DE102008001909A1 - Projection exposure system, has multipolar lighting adjustment of imaging device and compensation unit is provided for compensation of image defect induced by multipolar lighting adjustment - Google Patents

Abstract

The projection exposure system (1) has multipolar lighting adjustment of an imaging device. The imaging device is so formed that the multipolar lighting adjustment is changeable into another multipolar lighting adjustment. A compensation unit is provided for compensation of image defect induced by the multipolar lighting adjustment. An independent claim is also included for a method for compensation of image defect induced by a multipolar lighting adjustment.

Description

BACKGROUND OF THE INVENTION

FIELD OF THE INVENTION

The The present invention relates to an imaging device, in particular a projection exposure system for microlithography with a multipolar illumination setting as well as a procedure to compensate for by a multipolar illumination setting induced aberrations in corresponding imaging devices.

STATE OF THE ART

Projection exposure systems for microlithography for the production of microstructured Components are used in microtechnology and in particular microelectronics used in many ways. Due to the ever smaller Structures that are to be manufactured with such systems, is a high precision of the projection exposure equipment essential. The imaging devices used in this case, be however, it is in the lighting system or in the projection lens exposed to various influences, which over the service life to a change in picture properties can contribute.

When Example is the one for the microlithographic image used radiation, which to some extent of the optical elements, such as lenses, mirrors, diffractive optical Elements (DOEs) is absorbed, causing a warming the optical elements, the so-called lens heating (LH) comes. The absorption depends on the material used for the Lenses or the coatings disposed thereon.

By the heating of the optical elements can lead to surface deformations as well as refractive elements (lenses) for modification the refractive index come, directly by the thermal load and / or the resulting mechanical residual stresses. All of this affects the imaging properties of the corresponding ones Imaging device.

Around those generated by the heating of the optical elements Changes over one for one compensate for a different temperature condition of the imaging device, In addition to the measures to reduce or Limiting the heating of the optical elements by means of suitable materials and the like compensation devices be provided by active changes to the Imaging device to a reduction or a complete Can compensate for aberrations.

From the EP 0 961 149 A2 For example, a catadioptric projection lens is known in which a mirror is provided which can be deformed by means of actuators in order to compensate for non-rotationally symmetric aberrations. In addition, lenses rotatable about the optical axis may be provided to minimize further aberrations. A correction of asymmetric aberrations by rotation of two, due to their shape asymmetric aberration generating lenses is known from US 5,852,518 known.

Except for mirror elements actuators are also known for lenses, according to the number of actuators and their distribution z. B. on the circumference of the corresponding lens element allow a suitable deformation of the lens element. Such deformations of at least two optical elements can be used to compensate for asymmetrical aberrations, as in WO 2006/125617 A2 disclosed. By superimposing the wavefront deformations generated by deformation, complex aberrations can be corrected. The revelation of WO 2006/125617 A2 is hereby incorporated by reference in its entirety into the present disclosure.

Correction of aberrations with a single deformable optical element is further disclosed in U.S. Pat DE 10 2005 015 627 A1 disclosed.

Next the already mentioned high precision of the projection exposure equipment However, it is increasingly important for the user that corresponding plants also variable for different Uses, especially for very many different Types of microstructures to be generated and correspondingly different Reticle can be used. It is advantageous for this also the lighting to the different circumstances, such as For example, to be able to adapt the shape, type and structure of a reticle.

Accordingly, for example, from the DE 103 43 333 A1 a microlithography projection exposure apparatus is known in which a variable setting of different lighting modes without replacement of optical components is possible. The disclosure of this application for the same Applicant is hereby incorporated by reference in its entirety into the present disclosure.

However, a problem with such a system may be that the different Be different settings, such as dipole or quadrupole illumination settings, which are difficult to compensate because of the variability in azimuthal and radial alignment of the optical axis aberrations and complexity of imaging aberrations.

DISCLOSURE OF THE INVENTION

OBJECT OF THE INVENTION

It is therefore an object of the present invention, the problem of Compensation of various aberrations, for example, by variable in time and according to the type and size of the setting, non-rotationally symmetric lighting settings arise, to solve in a simple and effective way. The induced Aberrations can both the image of the mask on the wafer through the projection lens as well as the illumination concern the mask through the lighting system. In particular, a should corresponding method or device despite variable compensation of aberrations continue to be easily constructed, manufactured or be operable.

