DE102024205567A1 - TEMPERATURE DEVICE FOR TEMPERING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHING PLANT, LITHOGRAPHING PLANT AND METHOD FOR MANUFACTURING A TEMPERATURE DEVICE - Google Patents

Abstract

Temperature control device (200) for temperature control of a position-sensitive component (102) of a lithography system (1), comprising a liquid line (208) for transporting a temperature control fluid (206), wherein
the fluid line (208) has at least one first circumferential section (232) and at least one second circumferential section (234), which together form a closed circumference (U ₁ ) of the fluid line (208), and
comprising at least one second circumferential section (234) comprising an elastic material (220) for damping a pressure fluctuation of the temperature control fluid (206), which is more elastic than a material (227) of the at least one first circumferential section (232).

Description

The present invention relates to a temperature control device for temperature control of a position-sensitive component of a lithography system, a lithography system with such a temperature control device and a method for manufacturing such a temperature control device.

Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system, which includes an illumination system and a projection system. The image of a mask (reticule) illuminated by the illumination system is projected by the projection system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system. This transfers the mask structure onto the photosensitive coating of the substrate.

Driven by the pursuit of ever smaller structures in the fabrication of integrated circuits, EUV lithography systems are currently being developed that utilize light with wavelengths ranging from 0.1 nm to 30 nm, particularly 13.5 nm. Since most materials absorb light of this wavelength, such EUV lithography systems must employ reflective optics, i.e., mirrors, instead of the previously used refracting optics, i.e., lenses.

The demands on the accuracy and precision of the imaging properties of lithography systems are constantly increasing. From a dynamic perspective, it is therefore essential to minimize the influence of disturbances on the movement of various position-sensitive components of the lithography system. For example, very precise positioning of optical components, especially mirrors, is required. Dynamic disturbances of optical components can be generated, for example, by the movement of other components of the lithography system or by acoustic disturbances. Acoustic disturbances can be transmitted to cooled, position-sensitive components of the lithography system as pressure fluctuations of a coolant in the cooling lines of a cooling device. Pressure fluctuations of the coolant are generated, for example, by flow-induced vibrations (FIV).

With the increasing complexity of lithography systems, further dynamic disturbances within and outside the system are to be expected, making additional mechanisms for their suppression or compensation desirable and necessary. Conventional solutions for reducing disturbance excitation of lithography system mirrors caused by flux-induced vibrations include, for example, those from the... WO 2021 013 441 A1 known.

Against this background, one object of the present invention is to provide an improved temperature control device for a lithography system, a corresponding lithography system and an improved method for manufacturing a temperature control device.

According to a first aspect, a temperature control device for temperature-controlling a position-sensitive component of a lithography system is proposed. The temperature control device includes a fluid line for transporting a temperature control fluid. Furthermore, the fluid line has at least a first circumferential section and at least a second circumferential section, which together form a closed circumference of the fluid line. The second circumferential section also includes an elastic material for damping pressure fluctuations in the temperature control fluid, which is more elastic than the material of the first circumferential section.

The elastic material, for example, has a viscoelastic material that is more viscoelastic than a material of at least one first circumferential section.

Because the fluid line has at least one second circumferential section made of (visco-)elastic material, pressure fluctuations of the temperature control fluid can be dampened. This second circumferential section, in particular, has a sound-dampening effect, i.e., it provides acoustic damping. Specifically, when an incoming pressure wave occurs, the second circumferential section is compressed and/or expanded and/or set in motion, so that the energy of the incoming pressure wave is at least partially converted into deformation energy and/or kinetic energy of the elastic material. In the case of a viscoelastic material that exhibits both elastic and viscous properties, the energy of the incoming pressure wave can also be at least partially dampened by the viscous component. This allows the energy of the incoming pressure wave to be dissipated and the amplitude of the outgoing pressure wave to be reduced.

The fluid line has, with respect to its circumference, at least one first circumferential section and at least one second circumferential section. In cross-section, the fluid line also has at least one first circumferential section and at least one second circumferential section. Here, "cross-section" refers specifically to the cross-section of the fluid line perpendicular to its longitudinal direction, its routing direction, and/or the flow direction of the temperature control fluid within the fluid line.

The (visco-)elastic material is therefore only used in the second circumferential section, but not in the first circumferential section. In other words, the elastic material – viewed in relation to the circumference of the fluid line – is only used in one or more sub-sections of the fluid line's circumference, while other sub-sections of the fluid line's circumference are free of the (visco-)elastic material.

This has the advantage that the second circumferential section with the elastic material can be manufactured more easily, as it does not extend over the entire circumference of the fluid line. Furthermore, a seal (e.g., a liquid-tight and/or gas-tight seal) between the second circumferential section with the elastic material and other sections of the fluid line, such as the first circumferential section, can be achieved more easily, since it is not necessary to provide a seal over the entire cross-section, e.g., a round one. Depending on the geometric design, a seal on a flat and/or quasi-flat surface may suffice. For example, by only partially applying the elastic material to the circumference of the fluid line, the interface between the temperature control fluid and an external gas space can also be reduced, thus minimizing the permeation of temperature control fluid into the gas space.

The fact that at least one second circumferential section contains the elastic material includes, for example, that at least one second circumferential section consists predominantly (e.g., over 90%, over 95% and/or over 99%) of the elastic material and/or that at least one second circumferential section consists exclusively of the elastic material.

By way of example only, at least one initial circumferential section covers 50% or more and/or 70% or more of the total circumference of the fluid line.

The fluid line can, for example, have several first circumferential sections and several second circumferential sections. The several first circumferential sections are, for example, arranged at intervals along the circumference. Furthermore, the several second circumferential sections can also be arranged at intervals along the circumference. The several first circumferential sections and the several second circumferential sections are, for example, arranged alternately.

The fluid line, for example, has at least one first line section, which includes at least one first and at least one second circumferential section. The fluid line also has at least one second line section that is free of the second circumferential section. The first and second line sections are, in particular, sections of the fluid line relative to a longitudinal direction, a routing direction, and/or a flow direction of the temperature control fluid within the fluid line. This means that the second circumferential section with the elastic material is only used in a portion of the fluid line, relative to the aforementioned longitudinal direction, routing direction, and/or flow direction. Furthermore, the fluid line can, for example, have several first line sections, each of which includes both the first and second circumferential sections. In other words, the fluid line can, for example, have several first line sections in which pressure fluctuations of the temperature control fluid are dampened by the second circumferential section with the elastic material.

The position-sensitive component of the lithography system can be an optical or a mechanical component, such as a projection lens. In particular, the position-sensitive component is a part that must be held in a precise position with only small tolerances during operation of the lithography system.

The position-sensitive component of the lithography system is, for example, a mirror within the system, such as a mirror in the projection optics. The mirrors of a projection optic in an EUV lithography system are typically mounted on a support frame by means of actuators, allowing for precise positioning of each mirror, e.g., in six degrees of freedom. to be able to adapt. The six degrees of freedom include, in particular, three translational degrees of freedom (e.g., in three mutually perpendicular spatial directions) and three rotational degrees of freedom (e.g., with respect to a rotation about the three mutually perpendicular spatial directions).

The position-sensitive component of the lithography system can also be a support structure and/or frame structure that serves as a (e.g., optical) reference. The position-sensitive component can, for example, be a sensor frame of the lithography system, such as the projection optics of the lithography system. A sensor frame typically includes a sensor device for measuring the current position of one or more optical components of the lithography system relative to the sensor frame. The sensor frame is, for example, vibrationally decoupled from a support frame of the optical component(s). The sensor device comprises, for example, one or more sensors, such as interferometers and/or other measuring devices for detecting the position of the optical component(s). The optical component(s) may, for example, include reflector elements for reflecting light emitted by the sensors (e.g., laser light). For example, the one or more sensors serve to detect the position of the optical component(s) in the six degrees of freedom.

The temperature control device can be used to influence the thermal condition of the position-sensitive component. Specifically, the temperature control device can be used to regulate the temperature of the position-sensitive component, meaning it can be cooled or heated. Accordingly, the temperature control device is, for example, a cooling device or a heating device. Furthermore, the temperature control fluid is, for example, a cooling fluid or a heating fluid.

In the following, the temperature control device is usually described as a cooling device. However, in other embodiments, the temperature control device can also be a heating device. Therefore, whenever the present application refers to a cooling device, cooling unit, cooling, coolant, cooling line, method for manufacturing a cooling device, etc., it could just as easily mean a heating device, heating unit, heating, heating fluid, heating line, method for manufacturing a heating device, etc.

The cooling device, as an example of a temperature control device, serves in particular to prevent high temperatures and temperature fluctuations of the position-sensitive component.

