DE102009027094A1 - Method for the cementation of nickel and/or cobalt on copper comprises contacting a copper surface with a liquid phase containing nickel and/or cobalt ions and an ionic liquid and depositing nickel and/or cobalt in a currentless manner - Google Patents

Abstract

Method for the cementation of nickel and/or cobalt on copper comprises contacting an object having a copper surface with a liquid phase containing nickel and/or cobalt ions and an ionic liquid containing anions and cations and depositing nickel and/or cobalt on the copper surface in a currentless manner.

Description

The The present invention relates to a method for the cementation of Nickel and / or cobalt on copper.

For the deposition of metals on the surface of objects, such as metal surfaces, exist in the state the technique numerous procedures.

To the One can create metal surfaces thereby be that metals evaporated in a high vacuum and then deposited again become. This is known as "physical vapor deposition" Method is further supplemented by the so-called chemical vapor deposition method, in which prior to deposition of a metal a chemical reaction takes place, so that typically the to be separated metal before the reaction in a higher Oxidation level is present.

The However, metals can also be deposited from their ions done electrochemically. For example, there exist galvanic processes for depositing metals on surfaces, which can serve, for example, for cleaning the metal, wherein prior to the reductive deposition, oxidative dissolution he follows.

For example, the electrodeposition in US-A 2002/070112 described. Also electroless deposits are known in the art. Here, such an electroless deposition of metals on less noble metals with simultaneous dissolution of these less noble metals is called cementation.

As an example of such electroless deposition in aqueous systems is disclosed US-A 3,930,847 the cementation of copper on iron.

at However, this cementation process is not any deposition possible, because in the given milieu only one deposition of the less noble metal is possible.

Therefore There is a need, despite the methods known in the art on alternative methods involving the electroless deposition of certain Metals on metal surfaces, of which different metals have enable.

A The object of the present application is thus to provide such methods to provide.

• (a) Inkontaktbringen eines Gegenstandes, der zumindest teilweise eine Kupferoberfläche aufweist, mit einer flüssigen Phase enthaltend Ionen zumindest eines der Metalle ausgewählt aus der Gruppe der Metalle bestehend aus Nickel und Kobalt sowie eine ionischen Flüssigkeit enthaltend Anionen und Kationen und
• (b) stromlose Abscheidung von Nickel und/oder Kobalt auf der Kupferoberfläche.

The object is achieved by a method for cementation of nickel and / or cobalt on copper containing the step

• (a) contacting an article having at least partially a copper surface with a liquid phase containing ions of at least one of the metals selected from the group of metals consisting of nickel and cobalt and an ionic liquid containing anions and cations and
• (b) electroless deposition of nickel and / or cobalt on the copper surface.

It has been shown to be using ionic liquids the deposition of nickel and / or cobalt on copper possible is, even though their standard redox potential in aqueous Medium is lower than that of copper.

Prefers the deposition of nickel on copper.

the inventive method for the cementation of Nickel and / or cobalt on copper may be an activation step of Copper surface to be upstream. in principle Such activation methods are known in the art. A such activation can be achieved, for example, by mechanical means done with a polisher. In addition, a reductive Activation, if necessary, where appropriate existing copper oxide is converted into copper. Suitable reducing agents are hydrogen or diisobutylaluminum hydride (DIBAL). Also, an etching process, for example, with iodine, hydrogen chloride gas, hydrochloric acid solutions, Peroxides or potassium metal alkylates or alcoholates is possible.

Basically, standard methods of substrate preparation in galvanic processes are suitable. This can be, for example, a chemical and / or galvanic degreasing and optionally a Include drying.

The Contact and find the subsequent cementation in the presence of an ionic liquid instead.

Suitable ionic liquids and their preparation are for example DE-A 10 2005 017 733 known.

sowie Oligomere, die diese Strukturen enthalten.Generally preferred are ionic liquids which have cations which are selected from the compounds of the formulas (IVa) to (IVw):

and oligomers containing these structures.

sowie Oligomere, die diese Struktur enthalten.Further suitable cations are compounds of the general formula (IVx) and (IVy)

and oligomers containing this structure.

• • der Rest R für Wasserstoff, einen Kohlenstoff enthaltenden organischen, gesättigten oder ungesättigten, acyclischen oder cyclischen, aliphatischen, aromatischen oder araliphatischen, unsubstituierten oder durch 1 bis 5 Heteroatome oder funktionelle Gruppen unterbrochenen oder substituierten Rest mit 1 bis 20 Kohlenstoffatomen; und
• • die Reste R¹ bis R⁹ unabhängig voneinander für Wasserstoff, eine Sulfo-Gruppe oder einen Kohlenstoff enthaltenden organischen, gesättigten oder ungesättigten, acyclischen oder cyclischen, aliphatischen, aromatischen oder araliphatischen, unsubstituierten oder durch 1 bis 5 Heteroatome oder funktionelle Gruppen unterbrochenen oder substituierten Rest mit 1 bis 20 Kohlenstoffatomen, wobei die Reste R¹ bis R⁹, welche in den oben genannten Formeln (IV) an ein Kohlenstoffatom (und nicht an ein Heteroatom) gebunden sind, zusätzlich auch für Halogen oder eine funktionelle Gruppe stehen können; oder
• • zwei benachbarte Reste aus der Reihe R¹ bis R⁹ zusammen auch für einen zweibindigen, Kohlenstoff enthaltenden organischen, gesättigten oder ungesättigten, acyclischen oder cyclischen, aliphatischen, aromatischen oder araliphatischen, unsubstituierten oder durch 1 bis 5 Heteroatome oder funktionelle Gruppen unterbrochenen oder substituierten Rest mit 1 bis 30 Kohlenstoffatomen.

In the above formulas (IVa) to (IVy)

• • the radical R is hydrogen, a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups radical having 1 to 20 carbon atoms; and
• • the radicals R ¹ to R ⁹ independently of one another are hydrogen, a sulfo group or a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups Radical having 1 to 20 carbon atoms, wherein the radicals R ¹ to R ⁹ , which in the abovementioned formulas (IV) are bonded to a carbon atom (and not to a heteroatom), may additionally also stand for halogen or a functional group; or
• • two adjacent radicals from the series R ¹ to R ⁹ together also for a divalent, carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups or substituted radical with 1 to 30 carbon atoms.

Suitable hetero atoms in the definition of the radicals R and R ¹ to R ^{9 are in} principle all heteroatoms in question which are capable of formally a -CH ₂ -, a -CH =, a -C≡ or a = C = group to replace. When the carbon-containing group contains heteroatoms, oxygen, nitrogen, sulfur, phosphorus and silicon are preferable. Particularly preferred groups which may be mentioned are -O-, -S-, -SO-, -SO ₂ -, -NR'-, -N =, -PR'-, -PR ¹ ₂ and -SiR ' ₂ -, wherein the radicals R 'are the remainder of the carbon-containing radical. The radicals R ¹ to R ⁹ are, in the cases in which those in the above-mentioned Formulas (IV) to a carbon atom (and not to a heteroatom) bound also be bound directly via the heteroatom.

Suitable functional groups are in principle all functional groups which may be bonded to a carbon atom or a heteroatom. Suitable examples include -OH (hydroxy), = O (especially as carbonyl group), -NH ₂ (amino), = NH (imino), -COOH (carboxy), -CONH ₂ (carboxamide), -SO ₃ H (sulfo ) and -CN (cyano). Fractional groups and heteroatoms can also be directly adjacent, so that combinations of several adjacent atoms, such as -O- (ether), -S- (thioether), -COO- (ester), -CONH- (secondary amide) or -CONR'- (tertiary amide), are included, for example, di (C ₁ -C ₄ alkyl) amino, C ₁ -C ₄ alkyloxycarbonyl or C ₁ -C ₄ alkyloxy.

When Halogens are called fluorine, chlorine, bromine and iodine.

• • unverzweigtes oder verzweigtes, unsubstituiertes oder ein bis mehrfach mit Hydroxy, Halogen, Phenyl, Cyano, C₁- bis C₆-Alkoxycarbonyl und/oder Sulfonsäure substituiertes C₁- bis C₁₈-Alkyl mit insgesamt 1 bis 20 Kohlenstoffatomen, wie beispielsweise Methyl, Ethyl, 1-Propyl, 2-Propyl, 1-Butyl, 2-Butyl, 2-Methyl-1-propyl (Isobutyl), 2-Methyl-2-propyl (tert.-Butyl), 1-Pentyl, 2-Pentyl, 3-Pentyl, 2-Methyl-1-butyl, 3-Methyl-1-butyl, 2-Methyl-2-butyl, 3-Methyl-2-butyl, 2,2-Dimethyl1-propyl, 1-Hexyl, 2-Hexyl, 3-Hexyl, 2-Methyl-1-pentyl, 3-Methyl-1-pentyl, 4-Methyl-1-pentyl, 2-Methyl-2-pentyl, 3-Methyl-2-pentyl, 4-Methyl-2-pentyl, 2-Methyl-3-pentyl, 3-Methyl-3-pentyl, 2,2-Dimethyl-1-butyl, 2,3-Dimethyl-1-butyl, 3,3-Dimethyl-1-butyl, 2-Ethyl-1-butyl, 2,3-Dimethyl-2-butyl, 3,3-Dimethyl-2-butyl, 1-Heptyl, 1-Octyl, 1-Nonyl, 1-Decyl, 1-Undecyl, 1-Dodecyl, 1-Tetradecyl, 1-Hexadecyl, 1-Octadecyl, 2-Hydroxyethyl, Benzyl, 3-Phenylpropyl, 2-Cyanoethyl, 2-(Methoxycarbonyl)-ethyl, 2-(Ethoxycarbonyl)-ethyl, 2-(n-Butoxy-carbonyl)-ethyl, Trifluormethyl, Difluormethyl, Fluormethyl, Pentafluorethyl, Heptafluorpropyl, Heptafluorisopropyl, Nonafluorbutyl, Nonafluorisobutyl, Undecylfluorpentyl, Undecylfluorisopentyl, 6-Hydroxyhexyl und Propylsulfonsäure;
• • Glykole, Butylenglykole und deren Oligomere mit 1 bis 100 Einheiten und einem Wasserstoff oder einem C₁- bis C₈-Alkyl als Endgruppe, wie beispielsweise R^AO-(CHR^B-CH₂-O)_n-CHR^B-CH₂- oder R^AO-(CH₂CH₂CH₂CH₂O)_n-CH₂CH₂CH₂CH₂O- mit R^A und R^B bevorzugt Wasserstoff, Methyl oder Ethyl und n bevorzugt 0 bis 3, insbesondere 3-Oxabutyl, 3-Oxapentyl, 3,6-Dioxaheptyl, 3,6-Dioxaoctyl, 3,6,9-Trioxadecyl, 3,6,9-Trioxaundecyl, 3,6,9,12-Tetraoxatridecyl und 3,6,9,12-Tetraoxatetradecyl;
• • Vinyl; und N,N-Di-C₁- bis C₆-alkyl-amino, wie beispielsweise N,N-Dimethylamino und N,N-Diethylamino.

