DE102007029445A1 - Hierarchically structured films and membranes manufacturing method, involves applying and coating printed fluid structures on substrate with lining fluid, and hardening lining fluid and/or vaporized volatile components - Google Patents
Hierarchically structured films and membranes manufacturing method, involves applying and coating printed fluid structures on substrate with lining fluid, and hardening lining fluid and/or vaporized volatile components Download PDFInfo
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- DE102007029445A1 DE102007029445A1 DE200710029445 DE102007029445A DE102007029445A1 DE 102007029445 A1 DE102007029445 A1 DE 102007029445A1 DE 200710029445 DE200710029445 DE 200710029445 DE 102007029445 A DE102007029445 A DE 102007029445A DE 102007029445 A1 DE102007029445 A1 DE 102007029445A1
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- membranes
- hierarchically structured
- structured films
- liquid
- substrate
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- 239000000758 substrate Substances 0.000 title claims abstract description 38
- 239000012528 membrane Substances 0.000 title claims description 72
- 239000011248 coating agent Substances 0.000 title claims description 20
- 238000000576 coating method Methods 0.000 title claims description 20
- 239000012530 fluid Substances 0.000 title abstract description 12
- 238000004519 manufacturing process Methods 0.000 title description 14
- 238000000034 method Methods 0.000 claims abstract description 58
- 239000002245 particle Substances 0.000 claims abstract description 39
- 229920000642 polymer Polymers 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000007639 printing Methods 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 53
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 24
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 19
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- 239000006185 dispersion Substances 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 7
- 238000007711 solidification Methods 0.000 claims description 6
- 230000008023 solidification Effects 0.000 claims description 6
- 238000004017 vitrification Methods 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 238000013270 controlled release Methods 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims 7
- 238000004090 dissolution Methods 0.000 claims 6
- 239000007787 solid Substances 0.000 claims 5
- 239000007795 chemical reaction product Substances 0.000 claims 3
- 239000007789 gas Substances 0.000 claims 3
- 239000008240 homogeneous mixture Substances 0.000 claims 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- 238000002425 crystallisation Methods 0.000 claims 2
- 230000008025 crystallization Effects 0.000 claims 2
- 239000008241 heterogeneous mixture Substances 0.000 claims 2
- 229910010272 inorganic material Inorganic materials 0.000 claims 2
- 239000011147 inorganic material Substances 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- 239000013543 active substance Substances 0.000 claims 1
- 238000004887 air purification Methods 0.000 claims 1
- 229910002113 barium titanate Inorganic materials 0.000 claims 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 claims 1
- 229910000019 calcium carbonate Inorganic materials 0.000 claims 1
- 238000009295 crossflow filtration Methods 0.000 claims 1
- 238000007598 dipping method Methods 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910003480 inorganic solid Inorganic materials 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 238000006068 polycondensation reaction Methods 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 238000011146 sterile filtration Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
- 239000000741 silica gel Substances 0.000 abstract description 7
- 229910002027 silica gel Inorganic materials 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 28
- 239000011148 porous material Substances 0.000 description 22
- 229920006254 polymer film Polymers 0.000 description 20
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 12
- 239000004793 Polystyrene Substances 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 8
- 238000005266 casting Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000009736 wetting Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000012982 microporous membrane Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920005597 polymer membrane Polymers 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 238000011001 backwashing Methods 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/00158—Diaphragms, membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0023—Organic membrane manufacture by inducing porosity into non porous precursor membranes
- B01D67/0032—Organic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/08—Patterned membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/10—Microfilters, e.g. for gas or fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Die Neuerung bezieht sich auf hierarchisch strukturierte Filme und Membranen, ein Verfahren zu ihrer Herstellung und ihre Verwendung. Strukturierte Filme und Membranen können vielfältig eingesetzt werden, z. B. als Bestandteil von Mikroreaktionssystemen, zur kontrollierten Freisetzung von Wirkstoffen, als Stempel oder als Master zur Herstellung von Stempeln, als Filtrationsmedien, als Lochmaske bei lithographischen Prozessen oder als Komponenten optischer Systeme, wie Linsen, Mattierungsschichten, Abschwächer oder Defraktionsfilter.The Innovation relates to hierarchically structured films and membranes, a process for their preparation and their use. Structured films and membranes can be used in a variety of ways z. B. as part of microreaction systems, the controlled Release of active ingredients, as a stamp or as a master for the production of punches, as filtration media, as a shadow mask in lithographic Processes or as components of optical systems, such as lenses, matting layers, Attenuator or defraction filter.
