DE102005002836A1 - Method for producing flat electro-optical element, involves preparation of substrate, application of first electrode layer whereby at least one functional layer is applied along with a second electrode layer - Google Patents

Abstract

For cost-effective and simple production of a planar electro-optical element which has a functional surface with a defined, in particular a homogeneous distribution of functionality, the invention provides a method, comprising providing a substrate, applying a first electrode layer, applying at least one functional layer , the application of a second electrode layer and the application of at least one resistance matching layer, which has an electrical resistance perpendicular to the layer plane, which varies in at least one horizontal direction along the layer plane. DOLLAR A Furthermore, the invention proposes a method for producing a coated substrate for producing an electro-optical element. DOLLAR A Further, the invention comprises a correspondingly produced electro-optical element, a coated substrate and the use of a coated substrate for producing an electro-optical element and the use of an electro-optical element.

Description

The The invention relates generally to planar or at least in some areas planar electro-optical elements, and in particular planar electro-optical elements with a predetermined distribution of functionality, in particular one over the functional area uniform Functionality distribution, and a substrate and a method for the production thereof.

Electro-optical Elements can be varied use, such as photovoltaic elements, electrochromic Elements, liquid crystal elements or optoelectronic sensors. A particularly interesting application are also organic, electro-optical elements, in particular organic light-emitting diodes.

Of the electrochromic effect is based on that when moving the electrical charge within a functional layer composite by applying a suitable voltage, the optical properties of Composite, such as the transmittance, change. This Effect is for example for electrically dimming rearview mirror used in the automotive industry or for large-scale display panels. Increasingly are also used in buildings to control solar radiation instead of blinds, roller blinds or awnings Switchable glazings based on electrochromic layers used.

Photovoltaic elements typically use appropriately doped semiconductors in order to striking an area To convert light radiation into electricity. These elements have as Solar cells were widely used.

For the sensors Various electro-optical effects can be used. So can be a layer system that emits light depending on the voltage is registered by an underlying array of photodiodes, be used for example for fingerprint recognition. Far are also widespread based on photovoltaic reactions CMOS or CCD sensors such as those found in digital cameras Find use.

One particularly interesting field of application is that of organic, electro-optical Elements. Organic, electro-optical elements, in particular organic Light-emitting diodes (OLEDs) usually consist of two electrode layers with interposed organic layers that at least include an organic electroluminescent phosphor. The Layers are applied to a substrate (Substrate), which is typically transparent. Preferably find for this purpose glass substrates use. Thus light substrate side must be emitted from the component, which faces the substrate Electrode, typically the anode, are also made transparent. As materials are usually semiconductor layers with high Conductivity, such as. transparent conductive Oxides (TCO), in particular ITO (indium tin oxide) used. OLEDs are current driven devices, i. during operation, a defined flows Current through the electrode layers and leads to lateral potential differences, due to the finite ohmic resistances of the electrode layers. The cross-current between the electrode layers, the organic Luminescent layers flows through, leads to Light generation, which is proportional to the current density. Local differences in the current density lead therefore to locally different light emission.

For lighting or lighting elements are flat large-area light sources with uniform or predetermined luminance distribution required. Typically, these can Components are contacted only in the edge zone. The conductivity the currently known best materials for the formation of transparent electrode layers however, is not sufficient to cover the electrode layers as equipotential surfaces in device design consider to be able to. The significant local resistance of the electrodes causes voltage drops in the Electrode layers leading to different voltage differences lead between the electrode layers. With that arise, of Outside not controllable, different local current densities across the Luminescent layers, which are locally different luminance to lead. The bigger the luminous areas are the stronger the unwanted ones form inhomogeneities the luminance distribution.

Desirable would be therefore Electrodes with as possible small surface resistances, the compared to the resistors the organic layers as equipotential layers could be considered. In this case would result an OLED device, which in the case of uniform execution of the functional layers uniform light would emit. Furthermore would that be Ohmic losses of current flow in the electrodes accordingly low. This is for the cathode, which is typically designed as a metal layer, largely fulfilled. The transparent layer, however, deviates significantly from the ideal state from.

Accordingly was trying to get the surface resistances of the Electrode layers through a greater thickness of the layers too to reduce. Typical ITO layers used as anodes in OLEDs have layer thicknesses of about 100 nm and surface resistances of 10-20 ohms. An increase in the Layer thickness leads usually to increase the absorption losses in the transparent electrode layer and thus reducing the emitted light. You can continue For thicker ITO layers, set up interference structures that also to intensity reductions or to local inhomogeneities due to variations in the Cause interference effect can. The deposition of thicker layers also leads to an extension the process times and thus to an increase in component manufacturing costs.

It Attempts have also been made to improve the conductivity of the transparent electrode layer to increase in another way. However, leads a sufficient increase the conductivity always to a significant increase the absorption losses in the transparent electrode layer and thus a significant reduction of the emitted light. In order to results in an unacceptable efficiency of the component or a unacceptable power consumption to achieve a desired Light intensity.

From WO 00/17911 A1 it is known to reduce the sheet resistance of the electrodes by means of conductive transparent additional layers. However, such additional layers increase the production costs and thus the costs. Another disadvantage is that this measure is only suitable for improving the uniformity of the luminance distribution of a given component. As soon as the luminous area is increased or the luminous intensity as a whole is increased, larger inhomogeneities again arise due to the resulting voltage drops in the electrodes. The additional layers themselves must not show any significant absorption in the visible spectrum EP 969517 A1 It is known to reduce the sheet resistance of the electrodes by additional coating with a close-meshed metal grid. A disadvantage of this approach is, in turn, the significantly increased by the additional coating manufacturing costs and thus increased costs for the OLED component. In addition, the metal grid can significantly affect other OLED device fabrication processes. For example, shadows may form in PVD coatings or streaks or grooves in liquid phase coatings, for example by spin coating or dip coating. Also, the risk of short circuits between the electrodes and thus the total destruction of the components increase. Furthermore, the lattice structure forms dark areas in the luminous area of the component, since no light is emitted directly under the lattice structure.

In EP 997058 A1 For improving the homogeneity of the luminance distribution, it is proposed to combine a transparent electrode and a metal electrode whose surface resistance ratio is about 1. Since the sheet resistance of the transparent electrode can be reduced only with a concomitant increase in light loss, the sheet resistance ratio is achieved by increasing the sheet resistance of the metal electrode. However, this leads to a significant increase of the inner line resistance of the device and the resulting ohmic losses by about a factor of 2.

In addition, the required operating voltage increases. In addition, the adjustment of the surface resistances only in very special Kontaktierungskonfigurationen has a reducing effect on the luminance inhomogeneity, with symmetrical wiring of the component, the resistance ratio has no influence. Furthermore, the inhomogeneities can be adjusted by matched anode and cathode resistances according to the EP 997058 A1 on the contrary, they are still very pronounced for large components.

A more homogeneous luminance distribution can also be achieved by dividing the luminous area of the component into separate, small luminous areas. For example, an OLED constructed according to this principle is made US 6,515,417 B1 known. However, this solution increases the production costs and thus the costs for the OLED component considerably.

Of the The invention is therefore based on the problem of finding a way like a cost-effective and easy to manufacture, improved electro-optical element can be provided that has a functional area with a defined, in particular has a homogeneous, distribution of functionality.

This object is already achieved in a surprisingly simple manner by a method for the manufacture An electro-optical element according to claim 1, a method for producing a substrate according to claim 64, an electro-optical element according to claim 32, as well as a coated substrate according to claim 66. Furthermore, the object is achieved by a use according to the claims 69 and 70. Advantageous developments are the subject of the respective subclaims.

Accordingly includes the method according to the invention for producing an electro-optical element, providing a substrate, the application of a first electrode layer, the application of at least one functional layer, the application a second electrode layer, as well as applying at least a resistance matching layer, which is an electrical resistance perpendicular to the layer plane, in at least one horizontal Direction varies along the layer plane.

Especially advantageous is the process for producing an organic, electro-optical element, in particular an organic, light-emitting Diode, adapted. Therefor the application of the functional layer comprises at least the application a layer which is an organic electro-optic material having.

The method may also be adapted for producing an electrochromic element, such as an electrochromic window element or an electrochromic mirror, wherein the application of the functional layer comprises the application of at least one electrochromic layer. Suitable materials for the electrochromic layer are, for example, WO _x , NiO _x , VO _x or NbO _x .

Further The method may also include applying a photovoltaic layer Provide as a functional layer. Advantageously, the functional layer comprises furthermore at least one doped semiconductor layer, in particular a double-layer system with a p-doped and an n-doped semiconductor layer. Such functional layers can for producing various electro-optical elements, such as Photovoltaic elements or optoelectronic sensors used become.

