DE102019201916A1 - Method and device for inspection of nano and microstructures - Google Patents

Abstract

The present invention relates to an optical arrangement and to a method for inspecting nano - or microstructures of an object (1) by comparing a plurality of optical images of the nano - or microstructures to be examined with a plurality of reference images of ideally to the nano - or Microstructures identical reference structures, wherein the plurality of optical images and the plurality of reference images are each created with different focus settings using an optical arrangement, wherein the optical arrangement comprises an object area (4) and an image area (6), wherein the image area (6) a plurality of image sensors (7) or a plurality of separately readable regions of an image sensor and the nano or microstructures of the object (1) to be examined are moved through the object region (4) such that the same nano - or microstructures to be examined are applied to the different images nsoren (7) or separate areas of an image sensor are mapped, wherein each image sensor (7) or each separate area of an image sensor detects a picture with different focus.

Description

BACKGROUND OF THE INVENTION

FIELD OF THE INVENTION

The present invention relates to a method for inspecting nano - or microstructures of an object, in particular wafers in the microlithographic production of nano - or microstructured components, as well as an optical arrangement for carrying out a corresponding method.

STATE OF THE ART

In the production of nanostructured or microstructured components of microelectronics or microsystems technology, the components produced for quality assurance must be checked at least randomly, but preferably without any gaps. Such inspection of patterned semiconductors or wafers is very expensive, since the structured components require a high resolution of the imaging methods due to the small structural dimensions for the inspection.

In order to be able to use optical arrangements which work with visible light and which enable the required resolution in the imaging, for example, image reconstruction methods such as HR-SIM, so-called super-resolution methods, are required, which are also very time-consuming due to the image reconstruction.

Although the use of electromagnetic radiation with much smaller wavelengths to image the nano - or microstructured components allows a much higher resolution for imaging, but at the same time the technical complexity is much higher, since the materials used for the nano - or microstructured components at wavelengths smaller than 100 nm or 50 nm have no sufficiently high reflectivity, so that in addition the inspection speed is reduced. The use of scanning electron microscopes or the like also leads to a significant reduction in the inspection speed, so that no efficient methods for inspecting nano - or microstructured components are available.

Although there are efforts in the field of optical microscopy to improve the resolution or the information content of optical images, for example, by recording techniques in which several images are combined with different focus settings, but also these methods and devices are for the inspection of nano - or microstructured components not yet optimally suitable. For example, Ravikiran Attota, Ronald G Dixson and András E. Vladár are described in Through-Focus Scanning Optical Microscopy in Proc. SPIE 8036, Scanning Microscopy 2011: Advanced Microscopy Tehnologies for Defense, Homeland Security, Forensic, Life, Environmental and Industrial Sciences, 803610 (June 01, 2011) describes that this can reduce measurement inaccuracies in the analysis of nano- or microstructured components. However, this is only achieved by using those images with the optimum focus setting from a plurality of images with different focus settings.

In addition, methods are known in which so-called TDI image sensors (for example charge coupled device (CCD)) sensors with Time Delay Integration (TDI) (Time Delay Integration) are used to record line by line images during the integration time for a TDI Line through a focus layer area so that an image averaged over the focus layer area is generated ( EP 2 477 055 ). The same is true of the US Pat. No. 6,583,865 B2 is achieved, in which the TDI image sensor is arranged at an angle to the image plane, so that during the integration time an averaged image is taken, which includes both defocused and focused images. A disadvantage of these solutions is that no distinction between focused and defocused images is possible and there is no possibility for the subsequent selection of an image with the optimal focus position or viewing multiple images with different focal position.

The US Pat. No. 7,702,181 B2 again describes a line scanning method, wherein several focal positions are detected with each line by line recording. Although in this method, the optimum focus position can be retrieved later in the stack of captured images, no improvement in the effective resolution is achieved.

The US Pat. No. 4,845,558 discloses a method and apparatus for detecting errors in repetitive microstructures by comparing corresponding recordings with stored reference values, but again, no improvement in resolution is achieved.