TECHNICAL SOLUTION

These Task is solved by an imaging device with the features of claim 1 and corresponding method for Compensation of aberrations with the features of the claims 23 or 24. Advantageous embodiments are the subject of the dependent Claims.

The The present invention is based on the recognition that in time and according to the type and size of the setting variable multipolar, ie in particular with respect to the optical axis non-rotationally symmetric Illumination settings a variable compensation device for those induced by the multipolar illumination adjustment Aberrations can be provided which makes it possible at least for two different multipolar, ie in particular non-rotationally symmetrical lighting settings a corresponding Compensation to achieve the resulting aberrations.

Under Multipolar lighting setting will be any lighting setting understood, which in a field level, ie in particular a Retikelebene a projection exposure system a distribution of intensity concerning the ailment and size the angle of incidence of the light or radiation used for imaging having. Correspondingly, pupil planes or conjugated ones are found in the pupil planes Planes of the imaging device azimuthal and / or radial intensity distributions of the light used for imaging or generally used electromagnetic radiation. Common lighting settings represent dipole or quadrupole settings, which in one Pupillenebene the imaging device, for example, two or have four disk-like intensity maxima.

Especially Such a variable compensation device for be provided multipolar lighting settings, which related to their azimuthal orientation arbitrarily about the optical axis as Rotary axis can be arranged, so that any azimuthal Orientation of the illumination poles with respect to a reticle to be illuminated or a lighting field.

additionally or alternatively, various multipolar lighting settings, like dipole or quadrupole settings or the like, to the variable Compensation may be provided, in its radial configuration relative to the optical axis and / or their amplitude are variable.

The corresponding aberrations caused by the multipolar illumination settings Above all, one can be induced n-fold symmetry with the natural number n ≥ 2 , wherein the balance of the symmetry according to the following Description is related to a rotation about the optical axis, z. B. of the projection lens contained in the projection exposure system.

In the case of inhomogeneous, non-rotationally symmetrical aberrations or the corresponding deformations of compensation elements, one speaks of 2, 4 or generally multiple ripples, depending on which type of inhomogeneous, non-rotationally symmetrical illumination or corresponding deformation exists. In a dipole illumination, a 2-ripple is given, while in a quadrupole illumination due to the four poles of a 4-ripple is spoken. In the following, the symmetry of point groups is also referred to as being comparable to the counting, so that, for example, a rotation of 180 ° about the optical axis results in a matching position of the poles or aberrations or deformations in the case of a 2-index. Similarly, in a 4-turn by a 90 ° rotation about the optical axis a match of the corresponding illumination settings or the aberrations or deformation of the compensation elements is achieved. Consequently, in the present application, the terms ripple and count will be similarly described below and in accordance with FIG used previous definition.

The variable compensation device can at least one, preferably two, in particular three or more deformable optical elements have, wherein the deformation of the optical elements aberrations are generated, which counteract the aberrations to be compensated. The deformation can vary in strength and / or with take different signs. The compensation can be both in the lighting system as well as in the projection lens of a Projection exposure made.

Especially the variable compensation device can be at least one deformable comprise optical element which is rotatable about the optical axis is arranged so that the non-rotationally symmetric or n-wavy Deformation is azimuthally aligned by rotation about the optical axis can be that at least certain aberrations or corresponding Illumination settings in any azimuthal orientation or alignment can be compensated.

alternative or additionally, the compensation device can at least comprise a pair or a plurality of deformable optical elements, in fixed angular relationships with respect to each other with respect to their azimuthal Alignment are arranged. By linear combinations of aberrations, which is generated by the individual deformable optical elements can also be different aberrations and in particular certain aberrations in each azimuthal Orientation be compensated.

All in all can in the compensation device a variety of Combinations of rotatable and / or with respect to their azimuthal orientation fixedly arranged deformable optical elements, such as also two or more pairs of deformable optical elements be provided with a fixed azimuthal orientation for as many arbitrary lighting settings as possible as many arbitrary azimuthal orientations To provide compensation for aberrations.

