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DE10343720A1 - polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface - Google Patents

polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface Download PDF

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Publication number
DE10343720A1
DE10343720A1 DE2003143720 DE10343720A DE10343720A1 DE 10343720 A1 DE10343720 A1 DE 10343720A1 DE 2003143720 DE2003143720 DE 2003143720 DE 10343720 A DE10343720 A DE 10343720A DE 10343720 A1 DE10343720 A1 DE 10343720A1
Authority
DE
Germany
Prior art keywords
beam splitter
polarization beam
transparent material
mesh
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE2003143720
Other languages
German (de)
Inventor
Matthias Burkhardt
Michael Helgert
Oliver Sandfuchs
Robert Brunner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Carl Zeiss Jena GmbH
Original Assignee
VEB Carl Zeiss Jena GmbH
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VEB Carl Zeiss Jena GmbH, Carl Zeiss Jena GmbH filed Critical VEB Carl Zeiss Jena GmbH
Priority to DE2003143720 priority Critical patent/DE10343720A1/en
Publication of DE10343720A1 publication Critical patent/DE10343720A1/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3008—Polarising elements comprising dielectric particles, e.g. birefringent crystals embedded in a matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Polarising Elements (AREA)

Abstract

A polarization beam splitter based on a high frequency mesh, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface. The mesh consists of raised sections which have a different mesh period in each direction, a metal layer and a dielectric material layer.
DE2003143720 2003-09-12 2003-09-12 polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface Ceased DE10343720A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE2003143720 DE10343720A1 (en) 2003-09-12 2003-09-12 polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2003143720 DE10343720A1 (en) 2003-09-12 2003-09-12 polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface

Publications (1)

Publication Number Publication Date
DE10343720A1 true DE10343720A1 (en) 2005-04-28

Family

ID=34398833

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2003143720 Ceased DE10343720A1 (en) 2003-09-12 2003-09-12 polarization beam splitter, comprises a dielectric transparent material substrate and an optical mesh on the substrate surface

Country Status (1)

Country Link
DE (1) DE10343720A1 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0322714A2 (en) * 1987-12-24 1989-07-05 Kuraray Co., Ltd. Polarizing optical element and device using the same
DE3831503A1 (en) * 1988-09-16 1990-03-22 Ver Glaswerke Gmbh Transparent reflection-reducing covering layer for transparent glass or plastic substrates
JPH08304615A (en) * 1995-05-02 1996-11-22 Fuji Photo Optical Co Ltd Diffraction grating for optical pickup and its shape determining method and shape determining system
EP0959051A1 (en) * 1996-08-13 1999-11-24 Nippon Sheet Glass Co., Ltd. Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
US6181458B1 (en) * 1998-12-18 2001-01-30 Eastman Kodak Company Mechanical grating device with optical coating and method of making mechanical grating device with optical coating
DE69619691T2 (en) * 1995-12-06 2002-08-22 De La Rue International Ltd., Basingstoke METHOD FOR PRODUCING A BREAKING STRUCTURE
WO2003069381A2 (en) * 2002-02-12 2003-08-21 Unaxis Balzers Limited Optical component comprising submicron hollow spaces
EP1369714A1 (en) * 2002-06-04 2003-12-10 Canon Kabushiki Kaisha Polarizing optical component and method of manufacturing same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0322714A2 (en) * 1987-12-24 1989-07-05 Kuraray Co., Ltd. Polarizing optical element and device using the same
DE3831503A1 (en) * 1988-09-16 1990-03-22 Ver Glaswerke Gmbh Transparent reflection-reducing covering layer for transparent glass or plastic substrates
JPH08304615A (en) * 1995-05-02 1996-11-22 Fuji Photo Optical Co Ltd Diffraction grating for optical pickup and its shape determining method and shape determining system
DE69619691T2 (en) * 1995-12-06 2002-08-22 De La Rue International Ltd., Basingstoke METHOD FOR PRODUCING A BREAKING STRUCTURE
EP0959051A1 (en) * 1996-08-13 1999-11-24 Nippon Sheet Glass Co., Ltd. Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
US6181458B1 (en) * 1998-12-18 2001-01-30 Eastman Kodak Company Mechanical grating device with optical coating and method of making mechanical grating device with optical coating
WO2003069381A2 (en) * 2002-02-12 2003-08-21 Unaxis Balzers Limited Optical component comprising submicron hollow spaces
EP1369714A1 (en) * 2002-06-04 2003-12-10 Canon Kabushiki Kaisha Polarizing optical component and method of manufacturing same

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
8110 Request for examination paragraph 44
R016 Response to examination communication
R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final

Effective date: 20140213