In particular, mirrors in an EUV lithography system (as an example of position-sensitive components) heat up as a result of absorbing the high-energy EUV radiation. The resulting high temperatures and temperature fluctuations within the mirror, and the associated thermal deformations, can lead to wavefront aberrations and thus impair the mirror's imaging properties. To prevent thermally induced deformations, the mirrors in the lithography system can be actively cooled.

The cooling device, as an example of a temperature control device, can also be used (additionally or instead) to cool, for example, a sensor frame (as an example of a position-sensitive component). This prevents thermal crosstalk (e.g., heating of the sensor frame by heat radiation). Heat radiation is caused in particular by ambient light, such as scattered light, from the lithography system, which is absorbed by mirror surfaces or structural elements. Other heat sources can include actuators and heating heads. The cooling device creates a stable temperature environment for the sensor frame. This allows for more accurate position measurement of the mirror or mirrors using the sensor device held by the sensor frame.

The cooling device, as an example of a temperature control device, further comprises, for example, a cooling unit for cooling the coolant, one or more pumps for generating a required coolant flow rate, and one or more valves for controlling the coolant flow.

Cooling requires a specific coolant flow rate, which is achieved via a pump system. This results in dynamic disturbances, as each pump generates local pressure fluctuations. These are transmitted throughout the cooling circuit via coolant noise (aqueous noise, longitudinal water wave). Furthermore, any change in cross-section, any bend in the fluid line, and any valve in the cooling circuit can represent a source of disturbance, causing local pressure fluctuations in the fluid. This type of dynamic disturbance is also called flow-induced vibration (FIV). The disturbance is transmitted to the cooled position-sensitive component via water noise. This causes the position of the position-sensitive component to deviate from its intended position. In particular, a pressure surge of the coolant acts on surfaces of the cooled position-sensitive component. The pressure surge is converted into a force at the surfaces on which it acts. This force causes the position of the position-sensitive component to deviate from a desired position. Generally speaking, any pressure disturbance, such as one or more pressure surges, a harmonic pressure signal, and/or harmonic pressure fluctuations in the coolant, can cause disturbances in the cooled position-sensitive component.

The proposed temperature control device, e.g., a cooling device, with its second circumferential section made of (visco-)elastic material, can dampen pressure fluctuations in the temperature control fluid, e.g., cooling fluid, and reduce or prevent their transmission to the position-sensitive component. Consequently, the imaging performance of the lithography system can be improved. Furthermore, interference can be better compensated for, even in increasingly complex lithography systems with a growing number of sources of interference.

The lithography system is, for example, an EUV or a DUV lithography system. EUV stands for "extreme ultraviolet" and refers to a wavelength of the working light in the range of 0.1 nm to 30 nm, specifically 13.5 nm. DUV stands for "deep ultraviolet" and refers to a wavelength of the working light between 30 nm and 250 nm.

The EUV or DUV lithography system comprises an illumination system and a projection system. Specifically, the EUV or DUV lithography system projects the image of a mask (reticule) illuminated by the illumination system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system, in order to transfer the mask structure onto the photosensitive coating of the substrate.

The fluid line (e.g., cooling line) includes, for example, a fluid pipe (e.g., a metal pipe and/or a stainless steel pipe) with an outer wall. The fluid line (e.g., cooling line) may also include a fluid channel formed within a solid body (e.g., a support frame of the lithography system). The fluid channel may be formed, for example, by machining the solid body (e.g., by cutting, machining, milling, and/or forming). Alternatively, the fluid channel may be formed, for example, by primary forming the solid body (e.g., by casting and/or additive manufacturing).

The fluid line serves, for example, to transport the temperature control fluid to and/or from the position-sensitive component. The fluid line serves, for example, to transport the temperature control fluid from a temperature control unit (e.g., cooling unit) of the temperature control device to the position-sensitive component and/or from the position-sensitive component (back) to the temperature control unit. The temperature control device can also have more than one fluid line.

The temperature control fluid (e.g., cooling fluid) is or includes, for example, water.

The at least one first circumferential section comprises, for example, a rigid material. The at least one first circumferential section comprises, for example, metal and/or stainless steel. For example, the at least one first circumferential section consists predominantly (e.g., over 90%, over 95%, and/or over 99%) and/or exclusively of metal and/or stainless steel.

The at least one second circumferential section with the elastic material is, for example, a (visco-)elastic separating membrane. This at least one second circumferential section with the elastic material is, in particular, deformable (e.g., reversibly) so that pressure fluctuations of the temperature control fluid can be dampened.

The at least one second circumferential section made of elastic material is, for example, fluid-tight, liquid-tight and/or gas-tight.

The at least one second circumferential section comprises, for example, a thin-walled elastic material. The at least one second circumferential section comprises, for example, a viscoelastic material. The material of the at least one second circumferential section includes, for example, polyurethane, silicone, rubber, natural rubber, silicone rubber, fluororubber, perfluororubber, polynorbornene rubber, perfluoroalcyl vinyl ether, perfluoroalkoxy, polyvinyl chloride, one or more thermoplastic elastomers, and/or another elastic material. Fluororubber is particularly well-suited for vacuum applications due to its resistance to aging and low outgassing. The material of the at least one second circumferential section may also include, for example, a fluorothermoplastic such as tetrafluoroethylene, polytetrafluoroethylene, hexafluoropropylene, and/or vinylidene fluoride.

For example, a material of at least one first circumferential section has a first modulus of elasticity. Furthermore, the elastic material of at least one second circumferential section has, for example, a second modulus of elasticity. In addition, the second modulus of elasticity of the elastic material of the at least one second circumferential section is, in particular, lower than the first modulus of elasticity of the first circumferential section.

For illustrative purposes only, the first modulus of elasticity may be in the range of 20 GPa or greater, 50 GPa or greater, or 100 GPa or greater. For example, the material of the first circumferential section is steel, which has a modulus of elasticity of 210 GPa.

For illustrative purposes only, the second modulus of elasticity may be in the range of 5 GPa or less, 3 GPa or less, 2 GPa or less, 1 GPa or less, and/or 0.1 GPa or less. For example, the material of the second circumferential section is rubber, which has a modulus of elasticity of less than 0.1 GPa.

In addition to or instead of different moduli of elasticity, the thickness (e.g., wall thickness) of the at least one second circumferential section can, for example, be smaller than the thickness (e.g., wall thickness) of the at least one first circumferential section.

In the case of a viscoelastic material, whose behavior corresponds to that of a mixture of an elastic solid and a viscous fluid, a variety of viscoelastic processes (e.g., rotation of molecules, unfolding of molecular chains, etc.) can occur, resulting in a complex damping spectrum. The viscoelastic behavior of a material can be described using a relaxation modulus, which indicates the resistance to viscoelastic deformation. The total deformation of a viscoelastic material under load results from the additive superposition of the elastic, viscous, and viscoelastic deformation components.

The at least one second circumferential section with the elastic material is designed, for example, to dampen pressure fluctuations of the temperature control fluid in a frequency range of 1 Hz and above, 10 Hz and above, 1 Hz to 3 kHz, 1 Hz to 1 kHz, 1 Hz to 800 Hz and/or 1 Hz to 500 Hz.

According to one embodiment of the first aspect, the at least one second circumferential section forms at least one separating membrane that separates a liquid space of the liquid line from at least one gas space.

This allows at least one second circumferential section to move and/or deform into the gas space.

The gas space contains a gas, e.g., air.

The liquid chamber of the liquid line serves in particular to hold the temperature control fluid.

According to a further embodiment of the first aspect, the at least one gas space is an open gas space formed by an surrounding space of the liquid line.

This means that the at least one separating membrane, formed by the at least one second circumferential section, separates the liquid space of the liquid line from the open gas space.

The fluid line and/or a section of the fluid line, which has at least one second circumferential section, is located in the surrounding space. For example, if the fluid line has a fluid channel formed in a solid body (e.g., a support frame), then this solid body is also located in the surrounding space.

Furthermore, in this embodiment, the surrounding space contains a gas, i.e., it is filled with a gas, e.g., air.

According to a further embodiment of the first aspect, the temperature control device has at least one closed gas chamber for receiving a gas and providing the at least one gas space. Furthermore, the at least one gas chamber is arranged on the liquid line adjacent to the at least one second circumferential section, such that the at least one second circumferential section separates the at least one gas space of the gas chamber from the liquid space of the liquid line.

The closed gas chamber allows for damping of pressure fluctuations of the temperature control fluid by means of the elastic material of the second circumferential section itself, in addition to the damping of pressure fluctuations of the temperature control fluid due to compression of the separated gas volume.

The at least one second circumferential section forms in particular an elastic separating membrane that separates the at least one gas space from the liquid space in a fluid-tight, liquid-tight and/or gas-tight manner.

