DE102022203758A1 - CONNECTING COMPONENTS OF AN OPTICAL DEVICE - Google Patents

Abstract

The present invention relates to an optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element unit (109), in particular a facet element unit, a support device (110) and a deformation device (111). The optical element unit (109) has an optical element (109.1) with an optical surface (109.2). The support device (110) is designed to support the optical element unit (109) on a support structure (112) in such a way that the optical element unit (109) with respect to the support structure (112) in a positioning process in at least one degree of freedom, in particular a rotational degree of freedom, can be adjusted from a starting position. The deformation device (111) is designed to deform the optical surface (109.2), wherein the deformation device (111) has a first connection region (111.1) and a second connection region (111.2) and a deformation force flow from the first connection region (111.1) to the second connection area (111.2) defined. The first connection region (111.1) is arranged at a drive end of the deformation device (111) and is designed to be connected to the support device (110) or the support structure (112) at a first connection point (111.5). The second connection region (111.2) is arranged at an output end of the deformation device (111) and is connected to the optical element unit (109) at a second connection point (111.6). The deformation device (111) has a third connection region (111.3), which is arranged in the direction of the deformation force flow between the first connection region (111.1) and the second connection region (111.2). The third connection area (111.3) is connected to the optical element unit (109) or the support device (110) at a third connection point (111.8), the third connection point (111.8) being arranged in such a way that the third connection point (111.8) during the positioning process experiences a first relative movement to the first connection point (111.5). The deformation device (111) is a, in particular passive, gear device which is designed to convert the first relative movement into a second relative movement between the second connection point (111.6) and the third connection point (111.8) during the position adjustment process, wherein during the second relative movement the deformation device (111) at the second connection point (111.6) introduces a deformation load into the optical element unit (109), which causes a deformation of the optical surface (109.2).

Description

BACKGROUND OF THE INVENTION

The present invention relates to an optical arrangement for microlithography which is suitable for the use of useful UV light, in particular light in the extreme ultraviolet (EUV) range. The invention further relates to an optical module, in particular a facet mirror, and an optical imaging device with such an optical module. The invention can be used in connection with any optical imaging method. It can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used for this purpose (for example optical masks).

Typically, the optical systems used in connection with the fabrication of such microelectronic circuits include a variety of optical element modules, which include optical elements such as lenses, mirrors, gratings, etc., arranged in the path of the light. These optical elements typically cooperate in an exposure process to illuminate a pattern formed on a mask, reticle, or the like and to transfer an image of that pattern to a substrate such as a wafer. The optical elements are usually combined in one or more functionally different optical element groups, which can be held within different optical element units. Facet mirror devices such as those mentioned above can serve, among other things, to homogenize the exposure light beam, i.e. H. in order to achieve the most even possible power distribution within the exposure light beam. They can also be used to provide any desired specific power distribution within the exposure light beam.

Due to the ongoing miniaturization of semiconductor devices, there is not only a constant need for improved resolution, but also a need for improved accuracy of the optical systems used to produce these semiconductor devices. Of course, this accuracy does not only have to be present initially, but must be maintained throughout the entire operation of the optical system. A problem in this context is the most precise possible power distribution or intensity distribution within the exposure light beam, which corresponds as closely as possible to a desired power distribution in order to ultimately avoid or at least reduce undesirable imaging errors. In order to enable the most sensitive power distribution possible, it is therefore desirable to reduce the optical area of the individual facet elements and to increase the number of facet elements, ultimately increasing the “resolution” of the facet mirror.

In order to achieve a desired power distribution, facet mirror devices were developed, such as those in DE 102 05 425 A1 (Holderer et al.), the entire disclosure of which is incorporated herein by reference. The DE 102 05 425 A1 (Holderer et al.) shows, among other things, facet mirror devices in which facet elements with a spherical rear surface sit in an assigned recess within a carrier element. The spherical rear surface rests on a corresponding spherical wall or several contact points of the support element delimiting this recess. The spherical back surface has a comparatively small radius of curvature so that it defines a center of rotation of the facet element that is far away from a center of curvature of the optical surface of the facet element. An operating lever is centrally connected to the back of the facet element and corresponding manipulators tilt the operating lever, ie produce lateral deflections of the free end of the operating lever in order to adjust both the position and the orientation of the optical surface of the facet.

A similar adjustment principle is also from the WO 2012/175116 A1 (Vogt et al.), the entire disclosure of which is incorporated herein by reference. Here too, an elongated operating lever is attached to the back of the facet element. The tilting of the optical surface of the facet element is also achieved here by a lateral deflection of an actuating lever transversely to its longitudinal axis.

These designs have the disadvantage that an adjustment of the position (i.e. the position and/or orientation in at least one degree of freedom up to all degrees of freedom in space) of the optical surface of the facet element can increase an optical imaging error of the entire imaging device. Typically, such adjustment movements have a primarily disadvantageous effect on the focusing and the coma of the imaging device.

BRIEF SUMMARY OF THE INVENTION

The invention is therefore based on the object of providing an optical arrangement of an imaging device for microlithography, a corresponding optical module and a corresponding optical imaging device with a such an arrangement, to provide a method for supporting an optical element and an optical imaging method, which does not have the aforementioned disadvantages or at least to a lesser extent and in particular to achieve at least a reduction in the imaging errors caused by a Adjustment of the optical element is required.

The invention solves this problem with the features of the independent claims.

The invention is based on the technical teaching that good compensation for imaging errors can be achieved in a simple manner by adjusting the position (i.e. the position and/or orientation in at least one degree of freedom up to all degrees of freedom in space) of the optical surface can be achieved if the imaging error is at least partially compensated for by a deformation of the optical surface, the deformation being achieved by a deformation device which forcibly couples a relative movement that results from adjusting the position of the optical surface between two components of the arrangement into one Movement on the optical element is implemented. The movement on the optical element results from a deformation load that is introduced into the optical element by the deformation device. This deformation load on the optical element causes a deformation of the optical surface, which at least partially (preferably, of course, at least substantially completely) compensates for the imaging error caused by the positional adjustment of the optical element or the optical surface. Depending on the design of the deformation device, the deformation load can be a pure deformation force or a pure deformation moment or a combination thereof.

In other words, a forced deformation is simply superimposed on the rigid body movement of the optical element (i.e. the change in position of the non-forcibly deformed optical element) by the deformation device, which at least partially compensates for the imaging error caused by the pure rigid body movement. The forced coupling between the rigid body movement and the deformation is of course preferably coordinated with the imaging error caused by the pure rigid body movement, whereby the compensation can be coordinated in such a way that the compensation occurs continuously (i.e. is present to a sufficient extent in every position that deviates from the defined initial position) or is specifically tailored or optimized only for one or more discrete and predefinable positions or positioning situations (deviating from the defined initial position). Such defined positioning situations can, for example, be required or provided for so-called setting changes of the imaging device. In the different (typically discrete) settings, a corresponding, at least partial correction of the imaging error caused by the rigid body movement is then carried out.

According to one aspect, the invention therefore relates to an optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element unit, in particular a facet element unit, a support device and a deformation device. The optical element unit has an optical element with an optical surface. The support device is designed to support the optical element unit on a support structure in such a way that the optical element unit can be adjusted from an initial position with respect to the support structure in a position adjustment process in at least one degree of freedom, in particular a rotational degree of freedom. The deformation device is designed to deform the optical surface, wherein the deformation device has a first connection region and a second connection region and defines a deformation force flow from the first connection region to the second connection region. The first connection region is arranged at a drive end of the deformation device and is designed to be connected to the support device or the support structure at a first connection point. The second connection area is arranged at an output end of the deformation device and connected to the optical element unit at a second connection point. The deformation device further has a third connection area, the third connection area being arranged in the direction of the deformation force flow between the first connection area and the second connection area. The third connection area is connected to the optical element unit or the support device at a third connection point, the third connection point being arranged in such a way that the third connection point experiences a first relative movement to the first connection point during the position adjustment process. The deformation device is a, in particular passive, gear device which is designed to convert the first relative movement into a second relative movement between the second connection point and the third connection point during the position adjustment process, wherein during the second relative movement a deformation load is applied by the deformation device at the second connection point the optical element unit is initiated, which causes a deformation of the optical surface.

With such a design, in particular the simple (preferably purely passive) gear device, a forced deformation of the optical surface can be achieved in a simple manner, which at least partially compensates for the imaging error caused by the adjustment of the position of the optical element unit or the rigid body movement of the optical Element unit and its optical surface is created. The deformation device simply uses a relative movement that results from adjusting the position of the optical surface between two components of the arrangement, the position adjustment of the optical surface in turn resulting from the actuating load introduced into the optical element unit for this purpose. This relative movement between the two components (resulting from the actuating load) is simply converted by the gear device into a deformation load on the optical element, into which the optical element is introduced. The deformation load on the optical element then causes a forced deformation of the optical surface, which is accompanied by the second relative movement and at least partially (preferably, of course, at least substantially completely) compensates for the imaging error generated by the position adjustment of the optical element or the optical surfaces.

Consequently, the deformation device is preferably designed such that the deformation of the optical surface achieved by the deformation device at least counteracts an imaging error in the optical arrangement that is caused by the position adjustment process. The deformation of the optical surface achieved by the deformation device preferably at least substantially completely compensates for the imaging error. The coordination or optimization of the deformation to the adjustment from the starting position can be designed to be continuous, at least in sections, so that the imaging error is at least partially, preferably substantially completely, compensated for with each deflection (from the starting position) via the position adjustment process. In certain variants, the coordination or optimization of the deformation can only take place based on discrete, predeterminable adjustments or deflections from the initial position, so that the greatest possible compensation for the imaging error is achieved in these discrete positions.

The compensated imaging error can be imaging errors of one or more types (individually or in any combination) that have at least a significant negative impact on the quality of the image. It is particularly advantageous if the compensated imaging error affects at least one of the following properties: focusing, coma or any combinations thereof.

In certain variants, the position adjustment process causes a defocusing of the optical arrangement and the deformation of the optical surface achieved by the deformation device causes a change in the focusing of the optical surface, which at least counteracts the defocusing of the optical arrangement, in particular at least substantially compensates for the defocusing. This makes it easy to advantageously compensate for a frequently occurring imaging error.

It is understood that the forced deformation can in principle be achieved by relative movements of appropriate magnitude on the optical element unit, which are accompanied by deformation forces of appropriate magnitude. In principle, the deformation device can generate any suitable motion translation between the first relative movement and the second relative movement with a predeterminable motion translation ratio of the first to the second relative movement. The respective relative movement can basically be of any type, i.e. a pure translation (in one to three degrees of freedom), a pure rotation (in one to three degrees of freedom) or any combinations thereof. Preferably, the first relative movement (preferably at least primarily) comprises a first displacement of the first connection point with respect to the third connection point in a first direction, while the second relative movement (preferably at least primarily) comprises a second displacement of the second connection point with respect to the third connection point in a second direction. In certain favorable variants, the motion transmission ratio is preferably 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, whereby the ratio can in particular also be 1:1. In certain favorable variants, the ratio of the first shift to the second shift is still 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, the ratio in particular also being 1:1 can be. In both cases, favorable and needs-based deformations can be achieved.

It is understood that when converting the first relative movement into the second relative movement, any conversion of the direction of the movement between the drive end and the output end can in principle also take place. In certain preferred variants, the first relative movement (preferably at least primarily) comprises a first displacement of the first connection point with respect to the third connection point in a first direction, while the second relative movement (preferably at least primarily) comprises a second displacement of the second connection point with respect to the third connection point in a second direction. In certain variants, the first direction is preferably inclined to the second direction by an angle of inclination, the angle of inclination being in particular 0° to 20°, preferably 0° to 10°, more preferably 0° to 5°. This makes it possible to achieve a favorable movement or force deflection, with which a corresponding deformation can be achieved in a simple manner at suitable deformation force introduction points with favorable deformation force introduction.

In certain variants, the deformation device is arranged and designed such that the first direction and the second direction lie at least essentially in a common plane. With such a planar design, a particularly compact design with precise motion translation can be realized, since the components, at least primarily, only have to absorb loads in the common plane and can therefore be designed simply but still sufficiently rigid for the planar load cases.

In certain advantageous variants, the deformation device is arranged and designed in such a way that, starting from the starting position, opposing first displacements of the first connection point with respect to the third connection point along the first direction cause opposite or parallel second displacements of the second connection point with respect to the third connection point along the second direction.

Opposing second displacements can advantageously be used to deal with situations in which position adjustment processes in different directions (from the initial position) produce imaging errors that must be compensated for by opposing deformations. For example, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process in one direction (from the initial position) requires an increase in the curvature of the optical surface, while a position adjustment process in the opposite direction (from the initial position) requires a reduction in curvature the optical surface requires.

Second displacements in the same direction can advantageously be used to deal with situations in which position adjustment processes in different directions (from the initial position) produce imaging errors which, regardless of this, always have to be compensated for by deformations in the same direction. For example, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process requires an increase (or reduction) in the curvature of the optical surface, regardless of the direction of the deflection (from the initial position).

It goes without saying that the optical element unit can basically be designed in any way, as long as it enables a deformation of the optical surface corresponding to the imaging error to be compensated via the forced coupling of the deformation device described herein. In certain advantageous variants, the support device defines at least one tilting axis of the optical element unit, about which the optical surface is tilted during the positioning process, while the optical element unit comprises a projection pointing away from the optical surface, the projection having a free end which extends from the is at least one tilt axis away. The third connection point is arranged in the area of the free end of the projection, so that when the optical element unit is tilted about the tilting axis, a comparatively large and therefore advantageous deflection (from the starting position) is achieved in the area of the free end of the projection and thus of the third connection point.