The radical R preferably stands for

• • straight-chain or branched, unsubstituted or monosubstituted to hydroxyl, halogen, phenyl, cyano, C ₁ - to C ₆ -alkoxycarbonyl and / or sulfonic acid-substituted C ₁ - to C ₁₈ -alkyl having a total of 1 to 20 carbon atoms, such as, for example, methyl , Ethyl, 1-propyl, 2-propyl, 1-butyl, 2-butyl, 2-methyl-1-propyl (isobutyl), 2-methyl-2-propyl (tert-butyl), 1-pentyl, 2- Pentyl, 3-pentyl, 2-methyl-1-butyl, 3-methyl-1-butyl, 2-methyl-2-butyl, 3-methyl-2-butyl, 2,2-dimethyl-1-propyl, 1-hexyl, 2-hexyl, 3-hexyl, 2-methyl-1-pentyl, 3-methyl-1-pentyl, 4-methyl-1-pentyl, 2-methyl-2-pentyl, 3-methyl-2-pentyl, 4- Methyl 2-pentyl, 2-methyl-3-pentyl, 3-methyl-3-pentyl, 2,2-dimethyl-1-butyl, 2,3-dimethyl-1-butyl, 3,3-dimethyl-1 butyl, 2-ethyl-1-butyl, 2,3-dimethyl-2-butyl, 3,3-dimethyl-2-butyl, 1-heptyl, 1-octyl, 1-nonyl, 1-decyl, 1-undecyl, 1-dodecyl, 1-tetradecyl, 1-hexadecyl, 1-octadecyl, 2-hydroxyethyl, benzyl, 3-phenylpropyl, 2-cyanoethyl, 2- (methoxycarbonyl) -ethyl, 2- (ethoxycar bonyl) -ethyl, 2- (n-butoxy-carbonyl) -ethyl, trifluoromethyl, difluoromethyl, fluoromethyl, pentafluoroethyl, heptafluoropropyl, heptafluoroisopropyl, nonafluorobutyl, nonafluoroisobutyl, undecylfluoropentyl, undecylfluoroisopentyl, 6-hydroxyhexyl and propylsulfonic acid;
• • Glycols, butylene glycols and their oligomers having 1 to 100 units and a hydrogen or a C ₁ - to C ₈ alkyl as an end group, such as R ^A O- (CHR ^B -CH ₂ -O) _n -CHR ^B -CH ₂ - or R ^A O- (CH ₂ CH ₂ CH ₂ CH ₂ O) _n -CH ₂ CH ₂ CH ₂ CH ₂ O- with R ^A and R ^{B is} preferably hydrogen, methyl or ethyl and n is preferably 0 to 3, in particular 3 Oxabutyl, 3-oxapentyl, 3,6-dioxaheptyl, 3,6-dioxaoctyl, 3,6,9-trioxadecyl, 3,6,9-trioxaundecyl, 3,6,9,12-tetraoxatridecyl and 3,6,9 , 12-tetraoxatetradecyl;
• • vinyl; and N, N-di-C ₁ to C ₆ alkylamino such as N, N-dimethylamino and N, N-diethylamino.

Particularly preferably, the radical R is unbranched and unsubstituted C ₁ - to C ₁₈ -alkyl, such as, for example, methyl, ethyl, 1-propyl, 1-butyl, 1-pentyl, 1-hexyl, 1-heptyl, 1-octyl, 1 -Decyl, 1-dodecyl, 1-tetradecyl, 1-hexadecyl, 1-octadecyl, in particular methyl, ethyl, 1-butyl and 1-octyl, and also CH ₃ O- (CH ₂ CH ₂ O) _n -CH ₂ CH ₂ - and CH ₃ CH ₂ O- (CH ₂ CH ₂ O) _n -CH ₂ CH ₂ - where n is 0 to 3rd

• • Wasserstoff;
• • Halogen;
• • eine funktionelle Gruppe;
• • gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituiertes und/oder durch ein oder mehrere Sauerstoff- und/oder Schwefelatome und/oder ein oder mehrere substituierte oder unsubstituierte Iminogruppen unterbrochenes C₁-C₁₈-Alkyl;
• • gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituiertes und/oder durch ein oder mehrere Sauerstoff- und/oder Schwefelatome und/oder ein oder mehrere substituierte oder unsubstituierte Iminogruppen unterbrochenes C₂-C₁₈-Alkenyl;
• • gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituiertes C₆-C₁₂-Aryl;
• • gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituiertes C₅-C₁₂-Cycloalkyl;
• • gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituiertes C₅-C₁₂-Cycloalkenyl; oder
• • einen gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituierten fünf- bis sechsgliedrigen, Sauerstoff-, Stickstoff- und/oder Schwefelatome aufweisenden Heterocyclus bedeuten; oder zwei benachbarte Reste zusammen für
• • einen ungesättigten, gesättigten oder aromatischen, gegebenenfalls durch funktionelle Gruppen, Aryl, Alkyl, Aryloxy, Alkyloxy, Halogen, Heteroatome und/oder Heterocyclen substituierten und gegebenenfalls durch ein oder mehrere Sauerstoff- und/oder Schwefelatome und/oder ein oder mehrere substituierte oder unsubstituierte Iminogruppen unterbrochenen Ring.

The radicals R ¹ to R ⁹ are preferably each independently

• • hydrogen;
• • halogen;
• • a functional group;
• Optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted and / or interrupted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino C ₁ -C _18- alkyl;
• Optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted and / or interrupted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino C ₂ -C ₁₈ alkenyl;
• Optionally C ₆ -C ₁₂ -aryl substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles;
• Optionally C ₅ -C ₁₂ -cycloalkyl substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles;
• Optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted C ₅ -C ₁₂ cycloalkenyl; or
• • an optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles substituted five to six-membered, oxygen, nitrogen and / or sulfur atoms having heterocycle; or two adjacent radicals together for
• • an unsaturated, saturated or aromatic, optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles and optionally substituted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted Imino groups broken ring.

When optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles C ₁ - to C ₁₈ -alkyl, it is preferably methyl, ethyl, 1-propyl, 2-propyl, 1-butyl , 2-butyl, 2-methyl-1-propyl (isobutyl), 2-methyl-2-propyl (tert-butyl), 1-pentyl, 2-pentyl, 3-pentyl, 2-methyl-1-butyl, 3-methyl-1-butyl, 2-methyl-2-butyl, 3-methyl-2-butyl, 2,2-dimethyl-1-propyl, 1-hexyl, 2-hexyl, 3-hexyl, 2-methyl 1-pentyl, 3-methyl-1-pentyl, 4-methyl-1-pentyl, 2-methyl-2-pentyl, 3-methyl-2-pentyl, 4-methyl-2-pentyl, 2-methyl-3 pentyl, 3-methyl-3-pentyl, 2,2-dimethyl-1-butyl, 2,3-dimethyl-1-butyl, 3,3-dimethyl-1-butyl, 2-ethyl-1-butyl, 2, 3-Dimethyl-2-butyl, 3,3-dimethyl-2-butyl, heptyl, octyl, 2-ethylhexyl, 2,4,4-trimethylpentyl, 1,1,3,3-tetramethylbutyl, 1-nonyl, 1- Decyl, 1-undecyl, 1-dodecyl, 1-tridecyl, 1-tetradecyl, 1-pentadecyl, 1-hexadecyl, 1-heptadecyl, 1-octadecyl, cyclopentylmethyl, 2-cyclopentylethyl, 3-cyclopentylpropyl, cyclohe xylmethyl, 2-cyclohexylethyl, 3-cyclohexylpropyl, benzyl (phenylmethyl), diphenylmethyl (benzhydryl), triphenylmethyl, 1-phenylethyl, 2-phenylethyl, 3-phenylpropyl, α, α-dimethylbenzyl, p-tolylmethyl, 1- (p-butylphenyl ) -ethyl, p-chlorobenzyl, 2,4-dichlorobenzyl, p-methoxybenzyl, m-ethoxybenzyl, 2-cyanoethyl, 2-cyanopropyl, 2-methoxycarbonylethyl, 2-ethoxycarbonylethyl, 2-butoxycarbonylpropyl, 1,2-di- (methoxycarbonyl ) -ethyl, methoxy, ethoxy, formyl, 1,3-dioxolan-2-yl, 1,3-dioxan-2-yl, 2-methyl-1,3-dioxolan-2-yl, 4-methyl-1, 3-dioxolan-2-yl, 2-hydroxyethyl, 2-hydroxypropyl, 3-hydroxypropyl, 4-hydroxybutyl, 6-hydroxyhexyl, 2-aminoethyl, 2-aminopropyl, 3-aminopropyl, 4-aminobutyl, 6-aminohexyl, 2- Methylaminoethyl, 2-methylaminopropyl, 3-methylaminopropyl, 4-methylaminobutyl, 6-methylaminohexyl, 2-dimethylaminoethyl, 2-dimethylaminopropyl, 3-dimethylaminopropyl, 4-dimethylaminobutyl, 6-dimethylaminohexyl, 2-hydroxy-2,2-dimethylethyl, 2- Phenoxyethyl, 2-phenoxypropyl, 3-phenoxypropyl, 4-phenoxyb ethyl, 6-phenoxyhexyl, 2-methoxyethyl, 2-methoxypropyl, 3-methoxypropyl, 4-methoxybutyl, 6-methoxyhexyl, 2-ethoxyethyl, 2-ethoxypropyl, 3-ethoxypropyl, 4-ethoxybutyl, 6-ethoxyhexyl, acetyl, C _n F _{2 (na) + (1-b)} H _{2a + b} with n equal to 1 to 30, 0 ≤ a ≤ n and b = 0 or 1 (for example CF ₃ , C ₂ F ₅ , CH ₂ CH ₂ -C _{( n-2)} F _{2 (n-2) +1} , C ₆ F ₁₃ , C ₈ F ₁₇ , C ₁₀ F ₂₁ , C ₁₂ F ₂₅ ), chloromethyl, 2-chloroethyl, trichloromethyl, 1,1-dimethyl-2 -chloroethyl, methoxymethyl, 2-butoxyethyl, diethoxymethyl, diethoxyethyl, 2-isopropoxyethyl, 2-butoxypropyl, 2-octyloxyethyl, 2-methoxyisopropyl, 2- (methoxycarbonyl) -ethyl, 2- (ethoxycarbonyl) -ethyl, 2- (n- Butoxycarbonyl) -ethyl, butylthiomethyl, 2-dodecylthioethyl, 2-phenylthioethyl, 5-hydroxy-3-oxa-pentyl, 8-hydroxy-3,6-dioxo-octyl, 11-hydroxy-3,6,9-trioxa-undecyl , 7-hydroxy-4-oxaheptyl, 11-hydroxy-4,8-dioxa-undecyl, 15-hydroxy-4,8,12-trioxa-pentadecyl, 9-hydroxy-5-oxa-nonyl, 14-hydroxy 5,10-dioxa-tetradecyl, 5-methoxy-3-oxa-pentyl, 8-methoxy-3,6-dioxa-octyl l, 11-methoxy-3,6,9-trioxa-undecyl, 7-methoxy-4-oxa-heptyl, 11-methoxy-4,8-dioxa-undecyl, 15-methoxy-4,8,12-trioxa pentadecyl, 9-methoxy-5-oxa-nonyl, 14-methoxy-5,10-dioxa-tetradecyl, 5-ethoxy-3-oxa-pentyl, 8-ethoxy-3,6-dioxa-octyl, 11-ethoxy 3,6,9-trioxa-undecyl, 7-ethoxy-4-oxa-heptyl, 11-ethoxy-4,8-dioxa-undecyl, 15-ethoxy-4,8,12-trioxa-pentadecyl, 9-ethoxy 5-oxa-nonyl or 14-ethoxy-5,10-oxa-tetradecyl.

