DE10216092A1 - Composite material used for envelope for HID lamps comprises a substrate material in the form of quartz and a barrier coating applied on one side of the substrate material using impulse-CVD - Google Patents
Composite material used for envelope for HID lamps comprises a substrate material in the form of quartz and a barrier coating applied on one side of the substrate material using impulse-CVDInfo
- Publication number
- DE10216092A1 DE10216092A1 DE2002116092 DE10216092A DE10216092A1 DE 10216092 A1 DE10216092 A1 DE 10216092A1 DE 2002116092 DE2002116092 DE 2002116092 DE 10216092 A DE10216092 A DE 10216092A DE 10216092 A1 DE10216092 A1 DE 10216092A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate material
- coating
- barrier coating
- composite material
- hollow body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Die Erfindung betrifft ein Verbundmaterial aus einem Substratmaterial und wenigstens einer auf einer Seite des Substratmaterials aufgebrachten Barrierebeschichtung sowie ein Verfahren zum Herstellen eines Verbundmaterials, umfassend ein Substratmaterial und wenigstens eine Barrierebeschichtung. The invention relates to a composite material made of a substrate material and at least one applied to one side of the substrate material Barrier coating and a method for producing a Composite material comprising a substrate material and at least one Barrier coating.
Brenner für HID-Lampen bestehen gemäß bekannten Ausführungen entweder aus Quarz- oder Keramikmaterial. Ein wesentliches Problem besteht dabei darin, daß bei Ausführungen in Quarz im Betrieb eine Farbtemperaturverschiebung zu beobachten ist. Dies kann auf den auftretenden Na-Mangel in der Brennerfüllung zurückgeführt werden, da Natrium als Bestandteil der Brennerfüllung im Betrieb der HID-Lampen in das Quarzmaterial eindiffundiert und somit der Brenneratmosphäre entzogen wird. Es ist daher vorteilhaft, derartige Substratmaterialien mit einer Barrierebeschichtung zu versehen. Geeignete Barriere-Schichten verhindern auch Halogen-Angriffe auf das Brennermaterial. Dabei ist jedoch zu beachten, daß es sich bei diesem Produkt um ein Massenprodukt handelt, wobei die Skalierung von Batchprozessen für Massenfertigung mit wechselndem Durchsatz in der Regel problematisch ist. Alle PVD-Verfahren für eine Innenbeschichtung, wie sie bei einem derartigen Quarzkolben erforderlich wären, sind ungeeignet, da es sich um projektive Verfahren handelt. Burners for HID lamps exist according to known designs either made of quartz or ceramic material. An essential problem consists in the fact that a version of quartz in operation Color temperature shift can be observed. This can be due to the occurring Na deficiency in the burner filling can be attributed, because Sodium as part of the burner filling in the operation of the HID lamps in the Quartz material diffused in and thus removed from the burner atmosphere becomes. It is therefore advantageous to use such substrate materials with a To provide barrier coating. Prevent suitable barrier layers also halogen attacks on the burner material. However, this is too note that this product is a mass product, whereby the scaling of batch processes for mass production with changing throughput is usually problematic. All PVD processes for an inner coating, as is the case with such a quartz piston would be unsuitable as these are projective procedures is.
Der Erfindung lag daher die Aufgabe zugrunde, ein Verbundmaterial sowie ein Verfahren zur Herstellung eines derartigen Verbundmaterials zu schaffen, das sich durch eine verbesserte Barrierewirkung gegenüber der Diffusion von Natrium in das Kolbenmaterial auszeichnet, wobei das Barrieresystem pinholefrei und des weiteren inert gegenüber der Plasmachemie über die Lebensdauer eines HID-Brenners mit Arbeitstemperaturen zwischen ca. 800°C und 1000°C bei Einsatz in diesem ist. Das entwickelte Verfahren soll sich dabei für die Massenfertigung eignen. The invention was therefore based on the object of a composite material as well to provide a method for producing such a composite material, which is characterized by an improved barrier effect against the diffusion of Sodium in the piston material is characterized by the barrier system free of pinholes and further inert to plasma chemistry via the Lifetime of a HID burner with working temperatures between approx. 800 ° C and 1000 ° C when used in this. The developed process should are suitable for mass production.