Sie stellen zu bekannten Systemen eine technisch effiziente und preisgünstige Alternative dar.she make known systems a technically efficient and inexpensive Alternative dar.
Stand der TechnikState of the art
Poröse
Materialien spielen in der Technik eine bedeutende Rolle als Filtermedien.
Herkömmliche Filtermedien bestehen aus einer porösen
Schicht bei der die Porendurchmesser in der Größe
stark variieren. Dies vermindert die Trennschärfe dieser
Filtermedien bedeutend. Weiterhin beträgt die Dicke der
herkömmlichen Filtermedien ein Vielfaches der Porendurchmesser.
Dies verleiht den Filtermedien zwar die für den Filtrationsprozess
nötige mechanische Stabilität, allerdings wird
durch die Länge der Poren und die in den Membranen vorhandenen
komplexen Pfade der Strömungswiderstand erhöht
und der Fluss somit vermindert. Seit einigen Jahren stehen den konventionellen
Filtermedien die Mikrosiebe, beschrieben von
Bei
Cees J. M. van Rijn werden sowohl die Poren als auch die Stützstrukturen
bzw. mikrofluidische Kanäle durch mehrstufige Lithographie
erzeugt. Ein Nachteil der durch Lithographie dargestellten Mikrosiebe
ist ihre sowohl zeitlich als auch apparativ aufwendige Herstellung.
Außerdem ist die Größe der lithographisch
erzeugten Mikrosiebe auf wenige Quadratzentimeter beschränkt.
Ultradünne Polymerfilme mit Poren einheitlicher Größe
können auf einfache Weise nach dem Prinzip der partikel-assistierten Benetzung erzeugt
werden,
Es war demnach von Interesse, eine Methode zu entwickeln, bei der ein poröser Polymerfilm durch Partikel-assistierte Benetzung erzeugt wird und in einem Zuge die notwendige Stützstruktur durch die Einlagerung von Flüssigkeitsstrukturen aufgebaut wird, jedoch die Form und Dimension der Stützstruktur über die o. g. Limitierungen hinaus variiert werden können.It was therefore of interest to develop a method in which a porous polymer film through particle-assisted wetting is generated and in one go through the necessary support structure the incorporation of liquid structures is built up, however, the shape and dimension of the support structure over the o. g. Limitations can be varied.
Als weiterer technologischer Hintergrund werden die folgenden Schriften angeführt.When Further technological background will be the following writings cited.
Der in den Hauptansprüchen angegebenen Erfindung liegt damit das Problem zugrunde, ein Verfahren zu entwickeln, bei der ein poröser Polymerfilm durch partikelassistierte Benetzung erzeugt wird und in einem Zuge die notwendige Stützstruktur durch die Einlagerung von Flüssigkeitsstrukturen aufgebaut wird, jedoch die Form und Dimension der Stützstruktur über die o. g. Limitierungen hinaus variiert werden können.Of the claimed in the main claims invention is thus the problem underlying a method of developing a porous Polymer film is produced by particle assisted wetting and in a train the necessary support structure by the storage is constructed of liquid structures, but the shape and dimension of the support structure over the o. g. Limitations can be varied.
Dieses Problem wird durch die in den Hauptansprüchen angegebenen Merkmale gelöst, insbesondere dadurch, dass die die Stützstruktur erzeugenden Strukturen aus einer Flüssigkeit mit einem InkJet-Drucker aufgebracht werden.This Problem is indicated by the in the main claims Characteristics solved, in particular by the fact that the support structure generating structures from a liquid with a Inkjet printers are applied.
