DE102022127259B4 - Method and apparatus for focusing a beam onto an object and method for creating an opening in a workpiece using this method - Google Patents

Abstract

Method for imaging at least one beam (1) of electromagnetic radiation onto an object (2), wherein the beam (1) is deflected via its beam path (3) by an optical arrangement (4) by means of an optical scanner system (5) of the optical arrangement (4), comprising at least two optical scanners (6), at least twice with a predetermined and/or predefinable variable angle, each time changing the beam path (3) of the beam (1), and the beam (1) is not subject to refraction between each deflection, the beam (1) is also imaged onto the object (2) by means of an imaging optic (7) after its deflection, and a focus area (8) of the beam (1) is placed on and/or into the object (2) by means of the imaging optic (7), at least one swiveling movement of a beam segment (9) exiting the scanner system (5) is also generated, and the swiveling movement and/or at least one rotational movement (15) about the The pivot point (10) causes a movement of the focus area (8) in at least one spatial direction (X, Y) perpendicular to the optical axis of the imaging optics (7), characterized in that during the pivoting movement the pivot point (10) of the beam section (9) lies in the beam path (3) in the imaging optics (7) and the beam (1) is shaped via its beam path (3) by the optical arrangement (4) by means of a beam shaping optics (16), so that a focus area (8) extended in the direction of the beam path (3) is imaged on and/or in the object (2), which extends over at least a part of the dimension of the object (2) formed in the direction of the beam path (3).

Description

The invention relates to a method and a device for imaging at least one beam onto an object, wherein the beam is deflected at least twice via its beam path by means of an optical arrangement using at least two optical scanners, thereby changing the beam path of the beam, and the beam is also imaged onto the object by means of an imaging optic, and by means of the imaging using the imaging optic a focus area of the beam is placed on and/or in the object.

Furthermore, the invention relates to a method for introducing at least one opening into the object designed as a workpiece made of a transparent material by means of the aforementioned method.

Due to its optical, electrical, chemical, and mechanical properties, glass is highly suitable for replacing silicon, for example, not only as a substrate but also as a directly structured bulk material at comparatively low cost, thus opening up a wide range of applications. These range from micro- and nanoelectronics and microelectromechanical systems (MEMS) to applications in microfluidics and system packaging. A crucial prerequisite for this, however, is the availability of a glass processing method that enables the creation of precise structures of very small dimensions within the glass, and thus allows for micromachining of the glass, preferably with a high degree of structural freedom and short processing times.

In principle, numerous glass processing methods are already known from the prior art, including abrasive cutting, etching, and laser ablation. However, these methods have the disadvantage of sometimes requiring long processing times and offering limited freedom in shaping. Furthermore, some of these methods introduce undesirable defects into the glass, such as chipping, microcracks, or thermally induced stresses.

Furthermore, a known prior art method that does not exhibit these disadvantages involves the micro-machining of glass using laser-induced deep etching. This method is known as LIDE (Laser Induced Deep Etching). The LIDE process enables the creation of extremely precise structures with very short processing times, thus creating the conditions for the increased use of glass as a material in the applications mentioned above.

The LIDE process contrasts with a method known as selective laser-induced etching, also called ISLE (In-volume Selective Laser-induced Etching), which is suitable for creating structures in and from transparent materials. In ISLE, laser radiation is focused almost to a point within a transparent material such as glass, structurally and/or chemically altering the material in a small volume of only a few cubic micrometers. The altered volumes can then be etched at a rate ten times higher than that of unaltered material. Due to the small volumes of altered material resulting from the point-like focusing of the laser beam, an extremely high number of pulse sequences is required for structuring. This, in turn, leads to long processing times.

However, in the case of, for example, from the WO 2014 / 161 534 A2 and the WO 2016 / 041 544 A1 In known laser-induced deep etching processes, a transparent material, particularly glass, is modified by means of a laser pulse or pulse train over an elongated region along the beam axis, so that the modification is then anisotropically etched in a subsequent wet-chemical etching bath. The modification often occurs over the entire thickness of the transparent material, for example, over the entire thickness of a glass plate.