By Insert an additional one locally varying resistance matching layer, for example With locally varying layer thickness or conductivity, can be easily Art given in a wide range of predetermined functionalities, especially uniform functionality distributions achieve. For this purpose, the resistance matching layer in principle at any point within the respective layer package to be ordered.

Especially the resistances the layers of an organic, electro-optical element are typically across the layer (typical 0.1 μm length dimension) less than the resistors along the layer (typical length dimension 100 μm), so that mainly only power line takes place across the layer.

Conveniently, For example, the method includes applying contact surfaces the first and the second electrode layer, preferably in the Edge regions of the layers, for tapping or applying an electrical Voltage between the electrode layers. Advantageous are the contact surfaces arranged in the edge regions of the electrode layers, for example the light entry or light emission through transparent electrode layers to enable.

Advantageous provides the method, a functional distribution of the functional area and a value for specify the operating voltage of the electro-optical element and apply the at least one resistance matching layer in such a way that the electro-optical element upon application of the predetermined operating voltage between the first and second electrode layers substantially the given functionality distribution having. In operation, the operating voltage of the given Value around approx. ± 10 %, without this being essential to the given distribution of functionality impaired.

Especially The method provides, advantageously, the at least one resistance matching layer in such a way muster that the light exit or light entry surface of the electro-optical element when applying a voltage between the first and the second electrode layer is a substantially uniform distribution of functionality having. Under a uniform distribution of functionality is one about the Functional surface, typically the light exit or light entry surface, in to understand the essential constant distribution of functionality. In the distribution of functionality For example, it may be advantageous for the luminance distribution a light-emitting element, the distribution of the transmittance an electrochromic element or the distribution of photosensitivity act.

Of the Resistance profile of the resistance matching layer to achieve a predetermined, in particular uniform, distribution of functionality depends on on the geometry of the electro-optical element, on the type of Contacting the electrode layers and optionally of the Operating parameters of the electro-optical element.

For simple Geometries of the electro-optical element, such as rectangular or oval geometries, in which in particular contacts along the opposite side Edges are provided, leaves the resistance profile of the resistance matching layer with Specify help for simple mathematical relationships.

So For example, the method can advantageously provide the resistance matching layer such that the resistance perpendicular to the layer plane at least at one point of the layer plane is minimal and in at least a horizontal direction from the at least one point along the layer substantially increases.

Especially Advantageously, the resistance of the resistance matching layer increases perpendicular to the layer plane of the at least one point with minimal Resistance to the edge of the layer is substantially square with the distance to.

ist, mit

A:

Uniformer Flächenwiderstand der als Anode vorgesehenen Elektrodenschicht,

K:

Uniformer Flächenwiderstand der als Kathode vorgesehenen Elektrodenschicht,

r:

Abstand entlang der Schichtebene zu einem ausgezeichneten Punkt oder einer ausgezeichneten Kurve in der Schichtebene, wobei in dem ausgezeichneten Punkt beziehungsweise entlang der ausgezeichneten Kurve der Widerstand der Widerstandsanpassungs-Schicht senkrecht zur Schichtebene minimal ist,

n:

Exponent mit n > 0, insbesondere mit n = 2,

m:

Relative Gewichtung der Elektrodenwiderstände, insbesondere mit m = 1.

For electrode layers with surface resistances uniform over the luminous area and certain, in particular symmetrical, geometries, the method advantageously provides for applying the resistive matching layer such that the resistance of the resistive matching layer has a course perpendicular to the layer plane in at least one horizontal direction along the layer plane, which is essentially proportional to

is with

A:

Uniform sheet resistance of the electrode layer provided as anode,

K:

Uniform sheet resistance of the electrode layer provided as a cathode,

r:

Distance along the layer plane to an excellent point or curve in the layer plane, wherein in the excellent point or along the excellent curve, the resistance of the resistance matching layer perpendicular to the layer plane is minimal,

n:

Exponent with n> 0, in particular with n = 2,

m:

Relative weighting of the electrode resistances, in particular with m = 1.

beschrieben wird, mit

R:

Lokaler elektrischer Widerstand der Widerstandsanpassungs-Schicht senkrecht zur Schichtebene,

C₁, C₂:

Vom Abstand r unabhängige Konstanten, und mit A, K, r, n und m wie oben.

The resistance matching layer may additionally have a resistance component constant over the layer, such that the resistance of the resistance matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane has a course substantially determined by the equation

is described with

R:

Local electrical resistance of the resistance matching layer perpendicular to the layer plane,

C ₁ , C ₂ :

Constants independent of the distance r, and with A, K, r, n and m as above.

Point the electrodes have known systematic inhomogeneities, e.g. Abscheidebedte variations of the metal cathode, so they can also by a suitable choice of the expression of the resistance matching layer be reduced or even largely compensated.

For arbitrary, asymmetrical shapes and / or symmetry-destructive contacts, such as point contacts in the case of rectangular functional areas, it is generally not possible to specify simple analytical expressions for the resistance profile of the resistance matching layer. In these cases, the determination of the resistance profile can be carried out by means of numerical methods or by means of simulations. For this example, the "finite element" method or the inversion of Feldgleichungssyste be used.

The Applying the resistance matching layer advantageously comprises the application of a fluid coating material, for example by spin coating or dip coating.

Especially advantageous embodiments of the method, which are the targeted local variation of the resistance matching layer to simple and cost-effective Allow way. In particular, to achieve layer thickness variations are printing techniques suitable, such as flexographic printing, screen printing or electrophotographic Printing process. Also particularly suitable are ink-jet printing processes or other spraying methods.

To the Application of a fluid coating material includes the method Correspondingly advantageous printing by means of a computer-controlled Printhead, in particular by means of an inkjet printhead, the Printing by screen printing, printing by flexographic printing or gravure printing, or spraying through a mask.

To the Applying the resistance matching layer may be advantageous in addition to the printing techniques mentioned in principle, all known deposition methods are used.

Accordingly Advantageously, the method comprises depositing a layer physical vapor deposition, in particular by vapor deposition or sputtering, or by chemical vapor deposition, in particular plasma-induced chemical vapor deposition. Also, you can Applying the resistance matching layer various methods be combined.

For the variation The resistance of the resistance matching layer is different Options. Accordingly, the application of the at least one resistance matching layer advantageously comprises the application of layer areas with different layer thickness and / or different layer composition and / or different Film morphology.

The simplest and most controllable type of resistance variation is the variation of the layer thickness, since the local transverse resistance is directly proportional to the local layer thickness, starting from a specific resistance of the layer, homogeneous everywhere and of the Layer thickness independently is. The above coating methods such as printing techniques or spraying techniques are for this particularly suitable, since these methods are a variation of the layer thickness to allow in a simple way.

The Layer thickness variation can lead to an additional optical effect, for example, to absorption or interference effects lead. These Effect can also be variations in the distribution of functionality, especially in the luminance distribution, result.

This Effect offers another possibility for modulating the distribution of functionality of the electro-optical component. The determination of the resistance profile the resistance matching layer to achieve a given functionality distribution Taking advantage of this effect can be achieved by means of coupled electro-optical Considering simulations of microscopic material properties, transport, recombination and light generation processes Certain resistance profiles can also be done by appropriate lateral different dopings of the conductive resistance matching layer with substances showing the conductivity be adjusted. These substances can during the deposition of the resistance matching layer be admixed or subsequently via diffusion processes be introduced into the layer. The latter can be done via thermal transfer, local activation, for example via temperature, light or achieved mechanical energy input, printing or the like become. Advantageously, the layer thickness can be substantially constant here held, so that adverse local interference effects strong repressed can be. For long-term stability to ensure the component the method provides advantageous that in the finished component, the Diffusion processes do not continue.

Also by varying the morphology of the resistance matching layer, especially with polymer layers, can be a variation of the resistance be achieved because the morphology has an impact on the local resistivity and thus on the local cross resistance Has. structural changes can via temperature entry profiles when baking, over local activation for example by temperature, light, mechanical Energy input or chemical activators or certain material compositions be set.

Of course, the described method for varying the resistance of the resistance matching layer also with each other be combined.

to Lichtaus- and / or Lichteinkopplung includes the application of the first and / or the second electrode layer advantageously the application an at least partially transparent, electrically conductive layer, which in particular has ITO (indium tin oxide). Because of the high Material costs of ITO become the first or second electrode layer at least on the side of the electro-optical element, on the no light emission and / or Light coupling is required, advantageously as a metal layer applied.

Further have the first and the second electrode layer of the electro-optical Elementes advantageous on different work functions.