DISCLOSURE OF THE INVENTION

OBJECT OF THE INVENTION

It is therefore an object of the present invention to provide a method and a device with which an inspection of nano - and microstructured components with high Resolution can be performed with the least possible effort in an efficient manner. In particular, an optical arrangement is to be used which can be operated with visible light and nevertheless enables the detection of defects in the nanometer and micrometer range with reasonable process times.

TECHNICAL SOLUTION

This object is achieved by a method having the features of claim 1 and an optical arrangement having the features of claim 11. Advantageous embodiments are the subject of the dependent claims.

According to the invention, it is proposed to move an area of an object with nano- or microstructures to be examined through the object area of an objective of an optical arrangement and to record a plurality of images of the same area to be examined by several image sensors arranged in the image area of the objective of the corresponding optical arrangement during this scanning process , wherein the different images are taken with different focus settings to obtain a stack with differently focused optical images of an examined area of an object with nano - and microstructures.

Accordingly, an optical arrangement according to the invention has an object holder for receiving the object to be examined with the nano- or microstructures, which is suitable for scanning the object in the object area of an objective of the optical arrangement. At the same time, the optical arrangement in the image area of the objective comprises a plurality of image sensors, each of which is planar, i. Two-dimensional images of the object to be examined can detect, so that according to the scan progress, the various image sensors in the image area of the lens, the respective same area, i. Two - dimensional area of an object to be examined with nano - or microstructures can sequentially capture. Instead of a plurality of separate image sensors for two-dimensional or two-dimensional detection of images, a single image sensor with separately readable regions can also be provided, which is likewise suitable for consecutively detecting a plurality of two-dimensional or two-dimensional images in the different, separately readable regions.

By the movement of the object to be examined with the nano - or microstructures through the object area and the corresponding continuous acquisition of images of the area of the object to be examined in the plurality of image sensors in the image area of the objective becomes similar to the known recording technique in which a moving object on a Moving film is recorded that achieves fast editing, ie a detection of the object to be examined in a scan, however, a high resolution is achieved. This is additionally supported by the simultaneous variation of the focus, so that aberrations such as curvature of field or astigmatism can be corrected.

The stack of images of the same area of the object with nano- or microstructures to be examined in this way can be compared with a stack of reference images of reference structures that have been generated in the same way in order to identify possible errors in the nano- or microstructures , The reference structures are theoretically or ideally identical to the nano- or microstructures of the object to be inspected, so that errors can be determined in a simple manner by comparing the image stack of images of the object to be examined with the reference images.

The movement of the object to be examined through the object region of the objective can take place stepwise or continuously, the corresponding detection of the object to be examined being suitably adapted by the image sensors.

In order to accommodate the plurality of image sensors for detecting the two-dimensional images of the object to be examined in the image area of the objective, the objective must have a larger field of view than is usual in the case of objectives for inspection systems of this type in the prior art. In particular, the image field of the objective must correspond in at least one dimension to the majority of the dimensions of the image sensors used.

The corresponding optical arrangement comprises a control unit for controlling the object holder or the movement thereof and for controlling the image sensors or the separate areas of an image sensor, such that during the movement of the object to be examined through the object area the same area of the object to be examined with nano - or Microstructures in turn on the different image sensors or areas of an image sensor in the image area of the lens is mapped.

A stack of images of the object to be examined with different focus settings can, as already mentioned, in the method according to the invention in a scanning process, ie in a unidirectional or translational Movement of the object to be generated by the object area. Alternatively, it is also possible to capture multiple images with different focus settings by repeated scans. Although this increases the detection time, depending on the size of the image area and the size of the image sensors or the area of the object to be recorded, an acceptable processing time is nevertheless realized with a high resolution.

The different focussing of the images in an image stack can be realized by various measures or combinations thereof.

On the one hand, the focus adjustment of the lens can be changed, wherein in the case of an objective with a corresponding focusing device, the focus adjustment of the objective can be carried out automatically.