In the case of C ₂ - bis optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles and / or interrupted by one or more oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups C ₁₈ -alkenyl is preferably vinyl, 2-propenyl, 3-butenyl, cis-2-butenyl, trans-2-butenyl or
C _n F _{2 (na) - (1-b)} H _2a-b with n ≤ 30, 0 ≤ a ≤ n and b = 0 or 1.

When optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles C ₆ - to C ₁₂ -aryl is preferably phenyl, tolyl, xylyl, α-naphthyl, β-naphthyl, 4th Diphenylyl, chlorophenyl, dichlorophenyl, trichlorophenyl, difluorophenyl, methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, diethylphenyl, iso-propylphenyl, tert-butylphenyl, dodecylphenyl, methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, methylnaphthyl, isopropylnaphthyl, chloronaphthyl, ethoxynaphthyl, 2, 6-dimethylphenyl, 2,4,6-trimethylphenyl, 2,6-dimethoxyphenyl, 2,6-dichlorophenyl, 4-bromophenyl, 2-nitrophenyl, 4-nitrophenyl, 2,4-dinitrophenyl, 2,6-dinitrophenyl, 4- Dimethylaminophenyl, 4-acetylphenyl, methoxyethylphenyl, ethoxymethylphenyl, methylthiophenyl, isopropylthiophenyl or tert-butylthiophenyl or C ₆ F _(5-a) H _a with 0 ≤ a ≤ 5.

C ₅ -C ₁₂ -cycloalkyl optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles is preferably cyclopentyl, cyclohexyl, cyclooctyl, cyclododecyl, methylcyclopentyl, dimethylcyclopentyl, methylcyclohexyl, dimethylcyclohexyl , Diethylcyclohexyl, butylcyclohexyl, methoxycyclohexyl, dimethoxycyclohexyl, diethoxycyclohexyl, butylthiocyclohexyl, chlorocyclohexyl, dichlorocyclohexyl, dichlorocyclopentyl, C _n F _{2 ( n ) - (1-b)} H _2a-b with n ≤ 30, 0 ≤ a ≤ n and b = 0 or 1 and a saturated or unsaturated bicyclic system such. Norbornyl or norbornenyl.

When optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles C ₅ - to C ₁₂ cycloalkenyl is preferably 3-cyclopentenyl, 2-cyclohexenyl, 3-cyclohexenyl, 2.5 -Cyclohexadienyl or C _n F _{2 (na) -3 (1-b)} H _2a-3b with n ≤ 30, 0 ≤ a ≤ n and b = 0 or 1.

at optionally substituted by functional groups, aryl, alkyl, aryloxy, Alkyloxy, halogen, heteroatoms and / or heterocycles substituted five- to six-membered, oxygen, nitrogen and / or Sulfur atoms containing heterocycle is preferred furyl, thiophenyl, pyrryl, pyridyl, indolyl, benzoxazolyl, dioxolyl, Dioxo, benzimidazolyl, benzthiazolyl, dimethylpyridyl, methylquinolyl, Dimethylpyrryl, methoxyfuryl, dimethoxypyridyl or difluoropyridyl.

Two adjacent radicals together form an unsaturated, saturated or aromatic, optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles and optionally substituted by one or more oxygen and / or sulfur atoms and / or one or more several substituted or unsubstituted imino groups interrupted ring, it is preferably 1,3-propylene, 1,4-butylene, 1,5-pentylene, 2-oxa-1,3-propylene, 1-oxa-1,3- propylene, 2-oxa-1,3-propylene, 1-oxa-1,3-propenylene, 3-oxa-1,5-pentylene, 1-aza-1,3-propenylene, 1-C ₁ -C ₄ - Alkyl 1-aza-1, 3-propenylene, 1,4-buta-1,3-dienylene, 1-aza-1,4-buta-1,3-dienylene or 2-aza-1,4-butane 1.3 dienylene.

Contain the abovementioned radicals oxygen and / or sulfur atoms and / or substituted or unsubstituted imino groups, the number is the oxygen and / or sulfur atoms and / or imino groups not limited. As a rule, it is no longer as 5 in the remainder, preferably not more than 4 and more especially preferably not more than 3.

Contain the above-mentioned radicals heteroatoms, so are between two heteroatoms usually at least one carbon atom, preferably at least two carbon atoms.

• • Wasserstoff;
• • unverzweigtes oder verzweigtes, unsubstituiertes oder ein bis mehrfach mit Hydroxy, Halogen, Phenyl, Cyano, C₁- bis C₆-Alkoxycarbonyl und/oder Sulfonsäure substituiertes C₁- bis C₁₈-Alkyl mit insgesamt 1 bis 20 Kohlenstoffatomen, wie beispielsweise Methyl, Ethyl, 1-Propyl, 2-Propyl, 1-Butyl, 2-Butyl, 2-Methyl-1-propyl (Isobutyl), 2-Methyl-2-propyl (tert.-Butyl), 1-Pentyl, 2-Pentyl, 3-Pentyl, 2-Methyl-1-butyl, 3-Methyl-1-butyl, 2-Methyl-2-butyl, 3-Methyl-2-butyl, 2,2-Dimethyl-1-propyl, 1-Hexyl, 2-Hexyl, 3-Hexyl, 2-Methyl-1-pentyl, 3-Methyl-1-pentyl, 4-Methyl-1-pentyl, 2-Methyl-2-pentyl, 3-Methyl-2-pentyl, 4-Methyl-2-pentyl, 2-Methyl-3-pentyl, 3-Methyl-3-pentyl, 2,2-Dimethyl-1-butyl, 2,3-Dimethyl-1-butyl, 3,3-Dimethyl-1-butyl, 2-Ethyl-1-butyl, 2,3-Dimethyl-2-butyl, 3,3-Dimethyl-2-butyl, 1-Heptyl, 1-Octyl, 1-Nonyl, 1-Decyl, 1-Undecyl, 1-Dodecyl, 1-Tetradecyl, 1-Hexadecyl, 1-Octadecyl, 2-Hydroxyethyl, Benzyl, 3-Phenylpropyl, 2-Cyanoethyl, 2-(Methoxycarbonyl)-ethyl, 2-(Ethoxycarbonyl)-ethyl, 2-(n-Butoxy-carbonyl)-ethyl, Trifluormethyl, Difluormethyl, Fluormethyl, Pentafluorethyl, Heptafluorpropyl, Heptafluorisopropyl, Nonafluorbutyl, Nonafluorisobutyl, Undecylfluorpentyl, Undecylfluorisopentyl, 6-Hydroxyhexyl und Propylsulfonsäure;
• • Glykole, Butylenglykole und deren Oligomere mit 1 bis 100 Einheiten und einem Wasserstoff oder einem C₁- bis C₈-Alkyl als Endgruppe, wie beispielsweise R^AO-(CHR^B-CH₂-O)_n-CHR^B-CH₂- oder R^AO-(CH₂CH₂CH₂CH₂O)_n-CH₂CH₂CH₂CH₂O- mit R^A und R^B bevorzugt Wasserstoff, Methyl oder Ethyl und n bevorzugt 0 bis 3, insbesondere 3-Oxabutyl, 3-Oxapentyl, 3,6-Dioxaheptyl, 3,6-Dioxaoctyl, 3,6,9-Trioxadecyl, 3,6,9-Trioxaundecyl, 3,6,9,12-Tetraoxatridecyl und 3,6,9,12-Tetraoxatetradecyl;
• • Vinyl; und
• • N,N-Di-C₁- bis C₆-alkyl-amino, wie beispielsweise N,N-Dimethylamino und N,N-Diethylamino.