The optical element unit can be designed in one piece or in several parts. In certain variants, the optical element unit has an element carrier which carries the optical element and forms the projection. The optical element itself can only be formed by a (single or multi-layer) coating of the element carrier, whereby an advantageously simple design can be achieved. Likewise, the optical element can have a separate element body on which the optical surface is formed (for example by a corresponding coating) and which is connected to the element carrier in a suitable manner.

The geometry of the optical element unit can in principle be arbitrary. In certain advantageous variants, the optical element unit has a substantially T-shaped or L-shaped design with a first leg and a second leg, the optical surface being formed on the first leg and the projection being formed by the second leg. This makes it possible to achieve configurations in terms of weight and rigidity that are particularly advantageous from a dynamic point of view (as is important, for example, for quick and precise setting changes).

It goes without saying that the deformation device can basically be designed in any way in order to achieve the desired deformation that is forcibly coupled to the position adjustment process. In principle, any operating principles can be used to convert movement or force. For example, mechanical, hydraulic, magnetic or electrical (for example piezoelectric) operating principles can be used (individually or in any combination).

In preferred variants, the deformation device comprises a deformation unit which is designed in the manner of a coupling mechanism, wherein the deformation unit comprises a first coupling unit, a second coupling unit and a third coupling unit. The first coupling unit forms the first connection area, while the second coupling unit forms the second connection area. The third coupling unit forms the third connection region, with at least the third coupling unit being designed to define a movement transmission ratio of the first relative movement to the second relative movement. This makes it possible to achieve a particularly simple, preferably purely mechanical, forced coupling of the deformation to the position adjustment.

The movement implementation can in principle be carried out in any suitable way. Rotational and translational movements can be combined with each other as desired. In certain variants, the third coupling unit comprises at least one rotation unit, which is designed to convert a movement of the first coupling unit into a rotational movement about a rotation axis. In certain variants, the third coupling unit comprises at least one parallel guide unit, which is designed to convert a movement of the first coupling unit into a translational movement. The third coupling unit can comprise at least one coupling element which is connected to the optical element unit in the area of the third connection point, since particularly simple configurations can be achieved with this. The first, second and third coupling units preferably define a common main extension plane of the deformation unit and extend at least substantially parallel to the main extension plane, in particular substantially in the main extension plane. With such a planar design, a particularly simple and robust configuration can be achieved.

In certain, particularly simple and robust variants, the deformation unit is designed to be monolithic, at least in sections, in particular completely. At least one joint section of the deformation unit can be designed in the manner of a solid-state joint. All joint sections of the deformation unit are preferably designed in the manner of a solid-state joint. This makes it possible to achieve particularly precise movement or force conversion.

In certain, particularly simply designed variants, the at least one coupling element of the third coupling unit comprises at least one rotation element which is designed to convert a movement of the first coupling unit into a rotational movement about the axis of rotation. The at least one coupling element defines a rotation element circumferential direction and a rotation element radial direction, which runs perpendicular to the rotation axis.

The axis of rotation can run at least essentially perpendicular to a plane that is spanned by the first, second and third connection points. This results in a simple coupling in which, in the case of the above-mentioned planar design, the rotational movement also takes place in the main extension plane.

In certain variants, the rotation element comprises a, in particular pin-shaped, rotation axis section which defines the rotation movement about the rotation axis, the rotation axis section being designed in particular to provide the rotation movement around the rotation axis by elastic torsion of the rotation axis section around the rotation axis. This allows a particularly simple and compact configuration to be achieved.

The rotation element can basically be designed in any way to achieve the desired movement implementation. In preferred variants, the rotation element comprises at least one lever section which extends in the rotation element radial direction. The first coupling unit is then connected to the lever section in the rotation element radial direction at a first distance from the rotation axis at a first lever coupling point, while a subsequent coupling element in the rotation element radial direction is connected to the lever section at a second distance from the rotation axis at a second lever coupling point is. This allows the transmission ratio of the movement conversion to be easily defined (via a suitable choice of the first and second distance). In particularly advantageous variants with a favorable transmission ratio, the ratio of the first distance to the second distance is preferably 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, whereby the ratio can in particular also be 1:1.

In certain variants, the first lever coupling point and the second lever coupling point are arranged offset from one another in the rotation element circumferential direction by a circumferential offset angle, the circumferential offset angle being in particular 0° to 180°, preferably 70° to 160°, more preferably 80° to 110°. Thanks to such an offset in the circumferential direction of the rotation element, almost any directional conversion between the input movement and the output movement on the rotation element can be achieved.

The lever section can in principle be designed in any suitable way, in particular in order to achieve the desired leverage ratios and the desired directional conversion with sufficient rigidity. Preferably, the at least one lever section is at least one of the following: a substantially plate-shaped element, a substantially disk-shaped element, a substantially circular disk-shaped element, a substantially circular segment-shaped element, a substantially triangular element.

Particularly compact and light configurations result when the at least one lever section has a plurality of corner sections on its circumference and at least one of the first lever coupling point, the second lever coupling point and the rotation axis section is arranged in the area of one of the corner sections. Preferably, each of these components is arranged in a separate corner section.

It is understood that the directional conversion between the input movement and the output movement on the rotation element can basically be designed in any way and is adapted accordingly to the geometric boundary conditions of the optical element unit, in particular to the deformation to be achieved. Preferably, a leading coupling element in the direction of the deformation force flow engages the rotation element in a first rotation element coupling point, while a subsequent coupling element in the direction of the deformation force flow engages the rotation element in a second rotation element coupling point. The subsequent coupling element has a subsequent coupling pivot point which, in a kinematic chain of the deformation device, immediately follows the second rotation element coupling point in the direction of the deformation force flow. This makes it possible to implement a favorable movement in a particularly simple manner. In the initial position, there is preferably an optical surface that is essentially not deformed by the deformation device.

The leading coupling element is preferably designed and arranged in such a way that, at least at the start of the position adjustment process, it initiates an initial displacement into the rotating element from the starting position, which is inclined to the rotating element radial direction in the first rotating element coupling point by a leading inclination angle, the leading inclination angle being in particular 70° to 90° , preferably 75° to 89°, more preferably 80° to 85°. This makes it possible to achieve a particularly favorable introduction of movement or introduction of force into the rotation element.

In certain variants, the subsequent coupling element is designed and arranged in such a way that a connecting line between the subsequent coupling pivot point and the second rotation element coupling point in the starting position is inclined to the rotation element radial direction in the second rotation element coupling point by a caster inclination angle, the caster inclination angle being in particular 0° to 20°, preferably 1 ° to 15°, more preferably 5° to 10, in particular 0°. In both cases, particularly favorable output ratios can be achieved.

With the design in which the caster angle of inclination (in the starting position) is 0°, the design already described above can be realized in particular, in which, starting from the starting position, opposite first displacements of the first connection point with respect to the third connection point along the first direction, parallel second displacements of the second connection point with respect to the third connection point along the second direction. This can be used to advantageously handle situations in which position adjustment processes in different directions (from the initial position) produce imaging errors which, regardless of this, always have to be compensated for by deformations in the same direction. As mentioned, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process requires an increase (or reduction) in the curvature of the optical surface, regardless of the direction of the deflection (from the initial position).

It is also possible to allow the caster inclination angle to pass through the zero point (i.e. 0°) in one direction when adjusting the position from the starting position. This makes it possible to with the same amplitude of the position adjustment from the starting position in both directions to achieve a simultaneous deformation of different strength or amplitude (provided that the caster inclination angle passes through the zero point in one direction).

It goes without saying that a single rotation unit can be sufficient to achieve the desired movement conversion or force conversion. In certain variants, however, the deformation unit comprises two or more rotation units, since this enables in particular a favorable adaptation of the deformation unit to the geometric boundary conditions of the optical arrangement, in particular of the optical element unit. The rotation unit is therefore preferably a first rotation unit and the third coupling unit comprises at least one second rotation unit, the second rotation unit being connected to the first rotation unit via a further coupling element. The second rotation unit is designed to convert a movement mediated by the further coupling element into a further rotational movement.

The second rotation unit can basically have any design. It is preferably designed in the manner of the first rotation unit, in particular being designed at least essentially identical to the first rotation unit, at least with regard to its geometry, preferably also with regard to its dimensions. In this respect, with regard to the features, properties and functions of the second rotation unit, reference is made to the above statements on the (first) rotation unit.

The second coupling unit can be connected to the second rotation unit in any way. Preferably, the second coupling unit is connected in an articulated manner to the second rotation unit, since this allows particularly compact configurations to be achieved in which the movement implementation can take place at least primarily via a longitudinal movement of the second coupling unit.

In certain variants, the second rotation unit defines a further rotation axis of the further rotation movement, wherein the further rotation axis runs at least substantially parallel to the rotation axis of the first rotation unit or the further rotation axis runs inclined to the rotation axis of the first rotation unit. In the case of parallel axes of rotation, a planar design already described above can be realized. In the case of mutually inclined rotation axes, any three-dimensional design of the deformation unit can be implemented if this is necessary, for example, due to the geometric boundary conditions of the optical arrangement, in particular the optical element unit.

In certain variants, the optical element unit is designed in the manner described above with a first and second leg, the first rotation unit then being connected to the optical element unit in the area of the free end of the second leg and the second rotation unit in the area of a transition between the first Leg and the second leg is connected to the optical element unit. This makes it possible to achieve a particularly compact and inexpensive configuration. Likewise, in the design described above with a first and second leg, the second coupling unit can extend adjacent to the first leg along the first leg and the further coupling element can extend adjacent to the second leg along the second leg. This also makes it possible to achieve a particularly compact and inexpensive configuration.

It is understood that one deformation unit may be sufficient to achieve the desired deformation. In certain variants, however, two or more deformation units can also be provided. In certain variants, the deformation unit is therefore a first deformation unit, with the deformation device then comprising at least one second deformation unit. Not only can particularly complex deformations be achieved in this way, it is also possible to assign separate, possibly different, deformations of the optical surface to position adjustment processes from the initial position in different degrees of freedom.

The second deformation unit can basically have any design. Preferably, the second deformation unit is again designed in the manner of a coupling transmission. Furthermore, the second deformation unit can be designed in the manner of the first deformation unit, in particular being designed at least essentially identical to the first deformation unit, at least with regard to its geometry, preferably also with regard to its dimensions. In this respect, with regard to the features, properties and functions of the second deformation unit, reference is made to the above statements on the (first) deformation unit.

As already mentioned, the two deformation units can be coupled to one another, in particular mechanically coupled. In a particularly simple case, the first deformation unit and the second deformation unit can be coupled via a portal element to which the second coupling unit is then articulated.

The first and second deformation units can in principle be arranged in any way relative to one another. In certain variants, the first deformation unit defines a first main extension plane, while the second deformation unit defines a second main extension plane, wherein the first main extension plane and the second main extension plane run parallel to one another or are inclined to one another. With such a parallel course, different deformations of the optical surface can be assigned to a position adjustment process from the initial position in the same degree of freedom and superimposed to form a complex deformation. With the mutually inclined course, not only can particularly complex deformations be achieved, it is also possible to assign separate, possibly different, deformations of the optical surface to position adjustment processes from the initial position in different degrees of freedom.

In order to achieve the desired deformation of the optical surface or required to compensate for the imaging error, the optical element unit can in principle be adapted in any suitable manner which ensures a defined deformation. In certain variants, the optical element unit has a first section and a second section, with the support device engaging on the first section and the deformation device engaging with the second connection region on the second section. The first section and the second section are connected to one another via at least one deformation tilt axis section, wherein the at least one deformation tilt axis section is designed such that it defines at least one deformation tilt axis around which the second section relative to the first section when the optical surface is deformed by the deformation device is tilted. This makes it possible in a simple manner to achieve a defined, corresponding deformation of the optical surface.

It goes without saying that a single deformation tilting axis section may be sufficient to achieve the desired deformation. However, the first section and the second section are preferably connected to one another via a number of N deformation tilting axis sections, where N is 1 to 500, preferably 5 to 50, more preferably 10 to 20. In particular, this can ensure a sufficiently uniform curvature of the optical surface, if this is necessary. This can be particularly advantageous in order to avoid undesirable local light intensity concentrations in the vicinity of the respective deformation tilt axis section in the case of a reflecting optical surface, which results from the superimposition of the reflected light of the two immediately adjacent optical partial surfaces that are tilted relative to one another.

The deformation tilting axis section can be designed such that it only defines a single (correspondingly pronounced) deformation tilting axis. This results in a clearly defined deformation in a simple manner. In certain variants, however, the at least one deformation tilt axis section defines a number of M discrete deformation tilt axes, where M is 1 to 15, preferably 3 to 11, more preferably 5 to 7. This makes it possible, in particular, to generate tilts about several deformation tilt axes by introducing one or more deformation forces in the corresponding direction and thus to specify an almost arbitrarily complex deformation of the optical surface.

The deformation tilting axis section can in principle be implemented in any suitable manner, via which at least one deformation tilting axis can be defined. For example, through appropriate local material selection, structural weakening or other measures for the respective deformation tilt axis section, a corresponding stiffness distribution can be achieved in the optical element unit, which defines such a deformation tilt axis. In certain variants, the at least one deformation tilt axis section is formed by a weakening section in which the optical element unit is weakened. The weakening can, as just mentioned, be realized by a local reduction in the rigidity of the optical element unit.

In certain variants, the at least one deformation tilt axis section is formed by at least one recess, in particular at least one slot, in the optical element unit, since this allows a corresponding local structural weakening to be introduced into the optical element unit in a particularly simple manner in a precisely defined manner. The recess can basically be designed in any way. Preferably, the recess is at least essentially rectilinear, since this allows a deformation tilting axis to be precisely defined in a particularly simple manner.