The gas in the closed gas chamber, separated from the temperature control fluid in the liquid chamber of the fluid line by the elastic separating membrane, provides a compressible gas volume adjacent to the liquid chamber. This compressible gas volume dampens pressure fluctuations in the temperature control fluid, thus significantly reducing the propagation of pressure fluctuations through the fluid. Specifically, the elastic separating membrane is designed to deform, thereby altering the volume of the liquid chamber at the expense of the volume of the gas chamber.

For example, an increase in the pressure of the temperature control fluid, viewed through the cross-section of the fluid line, causes the separating membrane to deform into the original gas space, thus increasing the volume of the fluid space and simultaneously decreasing the volume of the gas space. Therefore, an increase in the pressure of the temperature control fluid can be dampened by the expansion of the fluid in the fluid space and the compression of the gas in the gas space. One could also say that the gas space stores the energy of an acoustic wave in the temperature control fluid and releases it back to the fluid when the pressure in the fluid drops again.

A similar phenomenon occurs when the pressure of the temperature control fluid in the liquid chamber of the fluid line decreases, leading to an increase in the volume of the gas chamber. This allows the gas in the gas chamber to expand, compressing the temperature control fluid in the liquid chamber and thus dampening the pressure decrease of the temperature control fluid.

Accordingly, periodic pressure fluctuations of the temperature control fluid can also be dampened using the compressible gas volume.

One can also say that the closed gas chamber acts as a spring element and/or elastic element, since the gas compressed in the gas chamber expands again as a reaction.

Providing at least one closed gas chamber is particularly advantageous when the liquid line and/or a section of the liquid line, which has at least one second circumferential section, is located in a low-pressure and/or vacuum environment. This is because, in such a low-pressure and/or vacuum environment, a gas at a predetermined pressure can be supplied by means of the closed gas chamber.

For example, the gas pressure in the at least one gas chamber can optionally be set to a predetermined value ("pre-charge pressure") – e.g., before the initial commissioning of the temperature control device. This allows the compressibility of the gas in the at least one gas chamber, required for sound attenuation through the gas volume, to be preset. Furthermore, the required compressibility of the gas in the at least one gas chamber can also be preset by selecting a volume for the at least one gas chamber and/or by selecting the gas composition.

For example, the gas pressure in the at least one gas chamber can optionally be monitored – e.g., during operation of the temperature control device – using one or more sensors. If necessary, the gas pressure in the at least one gas chamber can be readjusted to the predetermined value (“pre-charge pressure”) by supplying gas into the at least one gas chamber.

The at least one gas chamber comprises, in particular, a container with an interior space that forms the at least one gas space. The at least one gas chamber serves, in particular, to hold a gas. The gas in the gas chamber consists, for example, of air, clean air, nitrogen, helium, and/or another gas. Clean air is, for example, air conforming to one of the purity classes 1 to 9 of the ISO standard. ISO 8573-1:2010 .

The at least one gas chamber is closed both in the cross-section of the liquid line and overall. In particular, the at least one gas chamber is closed in a gas-tight and liquid-tight manner.

For example, the temperature control device has a gas chamber assigned to every second circumferential section. In other words, the number of gas chambers is equal to the number of second circumferential sections.

In embodiments where at least one gas chamber is provided, the at least one second circumferential section can also comprise a non-damping material (e.g., a steel diaphragm). In this case, the damping is achieved a pressure fluctuation of the temperature control fluid via the movement of a gas or fluid in the at least one gas chamber (intramolecular friction).

According to a further embodiment of the first aspect, the liquid line has a liquid pipe with an outer wall, wherein at least one section of the outer wall is replaced by the at least one second circumferential section.

For example, in the manufacturing of a liquid pipe, a raw liquid pipe is provided which, in cross-section, has a closed outer wall (i.e., an outer wall that forms a closed circumference). Then, for example, at least one section of the outer wall is removed in cross-section (e.g., by cutting, machining, and/or milling) to create at least one opening in the liquid pipe. This at least one opening is then covered, for example, by the at least one second circumferential section.

For illustrative purposes only, more than one opening in the liquid tube can be created, and one of the at least two circumferential sections can cover more than one of the openings. For example, two openings in the liquid tube are created, and a second circumferential section is provided that covers both openings. However, other numbers of openings and second circumferential sections are also possible.

According to a further embodiment of the first aspect, the fluid line has a fluid channel formed in a solid body of the lithography system, which, viewed in cross-section, is open to an outer surface of the solid body. Furthermore, the at least one second circumferential section forms a cover for the fluid channel.

This allows the fluid line to be integrated, at least partially, into existing mechanical components of the lithography system. This saves space within the lithography system.

The solid body is, for example, a mechanical component of the lithography system. The solid body is, for example, a support frame and/or a support structure of the lithography system.

For example, the fluid channel in the solid body is formed by cutting, machining and/or milling.

The fluid channel, particularly when viewed in cross-section, is open towards the outside of the solid body. For example, the fluid channel is a channel-shaped depression on the outside of the solid body. The fluid channel is, for instance, an open groove within the solid body.

By designing the fluid conduit, at least in sections, as a cooling channel within the solid body, complex geometries of the fluid conduit are possible. For example, such a cooling channel can also have a curved, multi-curved, and/or serpentine shape. Multiple cooling channels can also be arranged in parallel.

For example, the fluid line also has a supply section, which includes a fluid pipe and is fluidly connected to a first end of the cooling channel in the solid body, e.g., connected at the first end. For example, the fluid line also has a discharge section, which includes a fluid pipe and is fluidly connected to a second end of the cooling channel in the solid body, e.g., connected at the second end.

Furthermore, the fluid line can also have at least one first section with a fluid pipe as described above, with at least the second elastic circumferential section, and at least one second section with a fluid channel as described above, with at least the second elastic circumferential section.

Furthermore, the temperature control device can also have several liquid lines, wherein at least one first line is equipped with a liquid pipe as described above with at least the second elastic circumferential section and at least one second line is equipped with a liquid channel as described above with at least the second elastic circumferential section.

According to a further embodiment of the first aspect, the liquid line, the liquid pipe, a raw liquid pipe from which the liquid pipe is made, and/or the liquid channel each have a cross-section with a circular, oval, polygonal, regularly polygonal, rectangular, square and/or triangular shape.

In other examples, the liquid pipe, the raw liquid pipe, from which the liquid pipe is manufactured, and/or the liquid channel also has a different cross-section than the cross-sections mentioned.

According to a further embodiment of the first aspect, the at least one second circumferential section has a planar shape and/or a plate shape.

In other examples, the at least one second circumference section may also have a different form.

This allows for particularly simple manufacturing of the second circumferential section, particularly simple attachment of the second circumferential section to other elements of the fluid line, and particularly simple sealing of the second circumferential section.

According to a further embodiment of the first aspect, the at least one second circumferential section is attached to an outer wall of the liquid line, or the at least one second circumferential section is attached to a solid body of the lithography system in which a liquid channel of the liquid line is formed.

The outer wall is, in particular, a wall that separates a liquid chamber of the liquid pipe from an external chamber of the liquid pipe. The outer wall has an inner side facing the liquid chamber and an outer side facing the external chamber. The at least one second circumferential section can, for example, be attached to the inner side and/or the outer side of the outer wall of the liquid pipe.

The at least one second circumferential section can be attached to the outer wall of the fluid line or to the solid body in a form-fit manner (e.g. by means of grooves), a force-fit manner (e.g. by pressing) and/or a material-fit manner (e.g. by gluing, soldering and/or welding).

The outer wall of the fluid line or the solid body in which the fluid channel of the fluid line is formed has in particular one or more fastening sections for fastening the at least one second circumferential section.

For example, one or more end sections of at least one second circumferential section are clamped between the said fastening sections.

For example, one or more end sections of at least one second circumferential section have a projection. Furthermore, said fastening section has one or more recesses into which the projection engages.

As an example only, at least one second circumferential section can also be attached to the outer wall of the liquid pipe or to the solid body by adhesive bonding. A suitable adhesive is selected for this purpose, e.g., with regard to tightness, gas tightness, liquid tightness, and/or adhesive strength.

According to a further embodiment of the first aspect, the fluid line has at least one limiting element which is arranged adjacent to the at least one second circumferential section. Furthermore, the at least one limiting element is configured to spatially limit elastic movement and/or deformation of the at least one second circumferential section.

For example, the at least one limiting element is designed to spatially limit elastic movement and/or deformation of the at least one second circumferential section in the direction of the liquid space and/or in the direction of the gas space.

The limiting element is designed and arranged, for example, in such a way that it limits (visco-)elastic movement of the at least one second circumferential section directed towards the liquid space of the liquid line. This prevents the at least one second circumferential section from collapsing into the liquid space when the gas space pressure is high (especially when it is much higher than the pressure of the temperature control fluid in the liquid space).