Erfindungsgemäß wird die Aufgabe durch ein Verbundmaterial gemäß Anspruch 1 sowie ein Verfahren gemäß Anspruch 5 gelöst. Die Erfinder haben herausgefunden, daß durch den Einsatz eines Plasma-unterstützten CVD-Verfahrens, eines sogenannten PICVD-Verfahrens, die erforderliche gute Haftung erreicht wird, ebenso eine hervorragende Barrierewirkung gegen Stoffe aus der Lampenatmosphäre sowie Stoffen, die in Kontakt mit der Oberfläche des Verbundmaterials stehen können, insbesondere gegenüber Na. Insbesondere ermöglicht das PICVD-Verfahren eine Hochtemperatur (HT)-Abscheidung und damit die Erzeugung von α = Al2O3. Mit Hilfe der PICVD-Verfahren können des weiteren auch sehr dünne Schichten auf ein Substratmaterial aufgebracht werden, die Barriereeigenschaften aufweisen. Hierdurch ist eine erhebliche Materialersparnis möglich. Des weiteren zeichnen sich derartige Schichten durch eine hohe Flexibilität aus. According to the invention the object is achieved by a composite material according to claim 1 and a method according to claim 5. The inventors have found that by using a plasma-assisted CVD process, a so-called PICVD process, the required good adhesion is achieved, as well as an excellent barrier effect against substances from the lamp atmosphere and substances that come into contact with the surface of the composite material can stand, especially towards Na. In particular, the PICVD process enables high temperature (HT) deposition and thus the generation of α = Al 2 O 3 . The PICVD method can also be used to apply very thin layers to a substrate material that have barrier properties. This enables considerable material savings. Furthermore, such layers are characterized by a high degree of flexibility.
Die Verwendung eines PICVD-Verfahrens ermöglicht auch den Einsatz auf Mehrplatzanlagen, was insbesondere in einem hohen Durchsatz resultiert. The use of a PICVD method also enables use on Multi-user systems, which in particular results in high throughput.
Gemäß der Erfindung umfaßt die Barrierebeschichtung wenigstens AlxOy mit xε[2], yε[3]. According to the invention, the barrier coating comprises at least Al x O y with xε [2], yε [3].
In einer bevorzugten Ausführungsform weist die Barrierebeschichtung eine Dicke 50-200 nm, bevorzugt 180 nm auf. Derartige Barriereschichten weisen neben guten Barriereeigenschaften auch eine hohe Flexibilität auf. Des weiteren können bei derartig dünnen Schichten insbesondere auch intrinsische Spannungen, die zu einem Abplatzen der Barriereschicht führen können, vermieden werden. In a preferred embodiment, the barrier coating has a Thickness 50-200 nm, preferably 180 nm. Such barrier layers not only have good barrier properties but also a high degree of flexibility. Furthermore, such thin layers can also in particular intrinsic tensions that cause the barrier layer to flake off can be avoided.
Neben dem Verbundmaterial stellt die Erfindung auch ein Verfahren zum Herstellen eines derartigen Verbundmaterials zur Verfügung, das sich dadurch auszeichnet, daß in einem Beschichtungsreaktor mittels eines Mikrowellen-Pulses ein Plasma erzeugt wird, wodurch in den Reaktor eingeleitete Precursor-Gase mit der Gasatmosphäre im Beschichtungsreaktor reagieren und auf dem Substratmaterial einer Barrierebeschichtung abgeschieden werden. Eine Barriereschicht ergibt sich bei Verwendung von AlCl3 als Precursor-Material in einer Atmosphäre aus O2. In addition to the composite material, the invention also provides a method for producing such a composite material, which is characterized in that a plasma is generated in a coating reactor by means of a microwave pulse, as a result of which precursor gases introduced into the reactor react with the gas atmosphere in the coating reactor and deposited on the substrate material of a barrier coating. A barrier layer results when AlCl 3 is used as a precursor material in an atmosphere of O 2 .
