DE102007018800A1 - Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage - Google Patents
Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage Download PDFInfo
- Publication number
- DE102007018800A1 DE102007018800A1 DE102007018800A DE102007018800A DE102007018800A1 DE 102007018800 A1 DE102007018800 A1 DE 102007018800A1 DE 102007018800 A DE102007018800 A DE 102007018800A DE 102007018800 A DE102007018800 A DE 102007018800A DE 102007018800 A1 DE102007018800 A1 DE 102007018800A1
- Authority
- DE
- Germany
- Prior art keywords
- electronic component
- organic semiconductor
- charge
- layer
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000012212 insulator Substances 0.000 title claims abstract description 19
- 239000004065 semiconductor Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 33
- 239000002800 charge carrier Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 17
- 238000002347 injection Methods 0.000 claims description 14
- 239000007924 injection Substances 0.000 claims description 14
- 230000015556 catabolic process Effects 0.000 claims description 10
- 230000005669 field effect Effects 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 6
- 230000000903 blocking effect Effects 0.000 claims description 4
- -1 polyindenofluorenes Polymers 0.000 claims description 3
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 claims description 2
- 229910003472 fullerene Inorganic materials 0.000 claims description 2
- 239000002094 self assembled monolayer Substances 0.000 claims 3
- 229920001577 copolymer Polymers 0.000 claims 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 claims 1
- 229920002098 polyfluorene Polymers 0.000 claims 1
- 229920000123 polythiophene Polymers 0.000 claims 1
- 239000012044 organic layer Substances 0.000 description 14
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 230000037230 mobility Effects 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000295 complement effect Effects 0.000 description 4
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004770 highest occupied molecular orbital Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000009396 hybridization Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/481—Insulated gate field-effect transistors [IGFETs] characterised by the gate conductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/491—Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/311—Phthalocyanine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/623—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing five rings, e.g. pentacene
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
Stand der TechnikState of the art
Die
vorliegende Erfindung betrifft einen ein elektronisches Bauelement
auf der Basis organischer Halbleiter, insbesondere einen organischen
Feldeffekttransistor (OFET). OFETs sind in verschiedenen Bauformen und
auf der Basis verschiedener organischer Halbleiter bekannt. Prinzipiell
bildet ein organischer Halbleiter einen Kanal zwischen Drain- und
Source-Elektrode, welcher durch einen Gate-Isolator von der von
der Gate-Elektrode getrennt ist. Durch das Anlegen einer Spannung
an die Gate-Elektrode kann die Leitfähigkeit des Kanals,
der sich zwischen Drain- und Source-Elektrode an der Grenzfläche
zum Gate-Isolator befindet, kapazitiv moduliert werden. Ein Überblick über
herkömmliche OFETs findet sich beispielsweise in
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, die Transfercharakteristik und das Schaltverhalten von OFETs zu verbessern.Of the The present invention is based on the object, the transfer characteristic and to improve the switching behavior of OFETs.
Vorteile der ErfindungAdvantages of the invention
Das elektronische Bauelement auf der Basis organischer Halbleiter, insbesondere OFET, mit den kennzeichnenden Merkmalen des Anspruchs 1 hat den Vorteil eines verbesserten Schaltverhaltens im Vergleich zu konventionellen OFETs.The electronic component based on organic semiconductors, in particular OFET, with the characterizing features of claim 1 has the Advantage of an improved switching behavior compared to conventional OFETs.
Die Gate-Spannung ermöglicht es zwischen einem „OFF-Zustand", bei dem der Source-Drain-Strom durch den Sperrstrom einer Diode gegeben ist, und einem „ON-Zustand", bei dem der Strom durch einen lawinenartigen Durchbruch gegeben ist, zu schalten. Der Source-Drain-Strom kann dabei über mehrere Größenordnungen variiert werden und es kann ein sehr steiles Schaltverhalten als Funktion der Gate-Spannung erreicht werden. Das erfindungsgemäße elektronische Bauelement auf der Basis organischer Halbleiter kann insbesondere zur Herstellung von Schaltkreisen auf der Basis komplementärer Logik genutzt werden.The Gate voltage allows between an "OFF state", wherein the source-drain current through the reverse current of a diode is given, and an "ON state" in which the current given by an avalanche-like breakthrough, to switch. The source-drain current can be over several orders of magnitude can be varied and it can be a very steep switching behavior than Function of the gate voltage can be achieved. The invention Electronic component based on organic semiconductors can in particular for the manufacture of circuits based on complementary Logic can be used.
Durch die in weiteren Ansprüchen aufgeführten Charakteristiken sind vorteilhafte Weiterbildungen des gattungsgemäßen OFETs möglich.By the characteristics listed in further claims are advantageous developments of the generic OFETs possible.
Zeichnungdrawing
Der erfindungsgemäße OFET und seine Vorteile werden anhand der Zeichnungen näher beschrieben. Es zeigen:Of the OFET according to the invention and its advantages described in more detail with reference to the drawings. Show it:
Ausführungsbeispieleembodiments
Eine
elektrisch isolierende Schicht (
Die
aktive organische Schicht (
Die
elektrischen Kontakte (
Die
elektrischen Kontakte (
Ein
wesentlicher bestimmender Faktor der Injektionseigenschaften von
Kontakten mit organischen Materialien ist der „Interface-Offset".
Dieses „Interface-Offset" wird wesentlich durch die Eigenschaften
der beteiligten Schichten, also der aktiven organischen Schicht
(
Zur
Löcher-Injektion können insbesondere Materialien
mit hoher Austrittsarbeit wie Platin, Palladium, Gold, Indium-Zinnoxid
oder Titannitrid verwendet werden. Für den Fachmann ist
unmittelbar erkennbar, dass durch die Verwendung von geeigneten
Pufferschichten eine Verbesserung der Injektionseigenschaften erzielt werden
kann. Es ist insbesondere vorteilhaft, wenn die Ladungsträger-injizierenden
Kontakte (
Typische Kontaktmaterialien zur Elektronen-Injektion weisen eine niedrige Austrittsarbeit auf, wie beispielsweise Aluminium, Kalzium, Magnesium, Cäsium. Barium, Alkalifluoride, Erdalkalifluoride oder -oxide. Weitere Materialien sind dem Fachmann aus dem Stand der Technik bekannt.typical Contact materials for electron injection have a low Work function such as aluminum, calcium, magnesium, Cesium. Barium, alkali fluorides, alkaline earth fluorides or oxides. Other materials are the expert from the prior Technique known.
Zur
Ausbildung eines Sperrkontaktes für einen Ladungsträgertyps
kann es vorteilhaft sein, dass die aktive organische Schicht (
Zusätzlich
ergeben sich weitere Möglichkeiten der Modifikation der
Injektions-Eigenschaften der Kontakte (
Ohne
angelegte Gate-Spannung, d. h. im „Off-Zustand", weist
der Kanal eine diodenartige Charakteristik auf, wobei dieser vorteilhafterweise
in Sperr-Richtung betrieben wird. Folglich fließt zwischen
Source-(
Für
den Fachmann ist unmittelbar erkennbar, dass auch von in
Wie
aus
Folglich ist es möglich, die Beweglichkeit der Ladungsträger μ im organischen Halbleiter als Funktion der Feldstärke E über den folgenden Zusammenhang zu bestimmen: Consequently, it is possible to determine the mobility of the charge carriers μ in the organic semiconductor as a function of the field strength E via the following relationship:
Dem Fachmann ist unmittelbar ersichtlich, dass der erfindungsgemäße OFET die Basis für Schaltkreise mit komplementärer Logik bilden kann. Insbesondere können aus zwei erfindungsgemäßen OFETs mit n-Typ- bzw. p-Typ-Verhalten Inverter-Schaltkreise gebildet werden, welche wiederum Bestandteil komplexerer Schaltungen sein können. Hierbei ist insbesondere zu beachten, dass wie in Tabelle 1 gezeigt, verschiedene Materialien sowohl p-Typ als auch n-Typ OFETs bilden können. Des Weiteren ist unmittelbar ersichtlich, dass der erfindungsgemäße OFET den elementaren Teil von Halbleiterspeicherzellen bilden kann.the One skilled in the art will readily appreciate that the invention OFET the basis for circuits with complementary Can form logic. In particular, from two inventive OFETs with n-type or p-type behavior formed inverter circuits which, in turn, be part of more complex circuits can. It should be noted in particular that how shown in Table 1, various materials both p-type and can also form n-type OFETs. Furthermore, it is immediate it can be seen that the invention OFET the form elementary part of semiconductor memory cells.
Es versteht sich, dass die vorstehende Beschreibung lediglich illustrativ für die Erfindung ist. Verschiedene Alternativen und Modifikationen können durch einen Fachmann ohne Abweichung von der Erfindung in Betracht gezogen werden. Demgemäß ist die vorliegende Erfindung so gedacht, dass sie alle derartigen Alternativen, Modifikationen und Variationen umfasst, die in den Umfang der beigefügten Ansprüche fallen.It It should be understood that the foregoing description is illustrative only for the invention. Various alternatives and modifications can be done by a professional without departing from the invention be considered. Accordingly, the present Invention is thought to contain all such alternatives, modifications and variations included within the scope of the appended claims Claims fall.