Also the resistance matching layer is advantageously applied in such a way that the outlet potentials on the electrical requirements the functional layer, in the case of an organic, electro-optical element matched to those of the electroluminescent layer package.

ever by position of the resistance matching layer in the layer sequence of the electro-optical element may be different Requirements for the transparency of the resistance matching layer.

Farther are the materials and manufacturing methods of the resistance matching layer preferably compatible with the requirements of the electro-optical Elementes, for example regarding temperature limits or solvent resistance, and affect not the electroluminescent properties of the device.

In principle, all conductive layer materials which fulfill these boundary conditions are suitable. Examples of suitable inorganic materials include ITO (indium tin oxide), SnO _x, InO _x, ZnO _x, TiO _x, a CH, and doped Si. Suitable organic materials, in particular for organic, electro-optical elements, are, for example, PEDOT (poly (3,4-ethylenedioxythiophene)), PEDOT / PSS (PSS: poly (styrenesulfonic acid)), PANI (polyaniline), antrazene, Alq ₃ (tris (8 -oxychinolinato) -aluminum), TPD (triphenyldiamine), CuPc (copper phthalocyanine), NPD (N, N'-bis (1-naphthyl) -N, N'-diphenylbenzidine), as well as all mentioned in the literature as an alternative to PEDOT Materials.

at organic, electro-optical elements becomes the resistance matching layer particularly advantageous as a hole conductor layer, in particular as a PEDOT or PANI layer, applied, since such a layer is already typical component for example, of polymer OLEDs and therefore the one to be achieved by the resistance matching layer Correction function together with the hole conductor functionality in one Work step can be particularly easily and inexpensively generated.

Advantageous the method may further comprise applying one or more functional Layers provide, such as hole injection layers, Electron blocker layers, hole blocker layers, electron conductor layers, Hole conductor layers and / or electron injection layers. Further The method may also include applying at least one ion conductor layer and / or ion storage layer.

With Particularly advantageous, the method comprises applying a light absorption layer, in particular a color-neutral light absorption layer, with horizontal along the layer plane varying light absorption properties.

Especially Preferably, the application of the light absorption layer comprises Applying a photosensitive layer, exposing the photosensitive Layer and developing the photosensitive layer.

modulation techniques such as masks of uniform luminescent layers for Representation of symbols or writing or coloring can do this be used, targeted functionality distributions, in particular Luminance distributions to adjust. For this purpose, the light-absorbing Layers are applied directly to the component.

Especially advantageous is the self-controlling optimization of the light profile Light emitting components individually for each individual component to compensate for statistically distributed local differences.

A self-controlling optimization of the light profile, for example be achieved by first a photosensitive layer such as. a photoemulsion is applied, this by coordinated Switching on the light-emitting, electro-optical component exposed, developed and thus optimally on each individual component and its local defects such as coating defects or short circuits adapted becomes. Subsequently there is a fixation of the photosensitive layer and expediently the application of a protective coating, e.g. with a paint.

Accordingly the method comprises particularly advantageous that the exposure the photosensitive layer by switching on the electro-optical Element for a predetermined period of time, wherein the switching on by Applying a predetermined voltage between the first and the second electrode layer takes place.

A Another variant for optimizing the light profile is the active controlled individual coating. For this, the luminance distribution the exit light area the electro-optical component by means of a suitable detector system, for example by means of a camera system with image processing, captured and saved. From the recorded luminance distribution becomes an absorption density distribution for optimal local correction of the brightness profile. According to the calculated absorption density distribution is a locally varying absorptive layer, for example by means of a spray or printing process, such as Ink-jet printing or electrophotographic Print, applied to the light exit surface. Then done again a fixation and expediently the application of a Protective coating. For the Absorptive layer can various organic and inorganic materials used For example, thermosets, thermoplastics, sol-gel solutions or Colours.

A Another variant is the actively controlled individual Masking, where a separate mask on glass or polymer substrate manufactured and fixed on the front side of the component.

Further Modifications include the method for generating the absorption profile For example, the actively controlled individual exposure, at which detects the gross luminance, calculates the correction, and a Photoemulsion exposed for example by means of a guided light beam as well as the actively controlled individual fixation of absorptive Materials detecting the gross luminance, the correction calculated and for fixation and formation of the absorptive coating exposed a coating on the component surface becomes.

A Another variant involves the application of a self-regulating phototropic Coating.

All described method for applying a light absorption layer have the advantage that every individual component in terms of the predetermined luminance distribution can be optimized.

modified The absorptive correction layer can also be integrated into the component become. However, depending on the position in the sequence of layers, the Layer additional conductivity have and optical interference or adjusted in the light refraction behavior be. Here, too, is an individual adjustment of the local absorption behavior by applying a photochromic coating or by adjusting the absorption over an external energy input, for example by means of a laser possible.

ever according to the purpose of the component to be produced, the method Advantageously, the step of applying at least partially reflecting layer or an at least partially reflecting layer system and / or the step of applying an at least partially anti-reflection Layer or an at least partially anti-reflective coating system include.

in the It is also within the scope of the invention an electro-optical element, which in particular with the above can be produced described method.

One inventive electro-optical Element, accordingly comprises a substrate, a first electrode layer, at least one functional layer, a second electrode layer, and at least one resistance matching layer which is an electrical Resistance perpendicular to the layer plane, in at least a horizontal direction along the layer plane varies.

One inventive electro-optical Element can also consist of several or a plurality of separate planar sub-elements be composed, for example, on a common Substrate are arranged.

Advantageous is the element as an organic electro-optical element, in particular as an organic, light-emitting diode, formed, wherein the Functional layer at least one organic, electro-optical material having.

A further advantageous embodiment of an element according to the invention is an electrochromic element, in which the at least one functional layer comprises at least one electrochromic layer. The electrochromic layer preferably has WO _x , but other materials known to the person skilled in the art, for example NiO _x , VO _x or NbO _x are also within the scope of the invention.

Further For example, the functional layer may be a photovoltaic layer include. For many purposes, a functional layer is also advantageous, which at least one doped semiconductor layer, in particular a Double layer system with a p-doped and an n-doped semiconductor layer, includes.

typically, is the electrode layer acting as an anode on the substrate and the electrode layer acting as a cathode on the intermediate layer Layer system arranged. Of course, but is also one inverted system in which the cathode on the substrate and the anode is applied to the intermediate layer system is, within the scope of the invention.

Advantageous includes the first and / or the second electrode layer of an inventive element in the edge areas a contact surface for applying and / or tapping an electrical voltage. at Applying a voltage between the first and second electrode layers, which within a tolerance of ± 10% of a given Operating voltage corresponds, the light exit and / or Light entry surface the element advantageously substantially a predetermined distribution of functionality on, with the distribution of functionality particularly advantageous uniform distribution over the Light exit and / or light entry surface corresponds.

Of the Resistance of the resistance matching layer is particularly advantageous a course as above for the method described on. Accordingly, the resistance decreases perpendicular to the layer plane, preferably from a point of minimum resistance towards the edge of the layer towards, in particular square.

beschrieben wird (verwendete Größen wie oben).Particularly preferably, the resistance of the resistance matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane on a curve, which essentially by the equation

is described (sizes used as above).

• – Spin-Coating,
• – Tauchbeschichten,
• – Bedrucken mittels eines Inkjet- Druckkopfes,
• – Bedrucken durch Siebdruck,
• – Bedrucken durch Flexodruck oder Gravurdruck,
• – Besprühen durch eine Maske,
• – physikalische Dampfphasenabscheidung, insbesondere Aufdampfen oder Sputtern, oder
• – chemische Dampfphasenabscheidung, insbesondere plasmainduzierte chemische Dampfphasenabscheidung,

Advantageously, the resistance matching layer is applied by one of the following methods:

• - spin coating,
• - dip coating,
• Printing by means of an inkjet print head,
• - printing by screen printing,
• - printing by flexographic printing or gravure printing,
• - spraying through a mask,
• - Physical vapor deposition, in particular vapor deposition or sputtering, or
• Chemical vapor deposition, in particular plasma-induced chemical vapor deposition,

Preferably For example, the resistance matching layer has layer regions of different layer thickness and / or different layer composition and / or different Layer morphology on.

Examples suitable materials for the resistance matching layer are the ones above mentioned with the method.

The electrode layers of an element according to the invention are advantageously designed such that the first and the second electrode layer have different work functions. Furthermore, the first and / or the second electrode layer are preferably at least partially transparent, and in particular have indium tin oxide. Alternatively, the first and / or second electrode layer are advantageously used as metal layer educated. For a one-sided Lichtaus- and / or Lichteinkopplung one of the electrode layers is advantageously formed as a transparent ITO layer and the other as a metal layer.