The compensation device or corresponding parts thereof, for example the deformable optical elements, may be provided in a pupil plane and / or in the vicinity of such a plane. In particular, the compensation device or parts thereof, that is to say correspondingly the deformable optical element, can be provided in a plane whose subaperture ratio ≥ 0.75 is in particular ≥ 0.9. The subaperture ratio in a plane parallel to a pupil plane of the optical system is defined as | R - H |: (| R - H | + | H |) wherein, starting from an object point of maximum object height R, the marginal beam height and H is the main beam height, measured in the plane. The subaperture ratio can thus assume values between 0 and 1, with the value 1 in each pupil plane of the optical system and the value 0 in each field plane of the optical system. Since the multipolar illumination setting causes an inhomogeneous, in particular non-rotationally symmetrical light intensity distribution in the pupil plane, the arrangement in the corresponding pupil near planes is particularly advantageous to produce effects, especially in the pupil plane. But it is also an arrangement in other levels possible.

The deformable optical elements of the compensation device can both optical lenses and mirrors or diffractive optical Elements, so-called DOEs.

to Deformation of the optical elements can be connected to the optical Elements actuators and / or fixed bearing provided it enable the optical elements in a certain way deform, in particular with different amplitudes and / or in different directions.

At the deformable optical elements may be two or three more, especially n or 2n actuators and fixed bearings provided where n is a natural number ≥ 2. The Provide n or 2n actuators and a corresponding number of fixed bearings allows the introduction of deformations with n-fold or 2n-fold ripple or count the symmetry. This is especially true when the actuators for Movement or deformation of the optical elements and the fixed bearing alternately equidistant around the circumference of an example circular or cylindrical optical element, such as a lens, are arranged.

The Actuators allow movement of the edge of the optical Elements parallel or at least in the direction of the optical axis or opposite or a corresponding deformation.

The fixed bearings may be designed such that they define the deformable optical element at least with regard to the degree of freedom of movement of the optical elements in the direction of the optical axis or opposite. Above all, the fixed bearing can be designed such that, although a determination of the deformable optical element perpendicular or nearly perpendicular to the optical surface is given to the optical element or in the direction parallel to the optical axis, but for example, a tilting or rotation is still possible. This can be achieved that can be introduced into the deformable optical element by a variable actuation of actuators different ripples. In addition, it is conceivable to design the fixed bearing so that they are detachable, so that by adjusting or removing the bearings, the adjustment of the waviness can be made variable.

To a preferred embodiment, the compensation device at least two deformable optical elements which are so deformable are that they have an n-waviness, where n is a natural Number is ≥ 2. These two n-wavy deformable optical Elements can then move one another at an angle of 90 ° / n be arranged rotated about the optical axis, so that through the Actuation of the actuators any orientation of a n-wavy aberration can be compensated. This is done a linear combination of aberrations caused by the n-wavy deformable optical elements are introduced.

at the use of 2n wavy deformable optical elements in a compensation device, the provision of a further deformable be advantageous to an additional optical element Cover for an azimuthal orientation.

to Realization of a rotatable, deformable optical element can such an optical element have a rotary mount, in particular as a two-part version with inner and outer frame can be designed. The actuators can hereby at the Be arranged inside socket and, for example, by piezoelectric Components that have sliding contacts or the like with electrical energy can be supplied.

Similar any combination of several azimuthally aligned and / or freely rotatable deformable optical elements in one or more compensation devices may additionally or alternatively the deformable optical elements of a compensation device so be designed that different counts or ripples are provided or accessible by deformations. There is that a diverse combination possibility to achieve different compensation options for many different aberrations as well as a corresponding azimuthal Orientation of such aberrations.

at the imaging device according to the invention can both the multipolar illumination setting and the compensation device regarding the setting of the azimuthal and / or radial orientation and / or amplitude to be continuously variable. In order to is in addition to the gradual change of the multipolar Lighting adjustment by appropriate measures in Lighting system, for example, in the temporal sequence of Illumination of reticle to reticle or wafer to wafer and one corresponding stepwise adjustment of the compensation device another type of continuous change possible.

Around to be able to determine how the imaging properties and the operation of the compensation device are, can Measuring and detecting device for continuous or intermittent Be provided detection of imaging properties, in particular a control loop may be formed, which depends on the recorded measured values control the compensation device allows.

