DE102023212263A1 - Cooling device for cooling a position-sensitive component of a lithography system, lithography system and method for producing a cooling device - Google Patents

Abstract

Cooling device (100) for cooling a position-sensitive component (102) of a lithography system (1), comprising a liquid line (104) for transporting a cooling liquid (106) to the position-sensitive component (102), wherein the liquid line (104) has at least one multi-pipe section (118) in which a pipe (120) of the liquid line (104), viewed in cross section, is segmented by one or more partition walls (122) into a plurality of individual pipes (124), and the multi-pipe section (118) has an elastic material (126) for damping pressure fluctuations of the cooling liquid (106).

Description

The present invention relates to a cooling device for cooling a position-sensitive component of a lithography system, a corresponding lithography system and a method for producing a cooling device of a lithography system.

Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system equipped with an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate, such as a silicon wafer, coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system in order to transfer the mask structure to the light-sensitive coating of the substrate.

Driven by the pursuit of ever smaller structures in the production of integrated circuits, EUV lithography systems are currently being developed that use light with a wavelength in the range of 0.1 nm to 30 nm, particularly 13.5 nm. Since most materials absorb light at this wavelength, such EUV lithography systems must use reflective optics, i.e., mirrors, instead of the previously used refractive optics, i.e., lenses.

The demands on the accuracy and precision of the imaging properties of lithography systems are constantly increasing. From a dynamic perspective, it is therefore important to minimize the influence of disturbances on the movement of various position-sensitive components of the lithography system. For example, very precise positioning of optical components, especially mirrors, of the lithography system is required. Dynamic disturbances in optical components can be generated, for example, by the movement of other components of the lithography system or by acoustic disturbances. Acoustic disturbances can be transmitted to cooled, position-sensitive components of the lithography system as pressure fluctuations in a coolant in the cooling lines of a cooling device of the lithography system. Pressure fluctuations in the coolant are generated, for example, by flow-induced vibrations (FIV).

As the complexity of lithography systems continues to increase, further dynamic disturbances inside and outside the system are to be expected, so that additional mechanisms for their suppression or compensation are desirable and necessary.

Against this background, it is an object of the present invention to provide an improved cooling device for cooling a position-sensitive component of a lithography system and an improved method for producing a cooling device.

According to a first aspect, a cooling device for cooling a position-sensitive component of a lithography system is proposed. The cooling device comprises a liquid line for transporting a cooling liquid to the position-sensitive component. The liquid line comprises at least one multi-pipe section in which a pipe of the liquid line, viewed in cross section, is segmented into a plurality of individual pipes by one or more partition walls. Furthermore, the multi-pipe section comprises an elastic material for damping pressure fluctuations of the cooling liquid.

The multi-pipe section acts as a flow straightener. In particular, the multi-pipe section can be used to convert turbulent flow into laminar flow and locally achieve highly laminar flow. Turbulent flow can be caused, for example, by a source of flow-induced vibrations (FIV source). By arranging the multi-pipe section downstream of, for example, an FIV source, turbulence caused by the FIV source can be smoothed.

In addition, the elastic material of the multi-pipe section can also dampen pressure fluctuations in the coolant. Pressure fluctuations in the coolant can be caused, for example, by vibrations in a supporting structure of the fluid line. Furthermore, turbulence caused by FIV sources can generate pressure fluctuations in the coolant. Pressure fluctuations in the coolant (i.e., fluid-borne noise) cause the elastic material to deform elastically (e.g., compress and/or stretch), thereby dampening the pressure fluctuations.

For example, the elastic material can dampen pressure fluctuations in the coolant in such a way that the transmission of acoustic disturbances in the case of resonance enhancement (e.g., standing waves or structural resonances) is significantly reduced. For example, a high, narrow-band peak in the frequency spectrum of the pressure fluctuations can be dampened by the elastic material. material into a lower, broadband plateau.

The elastic material is, in particular, (reversibly) deformable. The elastic material comprises, for example, a polymer, e.g., a highly damped polymer, polytetrafluoroethylene (PTFE), polyurethane (PUR), fluororubber (FKM), and/or perfluororubber (FFKM).

The multi-pipe section comprises, in particular, a plurality of individual pipes arranged parallel to one another. The plurality of individual pipes can all have the same cross-sectional shape and/or cross-sectional size. However, the plurality of individual pipes can also have different cross-sectional shapes and/or cross-sectional sizes. A cross-sectional shape of one, several, or all of the individual pipes has, for example, a round, circular, oval, triangular, square, pentagonal, hexagonal, octagonal, and/or polygonal shape.

The multi-pipe section is, for example, an insert that—as seen in the cross-section of the pipe—is inserted into the pipe of the liquid line. However, the multi-pipe section can also be a pipe section that replaces a pipe section of the liquid line with respect to a flow direction of the cooling liquid and/or with respect to a longitudinal direction of the liquid line.

The liquid line is configured, for example, to transport the cooling liquid to and from the position-sensitive component.

The position-sensitive component of the lithography system can be an optical or mechanical component of the lithography system, e.g., a projection optics of the lithography system. The position-sensitive component is, in particular, a component that must be held in a precise position with only small tolerances during operation of the lithography system.

The position-sensitive component of the lithography system is, for example, a mirror of the lithography system, e.g., a mirror of the projection optics of the lithography system. The mirrors of the projection optics of an EUV lithography system are typically movably mounted on a support frame by means of actuators to enable the precise adjustment of the position of the respective mirror.

The position-sensitive component of the lithography system can also be a frame structure that serves as a (e.g., optical) reference. The position-sensitive component can, for example, be a sensor frame of the lithography system, e.g., the projection optics of the lithography system. A sensor frame typically has a sensor device for measuring a current position of one or more optical components of the lithography system relative to the sensor frame. The sensor frame is mounted, for example, in a vibration-decoupled manner with respect to a support frame of the optical component(s). The sensor device comprises, for example, one or more sensors, such as interferometers and/or other measuring devices for detecting a position of the optical component(s). The optical component(s) can, for example, have reflector elements for reflecting light emitted by the sensors (e.g., laser light). For example, the one or more sensors serve to detect a position of the optical component(s) in six degrees of freedom. The six degrees of freedom include, in particular, three translational degrees of freedom (e.g. in three mutually perpendicular spatial directions) and three rotational degrees of freedom (e.g. with respect to a rotation around the three mutually perpendicular spatial directions).

The proposed cooling device with the multi-tube section made of elastic material can reduce the occurrence of pressure fluctuations in the coolant (individual tubes, flow straighteners) and dampen any resulting pressure fluctuations (elastic material). This reduces or prevents the transmission of pressure fluctuations to the position-sensitive component via the coolant. Consequently, greater precession of the position and thus of the optical properties or reference properties of the position-sensitive component can be achieved. Consequently, the imaging properties of the lithography system can be improved. Furthermore, interference excitations can be better compensated, even in increasingly complex lithography systems with a growing number of interference sources.

The lithography system is, for example, an EUV or DUV lithography system. EUV stands for "extreme ultraviolet" (EUV) and refers to a wavelength of the working light in the range of 0.1 nm to 30 nm, specifically 13.5 nm. Furthermore, DUV stands for "deep ultraviolet" (DUV) and refers to a wavelength of the working light between 30 nm and 250 nm.

The EUV or DUV lithography system comprises an illumination system and a projection system. In particular, the EUV or DUV lithography system projects the image of a mask (reticle) illuminated by the illumination system onto a substrate coated with a light-sensitive layer (photoresist) by means of the projection system. and a substrate arranged in the image plane of the projection system, for example a silicon wafer, is projected in order to transfer the mask structure onto the light-sensitive coating of the substrate.

The liquid line (e.g. cooling line) is, for example, a pipe for conducting the cooling liquid. The liquid line comprises, for example, a metal pipe and/or a stainless steel pipe. The liquid line can, for example, have a circular cross-section or a differently shaped cross-section. The cooling liquid is or comprises, for example, water. The liquid line serves, for example, to transport the cooling liquid to and/or from the position-sensitive component. The liquid line serves, for example, to transport the cooling liquid from a cooling unit of the cooling device to the position-sensitive component and/or from the position-sensitive component (back) to the cooling unit. The cooling device can also have more than one liquid line.

The cooling device is used in particular to avoid high temperatures and temperature fluctuations of the position-sensitive component.

In particular, mirrors in an EUV lithography system (as an example of position-sensitive components) heat up due to the absorption of high-energy EUV radiation. The resulting high temperatures and temperature fluctuations in the mirror, and the associated thermal deformation of the mirror, can lead to wavefront aberrations and thus impair the imaging properties of the mirrors. To prevent thermally induced deformations, the mirrors of the lithography system can be actively cooled using the cooling device.