In certain variants, the at least one deformation tilting axis section is formed by a plurality of recesses, in particular a plurality of slots, in the optical element unit, since this means that several deformations can be easily achieved tilting axes can be precisely defined. Particularly favorable designs that support complex deformations result when at least two of the recesses intersect each other.

It is understood that several (possibly all) deformation tilting axis sections can be designed the same and, in particular, can have the same properties. In certain advantageous variants, the first section and the second section are connected to one another via a plurality of spaced-apart deformation tilting axis sections, each deformation tilting axis section defining at least one deformation tilting axis and a deformation tilting stiffness around the at least one deformation tilting axis. In order to achieve a predeterminable deformation of the optical surface, the distance between adjacent deformation tilt axis sections can vary. Additionally or alternatively, for this purpose, the deformation tilting stiffness can vary from the first section to the second section. The deformation tilting stiffness can decrease from the first section towards the second section at least in a first partial area.

Likewise, the deformation tilting stiffness can increase from the first section towards the second section, at least in a second partial area. ;

In certain variants, a different deformation tilting stiffness of two deformation tilting axis sections is formed by at least one of the following: a different width of the recesses transverse to the deformation tilting axis and a different distance of the recesses from the optical surface. In both cases, a precise variation of the deformation tilting stiffness can be achieved in a simple manner.

It is understood that the alignment of the deformation tilting axis to the direction of the deformation force, which is introduced into the optical element unit by the deformation device, provides a further influencing parameter, which defines or influences the type and/or strength of the deformation of the optical surface can be. In certain variants, the deformation device is designed to introduce at least one deformation force in a deformation force direction into the second section during the position adjustment process, the at least one deformation tilt axis being inclined to the deformation force direction by a deformation tilt axis angle. The deformation tilt axis angle can be 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°, since particularly favorable configurations can be achieved in this way

In certain variants, the deformation device can be designed to introduce a first deformation force in a first deformation force direction and a second deformation force in a second deformation force direction into the second section during the position adjustment process, wherein at least one first deformation tilt axis is defined, which is at least substantially perpendicular to the first Deformation force direction runs, and at least one second deformation tilt axis is defined, which runs at least substantially perpendicular to the second deformation force direction. This makes it possible to achieve complex deformations in a particularly simple manner, in which, if necessary, multiple curved areas of the optical surface can be achieved or adjusted

It is understood that the support device can optionally only provide a position adjustment in a single (rotational or translational) degree of freedom in accordance with the requirements of the imaging device. In particularly well-adjustable variants, position adjustment in two or more degrees of freedom is possible. The support device is preferably designed to adjust the optical element unit with respect to the support structure in the position adjustment process in a first degree of freedom, in particular a first rotational degree of freedom, from the starting position. Furthermore, the support device is designed to adjust the optical element unit with respect to the support structure in the position adjustment process in a second degree of freedom, in particular a second rotational degree of freedom, from the starting position, the first degree of freedom being different from the second degree of freedom. The deformation device is then preferably designed to cause a first deformation of the optical surface during the position adjustment process when adjusting the optical element unit in the first degree of freedom and to cause a second deformation of the optical surface that deviates from the first deformation when adjusting the optical element unit in the second degree of freedom cause.

Particularly favorable variants arise when the first deformation and the second deformation change a course of a curvature of the optical surface about different axes of curvature of the optical surface. In certain variants, the first deformation can change a course of a curvature of the optical surface about a first axis of curvature of the optical surface, while the second deformation can change a course of a curvature of the optical surface about a second axis of curvature of the optical surface changed. The first axis of curvature can be inclined to the second axis of curvature, in particular by 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°. It goes without saying that the deformation during position adjustment in the different degrees of freedom can in principle be achieved by a common deformation unit. In certain variants, the deformation device can comprise a first deformation unit and a second deformation unit, the first deformation unit being designed to effect the first deformation and the second deformation unit being designed to effect the second deformation.

The optical element unit or the optical surface can basically have any design. Its use is particularly advantageous in configurations in which the optical surface has an area of 5 mm ² to 50,000 mm ² , preferably 15 mm ² to 2,000 mm ² , more preferably 25 mm ² to 500 mm ² . The same applies to variants in which the optical surface has a maximum dimension of 0.5 mm to 500 mm, preferably 1 mm to 100 mm, more preferably 5 mm to 20 mm.

It is particularly favorable if the optical surface is at least one of the following: an at least simply curved surface, a spherical surface, an aspherical surface, a slim optical surface elongated along a main direction of extension, a slim optical surface which is curved along a main direction of extension. It can be used on any optical surface; it is particularly simple and inexpensive if the optical surface is a reflective surface.

The present invention further relates to an optical module, in particular a facet mirror, with at least two, in particular a plurality P, optical arrangements according to the invention. The optical arrangements can be connected to a common support structure. Furthermore, the plurality P can preferably be 5 to 1000, preferably 10 to 500, more preferably 10 to 100.

The present invention further relates to an optical imaging device, in particular for microlithography, with an illumination device with a first optical element group, an object device for recording an object, a projection device with a second optical element group and an image device, wherein the illumination device is designed to illuminate the object and the projection device is designed to project an image of the object onto the image device. The lighting device and/or the projection device comprises at least one optical module according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

The present invention further relates to a method for supporting an optical element unit, in particular a facet element unit, an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which the optical element unit, which has an optical element with an optical surface, is supported by means of a support device on a support structure in such a way that the optical element unit can be adjusted from an initial position with respect to the support structure in a positioning process in at least one degree of freedom, in particular a rotational degree of freedom. The optical surface is deformed via a deformation device, the deformation device having a first connection region and a second connection region and defining a deformation force flow from the first connection region to the second connection region. The first connection region is arranged at a drive end of the deformation device and connected to the support device or the support structure at a first connection point. The second connection region is arranged at an output end of the deformation device and connected to the optical element unit at a second connection point. A third connection region of the deformation device is arranged in the direction of the deformation force flow between the first connection region and the second connection region, the third connection region being connected to the optical element unit or the support device at a third connection point. The third connection point is arranged such that the third connection point experiences a first relative movement to the first connection point during the position adjustment process. The deformation device is a, in particular passive, gear device which converts the first relative movement into a second relative movement between the second connection point and the third connection point during the position adjustment process, a deformation load being introduced into the optical element unit by the deformation device during the second relative movement at the second connection point causes a deformation of the optical surface. This can also be used as described above in connection with the optical arrangement Implement variants and advantages to the same extent, so that reference is made to the above statements in order to avoid repetition.

Finally, the present invention relates to an optical imaging method, in particular for microlithography, in which an illumination device, which has a first optical element group, illuminates an object and a projection device, which has a second optical element group, projects an image of the object onto an image device. At least one optical element of the lighting device and/or the projection device is supported using a method according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

Further aspects and exemplary embodiments of the invention result from the dependent claims and the following description of preferred exemplary embodiments, which refers to the attached figures. All combinations of the disclosed features, regardless of whether they are the subject of a claim or not, are within the scope of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

• 1 is a schematic representation of a preferred embodiment of a projection exposure system according to the invention, which includes a preferred embodiment of an optical arrangement according to the invention.
• 2 is a schematic sectional view of part of the arrangement 1 (along the angled cutting line II-II 3 ) in its initial position.
• 3 is a schematic sectional view of part of the assembly 2 (along the angled section line III-III 2 ) in its initial position.
• 4 is a schematic view of the deformation device of the arrangement 2 and 3 .
• 5 is a schematic sectional view of part of the assembly 1 (along the angled cutting line II-II 3 ) in a position deflected from the starting position, which is reached at the end of a position adjustment process.
• 6 is a schematic view of a component of the deformation device of a further preferred embodiment of the optical arrangement according to the invention
• 7 is a schematic, generalized view of the deformation device 4 ).
• 8th is a schematic view of the deformation device of a further preferred embodiment of the optical arrangement according to the invention (similar to the view from 4 ).
• 9 is a schematic view of the deformation device of a further preferred embodiment of the optical arrangement according to the invention (similar to the view from 4 )...

DETAILED DESCRIPTION OF THE INVENTION

First embodiment

The following is with reference to the 1 until 6 a preferred embodiment of a projection exposure system 101 according to the invention for microlithography is described, which includes a preferred embodiment of an optical arrangement according to the invention. To simplify the following explanations, an x,y,z coordinate system is given in the drawings, with the z direction running parallel to the direction of the gravitational force. The x-direction and the y-direction are therefore horizontal, with the x-direction in the representation 1 runs vertically into the drawing plane. Of course, in further embodiments it is possible to choose any orientation that deviates from that of an x,y,z coordinate system.

Below we will initially refer to the 1 The essential components of a projection exposure system 101 are described as an example. The description of the basic structure of the projection exposure system 101 and its components is not intended to be restrictive.

A lighting device or a lighting system 102 of the projection exposure system 101 includes, in addition to a radiation source 102.1, an optical element group in the form of lighting optics 102.2 for illuminating an object field 103.1 (shown schematically). The object field 103.1 lies in an object plane 103.2 of an object device 103. A reticle 103.3 (also referred to as a mask) arranged in the object field 103.1 is illuminated. The reticle 103.3 is held by a reticle holder 103.4. The reticle holder 103.4 can be displaced in particular in one or more scanning directions via a reticle displacement drive 103.5. Such a scan In the present example, the direction runs parallel to the y-axis.

The projection exposure system 101 further comprises a projection device 104 with a further optical element group in the form of projection optics 104.1. The projection optics 104.1 is used to image the object field 103.1 into a (schematized) image field 105.1, which lies in an image plane 105.2 of an image device 105. The image plane 105.2 runs parallel to the object plane 103.2. Alternatively, an angle other than 0° between the object plane 103.2 and the image plane 105.2 is also possible.

During exposure, a structure of the reticle 103.3 is imaged onto a light-sensitive layer of a substrate in the form of a wafer 105.3, the light-sensitive layer being arranged in the image plane 105.2 in the area of the image field 105.1. The wafer 105.3 is held by a substrate holder or wafer holder 105.4. The wafer holder 105.4 can be displaced in particular along the y direction via a wafer displacement drive 105.5. The displacement on the one hand of the reticle 103.3 via the reticle displacement drive 103.5 and on the other hand of the wafer 105.3 via the wafer displacement drive 105.5 can take place synchronized with one another. This synchronization can be done, for example, via a shared (in 1 Control device 106 (shown only very schematically and without control paths).

The radiation source 102.1 is an EUV radiation source (extreme ultraviolet radiation). The radiation source 102.1 emits in particular EUV radiation 107, which is also referred to below as useful radiation or illumination radiation. The useful radiation in particular has a wavelength in the range between 5 nm and 30 nm, in particular a wavelength of approximately 13 nm. The radiation source 102.1 can be a plasma source, for example an LPP source (Laser Produced Plasma, i.e. using a Laser generated plasma) or a DPP source (Gas Discharged Produced Plasma, i.e. plasma generated by gas discharge). It can also be a synchrotron-based radiation source. The radiation source 102.1 can also be a free electron laser (free electron laser, FEL).

Since the projection exposure system 101 works with useful light in the EUV range, the optical elements used are exclusively reflective optical elements. In further embodiments of the invention, it is of course also possible (particularly depending on the wavelength of the illuminating light) to use any type of optical element (refractive, reflective, diffractive) alone or in any combination for the optical elements.

The illumination radiation 107, which emanates from the radiation source 102.1, is focused by a collector 102.3. The collector 102.3 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces. The at least one reflection surface of the collector 102.3 can be exposed to the illumination radiation 107 in grazing incidence (Grazing Incidence, Gl), i.e. with angles of incidence greater than 45°, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45° become. The collector 11 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.

After the collector 102.3, the illumination radiation 107 propagates through an intermediate focus in an intermediate focus plane 107.1. In certain variants, the intermediate focus plane 107.1 can represent a separation between the illumination optics 102.2 and a radiation source module 102.4, which includes the radiation source 102.1 and the collector 102.3.

The illumination optics 102.2 includes a deflection mirror 102.5 along the beam path and a downstream first facet mirror 102.6. The deflection mirror 102.5 can be a flat deflection mirror or, alternatively, a mirror with an effect that influences the bundle beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 102.5 can be designed as a spectral filter, which at least partially separates out so-called false light from the illumination radiation 107, the wavelength of which deviates from the useful light wavelength. If the optically effective surfaces of the first facet mirror 102.6 are arranged in the area of a plane of the illumination optics 102.2, which is optically conjugate to the object plane 103.2 as a field plane, the first facet mirror 102.6 is also referred to as a field facet mirror. The first facet mirror 102.6 comprises a large number of individual first facets 102.7, which are also referred to below as field facets. These first facets and their optical surfaces are in the 1 only strongly indicated schematically by the dashed contour 102.7.

The first facets 102.7 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour. The first facets 102.7 can be designed as facets with a planar or alternatively with a convex or concave curved optical surface.

Like, for example, from the DE 10 2008 009 600 A1 (the entire disclosure of which is incorporated herein by reference), the first facets 102.7 themselves can also each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 102.6 can in particular be designed as a microelectromechanical system (MEMS system), as is the case, for example, in FIG DE 10 2008 009 600 A1 is described in detail.

In the present example, the illumination radiation 107 runs horizontally between the collector 102.3 and the deflection mirror 102.5, i.e. along the y-direction. However, it is understood that a different orientation can also be selected for other variants.