Moreover, it is possible to move the object to be examined with respect to the focus position, i. by a continuous or stepwise movement of the nano - or microstructures to be examined transversely, in particular perpendicular to the object plane of the objective to change the focus adjustment with respect to the area to be examined.

Another way to change the focus of the imaging area is to arrange the image sensors or the separate areas of an image sensor, which are separately readable, obliquely to the image plane of the lens, so that according to the position of the image sensor different focus settings in the capture of the image given are.

In addition to the arrangement of the image sensors or the separately readable areas of an image sensor in a plane which is arranged at an angle α obliquely to the image plane of the lens, each image sensor or each separate area of an image sensor can be arranged in a different plane, wherein the different levels, in which the image sensors are arranged, in each case run parallel to the image plane. In this context, it should be noted that it depends only on the different arrangement with respect to the image plane to realize different focus settings. It is thus also possible to arrange the image sensors locally with the aid of deflecting mirrors or beam splitters or the like, in order to be able to take into account, for example, given space conditions.

The images of the nano - and microstructures to be examined and the reference images of the reference structures can be created using the same, in particular the same optical arrangement or with corresponding comparable optical arrangements.

From the stack of images, a combined image of the nano- or microstructures to be examined can be generated, wherein in the image different regions of different images can be used which have the respectively best focus for the respective region. As a result, aberrations, such as astigmatism and field curvature, in the generated image of the object to be examined can be eliminated. For example, in structures to be imaged having edges in two orthogonal directions, these edges may be aligned along the principal directions of astigmatism error of the objective, so that an astigmatism corrected image can be reconstructed from the images of the focus stack by selecting the best for the respective structural directions Image or the best image area is selected from the image stack.

To improve the result, the process can be repeated. In particular, it is possible to repeat the detection of the multiple images with different focus settings at least once, until a stack of multiple images is present, which is symmetrical with respect to the best focus position, that is, for example, equal to many over- and under-focused images to a picture with the best focus setting.

The best focus position with the best focus can be adjusted with respect to the optical axis and the rest of the image field, for example by changing the object with the object holder in its position in the direction of the optical axis. Alternatively, the optimum focus position, in particular at the location of the optical axis, can also be set by changing the focusing system of the objective. In order to set the best focus position for the rest of the image field, a corresponding correction after a calibration can then always be made in a similar manner.

For the acquisition of the focused images, it may be necessary for the image field regions or the image regions used for the evaluation to be enlarged with increasing defocus in order to capture the complete information of the defocused image.

For the generation of corresponding images or images of the object to be examined and their evaluation, known image processing methods such as interpolation or mathematical orientation of the image to the reference image application find.

Furthermore, it is possible to influence both the illumination light for illuminating the object to be examined and the imaging light in the imaging beam path, for example with regard to the polarization state or with regard to the distribution of the light in the illumination pupil or imaging pupil. For this purpose, the corresponding optical arrangement in a lighting arrangement with an illumination beam path have polarization elements and or other optical elements for influencing the illumination light. In the same way, the objective can likewise comprise corresponding polarization elements and / or further optical elements for influencing the imaging light.

In addition, color filters in the image area of the objective can be arranged in front of the image sensors or the separate areas of an image sensor, and in particular different color filters, in order to correct chromatic aberrations.

The image sensors may be selected from the group consisting of full field image sensors, CCD sensors, CMOS sensors and TDI sensors, and combinations thereof.