From the WO 2021 / 239 302 A1 Furthermore, a similar method for creating a recess, for example a blind hole, in a transparent material by means of laser-induced deep etching is known, wherein the modification of the material also takes place over the entire elongated area of the recess to be formed. The modification is achieved by the fact that the focal area of the laser beam, in contrast to a point-like configuration, has a spatial extension in the beam direction and thus a beam shape. This spatial extension, or rather the lengthening of the focal area of the laser beam in the beam direction, allows a sufficiently high intensity to be coupled into the transparent material to modify an area along its length.

The aforementioned developments of laser-induced deep etching, but in particular the WO 2021 / 239 302 A1 They also describe the modification of several parallel alignments. The process involves creating areas that are partially overlapping, allowing, for example, the formation of larger, planar structures in a transparent material. For this purpose, a laser head, which emits the laser beam that effects the modification, is typically moved along at least one linear axis, emitting at least one laser pulse at the areas to be modified during the process. Despite the short processing times already achievable through laser-induced deep etching, this design adversely limits further reductions in processing times because the accelerations and speeds of linear axes are comparatively limited, particularly due to high masses.

In this context, however, it is already known from the prior art to deflect a laser beam by means of an optical scanner system, for example by means of at least one galvanometer scanner, in order to increase the area that can be covered by a laser beam in a short period of time.

However, the use of scanner systems for deflecting laser beams, which exhibit the aforementioned beam shaping, proves problematic, especially in combination with standard optics commonly used to image the laser beam onto the material, as this causes a disturbance in the beam shaping of the laser beam, so that the extended focus range cannot be guaranteed.

However, solutions to circumvent this problem are already being proposed in the state of the art.

Thus, from the US 2014 / 0 008 549 A1 A method and a device for creating a volumetric image of a sample with extended depth of field by laser scanning imaging are known. For this purpose, a laser beam with an extended focus area in the region of the image to be acquired is used, which is deflected planarly, i.e., in two spatial directions, by two scanner mirrors. To provide the extended focus area at the sample, a Bessel-like, non-diffractive beam is generated from the laser beam initially emitted by a laser source using an axicon. Before each deflection by one of the two scanner mirrors, this beam is transformed by a converging lens into an annular beam with its focus on the scanner mirror to avoid distortion of the laser beam during deflection. After each deflection, the beam is transformed back into a non-diffractive beam by an achromatic lens. This beam is then focused again by a converging lens into an annular beam to provide the extended focus area for capturing the sample, with the focus being set on the rear focal plane of the objective lens that images the beam onto the sample. The imaging objective repeatedly transforms the beam into a non-diffractive, Bessel-like beam, which exhibits an extended focus range at the sample. However, the complex optical setup employed here adversely produces superposition of aberrations, which are imposed on the beam by the numerous optical elements. Furthermore, the setup chosen for a microscopy system is largely unsuitable for laser processing applications due to the necessary optical elements.

Furthermore, the species-specific DE 10 2020 131 405 A1 A device for processing materials with electromagnetic radiation, in particular lasers, wherein the device comprises a mirror deflection system and a focusing lens, and wherein a diffractive optical element (DOE) is arranged in the beam path between the scanner and the focusing lens to split the beam into multiple beam paths and thereby generate or position patterns of processing points. The DOE can be rotatable or pivotable, generate equal or different distances and geometries of the partial beams, and alternatively be arranged on or at the focusing lens. A suitable focusing optic is an F-theta lens or a multi-lens system such as a telecentric lens, and the mirror deflection system can have one or more axes, preferably two. The disclosure further includes a beam multiplication device with a housing, scanner, and focusing lens in whose beam path a DOE is arranged, as well as exemplary embodiments including a variant in which the focusing lens itself has diffractive properties for beam splitting.