A second facet mirror 102.8 is arranged downstream of the first facet mirror 102.6 in the beam path of the illumination optics 102.2. If the optically effective surfaces of the second facet mirror 102.8 are arranged in the area of a pupil plane of the illumination optics 102.2, the second facet mirror 102.8 is also referred to as a pupil facet mirror. The second facet mirror 102.8 can also be arranged at a distance from a pupil plane of the illumination optics 102.2. In this case, the combination of the first facet mirror 102.6 and the second facet mirror 102.8 is also referred to as a specular reflector. Such specular reflectors are known, for example, from US 2006/0132747 A1 , the EP 1 614 008 B1 or the US 6,573,978 (the entire disclosure of which is incorporated herein by reference).

The second facet mirror 102.8 in turn comprises a plurality of second facets, which are in the 1 are only strongly indicated schematically by the dashed contour 102.9. The second facets 102.9 are also referred to as pupil facets in the case of a pupil facet mirror. The second facets 102.9 can basically be designed like the first facets 102.7. In particular, the second facets 102.9 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal edges. Alternatively, the second facets 102.9 can be facets composed of micromirrors. The second facets 102.9 can in turn have planar or alternatively convex or concave curved reflection surfaces. In this regard, we refer again to the DE 10 2008 009 600 A1 referred.

In the present example, the lighting optics 102.2 thus forms a double-faceted system. This basic principle is also known as the fly's eye integrator. In certain variants, it can also be advantageous not to arrange the optical surfaces of the second facet mirror 102.8 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 104.1.

In a further, not shown, embodiment of the illumination optics 102.2, a transmission optics 102.10 (shown only in a highly schematic manner) can be arranged in the beam path between the second facet mirror 102.8 and the object field 103.1, which contributes in particular to the imaging of the first facets 102.7 into the object field 103.1. The transmission optics 102.10 can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 102.2. The transmission optics 102.10 can in particular include one or two mirrors for vertical incidence (NI mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GL mirror, grazing incidence mirror).

The lighting optics 102.2 has the design as shown in the 1 is shown, after the collector 102.3 exactly three mirrors, namely the deflection mirror 102.5, the first facet mirror 102.6 (e.g. a field facet mirror) and the second facet mirror 102.8 (e.g. a pupil facet mirror). In a further embodiment of the lighting optics 102.2, the deflection mirror 102.5 can also be omitted, so that the lighting optics 102.2 can then have exactly two mirrors after the collector 102.3, namely the first facet mirror 102.6 and the second facet mirror 102.8.

With the help of the second facet mirror 102.8, the individual first facets 102.7 are imaged into the object field 103.1. The second facet mirror 102.8 is the last beam-forming mirror or actually the last mirror for the illumination radiation 107 in the beam path in front of the object field 103.1. The image of the first facets 102.7 by means of the second facets 102.9 or with the second facets 102.9 and a transmission optics 102.10 into the object plane 103.2 is generally only an approximate image.

The projection optics 104.1 comprises a plurality of mirrors Mi, which are numbered according to their arrangement along the beam path of the projection exposure system 101. At the one in the 1 In the example shown, the projection optics 104.1 includes six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 can each have a (not shown) through have an entrance opening for the lighting radiation 107. In the present example, the projection optics 104.1 is a double-obscured optic. The projection optics 104.1 has an image-side numerical aperture NA that is greater than 0.5. In particular, the image-side numerical aperture NA can also be larger than 0.6. For example, the image-side numerical aperture NA can be 0.7 or 0.75.

The reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape. The mirrors Mi, just like the mirrors of the lighting optics 102.2, can have highly reflective coatings for the lighting radiation 107. These coatings can be made up of several layers (multilayer coatings), in particular they can be designed with alternating layers of molybdenum and silicon.

In the present example, the projection optics 104.1 has a large object image offset in the y-direction between a y-coordinate of a center of the object field 103.1 and a y-coordinate of the center of the image field 105.1. This object-image offset in the y-direction can be approximately as large as a distance between the object plane 103.2 and the image plane 105.2 in the z-direction.

The projection optics 104.1 can in particular be anamorphic. In particular, it has different imaging scales βx, βy in the x and y directions. The two imaging scales βx, βy of the projection optics 104.1 are preferably (βx; βy) = (+/- 0.25; +/- 0.125). A positive image scale β means an image without image reversal. A negative sign for the image scale β means an image with image reversal. In the present example, the projection optics 104.1 thus leads to a reduction in the x-direction, i.e. in the direction perpendicular to the scanning direction, in a ratio of 4:1. In contrast, the projection optics 104.1 in the y direction, i.e. in the scanning direction, leads to a reduction in size in a ratio of 8:1. Other image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions are also possible, for example with absolute values of 0.125 or 0.25.

The number of intermediate image planes in the x and y directions in the beam path between the object field 103.1 and the image field 105.1 can be the same. Likewise, the number of intermediate image planes can be different depending on the design of the projection optics 104.1. Examples of projection optics with different numbers of such intermediate images in the x and y directions are, for example, from US 2018/0074303 A1 known (the entire disclosure of which is incorporated herein by reference).

In the present example, one of the pupil facets 102.9 is assigned to exactly one of the field facets 102.7 to form an illumination channel for illuminating the object field 103.1. This can in particular result in lighting based on Köhler's principle. The far field is broken down into a large number of object fields 103.1 using the field facets 102.7. The field facets 102.7 generate a plurality of images of the intermediate focus on the pupil facets 102.9 assigned to them.

The field facets 102.7 are each imaged onto the reticle 103.3 by an assigned pupil facet 102.9, with the images superimposing one another, so that there is an overlapping illumination of the object field 103.1. The illumination of the object field 103.1 is preferably as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by overlaying different lighting channels.

By arranging the pupil facets 102.9, the illumination of the entrance pupil of the projection optics 104.1 can be geometrically defined. By selecting the illumination channels, in particular the subset of the pupil facets 102.9 that carry light, the intensity distribution in the entrance pupil of the projection optics 104.1 can be adjusted. This intensity distribution is also referred to as the lighting setting of the lighting system 102. A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 102.2 can be achieved by redistributing the illumination channels. The aforementioned settings can be made for actively adjustable facets by appropriate control via the control device 106.

Further aspects and details of the illumination of the object field 103.1 and in particular the entrance pupil of the projection optics 104.1 are described below.

The projection optics 104.1 can in particular have a homocentric entrance pupil. This can be accessible or inaccessible. The entrance pupil of the projection optics 104.1 often cannot be illuminated precisely with the pupil facet mirror 102.8. In an image of the projection optics 104.1, which shows the center of the pupil lens facet mirror 102.8 images telecentrically onto the wafer 105.3, the aperture rays often do not intersect at a single point. However, an area can be found in which the pairwise distance of the aperture beams becomes minimal. This surface represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.

In certain variants, it may be that the projection optics 104.1 has different positions of the entrance pupil for the tangential and sagittal beam paths. In this case, it is preferred if an imaging optical element, in particular an optical component of the transmission optics 102.10, between the second facet mirror 102.8 and the reticle 103.3 is provided. With the help of this imaging optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

When arranging the components of the lighting optics 102.2, as shown in the 1 is shown, the optical surfaces of the pupil facet mirror 102.8 are arranged in a surface conjugate to the entrance pupil of the projection optics 104.1. The first facet mirror 102.6 (field facet mirror) defines a first main extension plane of its optical surfaces, which in the present example is arranged tilted relative to the object plane 5. In the present example, this first main extension plane of the first facet mirror 102.6 is arranged tilted to a second main extension plane, which is defined by the optical surface of the deflection mirror 102.5. In the present example, the first main extension plane of the first facet mirror 102.6 is further arranged tilted to a third main extension plane, which is defined by the optical surfaces of the second facet mirror 102.8.

As shown below using the second facet mirror 102.8 and the 2 is explained, in the present example the facet mirrors 102.6 and 102.8 are constructed as optical modules according to the invention, which include a plurality P of optical arrangements in the form of facet units 108, of which in 2 a facet unit 108 is shown. The facet units 108 are designed identically in this example. In other variants, they can also be designed differently (individually or in groups).

The respective facet unit 108 comprises an optical element unit in the form of a facet element unit 109, a support device 110 and a deformation device 111. The facet element unit 109 has an optical element in the form of a facet element 109.1. The facet element 109.1 has an optical surface 109.2. The optical surface 109.2 is a reflective optical surface, which is formed, for example, by a suitable coating that reflects the useful light on a facet body 109.3 of the facet element 109.1. However, it is understood that in other variants the optical surface 109.2 can also be designed in any other way, for example can be achieved by appropriate surface processing of the facet body 109.3.

The support device 110 supports the facet element unit 109 on a support structure in the form of a carrier 112 of the facet mirror 102.8. Several facet units 108 (in groups) up to all facet units 108 of the second facet mirror 102.8 can be supported on a common carrier 112. The plurality P of facet units 108 can be 5 to 1000, preferably 10 to 500, more preferably 10 to 100.

The support device 110 is designed to support the facet element unit 109 on the support structure 112 in such a way that the facet element unit 109 with respect to the support structure 112 in a positioning process in at least one degree of freedom from the in 2 and 3 shown starting position is adjustable. In the present example, the support device 110 defines two rotational degrees of freedom of adjustment, namely a first degree of tilting freedom about a first tilting axis 110.1 (see 3 ) and a second tilting degree of freedom about a second tilting axis 110.2 (siege 2 ), by which the facet element unit 109 can be tilted relative to the support structure 112 in a positioning process. However, it is understood that in other variants, any other number of adjustment degrees of freedom can be defined (up to five or even all six degrees of freedom in space).

In the present example, the first tilt axis 110.1 and the second tilt axis 110.2 are each realized in a fundamentally well-known manner by two pairs of leaf springs 110.3 and 110.4, respectively, which are nested within one another and act kinematically in series between the support structure 112 and the facet element unit 109. In the present example, the first tilt axis 110.1 is defined by the intersection line of the main extension planes of the two leaf springs of the leaf spring pair 110.3, while the second tilt axis 110.2 is defined by the intersection line of the main extension planes of the two leaf springs of the second leaf spring pair 110.4. In the present example, the position adjustment process takes place in a generally known manner using an actuating force FA (see 5 ), which is in a position element 109.4 of the facet element unit 109 is initiated. The actuating force FA acts on the free end 109.5 of the actuating element 109.4, which points away from the optical surface and which protrudes through a recess in the support structure 112. In the in 5 In the state shown as an example, the facet element unit 109 is tilted about the first tilt axis 110.1.

The deformation device 111 is designed to deform the optical surface 109.2, the deformation device 111 having a first connection region 111.1 and a second connection region 111.2 and defining a deformation force flow DFF from the first connection region 111.1 to the second connection region 111.2. The first connection area 111.1 is arranged at a drive end 111.3 of the deformation device 111, while the second connection area 111.2 is arranged at an output end 111.4 of the deformation device 111. The first connection area is 111.1 (in which in 2 and 3 assembled state shown) is connected to the support device 110 at at least one first connection point 111.5. The second connection area is (in which in 2 and 3 assembled state) is connected to the optical element unit 109 at a second connection point 111.6.

The deformation device 111 further has a third connection area 111.7, which is arranged in the direction of the deformation force flow DFF between the first connection area 111.1 and the second connection area 111.2. The third connection area 111.7 is connected to the optical element unit 109 at a third connection point 111.8, the third connection point 111.8 being arranged such that the third connection point 111.8 experiences a first relative movement RM1 to the first connection point 111.5 during the position adjustment process. In the present example, the deformation device 111 is a passive transmission device which converts the first relative movement RM1 into a second relative movement RM2 between the second connection point 111.6 and the third connection point 111.8 during the position adjustment process. During the first relative movement RM 1, a deformation load LD is introduced into the optical element unit 109 by the deformation device 111 at the second connection point 111.6, which causes a deformation of the optical element unit 109 (and thus the optical surface 109.2), with which the second relative movement RM2 comes along.

Depending on the design and arrangement of the deformation device 111, the deformation load LD can be a pure deformation force FD or a pure deformation moment MD or a combination thereof. In this example (see 5 ), the deformation load LD is a combined load composed of a deformation force FD and a deformation moment MD.

In the present example, the deformation device 111 comprises a first deformation unit 111.9 and a second deformation unit 111.10, each of which is designed in the manner of a coupling gear, as will be explained below using the example of the first deformation unit 111.9. This not only makes it possible to achieve particularly complex deformations of the optical surface 109.2. In addition, it is also possible to assign separate, possibly different, deformations of the optical surface 109.2 to position adjustment processes from the initial position in different degrees of freedom. However, it is understood that, depending on the requirements for the deformation or compensation, in principle a single deformation unit 111.9 or 111.10 can be sufficient to achieve the desired deformation of the optical surface 109.2.

In the present example, the first deformation unit 111.9 comprises a first coupling unit 111.11, a second coupling unit 111.12 and a third coupling unit 111.13. The first coupling unit 111.11 forms the first connection area 111.1, while the second coupling unit 111.12 forms the second connection area 111.6. The third coupling unit 111.13 forms the third connection region 111.8, wherein the third coupling unit 111.13 is designed to define a movement transmission ratio MTR of the first relative movement RM1 to the second relative movement RM2. This makes it possible to achieve a particularly simple, preferably purely mechanical, forced coupling of the deformation of the optical surface 109.2 to the position adjustment of the facet element unit 109.

