inc. Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating
CN101962790B (en) * 2010-08-20 2012-05-23 河南科技大学 Electrolyte composition for semi-bright acidic tin plating
EP2740820A1 (en) 2012-12-04 2014-06-11 Dr.Ing. Max Schlötter GmbH & Co. KG Electrolyte and process for the separation of solderable layers
JP6133056B2 (en) * 2012-12-27 2017-05-24 ローム・アンド・ハース電子材料株式会社 Tin or tin alloy plating solution
WO2022129238A1 (en) 2020-12-18 2022-06-23 Basf Se Composition for tin or tin alloy electroplating comprising leveling agent
CN119630838A (en) 2022-07-26 2025-03-14 巴斯夫欧洲公司 Composition for tin or tin alloy electroplating comprising a leveling agent

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1185579A (en) * 1957-10-30 1959-08-03 Improvements in the electrolysis of aqueous solutions of metal salts

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE508197A (en) * 1951-01-12
DE971778C (en) * 1953-05-05 1959-03-26 Max Schloetter Fa Dr Ing Process for the galvanic deposition of tin from acidic electrolytes
US3082157A (en) * 1958-06-23 1963-03-19 Bethlehem Steel Corp Electrodeposition of tin

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1185579A (en) * 1957-10-30 1959-08-03 Improvements in the electrolysis of aqueous solutions of metal salts

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1621173B1 (en) * 1967-07-27 1970-12-23 Parker Ste Continentale Galvanic tin bath and process for tinning
US3755096A (en) * 1971-07-01 1973-08-28 M & T Chemicals Inc Bright acid tin plating
FR2509756A1 (en) * 1981-07-14 1983-01-21 Edinen Zentar Chim ELECTROLYTE FOR THE DEPOSITION OF BRILLIANT TIN COATINGS

Also Published As

Publication number Publication date
NL6801713A (en) 1968-04-25
NL124247C (en)
CH449372A (en) 1967-12-31
US3361652A (en) 1968-01-02
DE1246346B (en) 1967-08-03
GB1022746A (en) 1966-03-16
NL134963C (en)
NL6409945A (en) 1965-03-01
BE652405A (en) 1964-12-16

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E77 Valid patent as to the heymanns-index 1977