The cooling device can also be used (in addition to or instead of) cooling, for example, a sensor frame (as an example of a position-sensitive component). This can prevent the sensor frame from heating up due to thermal radiation. Thermal radiation is caused in particular by working light of the lithography system absorbed by mirror surfaces or structural elements. Other heat sources can be, for example, actuators and heating heads. With the help of the cooling device, a stable temperature environment can be created for the sensor frame. This allows a position measurement of the mirror or the multiple mirrors to be carried out with greater accuracy using the sensor device held by the sensor frame.

The cooling device further comprises, for example, a cooling unit for cooling the cooling liquid, one or more pumps for generating a required coolant flow rate of the cooling liquid and one or more valves for controlling the cooling flow.

Cooling requires a specific coolant flow rate, which is achieved via a pump system. This results in dynamic disturbances, as each pump generates turbulence and thus local pressure fluctuations. These are transmitted through the entire cooling circuit via coolant sound (e.g., water sound, longitudinal water sound wave). Furthermore, every change in cross-section and every deflection of the liquid line, as well as every installed valve in the cooling circuit, can represent a source of disturbance that causes turbulence and thus local pressure fluctuations in the liquid. This type of dynamic disturbance is also called flow-induced vibrations (FIV). The disturbance is transmitted to the cooled position-sensitive component via water sound. This causes the position of the position-sensitive component to deviate from a desired position. In particular, a pressure surge of the coolant acts on surfaces of the cooled position-sensitive component. The pressure surge is converted into a force on the surfaces it acts on. Due to this force, the position of the position-sensitive component deviates from the target position.

According to an embodiment of the first aspect, the one or more partition walls of the multi-pipe section comprise the elastic material, an outer wall of the multi-pipe section comprises the elastic material and/or the multi-pipe section is made of the elastic material.

For example, the partition walls of the multi-pipe section, the outer wall of the multi-pipe section and/or the entire multi-pipe section are made of and/or consist of the elastic material.

According to a further embodiment of the first aspect, at least a first of the plurality of individual pipes is configured to supply cooling liquid to the position-sensitive component, at least a second of the plurality of individual pipes is configured to discharge cooling liquid from the position-sensitive component, and the one or more partition walls which separate the at least one first and the at least one second individual pipe from one another comprise the elastic material.

Consequently, a combined outgoing and return line is provided, where the outgoing line(s) (supply line supply line(s) and return line(s) (discharge line(s)) are coupled together via the elastic material. By combining the supply line and discharge line for the coolant in the multi-pipe section with the elastic material, pressure fluctuations between the supply line and discharge line can be at least partially compensated.

For example, the multi-pipe section with the combined supply and return line can be arranged directly upstream of the position-sensitive component. This makes it possible to significantly reduce a pressure gradient across the position-sensitive component (i.e., a location-dependent pressure that changes across the position-sensitive component).

In embodiments of the first aspect, the individual tubes of the multi-tube section have very small cross-sectional areas. This allows for increased unsteady, viscous damping. In particular, the magnitude of the unsteady, viscous damping scales with the fourth power of the cross-sectional areas (e.g., the diameter in the case of circular cross-sections) of the individual tubes.

For example, a diameter of the multi-pipe section (i.e., overall diameter of the multi-pipe section) is 3/4 inch (1.91 cm) or less, 1/2 inch (1.27 cm) or less, 3/8 inch (0.95 cm) or less, and/or 1/4 inch (0.64 cm) or less. In another example, a diameter of the multi-pipe section is 5 cm or less, 3 cm or less, 2 cm or less, 1 cm or less, and/or 0.5 cm or less.

In addition, the diameter of each of the individual tubes in the multi-tube section is, for example, 5 mm or less, 3 mm or less, 2 mm or less, 1 mm or less, 0.5 mm or less, 0.3 mm or less, 0.2 mm or less, and/or 0.1 mm or less. These small individual tube diameters and the associated small cross-sectional areas of the individual tubes advantageously increase unsteady, viscous damping. A lower limit for the individual tube diameters or the cross-sectional areas of the individual tubes results from the undesirably high flow resistance that occurs with very small pipe diameters/cross-sectional areas.

According to a second aspect, a cooling device for cooling a position-sensitive component of a lithography system is proposed. The cooling device comprises a liquid line with a plurality of fluid-connected line sections for transporting a cooling liquid to the position-sensitive component, wherein
a longitudinal direction of a respective line section is arranged parallel to an x-, y- or z-direction,
the x, y and z directions are mutually perpendicular spatial directions, and
a total length of all x-line sections arranged parallel to the x-direction, a total length of all y-line sections arranged parallel to the y-direction and/or a total length of all z-line sections arranged parallel to the z-direction is/are set up accordingly in the x-direction, the y-direction and/or the z-direction based on predetermined mechanical vibration excitations of the liquid line.

This allows, for example, the total length of all x-line sections to be adapted during the manufacture of the cooling device to a predetermined mechanical vibration excitation of the cooling device or the liquid line of the cooling device in the x-direction. The same applies to the y-line sections and the predetermined mechanical vibration excitation in the y-direction, as well as to the z-line sections and the predetermined mechanical vibration excitation in the z-direction.

For example, if a predetermined vibration excitation of the cooling device or the liquid line of the cooling device is large in the x-direction (e.g., larger than in the y- and/or z-direction), then the total length of the x-line sections is selected to be small during manufacture of the cooling device (e.g., smaller than in the y- and/or z-direction).

The predetermined mechanical vibration excitation of the cooling device or the liquid line of the cooling device in the x-direction, the y-direction and/or the z-direction is, for example, a predetermined acceleration of the cooling device or the liquid line accordingly in the x-direction, the y-direction and/or the z-direction.

The plurality of fluidically connected line sections comprise in particular one or more x-line sections, one or more y-line sections and/or one or more z-line sections.

A time-dependent pressure surge p(t) introduced into the cooling liquid (e.g. by means of vibrating support structures of the liquid line) is linearly dependent on the density ρ of the cooling liquid, the accelerated line length 1 of the liquid line and the time-dependent acceleration a(t) of the liquid line: $$\text{p}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \text{L}\cdot \text{a}\left(\text{t}\right)$$

The pressure surge p(t) is a linear combination of the pressures resulting from the total active line lengths L _i and the corresponding accelerations a _i (t) in the three spatial directions x, y, z with i ∈ {x,y,z}: $$\text{p}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right]$$

The aim here is to minimize the sum of the individual contributions, i.e. to realize as little line length L _x , L _y , L _z as possible in directions x, y, z that are subject to a high acceleration a _x (t), a _y (t), a _z (t).

In embodiments of the second aspect, the total length of all x-line sections arranged parallel to the x-direction, the total length of all y-line sections arranged parallel to the y-direction and/or the total length of all z-line sections arranged parallel to the z-direction is/are set up based on the predetermined mechanical vibration excitations of the liquid line accordingly in the x-direction, the y-direction and/or the z-direction and additionally with respect to a rotation or angular acceleration about the x-direction, a rotation or angular acceleration about the y-direction and/or a rotation or angular acceleration about the z-direction.

According to an embodiment of the second aspect, the total length of all x-line sections, the total length of all y-line sections and/or the total length of all z-line sections is/are arranged based on the predetermined mechanical vibration excitations of the liquid line in the x-direction, the y-direction and/or the z-direction such that a large predetermined acceleration of the liquid line due to the vibration excitation of the liquid line in a corresponding direction corresponds to a small total length of the line sections arranged parallel to the corresponding direction.

According to a further embodiment of the second aspect, the plurality of fluidically connected line sections comprise a first group of fluidically connected supply line sections for supplying the cooling liquid to the position-sensitive component and a second group of fluidically connected discharge sections for discharging the cooling liquid from the position-sensitive component, wherein at least one supply line section of the first group and at least one discharge section of the second group are in mechanical contact with an outer surface of the position-sensitive component. Furthermore, the following applies to a total pressure p _G1 (t) of the first group on the position-sensitive component: $${\text{p}}_{\text{G1}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x1}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{<figure-callout id="1" label="L y" filenames="DE102023212263A1\_0010.png,DE102023212263A1\_0014.png" state="{{state}}">L</figure-callout>}}_{\text{y}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z1}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right].$$

In addition, for a total pressure p _G2 (t) of the second group on the position-sensitive component, the following applies: $${\text{p}}_{\text{G2}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x2}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y2}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z2}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right].$$

Here, ρ denotes a density of the cooling liquid, L _x1 , L _y1 and L _z1 denote a respective total length corresponding to the x, y and z line sections of the first group, L _x2 , L _y2 and L _z2 denote a respective total length corresponding to the x, y and z line sections of the second group, and a _x (t) denotes the acceleration in the x direction, a _y (t) the acceleration in the y direction and a _z (t) the acceleration in the z direction. In addition, the total lengths L _x1 , L _y1 , L _z1 , L _x2 , L _y2 and L _z2 are set up as a function of the predetermined accelerations a _x (t), a _y (t) and a _z (t) such that the total pressure p _G1 (t) of the first group at least partially compensates the total pressure p _G2 (t) of the second group.