The optical arrangement can furthermore have an evaluation unit for automated comparison of the plurality of optical images of the nano- or microstructures to be examined with a plurality of reference images.

list of figures

• 1 eine Darstellung einer erfindungsgemäßen optischen Anordnung mit einer Detaildarstellung des Bildfeldes in Draufsicht,
• 2 bis 6 weitere Darstellungen gemäß der 1 mit unterschiedlicher Position des zu untersuchenden Objekts gemäß dem Scanfortschritt und der gleichzeitigen Aktivierung unterschiedlicher Bildsensoren zur Erfassung der Abbildung der zu untersuchenden Nano - oder Mikrostrukturen des Objekts,
• 7 eine weitere Darstellung eines Bildfeldes einer erfindungsgemäßen optischen Anordnung mit den im Bildbereich angeordneten Bildsensoren,
• 8 die dazugehörige Seitenansicht des Bildbereichs mit Bildebene und Bildsensoren sowie in
• 9 eine Darstellung einer weiteren Ausführungsform einer erfindungsgemäßen optischen Anordnung.

The accompanying drawings show in a purely schematic manner in FIG

• 1 a representation of an optical arrangement according to the invention with a detailed representation of the image field in plan view,
• 2 to 6 further representations according to the 1 with different position of the object to be examined according to the scan progress and the simultaneous activation of different image sensors for detecting the image of the nano - or microstructures of the object to be examined,
• 7 a further illustration of an image field of an optical arrangement according to the invention with the image sensors arranged in the image area,
• 8th the associated side view of the image area with image plane and image sensors and in
• 9 a representation of another embodiment of an optical arrangement according to the invention.

EMBODIMENTS

Further advantages, characteristics and features of the present invention will become apparent from the following detailed description of the embodiments. However, the invention is not limited to these embodiments.

The 1 shows in a purely schematic side view an embodiment of an optical arrangement according to the invention, with which a method for the inspection of nano or microstructures of an object can be carried out according to the present invention.

The optical arrangement comprises an object holder 2 on which an object 1 can be arranged with nano - or microstructures, which is to be investigated. The object holder 2 is movable, so the object stored thereon 1 in an object area 4 is movable. The object area 4 is through a lens 3 defines with which the object 1 or the nano - or microstructures arranged thereon in an image area 6 of the lens 3 can be imaged in which several image sensors 7 or an image sensor with separately readable areas for capturing images of the object 1 are arranged. The optical arrangement can be operated with visible light and can be formed in particular by a light microscope.

Through the lens 3 will be next to the object area 4 with an object plane 5 an image plane 11 defines, so that an object 1 in the object plane 5 through the lens 3 into the picture plane 11 can be displayed.

As can be seen from the presentation of 1 and in particular the detailed representation of the image field 12 in the 1 results is the image field 12 sized so large that several image sensors 7 or a plurality of separately readable areas of an image sensor in the image field 12 can be arranged. The picture field is corresponding 12 many times larger than in conventional optical arrangements that are used to image the nano or microstructures to be investigated in the prior art.

From the side view of the 1 It can be seen that in the embodiment shown, the image sensors 7 or the separately readable areas of an image sensor in a plane 15 are arranged side by side, at an angle α diagonally to the image plane 11 of the image field 12 is aligned. Accordingly, individual image sensors take 7 an object 1 , which is in the object plane 5 is located, defocused, when it is above or below the image plane 11 are located.

As mentioned before, the object holder is 2 movably formed, the object holder 2 parallel to the object plane 5 preferably in a unidirectional, translational movement can move. The movement of the object holder 2 is controlled by a control unit 9 controlled by a signal and data line 10 with the object holder 2 is connected, for example, corresponding control data to the drive of the object holder 2 to convey.

In addition, the control unit 9 via signal and data lines 10 both with the lens 3 as well as with the image sensors 7 connected. Accordingly, the control unit 9 Control signals to the image sensors 7 transmit to the image sensors 7 for capturing an image and the captured image information via the data and control line 10 read. Through the connection of the control unit 9 with the lens 3 can the lens 3 with an autofocus function automatically in the focus adjustment can be varied so that object and image plane 5 . 11 can be adjusted.

According to the invention, the control unit 9 set up so that according to the movement of the object holder 2 with the object to be examined 1 along the object plane 5 the individual image sensors 7 or separately readable areas of an image sensor are controlled to record a corresponding image, so by a scanning process in which the object 1 on the object holder 2 according to the scanning direction 14 in the object area 4 of the lens 3 along the object plane 5 is moved, several pictures from the image sensors 7 in the image area 6 be detected by the lens, wherein the oblique arrangement of the series of image sensors 7 the images are captured with different focus.