Advantageous the element further comprises at least one hole injection layer and / or an electron blocker layer and / or a hole blocking layer and / or an electron conductor layer and / or a hole conductor layer and / or an electron injection layer and / or an ion conductor layer and / or an ion storage layer.

A particularly preferred embodiment an element according to the invention comprises a light absorption layer, in particular a color neutral Light absorption layer, with horizontally along the layer plane varying light absorption properties, which in particular manufactured as described above.

The Element further advantageously comprises further functional layers such as for example antireflection coatings.

The Shape of the light exit and / or light entry surface of a element according to the invention is particularly advantageous substantially symmetrical, in particular rectangular, round or oval.

For special Use purposes, for example in the automotive industry includes the light exit and / or light entry surface advantageously at least one acute-angled area. This is for example at a surface in shape given a circular section.

Especially in symmetric forms, the resistance matching layer a resistance profile, which analytically through the expresses equation 1 above.

ever According to purpose, the light exit and / or light entry surface of a element according to the invention also have a free, non-symmetrical shape. In these make is the resistance curve of the resistance matching layer in usually not given by a simple analytical expression, but the result of numerical methods or simulations, such as for example the "Finite Elements "method or the inversion of field equation systems.

• – Bereitstellen eines Substrats,
• – Aufbringen zumindest einer Elektrodenschicht,
• – Aufbringen zumindest einer Widerstandsanpassungs-Schicht auf das Substrat, welche einen elektrischen Widerstand senkrecht zur Schichtebene aufweist, der in horizontaler Richtung entlang der Schichtebene variiert, wobei zumindest eine Teilfläche der Elektrodenschicht als Kontaktfläche vorgesehen wird und der Widerstandsverlauf der Widerstandsanpassungs-Schicht vom Flächenwiderstand der Elektrodenschicht und von der Anordnung der zumindest einen Kontaktfläche abhängt.

The invention further includes a method for producing a coated substrate, comprising the steps:

• Providing a substrate,
• Applying at least one electrode layer,
• Applying at least one resistance matching layer to the substrate which has an electrical resistance perpendicular to the layer plane which varies in the horizontal direction along the layer plane, at least one partial surface of the electrode layer being provided as the contact surface and the resistance profile of the resistance matching layer being of the sheet resistance of the electrode layer and depends on the arrangement of the at least one contact surface.

Advantageous comprises the application of the at least one electrode layer the application of an at least partially transparent, electrically conductive Layer comprising in particular indium-tin oxide.

Corresponding The invention further includes a coated substrate for manufacturing an electro-optical element, in particular a photovoltaic Element, an electrochromic element, or an OLED or PLED, in particular produced by a method as described above, comprising at least one electrode layer and at least one resistance matching layer, which is an electrical resistance perpendicular to the layer plane which varies in the horizontal direction along the layer plane.

When Substrate material of the coated substrate are various materials suitable, such as glass, in particular soda-lime glass, Glass-ceramic and / or plastic, in particular a barrier-coated Plastic, and / or combinations thereof.

The Electrode layer of the coated substrate is preferably at least partially transparent and has in particular indium tin oxide on.

On the described manner can provide a pre-corrected substrate which, in order to obtain uniform functional distributions, in particular uniform luminance distributions, are used can.

The Substrate can still be replaced by further functional layers, e.g. Antireflection coatings be refined.

The Resistive matching layer may be in a separate coating step deposited or, for example, in one for an organic, electro-optical Element provided hole conductor layer can be integrated, which For example, is designed as a PEDOT coating. The integration in a PEDOT coating offers the further advantage that the Resistance correction layer in the work function very well to the Anode is adapted.

Advantageous the resistance matching layer is formed such that it not affected by subsequent cleaning operations. Furthermore, the Resistance-matching layer advantageous against solvents additional liquid coatings (for example, in polymer OLEDs) substantially resistant. Besides that is the resistance matching layer advantageously vacuum-resistant and largely optically inactive with respect to Interference or absorption.

• – als Leuchtmittel,
• – als Beleuchtungmittel,
• – als Hinweis- oder Leuchttafel,
• – als variables Hinweisschild,
• – als Schalter- oder Sensorbeleuchtung,
• – als hoch- oder niedrigauflösendes Display,
• – als digitale Plakatwand oder Werbetafel,
• – in Leuchtböden oder Leuchttischen,
• – als Lichtfläche zur Ambientebeleuchtung,
• – zur Hintergrundbeleuchtung von Displays,
• – zur Spezialbeleuchtung, insbesondere in der Mikroskopie,
• – zur Signalgebung oder Beleuchtung, insbesondere im Automobil-, Luftfahrt- Schiffahrts- oder Haushaltsbereich,
• – als Photovoltaik-Element,
• – als optolektronischen Sensor,
• – als Flüssigkristall-Element,
• – als elektrochromes Fensterelement, oder
• – als elektrochromen Spiegel.

Also within the scope of the invention is the use of a substrate as described above for producing an electro-optical element, in particular a photovoltaic element, an electrochromic element, or an OLED or PLED, as well as the use of an electro-optical element as described above

• As bulbs,
• As a lighting agent,
• - as a notice or lighting board,
• - as a variable information sign,
• - as switch or sensor lighting,
• - as high or low resolution display,
• - as a digital billboard or billboard,
• - in illuminated floors or light tables,
• - as a light surface for ambient lighting,
• - for backlighting displays,
• - for special lighting, especially in microscopy,
• For signaling or lighting, in particular in the automotive, aviation, shipping or household sectors,
• As a photovoltaic element,
• As opto-electronic sensor,
• As a liquid crystal element,
• - As an electrochromic window element, or
• - as electrochromic mirror.

The Invention will be described below with reference to preferred embodiments using the example of an OLED and with reference to the accompanying drawings described in more detail. The same reference numerals in the drawings designate the same or similar Parts.

It each show schematically:

1a a perspective view of an OLED device according to the prior art,

1b a cross-sectional view of an OLED device according to the prior art,

1c a replacement resistor network of the OLED device 1a and 1b .

2 a replacement resistance network of an OLED component according to the invention,

3a -F comparison of an OLED device without and with a resistance matching layer with symmetrical contacting,

4a -F comparison of an OLED device without and with resistance matching layer in diagonal contacting,

5a -F comparison of an OLED device without and with a resistance matching layer in one-sided contacting,

6a -F comparison of an OLED device without and with a resistance matching layer when contacting the anode on both sides and contacting the cathode on one side,

7a Potential curves in an OLED component with resistance matching layer and symmetrical contacting for different current intensities,

7b Luminous intensities of an OLED component with a resistance matching layer and symmetrical contacting for different current intensities,

8th Luminous intensity distributions of an OLED device with randomized deviations of the resistance values of the resistive matching layer

9 3 a perspective view of a first rectangular OLED component according to the invention,

10 a perspective view of a second rectangular OLED device according to the invention,

11 3 a perspective view of a third rectangular OLED component according to the invention,

12 3 a perspective view of a fourth rectangular OLED component according to the invention,

13 a perspective view of a first round OLED device according to the invention,

14 a perspective view of a second inventive round OLED component,

15 a cross-sectional view of the OLED component 14 .

16 a view of the OLED component 14 .

17 a perspective view of an acute-angled OLED component according to the invention,

18 a replacement resistor network of the OLED device 17 without resistance matching layer,

19 a replacement resistor network of the OLED device 17 with resistance matching layer,

20 a perspective view of a first substrate according to the invention,

21 a perspective view of a second substrate according to the invention,

22 a perspective view of a third substrate according to the invention,

23 a perspective view of a fourth inventive substrate,

24 a cross-sectional view of an elliptical OLED device,

25 a view of the OLED component 24 ,

The 1a and 1b schematically show a rectangular OLED component 100 According to the state of the art. In 1 is a perspective view and in 2 a cross-sectional view through the component 100 shown. The OLED component 100 is formed in this embodiment as a polymer OLED (PLED) and accordingly has 2 organic layers 130 and 140 on.

On a transparent substrate 110 For example, a glass substrate or a passi accordingly Fourth polymer substrate is a transparent conductive electrode layer 121 applied as an anode.

This is followed by a leveling layer 130 to compensate for substrate unevenness, which in this embodiment also acts as a hole conductor layer (HTL, Hole Transport Layer). This is followed by the electroluminescent layer 140 (EL layer), which comprises, for example, light-emitting polymers (LEP), such as PPV (poly-para-phenylene-venylene) or parylene, or short-chain organic molecules, such as Alq ₃ with corresponding dopants. The polymers are typically deposited from the liquid phase, the shorter-chain organic molecules from the gas phase by thermal evaporation.