Die Barriereeigenschaften werden spektroskopisch bestimmt, z. B. über den zeitlichen Verlauf der Selbstabsoption von Emmissionslinien. The barrier properties are determined spectroscopically, e.g. B. about the temporal course of self-absorption of emission lines.
Die Erfindung soll nachfolgend anhand der Ausführungsbeispiele und der Figuren näher erläutert werden. The invention is intended to be described in the following using the exemplary embodiments and Figures are explained in more detail.
Es zeigt: It shows:
Fig. 1 einen PICVD-Beschichtungsplatz für einen Hohlkörper Fig. 1 shows a PICVD coating station for a hollow body
Nachfolgend soll ein Ausführungsbeispiel der Erfindung gegeben werden, wobei Quarzglas als Substratmaterial in Form eines Hohlkörpers gewählt wurde, der als Kolben für HID-Lampen Verwendung findet. Der Hohlkörper wurde mit einer Na-Barriereschicht, umfassend Al2O3 gemäß der Erfindung versehen. Die Kolben werden beispielsweise auf einem PICVD- Beschichtungsplatz für Glasflaschen, wie beispielsweise in der US 5736207 beschrieben, deren Offenbarungsgehalt in vorliegender Anmeldung mitaufgenommen wird, beschichtet. Eine Ausführungsform eines derartigen Beschichtungsplatzes für 3D-Körper ist in Fig. 1 gezeigt. Der Beschichtungsplatz gemäß Fig. 1 umfaßt eine Vakuumapparatur 1, einen Gaserzeuger 3 sowie einem Mikrowellenerzeuger 5 zur Erzeugung von Mikrowellen-Pulsen, die wiederum im Beschichtungsreaktor, der vorliegend von dem zu beschichtenden 3D-Hohlkörper 7 in Form des Quarzkolbens ausgebildet wird, für eine vorbestimmte Zeit ein Plasma erzeugen. Des weiteren umfaßt der Beschichtungsplatz eine Aufnahmevorrichtung 9 zur Halterung der innen zu beschichtenden 3D-Hohlkörper 7. Die 3D-Hohlkörper 7 werden innen evakuiert. Um mechanische Belastungen während der Beschichtung zu vermeiden, besteht auch die Möglichkeit, den Raum außerhalb des zu beschichtenden Hohlkörpers zu evakuieren. Hierfür ist um den 3D-Hohlkörper 7 ein evakuierbarer Rezipient 11 angeordnet. Ein derartiger Aufbau gibt die Möglichkeit, alternativ oder gleichzeitig zur Innenbeschichtung eine zusätzliche Außenbeschichtung durchzuführen. An exemplary embodiment of the invention is to be given below, quartz glass being chosen as the substrate material in the form of a hollow body which is used as a bulb for HID lamps. The hollow body was provided with a Na barrier layer comprising Al 2 O 3 according to the invention. The flasks are coated, for example, on a PICVD coating station for glass bottles, as described, for example, in US 5736207, the disclosure content of which is included in the present application. An embodiment of such a coating station for 3D bodies is shown in FIG. 1. The coating station of FIG. 1 comprises a vacuum apparatus 1, a gas generator 3, and a microwave generator 5 for generating microwave pulses, which in turn predetermined in the coating reactor, which is formed in the present case by the to be coated 3D hollow body 7 in the form of the quartz envelope, for a Time generating a plasma. Furthermore, the coating station comprises a holding device 9 for holding the 3D hollow bodies 7 to be coated on the inside. The 3D hollow bodies 7 are evacuated on the inside. In order to avoid mechanical loads during the coating, it is also possible to evacuate the space outside the hollow body to be coated. For this purpose, an evacuable recipient 11 is arranged around the 3D hollow body 7 . Such a structure gives the possibility of carrying out an additional outer coating alternatively or simultaneously with the inner coating.