From the WO 2010 / 069 987 A1 Furthermore, a method and a device for dynamically displacing a light beam relative to a focusing optic are described, wherein, for each deflection direction, at least two beam deflection means arranged one behind the other with independently controllable deflection angles are controlled such that the light beam always passes through the same point in the pupil during scanning, and its position in the scanning area is determined by a group of four deflection angles defined for each pixel. The deflection units can be implemented as galvanometer-driven mirrors or other modulators and arranged around a pupil image or an intermediate image, with calibration detectors establishing the correlation between the beam position in the pupil and the scanning area. The text describes methods for confocal scanning light microscopy and STED microscopy with phase modulation in pupil imaging, as well as the possibility of predefined and adaptive scanning patterns.

The EP 3 106 943 B1 The document also describes a scanner system for laser material processing with two independently swiveling plane mirrors, a control module, and an interface for receiving target data for a virtual tool with two gimbal-like swivel axes. The control module transforms the first and second target axis swivel angles of the virtual tool into first and second target mirror swivel angles, so that the real laser beam is guided to a target processing point and, optionally, receives a target focus position via an optics module. The system is designed as a 2D or 3D scanner and is intended for high laser power. A machine tool is also described, whose interpolator interpolates the machine axes together with the virtual swivel axes in real time, as well as an operating procedure in which the target processing point is calculated from the target data, the two target mirror swivel angles are determined by a backward transformation, and the beam path length for setting the focus position is determined by a forward transformation.

Against this background, the invention is based on the objective of providing a method and a device of the type mentioned at the outset, which have an optical design adapted for use in a laser processing application and which is also simplified.

This problem is solved according to the invention by a method according to the features of claims 1 and 2 and a device according to the features of claim 11.

Further details of the invention can be found in the dependent claims.

According to the invention, a method for imaging at least one beam of electromagnetic radiation, in particular a laser beam, onto an object is provided. Such a beam, in particular a pulsed beam, would preferably first be emitted by a beam source, in particular a laser source, of the optical arrangement.

In this process, the emitted beam is deflected along its path by an optical arrangement using an optical scanner system, thereby changing the beam path or direction of propagation. For this purpose, the scanner system comprises at least two optical scanners, through which the beam is deflected at least twice at a predetermined and/or predefinable, variable angle.

The beam, or rather the radiation, undergoes no further refraction before and/or between each deflection. Thus, at least between each deflection, the beam does not pass through any further optical element that refracts the beam, such as a converging lens. This significantly simplifies the optical setup and avoids unwanted aberrations. However, any disturbance of a beam shaping that may be present during the deflection of the beam requires correction.

According to the invention, after deflection, the beam is imaged onto the object by means of an imaging optic, whereby the imaging by means of the imaging optic places a focus area of the beam onto and/or into the object. Furthermore, according to the invention, at least one pivoting movement of a beam segment exiting the scanner system is generated by means of the scanner system, in which the pivot point or rotation point of the beam segment in the beam path is not located in front of or within the imaging optic. Here, the pivoting movement and/or at least a rotational movement about the pivot point causes a movement of the focus area in at least one spatial direction perpendicular to the optical axis of the imaging optic. By placing the pivot point of the beam segment in front of and/or within the imaging optic, undesirable imaging errors introduced into the beam by the deflection are advantageously avoided. This is achieved, in particular, without the use of special imaging optics to prevent such undesirable imaging errors. Instead, standard optics commonly used for imaging the beam onto the object can be employed as the imaging optic.

Furthermore, according to the invention, the beam is shaped by means of a beam-shaping optic during its path through the optical arrangement, thereby imaging a focal area on and/or in the object that is extended in the direction of the beam path and covers at least a portion of a dimension of the object that extends in the direction of the beam path. As already mentioned, the extended focal area could be used, for example, to reduce the processing times of the object, particularly the workpiece, within the framework of the LIDE process thus presented. significantly reduce throughput compared to a point-like focus.