The OLED layer sequence is through the cathode layer 122 completed. The illustrated embodiment provides a symmetrical circuit. Accordingly, for contacting the component 100 contact surfaces 151 and 152 on two opposite sides of the anode layer 121 and contact surfaces 153 and 154 on two opposite sides of the cathode layer 122 arranged. The wiring with a DC voltage source 10 and corresponding lines 20 is in 1b shown.

The typically provided encapsulation to protect the functional layers against destruction by oxygen or water from the environment is not shown.

1c shows a replacement resistor network in the 1a and 1b represented OLED component. In this idealized network, the resistances within the organic layers are neglected, since they are typically significantly larger with a length scale in the range of μm to mm than the surface resistances of the electrode layers or the local transverse resistances to the layers at typical layer thicknesses in the range of 100 nm.

The local transverse resistance through the organic layers results from the sum of the transverse resistances through the HTL and the EL layer to: R i = R HTL , i + R EL , i (I i ) with i = 1, ..., n, (2) wherein the resistance of the EL layer depends on the current flowing through I _i . Together with the sheet resistances A _{i of} the anode and K _{i of} the cathode, the current intensities I _i in the individual branches and the resulting potential differences between the electrodes can be calculated. The layer resistances of the electrode layers can generally be assumed to be constant along the layer plane. The locally emitted light intensity is also determined by the prevailing current intensity. The dependencies of the resistance of the EL layer and the intensity of the current intensity R _EL (I _i ) and L _EL (I _i ) can be determined experimentally directly on laterally small components (pixel device). Since per se the individual currents I _i and thus R _EL (I _i ) are unknown, the calculation of the network is iterative.

Of the Basic idea of a particularly advantageous embodiment of the invention to make corrections through a resistance matching layer, which preferably has a constant luminance over the entire luminous area of the OLED component allows.

mit
A = A_i = const., K = K_i = const., i ∊ {1,..., n – 1}, und A₀ = A_n = 2·A, K₀ = K_n = 2·KIt can be seen that the dimensioning of the resistance matching layer in the present approximation depends only on the surface resistances of the two electrode layers. The following parabolic resistance curve applies for the layer in the case of 2 illustrated bilateral symmetrical circuit

With
A = A _i = const., K = K _i = const., I ∈ {1, ..., n - 1}, and A ₀ = A _n = 2 · A, K ₀ = K _n = 2 · K

In the 3 to 6 are the self-adjusting current and thus luminance distributions for differently contacted OLED components shown. For OLED components according to the prior art, this always results in inhomogeneities of the luminance. It is obvious that with no wiring approach with correspondingly extended components and / or high luminous intensity, ie at high current densities and thus voltage drops, a uniform luminance distribution according to the prior art can be achieved.

The in the 3 - 6 Wiring examples and calculated distributions are based on a as in 2 illustrated replacement resistor network for a corresponding rectangular OLED component with appropriate circuitry. As in 2 the component is shown with the substrate at the top (rotated by 180 ° in comparison to 1a and 1b ). The wiring is in the 3a . 3d . 4a . 4d . 5a . 5d . 6a and 6d each represented by corresponding arrows.

For better comparability of the results, the transverse resistances are assumed to be constant and equal. The calculations also show a constant cathode resistance K of 1 ohm, a constant anode resistance A of 10 ohms, a constant transverse resistance of 300 ohms, line and contact resistances with A ₀ = A _n = 2 * A and K ₀ = K _n = 2 K, as well as a total current of 100 mA through the device. The respective operating voltage U ₀ required for this total current is indicated in each case.

3a shows an OLED component according to the prior art such as in 1a shown, which is connected symmetrically on both sides. The light exit direction points upwards, accordingly the substrate is located 110 on the upper side of the component. Between the transparent anode layer 121 and the cathode layer 122 are the HTL layer 130 and the EL layer 140 arranged.

In 3b are the potential courses 310 respectively. 320 the anode or cathode layer shown. The resulting current density distribution 330 is in 3c shown.

In contrast, shows 3d an OLED component, which is also connected symmetrically on both sides, but in contrast to the in 3a shown component in addition to the substrate 210 , the electrode layers 221 and 222 , as well as the HTL and EL layers 230 and 240 a resistance matching layer 262 having.

The resistance matching layer 262 has a laterally varying resistance profile according to the above equation (3). The corresponding potential courses 410 respectively. 420 the anode or cathode layer are in 3e shown. By the resistance matching layer according to the invention 262 results in the 3f shown homogeneous current density distribution 430 , Accordingly, an OLED component corrected in this way has a homogeneous luminance distribution.

The following 4a -f, 5a -F and 6a -F are different from the ones 3a -F only by a different wiring of the OLED components.

mit
A = A_i = const., K = K_i = const., i ∊ {1,..., n – 1}, und A₀ = A_n = 2·A, K₀ = K_n = 2·KThe correction in a diagonal wiring of an OLEDs component, as in the 4a - 4f also takes place by means of a parabolic resistance curve of the anti-reflection matching layer according to the equation

With
A = A _i = const., K = K _i = const., I ∈ {1, ..., n - 1}, and A ₀ = A _n = 2 · A, K ₀ = K _n = 2 · K

The vertex of the parabola defined by the parameter i ₀ is shifted from the center of the component to the cathode terminal-side region of the component in the event that the anode resistance A is greater than the cathode resistance K.

Also in this case, the strength of the correction resistance curve is determined only by the surface resistances of the anode and cathode and is independent of the value of the total current or other homogeneous resistive layers, in particular the EL layers. The position of the vertex i _0, however, depends on the ratio of the electrode resistances. Thus, the vertex for the case A = K in the middle of the device is analogous to the symmetrical wiring and for A »K the device behaves as in the case of one-sided contacting as in 5a - 5f shown, ie the vertex shifts to the front side with cathode contact. For A> K, i _{0 is} between these extreme positions. This position is independent of the total current and the behavior of other homogeneously formed EL layers.

In other words, the equivalent in the 5a - 5f shown one-sided circuit of an OLED component circuit technology a half-side component according to the in 3d shown symmetrical circuit and can therefore with the same parabolic resistance course to approach (4) are corrected when the apex of the parabola (i ₀ ) is placed on the opposite side of the contact side.

wobei n die Anzahl der Querwiderstände angibt.As can be seen from formula (3), the contact point in the middle of the component, that is, at two-sided contacting of a symmetrically constructed resistance network

where n indicates the number of transverse resistances.

For the one-sided contacted resistor network, the mirror plane is slightly outside of the last opposite Transverse resistance (additional Distance Δi = ½), otherwise this resistance would be mirrored on itself and only for half resistance value.

Also in this case, the strength becomes of the correction resistance curve only by the surface resistances of Anode and cathode determines and is independent of the value of the total current or other homogeneous resistive layers, ins. of the EL layers. The location of the vertex is independent of the Electrode resistances.

Also in the in the 6a - 6f shown circuit with double-sided contacting of the anode layer and one-sided contacting of the cathode layer follows the Wwiderstandsverlauf the resistance matching layer the principle parabolic curve according to equation (4) and depends only on the electrode resistors A and K. For K «A, the resistance curve for this circuit drops with that for a symmetrical circuit according to 3a - 3f together and the vertex i ₀ is in the middle of the device. With reduction of the ratio A / K, the vertex shifts in the direction of the side of the component facing away from the cathode contact.

Also in this case, the strength becomes of the correction resistance curve only by the surface resistances of Anode and cathode determines and is independent of the value of the total current or other homogeneous resistive layers, ins. of the EL layers.

In the 7a and 7b are each shown at different total currents between 20 and 500 mA for a symmetrically connected and by means of a resistance adjustment layer corrected OLED component resulting potential curves or current distributions. In detail are shown for a current of 50 mA in 7a the potential course 502 and in 7b the luminosity course 512 , for a current of 100 mA in 7a the potential course 504 and in 7b the luminosity course 514 , for a current of 200 mA in 7a the potential course 506 and in 7b the luminosity course 516 , and for a current of 500 mA in 7a the potential course 508 and in 7b the luminosity course 518 ,

The calculations show a constant cathode resistance of 1 ohm, a constant anode resistance of 10 ohms, line and contact resistances A ₀ , K ₀ , A _n and K _n , which are twice as large as A and K, and a total current through the device of 100 mA. Furthermore, the calculations are based on a real OLED characteristic.

It shows that the course of the resistance matching layer is independent of the total current is. Next you can on the resistance matching layer any further layers be applied (PEDOT, EL, etc.) as long as these layers in Sum a uniform cross resistance with the same current dependence exhibit, the uniformity remains the cross-flow unchanged. The uniform Resistance of the further layers leads in connection with the uniform current distribution to one over the area constant potential increase between the two electrode layers.