As a result, a mechanical force acting on the position-sensitive component due to a pressure wave of a cooling liquid in the first group of supply line sections is at least partially compensated by a mechanical force acting on the position-sensitive component due to a pressure wave of a cooling liquid in the second group of discharge lines.

For example, if the predetermined vibration excitation of the liquid line is a vibration excitation that is symmetrical with respect to the first and second group of line sections, then a symmetrical routing of the lines of the first and second group is advantageous in order to minimize interference in the position-sensitive component.

However, if the predetermined vibration excitation of the liquid line is, for example, an asymmetrical vibration excitation with respect to the first and second group of line sections, then a corresponding asymmetrical routing of the lines of the first and second group is advantageous in order to minimize interference in the position-sensitive component.

According to a third aspect, a cooling device for cooling a position-sensitive component of a lithography system is proposed The cooling device has a liquid line for transporting a cooling liquid to the position-sensitive component, wherein
the liquid line has a first line section with a first line diameter, which is configured to extend into an interior of the position-sensitive component, and a second line section fluidly connected to the first line section with a second line diameter, which is configured to be arranged further away from the position-sensitive component than the first line section with respect to a flow direction of the cooling liquid, and
the first pipe diameter is larger than the second pipe diameter.

By applying a larger cable diameter directly adjacent to the position-sensitive component, dynamic interference inputs into the position-sensitive component can be reduced.

For example, the first conduit diameter is 3/4 inch (1.91 cm) or less, 1/2 inch (1.27 cm) or less, 3/8 inch (0.95 cm) or less, and/or 1/4 inch (0.64 cm) or less. In another example, the first conduit diameter is 5 cm or less, 3 cm or less, 2 cm or less, 1 cm or less, and/or 0.5 cm or less.

For example, the second conduit diameter is 1/2 inch (1.27 cm) or less, 3/8 inch (0.95 cm) or less, and/or 1/4 inch (0.64 cm) or less. In another example, the second conduit diameter is 3 cm or less, 2 cm or less, 1 cm or less, 0.5 cm or less, and/or 0.3 cm or less.

According to an embodiment of the third aspect, a damping component for damping a pressure fluctuation of the cooling liquid is arranged between the first and second line sections.

The damping component is, for example, one or more multi-pipe sections as described above and/or one or more of the silencer devices described below.

• eine Flüssigkeitsleitung zum Transportieren einer Kühlflüssigkeit zu der positionssensitiven Komponente, und
• eine erste und eine zweite Schalldämpfereinrichtung zum Dämpfen einer Druckschwankung der Kühlflüssigkeit, wobei
• jede der ersten und zweiten Schalldämpfereinrichtung eine mit der Flüssigkeitsleitung fluidverbundene Flüssigkeitskammer, eine Gaskammer zum Aufnehmen eines Gases und eine die Gaskammer von der Flüssigkeitskammer abtrennende elastische Trennmembran aufweist,
• die Flüssigkeitsleitung mindestens einen ersten Leitungsabschnitt mit einem ersten Leitungsdurchmesser aufweist, welcher in Strömungsrichtung der Kühlflüssigkeit vor und/oder nach der ersten und zweiten Schalldämpfereinrichtung angeordnet ist, und einen mit dem mindestens einen ersten Leitungsabschnitt fluidverbundenen zweiten Leitungsabschnitt mit einem zweiten Leitungsdurchmesser, welcher zwischen der ersten und der zweiten Schalldämpfereinrichtung angeordnet ist, und
• der erste Leitungsdurchmesser größer als der zweite Leitungsdurchmesser ist.

According to a fourth aspect, a cooling device for cooling a position-sensitive component of a lithography system is proposed. The cooling device comprises:

• a liquid line for transporting a cooling liquid to the position-sensitive component, and
• a first and a second silencer device for damping a pressure fluctuation of the cooling liquid, wherein
• each of the first and second silencer devices comprises a liquid chamber fluidly connected to the liquid line, a gas chamber for receiving a gas, and an elastic separating membrane separating the gas chamber from the liquid chamber,
• the liquid line has at least one first line section with a first line diameter, which is arranged in the flow direction of the cooling liquid upstream and/or downstream of the first and second silencer device, and a second line section fluidly connected to the at least one first line section with a second line diameter, which is arranged between the first and second silencer device, and
• the first pipe diameter is larger than the second pipe diameter.

For example, the first conduit diameter is 3/4 inch (1.91 cm) or less, 1/2 inch (1.27 cm) or less, 3/8 inch (0.95 cm) or less, and/or 1/4 inch (0.64 cm) or less. In another example, the first conduit diameter is 5 cm or less, 3 cm or less, 2 cm or less, 1 cm or less, and/or 0.5 cm or less.

For example, the second conduit diameter is 1/2 inch (1.27 cm) or less, 3/8 inch (0.95 cm) or less, and/or 1/4 inch (0.64 cm) or less. In another example, the second conduit diameter is 3 cm or less, 2 cm or less, 1 cm or less, 0.5 cm or less, and/or 0.3 cm or less.

The second line section provides in particular a fluid connection between the first and second silencer device (in particular between the two liquid chambers of the first and second silencer device).

Each of the silencer devices enables the damping of pressure fluctuations in the coolant by changing the volume available for the coolant. In particular, the elastic separating membrane of the respective silencer device is designed to deform and thereby change the volume of the respective liquid chamber at the expense of the volume of the respective gas chamber. Thus, the propagation of pressure fluctuations via the coolant can be significantly reduced by each of the silencer devices. By having at least two silencer devices directions are connected in series, the damping effect can be further increased.

Furthermore, since the second line diameter of the second line section arranged between the at least two silencer devices and fluidly connecting them is smaller than the first line diameter, a hydraulic mass between the at least two silencer devices can be increased. In particular, the hydraulic mass between the at least two silencer devices is inversely proportional to the diameter of the second line section connecting the at least two silencer devices.

Each of the silencer devices comprises, for example, a resonance absorber, a Helmholtz resonator, and/or a throat section that fluidically connects the fluid line to the respective fluid chamber of the silencer device. This achieves sound attenuation, i.e., the damping of a pressure fluctuation of the cooling fluid, based on a resonance effect.

A Helmholtz resonator is a particular example of a resonance absorber. A Helmholtz resonator has a resonator volume, which in this case is provided by the volume of the liquid chamber. Furthermore, a Helmholtz resonator has a resonator neck (neck section) that is fluidly connected to the resonator volume. A pressure wave from the cooling liquid in the line excites the cooling liquid in the resonator neck to vibrate, with the portion of cooling liquid in the resonator neck vibrating against the portion of cooling liquid in the liquid chamber. Sound dampening is achieved analogously to a mass-spring system.

According to a fifth aspect, a lithography system, in particular an EUV lithography system, is proposed. The lithography system has a cooling device as described above.

The cooling device and/or the position-sensitive component is preferably part of the projection system of the lithography system. However, the cooling device and/or the position-sensitive component can also be part of an illumination system of the lithography system. The lithography system (projection exposure system) can be an EUV lithography system. EUV stands for "Extreme Ultraviolet" and refers to a wavelength of the working light between 0.1 nm and 30 nm. The projection exposure system can also be a DUV lithography system. DUV stands for "Deep Ultraviolet" and refers to a wavelength of the working light between 30 nm and 250 nm.

According to an embodiment of the fifth aspect, the lithography system comprises a position-sensitive component.

According to a further embodiment of the fifth aspect, the cooling device comprises at least one source of flow-induced vibrations. Furthermore, the cooling device comprises at least one multi-pipe section as described above and/or at least two silencer devices as described above, which are arranged downstream of, in particular directly downstream of, the at least one source of flow-induced vibrations, as seen in the flow direction of the cooling liquid.

The at least one source of flow-induced vibrations (FIV), or FIV source for short, comprises, for example, one or more pumps, one or more valves, one or more geometric changes in the liquid line, such as (e.g., sudden) changes in the line cross-section, line deflections, line bends and/or line branches.