With such a design, in particular the simple, purely passive transmission device of the deformation device 111, a forced deformation of the optical surface 109.2 can be achieved in a simple manner, as shown in 5 is shown. The dashed contour represents 113 in 5 the initial position of the facet element unit 109 (see also 2 ), while the dotted outline is 114 in 5 represents the facet element unit 109 in the presence of a pure rigid body movement (ie a deflection from the starting position without the superimposed effect of the deformation device 111). The forced deformation of the optical surface 109.2 at least partially compensates for the imaging error caused by the adjustment of the position of the facet element unit 109 or the rigid body movement (see section ted contour 114) of the facet element unit 109 and its optical surface 109.2 is created. The deformation device 111 uses in a simple manner the relative movement RM 1, which results when adjusting the position of the facet element unit 109 and its optical surface 102.2 between the facet element unit 109 and the support device 110. This first relative movement RM1 resulting from the actuating force FA is simply converted by the gear device (here: the deformation unit 111.9) into a deformation load LD, which is introduced into the facet element unit 109. The deformation load LD on the facet element unit 109 then causes a forced deformation of the facet element unit 109, especially its optical surface 109.2, which is accompanied by the second relative movement RM2. The resulting deformation of the optical surface 109.2 then at least partially (preferably, of course, at least essentially completely) compensates for the imaging error IE generated by the position adjustment of the facet element unit 109 or the optical surface 109.2.

Consequently, in the present example, the deformation device 111 is designed such that the deformation of the optical surface 109.2 achieved by the deformation device 111 at least counteracts an imaging error IE of the optical arrangement 108, which is caused by the position adjustment process. The deformation of the optical surface 109.2 achieved by the deformation device 111 preferably at least substantially completely compensates for this imaging error IE. The coordination or optimization of the deformation to the adjustment from the starting position can be designed continuously, at least in sections, so that the imaging error IE is at least partially, preferably essentially completely, compensated for every deflection (from the starting position) via the position adjustment process. In the present example, the coordination or optimization of the deformation can also only take place based on discrete, predeterminable adjustments or deflections from the initial position, so that the greatest possible compensation for the imaging error is achieved in these discrete positions. This can be the case, for example, if a plurality of defined and discrete settings with discrete deflections from the initial position are provided for the optical arrangement 108.

The compensated imaging error IE can be imaging errors of one or more arbitrary types (individually or in any combination) that have at least a significant negative impact on the quality of the imaging of the imaging device 101. It is particularly advantageous if the compensated imaging error IE affects at least one of the following properties: focusing, coma, or any combinations thereof.

In the present example, the position adjustment process on the facet element unit 109 causes a defocusing of the optical arrangement 108. The deformation of the optical surface 109.2 achieved by the deformation device 111 then causes a change in the focusing of the optical surface 109.2, which at least counteracts the defocusing of the optical arrangement 108, in particular the defocusing is at least essentially compensated. This makes it easy to advantageously compensate for an imaging error IE that often occurs during such an adjustment from the starting position.

It is understood that the forced deformation can in principle be achieved by relative movements of a corresponding size on the facet element unit 109, which are accompanied by deformation loads LD of a corresponding size. In principle, the deformation device 111 can generate any suitable motion translation between the first relative movement RM1 and the second relative movement RM2 with a predeterminable motion translation ratio MTR of the first to the second relative movement RM1, RM2.

The respective relative movement RM 1, RM2 can basically be of any type, i.e. a pure translation (in one to three degrees of freedom), a pure rotation (in one to three degrees of freedom) or any combinations thereof. Preferably, the first relative movement (preferably at least primarily) comprises a first displacement S1 of the first connection point 111.5 with respect to the third connection point 111.8 in a first direction D1, while the second relative movement RM2 (preferably at least primarily) includes a second displacement S2 of the second connection point 111.6 with respect to the third Connection point 111.8 in a second direction D2. In certain favorable variants, the motion transmission ratio MTR is preferably 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, whereby the ratio can in particular also be 1:1. In certain favorable variants, the ratio of the first displacement S1 to the second displacement S2 is still 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, the ratio in particular also being 1 :1 can be. In both cases, favorable and needs-based deformations of the optical surface 109.2 can be achieved.

It is understood that when converting the first relative movement RM1 into the second relative Movement RM2 can basically also be implemented in any direction of the movement between the drive end and the output end. In certain preferred variants, the first relative movement RM1 (preferably at least primarily) comprises a first displacement S1 of the first connection point 111.5 with respect to the third connection point 111.8 in a first direction D1, while the second relative movement RM1 (preferably at least primarily) comprises a second displacement S2 of the second connection point 111.6 with respect to the third connection point 111.8 in a second direction D2. In certain preferred variants, the first direction D1 is inclined to the second direction D2 by an angle of inclination IA (see 4 ), whereby the angle of inclination IA is in particular 0° to 20°, preferably 0° to 10°, more preferably 0° to 5°. This makes it possible to achieve a favorable movement or force redirection, with which a corresponding deformation can be achieved in a simple manner at suitable deformation force introduction points (in the present example: connection point 111.6) with favorable deformation force introduction.

In the present example, the deformation device 111 is arranged and designed such that the first direction D1 and the second direction D2 lie at least essentially in a common plane. With such a planar design of the deformation unit 111.9, a particularly compact design with precise motion translation can be realized, since the components, at least primarily, only have to absorb loads in the common plane and can therefore be designed simply but still sufficiently rigid for the planar load cases.

In the present example, the initial situation is (see 2 ) an optical surface 109.2 that is essentially not deformed by the deformation device 111. The deformation device 111 is arranged and designed in such a way that, starting from the starting position, opposing first displacements S1 of the first connection point 111.5 with respect to the third connection point 111.8 along the first direction D1 also produce opposite second displacements S2 of the second connection point 111.6 with respect to the third connection point 111.8 along the second direction D2 effect.

For other variants (see 6 ) but a design can also be realized in which opposing first displacements S1 of the first connection point 111.5 with respect to the third connection point 111.8 along the first direction D1 cause parallel second displacements S2 of the second connection point 111.6 with respect to the third connection point 111.8 along the second direction D2.

With opposing second displacements S2 (see example of 2 ) situations can be advantageously dealt with in which position adjustment processes in different directions (from the initial position) produce imaging errors IE, which must be compensated for by opposing deformations. For example, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process in one direction (from the initial position) requires an increase in the curvature of the optical surface 109.2, while a position adjustment process in the opposite direction (from the initial position) requires a reduction Curvature of the optical surface 109.2 requires.

With second shifts in the same direction (see example of 6 ) situations can be advantageously dealt with in which position adjustment processes in different directions (from the initial position) produce imaging errors which, regardless of this, always have to be compensated for by deformations in the same direction. For example, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process requires an increase (or reduction) in the curvature of the optical surface 109.2, regardless of the direction of the deflection (from the initial position).

It goes without saying that the optical element unit 109 can basically be designed in any way, as long as it enables a deformation of the optical surface 109.2 corresponding to the imaging error IE to be compensated via the forced coupling of the deformation device 111 described herein. In the present example, the optical element unit 109 has a projection 109.6 pointing away from the optical surface 109.2, the projection 109.6 having a free end 109.7 which is distant from the first tilt axis 110.1. The third connection point 111.6 is arranged in the area of the free end 109.7 of the projection 109.6, so that when the optical element unit 109 is tilted about the first tilt axis 110.1, a comparatively large and therefore advantageous deflection (from the starting position) in the area of the free end 109.7 of the projection 109.6 and thus the third connection point 111.8 is achieved.

The optical element unit 109 can be designed in one piece or in several parts. In certain variants, the optical element unit 109 has an element carrier which carries the optical element and forms the projection, as shown in 2 is indicated by the dashed contour 109.8. The optical element 109.1 itself can only be formed by a (single or multi-layer) coating of the element carrier 109.8, whereby an advantageously simple design can be achieved. Likewise, the optical element 109.1 can have a separate element body on which the optical surface 109.2 is formed (for example by a corresponding coating) and which is connected in a suitable manner to the element carrier 109.8.

The geometry of the optical element unit 109 can basically be chosen arbitrarily according to the requirements of the imaging device 101. In the present example, the optical element unit 109 has a substantially T-shaped or L-shaped configuration with a first leg and a second leg, the optical surface 109.2 being formed on the first leg and the projection 109.6 being formed by the second leg . This makes it possible to achieve configurations in terms of weight and rigidity that are particularly advantageous from a dynamic point of view (as is important, for example, for quick and precise setting changes).

It is further understood that the deformation device 111 can basically be designed in any way in order to achieve the desired deformation of the optical surface 109.2, which is forcibly coupled to the position adjustment process. In principle, any operating principles can be used to convert movement or force. For example, mechanical, hydraulic, magnetic or electrical (for example piezoelectric) operating principles can be used (individually or in any combination).

In preferred variants, the deformation device 111, as in the present example, comprises a deformation unit 111.9, 111.10, which (as described above) is designed in the manner of a coupling gear, the third coupling unit 111.13 defining the movement transmission ratio MTR of the first relative movement RM1 to the second relative movement RM2. This makes it possible to achieve a particularly simple, preferably purely mechanical, forced coupling of the deformation to the position adjustment.

The movement conversion from the first relative movement RM1 into the second relative movement RM2 can in principle take place in any suitable manner. Rotational and translational movements can be combined with each other as desired. In the present example, the third coupling unit 111.13 comprises a coupling element in the form of a first rotation unit 111.14, which is on the one hand articulated to the first coupling unit 111.11 and on the other hand rotatably connected to the optical element unit 109 in the area of the third connection point 111.8. The first rotation unit 111.14 converts a relative movement of the first coupling unit 111.11 (to the third connection point 111.8) into a rotational movement about a first rotation axis 111.15. This rotational movement is then used to impart the second relative movement RM2.

The first axis of rotation 111.15 can run at least essentially perpendicular to a plane that is spanned by the first, second and third connection points 111.5, 111.6, 111.8. This results in a simple coupling in which, in the case of the above-mentioned planar design, the rotational movement of the first rotation unit 111.14 also takes place in the main extension plane of the first deformation unit 111.9.

In the present example, the first rotation unit 111.14 comprises a rotation element 111.19 and a, in particular pin-shaped, rotation axis section 111.20, which defines the rotation movement about the rotation axis 111.15. The rotation element 111.19 defines a rotation element circumferential direction and a rotation element radial direction, which runs perpendicular to the rotation axis 111.15. The rotation axis section 111.20 can in particular be designed to provide the rotational movement about the rotation axis 111.15 by elastic torsion of the rotation axis section 111.20 about the rotation axis 111.15. This allows a particularly simple and compact configuration to be achieved.

It goes without saying that a single rotation unit 111.14 may be sufficient to achieve the desired movement conversion or force conversion. In the present example, the deformation unit 111, more precisely, the third coupling unit 111.13, however, comprises a further, second rotation unit 111.16, which is rotatable about a second rotation axis 111.17, the second rotation axis 111.17 being at least substantially parallel to the first rotation axis 111.15 of the first rotation unit 111.14 runs. This makes possible a particularly compact design with a favorable adaptation of the deformation unit 111 to the geometric boundary conditions of the optical arrangement 108 (in particular the optical element unit 109).

In certain variants, the second axis of rotation 111.17 can also be inclined to the first axis of rotation 111.15. This allows any three-dimensional design of the Deformation unit 111 can be realized if this is necessary, for example, due to the geometric boundary conditions of the optical arrangement 108, in particular the optical element unit 109.

In the present example, the first rotation unit 111.14 and the second rotation unit 111.16 are connected via a further coupling element 111.18 in such a way that they form a parallel guide unit 111.16, which converts a movement (here: the aforementioned relative movement to the third connection point 111.8) of the first coupling unit 111.11 into a translational movement of the Implement coupling element 111.18. In the present example, the parallel guidance is achieved in that the articulation points of the coupling element 111.18 and the rotation axes 111.15, 111.17 define the corner points of a (plane) parallelogram. The second rotation unit 111.16 then converts the movement mediated by the coupling element 111.18 into a further rotational movement, which is then converted into a movement of the second coupling unit 111.12.

The second rotation unit 111.16 can basically have any design. It is preferably designed in the manner of the first rotation unit 111.14, wherein in particular it is designed at least essentially identical to the first rotation unit 111.14, at least with regard to its geometry, preferably also with regard to its dimensions. In this respect, with regard to the features, properties and functions of the second rotation unit 111.16, reference is made to the above statements regarding the first rotation unit 111.14.

The first, second and third coupling units 111.11 to 111.13 preferably define a common main extension plane of the deformation unit 111, wherein they extend at least substantially parallel to the main extension plane, in particular substantially in the main extension plane. With such a planar design, a particularly simple and robust configuration can be achieved.

The respective coupling unit 111.11, 111.12 can be connected to the first or second rotation unit 111.14, 111.16 in any way. The respective coupling unit 111.11, 111.12 is preferably connected in an articulated manner to the associated rotation unit 111.14, 111.16, since this allows particularly compact configurations to be achieved in which the movement implementation can take place at least primarily via a longitudinal movement of the first or second coupling unit 111.11, 111.12.

In the present example, the first rotation unit 111.14 is connected to the optical element unit 109 in the area of the free end 109.7 of the second leg, i.e. the projection 109.6, while the second rotation unit 111.16 is in the area of the transition between the first leg (on which the optical surface 109.2 is formed) and the second leg (projection 109.6) is connected to the optical element unit 109. This makes it possible to achieve a particularly compact and inexpensive configuration. Likewise, in the design described above with a first and second leg, the second coupling unit 111.12 can extend adjacent to the first leg along the first leg and the further coupling element 111.18 can extend adjacent to the second leg along the second leg. This makes it possible to achieve a particularly compact and inexpensive configuration.

In certain, particularly simple and robust variants, the deformation unit 111.9 is designed to be monolithic at least in sections, in particular completely. At least one joint section of the deformation unit 111 can be designed in the manner of a solid-state joint. All joint sections of the deformation unit 111 are preferably designed in the manner of a solid-state joint. This makes it possible to achieve particularly precise movement or force conversion.

The rotation element 111.19 can basically be designed in any way in order to achieve the desired movement implementation. For preferred variants (see 6 ), the rotation element 111.19 comprises a lever section 111.21 which extends in the rotation element radial direction. The first coupling unit 111.11 is then connected to the lever section 111.21 in the rotation element radial direction at a first distance CED1 from the rotation axis 111.15 at a first lever coupling point 111.22, while the coupling element 111.18 following in the direction of the deformation force flow is at a second distance CED2 from the rotation axis 111.15 in the rotation element radial direction is connected to the lever section 111.21 at a second lever coupling point 111.23. This allows the transmission ratio MTR of the movement conversion to be defined in a simple manner (via a suitable choice of the first distance CED1 and second distance CED2). In particularly advantageous variants with a favorable transmission ratio, the ratio CEDR of the first distance CED1 to the second distance CED2 is preferably 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, whereby the Ratio can in particular also be 1:1.

In certain variants, the first lever coupling point is 111.22 and the second lever Coupling point 111.23 is arranged offset from one another in the rotation element circumferential direction by a circumferential offset angle COA, the circumferential offset angle COA being in particular 0° to 180°, preferably 70° to 160°, more preferably 80° to 110°. Thanks to such an offset in the circumferential direction of the rotation element, almost any directional conversion between the input movement and the output movement on the rotation element 111.19 can be achieved.

The lever section 111.21 can in principle be designed in any suitable way, in particular in order to achieve the desired lever ratios and the desired directional conversion with sufficient rigidity. Preferably, the lever section 111.21 is, as in the present example, a substantially circular segment-shaped element. The lever section 111.21 can be designed as a plate-shaped element. In the present example, the lever section 111.21 is constructed from two straight radial sections 111.24 and an arcuate peripheral section 111.25. In further variants, the lever section 111.21 can be a substantially plate-shaped element, a substantially disk-shaped element, a substantially circular disk-shaped element and/or a substantially triangular element.

Particularly compact and light configurations result if the lever section has several corner sections on its circumference, as in the present example, and the first lever coupling point 111.22, the second lever coupling point 111.23 and the rotation axis section 111.20 are each arranged in the area of one of the corner sections. Preferably, each of these components 111.22, 111.23 and 111.20 is arranged in a separate corner section, as in the present example.

It is understood that the directional conversion between the input movement and the output movement on the rotation element 111.19 can basically be designed arbitrarily and is adapted accordingly to the geometric boundary conditions of the optical element unit 109, in particular to the deformation of the optical surface 109.2 to be achieved. Preferred (see in particular 4 ) engages a leading coupling element in the direction of the deformation force flow (for example the first coupling unit 111.11) in a first rotation element coupling point (for example the first lever coupling point 111.22) on the rotation element 111.19, while a subsequent coupling element in the direction of the deformation force flow (for example the coupling element 111.18) in a second Rotation element coupling point (for example the second lever coupling point 111.23) engages the rotation element. The subsequent coupling element 111.18 has a subsequent coupling pivot point 111.24, which immediately follows the second rotation element coupling point 111.23 in the direction of the deformation force flow in a kinematic chain of the deformation device 111. The coupling pivot point 111.24 is then immediately followed in the kinematic chain of the deformation device 111 in the direction of the deformation force flow by a rotation element coupling point 111.25, to which the second coupling unit 111.12 is finally articulated. This makes it possible to implement a favorable movement in a particularly simple manner.

Like the (highly generalized) representation of the 7 As can be seen, the leading coupling element 111.11 (formed by the first coupling unit) is designed and arranged in such a way that, at least at the beginning of the position adjustment process, it initiates an initial displacement into the first rotation element 111.19 from the initial position, which corresponds to the rotation element radial direction in the first rotation element coupling point 111.22 a lead inclination angle PRIA is inclined, the lead inclination angle PRA being in particular 70° to 90°, preferably 75° to 89°, more preferably 80° to 85°. This makes it possible to achieve a particularly favorable introduction of movement or introduction of force into the first rotation element 111.19.

In certain variants, the subsequent coupling element 111.18 is designed and arranged such that a connecting line between the subsequent coupling pivot point 111.24 and the second rotation element coupling point 111.23 in the starting position is inclined to the rotation element radial direction in the second rotation element coupling point 111.23 by a caster inclination angle POIA, the caster inclination angle POIA in particular 0 ° to 20°, preferably 1° to 15°, more preferably 5° to 10, in particular 0°. In both cases, particularly favorable output ratios can be achieved.

With the design in which the caster inclination angle POIA (in the starting position) is 0°, the design already described above can be realized in particular, in which, starting from the starting position, opposing first displacements S1 of the first connection point 111.5 with respect to the third connection point 111.8 along the first direction D1 parallel second displacements S2 of the second connection point 111.6 with respect to the third connection point 111.8 along the second direction D2. This can advantageously handle situations in which position adjustment processes in different directions (from the initial position) produce imaging errors IE, which, regardless of this, always have to be compensated for by deformations of the optical surface 109.2 in the same direction. As mentioned, suitable imaging error compensation can be achieved in a simple manner in cases in which a position adjustment process requires an increase (or reduction) in the curvature of the optical surface 109.2, regardless of the direction of the deflection (from the initial position).

It is also possible to allow the caster inclination angle POIA at the second rotation element coupling point 111.23 to pass through the zero point (i.e. POIA = 0°) in one adjusting direction when adjusting the position from the starting position (see also 8th ). This makes it possible to achieve a simultaneous deformation of the optical surface 109.2 with different strengths or amplitudes in both directions with the same amplitude of the position adjustment from the starting position (provided that the caster inclination angle passes through the zero point in one direction, i.e. POIA = 0°). .

It should be mentioned again that the second rotation unit 111.16 can basically have any design, but is preferably designed in the manner of the first rotation unit 111.14. It can be designed to be at least essentially identical to the first rotation unit 111.14, at least with regard to its geometry, preferably also with regard to its dimensions. In this respect, with regard to the features, properties and functions of the second rotation unit 111.16, reference is made to the statements made herein regarding the first rotation unit 111.14. In particular, the statements regarding the relative position or arrangement of the rotation element coupling points 111.22, 111.23 apply equally to the rotation element coupling points 111.24, 111.25. The rotation element coupling point 111.24 then corresponds to the rotation element coupling point 111.22 while the rotation element coupling point 111.25 corresponds to the rotation element coupling point 11 1.23 corresponds. This also applies in particular to the above information on the ratio CEDR, the circumferential offset angle COA, the leading inclination angle PRIA, and the trailing inclination angle POIA.

It goes without saying that one deformation unit 111.9 may be sufficient to achieve the desired deformation of the optical surface 109.2. In certain variants, however, two or more deformation units can also be provided. In the present example, as mentioned, the first deformation unit 111.9 and the second deformation unit 111.10 are provided (see 2 , 3 and 5 ), wherein the second deformation unit 111.10 is coupled to the support structure at a first coupling point via a first coupling unit 111.11. This not only makes it possible to achieve particularly complex deformations, it is also possible to assign separate, possibly different, deformations of the optical surface 109.2 to position adjustment processes from the starting position in different degrees of freedom (for example the respective tilting about the tilting axis 110.1 or 110.2).

The second deformation unit 111.10 can basically have any design. The second deformation unit 111.10 is preferably again designed in the manner of a coupling gear. Furthermore, the second deformation unit 111.10 can be designed in the manner of the first deformation unit 111.9, wherein in particular it is designed at least essentially identical to the first deformation unit, at least with regard to its geometry, preferably also with regard to its dimensions. In this respect, with regard to the features, properties and functions of the second deformation unit 111.10, reference is made to the above statements regarding the (first) deformation unit 111.9.

As already mentioned, the two deformation units 111.0, 111.10 can be mechanically coupled to one another. In a particularly simple case (highly schematic in 9 shown) the first deformation unit 111.9 and the second deformation unit 111.10 can be coupled via a portal element 111.26, to which the second coupling unit 111.12 is then articulated. The movement translation for the output movement on the second coupling unit 111.12 or the optical element unit 109 can then be adjusted via the distance between the connection of the second coupling unit 111.12 and the respective connection of the first and second deformation units 111.9, 111.10 on the portal element 111.26.

The first and second deformation units 111.9, 111.10 can in principle be arranged in any way relative to one another. In certain variants, the first deformation unit 111.9 defines a first main extension plane, while the second deformation unit 111.10 defines a second main extension plane, wherein the first main extension plane and the second main extension plane can then run parallel to one another or inclined to one another. With such a parallel course, different deformations of the optical surface 109.2 can be assigned to a position adjustment process from the initial position in the same degree of freedom and superimposed to form a complex deformation of the optical surface 109.2. With the mutually inclined course, not only particularly complex deforma can be created tions of the optical surface 109.2, it is also possible to assign separate, possibly different deformations of the optical surface 109.2 to position adjustment processes from the initial position in different degrees of freedom.

In order to achieve the desired deformation of the optical surface 109.2 or required to compensate for the imaging error, the optical element unit 109 can in principle be adapted in any suitable manner, which ensures a defined deformation of the optical surface 109.2. In the present example, the optical element unit 109.1 has a first section 109.9 and a second section 109.10, with the support device 110 engaging on the first section 109.9 and the deformation device 111 with the second connection region 111.6 engaging on the second section 109.10. The first section 109.9 and the second section 109.10 are connected to one another via (at least) one deformation tilting axis section 109.11, the deformation tilting axis section 109.11 being designed such that it defines at least one deformation tilting axis around which the second section 109.10 relative to the first section 109.9 during deformation the optical surface 109.2 is tilted by the deformation device 111. This makes it possible in a simple manner to achieve a defined, corresponding deformation of the optical surface 109.2.

It goes without saying that a single deformation tilting axis section 109.1 may be sufficient to achieve the desired deformation. However, the first section 109.9 and the second section 109.10 are preferably connected to one another via a number of N deformation tilting axis sections (as in 2 and 5 is indicated by the dashed contours 115). The number N is preferably 1 to 500, preferably 5 to 50, more preferably 10 to 20. This can in particular ensure a sufficiently uniform curvature of the optical surface 109.2, if this is necessary. This can be particularly advantageous in order to avoid undesirable local light intensity concentrations in the vicinity of the respective deformation tilt axis section 109.11, 115 in the case of a reflecting optical surface 109.2, which results from the superimposition of the reflected light of the two immediately adjacent optical partial surfaces that are tilted relative to one another.

The deformation tilting axis section 109.11 can be designed such that it only defines a single (correspondingly pronounced) deformation tilting axis. This has the great advantage that a precisely defined tilting can be achieved. In the present example, however, the deformation tilt axis section 109.11 defines a number of M discrete deformation tilt axes, where M is 1 to 15, preferably 3 to 11, more preferably 5 to 7. This makes it possible, in particular, to generate tilts about several deformation tilt axes by introducing one or more deformation forces in the corresponding direction and thus to specify an almost arbitrarily complex deformation of the optical surface 109.2.

The deformation tilting axis section 109.11 can in principle be implemented in any suitable manner, via which at least one deformation tilting axis can be defined. For example, through appropriate local material selection, structural weakening or other measures for the respective deformation tilt axis section 109.11, a corresponding stiffness distribution can be achieved in the optical element unit 109, which defines such a deformation tilt axis. In the present example, the deformation tilt axis section 109.11 is formed by a weakening section in which the optical element unit 109 is weakened. The weakening can, as just mentioned, be realized by a local reduction in the rigidity of the optical element unit 109.

In the present example, the deformation tilt axis section 109.11 is formed by introducing a first recess in the form of a slot 109.12 into the optical element unit 109. This allows a corresponding local structural weakening to be introduced into the optical element unit 109 in a particularly simple manner in a precisely defined manner. The recess or slot 109.12 can basically be designed in any way. The recess 109.12 is preferably at least essentially rectilinear, since this allows a deformation tilting axis to be precisely defined in a particularly simple manner.

In principle, a recess or slot 109.12 can be sufficient to realize the deformation tilting axis section 109.11. In the present example, one deformation tilt axis section 109.11 is formed by two recesses or slots 109.12, 109.13 in the optical element unit 109. This allows several deformation tilt axes (as described above) to be defined easily and precisely. Particularly favorable designs that support complex deformations result when at least two of the recesses intersect each other (real in the optical element unit 109) (not shown).

It is understood that several (possibly all) deformation tilting axis sections 109.11, 115 can be designed the same and in particular can have the same properties. In certain advantageous variants, the first section 109.9 and the second section 109.10 are connected to one another via a plurality of spaced-apart deformation tilting axis sections 109.11, 115, each deformation tilting axis section 109.11, 115 defining at least one deformation tilting axis and a deformation tilting stiffness DTR around the at least one deformation tilting axis.

To achieve a predeterminable deformation of the optical surface 109.2, the distance between adjacent deformation tilt axis sections 109.11, 115 can then vary. Additionally or alternatively, for this purpose, the deformation tilting stiffness DTR can vary from the first section to the second section. The deformation tilting stiffness DTR can decrease from the first section 109.9 towards the second section 109.10 at least in a first partial area. Likewise, the deformation tilting stiffness DTR can increase from the first section 109.9 towards the second section 109.10 at least in a second partial area.

In certain variants, a different deformation tilting stiffness DTR of two deformation tilting axis sections 109.11, 115 is formed by at least one of the following: a different width of the recesses 109.12, 109.13 transverse to the deformation tilting axis and a different distance of the recesses 109.12, 109.13 from the optical surface 109.2 (hence one different depth of the slot 109.12, 109.13 in the optical element unit 109). In both cases, a precise variation of the deformation tilting stiffness DTR can be achieved in a simple manner.

It is understood that the alignment of the deformation tilting axis to the direction of the deformation load LD, which is introduced into the optical element unit 109 by the deformation device 111, provides a further influencing parameter, via which the type and/or strength of the deformation of the optical surface 109.2 can be defined or influenced. In certain variants, the deformation device 111 is designed to introduce at least one deformation force in a deformation force direction into the second section during the position adjustment process, the at least one deformation tilt axis being inclined to the deformation force direction by a deformation tilt axis angle. The deformation tilt axis angle can be 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°, since particularly favorable configurations can be achieved in this way

In certain variants, the deformation device 111 can be designed to introduce a first deformation force in a first deformation force direction and a second deformation force in a second deformation force direction into the second section 109.10 during the position adjustment process, at least one first deformation tilting axis then being defined by the first slot 109.12, which runs at least substantially perpendicular to the first deformation force direction, and a second deformation tilt axis is defined by the second slot 109.13, which runs at least substantially perpendicular to the second deformation force direction. In this way, complex deformations of the optical surface 109.2 can be achieved in a particularly simple manner, in which, if necessary, multiple curved areas of the optical surface 109.2 can be achieved or adjusted.

It is understood that the support device 110 can optionally only provide a position adjustment in a single (rotational or translational) degree of freedom in accordance with the requirements of the imaging device 101. In particularly well-adjustable variants, position adjustment in two or more degrees of freedom is possible. In the present example, the support device 110 is designed, as mentioned, to move the optical element unit 109 with respect to the support structure 112 in the position adjustment process in a first rotational degree of freedom about the first tilt axis 110.1 and/or in a second rotational degree of freedom about the second tilt axis 110.2 from the starting position ( please refer 2 ) to adjust. The deformation device 111 is designed to bring about a first deformation of the optical surface 109.2 during the position adjustment process when adjusting the optical element unit 109 in the first degree of freedom by means of the first deformation unit 111.9 and when adjusting the optical element unit 109 in the second degree of freedom by means of the second deformation unit 111.10 to cause a second deformation of the optical surface 109.2 that deviates from the first deformation.

It can be particularly favorable variants if the first deformation and the second deformation change a course of a curvature of the optical surface 109.2 about different axes of curvature of the optical surface 109.2. In certain variants, the first deformation can change a course of a curvature of the optical surface 109.2 about a first axis of curvature of the optical surface 109.2, while the second deformation can change a course of a curvature the optical surface 109.2 is changed about a second axis of curvature of the optical surface 109.2. The first axis of curvature can be inclined to the second axis of curvature, in particular by 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°.

However, it is understood that the desired deformation of the optical surface 109.2 during position adjustment in the different degrees of freedom can in principle also be achieved by a common deformation unit. Likewise, both deformation units 111.9 and 111.10 can become effective at least when adjusting the optical element unit 109 in one of the two degrees of freedom (i.e. when tilting about the first tilting axis 110.1 and/or the second tilting axis 110.2) and produce superimposed deformations of the optical surface 109.2.

In certain variants, the deformation device 111 can also be designed to attack the optical element unit 109 via several further second coupling units 111.27, as shown in 8th is indicated. The second coupling units 111.12 and 111.27 can then all be connected accordingly to the third coupling unit 111.13 in order to introduce a corresponding deformation load into the optical element unit 109 and thus achieve superimposed deformations, which result in a (typically as uniform as possible) overall deformation of the optical surface 109.2 lead. This makes it possible, in particular, to achieve almost any complex deformation of the optical surface 109.2.

The points of attack of the second coupling units 111.12 and 111.27 on the optical element unit 109 are preferably arranged offset from one another. In particular, it can be provided that one of the second coupling units 111.12, 111.27 acts between two (in particular two immediately adjacent) deformation tilting axis sections 109.11, 115.

The optical element unit 109 or the optical surface 109.2 can basically have any design. Its use is particularly favorable in configurations in which the optical surface 109.2 has an area of 5 mm ² to 50,000 mm ² , preferably 15 mm ² to 2,000 mm ² , more preferably 25 mm ² to 500 mm ² . The same applies to variants in which the optical surface 109.2 has a maximum dimension of 0.5 mm to 500 mm, preferably 1 mm to 100 mm, more preferably 5 mm to 20 mm.

The advantages of the designs described here are particularly effective when the optical surface 109.2 is an at least simply curved surface, a spherical surface, an aspherical surface, a slim optical surface elongated along a main extension direction (as in the present example) or a slim one , is an optical surface that is curved along a main extension direction (as in the present example). The present teaching can be applied to any optical surfaces 109.2; it is particularly simple and inexpensive if the optical surface 109.2 (as in the present example) is a reflecting surface.

The present invention was explained above solely using examples in which the third coupling unit 111.13 comprises a first rotation unit 111.14 and a second rotation unit 111.16, which are connected via a further coupling element 111.18. However, it goes without saying that, for example, further rotation units can be provided in order to realize an even more complex design of the deformation device 111 (for example due to limited space). It can, as in 9 shown schematically, for example a third rotation unit 111.28 may be provided, which is articulated to the second rotation unit 111.16 via a further coupling element 111.29. In addition, one or more additional rotation units can be coupled.

Here too, the third rotation unit 111.28 can have a rotation element 111.30 that is rotatably linked to the optical element unit 109 about a third rotation axis 111.31. In the present example, the third axis of rotation 111.31 is inclined to the first axis of rotation 111.15 and the second axis of rotation 111.17. The inclination can be chosen arbitrarily according to the respective (for example geometric) requirements. In the present case, the third axis of rotation 111.31 and the first and second axes of rotation 111.15, 111.17 are each perpendicular to a normal plane, with the two normal planes in turn being perpendicular to one another. In this way, any three-dimensional design of the deformation unit 111 can be realized if this is necessary, for example, due to the geometric boundary conditions of the optical arrangement 108, in particular the optical element unit 109.

The present invention has been described above exclusively using examples from the field of microlithography. However, it is understood that the invention can also be used in connection with any other optical applications, in particular imaging methods at other wavelengths, in which similar problems arise with regard to the tilt adjustment of components in a small installation space.

Furthermore, the invention can be used in connection with the inspection of objects, such as so-called mask inspection, in which the masks used for microlithography are examined for their integrity, etc. Wafer 105.1 is then replaced by 1 for example, a sensor unit that captures the image of the projection pattern of the reticle 104.1 (for further processing). This mask inspection can then take place at essentially the same wavelength that is used in the later microlithography process. However, any wavelengths that deviate from this can also be used for the inspection.

The present invention was finally described above using concrete exemplary embodiments, which show concrete combinations of the features defined in the following patent claims. It should be expressly pointed out at this point that the subject matter of the present invention is not limited to these combinations of features, but all other combinations of features, as resulting from the following patent claims, also belong to the subject matter of the present invention.

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 10205425 A1 [0004]
• WO 2012/175116 A1 [0005]
• DE 102008009600 A1 [0081, 0084]
• US 2006/0132747 A1 [0083]
• EP 1614008 B1 [0083]
• US 6573978 [0083]
• US 2018/0074303 A1 [0093]

Claims (21)