The Imaging device according to the invention can be so be operated, that is first determined which Multipolar illumination setting, especially with regard to their azimuthal orientation is present, in which case in a subsequent Step the compensation device can be adjusted so that compensation by the multipolar illumination setting caused aberrations is made possible. This can for example the deformation of the deformable optical elements of a compensation device accordingly be chosen so that by an overlay the aberrations generated by the deformation caused by the multipolar illumination adjustment compensated for aberrations generated become. In a rotatable, deformable optical element can in addition to the deformation by means of the actuators one corresponding rotation, ie azimuthal alignment are made.

In order to can with an arbitrarily set lighting setting a effective compensation of the aberrations generated by the illumination be effected. It is arbitrary in particular in terms of to understand azimuthal alignment. In dependence of the number of deformable optical elements used is but also an arbitrariness or variability in terms of Type and size of lighting settings possible.

The corresponding method is particularly suitable for compensating for changes in the multipolar illumination setting, in particular with regard to an altered azimuthal alignment. The compensation can be both stepwise and continuously, for example in Depending on the continuously or intermittently detected imaging properties are adapted to the temporal variation of the aberrations, so as to achieve an effective compensation.

Farther It is also possible optical elements, in particular the deformable optical elements of the compensation device in one direction parallel or antiparallel to the optical axis movable to design, by shifting the corresponding optical Elements parallel or anti-parallel to the optical axis another Adjustment or compensation to create.

BRIEF DESCRIPTION OF THE DRAWINGS

Further Advantages, characteristics and features of the present invention in the following detailed description of embodiments clearly with reference to the attached drawings. The painting show here in a purely schematic way in

1 a microlithography projection exposure apparatus in which the present invention can be used;

2 a view of a first embodiment of a projection lens for use with a compensation device according to the invention;

3 a view of a second embodiment of a projection lens for use with a compensation device according to the invention;

4 a view of a third embodiment of a projection lens for use with a compensation device according to the invention

5 a plan view of a compensation device in the direction of the optical axis according to the present invention;

6 a representation of the wavefront deformation in deformation of optical elements of the embodiment of the 4 ,

7 in sub-diagrams a) to c) diagrams of the representation of wavefront deformation using Zernike polynomials and their superimposition;

8th a side view of a deformable optical element in the form of an optical lens;

9 a plan view of another form of compensation device comparable to the representation of 2 ;

10 a side sectional view of the deformable optical element in the form of a lens of the compensation device 9 along the section AA

11 a side view of the deformed lens from the 5 and 6 ;

12 a perspective view of the lens 11 ; and in

13 a representation of a dipole illumination.

The 1 shows a microlithography projection illumination system 1 as they are in the DE 103 43 333 A1 is disclosed. The disclosure of this application is incorporated herein by reference in its entirety.

The projection lighting system 1 has a light source 2 with a subsequent illumination system, which is a reticle 15 in a reticle plane homogeneously illuminates, which simultaneously the object plane of the subsequent projection lens 16 so that the pattern of the reticle is at one in the picture plane 17 arranged wafer is imaged on which a corresponding microstructure is to be generated.

The illumination system of the embodiment shown points to the light source 2 in the form of a laser or the like, a beam expander 3 on, the light in a light modulation device 4 emits their individual elements by a control device 5 are independently adjustable and changeable, so that any lighting setting (lighting setting) by the individual elements, eg. B. in the form of switchable, reflective diffraction gratings, is possible.

That of the light modulation unit 4 Outgoing light is through a zoom axicon lens 7 passed, wherein in the exit pupil plane 8th a grid element 9 is provided, which has a rectangular emission characteristic to achieve a rectangular illumination field.

The following is a coupling optics 10 provided the field level 11 follows. The illumination system subsequently has a illumination imaging arrangement 12 on, which is an imaging unit 13 includes, at the one pupil intermediate level 14 is provided, in which the compensation device according to the present invention can be arranged. Of course they are Other locations for the arrangement of the compensation device within the illumination system or the projection exposure system 1 possible, for example, which also represent pupil planes, pupil-near planes or conjugate planes. In particular, the compensation device can be provided in the projection objective of a projection exposure apparatus. The arrangement of the compensation device or at least parts thereof in a pupil plane or the vicinity thereof is therefore preferred because the compensation device is intended to compensate or eliminate the aberrations caused by the non-homogeneous, in particular non-rotationally symmetrical intensity distribution in the pupil plane that an effect in the pupil should be caused.