At the in 1 the situation shown is the object 1 at the beginning of the scan movement along the scan direction 14 and the first image sensor 7 is for capturing an image of the object 1 or the nano - or microstructures arranged thereon.

As is clear from the 2 to 6 results, the object becomes as the scan progresses 1 with the object holder 2 through the object area 4 of the lens 3 along the object plane 5 moves and at the same time, in turn, the juxtaposed image sensors 7 to capture the image of the object 1 from the control unit 9 activated. This will result in a scan multiple images of the same object 1 or the same nano - or microstructures with different focussing. While the middle image sensors 7 in relation to the object level 5 almost in the area of the best focus in the image plane 11 are located at the edge of the series of image sensors 7 arranged image sensors 7 outside of the object level 5 focus and capture accordingly defocused or under- or over-focused images.

From the captured images, various information can be obtained. Thus, for example, from a stack of different images with different focussing for each pixel of the nano - or microstructures to be examined, each on one of the image sensors 7 In this case, an image of the nano- or microstructures to be examined can be composed of the plurality of images, wherein for each image area of the composite image the image area of the image with the best focus position can be selected. Accordingly, optical errors such as field curvature or astigmatism can be corrected.

In addition to producing an optimally focused image combined with the optimum focus for as many as each pixel of the composite image, the images or stack of differently focussed images can also be used directly with a stack of reference images of reference structures to detect deviations the investigated nano - or microstructures of reference structures in a simple manner. For this it is only necessary to image a reference object with corresponding reference structures, which essentially correspond to the ideal shape of the nano- or microstructures to be examined, in the same way, so that when comparing the stack of images of the nano- or microstructures to be examined with the stack Reference images of the reference structures deviations can be detected in a simple manner. Thus, in the production of nano- or microstructured components of microelectronics or microsystems technology production errors can be determined at high speed, the inspection or inspection of the components can be largely automated.

The optical system may accordingly comprise an evaluation unit, which in the control unit 9 can be integrated, wherein the evaluation unit stored reference images with the of the image sensors 7 can compare captured images to determine deviations.

The 7 shows a picture box 12 according to the detailed representations in the 1 to 6 , where in the image field 12 of the 7 eight instead of six image sensors 7 or separately readable areas of an image sensor are arranged side by side. The arrow again turns into the scanning direction 14 displayed, in which the object to be examined with the nano - and or microstructures through the object area 4 is moved and the image sensors are switched according to the movement progress to record the image.

In the accompanying picture of 8th is the arrangement of the image sensors 7 shown in a side view. This figure is thus apparent that unlike the embodiment of the 1 to 6 the image sensors 7 not in one plane 15 are arranged obliquely to the image plane 11 runs, but that the image sensors 7 in height, ie offset in the direction of the optical axis to each other in different to the image plane 11 parallel planes are arranged. This also ensures that the image sensors 7 Take pictures of the object in different focus position.

In the embodiment of the 1 to 6 Furthermore, the possibility is shown, the focus position by an appropriate adjustment of the lens 3 , in particular automated via the data and signal line 10 to vary and / or the focus of the object to be imaged 1 by a movement of the object holder 2 along the optical axis, as indicated by the double arrow, to vary. These types of change of the focal position during the scanning process are conceivable.

To improve the measurement results, a scan with the production of several images with different focussing can be carried out repeatedly or several times in succession, for example to determine the best focus position for imaging the nano- or microstructures to be examined, and a stack of images with different foci symmetrical defocusing to produce the best focus position. In the embodiment shown the 1 to 6 This would mean that after a first scan by a movement of the object holder 2 along the optical axis 13 the object 1 can be adjusted with respect to the optimal focus position. Alternatively or additionally, the focusing can nevertheless be a setting of the autofocus of the objective 3 to be changed. Accordingly, then in a second scan, the average image sensors 7 to the best focus on the image plane 11 aligned while the image sensors 7 At the edges record the images that are symmetrically defocused to the best focus position.