Die Evakuiertang von 3D-Hohlkörper bzw. Rezipient geschieht mit Vakuumpumpeinrichtungen gemäß dem Stand der Technik. Die Evakuierung des 3D- Hohlkörpers wird über Vakuumleitung 13 vorgenommen, die des Rezipienten 11 über Vakuumleitung 15. Um den Rezipienten 11 optional zusätzlich zum Innenraum des 3D-Hohlkörpers evakuieren zu können, ist ein Ventil 17 vorgesehen. Wie zuvor erwähnt bildet in vorliegendem Ausführungsbeispiel die Innenwand 19 des 3D-Hohlkörpers 7 selbst die eigentliche Beschichtungskammer. Anschließend an die Evakuierung des Inneren des 3D-Hohlkörpers 7 wird das Innere des Hohlkörpers über Zuleitung 21 mit einem Precursor-Gas, beispielsweise mit einem Gemisch AlCl3 sowie Sauerstoff gefüllt. Der Druck im Beschichtungsreaktor liegt nach Befüllung zwischen einschließlich 0,1-0,5 mbar. Nach der Evakuierung wird Mikrowellenleistung in den zu beschichtenden 3D-Hohlkörper 7 eingekoppelt. Das Einkoppeln der Mikrowellenleistung vom Mikrowellenerzeuger 5, der beispielsweise ein Magnetron sein kann, in den Rezipienten bzw. 3D- Hohlkörper wird über ein oberhalb des 3D-Hohlkörpers 7 angeordnetes dielektrisches Fenster 27 vorgenommen. Andere Arten der Einkopplung, beispielsweise über Antennen, wären möglich. Mit Hilfe der zugeführten Mikrowellenleistung, die bevorzugt zeitmoduliert ist, wird ein gepulstes Plasma innerhalb des Hohlkörpers erzeugt. Typische Pulsdauern liegen zwischen einschließlich 0,1-2,0 ms, die Pulspause im Bereich von einschließlich 5-100 ms. Die Beschichtung im Pulsmodus führt zu hohen Plasmadichten, hohen Abscheideraten mit vollständiger Materialumsetzung und hochdichten Schichten. Des weiteren kann innerhalb der Pulspausen ein vollständiger Gasaustausch durchgeführt werden, so daß zu Beginn des nächsten Mikrowellenpulses stets eine ideale Gaszusammensetzung vorliegt. The 3D hollow body or recipient is evacuated using vacuum pump devices according to the prior art. The 3D hollow body is evacuated via vacuum line 13 , that of the recipient 11 via vacuum line 15 . In order to be able to optionally evacuate the recipient 11 in addition to the interior of the 3D hollow body, a valve 17 is provided. As mentioned above, in the present exemplary embodiment the inner wall 19 of the 3D hollow body 7 itself forms the actual coating chamber. Following the evacuation of the interior of the 3D hollow body 7 , the interior of the hollow body is filled via feed line 21 with a precursor gas, for example with a mixture of AlCl 3 and oxygen. The pressure in the coating reactor after filling is between 0.1-0.5 mbar. After the evacuation, microwave power is coupled into the 3D hollow body 7 to be coated. The coupling of the microwave power from the microwave generator 5 , which can be a magnetron, for example, into the recipient or 3D hollow body is carried out via a dielectric window 27 arranged above the 3D hollow body 7 . Other types of coupling, for example via antennas, would be possible. With the aid of the microwave power supplied, which is preferably time-modulated, a pulsed plasma is generated within the hollow body. Typical pulse durations are between 0.1-2.0 ms inclusive, the pulse pause in the range of 5-100 ms inclusive. Coating in pulse mode leads to high plasma densities, high deposition rates with complete material conversion and high-density layers. Furthermore, a complete gas exchange can be carried out within the pulse pauses, so that an ideal gas composition is always present at the beginning of the next microwave pulse.
Durch die Erfindung wird erstmals ein Verbundmaterial mit verbesserten Barriereeigenschaften sowie ein Herstellverfahren für ein derartiges Material zur Verfügung gestellt. The invention is the first time a composite material with improved Barrier properties and a manufacturing process for such a material made available.