For example, the cooling device has a plurality of FIV sources and either at least one multi-pipe section as described above and/or at least two silencer devices as described above are arranged after one, several or all of the FIV sources.

According to a further embodiment of the fifth aspect, the at least one multi-pipe section and/or the at least two silencer devices are arranged in front of, in particular directly in front of, the position-sensitive component, as seen in the flow direction of the cooling liquid.

This allows acoustic interference to the position-sensitive component to be reduced even further.

"Arranged directly upstream of the position-sensitive component" specifically means "located immediately upstream of the position-sensitive component." "Arranged directly upstream of the position-sensitive component" means, for example, that a section of the fluid line between the multi-pipe section or the two silencer devices and the position-sensitive component is free of FIV sources.

1. a) Ermitteln einer oder mehrerer mechanischer Schwingungsanregungen der Flüssigkeitsleitung entsprechend in der x-Richtung, der y-Richtung und/oder der z-Richtung, und
2. b) Herstellen der Flüssigkeitsleitung, sodass eine Gesamtlänge aller parallel zur x-Richtung angeordneten x-Leitungsabschnitte, eine Gesamtlänge aller parallel zur y-Richtung angeordneten y-Leitungsabschnitte und/oder eine Gesamtlänge aller parallel zur z-Richtung angeordneten z-Leitungsabschnitte basierend auf den ermittelten mechanischen Schwingungsanregungen der Flüssigkeitsleitung entsprechend in der x-Richtung, der y-Richtung und/oder der z-Richtung eingerichtet ist/sind.

According to a sixth aspect, a method for producing a A cooling device according to the second aspect described above is proposed for cooling a position-sensitive component of a lithography system. The cooling device comprises a liquid line with a plurality of fluid-connected line sections for transporting a cooling liquid to the position-sensitive component, wherein a longitudinal direction of a respective line section is arranged parallel to an x-, y-, or z-direction, and the x-, y-, and z-directions are mutually perpendicular spatial directions. The method further comprises the steps:

1. a) Determining one or more mechanical vibration excitations of the liquid line in the x-direction, the y-direction and/or the z-direction, and
2. b) Producing the liquid line such that a total length of all x-line sections arranged parallel to the x-direction, a total length of all y-line sections arranged parallel to the y-direction and/or a total length of all z-line sections arranged parallel to the z-direction is/are arranged accordingly in the x-direction, the y-direction and/or the z-direction based on the determined mechanical vibration excitations of the liquid line.

Insofar as the present application refers to a cooling device, cooling, cooling liquid, cooling line, method for producing a cooling device, etc., this may equally well mean a tempering device, tempering, tempering liquid, tempering line, method for producing a tempering device, etc. and/or a heating device, heating, heating liquid, heating line, method for producing a heating device, etc.

In this case, "one" is not necessarily limited to exactly one element. Rather, multiple elements, such as two, three, or more, may also be included. Any other counting term used here should also not be understood as implying a limitation to the exact number of elements stated. Rather, numerical deviations, both upward and downward, are possible unless otherwise stated.

The embodiments and features described for the cooling device according to the first aspect apply to the cooling device according to the second, third and fourth aspects as well as to the proposed method accordingly and vice versa.

Further possible implementations of the invention also include combinations of features or embodiments described above or below with respect to the exemplary embodiments that are not explicitly mentioned. In this case, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

• 1 zeigt einen schematischen Meridionalschnitt einer Projektionsbelichtungsanlage für die EUV-Projektionslithographie;
• 2 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer Ausführungsform;
• 3 zeigt im Querschnitt mehrere Ausführungsformen eines Multirohrabschnitts einer Flüssigkeitsleitung der Kühlvorrichtung aus 2;
• 4 zeigt eine perspektivische Ansicht eines Multirohrabschnitts gemäß einer weiteren Ausführungsform;
• 5 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer weiteren Ausführungsform;
• 6 zeigt eine Variante der Kühlvorrichtung aus 5;
• 7 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer weiteren Ausführungsform;
• 8 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer weiteren Ausführungsform;
• 9 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer weiteren Ausführungsform;
• 10 zeigt eine Kühlvorrichtung der Projektionsbelichtungsanlage aus 1 gemäß einer weiteren Ausführungsform; und
• 11 zeigt ein Flussablaufdiagramm eines Verfahrens zum Herstellen einer Kühlvorrichtung gemäß einer Ausführungsform.

Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will be explained in more detail below using preferred embodiments with reference to the accompanying figures.

• 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography;
• 2 shows a cooling device of the projection exposure system from 1 according to one embodiment;
• 3 shows in cross section several embodiments of a multi-pipe section of a liquid line of the cooling device from 2 ;
• 4 shows a perspective view of a multi-pipe section according to another embodiment;
• 5 shows a cooling device of the projection exposure system from 1 according to a further embodiment;
• 6 shows a variant of the cooling device from 5 ;
• 7 shows a cooling device of the projection exposure system from 1 according to a further embodiment;
• 8 shows a cooling device of the projection exposure system from 1 according to a further embodiment;
• 9 shows a cooling device of the projection exposure system from 1 according to a further embodiment;
• 10 shows a cooling device of the projection exposure system from 1 according to a further embodiment; and
• 11 shows a flowchart of a method for manufacturing a cooling device according to an embodiment.

In the figures, identical or functionally equivalent elements are provided with the same reference numerals unless otherwise stated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of an illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, an illumination optics 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the remaining illumination system 2. In this case, the illumination system 2 does not include the light source 3.

A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be displaced via a reticle displacement drive 9, in particular in a scanning direction.

In the 1 For explanation purposes, a Cartesian coordinate system is shown with an x-direction x, a y-direction y and a z-direction z. The x-direction x runs perpendicular to the plane of the drawing. The y-direction y runs horizontally and the z-direction z runs vertically. The scanning direction runs in the 1 along the y-direction y. The z-direction z runs perpendicular to the object plane 6.

The projection exposure system 1 comprises a projection optics 10. The projection optics 10 serves to image the object field 5 into an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible.

A structure on the reticle 7 is imaged onto a light-sensitive layer of a wafer 13 arranged in the image plane 12 in the region of the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be displaced, in particular along the y-direction y, via a wafer displacement drive 15. The displacement of the reticle 7, on the one hand, via the reticle displacement drive 9, and the displacement of the wafer 13, on the other hand, via the wafer displacement drive 15, can be synchronized with each other.

The light source 3 is an EUV radiation source. The light source 3 emits, in particular, EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation 16 has, in particular, a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example an LPP source (Laser Produced Plasma) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source. The light source 3 can be a free-electron laser (FEL).

The illumination radiation 16 emanating from the light source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and/or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 17 can be exposed to the illumination radiation 16 at grazing incidence (GI), i.e., at angles of incidence greater than 45°, or at normal incidence (NI), i.e., at angles of incidence less than 45°. The collector 17 can be structured and/or coated, on the one hand, to optimize its reflectivity for the useful radiation and, on the other hand, to suppress stray light.

After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4.

The illumination optics 4 comprises a deflecting mirror 19 and, downstream of this in the beam path, a first facet mirror 20. The deflecting mirror 19 can be a flat deflecting mirror or, alternatively, a mirror with a beam-influencing effect beyond the pure deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful light wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first facet mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugated to the object plane 6 as the field plane, it is also referred to as a field facet mirror. The first facet mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Of these first facets 21, 1 only a few examples are shown.

The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or partially circular edge contour. The first facets 21 can be designed as flat facets or, alternatively, as convexly or concavely curved facets.

As for example from the DE 10 2008 009 600 A1 As is known, the first facets 21 themselves can also be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1 referred to.

Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction y.

In the beam path of the illumination optics 4, a second facet mirror 22 is arranged downstream of the first facet mirror 20. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil facet mirror. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006/0132747 A1 , the EP 1 614 008 B1 and the US 6,573,978 .

The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

The second facets 23 can also be macroscopic facets, which can be round, rectangular or hexagonal, or alternatively facets composed of micromirrors. In this regard, reference is also made to the DE 10 2008 009 600 A1 referred to.

The second facets 23 may have planar or alternatively convex or concave curved reflection surfaces.

The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a fly's-eye integrator.

It may be advantageous not to arrange the second facet mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second facet mirror 22 may be arranged tilted relative to a pupil plane of the projection optics 10, as is shown, for example, in the DE 10 2017 220 586 A1 described.