Bei Versuchen, Wassertropfen kontrolliert durch einen InkJet-Drucker auf eine Oberfläche aufzubringen, anschließend mit einer Dispersion von Partikeln in einer Lösung eines nicht flüchtigen Polymers in einem flüchtigen Lösungsmittel zu überschichten, das System durch Verflüchtigen des Lösungsmittels zu verfestigen und anschließend die Partikel zu entfernen, konnten durch die kontrolliert aufgedruckten Tropfen erstmals Stützstrukturen mit über 20 μm großen Hohlräumen erzeugt und mit mikrosiebartigen Bereiche kombiniert werden. Darüber hinaus konnten erstmals Hohlräume mit Geometrien, die über die Form einfacher Kugelsegmente hinausgingen, hergestellt werden.at Try water drops controlled by an inkjet printer to apply to a surface, then with a dispersion of particles in a solution of a non-volatile polymer in a volatile Solvent to overflow the system Volatilize the solvent to solidify and then the particles could be removed by For the first time the controlled printed droplets support structures with cavities larger than 20 μm generated and combined with mikrosiebartigen areas. Furthermore were first able to create cavities with geometries over the shape of simple ball segments went out to be made.
Die Erfindung soll nachfolgend an bevorzugten Ausführungsbeispielen näher erläutert werden.The Invention is intended below to preferred embodiments be explained in more detail.
Mit einem InkJet-Drucker werden Wassertropfen mit regelmäßiger Anordnung auf eine hydrophobierte Metalloberfläche gedruckt. Die Wassertropfen werden unmittelbar im Anschluss an den Druckprozess mit einer Lösung von Partikeln und Polymer in einem Lösungsmittel überschichtet. Das Erstarren des Polymers erfolgt durch Verdunsten des Lösungsmittels.With An inkjet printer will be water droplets with regular Arrangement printed on a hydrophobized metal surface. The drops of water are immediately after the printing process covered with a solution of particles and polymer in a solvent. The solidification of the polymer takes place by evaporation of the solvent.
Die zugehörigen Zeichnungen/Abbildungen zeigen:The accompanying drawings / illustrations show:
- 11
- InkJet-DruckerInkJet Printer
- 22
- Zu druckende FlüssigkeitTo printing fluid
- 33
- Substratsubstratum
- 44
- Gedruckte Flüssigkeitsstrukturenprinted liquid structures
- 55
- Beschichtungsflüssigkeitcoating liquid
- 66
- Kieselgelpartikelsilica gel
- 77
- Nichtflüchtige Komponente (Polymer [Polymethylmethacrylat])nonvolatile Component (polymer [polymethylmethacrylate])
- 88th
- Flüchtige Komponente (Lösungsmittel [Chloroform])fugitive Component (solvent [chloroform])
- 99
- Hierarchisch strukturierter Film und Membranhierarchic structured film and membrane
- 1010
- Mikrometergroße ÖffnungenMicrometer-sized openings
- 1111
- Submikrometergroße Porensubmicron pore
- AA
- Drucken der FlüssigkeitsstrukturenTo Print the fluid structures
- A_2 bis A_nA_2 until
- Drucken der Flüssigkeitsstrukturen der zweiten bzw. n'ten LageTo Print the liquid structures of the second or n'ten position
- BB
- Auftragen und Überschichten mit einer BeschichtungsflüssigkeitInstruct and overlaying with a coating liquid
- B_2 bis B_nB_2 to B_n
- Auftragen und Überschichten mit einer Beschichtungsflüssigkeit der zweiten bzw. n'ten LageInstruct and overlaying with a coating liquid the second or nth position
- CC
- Aushärten/VerglasenCuring / vitrification
- C_2 bis C_nC_2 to C_n
- Aushärten/Verglasen der zweiten bzw. n'ten LageCuring / vitrification the second or nth position
- DD
- Entfernen der FlüssigkeitsstrukturenRemove the fluid structures
- Ee
- Entfernen der PartikelRemove the particle
- FF
- Entfernen des SubstratesRemove of the substrate
Das
Verfahrensgrundprinzip ist in
Eine Aluminiumfolie wird in der Gasphase mit 1,1,1,3,3,3-Hexamethyldisilazan
hydrophobiert und bildet das Substrat (
An aluminum foil is rendered hydrophobic in the gas phase with 1,1,1,3,3,3-hexamethyldisilazane and forms the substrate (
Der
hierarchisch strukturierte Polymerfilm (
Darstellung einer zweiseitig stabilisierten porösen Membran mit hierarchischer StrukturIllustration of a two-sided stabilized porous membrane with hierarchical structure
In
Ausführungsbeispiel:Embodiment:
Eine
Aluminiumfolie wird in der Gasphase mit 1,1,1,3,3,3-Hexamethyldisilazan
hydrophobiert und bildet das Substrat (
Darstellung einer dreidimensionalen porösen Membran mit hierarchischer StrukturIllustration of a three-dimensional porous membrane with hierarchical structure
In
Ausführungsbeispiel:Embodiment:
Eine
Aluminiumfolie wird in der Gasphase mit 1,1,1,3,3,3-Hexamethyldisilazan
hydrophobiert und bildet das Substrat (
ZITATE ENTHALTEN IN DER BESCHREIBUNGQUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.