Claims (13)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2002116092 DE10216092A1 (en) | 2002-04-11 | 2002-04-11 | Composite material used for envelope for HID lamps comprises a substrate material in the form of quartz and a barrier coating applied on one side of the substrate material using impulse-CVD |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2002116092 DE10216092A1 (en) | 2002-04-11 | 2002-04-11 | Composite material used for envelope for HID lamps comprises a substrate material in the form of quartz and a barrier coating applied on one side of the substrate material using impulse-CVD |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10216092A1 true DE10216092A1 (en) | 2003-10-30 |
Family
ID=28684961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2002116092 Withdrawn DE10216092A1 (en) | 2002-04-11 | 2002-04-11 | Composite material used for envelope for HID lamps comprises a substrate material in the form of quartz and a barrier coating applied on one side of the substrate material using impulse-CVD |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE10216092A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004061632B4 (en) * | 2004-12-17 | 2009-06-18 | Auer Lighting Gmbh | Internal coating of discharge vessels, quartz glass discharge vessels and their use |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2023772B2 (en) * | 1969-05-19 | 1974-01-17 | General Electric Co., Schenectady, N.Y. (V.St.A.) | Metal halide discharge lamp |
| DE2524410B2 (en) * | 1974-06-05 | 1978-01-12 | General Electric Co, Schenectady, NY (VStA) | GLASS-LIKE SILICON DIOXIDE WITH A BARRIER ZONE MADE OF ALUMINUM OXIDE AND ITS USE |
| DE3830249C2 (en) * | 1988-09-06 | 1990-07-12 | Schott Glaswerke, 6500 Mainz, De | |
| DE4115437A1 (en) * | 1990-05-09 | 1991-11-14 | Mitsubishi Electric Corp | PROJECTION CATHODE RAY TUBES |
| DE4208376A1 (en) * | 1992-03-16 | 1993-09-23 | Asea Brown Boveri | High performance irradiator esp. for ultraviolet light - comprising discharge chamber, filled with filling gas, with dielectrics on its walls to protect against corrosion and erosion |
| US5736207A (en) * | 1994-10-27 | 1998-04-07 | Schott Glaswerke | Vessel of plastic having a barrier coating and a method of producing the vessel |
| DE19801861C2 (en) * | 1998-01-20 | 2001-10-18 | Schott Glas | Process for producing a hollow, internally coated molded glass body |
| EP0806054B1 (en) * | 1995-09-15 | 2002-03-27 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Low pressure, high intensity electrodeless light source or electric lamp and method for operating the same |
-
2002
- 2002-04-11 DE DE2002116092 patent/DE10216092A1/en not_active Withdrawn
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2023772B2 (en) * | 1969-05-19 | 1974-01-17 | General Electric Co., Schenectady, N.Y. (V.St.A.) | Metal halide discharge lamp |
| DE2524410B2 (en) * | 1974-06-05 | 1978-01-12 | General Electric Co, Schenectady, NY (VStA) | GLASS-LIKE SILICON DIOXIDE WITH A BARRIER ZONE MADE OF ALUMINUM OXIDE AND ITS USE |
| DE3830249C2 (en) * | 1988-09-06 | 1990-07-12 | Schott Glaswerke, 6500 Mainz, De | |
| DE4115437A1 (en) * | 1990-05-09 | 1991-11-14 | Mitsubishi Electric Corp | PROJECTION CATHODE RAY TUBES |
| DE4208376A1 (en) * | 1992-03-16 | 1993-09-23 | Asea Brown Boveri | High performance irradiator esp. for ultraviolet light - comprising discharge chamber, filled with filling gas, with dielectrics on its walls to protect against corrosion and erosion |
| US5736207A (en) * | 1994-10-27 | 1998-04-07 | Schott Glaswerke | Vessel of plastic having a barrier coating and a method of producing the vessel |
| DE4438359C2 (en) * | 1994-10-27 | 2001-10-04 | Schott Glas | Plastic container with a barrier coating |
| EP0806054B1 (en) * | 1995-09-15 | 2002-03-27 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Low pressure, high intensity electrodeless light source or electric lamp and method for operating the same |
| DE19801861C2 (en) * | 1998-01-20 | 2001-10-18 | Schott Glas | Process for producing a hollow, internally coated molded glass body |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004061632B4 (en) * | 2004-12-17 | 2009-06-18 | Auer Lighting Gmbh | Internal coating of discharge vessels, quartz glass discharge vessels and their use |
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