With the help of the second facet mirror 22, the individual first facets 21 are imaged into the object field 5. The second facet mirror 22 is the last bundle-forming mirror or actually the last mirror for the illumination radiation 16 in the beam path before the object field 5.

In a further embodiment of the illumination optics 4 (not shown), a transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5, which transmission optics contributes in particular to the imaging of the first facets 21 into the object field 5. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirrors, normal incidence mirrors) and/or one or two mirrors for grazing incidence (GI mirrors, grazing incidence mirrors).

The illumination optics 4 has in the version shown in the 1 As shown, after the collector 17 there are exactly three mirrors, namely the deflection mirror 19, the first facet mirror 20 and the second facet mirror 22.

In a further embodiment of the illumination optics 4, the deflection mirror 19 can also be omitted, so that the illumination optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22.

The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optics into the object plane 6 is usually only an approximate imaging.

The projection optics 10 comprises a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

In the 1 In the example shown, the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or a different number of mirrors M1 are also possible. The projection optics 10 is a doubly obscured optic. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75.

Reflection surfaces of the mirrors Mi can be designed as freeform surfaces without a rotational symmetry axis. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one rotational symmetry axis of the reflection surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

The projection optics 10 has a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

The projection optics 10 can, in particular, be anamorphic. It has, in particular, different magnifications βx, βy in the x and y directions x, y. The two magnifications βx, βy of the projection optics 10 are preferably (βx, βy) = (+/- 0.25, +/- 0.125). A positive magnification β means imaging without image inversion. A negative sign for the magnification β means imaging with image inversion.

The projection optics 10 thus leads to a reduction in the ratio 4:1 in the x-direction x, i.e. in the direction perpendicular to the scanning direction.

The projection optics 10 leads to a reduction of 8:1 in the y-direction y, i.e. in the scanning direction.

Other magnifications are also possible. Magnifications with the same sign and absolutely identical in the x and y directions (x, y), for example, with absolute values of 0.125 or 0.25, are also possible.

The number of intermediate image planes in the x- and y-directions x, y in the beam path between the object field 5 and the image field 11 can be the same or can be different, depending on the design of the projection optics 10. Examples of projection optics with different numbers of such intermediate images in the x- and y-directions x, y are known from US 2018/0074303 A1 .

Each of the second facets 23 is assigned to exactly one of the first facets 21 to form a respective illumination channel for illuminating the object field 5. This can, in particular, result in illumination according to the Köhler principle. The far field is divided into a plurality of object fields 5 using the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to them.

The first facets 21 are each imaged onto the reticle 7 by an associated second facet 23, superimposed on one another, to illuminate the object field 5. The illumination of the object field 5 is, in particular, as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

By arranging the second facets 23, the illumination of the entrance pupil of the projection optics 10 can be geometrically defined. By selecting the illumination channels, in particular the subset of the second facets 23 that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil fill.

A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels.

Further aspects and details of the illumination of the object field 5 and in particular of the entrance pupil of the projection optics 10 are described below.

The projection optics 10 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

The entrance pupil of the projection optics 10 cannot usually be precisely illuminated with the second facet mirror 22. When the projection optics 10 images the center of the second facet mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found in which the pairwise determined distance of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in spatial space. In particular, this surface exhibits a finite curvature.

It may be that the projection optics have 10 different positions of the entrance pupil for the tangential and for the sagittal beam path. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7. With the help of this optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

At the 1 In the illustrated arrangement of the components of the illumination optics 4, the second facet mirror 22 is arranged in a surface conjugate to the entrance pupil of the projection optics 10. The first facet mirror 20 is arranged tilted relative to the object plane 6. The first facet mirror 20 is arranged tilted relative to an arrangement plane defined by the deflection mirror 19. The first facet mirror 20 is arranged tilted relative to an arrangement plane defined by the second facet mirror 22.

2 shows a cooling device 100 for the projection exposure system 1 from 1 according to one embodiment.

The cooling device 100 is configured to cool an optical or mechanical component 102 of the projection exposure apparatus 1. An example of an optical component 102 is a mirror of the projection exposure apparatus 1 (lithography apparatus), in particular of the projection optics 10, made of 1 The optical component 102 is, for example, one of the mirrors M1-M6. An example of a mechanical component 102 is a sensor frame (not shown) of the projection exposure system 1.

A sensor frame comprises, for example, a sensor device for measuring a current position of an optical component of the lithography system 1 relative to the sensor frame. The sensor frame is mounted, for example, in a vibration-decoupled manner with respect to a support frame of the optical component. The sensor device comprises, for example, one or more sensors, such as interferometers and/or other measuring devices for detecting a position of the optical component. The optical component can, for example, have reflector elements for reflecting light emitted by the sensors (e.g., laser light).

As in 2 As shown, the cooling device 100 includes a liquid line (e.g., cooling line) 104 for transporting a cooling liquid 106.

The cooling device 100 further comprises, for example, a cooling unit 108 for cooling the cooling liquid 102. The cooling device 100 also comprises one or more pumps 110 for generating a required coolant flow rate of the cooling liquid 106. The cooling device 100 may also comprise one or more valves 112 for controlling the cooling flow.

Pumps 110 of the cooling device 100 can cause turbulent flows of the cooling liquid 106. This can generate local pressure fluctuations in the liquid 106, which are transmitted via longitudinal water sound waves through the entire cooling circuit 114 to the component 102 to be cooled. This results in dynamic disturbance excitation of the component 102 to be cooled (flow-induced vibrations, FIV). In addition to pumps 110, cross-sectional changes and deflections 116 of the liquid line 104 as well as valves 112 of the cooling device 100 can also represent a disturbance source (FIV source) that causes local pressure fluctuations of the liquid 106. Such acoustic disturbance excitation is transmitted to the component 102 to be cooled via water sound. This can lead to an undesired change in the position of the component 102 to be cooled, which impairs the imaging properties of the projection exposure system 1.

To suppress pressure fluctuations of the cooling liquid 106, the cooling device 100, in particular the liquid line 104, has one or more multi-pipe sections 118. In 2 A multi-pipe section 118 is shown as an example. In the multi-pipe section 118, a pipe 120 of the liquid line 104 is seen in cross section ( 3 ) is segmented into a plurality of individual tubes 124 by one or more partition walls 122. The multi-tube section 118 has an elastic material 126 for dampening pressure fluctuations of the cooling liquid 106. For example, the partition walls 122 of the multi-tube section 118 are made of the elastic material 126.

In 3 is a cross-section of the multi-pipe section 118 along line III-III in 2 for four different embodiments of the individual tubes 124. In particular, 3 different cross-sectional shapes of the individual pipes are illustrated.

3a shows a tube 120a of the liquid line 104, which has a circular cross-section and into which a multi-tube section 118a is inserted. An outer wall 128a of the multi-tube section 118a also has a circular cross-section. The multi-tube section 118a is, for example, clamped between inner walls of the tube 120a. The multi-tube section 118a has a plurality of individual tubes 124a, of which 3 five are marked with a reference symbol. The individual tubes 124a each have a circular cross-section and are separated from each other by partition walls 122a. The multi-pipe section 118a, for example, is made entirely of the elastic material 126.

In the examples of 3b and 3c Pipes 120b, 120c of the liquid line 104 also have a circular cross-section. Furthermore, a multi-pipe section 118b, 118c with a circular outer wall 128b, 128c is inserted into the respective pipe 120b, 120c. 3b The individual tubes 124b, three of which are identified by a reference symbol, have an oval cross-section. Partition walls 122b fill the space between the individual tubes 124b. In 3c The individual tubes 124c, three of which are identified by a reference numeral, have a triangular cross-section. Partition walls 122c form a grid that defines the individual tubes 124c with the triangular cross-section.

In 3D A tube 120d of the liquid line 104 with a square cross-section is shown. Furthermore, a multi-tube section 118d with a corresponding square outer wall 128d is inserted into the tube 120d. 3D The individual tubes 124d, three of which are identified by a reference numeral, have a quadrangular cross-section. Partition walls 122d form a grid that defines the individual tubes 124d with the quadrangular cross-section.

The multi-pipe sections 118b, 118c, 118d in 3b , 3c , 3D are, for example, made entirely of elastic material 126 and inserted as an insert into the respective tube 120b, 120c, 120d.

In 4 Another embodiment of a multi-tube section 218 with an elastic material 226 is shown. The multi-tube section 218 in 4 has several individual tubes 224. Only as an example, 4 ten individual tubes 224 are shown. The individual tubes 224 shown each have a hexagonal cross-section. In other examples, the individual tubes 224 of the embodiment of 4 but may also have a different cross-sectional shape (e.g. circular, oval, triangular, square or other shape).