Optical arrangement for microlithography, in particular for the use of light in the extreme UV range (EUV), with - an optical element unit (109), in particular a facet element unit, - a support device (110) and - a deformation device (111), wherein - the optical element unit (109) has an optical element (109.1) with an optical surface (109.2), - the support device (110) is designed to support the optical element unit (109) on a support structure (112) in such a way that the optical element unit (109) can be adjusted from an initial position with respect to the support structure (112) in a position adjustment process in at least one degree of freedom, in particular a rotational degree of freedom, - the deformation device (111) is designed to deform the optical surface (109.2), - the deformation device (111) has a first connection area (111.1) and a second connection area (111.2) and defines a deformation force flow from the first connection area (111.1) to the second connection area (111.2), - the first connection area (111.1) at a drive end of the deformation device (111 ) is arranged and is designed to be connected to the support device (110) or the support structure (112) at a first connection point (111.5), - the second connection area (111.2) is arranged at an output end of the deformation device (111) and to a second connection point (111.6) is connected to the optical element unit (109), characterized in that - the deformation device (111) has a third connection area (111.3), - the third connection area (111.3) in the direction of the deformation force flow between the first connection area ( 111.1) and the second connection area (111.2), - the third connection area (111.3) is connected to the optical element unit (109) or the support device (110) at a third connection point (111.8), - the third connection point (111.8) in this way it is arranged that the third connection point (111.8) experiences a first relative movement to the first connection point (111.5) during the position adjustment process, - the deformation device (111) is a, in particular passive, transmission device which is designed to carry out the first relative movement during the position adjustment process in a second relative movement between the second connection point (111.6) and the third connection point (111.8), wherein during the second relative movement a deformation load is introduced into the optical element unit (109) by the deformation device (111) at the second connection point (111.6), which causes a deformation of the optical surface (109.2). Optical arrangement according to Claim 1 , wherein - the deformation device (111) is designed such that the deformation of the optical surface (109.2) achieved by the deformation device (111) at least counteracts an imaging error of the optical arrangement which is caused by the position adjustment process, in particular at least one of the following applies: - the deformation of the optical surface (109.2) achieved by the deformation device (111) at least substantially completely compensates for the imaging error, in particular in at least one predeterminable adjustment from the starting position; - the imaging error affects at least one of the properties of focusing, coma, or combinations thereof, - the position adjustment process causes a defocusing of the optical arrangement and the deformation of the optical surface (109.2) achieved by the deformation device (111) causes a change in the focusing of the optical surface ( 109.2), which at least counteracts the defocusing of the optical arrangement, in particular at least substantially compensating for the defocusing. Optical arrangement according to Claim 1 or 2 , wherein - the deformation device (111) generates a motion translation between the first relative movement and the second relative movement with a predeterminable motion translation ratio of the first to the second relative movement, wherein - the first relative movement produces a first displacement of the first connection point (111.5) with respect to the third connection point (111.8) in a first direction - the second relative movement comprises a second displacement of the second connection point (111.6) with respect to the third connection point (111.8) in a second direction, in particular at least one of the following applies: - the movement transmission ratio is 1000:1 to 1:1000 , preferably 100:1 to 1:100, more preferably 10:1 to 1:10, in particular 1:1; - The ratio of the first shift to the second shift is 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, in particular 1:1. Optical arrangement according to one of the Claims 1 until 3 , wherein - the first relative movement comprises a first displacement of the first connection point (111.5) with respect to the third connection point (111.8) in a first direction, - the second relative movement comprises a second displacement of the second connection point (111.6) with respect to the third connection point (111.8) in a second direction, in particular at least one of the following applies: - the first direction is inclined to the second direction by an angle of inclination, the angle of inclination in particular 0° to 20°, preferably 0° to 10°, more preferably 0° to 5° , amounts; - the deformation device (111) is arranged and designed such that the first direction and the second direction lie at least substantially in a common plane; - The deformation device (111) is arranged and designed in such a way that, starting from the starting position, opposing first displacements of the first connection point (111.5) with respect to the third connection point (111.8) along the first direction produce opposite or parallel second displacements of the second connection point (111.6) with respect to the third connection point (111.8) along the second direction. Optical arrangement according to one of the Claims 1 until 4 , wherein - the support device (110) defines at least one tilting axis (110.1; 110.2) of the optical element unit (109), about which the optical surface (109.2) is tilted during the positioning process, - the optical element unit (109) one of the optical surface (109.2) pointing away projection (109.6), - the projection (109.6) has a free end (109.7) which is away from the at least one tilt axis (110.1; 110.2), - the third connection point (111.8) in the area of the free End (109.7) of the projection (109.6) is arranged, in particular at least one of the following applies: - the optical element unit (109) has an element carrier (109.8) which carries the optical element (109.1) and the projection (109.6) forms, wherein the optical element (109.1) is formed in particular by a coating of the element carrier (109.8); - the optical element unit (109) has a substantially T-shaped or L-shaped design with a first leg and a second leg, the optical surface (109.2) being formed on the first leg and the projection (109.6) through the second Leg is formed. Optical arrangement according to one of the Claims 1 until 5 , wherein - the deformation device (111) comprises a deformation unit (111.9; 111.10), which is designed in the manner of a coupling gear, - the deformation unit comprises a first coupling unit (111.11), a second coupling unit (111.12) and a third coupling unit (111.13), - the first coupling unit (111.11) forms the first connection area (111.1); - the second coupling unit (111.12) forms the second connection area (111.2); - the third coupling unit (111.13) forms the third connection area (111.3); - at least the third coupling unit (111.13) is designed to define a movement transmission ratio of the first relative movement to the second relative movement, in particular at least one of the following applies: - the third coupling unit (111.13) comprises at least one rotation unit (111.14, 111.16), which is designed to convert a movement of the first coupling unit (111.11) into a rotational movement about a rotation axis (111.15, 111.17); - the third coupling unit (111.13) comprises at least one parallel guide unit which is designed to convert a movement of the first coupling unit (111.11) into a translational movement; - the third coupling unit (111.13) comprises at least one coupling element (111.19) which is connected to the optical element unit (109) in the area of the third connection point (111.8) - the first, second and third coupling units (111.11, 111.12, 111.13) define one common main extension plane of the deformation unit (111.9, 111.10) and extend at least substantially parallel to the main extension plane, in particular substantially in the main extension plane; - The deformation unit (111.9, 111.10) is designed to be monolithic at least in sections, in particular completely, with at least one joint section of the deformation unit (111.9, 111.10) being designed in the manner of a solid-state joint, in particular all joint sections of the deformation unit (111.9, 111.10) in the manner of a solid-state joint are trained. Optical arrangement according to Claim 6 , wherein - the at least one coupling element (111.19) of the third coupling unit (111.13) comprises at least one rotation element (111.19), which is designed to convert a movement of the first coupling unit (111.11) into a rotational movement about the rotation axis (111.15), whereby - the at least one coupling element (111.19) defines a rotation element circumferential direction and defines a rotation element radial direction which runs perpendicular to the rotation axis (111.15), wherein in particular at least one of the following applies: - the axis of rotation (111.15) runs at least substantially perpendicular to a plane which is spanned by the first, second and third connection points; - the rotation element (111.14) comprises a, in particular pin-shaped, rotation axis section which defines the rotational movement around the rotation axis (111.15), the rotation axis section being designed in particular to control the rotational movement around the rotation axis (111.15) by elastic torsion of the rotation axis section around the rotation axis ( 111.15). Optical arrangement according to Claim 7 , wherein - the rotation element (111.14) comprises at least one lever section (111.21) which extends in the rotation element radial direction, and - the first coupling unit (111.11) in the rotation element radial direction at a first distance from the rotation axis (111.15) at a first lever coupling point (111.22 ) is connected to the lever section (111.21) and a subsequent coupling element (111.18) in the direction of the deformation force flow is connected to the lever section (111.21) in the rotation element radial direction at a second distance from the rotation axis (111.15) at a second lever coupling point (111.23), in particular at least one of the following applies: - the ratio of the first distance to the second distance is 1000:1 to 1:1000, preferably 100:1 to 1:100, more preferably 10:1 to 1:10, in particular 1:1; - the first lever coupling point (111.22) and the second lever coupling point (111.23) are arranged offset from one another in the rotation element circumferential direction by a circumferential offset angle, the circumferential offset angle being in particular the at least one lever section (111.21) at least one of the following: a substantially plate-shaped element, an im Substantially disc-shaped element, a substantially circular disc-shaped element, a substantially circular segment-shaped element, a substantially triangular-shaped element; - The at least one lever section (111.21) has a plurality of corner sections on its circumference and at least one of the first lever coupling point (111.22), the second lever coupling point (111.23) and the rotation axis section is arranged in the area of one of the corner sections. Optical arrangement according to one of the Claims 7 or 8th , wherein - a leading coupling element (111.11) in the direction of the deformation force flow engages the rotation element (111.19) in a first rotation element coupling point (111.22) and a subsequent coupling element (111.18) in the direction of the deformation force flow acts in a second rotation element coupling point (111.23) on the rotation element (111.19 ). Deformation device (111) has a substantially undeformed optical surface (109.2), wherein at least one of the following applies: - the leading coupling element (111.11) is designed and arranged in such a way that there is an initial displacement into the rotation element from the initial position at least at the beginning of the position adjustment process (111.19), which is inclined to the rotational element radial direction in the first rotational element coupling point (111.22) by a lead inclination angle, the lead inclination angle in particular - the subsequent coupling element (111.18) being designed and arranged in such a way that a connecting line between the subsequent coupling pivot point (111.24) and the second rotation element coupling point (111.23) in the starting position is inclined to the rotation element radial direction in the second rotation element coupling point (111.23) by a caster inclination angle, the caster inclination angle in particular Optical arrangement according to one of the Claims 6 until 9 , wherein - the rotation unit is a first rotation unit (111.14) and - the third coupling unit (111.13) comprises at least one second rotation unit (111.16), - the second rotation unit (111.16) with the first rotation unit (111.14) via a further coupling element (111.18) is connected, - the second rotation unit (111.16) is designed to convert a movement mediated by the further coupling element (111.18) into a further rotational movement; wherein in particular at least one of the following applies: - the second rotation unit (111.16) is designed in the manner of the first rotation unit (111.14), in particular at least in terms of its geometry, preferably in terms of its dimensions, at least essentially identical to the first rotation unit (111.14); - the second coupling unit (111.12) is articulated to the second rotation unit (111.16); - The second rotation unit (111.16) defines a further axis of rotation (111.17) of the further rotation movement, the further axis of rotation (111.17) runs at least substantially parallel to the axis of rotation (111.15) of the first rotation unit (111.14) or the further axis of rotation (111.17) runs inclined to the axis of rotation (111.15) of the first rotation unit (111.14); - the optical arrangement is according to Claim 5 formed, wherein the first rotation unit (111.14) is connected to the optical element unit (109) in the area of the free end of the second leg and the second rotation unit (111.16) is connected to the optical element unit (111.16) in the area of a transition between the first leg and the second leg ( 109) is tied; - the optical arrangement is according to Claim 5 formed, wherein the second coupling unit (111.12) extends adjacent to the first leg along the first leg and the further coupling element (111.18) extends adjacent to the second leg along the second leg. Optical arrangement according to one of the Claims 6 until 10 , wherein - the deformation unit is a first deformation unit (111.9) and the deformation device (111) comprises a second deformation unit (111.10), in particular at least one of the following applies: - the second deformation unit (111.10) is designed in the manner of a coupling gear; - the second deformation unit (111.10) is designed in the manner of the first deformation unit (111.9), in particular at least in terms of its geometry, preferably in terms of its dimensions, at least essentially identical to the first deformation unit (111.9); - the first deformation unit (111.9) and the second deformation unit (111.10) are coupled via a portal element (111.26) to which the second coupling unit (111.12) is articulated; - the first deformation unit (111.9) defines a first main extension plane and the second deformation unit (111.10) defines a second main extension plane, wherein the first main extension plane and the second main extension plane run parallel to one another or are inclined to one another. Optical arrangement according to one of the Claims 1 until 11 , wherein - the optical element unit (109) has a first section (109.9) and a second section (109.10), - the support device (110) engages the first section (109.9), - the deformation device (111) with the second connection area ( 111.2) attacks the second section (109.10), - the first section (109.9) and the second section (109.10) are connected to one another via at least one deformation tilting axis section (109.11), - the at least one deformation tilting axis section (109.11) is designed such that it at least one deformation tilt axis is defined, about which the second section (109.10) is tilted relative to the first section (109.9) when the optical surface (109.2) is deformed by the deformation device (111), in particular at least one of the following applies: - the first section (109.9) and the second section (109.10) are connected to one another via a number of N deformation tilt axis sections (109.11, 115), where N is 1 to 500, preferably 5 to 50, more preferably 10 to 20; - The at least one deformation tilt axis section (109.11, 115) defines a number of M discrete deformation tilt axes, where M is 1 to 15, preferably 3 to 11, more preferably 5 to 7. Optical arrangement according to Claim 12 , wherein at least one of the following applies: - the at least one deformation tilt axis section (109.11, 115) is formed by a weakening section in which the optical element unit (109) is weakened; - The at least one deformation tilt axis section (109.11, 115) is formed by at least one recess (109.12, 109.13), in particular at least one slot, in the optical element unit (109), the recess (109.12, 109.13) being in particular at least essentially rectilinear ; - The at least one deformation tilting axis section is formed by a plurality of recesses (109.12, 109.13), in particular a plurality of slots, in the optical element unit (109), with at least two of the recesses (109.12, 109.13) in particular intersecting one another. Optical arrangement according to one of the Claims 12 or 13 , wherein - the first section (109.9) and the second section (109.10) are connected to one another via a plurality of spaced-apart deformation tilting axis sections (109.11, 115), - each deformation tilting axis section (109.11, 115) defines at least one deformation tilting axis and a deformation tilting stiffness about the at least one deformation tilting axis , - to achieve a predeterminable deformation of the optical surface (109.2), at least one of the following applies: the distance between adjacent deformation tilt axis sections (109.11, 115) varies, the deformation tilt rigidity varies from the first section (109.9) to the second section (109.10), whereby in particular at least one of the following applies: - the deformation-tilting stiffness decreases from that first section (109.9) towards the second section (109.10) at least in a first partial area; - the deformation-tilting stiffness increases from the first section (109.9) to the second section (109.10), at least in a second partial area; - the optical arrangement is according to Claim 13 formed, wherein a different deformation tilting stiffness of two deformation tilting axis sections (109.11, 115) is formed by at least one of the following: a different width of the recesses (109.12, 109.13) transverse to the deformation tilting axis and a different distance of the recesses (109.12, 109.13) to the optical surface (109.2). Optical arrangement according to one of the Claims 12 until 14 , wherein - the deformation device (111) is designed to introduce at least one deformation force in a deformation force direction into the second section (109.10) during the position adjustment process, and - the at least one deformation tilt axis is inclined to the deformation force direction by a deformation tilt axis angle, in particular at least one of The following applies: - the deformation tilt axis angle is 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°; - The deformation device (111) is designed to introduce a first deformation force in a first deformation force direction and a second deformation force in a second deformation force direction into the second section (109.10) during the position adjustment process, at least one first deformation tilt axis being defined, which is at least substantially vertical extends to the first deformation force direction, and at least one second deformation tilt axis is defined, which runs at least substantially perpendicular to the second deformation force direction. Optical arrangement according to one of the Claims 1 until 15 , wherein - the support device (110) is designed to adjust the optical element unit (109) with respect to the support structure (112) in the position adjustment process in a first degree of freedom, in particular a first rotational degree of freedom, from the starting position, - the support device (110) is designed to adjust the optical element unit (109) with respect to the support structure (112) in the position adjustment process in a second degree of freedom, in particular a second rotational degree of freedom, from the starting position, - the first degree of freedom is different from the second degree of freedom, - the deformation device (111) is designed to cause a first deformation of the optical surface (109.2) during the position adjustment process when adjusting the optical element unit (109) in the first degree of freedom and to cause a deformation of the first when adjusting the optical element unit (109) in the second degree of freedom Deformation to cause a different second deformation of the optical surface (109.2). wherein in particular at least one of the following applies: - the first deformation and the second deformation change a course of a curvature of the optical surface (109.2) about different axes of curvature of the optical surface (109.2); - the first deformation changes a course of a curvature of the optical surface (109.2) about a first axis of curvature of the optical surface (109.2), the second deformation changes a course of a curvature of the optical surface (109.2) about a second axis of curvature of the optical surface (109.2) , wherein the first axis of curvature is inclined to the second axis of curvature in particular by 70° to 90°, preferably 80° to 90°, more preferably 85° to 90°; - The deformation device (111) comprises a first deformation unit (111.9, 111.10) and a second deformation unit (111.9, 111.10), the first deformation unit (111.9, 111.10) being designed to bring about the first deformation, and the second deformation unit (111.9 , 111.10) is designed to cause the second deformation. Optical arrangement according to one of the Claims 1 until 16 , wherein at least one of the following applies: - the optical surface (109.2) has an area of 5 mm ² to 50,000 mm ² , preferably 15 mm ² to 2,000 mm ² , more preferably 25 mm ² to 500 mm ² ; - the optical surface (109.2) has a maximum dimension of 0.5 mm to 500 mm, preferably 1 mm to 100 mm, more preferably 5 mm to 20 mm; - the optical surface (109.2) is at least one of the following: an at least simply curved surface, a spherical surface, an aspherical surface, a slender optical surface elongated along a main extension direction, a slender optical surface curved along a main extension direction; - The optical surface (109.2) is a reflective surface. Optical module, in particular facet mirror, with at least two, in particular a plurality P, of optical arrangements (108) according to one of Claims 1 until 17 , in particular at least one of the following applies: - the optical arrangements (108) are connected to a common support structure (112); - the majority P is 5 to 1000, preferably 10 to 500, more preferably 10 to 100. Optical imaging device, in particular for microlithography, with - an illumination device (102) with a first optical element group (102.2), - an object device (103) for recording an object (103.3), - a projection device (104) with a second optical element group ( 104.1) and - an image device (105), wherein - the illumination device (102) is designed to illuminate the object (103.3) and - the projection device (104) is designed to project an image of the object (103.3) onto the image device (105). , characterized in that - the lighting device (102) and/or the projection device (104) has at least one optical module (102.8). Claim 18 includes. Method for supporting an optical element unit, in particular a facet element unit, an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which - the optical element unit (109), which has an optical element (109.1). an optical surface (109.2), is supported by means of a support device (110) on a support structure (112) in such a way that the optical element unit (109) with respect to the support structure (112) in a positioning process in at least one degree of freedom, in particular a rotational degree of freedom, can be adjusted from a starting position, wherein - the optical surface (109.2) is deformed via a deformation device (111), - the deformation device (111) has a first connection area (111.1) and a second connection area (111.2) and a deformation force flow from the first connection area (111.1) to the second connection area (111.2), - the first connection area (111.1) is arranged at a drive end of the deformation device (111) and connected to the support device (110) or the support structure (112) at a first connection point (111.5). - the second connection region (111.2) is arranged at an output end of the deformation device (111) and is connected to the optical element unit (109) at a second connection point (111.6), characterized in that - a third connection region (111.3) of the deformation device (111) is arranged in the direction of the deformation force flow between the first connection area (111.1) and the second connection area (111.2), - the third connection area (111.3) at a third connection point (111.8) with the optical element unit (109) or the support device (110 ) is connected, - the third connection point (111.8) is arranged such that the third connection point (111.8) experiences a first relative movement to the first connection point (111.5) during the position adjustment process, - the deformation device (111) is a, in particular passive, gear device , which converts the first relative movement into a second relative movement between the second connection point (111.6) and the third connection point (111.8) during the position adjustment process, wherein during the second relative movement a deformation load is transferred into the second connection point (111.6) by the deformation device (111). optical element unit (109) is initiated, which causes a deformation of the optical surface (109.2). Optical imaging method, in particular for microlithography, in which - an illumination device (102), which has a first optical element group (102.2), illuminates an object (103.3) and - a projection device (104), which has a second optical element group (104.1). , an image of the object (103.3) is projected onto an image device (105), characterized in that - at least one optical element (109.1) of the lighting device (102) and / or the projection device (104) by means of a method according to Claim 20 is supported,

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