In addition to, for example, a complete arrangement of the compensation device, for. B. consisting of two azimuthally twisted, deformable optical elements, in the pupil intermediate plane 14 , It is also possible to realize compensation devices in which the individual components, eg. B. deformable optical elements, at different locations of the imaging device, so the projection exposure arrangement, and thus are provided spatially separated.

The 2 to 4 show further examples of imaging devices in which corresponding compensation devices can be provided. The examples are different projection lenses of projection exposure equipment. The possible locations of use of the compensation devices or parts thereof, ie of the deformable optical elements, are shown by dashed rectangles, the subaperture ratio, as has been defined above, being ≥ 0.75 in these areas.

In the projection lens of 2 It is a purely refractive system, while the projection lens of 3 is a catadioptric system with a refractive part, a mirror part and again a refractive part, so that it can be referred to collectively as an RCR system.

The projection lens of the 4 can be referred to as a 2M system because it includes two mirrors.

The 5 shows a possible compensation device consisting of two deformable optical lenses, which in their azimuthal alignment with each other by the angle α, z. B. 45 ° to each other about the optical axis 6 are twisted.

In the plan view of 5 is just a deformable lens 30 while behind it along the optical axis 6 arranged second deformable optical lens 40 is hidden and therefore only shown in dashed lines. However, the corresponding bearings 43 . 44 and actuators 41 . 42 to recognize.

The two optical lenses 30 and 40 each have opposing actuators 31 . 32 respectively. 41 . 42 on, the side edge of the circular optical lenses at opposite locations parallel to or in the direction of the optical axis 6 can move.

Additionally are on the optical lenses 30 and 40 two fixed camps each 33 and 34 respectively. 43 and 44 provided on the circumference of the optical elements in each case by 90 ° from the actuators 31 . 32 respectively. 41 . 42 are provided.

Accordingly, by actuation of the actuators 31 . 32 respectively. 41 . 42 for rectified actuation, ie z. B. with simultaneous lifting of the lens edge from the plane of the 5 out over each two actuators of a lens a bend around the axis, passing through the fixed bearing 33 . 34 respectively. 43 . 44 is going to be achieved.

In order to a so-called. 2-wave deformation is generated, due to the transfer in an equivalent state by a rotation of 180 ° the optical axis has a 2-fold symmetry.

As in the diagrams (contour plots) a) to c) of the 6 can be seen, a 2-wave aberration is generated by the 2-wave deformation, which can be used to compensate for 2-wave aberrations. The left part of the picture 6 shows the wavefront with 2-wave deformation of the optical element 15 the projection lens of the 4 (left arrow) with azimuthal orientation 0 ° while the right part of the image 6 wavefront deformation with 2-wave deformation of the optical element 19 (right arrow) of the embodiment of the 4 in azimuthal orientation of 45 °. The middle picture shows the superimposed wavefront deformation.

By the arrangement of deformable optical elements, in the illustrated embodiment of optical lenses, one behind the other along the optical axis 6 With an azimuthal rotation, a linear combination or superimposition of the aberrations generated by the deformation can be effected, which at different combinations and preferably different deformations to any, in particular arbitrary azimuthal alignment of Kompen lead. In this way, arbitrary, in particular arbitrary azimuthal illumination settings can be corrected or compensated.

The 7 For example, shows the linear combination of optical aberrations in the form of Zernike polynomials by the deformation of the successively arranged optical lenses 30 and 40 the by means of the actuators 31 . 32 and 41 . 42 arise (partial images a) and b)), so that arise in the sub-image c) by overlay correspondingly azimuthally oriented astigmatism. Thus, a corresponding 2-wave aberration due to an inhomogeneous, non-rotationally symmetric, ie multipolar illumination, such as a dipole illumination compensated or reduced.