4 shows a multi-pipe section 218 with a combined supply and discharge line. In particular, at least a first individual pipe 230 of the plurality of individual pipes 224 is configured to supply cooling liquid 106 to the position-sensitive component 102 (supply pipe(s) 230). Furthermore, at least a second pipe 232 of the plurality of individual pipes 224 is configured to discharge cooling liquid 106 from the position-sensitive component 102 (discharge pipe(s) 232). As an example, the multi-pipe section 218 in 4 five supply pipes 230 and five discharge pipes 232. Partition walls 222, which separate the supply pipes 230 and the discharge pipes 232, comprise the elastic material 226. In 4 For reasons of clarity, only three of the partition walls 222 are provided with a reference numeral. However, in particular, all partition walls 222 can be made of the elastic material 226.

In 5 is a cooling device 300 for cooling an optical or mechanical component 302 of the projection exposure apparatus 1 ( 1 ) according to another embodiment. The cooling device 300 includes a liquid line (e.g., cooling line) 304 for transporting a cooling liquid 106. Although in 5 not shown, the cooling device 300 comprises, for example, a cooling unit (similar to the cooling unit 108 in 2 ), one or more pumps (similar to pump 110 in 2 ) and one or more valves (similar to valve 112 in 2 ) on.

The liquid line 304 comprises a plurality of fluidically connected line sections 334, 336, 338, 340, 342, 344 for transporting a cooling liquid to the position-sensitive component 302. Furthermore, a longitudinal direction A1 to A6 of a respective line section 334 to 344 is arranged parallel to an x-, y- or z-direction x, y, z, wherein the x-, y- and z-directions x, y, z are mutually perpendicular spatial directions. In the example of 5 the line sections 334, 338, 340 and 344 are arranged parallel to the x-direction x (i.e., the longitudinal directions A1, A3, A4, A6 are arranged parallel to the x-direction x). In addition, the line sections 336 and 342 are arranged parallel to the y-direction y (i.e., the longitudinal directions A2 and A5 are arranged parallel to the y-direction y). In 5 No line sections are shown that are arranged parallel to the z-direction z. The x- and y-line sections 334, 336, 338, 340, 342 and 344 shown have corresponding lengths l ₁ , l ₂ , l ₃ , l ₄ , l ₅ and l ₆ , as in 5 marked.

Furthermore, the total lengths of the line sections 334, 336, 338, 340, 342 and 344 in a respective direction x, y, z are selected as a function of a predetermined mechanical vibration excitation V _x , V _y , V _{z of} the cooling device 300, in particular of the liquid line 304. In particular, a total length L _x of all x-line sections 334, 338, 340 and 344 arranged parallel to the x-direction x is set based on a predetermined mechanical vibration excitation V _x of the liquid line 304 in the x-direction x. For example, the total length L _x is based on a predetermined time-dependent acceleration a _x (t) of the liquid line 304 due to a mechanical vibration excitation V _x in the x-direction x. In particular, for a large predetermined acceleration a _x (t) of the liquid line 304 due to the vibration excitation V _x in the x-direction x, a small total length L _x of the line sections 334, 338, 340 and 344 arranged parallel to the x-direction x is selected.

Similarly, a total length L _y of all y-line sections 336 and 342 arranged parallel to the y-direction y is set based on a predetermined mechanical vibration excitation V _y of the liquid line 304 in the y-direction y. A total length L _z of all z-line sections arranged parallel to the z-direction z can also be set based on a predetermined mechanical vibration excitation V _{z of} the liquid line 304 in the z-direction z.

In the example of 5 For example, a predetermined time-dependent acceleration a _z (t) of the liquid line 304 due to a mechanical vibration excitation V _z in the z-direction is very large, so that in the design of the cooling device 300 and in particular the routing of the liquid line 304, line sections in the z-direction were completely omitted (L _z = 0).

In 6 is a variant of the cooling device 300 from 5 As shown in 6 As shown, the cooling device 300', in particular the cooling line 304', can be designed such that pressure gradients along the position-sensitive component 302 are minimized.

In particular, as in 6 As can be seen, the plurality of fluidly connected line sections 334 to 344 comprise a first group G1 of fluidly connected supply line sections 334, 336, and 338 for supplying the cooling liquid 106 to the position-sensitive component 302. Furthermore, the plurality of fluidly connected line sections 334 to 344 can comprise a second group G2 of fluidly connected discharge sections 340, 342, and 344 for discharging the cooling liquid 106 from the position-sensitive component 302. At least one supply line section 338 of the first group G1 and at least one discharge section 340 of the second group G2 are in direct mechanical contact with an outer surface 346 of the position-sensitive component 302. A total pressure p _G1 (t) of the first group G1 on the position-sensitive component 302 is given by the following equation: $${\text{p}}_{\text{G1}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x1}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y1}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z1}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right].$$

In addition, a total pressure p _G2 (t) of the second group G2 on the position-sensitive component 302 results based on the following equation: $${\text{p}}_{\text{G2}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x2}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y2}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z2}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right].$$

In the above equations, L _x1 , L _y1 and L _z1 denote the respective total length corresponding to the x-, y- and z-line sections 334, 336, 338 of the first group G1. Furthermore, L _x2 , L _y2 and L _z2 denote the respective total length corresponding to the x-, y- and z-line sections 340, 342, 344 of the second group G2. In the example of 6 is L _x1 = l ₁ + l ₃ , l _y1 = l ₂ and L _z1 = 0. Furthermore, in the example of 6 L _x2 = l ₄ + l ₆ , l _y2 = l ₅ and L _z2 = 0. In addition, a _x (t) denotes the acceleration in the x-direction, a _y (t) the acceleration in the y-direction and a _z (t) the acceleration in the y-direction.

To keep pressure gradients along the position-sensitive component 302 as low as possible, it is advantageous if the total pressure p _G1 (t) of the first group G1 at least partially compensates for the total pressure p _G2 (t) of the second group G2. Ideally, the total pressure p _G1 (t) of the first group G1 is equal to the total pressure p _G2 (t) of the second group G2: $${\text{p}}_{\text{G1}}\left(\text{t}\right)={\text{p}}_{\text{G1}}\left(\text{t}\right).$$

As a result, a mechanical force acting on the position-sensitive component 302 due to a pressure wave of a cooling liquid 106 in the first group G1 of the supply line sections 334, 336, 338 is (at least partially) compensated by a mechanical force acting on the position-sensitive component 302 due to a pressure wave of a cooling liquid 106 in the second group G2 of the discharge sections 340, 342, 344.

If, for example, the predetermined vibration excitation V _x , V _y , V _z of the liquid line 304 is a vibration excitation that is symmetrical with respect to the first and second group G1, G2 of the line sections 334 to 344, then a symmetrical routing of the line sections 334 to 344 of the first and second group G1, G2 is advantageous in order to minimize dynamic interference in the position-sensitive component 302.

However, if the predetermined vibration excitation V _x , V _y , V _z of the liquid line 304 is, for example, an asymmetrical vibration excitation with respect to the first and second group G1, G2 of the line sections 334 to 344, then a corresponding asymmetrical routing of the line sections 334 to 344 of the first and second group G1, G2 is advantageous, to minimize interference in the position-sensitive component 302.

In 7 is a cooling device 400 for cooling an optical or mechanical component 402 of the projection exposure apparatus 1 ( 1 ) according to another embodiment. The cooling device 400 includes a liquid line (e.g., cooling line) 404 for transporting a cooling liquid 106. Although in 7 not shown, the cooling device 400 comprises, for example, a cooling unit (similar to the cooling unit 108 in 2 ), one or more pumps (similar to pump 110 in 2 ) and one or more valves (similar to valve 112 in 2 ) on.

The liquid line 404 comprises a first line section 450 with a first line diameter D1. The first line section 450 is configured to extend into an interior 454 of a body 456 of the position-sensitive component 402. Furthermore, the liquid line 404 comprises a second line section 452 fluidly connected to the first line section 450 and having a second line diameter D2. The second line section 452 is configured to be arranged farther away from the position-sensitive component 402 than the first line section 450 with respect to a flow direction S of the cooling liquid. Furthermore, the first line diameter D1 is larger than the second line diameter D2.

By applying a larger line diameter D1 (directly) adjacent to the position-sensitive component 402, interference inputs into the position-sensitive component 402 can be reduced.

Optionally, a damping component 458 for damping a pressure fluctuation of the cooling liquid 106 can be arranged between the first and second line sections 450, 452. The damping component 458 can, for example, be one or more multi-pipe sections 218 as described above ( 2 to 4 ). Additionally or instead, the damping component 458 may also be one or more silencer devices as described below ( 8 ) act.