Furthermore, the invention provides a method for introducing at least one opening, in particular a recess and/or a perforation, into the workpiece, preferably a substrate, made of a transparent material, especially glass. Using the beam imaging method described above, a modification of the workpiece material is produced at least in the beam's focal region, but particularly exclusively in the beam's focal region. This occurs without any material removal resulting from the beam's radiation. Subsequently, the opening is created in the workpiece by the action of an etching medium through anisotropic material removal in the respective modification area. The material removal therefore results solely from the etching effect of the etching medium and not directly from the beam's action or radiation. Although the etch rate of the modification or modifications is several orders of magnitude higher than that of an unmodified material, the workpiece can additionally be provided with a mask, in particular an etch mask, preferably made of a structured photoresist, in which the areas to be etched are exposed.

Each modification would preferably be generated by at least one pulse of the beam. To generate multiple modifications, e.g., at different positions on the workpiece, the beam, or rather its focal area, is moved across the workpiece between pulses by deflection. In this way, non-contiguous or contiguous, even overlapping, modifications can be created on the workpiece. These modifications are removed by the subsequent application of the etching medium and form at least one opening in the workpiece. By generating several contiguous modifications, structures with a high degree of freedom of form can be created in the workpiece, composed of a multitude of individual openings.

Furthermore, by moving the focus area through deflection via the optical scanners, which is used to generate a large number of modifications, a significant reduction in processing times can be achieved while maintaining a high degree of freedom in shape, especially compared to a standard LIDE method.

The area covered by the deflection of the beam and thus the movement of the focus area in each spatial direction, in which the modifications could consequently be generated, especially without the superposition of any further movement, can, for example, be up to plus/minus ten millimeters around a central axis or point of intersection. This is achieved with an extremely small positional error of the focus area and therefore of the modifications, of less than ten micrometers.

In a particularly advantageous embodiment of the invention, a rotational movement of the beam segment about – exclusively – a rotational axis of the pivot point, and thus a linear movement of the focus area in a single spatial direction, is achieved by means of two cooperating rotational movements of two optical scanners about their two parallel axes of rotation, which deflect the beam in the beam path. The two scanners form a scanner pair. By using two scanners with parallel axes of rotation to move the focus area of the beam in a single spatial direction, undesirable imaging errors of the beam, and in particular of the focus area, which would occur when using only one scanner, can be advantageously and simply minimized or even avoided.

An embodiment of the invention proves particularly advantageous when, in addition to the linear movement of the focus area in two spatial directions, two rotational movements of the beam segment around, in particular perpendicular, axes of rotation of the pivot point are superimposed. This would allow the focus area of the beam, or the beam striking the object or workpiece, to be moved not only along a line but also two-dimensionally across a surface. To execute the two rotational movements of the beam segment around the pivot point, the beam would be deflected by two axes of rotation for each rotation, resulting in a total of four axes of rotation, forming two groups of two axes of rotation, with the axes of rotation of the two groups being perpendicular to each other. The axes of rotation would be provided accordingly by the optical scanners, with each group of two axes of rotation being formed by a pair of scanners.

Furthermore, in a promising embodiment of the invention, it is provided that the two cooperating rotational movements, which cause a rotational movement of the beam section about - exclusively - an axis of rotation of the pivot point and deflect the beam in the beam path, The deflection elements of a scanner pair are configured asynchronously. This asynchronous movement advantageously allows the pivoting motion of the beam around at least one scanner of the scanner pair, in particular the second or rearmost scanner in the beam path. At least one of the following parameters—absolute angle, angular velocity, and/or angular acceleration—should differ between the scanners, especially one deflection element of the scanners.

It should also be mentioned that, in principle, there is a possibility that the beam formed within at least one of the methods will generally, but especially in the beam's focal region at and/or within the object or workpiece, exhibit a Gaussian focus. This would correspond to a design without beam shaping and thus an extended focal region. Any imaging errors that might occur could nevertheless be advantageously avoided.

Beam shaping can be achieved by beam shaping optics, which can be implemented, for example, as an axicon, a diffractive optical element (DOE), or a spatial light modulator (SLM). This would allow the beam to be shaped, in particular, as a Bessel-like beam. However, in a highly preferred embodiment, beam shaping would be achieved by imprinting a spherical aberration, which also results in an extended, particularly cigar-shaped, focal region of the beam. For such beam shaping, the beam shaping element should preferably be a quartz plate, especially one that is plane-parallel.

In a further advantageous embodiment of the invention, the beam shaping is applied by means of the beam shaping optics before the beam enters the optical scanner system of the arrangement. This avoids the formation of imaging errors caused by shaping a deflected beam, which therefore strikes the beam shaping element at an angle.

A further highly practical aspect of the invention lies in the fact that each focal region of the beam, which changes in its path due to deflection by the optical arrangement, is imaged by the imaging optics onto a single, and in particular common, focal plane on which the respective focal region lies or from which the respective focal region extends into the object. Because the focal region thus always lies on or extends from the focal plane, a consistent beam intensity acting on the object, and especially on the material of the workpiece, can be advantageously ensured within the focal region. This also results in the uniform and consistent generation of multiple modifications in the material of the workpiece. For this purpose, the imaging optics should preferably be designed as at least one f-theta lens.

In a no less advantageous embodiment, the invention further provides that the imaging of a respective focus area by the imaging optics is telecentric. In this way, the focus area of the beam would always be aligned parallel to the optical axis of the imaging optics, thereby enabling the generation of modifications in the workpiece that are always aligned in the same direction and thus do not differ in their angular orientation. This is achieved with a corresponding orientation of the object or workpiece, in particular perpendicular to the surface of the object or workpiece. For this purpose, the imaging optics should preferably be designed as at least one telecentric f-theta lens.

A particularly promising further development of the invention is described in that the linear movement of the focus area in at least one spatial direction is superimposed with at least one additional movement, in particular a linear movement, of a traversing axis. Here, the traversing axis is part of a device, wherein at least a part of the optical arrangement belonging to the device is arranged on the traversing axis. The traversing axis is specifically designed as a linear axis. By combining the movement of the focus area by deflecting the beam via, in particular, one or two scanner pairs with the additional movement of at least one traversing axis, it is also possible to process workpieces whose dimensions exceed the maximum possible deflection of the beams or the resulting possible movement range of the focus area. Thus, the workpiece can preferably be processed over its entire extent at very high processing speeds and therefore short processing times. Furthermore, modifications can be created in the workpiece that follow a virtually arbitrary trajectory, e.g., in the form of a spline, either individually or consecutively. The possible directions of movement for the focus area and the axis of travel do not have to be parallel and/or perpendicular to each other. An alignment at virtually any angle is conceivable, for example, an angle of 45 degrees.

Particularly in connection with the aforementioned further development, but also in general, an embodiment of the invention is considered advantageous in which the additional movement of the traversing axis is at least partially corrected and/or at least partially compensated by superimposing the linear movement of the focus area in at least one spatial direction with the at least one additional linear movement of the traversing axis. With the focus area and the traversing axis moving in the same direction, the movement of the focus area could thus be superimposed, particularly redundantly, on the movement of the traversing axis, thereby increasing, for example, the resolution of the positioning of modifications compared to the resolution provided by the traversing axis itself in the workpiece. Furthermore, the movement of the traversing axis can also be completely compensated by the movement of the focus area. This is particularly relevant when several modifications are to be generated in the workpiece at exactly the same position or at the same position but with an offset, e.g., transversely to the direction of movement of the traversing axis. A very high degree of freedom in the form of structures generated in the workpiece can thus be guaranteed with outstanding precision.

Furthermore, according to the invention, a device with an optical arrangement, in particular for carrying out at least one of the methods described above, is also provided. The optical arrangement of the device comprises a beam source, in particular a laser source, for emitting a beam of electromagnetic radiation, in particular a laser beam, and an optical scanner system. The scanner system is itself designed with at least two optical scanners, each with at least one rotatable deflecting element for deflecting the beam. In this context, it should be noted that no further element, in particular an optical refractive element, is arranged in the beam path between the scanners. In addition, the optical arrangement comprises at least one imaging optic, by which the beam can be imaged onto an object and, by means of the imaging optic, a focus area of the beam can be placed on and/or into the object. According to the invention, two scanners form a scanner pair, wherein the axes of rotation of the scanners belonging to each scanner pair are aligned parallel to each other. The optical arrangement comprises at least one scanner pair or at least two, preferably exclusively two, scanner pairs. It should be noted that the rotation axes, or groups of rotation axes, of the scanners of the different scanner pairs are aligned perpendicular to each other. The device according to the invention advantageously allows at least some of the methods according to the invention to be carried out, with a significantly simplified optical design of the optical arrangement. This allows undesirable imaging errors to be avoided and, at the same time, any disturbances caused by beam deflection in a potentially existing beam shaping to be corrected, since a pivot point or pivot point of a beam segment exiting the scanner system cannot be placed in front of or within the imaging optics in the beam path according to the invention. In addition to the optical arrangement, the device would also have at least one traversing axis on which at least part of the optical arrangement is arranged.

According to the invention, the optical arrangement also includes beam-shaping optics by means of which beam shaping can be imposed on the beam. This results in the imaging of a focal area on and/or within the object that is extended in the direction of the beam path and covers at least a portion of the object's dimension as defined in the direction of the beam path. As previously explained, the beam-shaping optics are, for example, implemented as an axicon, a diffractive optical element (DOE), a spatial modulator for light, also known as a spatial light modulator (SLM), or, in particular, as a plane-parallel quartz plate, and/or are preferably arranged downstream of the beam source and upstream of the optical scanner system.

• 1 eine Weiterbildung einer erfindungsgemäßen Vorrichtung;
• 2a bis 3b Weiterbildungen der erfindungsgemäßen Verfahren.

The invention allows for various embodiments. To further illustrate its basic principle, some of these are shown in the drawings and described below. These drawings show in

• 1 a further development of a device according to the invention;
• 2a to 3b Further developments of the methods according to the invention.

The 1 Figure 1 shows a further development of an optical arrangement 4, wherein the optical arrangement 4 comprises the beam source 19 for emitting the beam 1, the beam shaping optics 16, the scanner system 5, the two optical scanners 6 each with a rotatable deflection element, here a mirror, for deflecting the beam 1, and the imaging optics 7.

After the beam 1 exits the beam source 19, a beam shaping is imposed on the beam 1 by means of the beam shaping optics 16 following the beam source 19 in the beam path 3.

The beam 1 is then deflected twice at a predetermined, variable angle by the optical scanner system 5 following the beam shaping optics 16 in the beam path 3, each time changing the beam path 3 of the beam 1, in order to be imaged at different positions on the workpiece 11 and thereby to generate a modification 20 of the material of the workpiece 11 in the focus area 8 of the beam 1, wherein the focus area 8 of the beam 1 in the further development of the 1 The beam 1 is placed in the workpiece 11. The deflection of the beam 1 is effected by the two scanners 6 of the scanner system 5.

To prevent any disturbance of the beam shaping imposed on beam 1 by the beam shaping optics 16, a pivoting movement of the beam segment 9 exiting the scanner system 5 is generated by means of the scanner system 5, and in particular by means of the scanner 6 located in the beam path 3 following the first scanner 6 and in front of the imaging optics 7. During this movement, the pivot point 10 of this beam segment 9 lies in the imaging optics 7 within the beam path 3. The pivoting movement thus results in a rotation 15 of beam 1 about the pivot point 10, which in turn causes a movement of the focus area 8 in the spatial direction X perpendicular to the optical axis of the imaging optics 7.

It should be briefly noted in this context that the 1 shows the beam 1 in a highly simplified form in its beam profile, whereby only one beam path 3 of the beam 1 is shown.

The special feature of the deflection of beam 1 via the scanner system 5, which has only been briefly outlined above, lies in the fact that the rotational movement 15 of the beam section 9 about the axis of rotation 12 of the pivot point 10, and thus also the linear movement of the focus area 8 in the spatial direction X, is carried out by means of two cooperating rotational movements 13 of the scanners 6 about their two mutually parallel axes of rotation 14, which deflect beam 1 in the beam path 3. The two scanners 6 form a scanner pair, whereby the rotational movements 13 of the scanners 6 of the scanner pair are asynchronous.