In addition, for a second or further scans, the arrangement of the object 1 in the object holder 2 be changed so that in structures to be imaged with preferably in two orthogonal directions edges, these edges along the main directions of astigmatism error of the lens are aligned, so that the astigmatism of the lens can be optimally corrected.

As is clear from the 8th can give a longitudinal chromatic aberration by arranging corresponding color filters 16 in front of the image sensors 7 or the separately readable areas of an image sensor can be corrected.

In addition to the color filters 16 It is also conceivable in the lens 3 or in the imaging beam path to provide polarization elements for influencing the polarization of the imaging light or optical elements for influencing the light distribution in the imaging pupil.

In the same way can also polarization elements or other optical elements 19 for influencing the illumination light in a lighting arrangement 17 for illuminating the object to be imaged 1 attach as schematically in the 9 With respect to an embodiment of the optical arrangement comparable to the optical arrangement of the embodiment of 1 to 6 is shown. In the lighting arrangement 17 is next to the light source 18 schematically an optical element 19 , such as a polarizing filter.

In addition, the method of inspecting nano- or microstructures may be performed so that the total number of images of a batch of images with different focussing is not detected in one scan, but in several substeps. Although this increases the overall duration of the inspection, there is still an accuracy and time advantage over prior art methods.

Although the present invention has been described in detail with reference to the embodiments, it will be understood by those skilled in the art that the invention is not limited to these embodiments, but rather modifications are possible in the manner that individual features omitted or other combinations of features can be realized without departing from the scope of the appended claims. In particular, the The present disclosure includes all combinations of the individual features shown in the various embodiments, so that individual features that are described only in connection with one embodiment can also be used in other embodiments or combinations of individual features not explicitly shown.

LIST OF REFERENCE NUMBERS

1

Object with nano - or microstructures to be examined

2

movable object holder

3

lens

4

Property area

5

object level

6

image area

7

Image sensors or separately readable areas of an image sensor

8th

active image sensor or area of an image sensor

9

control

10

Data and / or control lines

11

image plane

12

field

13

optical axis

14

scanning direction

15

level

16

color filter

17

lighting arrangement

18

light source

19

optical element

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• EP 2477055 [0006]
• US 6583865 B2 [0006]
• US 7702181 B2 [0007]
• US 4845558 A [0008]

Claims (20)