Particularly preferably, the radicals R ¹ to R ⁹ are each independently

• • hydrogen;
• • straight-chain or branched, unsubstituted or monosubstituted to hydroxyl, halogen, phenyl, cyano, C ₁ - to C ₆ -alkoxycarbonyl and / or sulfonic acid-substituted C ₁ - to C ₁₈ -alkyl having a total of 1 to 20 carbon atoms, such as, for example, methyl , Ethyl, 1-propyl, 2-propyl, 1-butyl, 2-butyl, 2-methyl-1-propyl (isobutyl), 2-methyl-2-propyl (tert-butyl), 1-pentyl, 2- Pentyl, 3-pentyl, 2-methyl-1-butyl, 3-methyl-1-butyl, 2-methyl-2-butyl, 3-methyl-2-butyl, 2,2-dimethyl-1-propyl, 1 Hexyl, 2-hexyl, 3-hexyl, 2-methyl-1-pentyl, 3-methyl-1-pentyl, 4-methyl-1-pentyl, 2-methyl-2-pentyl, 3-methyl-2-pentyl, 4-methyl-2-pentyl, 2-methyl-3-pentyl, 3-methyl-3-pentyl, 2,2-dimethyl-1-butyl, 2,3-dimethyl-1-butyl, 3,3-dimethyl 1-butyl, 2-ethyl-1-butyl, 2,3-dimethyl-2-butyl, 3,3-dimethyl-2-butyl, 1-heptyl, 1-octyl, 1-nonyl, 1-decyl, 1 Undecyl, 1-dodecyl, 1-tetradecyl, 1-hexadecyl, 1-octadecyl, 2-hydroxyethyl, benzyl, 3-phenylpropyl, 2-cyanoethyl, 2- (methoxycarbonyl) -ethyl, 2- (ethoxyca rbonyl) -ethyl, 2- (n-butoxy-carbonyl) -ethyl, trifluoromethyl, difluoromethyl, fluoromethyl, pentafluoroethyl, heptafluoropropyl, heptafluoroisopropyl, nonafluorobutyl, nonafluoroisobutyl, undecylfluoropentyl, undecylfluoroisopentyl, 6-hydroxyhexyl and propylsulfonic acid;
• • Glycols, butylene glycols and their oligomers having 1 to 100 units and a hydrogen or a C ₁ - to C ₈ alkyl as an end group, such as R ^A O- (CHR ^B -CH ₂ -O) _n -CHR ^B -CH ₂ - or R ^A O- (CH ₂ CH ₂ CH ₂ CH ₂ O) _n -CH ₂ CH ₂ CH ₂ CH ₂ O- with R ^A and R ^{B is} preferably hydrogen, methyl or ethyl and n is preferably 0 to 3, in particular 3 Oxabutyl, 3-oxapentyl, 3,6-dioxaheptyl, 3,6-dioxaoctyl, 3,6,9-trioxadecyl, 3,6,9-trioxaundecyl, 3,6,9,12-tetraoxatridecyl and 3,6,9 , 12-tetraoxatetradecyl;
• • vinyl; and
• N, N-di-C ₁ to C ₆ alkylamino such as N, N-dimethylamino and N, N-diethylamino.

Most preferably, the radicals R ¹ to R ⁹ independently of one another are hydrogen or C ₁ - to C ₁₈ -alkyl, such as, for example, methyl, ethyl, 1-butyl, 1-pentyl, 1-hexyl, 1-heptyl, 1-octyl , for phenyl, for 2-hydroxyethyl, for 2-cyanoethyl, for 2- (methoxycarbonyl) ethyl, for 2- (ethoxycarbonyl) ethyl, for 2- (n-butoxycarbonyl) ethyl, for N, N-dimethylamino, for N, N-diethylamino, for chlorine and for CH ₃ O- (CH ₂ CH ₂ O) _n -CH ₂ CH ₂ - and CH ₃ CH ₂ O- (CH ₂ CH ₂ O) _n -CH ₂ CH ₂ - where n is the same 0 to 3.

• • einer der Reste R¹ bis R⁵ Methyl, Ethyl oder Chlor ist und die verbleibenden Reste R¹ bis R⁵ Wasserstoff sind;
• • R³ Dimethylamino ist und die verbleibenden Reste R¹, R², R⁴ und R⁵ Wasserstoff sind;
• • alle Reste R¹ bis R⁵ Wasserstoff sind;
• • R² Carboxy oder Carboxamid ist und die verbleibenden Reste R¹, R², R⁴ und R⁵ Wasserstoff sind; oder
• • R¹ und R² oder R² und R³ 1,4-Buta-1,3-dienylen ist und die verbleibenden Reste R¹, R², R⁴ und R⁵ Wasserstoff sind; und insbesondere solche, bei denen
• • R¹ bis R⁵ Wasserstoff sind; oder
• • einer der Reste R¹ bis R⁵ Methyl oder Ethyl ist und die verbleibenden Reste R¹ bis R⁵ Wasserstoff sind.

Very particularly preferred pyridinium ions (IVa) are those in which

• • one of the radicals R ¹ to R ^{5 is} methyl, ethyl or chlorine and the remaining radicals R ¹ to R ^{5 are} hydrogen;
• • R ^{3 is} dimethylamino and the remaining radicals R ¹ , R ² , R ⁴ and R ^{5 are} hydrogen;
• • all radicals R ¹ to R ^{5 are} hydrogen;
• • R ^{2 is} carboxy or carboxamide and the remaining radicals R ¹ , R ² , R ⁴ and R ^{5 are} hydrogen; or
• R ¹ and R ² or R ² and R ^{3 is} 1,4-buta-1,3-dienylene and the remaining radicals R ¹ , R ² , R ⁴ and R ^{5 are} are hydrogen; and in particular those in which
• • R ¹ to R ^{5 are} hydrogen; or
• • one of the radicals R ¹ to R ^{5 is} methyl or ethyl and the remaining radicals R ¹ to R ^{5 are} hydrogen.

When very particularly preferred pyridinium ions (IVa) are 1-methylpyridinium, 1-ethylpyridinium, 1- (1-butyl) pyridinium, 1- (1-hexyl) pyridinium, 1- (1-octyl) pyridinium, 1- (1-hexyl) -pyridinium, 1- (1-octyl) -pyridinium, 1- (1-dodecyl) -pyridinium, 1- (1-tetradecyl) -pyridinium, 1- (1-hexadecyl) -pyridinium, 1,2-dimethylpyridinium, 1-ethyl-2-methylpyridinium, 1- (1-butyl) -2-methylpyridinium, 1- (1-hexyl) -2-methylpyridinium, 1- (1-octyl) -2-methylpyridinium, 1- (1-dodecyl) -2-methylpyridinium, 1- (1-tetradecyl) -2-methylpyridinium, 1- (1-hexadecyl) -2-methylpyridinium, 1-methyl-2-ethylpyridinium, 1,2-diethylpyridinium, 1- (1-butyl) -2-ethylpyridinium, 1- (1-hexyl) -2-ethylpyridinium, 1- (1-octyl) -2-ethylpyridinium, 1- (1-dodecyl) -2-ethylpyridinium, 1- (1-tetradecyl) -2-ethylpyridinium, 1- (1-hexadecyl) -2-ethylpyridinium, 1,2-dimethyl-5-ethylpyridinium, 1,5-diethyl-2-methylpyridinium, 1- (1-Butyl) -2-methyl-3-ethylpyridinium, 1- (1-hexyl) -2-methyl-3-ethylpyridinium and 1- (1-octyl) -2-methyl-3-ethylpyridinium, 1- (1-dodecyl) -2-methyl-3-ethylpyridinium, 1- (1-Tetradecyl) -2-methyl-3-ethylpyridinium and 1- (1-hexadecyl) -2-methyl-3-ethylpyridinium.

• • R¹ bis R⁴ Wasserstoff sind; oder
• • einer der Reste R¹ bis R⁴ Methyl oder Ethyl ist und die verbleibenden Reste R¹ bis R⁴ Wasserstoff sind.

Very particularly preferred pyridazinium ions (IVb) are those in which

• • R ¹ to R ^{4 are} hydrogen; or
• • one of the radicals R ¹ to R ^{4 is} methyl or ethyl and the remaining radicals R ¹ to R ^{4 are} hydrogen.

• • R¹ Wasserstoff, Methyl oder Ethyl ist und R² bis R⁴ unabhängig voneinander Wasserstoff oder Methyl sind; oder
• • R¹ Wasserstoff, Methyl oder Ethyl ist, R² und R⁴ Methyl sind und R³ Wasserstoff ist.

Very particularly preferred pyrimidinium ions (IVc) are those in which

• • R ^{1 is} hydrogen, methyl or ethyl and R ² to R ^{4 are} independently hydrogen or methyl; or
• • R ^{1 is} hydrogen, methyl or ethyl, R ² and R ^{4 are} methyl and R ^{3 is} hydrogen.

• • R¹ Wasserstoff, Methyl oder Ethyl ist und R² bis R⁴ unabhängig voneinander Wasserstoff oder Methyl sind;
• • R¹ Wasserstoff, Methyl oder Ethyl ist, R² und R⁴ Methyl sind und R³ Wasserstoff ist;
• • R¹ bis R⁴ Methyl sind; oder
• • R¹ bis R⁴ Methyl Wasserstoff sind.

Very particularly preferred pyrazinium ions (IVd) are those in which

• • R ^{1 is} hydrogen, methyl or ethyl and R ² to R ^{4 are} independently hydrogen or methyl;
• • R ^{1 is} hydrogen, methyl or ethyl, R ² and R ^{4 are} methyl and R ^{3 is} hydrogen;
• • R ¹ to R ^{4 are} methyl; or
• • R ¹ to R ^{4 are} methyl hydrogen.