The production of uniform luminous surfaces by means of a resistance matching layer is robust against disturbances of the local component properties. A "noise" of the correction resistance values and the OLED characteristic of ± 5% only leads to a fluctuation of the local brightnesses by the values of the undisturbed case, but to no significant systematic deviation from the uniformity. The results of corresponding calculations shows 8th , in the different luminance courses 370 for ± 5% fault correction value or OLED characteristics are shown. The respective mean values 380 as well as the statistical mean 390 are also shown.

R_korr:

Lokaler elektrischer Widerstand der Widerstandsanpassungs-Schicht senkrecht zur Schichtebene,

A:

Uniformer Flächenwiderstand der als Anode vorgesehenen Elektrodenschicht,

K:

Uniformer Flächenwiderstand der als Kathode vorgesehenen Elektrodenschicht,

x₀:

Lage des Scheitelpunktes des Widerstandsverlaufes

x:

Koordinate entlang der Schichtebene zwischen den Anschlussseiten,

C₁, C₂:

Konstanten,

n:

Exponent mit n > 0, insbesondere mit n = 2,

m:

Relative Gewichtung der Elektrodenwiderstände, insbesondere mit m = 1.

For rectangular devices, the discrete resistive switching networks described above may be transitioned to continuous layer models by replacing the discrete approaches to the correction resistance curves of equation (4) by the following generalization:

R _corr :

Local electrical resistance of the resistance matching layer perpendicular to the layer plane,

A:

Uniform sheet resistance of the electrode layer provided as anode,

K:

Uniform sheet resistance of the electrode layer provided as a cathode,

x _0:

Location of the vertex of the resistance course

x:

Coordinate along the layer plane between the connection sides,

C ₁ , C ₂ :

constant,

n:

Exponent with n> 0, in particular with n = 2,

m:

Relative weighting of the electrode resistances, in particular with m = 1.

The constant C ₂ describes a constant resistance base contribution, which is, for example, coating technology. For example, the resistance matching layer will typically have a minimum thickness greater than zero at the apex.

requirement for the Applicability of the above equation is that the contacting over the full length the component sides takes place or the sheet resistance in the contacting area small against the typical resistances of the electrode layer.

conditioned by voltage drops in the contacting area are at local, for example substantially punctate Contacts without countermeasures disorders the luminance uniformity expected. But even this effect can be achieved by a suitable choice the expression the resistance matching layer are corrected.

9 schematically shows a perspective view of a rectangular OLED component according to the invention 202 , In this embodiment is on a substrate 210 a first electrode layer provided as an anode 221 arranged, which for the symmetrical wiring on opposite sides of contacts 251 and 252 having. The electrode layer 221 is preferably designed as a transparent ITO layer for a light extraction by the substrate. The OLED component is formed in this embodiment as a PLED and accordingly has a hole conductor layer 230 and an electroluminescent layer 240 on. Between the electrode layer 221 and the hole conductor layer 230 is the resistance matching layer 262 arranged. The OLED layer sequence is formed by the electrode layer provided as the cathode 222 completed, which for symmetrical wiring on opposite sides of contacts 253 and 254 In which in 9 Accordingly, the OLED component shown is essentially the component 1a which additionally includes the resistance matching layer 262 having.

In the in 9 illustrated embodiment, the resistance matching layer 262 formed such that the electrical resistance is varied by varying the layer thickness. The resistance curve corresponds to a curve according to the above equation (5) with x the coordinate on, an axis along the layer plane, which the contacts 251 and 252 connects and runs perpendicular to their major axes, and located at x ₀ in the middle of the layer. Accordingly, the OLED component 202 a substantially homogeneous luminance distribution over the entire light exit surface.

Instead of varying the layer thickness, the variation of the resistance of the resistance matching layer can also be achieved in another way, for example by varying the layer composition and / or the layer morphology. This is in the in 10 illustrated embodiment of an OLED component according to the invention 204 realized. This embodiment 204 corresponds to the in 9 shown 202 wherein the resistance matching layer 264 has the same resistance as the layer 262 , with the difference that the layer 264 a layer composition varying along the layer layer with the same layer thickness. The variation of the layer composition may, for example, be such that different compositions of layer materials are applied by suitable printing methods, the different compositions having different resistivities.

In the 11 and 12 are preferred embodiments of inventive OLED components 206 and 208 in which each of the HTL layer and the resistance matching layer to a corrected HTL layer 232 respectively. 234 combined. This offers the particular advantage that no additional operation is required for the application of the resistance matching layer.

In the 11 illustrated corrected HTL layer 232 has a layer thickness varying along the layer plane, through whose course, which in turn corresponds to equation (5), a homogeneous luminance distribution of the OLED component is achieved. In the in 12 illustrated embodiment, the resistance profile of the corrected HTL layer 234 given by a variation of the layer composition and / or the layer morphology.

Of course, next to the in the 9 to 12 illustrated rectangular OLED components 202 to 208 Other types in the context of the invention.

In 13 schematically is a perspective view of an embodiment of a round OLED device according to the invention 600 shown. This alien part 600 includes a round substrate 610 on which an entire surface of an anode layer 621 is arranged. In the edge region of the anode layer 621 is for contacting an annular contact surface 651 intended. Between the anode layer 621 and the cathode layer disposed above 622 are a corrected HTL layer 634 and an electroluminescent layer 640 arranged. In this embodiment also includes the cathode layer 622 an annular contact surface 652 on. The corrected HTL layer 634 has a suitable resistance profile along the layer plane, which increases from the layer center to the edge, so that the OLED component 600 has a homogeneous luminance distribution.

This in 14 illustrated round OLED component 700 also includes a substrate 710 on which an anode layer 721 with annular contact surface 751 is arranged. On the anode layer 721 is a corrected HTL layer 734 and an EL layer 740 arranged. The layer sequence is completed by the cathode layer 722 , Unlike the in 13 illustrated embodiment 600 has the cathode layer 722 of the component 700 a contact surface arranged in the middle of the layer 752 on. The substantially punctiform or small area contact surface 752 simplifies the contacting of the component 700 ,

The 15 and 16 each show schematically a cross-sectional view and a top view of the in 14 represented component 700 , Also shown is a voltage source in each case 10 to which the OLED component 700 connected. The resistance profile of the corrected HTL layer realized in this embodiment by varying the layer composition and / or the layer morphology 734 is in 15 indicated by corresponding hatchings. The resistance across the layer plane increases in this embodiment, from the middle of the layer to the edge substantially linearly.

17 shows a particularly preferred embodiment of an OLED component according to the invention 900 which has an acute-angled design. In the component 900 are a separate HTL layer 930 and resistance matching layer 964 intended. Apart from that, the OLED component provides 900 essentially a segment of the in 14 to 16 illustrated round OLED component 700 Accordingly, the OLED component comprises 900 a substrate 910 , an anode layer disposed thereon 921 with a contacting surface arranged on the edge 951 , as well as one above the resistance matching layer 964 and the HTL layer 930 arranged EL layer 940 , The layer sequence is completed with a cathode layer 922 , which in this embodiment, a small-area contact 952 having.

Analogous to the in 1c shown replacement resistor network shows 18 a replacement resistor network for the in 17 represented OLED component 900 but without resistance matching layer 964 ,

The local transverse resistance through the organic layers results from the sum of the transverse resistances through the HTL and the EL layer according to equation (2) above, wherein the resistance value of the EL layer in turn depends on the current I _i flowing through. Together with the layer resistances A _{i of} the anode layer and K _{i of} the cathode layer and on the basis of the applied voltage U ₀ and the total current I ₀ , the current intensities I _i in the individual branches and the resulting potential differences between the electrode layers can be calculated iteratively.

The calculations result in a homogeneous luminance distribution of this component a linear or approximately linear decrease in 19 shown correction resistances R κ / i (i = 1, ..., n) with increasing i.

Since the resistance profile of the resistance matching layer for a homogeneous luminance distribution of the OLED device is independent of the current intensity, such as in 7b As shown, the invention particularly advantageously provides a precorrected substrate which is coated with a resistance matching layer.

Various embodiments of such a substrate according to the invention are in the 20 to 23 shown. The illustrated substrates 802 . 804 . 806 and 808 each comprise a substrate 810 with an electrode layer applied thereon 821 which is preferably formed as an ITO layer and contacting surfaces 851 and 852 having.

The substrate 802 has a resistance matching layer 862 which varies in the layer thickness along the layer plane and is preferably likewise designed as a transparent ITO layer. The resistance matching layer 862 can be like in 20 additionally represented, for example, with an HTL layer 830 be coated, which can be advantageously designed as a PEDOT layer.