By imprinting the beam shape and imaging the beam 1 exhibiting the beam shape via the imaging optics 7, a focal area 8, extended in the direction of the beam path 3, is imaged on or in the workpiece 11. In this further development, this focal area extends over the entire dimension formed in the direction of the beam path 3, here the thickness of the workpiece 11. The extended focal area 8 thus causes a modification 20 of the material of the workpiece 11 over the entire thickness of the workpiece 11, so that an opening, here a perforation in the workpiece 11, is created by an etching step following the modification 20.

In order to ensure a substantially constant intensity of the beam 1 acting on the material of the workpiece 11 in the focus area 8 when several modifications 20 are to be produced at different positions in the workpiece 11, the respective focus area 8 of the beam 1, which is deflected for positioning and thus changes in its beam path 3, is telecentrically imaged by the imaging optics 7 onto a single focal plane 17, from which the respective focus area 8 extends into the workpiece 11.

From the 2a and 2b Furthermore, Figures 3a and 3b show further developments of the methods according to the invention. These figures show that the movement of the focus area 8 in the spatial directions X, Y is superimposed with an additional movement of the traversing axis 18 in the direction of movement Y', which coincides with the spatial direction Y. Modifications 20 in the focus areas 8 can be made in this way. 1 produce workpiece 11 as shown in more detail, which, as in the 2a and 3a occasionally or as in the 2b and 3b are trained.

It is possible that the focus areas 8 and thus the modifications 20 are as in the 2a and 2b represented by a virtually arbitrary trajectory, here in the form of a spline, so that depending on the pulse sequence of the in 1 ray 1 as shown, as in 2a , individual openings or, as in 2b , cuts are created by overlapping several openings in workpiece 11. In the further training of the 2a and 2b For this purpose, the movement of the focus area 8 in the spatial direction X is superimposed with the movement of the travel axis 18 in its direction of movement Y', whereby the spatial direction X and the direction of movement Y' are perpendicular to each other.

By superimposing the movement of the focus area 8 in the spatial directions X, Y with the additional movement of the travel axis 18 in its direction of movement Y', the additional movement of the travel axis 18 can also be at least partially corrected and/or at least partially compensated.

This allows, as in 3a shown, the movement of the focus area 8 is superimposed, in particular redundantly, on the movement of the travel axis 18, and thus, for example, a resolution of the positioning of the modifications 20 relative to increase the resolution in the workpiece 11 provided by the traversing axis 18 itself.

Furthermore, the movement of the travel axis 18 can also be completely compensated by the movement of the focus area 8. This is particularly true when, as in 3b , in the direction of movement Y' of the traversing axis 18 several modifications 20 at the same position, but with an offset transverse to the direction of movement Y' in the spatial direction X in the workpiece 11 are generated.

REFERENCE MARK LIST

1

beam

2

object

3

Ray path

4

optical arrangement

5

Scanner system

6

scanner

7

Imaging optics

8

Focus area

9

Beam section

10

Pivot point

11

workpiece

12

axis of rotation

13

Rotational movement

14

axis of rotation

15

Rotational movement

16

Beam shaping optics

17

Focus level

18

Traverse axis

19

radiation source

20

modification

X, Y

Spatial direction

Y'

Direction of movement

Claims (11)