• • R¹ Wasserstoff, Methyl, Ethyl, 1-Propyl, 1-Butyl, 1-Pentyl, 1-Hexyl, 1-Octyl, 2-Hydroxyethyl oder 2-Cyanoethyl und R² bis R⁴ unabhängig voneinander Wasserstoff, Methyl oder Ethyl sind.

Very particular preference is given to using as imidazolium ions (IVe) those in which

• • R ^{1 is} hydrogen, methyl, ethyl, 1-propyl, 1-butyl, 1-pentyl, 1-hexyl, 1-octyl, 2-hydroxyethyl or 2-cyanoethyl and R ² to R ^{4 are} independently hydrogen, methyl or ethyl ,

When very particularly preferred imidazolium ions (IVe) are called 1-methylimidazolium, 1-ethylimidazolium, 1- (1-butyl) -imidazolium, 1- (1-octyl) -imidazolium, 1- (1-dodecyl) -imidazolium, 1- (1-tetradecyl) -imidazolium, 1- (1-hexadecyl) -imidazolium, 1,3-dimethylimidazolium, 1-ethyl-3-methylimidazolium, 1- (1-butyl) -3-methylimidazolium, 1- (1-butyl) -3-ethylimidazolium, 1- (1-hexyl) -3-methyl-imidazolium, 1- (1-hexyl) -3-ethyl-imidazolium, 1- (1-hexyl) -3-butyl-imidazolium, 1- (1-octyl) -3-methylimidazolium, 1- (1-octyl) -3-ethylimidazolium, 1- (1-octyl) -3-butylimidazolium, 1- (1-dodecyl) -3-methylimidazolium, 1- (1-dodecyl) -3-ethylimidazolium, 1- (1-dodecyl) -3-butylimidazolium, 1- (1-dodecyl) -3-octylimidazolium, 1- (1-tetradecyl) -3-methylimidazolium, 1- (1-tetradecyl) -3-ethylimidazolium, 1- (1-tetradecyl) -3-butylimidazolium, 1- (1-tetradecyl) -3-octylimidazolium, 1- (1-hexadecyl) -3-methylimidazolium, 1- (1-hexadecyl) -3-ethylimidazolium, 1- (1-hexadecyl) -3-butylimidazolium, 1- (1-hexadecyl) -3-octylimidazolium, 1,2-dimethylimidazolium, 1,2,3-trimethylimidazolium, 1-ethyl-2,3-dimethylimidazolium, 1- (1-butyl) -2,3-dimethylimidazolium, 1- (1-hexyl) -2,3-dimethylimidazolium, 1- (1-octyl) -2,3-dimethylimidazolium, 1,4-dimethylimidazolium, 1,3,4-trimethylimidazolium, 1,4-dimethyl-3-ethylimidazolium, 3-butylimidazolium, 1,4-dimethyl-3-octylimidazolium, 1,4,5-trimethylimidazolium, 1,3,4,5-tetramethylimidazolium, 1,4,5-trimethyl-3-ethylimidazolium, 1,4,5-trimethyl-3-butylimidazolium and 1,4,5-trimethyl-3-octylimidazolium.

• • R¹ Wasserstoff, Methyl oder Ethyl ist und R² bis R⁴ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given as Pyrazoliumionen (IVf), (IVg) or (IVg ') such, in which

• • R ^{1 is} hydrogen, methyl or ethyl and R ² to R ^{4 are} independently hydrogen or methyl.

• • R¹ bis R⁴ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particularly preferred pyrazolium ions (IVh) are those in which

• • R ¹ to R ^{4 are} independently hydrogen or methyl.

• • unabhängig voneinander R¹ bis R⁶ Wasserstoff oder Methyl sind.

Very particular preference is given as 1-pyrazolinium (IVi) such as those in which

• • independently of one another R ¹ to R ^{6 are} hydrogen or methyl.

• • R¹ Wasserstoff, Methyl, Ethyl oder Phenyl ist und R² bis R⁶ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to using 2-pyrazolinium ions (IVj) or (IVj ') as those in which

• • R ^{1 is} hydrogen, methyl, ethyl or phenyl and R ² to R ^{6 are} independently hydrogen or methyl.

• • R¹ und R² unabhängig voneinander Wasserstoff, Methyl, Ethyl oder Phenyl sind und R³ bis R⁶ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to using as 3-pyrazolinium (IVk) or (IVk ') such, in which

• • R ¹ and R ^{2 are} independently hydrogen, methyl, ethyl or phenyl and R ³ to R ^{6 are} independently hydrogen or methyl.

• • R¹ und R² unabhängig voneinander Wasserstoff, Methyl, Ethyl, 1-Butyl oder Phenyl sind, R³ und R⁴ unabhängig voneinander Wasserstoff, Methyl oder Ethyl sind und R⁵ und R⁶ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particularly preferred as Imidazoliniumionen (IVI) are those in which

• • R ¹ and R ^{2 are} independently hydrogen, methyl, ethyl, 1-butyl or phenyl, R ³ and R ^{4 are} independently hydrogen, methyl or ethyl, and R ⁵ and R ^{6 are} independently hydrogen or methyl.

• • R¹ und R² unabhängig voneinander Wasserstoff, Methyl oder Ethyl sind und R³ bis R⁶ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to imidazolinium ions (IVm) or (IVm ') those in which

• • R ¹ and R ^{2 are} independently hydrogen, methyl or ethyl and R ³ to R ^{6 are} independently hydrogen or methyl.

• • R¹ bis R³ unabhängig voneinander Wasserstoff, Methyl oder Ethyl sind und R⁴ bis R⁶ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to using as imidazolinium ions (IVn) or (IVn ') those in which

• • R ¹ to R ^{3 are} independently hydrogen, methyl or ethyl and R ⁴ to R ^{6 are} independently hydrogen or methyl.

• • R¹ Wasserstoff, Methyl, Ethyl oder Phenyl ist und R² und R³ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to using thiazolium ions (IVo) or (IVo ') and oxazolium ions (IVp) as those in which

• • R ^{1 is} hydrogen, methyl, ethyl or phenyl and R ² and R ^{3 are} independently hydrogen or methyl.

• • R¹ und R² unabhängig voneinander Wasserstoff, Methyl, Ethyl oder Phenyl sind und R³ Wasserstoff, Methyl oder Phenyl ist.

Very particular preference is given to using 1,2,4-triazolium ions (IVq), (IVq ') or (IVq'') as those in which

• • R ¹ and R ^{2 are} independently hydrogen, methyl, ethyl or phenyl and R ^{3 is} hydrogen, methyl or phenyl.

• • R¹ Wasserstoff, Methyl oder Ethyl ist und R² und R³ unabhängig voneinander Wasserstoff oder Methyl sind, oder R² und R³ zusammen 1,4-Buta-1,3-dienylen ist.

Very particular preference is given to using 1,2,3-triazolium ions (IVr), (IVr ') or (IVr'') those in which

• • R ^{1 is} hydrogen, methyl or ethyl, and R ² and R ^{3 are} independently hydrogen or methyl, or R ² and R ³ together are 1,4-buta-1,3-dienylene.

• • R¹ Wasserstoff, Methyl, Ethyl oder Phenyl ist und R² bis R⁹ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particularly preferred pyrrolidinium ions (IVs) are those in which

• • R ^{1 is} hydrogen, methyl, ethyl or phenyl and R ² to R ^{9 are} independently hydrogen or methyl.

• • R¹ und R⁴ unabhängig voneinander Wasserstoff, Methyl, Ethyl oder Phenyl sind und R² und R³ sowie R⁵ bis R⁸ unabhängig voneinander Wasserstoff oder Methyl sind.

Very particular preference is given to using as imidazolidinium ions (IVt) those in which

• • R ¹ and R ^{4 are} independently hydrogen, methyl, ethyl or phenyl and R ² and R ³ and R ⁵ to R ^{8 are} independently hydrogen or methyl.

• • R¹ bis R³ unabhängig voneinander C₁- bis C₁₈-Alkyl sind; oder
• • R¹ und R² zusammen 1,5-Pentylen oder 3-Oxa-1,5-pentylen sind und R³ C₁-C₁₈-Alkyl, 2-Hydroxyethyl oder 2-Cyanoethyl ist.

Very particular preference is given to using as ammonium ions (IVu) those in which

• • R ¹ to R ^{3 are} independently C ₁ to C ₁₈ alkyl; or
• • R ¹ and R ² together are 1,5-pentylene or 3-oxa-1,5-pentylene and R ^{3 is} C ₁ -C ₁₈ alkyl, 2-hydroxyethyl or 2-cyanoethyl.

When Very particularly preferred ammonium ions (IVu) are methyl-tri- (1-butyl) -ammonium, N, N-dimethylpiperidinium and N, N-dimethylmorpholinium.

Examples of the tertiary amines of which the quaternary ammonium ions of the general formula (IVu) are derived by quaternization with the abovementioned radicals R are diethyl-n-butylamine, diet hyl-tert-butylamine, diethyl-n-pentylamine, diethyl-hexylamine, diethyloctylamine, diethyl (2-ethylhexyl) -amine, di-n-propylbutylamine, di-n-propyl-n-pentylamine, di-n-propylhexylamine, Di-n-propyloctylamine, di-n-propyl- (2-ethylhexyl) -amine, di-isopropylethylamine, di-iso-propyl-n-propylamine, di-isopropyl-butylamine, diisopropylpentylamine, di-iso-propylhexylamine, Di-isopropyloctylamine, di-iso-propyl- (2-ethylhexyl) -amine, di-n-butylethylamine, di-n-butyl-n-propylamine, di-n-butyl-n-pentylamine, di-n-butylhexylamine, Di-n-butyloctylamine, di-n-butyl- (2-ethylhexyl) -amine, Nn-butylpyrrolidine, N-sec-butylpyrrodidine, N-tert-butylpyrrolidine, Nn-pentylpyrrolidine, N, N-dimethylcyclohexylamine, N, N-diethylcyclohexylamine, N, N-di-n-butylcyclohexylamine, Nn-propylpiperidine, N-isopropylpiperidine, Nn-butylpiperidine, N-sec-butylpiperidine, N-tert-butylpiperidine, Nn-pentylpiperidine, Nn-butylmorpholine, N-sec-butylmorpholine, N-tert-butylmorpholine, Nn-pentylmorpholine, N-benzyl-N-ethylaniline, N-benzyl-Nn-propylaniline, N-Ben cyl-N-iso-propylaniline, N-benzyl-Nn-butylaniline, N, N-dimethyl-p-toluidine, N, N-diethyl-p-toluidine, N, N-di-n-butyl-p-toluidine, Diethylbenzylamine, di-n-propylbenzylamine, di-n-butylbenzylamine, diethylphenylamine, di-n-propylphenylamine and di-n-butylphenylamine.

preferred tertiary amines (IVu) are di-iso-propylethylamine, diethyl-tert-butylamine, Di-iso-propylbutylamine, di-n-butyl-n-pentylamine, N, N-di-n-butylcyclohexylamine and tertiary amines of pentyl isomers.