At the in 21 The embodiment shown is the resistance matching layer 864 formed such that the resistance variation along the layer plane is realized by a variation of the layer composition and / or the layer morphology and / or the density of the layer with a constant layer thickness. Also in this embodiment is an HTL layer 830 intended.

The resistance matching layer can also be advantageously integrated into the HTL coating formed, for example, as a PEDOT layer. Corresponding embodiments of a coated substrate according to the invention 806 respectively 808 are in the 22 respectively. 23 shown. The substrate 806 includes a pre-corrected by varying the layer thickness HTL layer 832 , the substrate 808 a pre-corrected by variation, for example, the layer morphology HTL layer 834 ,

Advantageous is the resistance matching layer 862 respectively. 864 or the precorrected HTL layer 832 respectively. 834 designed so that it is not affected by subsequent cleaning operations and is substantially resistant to solvents of other liquid coatings. Furthermore, the resistance matching layer is advantageously vacuum-tight and largely optically inactive with respect to interference or absorption.

An example of an oval design is in 24 and 25 shown. That in the 24 and 25 in each case schematically as a cross-sectional view or as a plan view shown elliptical OLED component comprises a substrate 710 on which an anode layer 721 is arranged, at the edge of a contact surface 751 is provided. On the anode layer 721 are a corrected HTL layer 734 and an EL layer 740 arranged. The layer sequence is completed by the cathode layer 722 , The cathode layer 722 of the component has two arranged in each case in the focal points of the ellipse contact surfaces 752 on. The substantially punctiform or small-area contact surfaces 752 simplify the contacting of the component.

10

voltage source

20

connecting cable

100

OLED component

110

substratum

121 122

electrode layer

130

Hole conductor layer

140

electroluminescent

151-154

contacts

202-208

embodiments an inventive

OLED component with rectangular design

210

substratum

221 222

electrode layer

230

Hole conductor layer

232 234

corrected Hole conductor layer

240

electroluminescent

251-254

contacts

262 264

Resistance matching layer

310

potential curve along the anode layer for

uncorrected component

320

potential curve along the cathode layer

for uncorrected component

330

course the current strength across the layer plane

in dependence the position along the

electrode layers for uncorrected component

370

Luminance courses for ± 5%

Correction resistance values or OLED characteristics

380

Average the disturbed Luminances

390

statistical Average

410

potential curve along the anode layer for

corrected component

420

potential curve along the cathode layer

for corrected component

430

course the current strength across the layer plane

in dependence the position along the

electrode layers for corrected component

502

potential curve for corrected Component at

one amperage of 50 mA

504

potential curve for corrected Component at

one amperage of 100 mA

506

potential curve for corrected Component at

one amperage of 200 mA

508

potential curve for corrected Component at

one amperage of 500 mA

512

Luminance profile for corrected component

at a current strength of 50 mA

514

Luminance profile for corrected component

at a current strength of 100 mA

516

Luminance profile for corrected component

at a current strength of 200 mA

518

Luminance profile for corrected component

at a current strength of 500 mA

600

OLED component with round design

610

substratum

621 622

electrode layer

634

corrected Hole conductor layer

640

electroluminescent

651, 652

contacts

700

OLED component with round design

710

substratum

721 722

electrode layer

734

corrected Hole conductor layer

740

electroluminescent

751, 752

contacts

802-808

embodiments an inventive

coated Substrate with rectangular

design

810

substratum

821

electrode layer

830

Hole conductor layer

832 834

corrected Hole conductor layer

851, 852

contacts

862, 864

Resistance matching layer

900

OLED component with acute-angled cross-section

910

substratum

921, 922

electrode layer

930

Hole conductor layer

964

Resistance matching layer

940

electroluminescent

951, 952

contacts

A ₀ -A _n

anode resistors

K ₀ -K _n

cathode resistors

R ₁ -R _n

local film resistors

I ₁ -I _n

local currents

R _{HTL, 1} -R _{HTL, n}

local resistors the hole conductor

R _{EL, 1} -R _{EL, n}

local resistors the electroluminescence

layer

U ₀

Between Anode and cathode applied voltage

I ₀

Total current through the component

R k / 1-R k / n

local resistors the resistance adjustment

layer

Claims (70)

Method for producing an electro-optical Elements comprising the steps Providing a substrate, - Apply a first electrode layer, - Apply at least one Functional layer, which in particular at least one electro-optic has usable material, - Apply a second Electrode layer, characterized by the step of - applying at least one resistance matching layer, which is an electrical resistance perpendicular to the layer plane, in at least one horizontal Direction varies along the layer plane. Process according to claim 1 for producing an organic, electro-optical element, in particular an organic, light-emitting Diode, wherein the application of at least one functional layer, the application at least one layer comprising at least one organic, having electro-optic material. Process according to claim 1 for the production of an electrochromic Elements, wherein the application of at least one functional layer comprises the application of at least one electrochromic layer. The method of claim 3, wherein the electrochromic layer has WO _x , NiO _x , VO _x and / or NbO _x . The method of claim 1, wherein applying the at least one functional layer, the application of at least one photovoltaic layer comprises. The method of claim 1, wherein the at least one Functional layer at least one doped semiconductor layer, in particular a double-layer system with a p-doped and an n-doped one Semiconductor layer comprises. A method according to any one of the preceding claims, further comprising the application of contact surfaces in the edge regions of first and second electrode layers for application or tapping an electrical voltage between the first and the second Electrode layer. Method according to one of the preceding claims through the steps: - Specify a functionality distribution at least one area the electro-optical element, - Specifying an operating voltage of the electro-optical element and - Apply at least a resistance matching layer, such that the at least one area of the electro-optical element upon application of a voltage to the Value of the specified operating voltage ± 10% between the first and the second electrode layer is substantially the predetermined one functionality distribution having. Method according to one of the preceding claims, characterized by the application of the at at least one resistance matching layer, so that the light exit and / or light entry surface of the electro-optical element has a substantially uniform distribution of functionality. Method according to one of the preceding claims, wherein the distribution of functionality is a luminance distribution. Method according to one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane at least at one point of the layer plane is minimal and in at least a horizontal direction from the at least one point to the edge the layer increases substantially. Method according to one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane at least at one point of the layer plane is minimal and in at least a horizontal direction from the at least one point to the edge the layer is substantially square with the distance from which increases at least one point. Method according to one of the preceding claims, wherein the resistance of the resistance-matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane has a course which is substantially proportional to

A: uniform sheet resistance of the electrode layer provided as anode, K: uniform sheet resistance of the electrode layer provided as a cathode, r: distance along the layer plane to a point or an excellent curve in the layer plane, wherein in the excellent point or along the excellent curve of Resistance of the resistance matching layer perpendicular to the layer plane is minimal, n: exponent with n> 0, in particular with n = 2, m: Relative weighting of the electrode resistances, in particular with m = 1. Method according to one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane has a course substantially by the equation