In 8 is a cooling device 500 for cooling an optical or mechanical component 102 of the projection exposure apparatus 1 ( 1 ) according to another embodiment. The cooling device 500 includes a liquid line (e.g., cooling line) 504 for transporting a cooling liquid 106. Although in 8 not shown, the cooling device 500 comprises, for example, a cooling unit (similar to the cooling unit 108 in 2 ), one or more pumps (similar to pump 110 in 2 ) and one or more valves (similar to valve 112 in 2 ) on.

To dampen pressure fluctuations of the cooling liquid 506, the cooling device 500 comprises a first and a second silencer device 560, 562. Each of the first and second silencer devices 560, 562 has a liquid chamber 564 fluidly connected to the liquid line 504, so that cooling liquid 506 can penetrate from the liquid line 504 into the liquid chamber 564 of the respective silencer device 560, 562. Furthermore, each of the first and second silencer devices 560, 562 has a gas chamber 566 for receiving a gas 570. The gas chamber 566 is separated from the respective liquid chamber 564 by an elastic separating membrane 568.

In the 8 In the state shown, the respective separating membrane 568 is in a resting state. The resting state is a relaxed, undeformed state of the separating membrane 568. By deforming the separating membrane 568, a volume of the liquid chamber 564 can be changed at the expense of a volume of the gas chamber 566. For example, an increase in pressure of the cooling liquid 506 can be dampened by expanding the cooling liquid 506 and compressing the gas 570 in the respective gas chamber 566. Accordingly, periodic pressure fluctuations of the cooling liquid 506 can also be dampened using the respective compressible gas chamber 566.

As in 8 As shown, each of the silencer devices 560, 562 can have a neck portion 572 that fluidly connects a fluid space of the fluid line 504 to the respective fluid chamber 564 of the silencer device 560, 562. The silencer devices 560, 562 each correspond, for example, to a resonance absorber and/or a Helmholtz resonator, in which the sound damping or sound absorption is achieved through a resonance effect. In particular, a portion of the cooling fluid 506 held in the neck portion 572 can vibrate against a portion of the cooling fluid 506 held in the fluid chamber 564, so that the damping occurs based on mass-spring damping.

In addition, the 8 shown cooling device 500, it is provided that the liquid line 504 has at least one first line section 574, 576 with a first line diameter D1, which is arranged in the flow direction S of the cooling liquid 506 before and/or after the two silencer devices 560, 562 Furthermore, the liquid line 504 comprises at least one second line section 578 fluidly connected to the at least one first line section 574, 576. The second line section 578 is arranged between the first and second silencer devices 560, 562. In particular, the second line section 578 fluidly connects the two liquid chambers 564 of the two silencer devices 560, 562 to one another. The second line section 578 has a second line diameter D2, which is smaller than the first line diameter D1. This increases a hydraulic mass between the two silencer devices 560, 562. In particular, the hydraulic mass between the two silencer devices 560, 562 is inversely proportional to the diameter D2 of the line section 578 connecting the two silencer devices 560, 562.

In 9 is a cooling device 600 for cooling one or more optical or mechanical components 602 (similar to the position-sensitive component 102) of the projection exposure apparatus 1 from 1 according to another embodiment. The cooling device 600 includes a liquid line (e.g., cooling line) 604 for transporting a cooling liquid 106. The cooling device 600 also includes a cooling unit 608 (similar to the cooling unit 108 in 2 ), one or more pumps 610 (similar to pump 110 in 2 ) and one or more valves 612 (similar to valve 112 in 2 ). In the flow direction S after (e.g., immediately after) the pump 610, which represents a significant FIV source, a multi-pipe section 618 is arranged to increase fluid damping. In addition, in the flow direction S before (e.g., immediately before) each of the position-sensitive components 602, a multi-pipe section 618 is arranged to reduce flow-induced vibration. The multi-pipe section 618 corresponds, for example, to one of the 2 and 3 shown multi-pipe sections 118, 118a, 118b, 118c, 118d.

In 10 is a cooling device 700 for cooling an optical or mechanical component 702 (similar to the position-sensitive component 102) of the projection exposure apparatus 1 from 1 according to another embodiment. The cooling device 700 includes a liquid line (e.g., cooling line) 704 for transporting a cooling liquid 106. The cooling device 700 also includes a cooling unit 708 (similar to the cooling unit 108 in 2 ), one or more pumps 710 (similar to pump 110 in 2 ) and one or more valves 712 (similar to valve 112 in 2 ) on.

In the flow direction S, downstream of (e.g., immediately downstream of) the pump 710, a multi-pipe section 718 is arranged to increase the fluid damping. The multi-pipe section 718 corresponds, for example, to one of the 2 and 3 shown multi-pipe sections 118, 118a, 118b, 118c, 118d. In addition, in the flow direction S upstream (e.g. immediately upstream) of the position-sensitive components 702, a multi-pipe section 718' similar to that shown in 4 shown multi-pipe section 218. The multi-pipe section 718' has, as shown in 4 The multi-pipe section 218 shown has a combined supply and discharge line 230, 232. The multi-pipe section 718' can, on the one hand, reduce flow-induced vibration in front of the position-sensitive component 702. Furthermore, a pressure gradient across the position-sensitive component 702 can be reduced.

Although the present invention has been described using exemplary embodiments, it can be modified in many ways.

LIST OF REFERENCE SYMBOLS

1

Projection exposure system

2

lighting system

3

light source

4

Lighting optics

5

Object field

6

Object level

7

Reticle

8

Reticle holder

9

Reticle displacement drive

10

Projection optics

11

Image field

12

Image plane

13

wafers

14

Wafer holder

15

Wafer relocation drive

16

Illumination radiation

17

collector

18

Intermediate focal plane

19

Deflecting mirror

20

first faceted mirror

21

first facet

22

second facet mirror

23

second facet

100

Cooling device

102

component

104

Liquid line

106

liquid

108

Cooling unit

110

pump

112

valve

114

circulation

116

redirection

118

Multi-pipe section

118a, 118b

Multi-pipe section

118c, 118d

Multi-pipe section

120

Pipe

120a, 120b

Pipe

120c, 120d

Pipe

122

partition

122a, 122b

partition

122c, 122d

partition

124

Single pipe

124a, 124b

Single pipe

124c, 124d

Single pipe

126

elastic material

128a, 128b

Wall

128c, 128d

Wall

218

Multi-pipe section

222

partition

224

Single pipe

226

elastic material

230

supply pipe

232

drainage pipe

300, 300'

Cooling device

302

component

304, 304'

Liquid line

334

Line section

336

Line section

338

Line section

340

Line section

342

Line section

344

Line section

346

Area

400

Cooling device

402

component

404

Liquid line

450

Line section

452

Line section

454

Interior

456

Body

458

Damping component

500

Cooling device

504

Liquid line

506

coolant

560

Silencer device

562

Silencer device

564

liquid chamber

566

gas chamber

568

Separation membrane

570

gas

572

neck section

574

Line section

576

Line section

578

Line section

600

Cooling device

602

component

604

Liquid line

608

Cooling unit

610

pump

612

valve

618

Multi-pipe section

700

Cooling device

702

component

704

Liquid line

708

Cooling unit

710

pump

712

valve

718, 718'

Multi-pipe section

ax, ay, az

acceleration

A1-A6

Direction

D1, D2

diameter

G1, G2

group

l1-l6

length

Lx, Ly, Lz

length

M1-M6

Mirror

S

Direction

S1, S2

Procedural steps

t

Time

Vx, Vy, Vz

Vibration excitation

x

Direction

y

Direction

z

Direction

QUOTES CONTAINED IN THE DESCRIPTION

This list of documents submitted by the applicant was generated automatically and is included solely for the convenience of the reader. This list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 10 2008 009 600 A1 [0091, 0095]
• US 2006/0132747 A1 [0093]
• EP 1 614 008 B1 [0093]
• US 6,573,978 [0093]
• DE 10 2017 220 586 A1 [0098]
• US 2018/0074303 A1 [0112]

Claims (14)