A second aspect is addressed by proposing a lithography system. This system comprises a position-sensitive component and a temperature control device, as described above, for controlling the temperature of this component.

The temperature control device and/or the position-sensitive component is preferably part of the projection system of the lithography system (projection exposure system). However, the lithography system and/or the position-sensitive component can also be part of an illumination system of the lithography system.

According to one embodiment of the second aspect, the lithography system has a solid body in which a fluid channel a liquid line of the temperature control device is formed, wherein the liquid channel in cross-section is open to an outside of the solid body, and the at least one second circumferential section forms a cover of the liquid channel.

The solid body is, for example, a support frame for the lithography system. More than one fluid channel of a fluid line can also be formed within the solid body.

For example, the massive body is not part of the position-sensitive component and/or is positioned at a distance from the position-sensitive component.

1. a) Bereitstellen einer Vorform der Flüssigkeitsleitung, wobei die Vorform der Flüssigkeitsleitung im Querschnitt gesehen mindestens eine Öffnung aufweist, und
2. b) Anbringen mindestens einer elastischen Membran an der Vorform der Flüssigkeitsleitung, sodass die mindestens eine Öffnung abgedeckt wird.

According to a third aspect, a method for manufacturing a temperature control device for a lithography system is proposed. The temperature control device is designed to control the temperature of a position-sensitive component of the lithography system and includes a fluid line for transporting a temperature control fluid. The method comprises the following steps:

1. a) Providing a preform of the liquid conduit, wherein the preform of the liquid conduit has at least one opening in cross-section, and
2. b) Attaching at least one elastic membrane to the preform of the liquid line so that at least one opening is covered.

The process for manufacturing the temperature control device can also be part of a higher-level process for manufacturing the lithography system.

In particular, the preform of the liquid conduit, viewed in cross-section in step a), has at least one first and at least one second circumferential section. Furthermore, the at least one first circumferential section contains material of the preform of the liquid conduit, whereas the at least one second circumferential section contains no material, but rather at least one opening.

Furthermore, in cross-section, the preform of the fluid conduit, as seen in step b), has the (visco-)elastic membrane in at least one second circumferential section, whereas at least one first circumferential section is free of the (visco-)elastic membrane.

• ein Roh-Flüssigkeitsrohr mit einer im Querschnitt gesehen geschlossenen Außenwand bereitgestellt, und
• mindestens ein Abschnitt der Außenwand im Querschnitt gesehen entfernt, um die mindestens eine Öffnung zu erzeugen.

According to one embodiment of the third aspect, in step a):

• a raw liquid pipe with a closed outer wall in cross-section was provided, and
• at least one section of the outer wall, viewed in cross-section, was removed to create at least one opening.

Removing at least one section of the outer wall involves, for example, cutting, skimming, skimming and/or milling material from the solid body.

In this embodiment, the preform of the liquid line with the at least one opening is formed by the liquid tube that has the opening.

• ein massiver Körper der Lithographieanlage bereitgestellt, und
• ein Flüssigkeitskanal in dem massiven Körper ausgebildet, welcher im Querschnitt gesehen zu einer Außenseite des massiven Körpers hin offen ist, um die mindestens eine Öffnung zu bilden.

According to another embodiment of the third aspect, in step a):

• a massive body of the lithography system was provided, and
• a fluid channel is formed in the solid body, which in cross-section is open to an outside of the solid body in order to form at least one opening.

In this embodiment, the preform of the liquid conduit with the at least one opening is formed by the liquid channel formed in the solid body and open to the outside of the solid body.

The term "one" here is not necessarily to be understood as restricting the number to exactly one element. Rather, it can also refer to multiple elements, such as two, three, or more. Similarly, every other counter used here should not be interpreted as restricting the number to the exact number stated. Instead, numerical deviations, both higher and lower, are possible unless otherwise specified.

The embodiments and features described for the temperature control device apply accordingly to the proposed method and vice versa.

Other possible implementations of the invention also include combinations of features or embodiments described previously or subsequently with regard to the exemplary embodiments, even if not explicitly mentioned. In such cases, the person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

• 1 zeigt einen schematischen Meridionalschnitt einer Projektionsbelichtungsanlage für die EUV-Projektionslithographie;
• 2 zeigt ein optisches System mit einer optischen Komponente der Projektionsbelichtungsanlage aus 1 gemäß einer Ausführungsform;
• 3 zeigt eine Kühlvorrichtung zum Kühlen der optischen Komponente aus 2 gemäß einer Ausführungsform;
• 4 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer Ausführungsform;
• 5 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer weiteren Ausführungsform;
• 6 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer weiteren Ausführungsform;
• 7 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer weiteren Ausführungsform;
• 8 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer weiteren Ausführungsform;
• 9 zeigt eine Flüssigkeitsleitung der Kühlvorrichtung aus 3 in einer Querschnittsansicht entlang Linie IV-IV gemäß einer weiteren Ausführungsform;
• 10 zeigt einen Tragrahmen der Lithographieanlage aus 1 gemäß einer Ausführungsform, wobei an dem Tragrahmen zwei Flüssigkeitsleitungen aus 4 angebracht sind;
• 11 zeigt einen Tragrahmen der Lithographieanlage aus 1 gemäß einer weiteren Ausführungsform, wobei in dem Tragrahmen zwei Flüssigkeitsleitungen in Form von Flüssigkeitskanälen ausgebildet sind;
• 12 veranschaulicht eine Anbringung einer elastischen Membran der Flüssigkeitsleitung gemäß einer Ausführungsform;
• 13 veranschaulicht eine Anbringung einer elastischen Membran der Flüssigkeitsleitung gemäß einer weiteren Ausführungsform;
• 14 veranschaulicht eine Anbringung einer elastischen Membran der Flüssigkeitsleitung gemäß einer weiteren Ausführungsform;
• 15 zeigt ein Flussablaufdiagramm eines Verfahrens zum Herstellen einer Temperiervorrichtung einer Lithographieanlage gemäß einer Ausführungsform; und
• 16 veranschaulicht Verfahrensschritte des Verfahrens aus 14 gemäß einer Ausführungsform.

Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will be explained in more detail below with reference to preferred embodiments and the accompanying figures.

• 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography;
• 2 shows an optical system with an optical component of the projection exposure system made of 1 according to one embodiment;
• 3 shows a cooling device for cooling the optical component made of 2 according to one embodiment;
• 4 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to one embodiment;
• 5 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to a further embodiment;
• 6 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to a further embodiment;
• 7 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to a further embodiment;
• 8 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to a further embodiment;
• 9 shows a liquid line of the cooling device 3 in a cross-sectional view along line IV-IV according to a further embodiment;
• 10 shows a support frame of the lithography system made of 1 according to one embodiment, wherein two fluid lines are attached to the support frame 4 are appropriate;
• 11 shows a support frame of the lithography system made of 1 according to a further embodiment, wherein two liquid lines in the form of liquid channels are formed in the support frame;
• 12 illustrates the attachment of an elastic membrane to the fluid line according to one embodiment;
• 13 illustrates the attachment of an elastic membrane to the fluid line according to a further embodiment;
• 14 illustrates the attachment of an elastic membrane to the fluid line according to a further embodiment;
• 15 shows a flowchart of a method for manufacturing a temperature control device for a lithography system according to one embodiment; and
• 16 illustrates the procedural steps of the process from 14 according to one embodiment.

In the figures, identical or functionally equivalent elements have been labelled with the same reference symbols, unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

1 Figure 1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of the illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, an illumination optic 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the illumination system 2. In this case, the illumination system 2 does not include the light source 3.

A reticule 7 arranged in the object field 5 is exposed. The reticule 7 is held by a reticule holder 8. The reticule holder 8 can be moved, particularly in a scanning direction, via a reticule displacement drive 9.

In the 1 For illustrative purposes, a Cartesian coordinate system with an x-direction x, a y-direction y, and a z-direction z is shown. The x-direction x runs perpendicular to the plane of the drawing. The y-direction y runs horizontally, and the z-direction z runs vertically. The scan direction runs in the 1 along the y-direction y. The z-direction z runs perpendicular to the object plane 6.

The projection exposure system 1 comprises a projection optic 10. The projection optic 10 serves to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 is parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible.

A structure on the reticulum 7 is imaged onto a photosensitive layer of a wafer 13 located in the image plane 12 within the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved, particularly along the y-direction y, via a wafer transfer drive 15. The movement of the reticulum 7 via the reticulum transfer drive 9 and of the wafer 13 via the wafer transfer drive 15 can be synchronized.

Light source 3 is an EUV radiation source. Light source 3 emits, in particular, EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation 16 has a wavelength in the range between 5 nm and 30 nm. Light source 3 can be a plasma source, for example, an LPP source (Laser Produced Plasma) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source. Light source 3 can be a free-electron laser (FEL).