In the embodiment shown the 7 is due to the deformation of the optical lens 30 from the 5 an aberration in the optical lens designated Z5 30 (Partial image a) and an aberration denoted Z6 in the optical lens 40 (Partial image b) generated, which lead by appropriate linear combination in the ratio 1: 1 (partial image c)) to astigmatism in a specific azimuthal orientation. Other combinations z. B. in the ratio -1: 1 lead to a different azimuthal orientation of the astigmatism. This arbitrarily azimuthal orientable aberration can be used to compensate for an arbitrarily oriented aberration. By changing the sign change, the entire angle range of 180 ° can be covered for a 2-wave (2-fold) disturbance.

The 8th shows an optical lens of the compensation device 2 namely, the optical lens 30 who are at the camps 33 and 34 is held or clamped while along a line perpendicular to the connecting line between the fixed bearings 33 and 34 the actuators 31 and 32 are arranged in 4 are not shown, but according to the indicated double arrow allow raising and lowering of the corresponding lens edge, so that there is a deflection of the optical lens 30 comes.

The 9 shows a second way of implementing a compensation device 21 which is a single rotatable optical lens 50 which is also deformable. There are four actuators for this purpose 51 to 54 equidistant around the circumference of the circular optical lens 50 provided so that they include angles of 90 ° between them. Between the individual actuators are also equidistant bearings 55 to 58 provided with respect to the actuators in their azimuthal orientation by 45 ° about the optical axis 6 are rotated, but in turn between the individual bearings have a rotation angle of 90 °.

Overall, with the deformable optical lens 50 due to the four arranged actuators 51 to 54 a 4-wave deformation possible.

Since the deformable optical element itself rotatable about the optical axis 6 is stored, as indicated by the double arrow, thus 4-wave aberrations in any azimuthal orientation in a rotation about the optical axis 6 be compensated or corrected, since according to the azimuthal orientation of the aberration to be compensated, the compensation device 21 with its rotatable optical element 50 can be aligned accordingly.

One possible implementation of a rotatable, deformable optical element is in the 10 which shows a sectional view along the section line AA 9 shows. In the sectional view of 10 is an exterior version 60 to recognize, in which an inner version 61 is rotatably mounted. Due to the rotatable inner frame 61 opposite the outer frame 60 can the optical element 50 around the optical axis 6 rotated and placed in any azimuthal orientation.

At the inner frame 61 are the actuators 51 to 54 , In the embodiment shown, the actuator 54 , as well as the bearings 55 to 58 , In the illustrated embodiment, the bearing 56 arranged.

By the actuators, which may for example be designed as piezoelectric elements that can be supplied via sliding contacts with electrical energy, the edge of the optical element 50 raised and lowered according to the double arrow. At the same time, the edge of the optical element 50 through the camps 55 to 58 , including the warehouse 56 , stabilized in its position, so that a corresponding deformation of the optical element can be realized.

For example, with the compensation device 21 In addition to 4-wave aberrations can also compensate for 2-wave aberrations, the bearings 55 to 58 be formed so that they are engaged with the optical element 50 can be solved, as the double arrow parallel to the corresponding support web of the camp 56 suggests. This can also be realized for example by a piezoelectric crystal.

This embodiment has the advantage that when dissolved bearings 55 to 58 the actuators 53 and 54 For example, assume the function of a parking bearing, while the actuators 51 and 52 continue to be operated as corresponding actuators. Thus, from the 4-wavy deformierba ren optical element 50 a 2-wave deformable optical element 50 be formed.

A corresponding releasable bearing arrangement can of course also in the embodiment of 5 with successively arranged optical elements 30 and 40 will be realized. However, additional lenses may be required to cover the additional orientation of the deformable lens that is not covered by the other deformable lenses. For example, a third deformable lens may be required here.

In addition, it is also possible the bearings 55 to 58 in such a way that a certain mobility of the deformable optical lens with respect. The bearing is given in one or more degrees of freedom and only a 2-wave deformation is realized by appropriate control of the actuators instead of a 4-wave deformation. This is schematically in 11 and 12 shown. Here are the camps 56 and 57 respectively. 55 and 58 the optical element 50 rotating on a certain plane while the ends through the actuators 53 and 54 respectively. 51 and 52 up and down according to the double arrows or along or opposite the optical axis 6 can be moved. Thus, a comparable deformation to that as in 8th is shown achieved.

The 13 shows a dipole illumination setting, in which a compensation device according to the invention can be used. Shown is the angular distribution in the form of the sine of the angle of incidence φ over a field plane or near-field plane, z. B. in the vicinity of the reticle. Accordingly, the shows 13 the sin φ distribution for the coordination x and y.

Although in the present embodiments, only compensation means have been described, the 2-wave deformable optical lenses in succession along the optical axis 6 or one around the optical axis 6 rotatable, 4-wave deformable optical element 50 It is understood that a variety of different combinations of n- or 2n wavy deformable optical elements, which are arranged with an azimuthal angular relationship to each other, and / or freely rotatable about the optical axis arranged deformable optical elements, are possible.

Even though the present invention is described with reference to optical lenses is, of course, that the present Invention also for other optical elements, such as mirrors or diffractive optical elements, so-called DOEs are used can.

Even though the present invention with reference to the accompanying embodiments has been described in detail, is for the expert also, of course, that modifications by different combination of individual presented features or Omitting individual features are possible without the scope of protection of the appended claims.

QUOTES INCLUDE IN THE DESCRIPTION

This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.

Cited patent literature

• - EP 0961149 A2 [0006]
• US 5852518 [0006]
• WO 2006/125617 A2 [0007, 0007]
• DE 102005015627 A1 [0008]
• - DE 10343333 A1 [0010, 0054]

Claims (31)

