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DE112006003700A5 - Hochreflektierendes Schichtsystem, Verfahren zur Herstellung des Schichtsysteme und Einrichtung zur Durchführung des Verfahrens - Google Patents

Hochreflektierendes Schichtsystem, Verfahren zur Herstellung des Schichtsysteme und Einrichtung zur Durchführung des Verfahrens Download PDF

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Publication number
DE112006003700A5
DE112006003700A5 DE200611003700 DE112006003700T DE112006003700A5 DE 112006003700 A5 DE112006003700 A5 DE 112006003700A5 DE 200611003700 DE200611003700 DE 200611003700 DE 112006003700 T DE112006003700 T DE 112006003700T DE 112006003700 A5 DE112006003700 A5 DE 112006003700A5
Authority
DE
Germany
Prior art keywords
producing
carrying
reflection layer
layer system
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE200611003700
Other languages
English (en)
Inventor
Jörg Dr. Faber
Ekkehart Dipl.-Phys. Reinhold
Carsten Dipl.-Phys. Deus
Hans-Christian Dipl.-Phys. Hecht
David Schubert
Uwe Kralapp
Hendrik Hummel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne GmbH
Original Assignee
Von Ardenne Anlagentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne Anlagentechnik GmbH filed Critical Von Ardenne Anlagentechnik GmbH
Publication of DE112006003700A5 publication Critical patent/DE112006003700A5/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE200611003700 2006-02-21 2006-09-06 Hochreflektierendes Schichtsystem, Verfahren zur Herstellung des Schichtsysteme und Einrichtung zur Durchführung des Verfahrens Withdrawn DE112006003700A5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006008352.0 2006-02-21
DE102006008352 2006-02-21
PCT/DE2006/001561 WO2007095876A1 (de) 2006-02-21 2006-09-06 Hochreflektierendes schichtsystem, verfahren zur herstellung des schichtsystems und einrichtung zur durchführung des verfahrens

Publications (1)

Publication Number Publication Date
DE112006003700A5 true DE112006003700A5 (de) 2008-10-23

Family

ID=37493823

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200611003700 Withdrawn DE112006003700A5 (de) 2006-02-21 2006-09-06 Hochreflektierendes Schichtsystem, Verfahren zur Herstellung des Schichtsysteme und Einrichtung zur Durchführung des Verfahrens

Country Status (4)

Country Link
US (1) US20090220802A1 (de)
CN (1) CN101379218B (de)
DE (1) DE112006003700A5 (de)
WO (1) WO2007095876A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012113464A1 (de) * 2011-02-22 2012-08-30 Von Ardenne Anlagentechnik Gmbh Reflexionsschichtsystem und verfahren zu dessen herstellung
DE102011012044B4 (de) * 2011-02-22 2015-09-17 Von Ardenne Gmbh Verfahren zur Herstellung eines Reflexionsschichtsystems
FR2981646B1 (fr) * 2011-10-21 2013-10-25 Saint Gobain Vitrage de controle solaire comprenant une couche d'un alliage nicu
DE102011122329A1 (de) * 2011-12-28 2013-07-04 Qioptiq Photonics Gmbh & Co. Kg Reflektierendes optisches Bauteil
DE102012109691B4 (de) * 2012-10-11 2014-08-07 Von Ardenne Anlagentechnik Gmbh Solarabsorber-Schichtsystem mit Gradientenschicht und Verfahren zu dessen Herstellung
US9236545B2 (en) * 2013-11-18 2016-01-12 Ge Lighting Solutions Llc Hybrid metallization on plastic for a light emitting diode (LED) lighting system
US9972877B2 (en) 2014-07-14 2018-05-15 Palo Alto Research Center Incorporated Metamaterial-based phase shifting element and phased array
US10355356B2 (en) 2014-07-14 2019-07-16 Palo Alto Research Center Incorporated Metamaterial-based phase shifting element and phased array
DE102015102496B4 (de) 2014-10-27 2024-06-20 Almeco Gmbh Temperatur- und korrosionsstabiler Oberflächenreflektor
US9871298B2 (en) 2014-12-23 2018-01-16 Palo Alto Research Center Incorporated Rectifying circuit for multiband radio frequency (RF) energy harvesting
US9935370B2 (en) 2014-12-23 2018-04-03 Palo Alto Research Center Incorporated Multiband radio frequency (RF) energy harvesting with scalable antenna
US20160258596A1 (en) * 2015-03-02 2016-09-08 GE Lighting Solutions, LLC Reflector and methods of fabrication thereof
US9927188B2 (en) 2015-06-15 2018-03-27 Palo Alto Research Center Incorporated Metamaterials-enhanced passive radiative cooling panel
US10060686B2 (en) 2015-06-15 2018-08-28 Palo Alto Research Center Incorporated Passive radiative dry cooling module/system using metamaterials
DE102017110712A1 (de) 2017-05-17 2018-11-22 Alanod Gmbh & Co. Kg System zur solaren Energiegewinnung und Verwendung eines reflektierenden Basismaterials in einem derartigen System
US11262489B1 (en) * 2018-09-19 2022-03-01 United States Of America As Represented By The Administrator Of Nasa Methods for increasing IR emittance of thin film second surface mirrored thermal control coatings
CN111580305A (zh) * 2020-05-13 2020-08-25 Tcl华星光电技术有限公司 一种背光模组