Especially preferred tertiary amines are di-n-butyl-n-pentylamine and tertiary amines of pentyl isomers. Another preferred tertiary amine having three identical residues is Triallylamine.

• • R¹ bis R⁵ Methyl sind.

Very particular preference is given to using as guanidinium ions (IVv) those in which

• • R ¹ to R ^{5 are} methyl.

When very particularly preferred guanidinium ion (IVv) is N, N, N ', N', N ", N" -hexamethylguanidinium.

• • R¹ und R² unabhängig voneinander Methyl, Ethyl, 1-Butyl oder 1-Octyl sind und R³ Wasserstoff, Methyl, Ethyl, Acetyl, -SO₂OH oder -PO(OH)₂ ist;
• • R¹ Methyl, Ethyl, 1-Butyl oder 1-Octyl ist, R² eine -CH₂-CH₂-OR⁴-Gruppe ist und R³ und R⁴ unabhängig voneinander Wasserstoff, Methyl, Ethyl, Acetyl, -SO₂OH oder -PO(OH)₂ sind; oder
• • R¹ eine -CH₂-CH₂-OR⁴-Gruppe ist, R² eine -CH₂-CH₂-OR⁵-Gruppe ist und R³ bis R⁵ unabhängig voneinander Wasserstoff, Methyl, Ethyl, Acetyl, -SO₂OH oder -PO(OH)₂ sind.

Very particular preference is given to using as cholinium ions (IVw) those in which

• • R ¹ and R ^{2 are} independently methyl, ethyl, 1-butyl or 1-octyl and R ^{3 is} hydrogen, methyl, ethyl, acetyl, -SO ₂ OH or -PO (OH) ₂ ;
• • R ^{1 is} methyl, ethyl, 1-butyl or 1-octyl, R ^{2 is} a -CH ₂ -CH ₂ -OR ⁴ group and R ³ and R ^{4 are} independently hydrogen, methyl, ethyl, acetyl, -SO ₂ OH or -PO (OH) ₂ ; or
• • R ^{1 is} a -CH ₂ -CH ₂ -OR ⁴ group, R ^{2 is} a -CH ₂ -CH ₂ -OR ⁵ group and R ³ to R ^{5 are} independently hydrogen, methyl, ethyl, acetyl, -SO _{2 are} OH or -PO (OH) ₂ .

Particularly preferred cholinium ions (IVw) are those in which R ^{3 is} selected from hydrogen, methyl, ethyl, acetyl, 5-methoxy-3-oxa-pentyl, 8-methoxy-3,6-dioxo-octyl, 11-methoxy 3,6,9-trioxa-undecyl, 7-methoxy-4-oxa-heptyl, 11-methoxy-4,8-dioxa-undecyl, 15-methoxy-4,8,12-trioxa-pentadecyl, 9-methoxy 5-oxa-nonyl, 14-methoxy-5,10-oxa-tetradecyl, 5-ethoxy-3-oxa-pentyl, 8-ethoxy-3,6-dioxa-octyl, 11-ethoxy-3,6,9- trioxa undecyl, 7-ethoxy-4-oxa-heptyl, 11-ethoxy-4,8-dioxa-undecyl, 15-ethoxy-4,8,12-trioxa-pentadecyl, 9-ethoxy-5-oxa-nonyl or 14-ethoxy-5,10-oxa-tetradecyl.

• • R¹ bis R³ unabhängig voneinander C₁-C₁₈-Alkyl, insbesondere Butyl, Isobutyl, 1-Hexyl oder 1-Octyl sind.

Very particularly preferred as phosphonium ions (IVx) are those in which

• • R ¹ to R ^{3 are} independently C ₁ -C ₁₈ alkyl, especially butyl, isobutyl, 1-hexyl or 1-octyl.

Under the aforementioned heterocyclic cations are the pyridinium ions, Pyrazolinium-, pyrazolium ions and the imidazolinium- and the Imidazoliumionen preferred. Furthermore, ammonium ions are preferred.

Particularly preferred are 1-methylpyridinium, 1-ethylpyridinium, 1- (1-butyl) pyridinium, 1- (1-hexyl) pyridinium, 1- (1-octyl) pyridinium, 1- (1-hexyl) -pyridinium, 1- (1-Octyl) -pyridinium, 1- (1-dodecyl) -pyridinium, 1- (1-tetradecyl) -pyridinium, 1- (1-hexadecyl) -pyridinium, 1,2-dimethylpyridinium, 1-ethyl-2- methylpyridinium, 1- (1-butyl) -2-methylpyridinium, 1- (1-hexyl) -2-methylpyridinium, 1- (1-octyl) -2-methylpyridinium, 1- (1-dodecyl) -2-methylpyridinium, 1- (1-tetradecyl) -2-methylpyridinium, 1- (1-hexadecyl) -2-methylpyridinium, 1-methyl-2-ethylpyridinium, 1,2-diethylpyridinium, 1- (1-butyl) -2-ethylpyridinium, 1- (1-Hexyl) -2-ethylpyridinium, 1- (1-Octyl) -2-ethylpyridinium, 1- (1-Dodecyl) -2-ethylpyridinium, 1- (1-Tetradecyl) -2-ethylpyridinium, 1- (1-hexadecyl) -2-ethylpyridinium, 1,2-dimethyl-5-ethylpyridinium, 1,5-diethyl-2-methylpyridinium, 1- (1-butyl) -2-methyl-3-ethyl- pyridinium, 1- (1-hexyl) -2-methyl-3-ethylpyridinium, 1- (1-octyl) -2-methyl-3-ethylpyridinium, 1- (1-dodecyl) -2-methyl- 3-ethyl-pyridinium , 1- (1-Tetradecyl) -2-methyl-3-ethylpyridinium, 1- (1-hexadecyl) -2-methyl-3-ethylpyridinium, 1-methylimidazolium, 1-ethylimidazolium, 1- (1 Butyl) -imidazolium, 1- (1-octyl) -imidazolium, 1- (1-dodecyl) -imidazolium, 1- (1-tetradecyl) -imidazolium, 1- (1-hexadecyl) -imidazolium, 1,3-dimethylimidazolium , 1-ethyl-3-methylimidazolium, 1- (1-butyl) -3-methylimidazolium, 1- (1-hexyl) -3-me ethyl imidazolium, 1- (1-octyl) -3-methylimidazolium, 1- (1-dodecyl) -3-methylimidazolium, 1- (1-tetradecyl) -3-methylimidazolium, 1- (1-hexadecyl) -3- methylimidazolium, 1,2-dimethylimidazolium, 1,2,3-trimethylimidazolium, 1-ethyl-2,3-dimethylimidazolium, 1- (1-butyl) -2,3-dimethylimidazolium, 1- (1-hexyl) -2, 3-dimethylimidazolium and 1- (1-octyl) -2,3-dimethylimidazolium, 1,4-dimethylimidazolium, 1,3,4-trimethylimidazolium, 1,4-dimethyl-3-ethylimidazolium, 3-butylimidazolium, 1, 4-dimethyl-3-octylimidazolium, 1,4,5-trimethylimidazolium, 1,3,4,5-tetramethylimidazolium, 1,4,5-trimethyl-3-ethylimidazolium, 1,4,5-trimethyl-3-butylimidazolium and 1,4,5-trimethyl-3-octylimidazolium.

The metal cations [M ¹ ] ⁺ , [M ² ] ⁺ , [M ³ ] ⁺ , [M ⁴ ] ²⁺ and [M ⁵ ] ³⁺ mentioned in formulas (IIIa) to (IIIj) are generally to metal cations of the 1st, 2nd, 6th, 7th, 8th, 9th, 10th, 11th, 12th and 13th group of the periodic table. Suitable metal cations are, for example, Li ⁺ , Na ⁺ , K ⁺ , Cs ⁺ , Mg ^{2 +} , Ca ^{2 +} , Ba ^{2 +} , Cr ^{3 +} , Fe ^{2 +} , Fe ^{3 +} , Co ^{2 +} , Ni ^{2 +} , Cu ^{2 +} , Ag ⁺ , Zn ²⁺ and Al ³⁺ .

As anions, in principle, all anions can be used, provided that AlCl ₄ ^- and / or Al ₂ Cl ₇ ^{- are} predominantly present.