Method for inspecting nano - or microstructures of an object (1) by comparing a plurality of optical images of the nano - or microstructures to be examined with a plurality of reference images of reference structures which are ideally identical to the nano - or microstructures to be examined, wherein the plurality of optical Illustrations and the plurality of reference images are respectively created with different focus settings by means of an optical arrangement, wherein the optical arrangement comprises an object area (4) and an image area (6), wherein the image area (6) several image sensors (7) or more separately readable Comprises regions of an image sensor and the nano - or microstructures of the object to be examined are moved through the object region such that the same nano - or microstructures to be examined are imaged on the different image sensors or separate regions of an image sensor n, wherein each image sensor (7) or each separate area of an image sensor detects a picture with different focussing. Method according to Claim 1 , characterized in that the nano - or microstructures of the object (1) to be examined are moved stepwise or continuously through the object area (4) and corresponding to the movement of the nano - or microstructures to be examined through the object area, the image sensors (7) or the separate ones Areas of the image sensor detect the nano - or microstructures to be examined. Method according to one of the preceding claims, characterized in that the image sensors (7) or the separate regions of an image sensor sequentially detect an image in accordance with the movement of the nano- or microstructures to be examined through the object region. Method according to one of the preceding claims, characterized in that the plurality of images are generated one after the other in a particular unidirectional movement of the nano- or microstructures to be examined by the object region (4) or several repeated, in particular unidirectional, movements of the nano- or microstructures to be examined. Method according to one of the preceding claims, characterized in that the different foci of the several images are realized by one or more measures comprising: a change in the focus of the objective (3), a continuous or stepwise movement of the nano - or microstructures to be examined transverse, in particular perpendicular to the object plane (5) of the objective during or between the production of the images, by an oblique to the image plane (11) of the lens arrangement of the image sensors or the separate areas of an image sensor and the arrangement of the image sensors or the separate areas of an image sensor different levels parallel to the image plane (11). Method according to one of the preceding claims, characterized in that the optical images of the nano- and microstructures to be examined and the reference images of the reference structures are created with the aid of the same optical arrangement or a corresponding optical arrangement. Method according to one of the preceding claims, characterized in that an image is generated from the plurality of images, in which regions of different images are combined with the respectively best focus for the respective region. Method according to one of the preceding claims, characterized in that the method is carried out repeatedly and / or that the detection of a plurality of images is repeated at least once until a stack of several images is symmetrical to the focus position. Method according to one of the preceding claims, characterized in that the focus position with respect to the optical axis and the rest of the image field is adjusted. Method according to one of the preceding claims, characterized in that the image field regions detected by the image sensors (7) or the separate regions of the one image sensor are enlarged with increasing defocusing. Optical arrangement for inspecting nano - or microstructures of an object (1), in particular for carrying out the method according to one of the preceding claims, having an object holder (2) for arranging an object (1) with nano - or microstructures to be examined, a lens ( 3) for imaging an object located in the object region (4) of the objective in the object holder, an image region (6) with a plurality of image sensors (7) or a plurality of separately readable regions of an image sensor into which the objective (3) is located in the object region of the objective Nano - or Microstructures of the object to be examined, and with a control unit (9) for controlling the object holder (2) and the image sensors (7) or the separate areas of the one image sensor, so that the same to be examined nano or microstructures of the object on the various image sensors or areas of an image sensor are mapped. Optical arrangement according to Claim 11 , characterized in that the image sensors (7) are selected from the group comprising full field image sensors, CCD sensors, CMOS sensors and TDI sensors or combinations thereof. Optical arrangement according to Claim 11 or 12 , characterized in that the plurality of image sensors (7) or the plurality of separate regions of an image sensor are arranged in a plane (15) which forms an angle α with respect to the image plane (11). Optical arrangement according to Claim 11 or 12 , characterized in that the plurality of image sensors (7) are arranged in different planes parallel to the image plane (11). Optical arrangement according to one of the preceding Claims 11 to 14 , characterized in that the object holder (2) is linearly or two-dimensionally parallel to an object plane (5) of the objective and / or transversely, in particular perpendicular to the object plane of the objective in the object region (4) movable. Optical arrangement according to one of the preceding Claims 11 to 15 , characterized in that the optical arrangement further comprises an automatically adjustable focusing device, with the different focus settings of the lens for the image of the object holder in the object are adjustable. Optical arrangement according to one of the preceding Claims 11 to 16 , characterized in that the optical arrangement further comprises an evaluation unit for the automated comparison of a plurality of optical images of the nano- or microstructures to be examined with a plurality of reference images of reference structures that are ideally identical to the nano- or microstructures to be examined. Optical arrangement according to one of the preceding Claims 11 to 17 , characterized in that in the image area (6) in front of the image sensors or the separate areas of the one image sensor color filter (16), in particular different color filters are arranged. Optical arrangement according to one of the preceding Claims 11 to 18 , characterized in that the optical arrangement comprises a lighting arrangement (17) with an illumination beam path , wherein in the illumination beam path polarization elements for influencing the polarization state of the illumination light and / or further optical elements (19) for influencing the distribution of the illumination light are arranged in an illumination pupil. Optical arrangement according to one of the preceding Claims 11 to 19 , characterized in that the objective (3) comprises polarization elements for influencing the polarization state of the imaging light and / or further optical elements for influencing the distribution of the imaging light in an imaging pupil.

Images