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US3682528A (en) * 1970-09-10 1972-08-08 Optical Coating Laboratory Inc Infra-red interference filter
US4620081A (en) * 1984-08-03 1986-10-28 The United States Of America As Represented By The United States Department Of Energy Self-contained hot-hollow cathode gun source assembly
US4719629A (en) * 1985-10-28 1988-01-12 International Business Machines Dual fault-masking redundancy logic circuits
GB2212228B (en) * 1987-11-13 1991-08-07 Rolls Royce Plc Enhanced performance brush seals
US5361172A (en) * 1993-01-21 1994-11-01 Midwest Research Institute Durable metallized polymer mirror
US6495251B1 (en) * 1997-06-20 2002-12-17 Ppg Industries Ohio, Inc. Silicon oxynitride protective coatings
DE19949291A1 (de) * 1998-10-13 2000-05-31 Dresden Vakuumtech Gmbh Korrosionsbeständige Hartstoffbeschichtung auf Substraten sowie Verfahren und Einrichtung zur Herstellung derselben
WO2000029784A1 (de) * 1998-11-12 2000-05-25 Alusuisse Technology & Management Ag Reflektor mit resistenter oberfläche
US6078425A (en) * 1999-06-09 2000-06-20 The Regents Of The University Of California Durable silver coating for mirrors
US6936347B2 (en) * 2001-10-17 2005-08-30 Guardian Industries Corp. Coated article with high visible transmission and low emissivity
US6830817B2 (en) * 2001-12-21 2004-12-14 Guardian Industries Corp. Low-e coating with high visible transmission
TWI237128B (en) * 2003-05-15 2005-08-01 Mitsui Chemicals Inc Reflector, usage of relfector, and manufacture method of reflector
KR100527195B1 (ko) * 2003-07-25 2005-11-08 삼성에스디아이 주식회사 유기전계 발광표시장치

Also Published As

Publication number Publication date
WO2007095876A1 (de) 2007-08-30
US20090220802A1 (en) 2009-09-03
CN101379218B (zh) 2013-07-03
CN101379218A (zh) 2009-03-04

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R016 Response to examination communication
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R082 Change of representative

Representative=s name: PATENTANWAELTE LIPPERT, STACHOW & PARTNER, DE

R081 Change of applicant/patentee

Owner name: VON ARDENNE GMBH, DE

Free format text: FORMER OWNER: VON ARDENNE ANLAGENTECHNIK GMBH, 01324 DRESDEN, DE

Effective date: 20140707

R082 Change of representative

Representative=s name: LIPPERT STACHOW PATENTANWAELTE RECHTSANWAELTE , DE

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Effective date: 20140707

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee