DE102007043563A1 - Etching, galvanizing, cleaning and photoresist developing of a substrate with megasonic support, comprise carrying out megasonic excitation by standard megasonic-oscillation of cool bar- and atomizer application - Google Patents

Abstract

The The invention relates to a method for etching, electroplating, Cleaning and photoresist development with Megasonic support. The Megasonic component is made up of commercially available, Made in large quantities and therefore inexpensive and reliable single and multiple swingers from the Food technology and air humidification technology.

Description

Examples of ultrasound-assisted cleaning can be found in DE 10154922A1 for insensitive steel parts. In the field of nasal technology, especially in semiconductor technology, ultrasound treatment has been used for a few years for treatments at higher frequencies in the lower to medium MHz range ("megasonic") .The cavitations forming here are significantly less energetic but still sufficient effective to improve the supply and removal of the process medium even in the smallest structures, while the high-energy Ultraschallkavitationen not only damage photoresist structures, but in semiconductor processes even cause damage in the silicon crystal.

typical Examples of the state of the "Megasonic" technology are industrially manufactured cleaning tanks for silicon wafers, which contain piezoelectric oscillators on the bottom, which stimulate the above cleaning medium and so for improved peeling off of the silicon surface lead to adhering particles. Partially also double tank systems become used, in which the outer tank bottom the Schwinger contains, which over a water Zwischenstrecke the bottom of the tank inside and thus the inside Stimulate process medium.

For very expensive substrates such. B. of 300 mm silicon wafer, the above method is also used as a single substrate processing. A typical example of this is in US 6726848 given. Here, the substrate is inserted vertically into a narrow cuvette with overflow and Umpump device. In the lower part of the cuvette sits the transducer covering the width of the substrate (here called "megasonic transducer"), which excites the process fluid along the front and back of the substrate by the wavefront propagating upwards and thus enhances the cleaning action of the process fluid.

Assembly, Contacting and control of such oscillators require special knowledge, they lead to disproportionate high costs in plant construction and corresponding dependency of the Plant operator from the supplier of the plant component "Megasonic Transducer".

Of the Invention according to claim 1 is the use of large in size Quantities manufactured and thus comparatively much Cheap Megasonic vibrators underlay them as nebulizers in supermarket vegetable counters, humidifiers and decorative ones Zimmerbrunnen find use. These nebulizers are in the specialized trade completely assembled including transformer supplied, so they without electrical knowledge can be operated. They contain In addition, a control LED to indicate the operation and a level sensor, the over at insufficient water level the oscillator off.

Of the Operator can thus easily control the operating state. There is still the possibility of using commercially available Sound pressure gauges the vibration intensity determine quantitatively, so that when insufficient Intensity of the complete oscillator without expertise can be exchanged.

Examples of such oscillators can be found in the catalogs of the electronics trade, z. B. in the Fa. Conrad-Electronic, Catalog "Business, Fascination Electronics and Technology", 2007/2008, page 706, rubric "Mini-Nebler" , see enclosed copy of the page, each with an example of a single oscillator and a 3-way arrangement.

The oscillators are usually operated with high power density of 20-24 watts / cm ² (input power). Too much intensity can be reduced by means of extended run length in the water route to the process-compatible level or by suspended in the waterway plates, so that there is also a scattering or widening of the angle of action.

drawing Figure 1 shows a single nebulizer with typical dimensions of the metal round of about 40 mm cross-section, about 30 mm high and about 15 mm in diameter the oscillator window with the relatively directed propagation of Vibrations in the water.

drawing 2 shows a vertically arranged narrow cuvette as a process chamber in a suitable wall thickness of z. Stainless steel sheet, glass, Ceramic or quartz depending on process chemistry with a perpendicular to the front-acting oscillator assembly, the substrate in the process chamber covers by a reciprocating motion.

QUOTES INCLUDE IN THE DESCRIPTION

This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.

Cited patent literature

• - DE 10154922 A1 [0001]
• - US 6726848 [0003]

Cited non-patent literature

• - Fa. Conrad-Electronic, Catalog "Business, Fascination Electronics and Technology", 2007/2008, page 706, rubric "Mini-Mist" [0007]

Claims (7)

Etching, electroplating, cleaning and photoresist development with Megasonic support, characterized in that the Megasonic excitation by means of commercially available Megasonic oscillator from the refrigerated display and nebulizer application. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1, characterized characterized in that commercial oscillator in the frequency domain 0.5 to 4 MHz can be used. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1 and 2, characterized in that the number and arrangement of the on a Mount mounted commercial Megasonic transducer as single devices or multiple blocks in the for suitable process medium to be processed substrate (eg silicon disk, photomask, printed circuit board, flat panel) stimulate a waterway as a transfer medium. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1-3, characterized in that the holder with the vibrators in the water path and the substrate to be processed relative to each other be moved so that one not covered by the vibrators Surface of the substrate by reciprocation or circular motion is traversed and thus over the entire surface over time is covered. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1-4, characterized in that the substrate in the process chamber with the appropriate process fluid mounted horizontally is and the Megasonic vibration from the bottom over the water intermediate route acts. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1-4, characterized in that the substrate in the process chamber with the appropriate process fluid mounted horizontally is and the Megasonic oscillation from above over the water intermediate route acts. Etching, electroplating, cleaning and photoresist development with Megasonic support according to claim 1-4, characterized in that the substrate in the process chamber with the appropriate process liquid mounted vertically is and the megasonic oscillation is perpendicular to the substrate surface the water intermediate route acts.