The illumination radiation 16 emanating from the light source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and/or hyperboloid reflective surfaces. The at least one reflective surface of the collector 17 can be illuminated by the illumination radiation 16 at grazing incidence (GI), i.e., with angles of incidence greater than 45°, or at normal incidence (NI), i.e., with angles of incidence less than 45°. The collector 17 can be structured and/or coated to optimize its reflectivity for the useful radiation and to suppress stray light.

After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4.

The illumination optics 4 comprise a deflecting mirror 19 and, downstream in the beam path, a first faceted mirror 20. The deflecting mirror 19 can be a planar deflecting mirror or, alternatively, a mirror with an effect that influences the beam shape beyond the mere deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first faceted mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field faceted mirror. The first faceted mirror 20 comprises a plurality of individual first facets 21, which can also be referred to as field facets. Of these first facets 21, the following are in the 1 These are just a few examples.

The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or semicircular border contour. The first facets 21 can be designed as planar facets or alternatively as convexly or concavely curved facets.

For example, from the DE 10 2008 009 600 A1 As is known, the first facets 21 can themselves each be composed of a multitude of individual mirrors, in particular a multitude of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, refer to the DE 10 2008 009 600 A1 referred.

Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction y.

In the beam path of the illumination optics 4, a second faceted mirror 22 is arranged downstream of the first faceted mirror 20. If the second faceted mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil faceted mirror. The second faceted mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first faceted mirror 20 and the second faceted mirror 22 is also referred to as a specular reflector. Specular reflectors are known from the US 2006/0132747 A1 , the EP 1 614 008 B1 and the US 6,573,978 .

The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

The second facets 23 can also be macroscopic facets, which are, for example, round, rectangular or hexagonal. They may be edged, or alternatively, facets composed of micromirrors. Reference is also made to the following: DE 10 2008 009 600 A1 referred.

The second facets 23 can have planar or alternatively convex or concave curved reflective surfaces.

The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a honeycomb condenser (English: Fly's Eye Integrator).

It can be advantageous not to arrange the second faceted mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second faceted mirror 22 can be arranged at an angle to a pupil plane of the projection optics 10, as is the case, for example, in the DE 10 2017 220 586 A1 is described.

With the aid of the second faceted mirror 22, the individual first facets 21 are imaged into the object field 5. The second faceted mirror 22 is the last beam-shaping, or indeed the last, mirror for the illumination radiation 16 in the beam path before the object field 5.

In another embodiment of the illumination optics 4, not shown, a transmission optic can be arranged in the beam path between the second facet mirror 22 and the object field 5, which contributes in particular to imaging the first facets 21 into the object field 5. The transmission optic can have exactly one mirror, or alternatively two or more mirrors, arranged one behind the other in the beam path of the illumination optics 4. The transmission optic can, in particular, comprise one or two mirrors for normal incidence (NI mirrors) and/or one or two mirrors for grazing incidence (GI mirrors).

The lighting optics 4, in the version shown in the 1 The image shows exactly three mirrors after the collector 17, namely the deflecting mirror 19, the first faceted mirror 20 and the second faceted mirror 22.

In a further embodiment of the lighting optics 4, the deflecting mirror 19 can also be omitted, so that the lighting optics 4 after the collector 17 can then have exactly two mirrors, namely the first faceted mirror 20 and the second faceted mirror 22.

The mapping of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optic into the object plane 6 is regularly only an approximate mapping.

The projection optics 10 comprise a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

In the 1 In the example shown, the projection optics 10 comprise six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The projection optics 10 is a doubly obscured optic. The penultimate mirror M5 and the last mirror M6 each have an aperture for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture that is greater than 0.5 and can also be greater than 0.6, for example, 0.7 or 0.75.

The reflective surfaces of the mirrors Mi can be designed as freeform surfaces without an axis of rotational symmetry. Alternatively, the reflective surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflective surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

The projection optics 10 has a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

The projection optics 10 can be anamorphic. In particular, they have different magnifications βx, βy in the x and y directions. The two magnifications βx, βy of the projection optics 10 are preferably (βx, βy) = (+/- 0.25, +/- 0.125). A positive magnification β indicates a projection without image inversion. A negative magnification β indicates a projection with image inversion.

The projection optics 10 thus lead to a reduction in the x-direction x, that is, in the direction perpendicular to the scan direction, in a ratio of 4:1.

The projection optics 10 lead to a reduction of 8:1 in the y-direction y, that is, in the scan direction.

Other magnification ratios are also possible. Magnification ratios with the same sign and absolute value in the x and y directions (x, y), for example with absolute values of 0.125 or 0.25, are also possible.

The number of intermediate image planes in the x and y directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can differ. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from the US 2018/0074303 A1 .

Each of the second facets 23 is assigned to exactly one of the first facets 21 to form an illumination channel for illuminating the object field 5. This can result, in particular, in illumination according to Köhler's principle. The far field is divided into a multitude of object fields 5 with the help of the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to each of them.

The first facets 21 are each superimposed on a corresponding second facet 23 to illuminate the object field 5 on the reticle 7. The illumination of the object field 5 is particularly homogeneous. It preferably exhibits a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

The illumination of the entrance pupil of the projection optics 10 can be geometrically defined by arranging the second facets 23. By selecting the illumination channels, in particular the subset of the second facets 23 that carry light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting or illumination pupil filling.

Another preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by a redistribution of the illumination channels.

Further aspects and details of the illumination of the object field 5 and, in particular, the entrance pupil of the projection optics 10 are described below.

The projection optics 10 can, in particular, have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

The entrance pupil of the projection optics 10 cannot always be illuminated exactly by the second faceted mirror 22. When the projection optics 10 image the center of the second faceted mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found where the pairwise determined separation of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in real space. In particular, this surface exhibits a finite curvature.

The projection optics 10 may have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second faceted mirror 22 and the reticle 7. This optical element can accommodate the different positions of the tangential and sagittal entrance pupils.

During the 1 In the illustrated arrangement of the components of the illumination optics 4, the second faceted mirror 22 is arranged in a plane conjugate to the entrance pupil of the projection optics 10. The first faceted mirror 20 is arranged at an angle to the object plane 6. The first faceted mirror 20 is arranged at an angle to an arrangement plane defined by the deflecting mirror 19. The first faceted mirror 20 is arranged at an angle to an arrangement plane defined by the second faceted mirror 22.

2 Figure 1 shows an optical system 100 with an optical component 102 (as an example of a position-sensitive component) according to an embodiment.

The optical component 102 is, for example, a mirror of the projection exposure system 1 (lithography system), in particular of the projection optics 10, made of 1 The optical component 102 is, for example, one of the mirrors M1 - M6. In the following, the position-sensitive component 102 is described as a mirror; however, in other examples, it may also be a different optical or mechanical component of the projection exposure system 1 than a mirror.

As in 2 As shown, the mirror 102 comprises a coating 104 with an optically active surface 106. The mirror 102 also comprises a substrate 108. Cooling lines 110 are arranged in the substrate 108, through which a cooling fluid 112, such as water, is circulated to actively cool the mirror 102. Cooling the mirror 102 serves to prevent thermal deformations of the mirror 102, for example, when exposed to high-energy EUV radiation 16 ( 1 ), to avoid.

The mirror 102 is movably attached to a support frame 116 by means of an actuator assembly 114. The actuator assembly 114 comprises, for example, several actuators 118 and a drive unit (not shown). The actuator assembly 114 serves, for example, to move the mirror 102 with respect to six degrees of freedom (translation in the x, y, and z directions and rotation about the x, y, and z directions). 2 to position.

The optical system 100 further includes a sensor device 120 for detecting the current position of the mirror 102. The sensor device 120 is in 2 The sensor device 120 is shown only schematically. It comprises one or more sensors, such as interferometers. The sensors of the sensor device 120 are, for example, attached to a sensor frame (not shown). The sensor frame is, for example, vibration-isolated from the support frame 116. For example, the current position of the mirror 102 is detected using laser beams 122. The sensor device 120 is, for example, configured to detect the position of the mirror 102 in its six degrees of freedom.

In 3 A cooling device 200 (as an example of a temperature control device) for cooling a position-sensitive component 102 (e.g., the mirror 102) is shown. The cooling device 200 has a cooling circuit 202. The cooling device 200 comprises a cooling unit 204 for cooling a coolant 206 and a fluid line 208 (cooling line 208) for transporting the coolant 206. The cooling device 200 also includes one or more pumps 210 for generating a required coolant flow rate of the coolant 206. The cooling device 200 further includes one or more valves 212 for controlling the coolant flow.