The anion [Y] ^{n of} the ionic liquid is for example selected from

• • the group of halides and halogen ^- containing compounds of the formula: F ^- , Cr ^- , Br ^- , I ^- , BF ₄ ^- , PF ₆ ^- , Al ₃ Cl ₁₀ ^- , AlBr ₄ ^- , FeCl ₄ ^- , BCl ₄ ^- , SbF ₆ ^- , AsF ₆ ^- , ZnCl ₃ ^- , SnCl ₃ ^- , CuCl ₂ ^- , CF ₃ SO ₃ ^- , (CF ₃ SO ₃ ) ₂ N ^- , CF ₃ CO ₂ ^- , CCl ₃ CO ₂ ^- , CN ^- , SCN ^- , OCN ^-
• The group of sulfates, sulfites and sulfonates of the general formula: SO ₄ ^2- , HSO ₄ ^- , SO ₃ ^2- , HSO ₃ ^- , R ^a OSO ₃ ^- , R ^a SO ₃ ^- ; advantageously SO ₄ ^2- , SO ₃ ^2- ; R ^a OSO ₃ ^- ; R ^a SO ₃ ^- .
• • the group of phosphates of the general formula PO ₄ ^3- , HPO ₄ ^2- , H ₂ PO ₄ ^- , R ^a PO ₄ ^2- , HR ^a PO ₄ ^- , R ^a R ^b PO ₄ ^- ; advantageously PO ₄ ^3- ; R ^a PO ₄ ^2- , R ^a R ^b PO ₄ ^-
• • the group of phosphonates and phosphinates of the general formula: R ^a HPO ₃ ^- , R ^a R ^b PO ₂ ^- , R ^a R ^b PO ₃ ^- ; advantageously R ^a R ^b PO ₂ ^- ; R ^a R ^b PO ₃ ^-
• • the group of phosphites of the general formula: PO ₃ ^3- , HPO ₃ ^2- , H ₂ PO ₃ ^- , R ^a PO ₃ ^2- , R ^a HPO ₃ ^- , R ^a R ^b PO ₃ ^- ; advantageously PO ₃ ^3- ; R ^a PO ₃ ^2- ; R ^a R ^b PO ₃ ^-
• The group of phosphonites and phosphinites of the general formula: R ^a R ^b PO ₂ ^- , R ^a HPO ₂ ^- , R ^a R ^b PO ^- , R ^a HPO ^- ; advantageously R ^a R ^b PO ₂ ^- ; R ^a R ^b PO ^-
• • the group of carboxylic acids of the general formula: R ^a COO ^-
• • the group of bristles of the general formula: BO ₃ ^3- , HBO ₃ ^2- , H ₂ BO ₃ ^- , R ^a R ^b BO ₃ ^- , R ^a HBO ₃ ^- , R ^a BO ₃ ^2- , B (OR ^a ) (OR ^b ) (OR ^c ) (OR ^d ) ^- , B (HSO ₄ ) ^- , B (R ^a SO ₄ ) ^- ; advantageously BO ₃ ^3- ; R ^a R ^b BO ₃ ^- ; R ^a BO ₃ ^2- ; B (OR ^a ) (OR ^b ) (OR ^c ) (OR ^d ) ^- , B (R ^a SO ₄ ) ^-
• The group of boronates of the general formula: R ^a BO ₂ ^2- , R ^a R ^b BO ^-
• • the group of carbonates and carbonic esters of the general formula: HCO ₃ ^- , CO ₃ ^2- , R ^a CO ₃ ^- ; advantageously CO ₃ ^2- , R ^a CO ₃ ^-
• The group of silicates and silicic acid esters of the general formula: SiO ₄ ^4- , HSiO ₄ ^3- , H ₂ SiO ₄ ^2- , H ₃ SiO ₄ ^3- , R ^a SiO ₄ ^3- , R ^a R ^b SiO ₄ ^2- , R ^a R ^b R ^c SiO ₄ ^- , HR ^a SiO ₄ ^2- , H ₂ R ^a SiO ₄ ^- , HR ^a R ^b SiO ₄ ^- , advantageously SiO ₄ ^4- , R ^a SiO ₄ ^2- , R ^a R ^b SiO ₄ ^2- , R ^a R ^b R ^c SiO ₄ ^-
• • the group of alkylsilane and arylsilane salts of the general formula: R ^a SiO ₃ ^3-, R ^a R ^b SiO ₂ ^2-, R ^a R ^b R ^c SiO ^-, R ^a R ^b R ^c SiO ₃ ^-, R ^a R ^b R ^c SiO ₂ ^- , R ^a R ^b SiO ₃ ^2-
• The group of the carboxylic imides, bis (sulfonyl) imides and sulfonyl imides of the general formula:
  
• The group of methides of the general formula:
  
• • the group of alkoxides and aryloxides of the general formulas: R ^a O ^- ;
• • the group of halometalates of the general formula [M _q Hal _r ] ^s where M is a metal and Hal is fluorine, chlorine, bromine or iodine, q and r are positive integers indicating the stoichiometry of the complex and s is a whole positive Number is and indicates the charge of the complex;
• • the group of sulfides, hydrogen sulfides, polysulfides, Hydrogenpolysulfide and thiolates of the general formulas: S ^2-, HS ^-, [S] ^2-, [HS _v] ^-, [R ^a S] ^-, where v is a positive integer of 2 to 10; advantageously S ^2- , [S _v ] ^2- , [R ^a S] ^-
• • the group of complex metal ions such as Fe (CN) ₆ ^3- , Fe (CN) ₆ ^4- , MnO ₄ ^- , Fe (CO) ₄ ^- .

In this R ^a , R ^b , R ^c and R ^d are each independently hydrogen, C ₁ -C ₃₀ -alkyl, optionally by one or more non-adjacent oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups interrupted C ₂ -C ₁₈ alkyl, C ₆ -C ₁₄ aryl, C ₅ -C ₁₂ cycloalkyl or a five- to six-membered, oxygen, nitrogen and / or sulfur atoms containing heterocycle, wherein two of them together form an unsaturated , saturated or aromatic, optionally interrupted by one or more oxygen and / or sulfur atoms and / or one or more unsubstituted or substituted imino groups interrupted ring, said radicals each additionally by functional groups, aryl, alkyl, aryloxy, alkoxy, halogen , Heteroatoms and / or heterocycles may be substituted. Advantageously, R ^a , R ^b , R ^c and R ^{d are} different from hydrogen.

Therein, optionally substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles, substituted C ₁ -C ₁₆ -alkyl, for example methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, tert. Butyl, pentyl, hexyl, heptyl, octyl, 2-ethylhexyl, 2,4,4-trimethylpentyl, decyl, dodecyl, tetradecyl, heptadecyl, octadecyl, 1,1-dimethylpropyl, 1,1-dimethylbutyl, 1,1,3, 3-tetramethylbutyl, benzyl, 1-phenylethyl, α, α-dimethylbenzyl, benzhydryl, p-tolylmethyl, 1- (p-butylphenyl) -ethyl, p-chlorobenzyl, 2,4-dichlorobenzyl, p-methoxybenzyl, m-ethoxybenzyl, 2-cyanoethyl, 2-cyanopropyl, 2-methoxycarbonethyl, 2-ethoxycarbonylethyl, 2-butoxycarbonylpropyl, 1,2-di- (methoxycarbonyl) -ethyl, 2-methoxyethyl, 2-ethoxyethyl, 2-butoxyethyl, diethoxymethyl, diethoxyethyl, 1, 3-dioxolan-2-yl, 1,3-dioxan-2-yl, 2-methyl-1,3-dioxolan-2-yl, 4-methyl-1,3-dioxolan-2-yl, 2-isopropoxyethyl, 2-butoxypropyl, 2-octyloxyethyl, chloromethyl, trichloromethyl, trifluoromethyl, 1,1-dimethyl-2- chloroethyl, 2-methoxyisopropyl, 2-ethoxyethyl, butylthiomethyl, 2-dodecylthioethyl, 2-phenylthioethyl, 2,2,2-trifluoroethyl, 2-hydroxyethyl, 2-hydroxypropyl, 3-hydroxypropyl, 4-hydroxybutyl, 6-hydroxyhexyl, 2- Aminoethyl, 2-aminopropyl, 4-aminobutyl, 6-aminohexyl, 2-methylaminoethyl, 2-methylaminopropyl, 3-methylaminopropyl, 4-methylaminobutyl, 6-methylaminohexyl, 2-dimethylaminoethyl, 2-dimethylaminopropyl, 3-dimethylaminopropyl, 4-dimethylaminobutyl, 6-dimethylaminohexyl, 2-hydroxy-2,2-dimethylethyl, 2-phenoxyethyl, 2-phenoxypropyl, 3-phenoxypropyl, 4-phenoxybutyl, 6-phenoxyhexyl, 2-methoxyethyl, 2-methoxypropyl, 3-methoxypropyl, 4-methoxybutyl, 6-methoxyhexyl, 2-ethoxyethyl, 2-ethoxypropyl, 3-ethoxypropyl, 4-ethoxybutyl or 6-ethoxyhexyl.

Optionally C ₂ -C ₁₈ -alkyl which is interrupted by one or more non-adjacent oxygen and / or sulfur atoms and / or one or more substituted or unsubstituted imino groups are, for example, 5-hydroxy-3-oxapentyl, 8-hydroxy-3,6- dioxaoctyl, 11-hydroxy-3,6,9-trioxaundecyl, 7-hydroxy-4-oxaheptyl, 11-hydroxy-4,8-dioxaundecyl, 15-hydroxy-4,8,12-trioxapentadecyl, 9-hydroxy-5- oxa-nonyl, 14-hydroxy-5,10-oxatetradecyl, 5-methoxy-3-oxapentyl, 8-methoxy-3,6-dioxa-octyl, 11-methoxy-3,6,9-trioxaundecyl, 7-methoxy 4-oxaheptyl, 11-methoxy-4,8-dioxa-undecyl, 15-methoxy-4,8,12-trioxapentadecyl, 9-methoxy-5-oxanonyl, 14-methoxy-5,10-oxatetradecyl, 5-ethoxy 3-oxapentyl, 8-ethoxy-3,6-dioxaoctyl, 11-ethoxy-3,6,9-trioxaundecyl, 7-ethoxy-4-oxaheptyl, 11-ethoxy-4,8-dioxaundecyl, 15-ethoxy-4, 8,12-trioxapentadecyl, 9-ethoxy-5-oxanonyl or 14-ethoxy-5,10-oxatetradecyl.

When two radicals form a ring, these radicals can be taken together, for example, as fused building blocks, 1,3-propylene, 1,4-butylene, 2-oxa-1,3-propylene, 1-oxa-1,3-propylene, 2-oxa 1,3-propenylene, 1-aza-1,3-propenylene, 1-C ₁ -C ₄ -alkyl-1-aza-1,3-propenylene, 1,4-buta-1,3-dienylene, 1 -Aza-1,4-buta-1,3-dienylene or 2-aza-1,4-buta-1,3-dienylene mean.