ZITATE ENTHALTEN IN DER BESCHREIBUNGQUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.
Zitierte Nicht-PatentliteraturCited non-patent literature
- - „Organic Thin Film Transistors" von Colin Reese, Marc Roberts, Mang-mang Lin und Zhenan Bao in Materials Today, S. 20–27, September 2004 [0001] "Organic Thin Film Transistors" by Colin Reese, Marc Roberts, Mang Mang Lin and Zhenan Bao in Materials Today, pp. 20-27, September 2004 [0001]
Claims (34)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007018800A DE102007018800A1 (en) | 2007-04-20 | 2007-04-20 | Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007018800A DE102007018800A1 (en) | 2007-04-20 | 2007-04-20 | Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102007018800A1 true DE102007018800A1 (en) | 2008-10-23 |
Family
ID=39767954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102007018800A Withdrawn DE102007018800A1 (en) | 2007-04-20 | 2007-04-20 | Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE102007018800A1 (en) |
-
2007
- 2007-04-20 DE DE102007018800A patent/DE102007018800A1/en not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| "Organic Thin Film Transistors" von Colin Reese, Marc Roberts, Mang-mang Lin und Zhenan Bao in Materials Today, S. 20-27, September 2004 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE112009000736B4 (en) | ORGANIC THIN FILM TRANSISTORS AND METHOD FOR THE PRODUCTION THEREOF | |
| DE10250868B4 (en) | Vertically integrated field effect transistor, field effect transistor arrangement and method for producing a vertically integrated field effect transistor | |
| DE112009001881T5 (en) | A method of fabricating organic thin film transistors using a laser induced thermal transfer printing process | |
| DE112008003420T5 (en) | Organic thin film transistors, active matrix organic optical devices, and methods of making same | |
| DE112009001944T5 (en) | Surface treated substrates for top-gate organic thin-film transistors | |
| DE112010001651T5 (en) | Process for producing an organic thin film transistor | |
| DE602004005824T2 (en) | ELECTRONIC DEVICE | |
| DE112008003235T5 (en) | Organic thin film transistors and methods of making the same | |
| DE10228772A1 (en) | Reduction of the contact resistance in organic field effect transistors with palladium contacts by using nitriles and isonitriles | |
| DE10160732A1 (en) | OFET used e.g. in RFID tag, comprises an intermediate layer on an active semiconductor layer | |
| DE102012200896A1 (en) | Electronic component | |
| EP1743389A2 (en) | Ultra-thin dielectric and use thereof in organic field-effect transistors | |
| DE112010000849T5 (en) | Method of forming source and drain electrodes of organic thin film transistors by electroless plating | |
| CN1674320B (en) | Organic field-effect transistor, and a method of manufacturing the organic field-effect transistor and flat panel display device including the same | |
| DE102008036063B4 (en) | Organic field effect transistor | |
| DE10226370B4 (en) | Substrate for an electronic component, use of the substrate, methods for increasing the charge carrier mobility and organic field effect transistor (OFET) | |
| DE102007018800A1 (en) | Electronic component i.e. organic FET, for inverter, has transistor channel with part that is controlled in boundary layer and insulator, where source-drain current between off and on conditions is controlled over dimensions by gate voltage | |
| DE10212878B4 (en) | Semiconductor circuit arrangement and semiconductor memory device | |
| US9865830B2 (en) | Organic thin film transistor, method for manufacturing the same and method for recoverying insulation thereof | |
| EP1580822A1 (en) | Organic field-effect-transistor and method for its production | |
| EP4282007A1 (en) | High electron mobility transistor (hemt), transistor arrangement, method of controlling an hemt and method of producing an hemt | |
| DE102007002965A1 (en) | Capacitive structure producing method for use in drift zone of e.g. n-channel MOSFET, involves separating individual silicon grains from surface of trench and producing dielectric layer on silicon grains in between separated silicon grains | |
| DE202005009260U1 (en) | Organic field effect transistor useful in electronic circuits comprises an organic semiconductor doped to increase its conductivity and a gate electrode in Schottky contact with the organic semiconductor | |
| DE112011103249B4 (en) | A gate-stack semiconductor device and a method of manufacturing the same, and the use of a gate-stack structure in a semiconductor device | |
| DE112018001069B4 (en) | Method of forming a semiconductor unit and a semiconductor unit |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8122 | Nonbinding interest in granting licences declared | ||
| 8139 | Disposal/non-payment of the annual fee |