A projection exposure apparatus for microlithography, comprising a multipolar illumination adjustment of the imaging apparatus, characterized in that the imaging apparatus is designed such that the multipolar illumination setting can be changed from a first multipolar illumination setting into at least one second multipolar illumination setting, wherein a compensation device ( 20 . 21 ) is provided to compensate for aberrations induced by the multipolar illumination adjustment, which is variably adjustable to compensate for different aberrations due to the first illumination setting and the second illumination setting. Projection exposure system according to claim 1, characterized in that the illumination setting in terms of their azimuthal and / or radial alignment with respect to. The optical axis ( 6 ) and / or its amplitude can be varied, so that different angular distributions of the light and / or with respect to a pupil plane different intensity distributions of the light can be set, in particular with respect to a reticle or an illumination field to be illuminated. Projection exposure apparatus according to claim 1 or 2, characterized in that the multipolar illumination setting a dipole or quadrupole adjustment, which is particularly azimuthal and / or radially and / or its amplitude is variable. Projection exposure system according to one of the preceding Claims, characterized in that the induced Aberrations an n-fold symmetry with the natural Number n> = 2 referred have on the optical axis as the axis of symmetry and / or order the optical axis may have different orientations. Projection exposure system according to one of the preceding Claims characterized in that the compensation device is designed such that aberrations with continuously variable set azimuthal orientation and / or compensated can. Projection exposure system according to one of the preceding claims, characterized in that the compensation device ( 20 . 21 ) has at least one, preferably two, in particular three or more deformable optical elements. Projection exposure apparatus according to claim 5, characterized in that at least one deformable optical element ( 50 ) is provided, which is arranged rotatably about the optical axis. Projection exposure system according to one of the preceding claims, characterized in that the compensation device ( 20 ) comprises at least one pair or a plurality of deformable optical elements arranged in a fixed angular relationship with respect to each other with respect to their azimuthal orientation. Projection exposure system according to claim 7, characterized characterized in that two or more pairs deformable optical Elements with between the elements of a pair of fixed angular relationship the azimuthal orientation are provided. Projection exposure apparatus according to one of the claims 5 to 8, characterized in that the compensation device any suitable combinations rotatable and / or with respect to their azimuthal alignment fixedly arranged deformable optical Has elements. Projection exposure system according to one of the preceding Claims, characterized in that the compensation device or optical elements thereof in a pupil plane and / or in are provided near such a level. Projection exposure system according to one of the preceding Claims, characterized in that the compensation device or optical elements thereof are arranged in a plane whose Subaperture ratio ≥ 0.75, in particular ≥ 0.9 , where the subaperture ratio is defined as | R - H |: (| R - H | + | H |), starting from an object point of maximum object height R the marginal beam height and H the main beam height is, measured in the plane parallel to a pupil plane of the optical system. Projection exposure system according to one of the preceding Claims, characterized in that the optical elements are selected from the group, the optical lenses, mirrors and diffractive optical elements. Projection exposure apparatus according to one of the preceding claims, characterized in that a deformable optical element at least one actuator ( 31 . 32 ; 41 . 42 ; 51 to 54 ) and at least one fixed bearing ( 33 . 34 ; 43 . 44 ; 55 to 58 ), preferably two or more, in particular n or 2n actuators and fixed bearings, where n is a natural number with n> = 2, so that deformations with n- or 2n-fold symmetry (n- or 2n ripple) are formed. Projection exposure apparatus according to claim 13, characterized in that the number of actuators and / or Fixed bearing with the count of symmetry of aberrations corresponds or is twice as large. A projection exposure apparatus according to claim 13 or 14, characterized in that the fixed bearings are designed such that they are solvable. Projection exposure apparatus according to one of the claims 13 to 15, characterized in that the compensation device at least two n-fold (n-wavy) deformable optical Includes elements that are azimuthal at an angle of 90 ° / n are twisted, especially with multiple deformable optical Elements in different directions related to an optical element or sequentially with respect to the previous optical one Element. Projection exposure apparatus according to one of the claims 13 to 16, characterized in that the actuator is a movement at least a part, in particular an edge region of the optical Elements in the direction or at least partially parallel to the optical Can cause axis of the element, preferably both a Movement in one direction from a basic position as well as in the opposite direction is possible. Projection exposure apparatus according to one of Claims 13 to 17, characterized in that the optical element has a rotary mount, in particular a two-part mount with inner and outer mount ( 60 . 61 ), wherein the one or more actuators are arranged on the inner frame. Projection exposure system according to one of the preceding Claims, characterized in that the compensation device optical elements with different degrees of ripple which includes deformations and / or deformation possibilities. Projection exposure system according to one of the preceding Claims, characterized in that the multipolar Lighting setting and / or the compensation device continuously are changeable. Projection exposure system according to one of the preceding Claims, characterized in that at least one Detecting device for continuous or intermittent Detecting the imaging properties is provided. Projection exposure system according to one of the preceding Claims, characterized in that at least one optical element, in particular at least one deformable optical Element of the compensation device in a direction parallel and / or antiparallel to the optical axis is movable. Projection exposure system according to one of the preceding Claims characterized in that at least one, preferably a plurality of compensation devices in the projection lens the projection exposure system are arranged. Projection exposure system according to one of the preceding Claims characterized in that at least one, preferably a plurality of compensation devices in the lighting system the projection exposure system are arranged. Method of compensation by a multipolar Illumination adjustment induced aberrations in imaging devices, in particular projection exposure apparatus for microlithography, with a multipolar illumination setting, preferably at an imaging device according to any one of the preceding claims, characterized in that based on a set multipolar Illumination setting at least two deformable optical elements of a Compensation device can be deformed so that the generated aberrations with each other superimposed aberrations compensated by the multipolar illumination setting. Method of compensation by a multipolar Illumination adjustment induced aberrations in imaging devices, in particular projection exposure equipment for microlithography, with a multipolar illumination setting, preferably at an imaging device according to any one of the preceding claims, characterized in that based on a set multipolar Illumination setting at least one deformable optical Element of a compensation device so around the optical axis is rotated and deformed, that the aberrations generated thereby Compensate for aberrations caused by the multipolar illumination setting. Method according to one of claims 23 or 24, characterized in that the set illumination setting one in their azimuthal and / or radial orientation with respect to optical axis is any set illumination setting. Method according to one of claims 23 to 25, characterized in that the multipolar illumination setting from a first multipolar illumination setting in at least changed a second multipolar illumination setting is compensating by the multipolar illumination settings induced aberrations by changing the deformation at least an optical element and / or azimuthal alignment of an optical Element is adjusted by rotation about the optical axis. Method according to one of claims 23 to 26, characterized in that the compensation due to a changed Illumination adjustment and / or temporal change the aberration continuously or gradually by change the deformation of at least one optical element and / or azimuthal Alignment of an optical element by rotation about the optical Axis is adjusted. Method according to one of claims 23 to 27, characterized in that the imaging properties are continuous or intermittently.