Cooling device (100) for cooling a position-sensitive component (102) of a lithography system (1), comprising a liquid line (104) for transporting a cooling liquid (106) to the position-sensitive component (102), wherein the liquid line (104) has at least one multi-pipe section (118) in which a pipe (120) of the liquid line (104), viewed in cross section, is segmented by one or more partition walls (122) into a plurality of individual pipes (124), and the multi-pipe section (118) has an elastic material (126) for damping pressure fluctuations of the cooling liquid (106). Cooling device according to Claim 1 , wherein the one or more partition walls (122) of the multi-pipe section (118) comprise the elastic material (126), an outer wall (128) of the multi-pipe section (118) comprises the elastic material (126) and/or the multi-pipe section (118) is made of the elastic material (126). Cooling device according to Claim 1 or 2 , wherein at least a first (230) of the plurality of individual tubes (224) is configured to supply cooling liquid (106) to the position-sensitive component (102), at least a second (232) of the plurality of individual tubes (224) is configured to discharge cooling liquid (106) from the position-sensitive component (102), and the one or more partition walls (222) which separate the at least one first and the at least one second individual tube (230, 232) from one another comprise the elastic material (226). Cooling device (300) for cooling a position-sensitive component (302) of a lithography system (1), comprising a liquid line (304) with a plurality of fluid-connected line sections (334-344) for transporting a cooling liquid (106) to the position-sensitive component (302), wherein a longitudinal direction (A1-A6) of a respective line section (334-344) is arranged parallel to an x-, y- or z-direction (x, y, z), the x-, y- and z-directions (x, y, z) are mutually perpendicular spatial directions, and a total length (L _x ) of all x-line sections (334, 338, 340, 344) arranged parallel to the x-direction (x), a total length (L _y ) of all y-line sections arranged parallel to the y-direction (y) (336, 342) and/or a total length (L _y ) of all z-line sections arranged parallel to the z-direction (z) is/are set up accordingly in the x-direction (x), the y-direction (y) and/or the z-direction (z) based on predetermined mechanical vibration excitations (V _x , _{V y} , V z ) of the liquid line (304). Cooling device according to Claim 4 , wherein the total length (L _x ) of all x-line sections (334, 338, 340, 344), the total length (L _y ) of all y-line sections (336, 342) and/or the total length (L _z ) of all z-line sections is/are set up based on the predetermined mechanical vibration excitations (V _x , V _y , V _z ) of the liquid line (304) in the x-direction (x), the y-direction (y) and/or the z-direction (z) in such a way that a large predetermined acceleration (a _x , a _y , a _z ) of the liquid line (304) due to the vibration excitation (V _x , V _y , V _z ) of the liquid line (304) in a corresponding direction (x, y, z) with a small total length (L _x , L _y , L _z ) of the line sections (334-344) arranged parallel to the corresponding direction (x, y, z). Cooling device according to Claim 4 or 5 , wherein the plurality of fluid-connected line sections (334-344) comprise a first group (G1) of fluid-connected supply line sections (334, 336, 338) for supplying the cooling liquid (106) to the position-sensitive component (302) and a second group (G2) of fluid-connected discharge sections (340, 342, 344) for discharging the cooling liquid (106) from the position-sensitive component (302), at least one supply line section (338) of the first group (G1) and at least one discharge section (340) of the second group (G2) is in mechanical contact with an outer surface (346) of the position-sensitive component (302), for a total pressure p _G1 (t) of the first group (G1) on the position-sensitive component (302) the following applies: $${\text{p}}_{\text{G1}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x1}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y1}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z1}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right],$$

for a total pressure p _G2 (t) of the second group (G2) on the position-sensitive component (302) applies: $${\text{p}}_{\text{G2}}\left(\text{t}\right)=\frac{1}{2}\cdot \mathrm{\rho }\cdot \left[{\text{L}}_{\text{x2}}\cdot {\text{a}}_{\text{x}}\left(\text{t}\right)+{\text{L}}_{\text{y2}}\cdot {\text{a}}_{\text{y}}\left(\text{t}\right)+{\text{L}}_{\text{z2}}\cdot {\text{a}}_{\text{z}}\left(\text{t}\right)\right],$$

ρ denotes a density of the cooling liquid (106), L _x1 , L _y1 and L _z1 denote a respective total length corresponding to the x-, y- and z-line sections (334, 336, 338) of the first group (G1), L _x2 , L _y2 and L _z2 denote a respective total length corresponding to the x-, y- and z-line sections (340, 342, 344) of the second group (G2), a _x (t) denotes the acceleration in the x-direction (x), a _y (t) denotes the acceleration in the y-direction (y) and a _z (t) denotes the acceleration in the z-direction (z), and the total lengths L _x1 , L _y1 , L _z1 , L _x2 , L _y2 and L _z2 depend on the predetermined accelerations a _x (t), a _y (t) and a _z (t) are arranged such that the total pressure p _G1 (t) of the first group (G1) at least partially compensates the total pressure p _G2 (t) of the second group (G2). A cooling device (400) for cooling a position-sensitive component (402) of a lithography system (1), comprising a liquid line (404) for transporting a cooling liquid (106) to the position-sensitive component (402), wherein the liquid line (404) has a first line section (450) with a first line diameter (D1) that is configured to extend into an interior (454) of the position-sensitive component (402), and a second line section (452) fluidically connected to the first line section (450) with a second line diameter (D2), that is configured to be arranged farther away from the position-sensitive component (402) than the first line section (450) with respect to a flow direction (S) of the cooling liquid (106), and the first line diameter (D1) is larger than the second line diameter (D2). Cooling device according to Claim 7 , wherein a damping component (458) for damping a pressure fluctuation of the cooling liquid (106) is arranged between the first and second line sections (450, 452). Cooling device (500) for cooling a position-sensitive component (102) of a lithography system (1), comprising: a liquid line (504) for transporting a cooling liquid (506) to the position-sensitive component (102), and a first and a second silencer device (560, 562) for dampening a pressure fluctuation of the cooling liquid (506), wherein each of the first and second silencer devices (560, 562) has a liquid chamber (564) fluidly connected to the liquid line (504), a gas chamber (566) for receiving a gas (570), and an elastic separating membrane (568) separating the gas chamber (566) from the liquid chamber (564), the liquid line (504) has at least one first line section (574, 576) with a first line diameter (D1) which, in the flow direction (S) of the Cooling fluid (506) is arranged upstream and/or downstream of the first and second silencer devices (560, 562), and a second line section (578) fluidically connected to the at least one first line section (574, 576) and having a second line diameter (D2), which is arranged between the first and second silencer devices (560, 562), and the first line diameter (D1) is larger than the second line diameter (D2). Lithography system (1), in particular EUV lithography system, with a cooling device (100, 300, 400, 500) according to one of the Claims 1 until 9 . Lithography system (1) according to Claim 10 , comprising a position-sensitive component (102). Lithography system (1) according to Claim 11 , wherein the cooling device (600) comprises: at least one source (610) for flow-induced vibrations, and at least one multi-tube section (618) according to one of the Claims 1 until 3 , and/or at least two silencer devices (560, 562) according to Claim 9 , and wherein the at least one multi-pipe section (618) and/or the at least two silencer devices (560, 562) are arranged downstream, in particular directly downstream, of the at least one source (610) for flow-induced vibrations, as seen in the flow direction (S) of the cooling liquid (106). Lithography system (1) according to Claim 11 or 12 , wherein at least one multi-pipe section (118, 618, 718') according to one of the Claims 1 until 3 and/or at least two silencer devices (560, 562) according to Claim 9 is/are arranged in front of, in particular directly in front of, the position-sensitive component (102, 602, 702) as seen in the flow direction (S) of the cooling liquid (106). Method for producing a cooling device (300) according to one of the Claims 4 until 6 for cooling a position-sensitive component (302) of a lithography system (1), wherein the cooling device (300) has a liquid line (304) with a plurality of fluid-connected line sections (334-344) for transporting a cooling liquid (106) to the position-sensitive component (302), a longitudinal direction (A1-A6) of a respective line section (334-344) is arranged parallel to an ^x- , y- ^, or z-direction (x, y, z), and the ^x- , y- ^, and z-directions (x, y, z) are mutually perpendicular spatial directions, comprising the steps of: a) determining (S1) one or more mechanical vibration excitations (V _x , V _y , V _z ) of the liquid line (304) in the x-direction (x), the y-direction (y), and/or the z-direction (z), and b) producing (S2) the liquid line (304) such that a total length (L _x ) of all x-line sections (334, 338, 340, 344) arranged parallel to the x-direction (x), a total length (L _y ) of all y-line sections (336, 342) arranged parallel to the y-direction (y) and/or a total length (L _z ) of all z-line sections arranged parallel to the z-direction (z) is/are set up accordingly in the x-direction (x), the y-direction (y) and/or the z-direction (z) based on the determined mechanical vibration excitations (V _x , V _y , V _z ) of the liquid line (304).

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