DE112006002127A5 - Plasmaerzeugungsvorrichtung und Plasmaerzeugungsverfahren - Google Patents

Plasmaerzeugungsvorrichtung und Plasmaerzeugungsverfahren Download PDF

Info

Publication number: DE112006002127A5
Authority: DE; Germany
Prior art keywords: plasma generating; generating device; generating method; plasma; generating
Prior art date: 2005-08-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

DE112006002127T

Other languages

English (en)

Inventor

Marko Dipl.-Phys. Eichler

Michael Dr. rer. nat. Thomas

Eugen Dipl.-Ing. Schlittenhardt (FH)

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV

Original Assignee

Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-08-11

Filing date

2006-08-09

Publication date

2008-07-03

2006-08-09 Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV

2008-07-03 Publication of DE112006002127A5 publication Critical patent/DE112006002127A5/de

Status Withdrawn legal-status Critical Current

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Spectroscopy & Molecular Physics (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Cleaning In General (AREA)
Drying Of Semiconductors (AREA)
Treatment Of Fiber Materials (AREA)

DE112006002127T 2005-08-11 2006-08-09 Plasmaerzeugungsvorrichtung und Plasmaerzeugungsverfahren Withdrawn DE112006002127A5 (de)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
DE102005038079.4		2005-08-11
DE102005038079		2005-08-11
PCT/EP2006/007889 WO2007017271A2 (de)	2005-08-11	2006-08-09	Plasmaerzeugungsvorrichtung und plasmaerzeugungsverfahren

Publications (1)

Publication Number	Publication Date
DE112006002127A5 true DE112006002127A5 (de)	2008-07-03

Family

ID=37177780

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE112006002127T Withdrawn DE112006002127A5 (de)	2005-08-11	2006-08-09	Plasmaerzeugungsvorrichtung und Plasmaerzeugungsverfahren

Country Status (4)

Country	Link
US (1)	US20090152097A1 (de)
JP (1)	JP2009505342A (de)
DE (1)	DE112006002127A5 (de)
WO (1)	WO2007017271A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20100193129A1 (en) *	2007-08-31	2010-08-05	Yoichiro Tabata	Apparatus for generating dielectric barrier discharge gas

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE102008024486B4 (de) *	2008-05-21	2011-12-15	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Plasmastempel, Plasmabehandlungsvorrichtung, Verfahren zur Plasmabehandlung und Herstellungsverfahren für einen Plasmastempel
DE102009006484A1 (de)	2009-01-28	2010-07-29	Ahlbrandt System Gmbh	Vorrichtung zum Modifizieren der Oberflächen von Bahn-, Platten- und Bogenware mit einer Einrichtung zur Erzeugung eines Plasmas
WO2011110191A1 (en) *	2010-03-10	2011-09-15	Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V.	Method and arrangement for treating an object with a low- temperature plasma
CN102519917B (zh) *	2011-12-13	2014-03-12	清华大学	一种基于介质阻挡放电的固体样品剥蚀方法及装置
JP5911178B2 (ja) *	2013-05-07	2016-04-27	株式会社イー・スクエア	プラズマ表面処理装置
EP3214906B1 (de) *	2014-10-29	2020-12-09	Toshiba Mitsubishi-Electric Industrial Systems Corporation	Generator für elektrische entladungen
CN104936371B (zh) *	2015-06-09	2017-07-07	北京三十四科技有限公司	一种空心电极介质阻挡结构

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4486286A (en) *	1982-09-28	1984-12-04	Nerken Research Corp.	Method of depositing a carbon film on a substrate and products obtained thereby
JPH0521393A (ja) *	1991-07-11	1993-01-29	Sony Corp	プラズマ処理装置
DE4332866C2 (de) *	1993-09-27	1997-12-18	Fraunhofer Ges Forschung	Direkte Oberflächenbehandlung mit Barrierenentladung
DE19532412C2 (de) *	1995-09-01	1999-09-30	Agrodyn Hochspannungstechnik G	Vorrichtung zur Oberflächen-Vorbehandlung von Werkstücken
US6083363A (en) *	1997-07-02	2000-07-04	Tokyo Electron Limited	Apparatus and method for uniform, low-damage anisotropic plasma processing
WO2003005397A2 (en) *	2001-07-02	2003-01-16	Plasmasol Corporation	A novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same
KR100476136B1 (ko) *	2002-12-02	2005-03-10	주식회사 셈테크놀러지	대기압 플라즈마를 이용한 표면처리장치
US20050011447A1 (en) *	2003-07-14	2005-01-20	Tokyo Electron Limited	Method and apparatus for delivering process gas to a process chamber

2006
- 2006-08-09 JP JP2008525480A patent/JP2009505342A/ja active Pending
- 2006-08-09 DE DE112006002127T patent/DE112006002127A5/de not_active Withdrawn
- 2006-08-09 US US12/063,328 patent/US20090152097A1/en not_active Abandoned
- 2006-08-09 WO PCT/EP2006/007889 patent/WO2007017271A2/de not_active Ceased

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20100193129A1 (en) *	2007-08-31	2010-08-05	Yoichiro Tabata	Apparatus for generating dielectric barrier discharge gas
US8857371B2 (en) *	2007-08-31	2014-10-14	Toshiba Mitsubishi-Electric Industrial Systems Corporation	Apparatus for generating dielectric barrier discharge gas

Also Published As

Publication number	Publication date
WO2007017271A3 (de)	2007-04-12
JP2009505342A (ja)	2009-02-05
US20090152097A1 (en)	2009-06-18
WO2007017271A2 (de)	2007-02-15

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Legal Events

Date	Code	Title	Description
2008-07-03	OP8	Request for examination as to paragraph 44 patent law
2012-03-13	R016	Response to examination communication
2014-06-05	R119	Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee	Effective date: 20140301