Zitierte PatentliteraturCited patent literature
- - DE 000010058258 B4 [0004] - DE 000010058258 B4 [0004]
- - DE 102006036863 A1 [0004] - DE 102006036863 A1 [0004]
- - GB 2379083 A [0007] GB 2379083 A [0007]
- - EP 1446234 B1 [0008] - EP 1446234 B1 [0008]
- - EP 1710021 A1 [0009] - EP 1710021 A1 [0009]
- - EP 1372973 B1 [0010] - EP 1372973 B1 [0010]
- - WO 99/41086 A1 [0011] WO 99/41086 A1 [0011]
- - DD 238467 A1 [0012] - DD 238467 A1 [0012]
- - DE 1810679 [0013] DE 1810679 [0013]
- - DE 3704546 C2 [0014] - DE 3704546 C2 [0014]
- - DE 69012925 T2 [0015] - DE 69012925 T2 [0015]
- - DE 69534208 T2 [0016] - DE 69534208 T2 [0016]
- - EP 1194216 B1 [0017] - EP 1194216 B1 [0017]
- - WO 93/23153 A1 [0018] WO 93/23153 A1 [0018]
- - WO 95/13860 A1 [0019] WO 95/13860 A1 [0019]
- - DD 142659 [0020] - DD 142659 [0020]
- - DD 153580 [0021] - DD 153580 [0021]
- - DD 296637 [0022] - DD 296637 [0022]
- - DE 3809523 A1 [0023] - DE 3809523 A1 [0023]
- - DE 4229477 A1 [0024] - DE 4229477 A1 [0024]
- - DE 19912582 A1 [0025] - DE 19912582 A1 [0025]
- - DE 102005011544 A1 [0026] DE 102005011544 A1 [0026]
- - EP 007750981 [0027] - EP 007750981 [0027]
- - EP 0241995 B1 [0028] EP 0241995 B1 [0028]
Zitierte Nicht-PatentliteraturCited non-patent literature
- - Cees J. M. van Rijn, Nanotechnology 1998, 9, 343–345 [0003] - Cees JM van Rijn, Nanotechnology 1998, 9, 343-345 [0003]
- - Cees J. M. van Rijn Nano and Mikro Engineered Membrane Technology, Membrane Science and Technology Series, 10, 2003, 137–148 [0003] - Cees JM van Rijn Nano and Micro Engineered Membrane Technology, Membrane Science and Technology Series, 10, 2003, 137-148 [0003]
- - H. Xu, F. Yan, P. Tierno, D. Marczewski, W. A. Goedel, J. Phys.: Condens. Matter 2005, 17, 465–476 [0004] H. Xu, F. Yan, P. Tierno, D. Marczewski, WA Goedel, J. Phys. Condens. Matter 2005, 17, 465-476 [0004]
- - U. H. F. Bunz, Adv. Mater, 2006, 18, 973–989 [0004] - UHF Bunz, Adv. Mater, 2006, 18, 973-989 [0004]
- - W. Stöber, A. Fink, E. Bohn, J. Colloid Interface Sci. 1968, 26, 62–69., A. P. Philipse, A. Vrij, J. Colloid Interface Sci. 1989, 128, 121–136. [0038] W. Stober, A. Fink, E. Bohn, J. Colloid Interface Sci. 1968, 26, 62-69., AP Philipse, A. Vrij, J. Colloid Interface Sci. 1989, 128, 121-136. [0038]
Claims (26)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200710029445 DE102007029445A1 (en) | 2007-06-22 | 2007-06-22 | Hierarchically structured films and membranes manufacturing method, involves applying and coating printed fluid structures on substrate with lining fluid, and hardening lining fluid and/or vaporized volatile components |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200710029445 DE102007029445A1 (en) | 2007-06-22 | 2007-06-22 | Hierarchically structured films and membranes manufacturing method, involves applying and coating printed fluid structures on substrate with lining fluid, and hardening lining fluid and/or vaporized volatile components |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2009131517A1 (en) * | 2008-04-22 | 2009-10-29 | Sarunas Petronis | Manufacturing of nanopores |
| DE102009006064A1 (en) * | 2009-01-26 | 2010-08-26 | Technische Universität Chemnitz | Producing a microstructured film, comprises hardening a film-forming substance with pore inducer and/or pores partially embedded in the film-forming substance, and structurally applying a supporting substance on the film-forming substance |
| DE102011010899A1 (en) * | 2011-02-04 | 2012-08-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method of creating a three-dimensional structure and three-dimensional structure |
| WO2016066505A1 (en) * | 2014-10-31 | 2016-05-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Component based on a structurable substrate with a membrane structure having three-dimensional pores in the nm range and semiconductor technology method for manufacturing same |