Although not shown in the figures, the cooling device 200 can also be used to cool several position-sensitive components 102 of the lithography system 1.

Pumps of the cooling device 200, such as pump 210, cause local pressure fluctuations in the coolant 206. These pressure fluctuations are transmitted throughout the entire cooling circuit 202 via longitudinal water-borne sound waves. Furthermore, changes in cross-sectional area (not shown) of the cooling line 208, bends 214 of the cooling line 208, and valves 212 of the cooling device 200 can also be sources of disturbance that cause local pressure fluctuations in the coolant 206. Such acoustic disturbances are transmitted via water-borne sound to the cooled position-sensitive component 102 (e.g., the mirror 102). This can lead to an undesired change in the position of the position-sensitive component 102.

To dampen pressure fluctuations of the coolant 206, the cooling device 200 includes a silencer assembly 216. The silencer assembly 216 has a sound-dampening element 218. The sound-dampening element 218 has, in particular, an elastic material 220, which can deform elastically and thus at least partially dissipate the energy of a pressure fluctuation of the coolant 206. The elastic material 220 is, for example, a viscoelastic material.

The sound-absorbing element 218 is arranged, in particular, such that it provides a liquid-tight seal for a liquid chamber 222 of the liquid line 208 in a section 224 of the liquid line 208. The section 224 of the liquid line 208 is, in particular, a section of the liquid line 208 with respect to a longitudinal direction of the liquid line 208, a flow direction of the liquid line 208, and/or a flow direction S of the liquid 206 in the liquid line 208. The section 224 of the liquid line 208 has, for example, a length L1 with respect to the longitudinal direction of the liquid line 208, the flow direction of the liquid line 208, and/or the flow direction S of the liquid 206 in the liquid line 208.

In 4 is a cross-section of the liquid line 208 along line IV-IV in 3 shown. In this example, the liquid line 208 has a liquid pipe 226. The liquid pipe 226 is made of a rigid material 227, such as metal and/or stainless steel. The liquid pipe 226 has an outer wall 228, which separates the liquid space 222 from an outer space 230 (i.e., an environment of the liquid line 208).

As in 4 As can be seen, the fluid line 208 has a first circumferential section 232 and a second circumferential section 234 with respect to a circumference U ₁ of the fluid line 208. The first circumferential section 232 and the second Circumferential section 234 together form a closed circumference U ₁ of the liquid line 208. The first circumferential section 232 is formed by the liquid pipe 226. The second circumferential section 234 has the sound-absorbing element 218 with the elastic material 220. In the 4 In the example shown, the second circumferential section 234 consists exclusively of the elastic material 220. In other examples, the second circumferential section 234 may also consist only substantially (e.g., more than 80%, more than 90%, more than 95%, and/or more than 99%) of the elastic material 220. For example, the second circumferential section 234 may also include a fabric or similar material integrated into the (visco-)elastic material 220.

The elastic material 220 of the second circumferential section 234, i.e., of the silencer element 218, is in particular more elastic than the material 227 of the first circumferential section 232, i.e., of the liquid pipe 226.

The second circumferential section 234, i.e., the sound-absorbing element 218, is in particular a membrane 236 (e.g., a separating membrane) that separates the liquid space 222 from a gas space 238. In the example of 4 The gas space 238 is an open gas space provided by an ambient space 230 of the liquid line 206.

Although in 4 Not shown, more than one first scope section 232 and more than one second scope section 234 may be provided (e.g. 6 ).

The liquid pipe 226 in 4 has a circular cross-section _Q1 , from which a secant is cut off to accommodate the sound-absorbing element 218. It can also be said that a raw-liquid pipe C ( 16 ), from which the in 4 The liquid pipe 226 shown is manufactured and has a circular cross-section _Q1 .

In the example of 4 The silencer element 218 has a planar shape P1 (i.e., a plate shape). Each of the silencer elements 218 to 818 shown herein may, for example, have a planar shape P1 or may also have another geometric shape. For example, the silencer element 218, 518, 718 may also have a curved and/or bent shape. For example, the silencer element 218, 518, 718 may have a curved and/or bent shape that follows a curvature of the corresponding fluid tube 226, 526, 726.

In 5 is a cross-section along line IV-IV of a liquid line 308 of the cooling device 200 made of 2 shown according to a further embodiment.

Similar to the liquid line 208 in 4 The liquid line 308 also indicates this. 5 a liquid pipe 326, which is made of metal, e.g., stainless steel. Unlike 4 is a cross-section Q ₂ of the liquid pipe 326 rectangular, e.g. square.

Furthermore, the liquid line 308 shows in 5 - similar to the liquid line 208 in 4 - with respect to a circumference U ₂ of the liquid line 308, a first circumferential section 332 and a second circumferential section 334. The first circumferential section 332 and the second circumferential section 334 together form a closed circumference U ₂ of the liquid line 308. The first circumferential section 332 is formed by the liquid pipe 326. The second circumferential section 334 has - similar to in 4 - a sound-absorbing element 318 with an elastic material 320. The elastic material 320 is, for example, a viscoelastic material. Furthermore, the second circumferential section 334, i.e., the sound-absorbing element 318, forms, in particular, a membrane 336 (e.g., a separating membrane) that separates a liquid space 322 from a gas space 338. Also in the example of 5 The gas space 338 is an open gas space provided by an ambient space 330 of the liquid line 206.

6 shows a view similar to 5 , wherein a liquid line 408 of the cooling device 200 is made 2 as shown in a further embodiment. Similar to the fluid line 308 in 5 The liquid line 408 also indicates this. 6 A liquid pipe 426, which is made of metal, e.g., stainless steel. A cross-section _Q3 of the liquid pipe 426 is similar to the cross-section _Q2 in 5 - rectangular, e.g. square.

Furthermore, the liquid line 408 shows in 6 - similar to the liquid line 208 in 4 and the liquid line 308 in 5 - with respect to a circumference U ₃ of the fluid line 408, several distinct circumferential sections 432a, 432b, 434a, 434b are defined. The several circumferential sections 432a, 432b, 434a, 434b together form a closed circumference U ₃ of the fluid line 408.

In contrast to the liquid line 208 in 4 and to liquid line 308 in 5 The liquid line 408 points to 6 However, two initial circumferential sections 432a, 432b appear, which are from the Liquid pipe 426 is formed. Furthermore, the liquid line 408 includes in 6 Two second circumferential sections 434a, 434b, each comprising a sound-absorbing element 418a, 418b made of an elastic material 420 (e.g., viscoelastic material 420). The sound-absorbing elements 418a, 418b can also comprise different (visco-)elastic materials 420. Each of the two second circumferential sections 434a, 434b, i.e., each of the two sound-absorbing elements 418a, 418b, forms a membrane 436a, 436b that separates a liquid space 422 of the liquid conduit 408 from a gas space 438. Also in the example of 6 The gas space 438 is an open gas space provided by an ambient space 430 of the liquid line 408.

Examples include: 6 Two first circumferential sections 432a, 432b and two second circumferential sections 434a, 434b are shown. However, a liquid line 208, 308, 408 of the cooling device 200 ( 3 ) may also have a different number of first perimeter sections and second perimeter sections.

As in the 7 and 8 As shown, the cooling device can handle 200 ( 3 ), in particular the silencer device 216, each elastic diaphragm 536, 636 also has a closed gas chamber 540, 640. The respective gas chamber 540, 640 serves to hold a gas 542, 642. In addition to damping pressure fluctuations of the coolant 206 by means of the elastic material 520, 620 itself, the closed gas chamber 540, 640 can also provide damping of pressure fluctuations of the coolant 206 due to a compressible gas volume.

In 7 Is a liquid pipe 526 similar to the one in 4 shown. A sound-absorbing element 518 is also shown, which is arranged (e.g., attached) to the liquid pipe 526. The sound-absorbing element 518 has an elastic material 520, which can deform elastically and thus at least partially dissipate the energy of a pressure fluctuation of the coolant 206. The liquid line 508 in 7 With respect to a circumference U ₄ of the fluid line 508, a first circumferential section 532 is formed by the fluid pipe 526. Furthermore, with respect to circumference U ₄ , the fluid line 508 comprises a second circumferential section 534, formed by the sound-absorbing element 518 with the elastic material 520.

The gas chamber 540 has a gas space 544 for receiving the gas 542. The gas 542 in the gas chamber 540 is, for example, adjusted to a predetermined gas pressure (pre-charge pressure) before the cooling device is put into operation.

The sound-absorbing element 518 now forms a separating membrane 536, which separates the gas space 544 from a liquid space 522 of the liquid line 508. The separating membrane 536 separates the gas space 544 from the liquid space 522 in a liquid-tight manner. The separating membrane 536 also separates the gas space 544 from the liquid space 522 in a gas-tight manner.