A: Uniform sheet resistance of the electrode layer provided as an anode, K: Uniform sheet resistance of the electrode layer provided as a cathode, r: Distance along the layer plane to a drawn-out point or one excellent curve in the layer plane, wherein in the excellent point or along the excellent curve the resistance of the matching layer is perpendicular to the layer plane minimum, C ₁ , C ₂ : constants independent of the distance r, n: exponent with n> 0, in particular with n = 2, m: Relative weighting of the electrode resistances, in particular with m = 1. Method according to one of the preceding claims, wherein the application of the at least one resistance matching layer applying a fluid coating material. The method of claim 15, wherein applying of the fluid coating material by spin coating or dip coating he follows. The method of claim 15, wherein applying the fluid coating material at least one of the steps - Printing by means of a computer-controlled print head, in particular by means of an inkjet printhead, - Printing by flexo printing or gravure printing, - Printing by screen printing or - spray through includes a mask. Method according to one of the preceding claims, wherein the application of the at least one resistance matching layer the deposition of a layer by physical vapor deposition, in particular by vapor deposition or sputtering, or by chemical vapor deposition, in particular plasma-induced chemical vapor deposition, includes. Method according to one of the preceding claims, wherein the application of the at least one resistance matching layer the application of layer areas with different layer thickness and / or different layer composition and / or different Layer morphology includes. Method according to one of the preceding claims, wherein applying the at least one resistance matching layer _x applying at least one of the materials ITO, SnO, InO _x, ZnO _x, TiO _x, a: CH, doped Si, PEDOT, PEDOT / PSS, PANI , Antracene, Alq ₃ , TDP, CuPu or NPD. Method according to one of the preceding claims, wherein the at least one resistance matching layer as a hole conductor layer is applied. Method according to one of the preceding claims, wherein the first and second electrode layers have different work functions exhibit. Method according to one of the preceding claims, wherein the application of the first and / or the second electrode layer the application of an at least partially transparent, electrically conductive layer comprising, in particular, indium tin oxide. Method according to one of the preceding claims, wherein the application of the first and / or the second electrode layer comprises the application of a metal layer. Method according to one of the preceding claims by the step of applying at least one hole injection layer and / or an electron blocker layer and / or a hole blocking layer and / or an electron conductor layer and / or a hole conductor layer and / or an electron injection layer. Method according to one of the preceding claims by the step of applying at least one ion conductor layer and / or an ion storage layer. Method according to one of the preceding claims by the application of a light absorption layer, in particular a color neutral light absorption layer, with horizontally along the layer plane of varying light absorption properties. The method of claim 27, wherein applying the light absorption layer comprises the following steps: - Apply a photosensitive layer, - Exposing the photosensitive Layer, - Develop the photosensitive layer. The method of claim 27, wherein the electro-optical Element is designed as a light-emitting element and the exposure the photosensitive layer by switching on the electro-optical Element for a predetermined period of time, wherein the switching on by Applying a predetermined voltage between the first and the second electrode layer takes place. Method according to one of the preceding claims by the step of applying an at least partially specular Layer or an at least partially reflective layer system. Method according to one of the preceding claims by the step of applying an at least partially antireflective Layer or an at least partially anti-reflective coating system. Electro-optical element, in particular produced by a method according to one of claims 1 to 31, comprising A substrate, a first electrode layer, at least one functional layer, and a second electrode layer, characterized by at least one resistance matching layer, which has an electrical resistance perpendicular to the layer plane, which varies in at least one horizontal direction along the layer plane. Element according to claim 32, which is organic electro-optical element, in particular as organic, light-emitting Diode is formed, wherein the functional layer at least one having organic, electro-optical material. An element according to claim 32, formed as an electrochromic Element, wherein the at least one functional layer at least one electrochromic layer comprises. The element of claim 34, wherein the electrochromic layer comprises WO _x , NiO _x , VO _x and / or NbO _x . The element of claim 32, wherein the at least one Functional layer comprises at least one photovoltaic layer. The element of claim 32, wherein the at least one Functional layer at least one doped semiconductor layer, in particular a double-layer system with a p-doped and an n-doped one Semiconductor layer comprises. An element according to any one of the preceding claims, wherein the first and / or second electrode layer in the edge regions a contact surface for applying or tapping an electrical voltage. An element according to any one of the preceding claims, wherein the light exit and / or light entry surface of the element when applied a voltage with the value of a given operating voltage ± 10% between the first and the second electrode layer substantially one given functionality distribution having. An element according to any one of the preceding claims, wherein the light exit and / or light entry surface of the element a substantially uniform distribution of functionality having. An element according to any one of the preceding claims, wherein the distribution of functionality is a luminance distribution. An element according to any one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane at least at one point of the layer plane is minimal and in at least a horizontal direction from the at least one point to the edge the layer increases substantially. An element according to any one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane at least at one point of the layer plane is minimal and in at least a horizontal direction from the at least one point to the edge the layer is substantially square with the distance from which increases at least one point. An element according to any one of the preceding claims, wherein the resistance of the resistance matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane has a profile which is substantially proportional to

A: Uniform sheet resistance of the electrode layer provided as an anode, K: Uniform sheet resistance of the electrode layer provided as a cathode, r: Distance along the layer plane to an excellent point or curve in the layer plane, in the excellent point or along the excellent curve, the resistance the resistance matching layer is minimal perpendicular to the layer plane, n: exponent with n> 0, in particular with n = 2, m: Relative weighting of the electrode resistances, in particular with m = 1. An element according to any one of the preceding claims, wherein the resistance of the resistive matching layer perpendicular to the layer plane in at least one horizontal direction along the layer plane has a characteristic substantially defined by the equation

A: Uniform sheet resistance of the electrode layer provided as an anode, K: Uniform sheet resistance of the electrode layer provided as a cathode, r: Distance along the layer plane to a drawn-out point or one excellent curve in the layer plane, wherein in the excellent point or along the excellent curve, the resistance of the resist matching layer perpendicular to the layer plane is minimal, C ₁ , C ₂ : constants n independent of the distance r: exponent with n> 0, in particular with n = 2, m: Relative weighting of the electrode resistances, in particular with m = 1. An element according to any one of the preceding claims, wherein the at least one resistance matching layer by means of a fluid Coating material is applied. The element of claim 46, wherein the at least one Resistance matching layer by spin coating or dip coating is applied. The element of claim 46, wherein the at least one Resistive adjustment layer through - printing by means of an inkjet Printhead - Printing by flexo printing or gravure printing, - Printing by screen printing or - spray through a mask is applied. An element according to any one of the preceding claims, wherein the at least one resistance matching layer by physical Vapor deposition, in particular by vapor deposition or sputtering, or by chemical vapor deposition, in particular plasma-induced chemical vapor deposition is applied. An element according to any one of the preceding claims, wherein the at least one resistance matching layer layer areas with different layer thickness and / or different layer composition and / or different layer morphology. Element according to any one of the preceding claims, wherein the at least one resistance matching layer, at least one of the materials ITO, SnO _x, InO _x, ZnO _x, TiO _x, a: CH, doped Si, PEDOT, PEDOT / PSS, PANI, anthracene, Alq ₃ , TDP, CuPu or NPD. An element according to any one of the preceding claims, wherein the at least one resistance matching layer as a hole conductor layer is trained. An element according to any one of the preceding claims, wherein the first and second electrode layers have different work functions exhibit. An element according to any one of the preceding claims, wherein the first and / or the second electrode layer at least partially is transparent, and in particular indium tin oxide. An element according to any one of the preceding claims, wherein the first and / or second electrode layer is formed as a metal layer is. Element according to one of the preceding claims by at least one hole injection layer and / or an electron blocker layer and / or a hole blocker layer and / or an electron conductor layer and / or a hole conductor layer and / or an electron injection layer. Element according to one of the preceding claims by at least one ion conductor layer and / or an ion storage layer. Element according to one of the preceding claims by a light absorption layer, in particular a color-neutral Light absorption layer, with horizontally along the layer plane varying light absorption properties. Element according to one of the preceding claims by an at least partially reflective layer or at least partially reflective layer system. Element according to one of the preceding claims by an at least partially non-reflective layer or at least partially anti-reflective coating system. Element according to one of the preceding claims by a substantially symmetrical, in particular rectangular, round or oval, shape of the light exit and / or light entry surface. Element according to one of the preceding claims through a light exit and / or light entry surface with free, non-symmetrical shaping. An element according to any one of claims 61 or 62 through a light exit and / or light entry surface, which comprises at least one acute-angled region. Method for producing a coated substrate, comprising the steps: - Provide a substrate, - Apply at least one electrode layer, - Apply at least one Resistance matching layer on the substrate, which has an electrical resistance perpendicular to the layer plane, in the horizontal direction along the layer plane varies, with at least a part of the Electrode layer as a contact surface is provided and the resistance profile of the resistance matching layer from sheet resistance the electrode layer and the arrangement of the at least one contact area depends. The method of claim 64, wherein applying the at least one electrode layer, the application of an at least partially transparent, electrically conductive layer comprising in particular indium tin oxide having. Coated substrate for producing an electro-optical Element, in particular produced by a method according to one the claims 64 or 65, characterized by at least one electrode layer and a resistance matching layer, which is an electrical Resistance perpendicular to the layer plane, in horizontal Direction varies along the layer plane. A coated substrate according to claim 66, characterized characterized in that the substrate is glass, especially soda lime Glass, a glass ceramic and / or a plastic, in particular a barrier coated plastic, and / or combinations thereof. Coated substrate according to any one of the preceding Claims, wherein the electrode layer is at least partially transparent, and in particular indium tin oxide having. Use of a substrate according to one of claims 66 to 68 for producing an electro-optical element, in particular a photovoltaic element, a photochromic element, a optoelectronic sensor, an OLED or a PLED. Use of an electro-optical element according to any one of claims 32 to 63 - as a lighting means, or - as a lighting means, or - as a notice or lighting panel or - as variable information sign, or - as a switch or sensor lighting or - as a high or low resolution display , or - as a digital billboard or billboard or - in illuminated floors or light tables or - as a light surface for ambient lighting or - for backlighting of displays or - for special lighting, especially in microscopy, - for signaling or lighting, especially in the automotive, aviation, shipping or household sector, - as a photovoltaic element , As an optoelectronic sensor, as a liquid crystal element, as an electrochromic window element, or as an electrochromic mirror.