| EP3284714A1 (en) * | 2016-08-19 | 2018-02-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing a cavity with porose structure |
| DE102016124682A1 (en) | 2016-12-16 | 2018-06-21 | Technische Universität Chemnitz | Method for printing on a liquid surface |
| DE102017130947A1 (en) * | 2017-12-21 | 2019-06-27 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Method for producing a microsystem component |
| US10854223B2 (en) | 2016-08-19 | 2020-12-01 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method of producing a magnetic structure |
| US11417448B2 (en) | 2014-12-16 | 2022-08-16 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method for manufacturing a device having a three-dimensional magnetic structure |
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Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009131517A1 (en) * | 2008-04-22 | 2009-10-29 | Sarunas Petronis | Manufacturing of nanopores |
| US8431034B2 (en) | 2008-04-22 | 2013-04-30 | Sarunas Petronis | Manufacturing of nanopores |
| DE102009006064A1 (en) * | 2009-01-26 | 2010-08-26 | Technische Universität Chemnitz | Producing a microstructured film, comprises hardening a film-forming substance with pore inducer and/or pores partially embedded in the film-forming substance, and structurally applying a supporting substance on the film-forming substance |
| DE102009006064B4 (en) * | 2009-01-26 | 2013-04-11 | Technische Universität Chemnitz | Process for producing a microstructured film |
| DE102011010899A1 (en) * | 2011-02-04 | 2012-08-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method of creating a three-dimensional structure and three-dimensional structure |
| US9221217B2 (en) | 2011-02-04 | 2015-12-29 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method for producing a three-dimensional structure and three-dimensional structure |
| DE102015101425B4 (en) * | 2014-10-31 | 2018-02-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Process for producing a component based on a structurable substrate with a three-dimensional membrane structure having pores in the nm range |
| CN107001029A (en) * | 2014-10-31 | 2017-08-01 | 弗劳恩霍夫应用研究促进协会 | Had based on structured substrate with the structural detail of the three-dimensional membrane structure of pore in nanometer range and manufacture its semiconductor technology method |
| WO2016066505A1 (en) * | 2014-10-31 | 2016-05-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Component based on a structurable substrate with a membrane structure having three-dimensional pores in the nm range and semiconductor technology method for manufacturing same |
| US11417448B2 (en) | 2014-12-16 | 2022-08-16 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method for manufacturing a device having a three-dimensional magnetic structure |
| EP3284714A1 (en) * | 2016-08-19 | 2018-02-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing a cavity with porose structure |
| US10854223B2 (en) | 2016-08-19 | 2020-12-01 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method of producing a magnetic structure |
| US11268122B2 (en) | 2016-08-19 | 2022-03-08 | Fraunhofer-Gesellschaft zur Foerderung der anaewandten Forschunq e.V. | Method of producing a cavity having a porous structure |
| DE102016124682A1 (en) | 2016-12-16 | 2018-06-21 | Technische Universität Chemnitz | Method for printing on a liquid surface |
| DE102017130947A1 (en) * | 2017-12-21 | 2019-06-27 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Method for producing a microsystem component |
| DE102017130947B4 (en) | 2017-12-21 | 2020-06-18 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Method for producing a microsystem component |
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