8 Figure 6 shows a fluid line 608 according to a further embodiment. The fluid line 608 is similar to the fluid line 308 in Figure 3. 5 In particular, it also has a liquid pipe 626 with a rectangular cross-section Q _2. Unlike the liquid line 308 in 5 The liquid line 608 has a closed gas chamber 640 similar to the gas chamber 540 in 7 on. The liquid line 608 in 8 includes - similar to the liquid line 308 in 5 - with respect to a circumference U ₅ of the liquid line 608, a first circumferential section 632, formed by the liquid pipe 626, and a second circumferential section 634, formed by a sound-absorbing element 618 with an elastic material 620. The sound-absorbing element 618 forms a separating membrane 636, which separates a gas space 644 of the gas chamber 640 from a liquid space 622 of the liquid line 608.

In 9 is a liquid line 708 of the cooling device 200 from 3 as shown according to a further embodiment (in cross-section along line IV-IV in 3 The liquid line 708 exhibits – similar to the liquid line 208 in 4 - a silencer element 718 with an elastic material 720, which is attached (e.g.) to a liquid pipe 726 of the liquid line.

Liquid line 708 has - similar to liquid line 208 in 4 - a first circumferential section 732, which is formed by the liquid pipe. Furthermore, the liquid pipe 708 has a second circumferential section 734, which is formed by the silencer element 718.

As in 9 As illustrated, the fluid line 708 also includes a limiting element 746, which is arranged adjacent to the at least one second circumferential section 734, i.e., to the silencer element 718. The limiting element 746 is shown in the example by 9 also arranged within the liquid chamber 722 of the liquid line 708. This means that the boundary element 746 is in the example of 9 The limiting element 746 is arranged in the coolant 206. For example, the limiting element 746 has a rigid grid structure or another rigid structure with openings, such that the limiting element 746 is permeable to the coolant 206. In other examples, the limiting element 746 can also have a flexible grid structure (e.g., threads, wires, and/or fibers) or another flexible structure with openings. The limiting element 746 is designed to spatially limit elastic movement and/or deformation of the second circumferential section 734, i.e., the elastic silencer element 718. By arranging the limiting element 746, the silencer element 718 can only move into the fluid space 722 of the fluid line 708 up to the limiting element 746.

In the example of 9 The silencer element 718 has a planar shape P1 (i.e., a plate shape) with a principal extent plane that extends into the plane of the drawing. In the example of 9 The boundary element 746, for example, also has a planar shape P2 with a principal extent plane that extends into the plane of the drawing. Furthermore, the silencer element 718 and the boundary element 746 are shown arranged parallel to each other (i.e., so that their principal extent planes are parallel to each other).

Although in 9 Not shown, the liquid line 708 can also be a gas chamber - similar to the one in 7 shown - exhibit. In addition, a boundary element - similar to the boundary element 746 in 9 - even in the case of one, several or all of the items in the 4 to 8 and 11 The fluid lines shown, 208, 308, 408, 508, 608, 808, are used.

10 Figure 1 illustrates the attachment of two fluid lines 208 to a body K1, e.g., a support element and/or a support frame, of the lithography system 1. Although in 10 Where two fluid lines 208 are shown attached to the body K1, there may also be only one fluid line 208 or more than two fluid lines 208 attached to the rigid body K1. Furthermore, the one or more fluid lines 208 attached to the body K1 may be any of those shown in the 4 to 9 The fluid line shown is 208, 308, 408, 508, 608, 708.

As in 11 As illustrated, a liquid line 808 can, however, instead of a liquid pipe 226, 326, 426, 526, 626, 726, have an outer wall 228 ( 4 to 9 ) also have a fluid channel 848, which is formed in a solid body K2. In 11 Two liquid lines 808 are shown in cross-section as examples, the cross-section being perpendicular to a respective longitudinal direction of the liquid lines 808 or to a flow direction S of the cooling liquid in the liquid lines 808. However, it is also possible to have only one liquid line 808 or more than two liquid lines 808, each having a liquid channel 848 formed in the solid body K2.

Each fluid channel 848 is, for example, cut and/or milled into the solid body K2. However, each fluid channel 848 can also be formed in the solid body K2 in another way.

Each liquid channel 848 is configured in the solid body K2 such that, viewed in cross-section, the liquid channel 848 is open towards an outer surface 850 of the solid body K2. That is, each liquid channel 848 has an opening 852 on its outer surface 850. Each liquid channel 848 can also be described as a channel and/or a depression with respect to the outer surface 850 of the solid body K2.

A first circumferential section 832 of the liquid line 808 is formed by the surfaces of the liquid channel 848. A second circumferential section 834 of the liquid line 808 is formed by the silencer element 818 with the elastic diaphragm.

The fluid channel 848 is in 11 shown with a rectangular cross-section Q _3. In other examples, however, a fluid channel 848 formed in the solid body K2 can also have a different cross-sectional shape, e.g. round, with rounded corners, circular, oval, polygonal, etc.

Furthermore, each of the liquid lines 808 has a silencer element 818 which covers the corresponding opening 852.

In the embodiment of the fluid line 808 as formed in a solid body of the lithography system 1, e.g. milled, installation space in the lithography system 1 can be saved. In particular, unlike the example in 10 - for the liquid line(s) 808 in 11 Essentially, no additional installation space is required. Furthermore, the 848 channels are easy to manufacture and offer the possibility of realizing even complex geometries of 808 fluid lines.

The massive body K2 can, for example, be a support frame for the lithography system 1.

Optionally, a gas chamber 840 – similar to the gas chamber 540 in – can be attached to the liquid line 808. 7 and gas chamber 640 in 8 - be provided for, as in 11 marked with dashed lines.

Optionally, although in 11 Not shown, the fluid line 808, viewed in cross-section, may also have more than one second circumferential section 834, i.e., more than one separating membrane. A spacer may, for example, be provided between each pair of the multiple second circumferential sections 834.

In the 12 to 14 Various embodiments of attaching a silencer element 918, 918', 918" are shown. In particular, embodiments of attaching the silencer element 918, 918', 918" of a fluid line, such as one of the fluid lines 208, 308, 408, 508, 608, 708 and 808, to a mounting section 954 of the corresponding fluid line are shown. The mounting section 954 of the corresponding fluid line, to which the silencer element 918, 918', 918" is attached, can, for example, be a section of a wall 228 of a fluid pipe 226, 326, 426, 526, 626, 726 ( 4 to 9 ) or can be a section of a solid body K2 in which a fluid channel 848 is formed ( 11 ).

As in 12 As can be seen, for example, an end section 956 of the silencer element 918 can be clamped between two mounting sections 954.

As in 13 As can be seen, an end section 956' of the silencer element 918' may, for example, have a section projecting (e.g. curved) from a main extension plane of the silencer element 918', which engages in a recess 958' of a fastening section 954'.

As in 14 As can be seen, an end section 956" of the silencer element 918" may, for example, have a section projecting from a main extension plane of the silencer element 918" that engages in a recess 958" of a mounting section 954".

Although in the 12 to 14 Not shown, a further end section of the silencer element 918, 918', 918" opposite the respective end section 956, 956', 956" shown can be designed similarly (e.g., mirror-symmetrically) to the end section 956, 956', 956". Furthermore, the attachment of the further end section to a corresponding fastening element (similar to the fastening element 954, 954', 954", e.g., mirror-symmetrically) can be carried out in a similar manner.

The following refers to 15 A method for manufacturing a temperature control device 200 for a lithography system 1 is described.

The temperature control device 200 ( 3 The temperature control device 200 is specifically designed for temperature control of a position-sensitive component 102 of the lithography system 1. Furthermore, the device has a fluid line 208, 308, 408, 508, 608, 708, 808 for transporting a temperature control fluid 206.

In the first step S1 of the process, a preform A ( 16 ) of the liquid line 208, wherein the preform A of the liquid line 208 has at least one opening B in cross-section.

In a first variant S1' of step S1, a raw-liquid pipe C with a closed outer wall 228' in cross-section is initially provided, as in 16 As seen above. Next, a section D of the outer wall 228', as seen in cross-section, is removed to create at least one opening B. For example, section D of the outer wall 228' is cut off. In the middle of 16 The preform A of the liquid line 208 with the created opening B can be seen.

It should be noted that the section D of the outer wall 228', which is removed to create the at least one opening B, may also be smaller or larger than shown. 16 shown. In other words, the arc length L2 of section D can also be smaller or larger than shown. 16 shown.

A shorter arc length L2 of section D is particularly advantageous when a flat membrane 236 is to be used. This is because, with a shorter arc length L2 of section D, the opening B is also smaller in cross-section and can be more easily covered by a flat membrane 236. Furthermore, this flat membrane 236 is easier to install.