Method for imaging at least one beam (1) of electromagnetic radiation onto an object (2), wherein the beam (1) is deflected via its beam path (3) by an optical arrangement (4) by means of an optical scanner system (5) of the optical arrangement (4), comprising at least two optical scanners (6), at least twice with a predetermined and/or predefinable variable angle, each time changing the beam path (3) of the beam (1), and the beam (1) is not subject to refraction between each deflection, the beam (1) is also imaged onto the object (2) by means of an imaging optic (7) after its deflection, and a focus area (8) of the beam (1) is placed on and/or into the object (2) by means of the imaging optic (7), at least one swiveling movement of a beam segment (9) exiting the scanner system (5) is also generated, and the swiveling movement and/or at least one rotational movement (15) about the The pivot point (10) causes a movement of the focus area (8) in at least one spatial direction (X, Y) perpendicular to the optical axis of the imaging optics (7), characterized in that during the pivoting movement the pivot point (10) of the beam section (9) lies in the beam path (3) in the imaging optics (7) and the beam (1) is shaped via its beam path (3) by the optical arrangement (4) by means of a beam shaping optics (16), so that a focus area (8) extended in the direction of the beam path (3) is imaged on and/or in the object (2), which extends over at least a part of the dimension of the object (2) formed in the direction of the beam path (3). Method for introducing at least one opening into the object (2) designed as a workpiece (11) made of a transparent material, wherein by means of the method according to Claim 1 at least in the focus area (8) of the beam (1) a modification (20) of the material of the workpiece (11) is produced without any material being removed as a result of the action of the beam (1), so that the opening is subsequently created by the action of an etching medium through an anisotropic removal of the material in the respective area of the modification (20) in the workpiece (11). Procedure according to Claim 1 or 2 , characterized in that a respective rotational movement (15) of the beam section (9) about a rotational axis (12) of the pivot point (10) and thus a respective linear movement of the focus area (8) in a spatial direction (X, Y) is carried out via two cooperating rotational movements (13) of two optical scanners (6) forming a scanner pair about their two mutually parallel rotational axes (14), which deflect the beam (1) in the beam path (3). Method according to at least one of the preceding claims, characterized in that , for the linear movement of the focus area (8) in two spatial directions (X, Y), two rotational movements (15) of the beam section (9) about two rotational axes (12) of the pivot point (10) are superimposed. Procedure according to Claim 3 , characterized in that the rotational movements (13) of the scanners (6) of the scanner pair are asynchronous. Method according to at least one of the preceding claims, characterized in that the imprinting of the beam shaping by means of the beam shaping optics (16) takes place before the entry of the beam (1) into the optical scanner system (5). Method according to at least one of the preceding claims, characterized in that a respective focus area (8) of the beam (1) which changes in its beam path (3) through the optical arrangement (4) due to the deflection is imaged by the imaging optics (7) onto a focal plane (17) on which the respective focus area (8) lies or from which the respective focus area (8) extends. Method according to at least one of the preceding claims, characterized in that the imaging of a respective focus area (8) is carried out telecentrically by the imaging optics (7). Method according to at least one of the preceding claims, characterized in that the movement of the focus area (8) in at least one spatial direction (X, Y) is superimposed with at least one additional movement of a traversing axis (18) belonging to a device, on which at least a part of the optical arrangement (4) belonging to the device is arranged. Procedure according to Claim 9 , characterized in that by superimposing the movement of the focus area (8) in at least one spatial direction (X, Y) with the at least one additional movement of the travel axis (18), the additional movement of the travel axis (18) is at least partially corrected and/or at least partially compensated. Device with an optical arrangement (4), in particular for carrying out a method according to at least one of the preceding claims, wherein the optical arrangement (4) comprises a beam source (19) for emitting a beam (1) of electromagnetic radiation, a scanner system (5) comprising at least two optical scanners (6) each with at least one rotatable deflecting element for deflecting the beam (1), and at least one imaging optic (7) by which the beam (1) can be imaged onto an object (2), and by imaging using the imaging optic (7) a focus area (8) of the beam (1) can be placed on and/or into the object (2), wherein no further optical element is arranged in the beam path (3) between the scanners (6), furthermore, each pair of scanners (6) forms a scanner pair, the axes of rotation (14) of which are aligned parallel to each other, and the optical arrangement (4) comprises at least one scanner pair or at least two scanner pairs, wherein the axes of rotation (14) of the scanner pairs are aligned perpendicular to each other, characterized in that , that the optical arrangement (4) has a beam shaping optic (16) by means of which such beam shaping can be imposed on the beam (1) so that a focus area (8) extended in the direction of the beam path (3) is imaged on and/or in the object (2), which extends over at least a part of the dimension of the object (2) formed in the direction of the beam path (3).