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DE112011102856B4 - Anordnung - Google Patents

Anordnung Download PDF

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Publication number
DE112011102856B4
DE112011102856B4 DE112011102856.3T DE112011102856T DE112011102856B4 DE 112011102856 B4 DE112011102856 B4 DE 112011102856B4 DE 112011102856 T DE112011102856 T DE 112011102856T DE 112011102856 B4 DE112011102856 B4 DE 112011102856B4
Authority
DE
Germany
Prior art keywords
precursor
nozzle head
cylindrical
substrate
zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE112011102856.3T
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German (de)
English (en)
Other versions
DE112011102856T5 (de
Inventor
Tapani Alasaarela
Pekka Soininen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beneq Oy
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Publication of DE112011102856T5 publication Critical patent/DE112011102856T5/de
Application granted granted Critical
Publication of DE112011102856B4 publication Critical patent/DE112011102856B4/de
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE112011102856.3T 2010-08-30 2011-08-29 Anordnung Active DE112011102856B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20105902 2010-08-30
FI20105902A FI20105902A0 (sv) 2010-08-30 2010-08-30 Anordning
PCT/FI2011/050747 WO2012028779A1 (en) 2010-08-30 2011-08-29 Apparatus

Publications (2)

Publication Number Publication Date
DE112011102856T5 DE112011102856T5 (de) 2013-08-08
DE112011102856B4 true DE112011102856B4 (de) 2023-03-23

Family

ID=42669406

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112011102856.3T Active DE112011102856B4 (de) 2010-08-30 2011-08-29 Anordnung

Country Status (5)

Country Link
CN (1) CN103080374B (sv)
DE (1) DE112011102856B4 (sv)
FI (1) FI20105902A0 (sv)
TW (1) TW201219117A (sv)
WO (1) WO2012028779A1 (sv)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI125341B (sv) * 2012-07-09 2015-08-31 Beneq Oy Apparatur och metod för processing av substrat

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5704983A (en) 1992-05-28 1998-01-06 Polar Materials Inc. Methods and apparatus for depositing barrier coatings
EP1884472A1 (en) 2005-05-27 2008-02-06 Kirin Beer Kabushiki Kaisha Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4597986A (en) * 1984-07-31 1986-07-01 Hughes Aircraft Company Method for photochemical vapor deposition
JP3103186B2 (ja) * 1992-03-19 2000-10-23 富士通株式会社 原子層エピタキシー装置および原子層エピタキシー法
JP2004014953A (ja) * 2002-06-10 2004-01-15 Tokyo Electron Ltd 処理装置および処理方法
US20050172897A1 (en) * 2004-02-09 2005-08-11 Frank Jansen Barrier layer process and arrangement
WO2006087893A1 (ja) * 2005-02-17 2006-08-24 Hitachi Kokusai Electric Inc. 基板処理方法および基板処理装置
KR20060103640A (ko) * 2005-03-28 2006-10-04 삼성전자주식회사 반도체 제조장치
JP2007111678A (ja) * 2005-10-24 2007-05-10 Sekisui Chem Co Ltd 線状被処理物用プラズマ処理装置
CN101589171A (zh) * 2006-03-03 2009-11-25 普拉萨德·盖德吉尔 用于大面积多层原子层化学气相处理薄膜的装置和方法
US8043432B2 (en) * 2007-02-12 2011-10-25 Tokyo Electron Limited Atomic layer deposition systems and methods
JP2010073822A (ja) * 2008-09-17 2010-04-02 Tokyo Electron Ltd 成膜装置、成膜方法、プログラム及びコンピュータ可読記憶媒体
US20110076421A1 (en) * 2009-09-30 2011-03-31 Synos Technology, Inc. Vapor deposition reactor for forming thin film on curved surface

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5704983A (en) 1992-05-28 1998-01-06 Polar Materials Inc. Methods and apparatus for depositing barrier coatings
EP1884472A1 (en) 2005-05-27 2008-02-06 Kirin Beer Kabushiki Kaisha Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container

Also Published As

Publication number Publication date
WO2012028779A1 (en) 2012-03-08
TW201219117A (en) 2012-05-16
DE112011102856T5 (de) 2013-08-08
CN103080374B (zh) 2016-04-13
CN103080374A (zh) 2013-05-01
FI20105902A0 (sv) 2010-08-30

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Legal Events

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R012 Request for examination validly filed
R082 Change of representative

Representative=s name: TBK, DE

R081 Change of applicant/patentee

Owner name: BENEQ OY, FI

Free format text: FORMER OWNER: BENEQ GROUP OY, ESPOO, FI

Owner name: BENEQ OY, FI

Free format text: FORMER OWNER: BENEQ OY, ESPOO, FI

Owner name: BENEQ OY, FI

Free format text: FORMER OWNER: BENEQ OY, VANTAA, FI

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final