In a second variant S2' of step S1, a massive body K2 is first created ( 11 ) the lithography system 1 is provided. Then a fluid channel 848 is formed in the solid body K2. In addition, the fluid channel 848 is designed such that, viewed in cross-section, it is open to an outer surface 850 of the solid body K2 in order to form at least one opening 852.

The fluid channel 848 is formed, for example, by cutting, machining and/or milling in the solid body K2.

In a second step S2 of the process, at least one elastic membrane 236 is attached to the preform A of the liquid line 208, so that the at least one opening B is covered. This is in 16 Illustrated below.

The procedure can be used to clean any of the fluid lines 208, 308, 408, 508, 608, 708, 808 ( 4 to 11 to produce.

This allows for the simple manufacture of a liquid line 206 with an elastic diaphragm 236 as a silencer element 218 for damping pressure fluctuations of the liquid 206. In particular, the liquid line 206 is manufactured such that, with respect to its circumference U _1, it has at least one first circumferential section 232 and at least one second circumferential section 234, wherein the elastic diaphragm 236 is only present in the second circumferential section 234.

The temperature control device 200 can, for example, also be used in a DUV lithography system.

Although the present invention has been described using exemplary embodiments, it can be modified in many ways.

REFERENCE MARK LIST

1

Projection exposure system

2

Lighting system

3

light source

4

Lighting optics

5

Object field

6

Object level

7

Reticles

8

Label holder

9

Reticle displacement drive

10

Projection optics

11

Image field

12

Image plane

13

Wafer

14

Wafer holder

15

wafer transfer drive

16

Lighting radiation

17

collector

18

Intermediate focus plane

19

Deflection mirror

20

first faceted mirror

21

first facet

22

second faceted mirror

23

second facet

100

optical system

102

position-sensitive component

104

coating

106

optically active surface

108

substrate

110

Cooling line

112

coolant

114

Actuator setup

116

support frame

118

actuator

120

Sensor device

122

laser beam

200

Temperature control device (cooling device)

202

Cooling circuit

204

Temperature control unit (cooling unit)

206

Temperature control fluid (cooling fluid)

208

liquid line

210

pump

212

valve

214

Deflection

216

Silencer device

218

sound damping element

220

elastic material

222

liquid space

224

Pipe section

226

liquid pipe

227

material

228, 228'

Exterior wall

230

Outdoor space

232

Scope section

234

Scope section

236

membrane

238

Gas space

308

liquid line

318

sound damping element

320

elastic material

322

liquid space

326

liquid pipe

330

surrounding area

332

Scope section

334

Scope section

336

membrane

338

Gas space

408

liquid line

418a

sound damping element

418b

sound damping element

420

elastic material

422

liquid space

426

liquid pipe

430

surrounding area

432a

Scope section

432b

Scope section

434a

Scope section

434b

Scope section

436a

membrane

436b

membrane

438

Gas space

508

liquid line

518

sound damping element

520

elastic material

522

liquid space

526

liquid pipe

532

Scope section

534

Scope section

536

membrane

540

Gas chamber

542

gas

544

Gas space

608

liquid line

618

sound damping element

620

elastic material

622

liquid space

626

liquid pipe

632

Scope section

634

Scope section

636

Separating membrane

640

Gas chamber

642

gas

644

Gas space

708

liquid line

718

Silencer element

720

elastic material

722

liquid space

726

liquid pipe

732

Scope section

734

Scope section

746

Boundary element

808

liquid line

818

Silencer element

832

Scope section

834

Scope section

840

Gas chamber

848

channel

850

Outside

852

opening

918, 918', 918"

Silencer element

954, 954', 954"

Fastening section

956, 956', 956"

Final section

958', 958"

Exclusion

A

preform

B

opening

C

raw-liquid pipe

D

Section

K1

Body

K2

Body

L1

length

L2

arc length

M1-M6

Mirror

P1

form

P2

form

Q1-Q3

cross-section

S

Direction

S1-S2, S1', S''

Procedural steps

U1-U5

Scope

x, y, z

Directions

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions.

Cited patent literature

• WO 2021 013 441 A1 [0005]
• DE 10 2008 009 600 A1 [0122, 0126]
• US 2006/0132747 A1 [0124]
• EP 1 614 008 B1 [0124]
• US 6,573,978 [0124]
• DE 10 2017 220 586 A1 [0129]
• US 2018/0074303 A1 [0143]

Cited non-patent literature

• ISO 8573-1:2010 [0062]

Claims (15)

Temperature control device (200) for temperature control of a position-sensitive component (102) of a lithography system (1), comprising a fluid line (208) for transporting a temperature control fluid (206), wherein the fluid line (208) has at least a first circumferential section (232) and at least a second circumferential section (234), which together form a closed circumference (U ₁ ) of the fluid line (208), and the at least one second circumferential section (234) has an elastic material (220) for damping a pressure fluctuation of the temperature control fluid (206), which is more elastic than a material (227) of the at least one first circumferential section (232). temperature control device according to Claim 1 , wherein the at least one second circumferential section (234, 534) forms at least one separating membrane (236, 536) that separates a liquid space (222, 522) of the liquid line (208, 508) from at least one gas space (238, 544). temperature control device according to Claim 2 , wherein the at least one gas space (238) is an open gas space formed by an surrounding space (230) of the liquid line (208). temperature control device according to Claim 2 , comprising at least one closed gas chamber (540) for receiving a gas (542) and for providing the at least one gas space (544), wherein the at least one gas chamber (540) is arranged on the liquid line (508) adjacent to the at least one second circumferential section (534), such that the at least one second circumferential section (534) separates the gas space (544) of the at least one gas chamber (540) from the liquid space (522) of the liquid line (508). Temperature control device according to one of the Claims 1 until 4 , wherein the liquid line (208) has a liquid pipe (226) with an outer wall (228), and at least one section (D) of the outer wall (228) is replaced by the at least one second circumferential section (234). Temperature control device according to one of the Claims 1 until 4 , wherein the fluid line (808) has a fluid channel (848) which is formed in a solid body (K2) of the lithography apparatus (1) and is open in cross-section to an outside (850) of the solid body (K2), and which has at least a second circumferential section (834) forming a cover for the fluid channel (848). Temperature control device according to one of the Claims 1 until 6 , wherein the liquid line (208), a liquid pipe (226) of the liquid line (208), a raw liquid pipe (C) from which the liquid pipe (226) is made, and/or the liquid channel (848) each have a cross-section (Q ₁ , Q ₂ , Q ₃ ) with a circular, oval, polygonal, regular polygonal, rectangular, square and/or triangular shape. Temperature control device according to one of the Claims 1 until 7 , wherein the at least one second circumferential section (234) has a planar shape (P1) and/or a plate shape (P1). Temperature control device according to one of the Claims 1 until 8 , wherein at least one second circumferential section (234) is attached to an outer wall (228) of the liquid line (208), or the at least one second circumferential section (834) is attached to a solid body (K2) of the lithography system (1) in which a liquid channel (848) of the liquid line (808) is formed. Temperature control device according to one of the Claims 1 until 9 , wherein the fluid conduit (708) has at least one limiting element (746) which is arranged adjacent to the at least one second circumferential section (734), and the at least one limiting element (746) is configured to spatially limit elastic movement and/or deformation of the at least one second circumferential section (734). Lithography system (1) with a position-sensitive component (102) and a temperature control device (200) according to one of the Claims 1 until 10 for temperature control of the position-sensitive component (102). Lithography system according to Claim 11 , comprising a solid body (K2) in which a liquid channel (848) of a liquid line (808) of the temperature control device (200) is formed, wherein the liquid channel (848) is open in cross-section to an outside (850) of the solid body (K2), and the at least one second circumferential section (834) forms a cover of the liquid channel (848). Method for manufacturing a temperature control device (200) of a lithography system (1), wherein the temperature control device (200) is for temperature control of a position-sensitive component (102) the lithography system (1) is set up and has a fluid line (208) for transporting a temperature control fluid (206), comprising the steps of: a) providing (S1) a preform (A) of the fluid line (208), wherein the preform (A) of the fluid line (208) has at least one opening (B) in cross-section, and b) attaching (S2) at least one elastic membrane (236) to the preform (A) of the fluid line (208) such that the at least one opening (B) is covered. Procedure according to Claim 13 , wherein in step a): a raw liquid pipe (C) with an outer wall (228') closed in cross-section is provided (S1'), and at least one section (D) of the outer wall (228') is removed in cross-section (S1') to create the at least one opening (B). Procedure according to Claim 13 , wherein in step a): a solid body (K2) of the lithography system (1) is provided (S1''), and a fluid channel (848) is formed in the solid body (K2) (S1''), which in cross-section is open to an outside (850) of the solid body (K2) to form the at least one opening (B).