The number of non-adjacent oxygen and / or sulfur atoms and / or imino groups is basically not limited, or is automatically limited by the size of the remainder or of the ring building block. In general, it is not more than 5 in the respective radical, preferably not more than 4 or very particularly preferably not more than 3. Furthermore, there are between two heteroatoms in the rule at least one, preferably at least two carbon atom (s).

substituted and unsubstituted imino groups may be, for example Imino, methylimino, iso-propylimino, n-butylimino or tert-butylimino be.

For example, the term "functional groups" means the following:
Carboxy, carboxamide, hydroxy, di (C ₁ -C ₄ alkyl) amino, C ₁ -C ₄ alkyloxycarbonyl, cyano or C ₁ -C ₄ alkoxy. In this case, C ₁ to C ₄ alkyl is methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl or tert-butyl.

Optionally C ₆ -C ₁₄ -aryl substituted by functional groups, aryl, alkyl, aryloxy, alkyloxy, halogen, heteroatoms and / or heterocycles are, for example, phenyl, tolyl, xylyl, α-naphthyl, β-naphthyl, 4-diphenylyl, chlorophenyl, Dichlorophenyl, trichlorophenyl, difluorophenyl, methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, diethylphenyl, iso-propylphenyl, tert-butylphenyl, dodecylphenyl, methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, methylnaphthyl, isopropylnaphthyl, chloronaphthyl, ethoxynaphthyl, 2,6-dimethylphenyl, 2 , 4,6-trimethylphenyl, 2,6-dimethoxyphenyl, 2,6-dichlorophenyl, 4-bromophenyl, 2- or 4-nitrophenyl, 2,4- or 2,6-dinitrophenyl, 4-dimethylaminophenyl, 4-acetylphenyl, methoxyethylphenyl or ethoxymethylphenyl.

Optionally C ₅ -C ₁₂ -cycloalkyl which is substituted by functional groups, aryl, alkyl, aryloxy, halogen, heteroatoms and / or heterocycles are, for example, cyclopentyl, cyclohexyl, cyclooctyl, cyclododecyl, methylcyclopentyl, dimethylcyclopentyl, methylcyclohexyl, dimethylcyclohexyl, diethylcyclohexyl, butylcyclohexyl, methoxycyclohexyl, Dimethoxycyclohexyl, diethoxycyclohexyl, butylthiocyclohexyl, chlorocyclohexyl, dichlorocyclohexyl, dichlorocyclopentyl and a saturated or unsaturated bicyclic system such as norbornyl or norbornenyl.

One five- to six-membered, oxygen, nitrogen and / or Sulfur-containing heterocycle is, for example, furyl, Thiophenyl, pyryl, pyridyl, indolyl, benzoxazolyl, dioxolyl, dioxyl, Benzimidazolyl, benzthiazolyl, dimethylpyridyl, methylquinolyl, Dimethylpyryl, methoxifuryl, dimethoxypyridyl, difluoropyridyl, methylthiophenyl, Isopropylthiophenyl or tert-butylthiophenyl.

preferred Anions are selected from the group of halides and halogen-containing compounds, the group of carboxylic acids, the group of sulfates, sulfites and sulfonates and the group of Phosphates.

Preferred anions are chloride, bromide, iodide, SCN ^-, OCN ^-, CN ^-, acetate, C ₁ -C ₄ alkyl, R ^a -COO ^-, R ^a SO ₃ ^-, R ^a R ^b PO ₄ ^-, methanesulfonate, tosylate , C ₁ -C ₄ dialkyl phosphates, hydrogen sulfate or tetrachloroaluminate.

Especially Dialkylimidazolium cations are preferably used in which the two alkyl groups the same or different, branched or unbranched, substituted with one or more ren phenyl groups or may be unsubstituted and 1 to 6 carbon atoms exhibit.

Especially preferred are benzylmethylimidazolium, hexylmethylimidazolium, Butylmethylimidazolium, ethylmethylimidazolium.

When Anions are particularly preferably tetrachloroaluminate and / or Heptachlordialuminat.

Most preferably, the ionic liquid has a formula KaCl × AlCl ₃ , wherein Ka has one of the abovementioned imidazolium cations and x has a value of from 0.9 to 2, advantageously from 1.4 to 1.7, in particular 1.5.

Preferably the contacting takes place, which is associated with the cementation of nickel and / or cobalt on copper, at a temperature of less than 100 ° C. More preferably, the Temperature preferably at most 97.5 ° C, further more preferably at most 95 ° C.

The Contacting and the concomitant cementation of nickel and / or cobalt on copper is preferably at least one For hours. Further preferably, the duration is at least 6 hours, more preferably at least 12 hours, more preferably at least 18 hours.

It is further preferred that during the contacting and the cementation associated therewith of nickel and / or cobalt on copper the liquid phase is at least temporarily moved. In particular, shaking or stirring is possible.

Nickel- and / or cobalt are in the liquid phase in the form of their Ions in front. These can be incorporated in the form of their salts become. As anions ions can serve as they are in the above Listed in connection with the ionic liquid were. They may be the same or different from or be the anions of the ionic liquid. Preferably at least partially also makes the anion in the Ni and / or Co salt the anion of the ionic liquid.

Especially Chlorides are suitable. The Ni and / or Co salts should be anhydrous Form present.

The Initial concentration of cobalt and / or nickel should be at least 0.05 wt .-% based on the total weight of the liquid Phase amount. The initial concentration is preferably at least 0.1% by weight, more preferably at least 0.5% by weight.

In With respect to the article which is at least partially a copper surface essentially no restrictions are imposed, if a cementation invention possible is.

Preferably For example, the article is a sheet metal. However, there are also balls, granules, powder (especially with Particle diameter in the μm to nm range) and three-dimensional Workpieces such as pipes and gutters conceivable.

by virtue of of the method according to the invention it is possible an article partially having a copper surface, at least partially with a nickel and / or cobalt layer Mistake. Such layers can, for example, in corrosion protection be used or as a primer, for example as part an alloy (such as a Zn / Ni alloy) serve. Likewise, catalyst applications are possible.

One Another object of the present invention is the use an ionic liquid containing anions and cations for the electroless deposition of nickel and / or cobalt on a Copper surface, which is an object at least partially having.

Examples:

Example 1 Ni cementation on copper in 1-ethyl-3-methyl-imidazolium chloride (E-MIMCI) × 1.5 AlCl ₃

129.7 g EMIMCI × 1AlCl ₃ (52.2% EMIMCI and 47.8% AlCl ₃ ) are heated under argon to 90 ° C and treated with 0.31 g of anhydrous nickel (II) chloride. The reaction solution turns green and after 18 h at this temperature with 30.7 g of aluminum (III) chloride, after which the solution decolorizes to yellow / brown. The reaction mixture is filtered under argon and the Ni concentration determined by elemental analysis:
Ni: 49 ppm

60 mL of this reaction mixture are transferred under argon into a temperature-controllable glass vessel. A copper sheet of dimensions 20 × 70 × 5 mm is immersed at 90 ° C in the stirred solution of nickel (II) chloride in EMIMCI × 1.5 AlCl ₃ . The copper sheet has a silvery-shiny nickel coating after 24 hours and is removed from the bath, washed with methanol and water and stored dry. By means of elemental analysis, the depletion of the ionic liquid on nickel (II) can be determined:
Ni: <10 ppm

The nickel coating of the copper sheet is examined by means of SEM-EDX: element C O Cl Ni Cu Weight% It. EDX 10.9 0.6 - 79.2 9.1

QUOTES INCLUDE IN THE DESCRIPTION

This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.

Cited patent literature

• - US 2002/070112 A [0005]
• - US 3930847 A [0006]
• - DE 102005017733 A [0016]

Claims (10)

Process for the cementation of nickel and / or Cobalt on copper containing the step (a) Contact an object that is at least partially a copper surface comprising, with a liquid phase containing ions at least one of the metals selected from the group of metals consisting of nickel and cobalt and an ionic liquid containing anions and cations and (b) electroless deposition of nickel and / or cobalt on the copper surface. Method according to claim 1, characterized in that that the copper surface of the article before contacting is activated. Method according to claim 1 or 2, characterized that nickel is deposited. Method according to one of claims 1 to 3, characterized in that the cations of the ionic liquid is at least one cation which is selected from the group of cations consisting of

and oligomers containing this structure, wherein in the abovementioned formulas (IVa) to (IVy) • the radical R represents hydrogen, a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or by 1 to 5 heteroatoms or functional groups are interrupted or substituted radicals having 1 to 20 carbon atoms; and • the radicals R ¹ to R ⁹ independently of one another are hydrogen, a sulfo group or a carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups substituted radical having 1 to 20 carbon atoms, wherein the radicals R ¹ to R ⁹ , which in the abovementioned formulas (IV) are bonded to a carbon atom (and not to a heteroatom), may additionally also stand for halogen or a functional group, or two adjacent radicals from the series R ¹ to R ⁹ together also represent a divalent, carbon-containing organic, saturated or unsaturated, acyclic or cyclic, aliphatic, aromatic or araliphatic, unsubstituted or interrupted by 1 to 5 heteroatoms or functional groups Rest with 1 to 30 carbon offatomen stand. Method according to one of claims 1 to 4, characterized in that the ionic liquid contains tetrachloroaluminate and / or Heptachlordialuminat as anion. Method according to one of claims 1 to 5, characterized in that the contacting at a temperature less than 100 ° C. Method according to one of claims 1 to 6, characterized in that the contacting at least For 1 hour. Method according to one of claims 1 to 7, characterized in that the liquid phase during the contacting is at least temporarily moved. Method according to one of claims 1 to 8, characterized in that the object is a sheet metal. Use of an ionic liquid containing anions and cations for the electroless deposition of nickel and / or cobalt on a copper surface, which is an object at least partially.