DE102005005409B4 - Working method of a sorption machine - Google Patents

Abstract

Working method of a sorption plant for a dual-substance mixture of working medium and sorbent, which essentially comprises:
A HK-Hochdruckaustreiber (1) for the expulsion of a mixed vapor of working fluid and sorbent from a rich HK solution (15),
A rectifier (2) or a HK-output column (16) for the formation of almost pure working medium high-pressure steam (17),
A steam superheater (30) for overheating the almost pure working medium high-pressure steam (17),
A work-performing expansion machine (31) for the relaxation of the working medium vapor,
and a main circuit with
An HK low-pressure absorber (7) for absorption of the HK low-pressure steam (18),
A HK solution heat exchanger (19) for heat exchange between poor HK solution (14) and rich HK solution (15),
characterized in that an additional circuit having the following features is added to the main circuit:
(a) the working medium high-pressure steam flows (017) of the main and auxiliary circuits are led jointly from the rectifier (2) to the expansion machine (31) used jointly by the main and auxiliary circuits,
(b) with removal or tapping of ZK medium-pressure steam (29) from the expansion machine ...

Description

The The invention relates to a method of operation of a sorption plant the absorption force cycle (absorption power cycle) for a binary mixture with main and auxiliary circuit.

sorption with binary mixtures have long been state of the art (Wilhelm Nibergall: sorption chillers in: Rudolf Plank: Handbook of Refrigeration Volume VII (1959); Cube, Steinle, Lotz, Kunis: Lehrbuch der Kältetechnik (1997)). For many mixtures, the sorbent has one for the process significant own vapor pressure on. For absorption fluids the closer the normal boiling points, the stronger the vapor pressure of the sorbent of working fluid (refrigerant) and absorbents are together. It becomes the sorbent evaporated in certain subsets together with the working fluid, if liquid Sorption mixture heat is supplied.

Around the unfavorable Influence of co-expelled sorbent is turned off subjected the expelled vapor mixture to rectification.

The Working fluid Ammonia and the sorbent Water is used for the absorption power cycle to generate electricity known. The cycle is based on the more than one hundred years old absorption cycle development on. Such circuits characterized by efficient conversion of heat into mechanical Work out. In most cases The generated mechanical work is converted into electricity.

To the essential aggregates for Counting sorption plants Expeller and absorber. The embodiments of expeller hang also from the state of aggregation of the heat source and the materials used. Is this heat as waste heat or by hot liquids to disposal, at least for larger facilities with the ammonia-water system the expeller as the absorber built from several superimposed pressure vessels. Flow through this the vapors in countercurrent to the solutions the individual apparatuses in succession. Air and other foreign gases interfere with operation and efficiency of absorption refrigeration systems. Therefore, well-functioning venting systems have been developed. Absorption plants with the working substances ammonia and water also operated in the negative pressure.

Absorption Force Circuits considered more suitable than steam Rankine, Organik Rankine, Ammonia Rankine, binary Ammonia-water Rankine cycles, though the temperature of the heat source with increase of the extracted heat falls (e.g. Flue gas) and whose maximum temperature is below about 300 ° C to 350 ° C. (Review by Erickson, D.C. et al., Heat Activated Dual-Function Absorption Cycle "at ASHRAE-SYMP-00138 New Orleans (2004) at www.energy-concepts.com/pdf/SYMP-00138-2003_R2.PDTF).

Have absorption cycles the property that the temperature of the solution rises when steam out you are expelled. This makes it possible to introduce heat to evaporate over the corresponding Temperature range. For Heat sources, which are characterized by a sliding temperature gradient, means that a thermodynamic advantage. It can take more energy out of it Transfer heat source be on the evaporating liquid mixture with limited exergy losses and this can make more work out be gained in the cycle.

In US 4,819,437 It is proposed to transfer gas turbine exhaust instead of to a steam cycle with the medium of water to a binary mixture - calculated with ammonia and water - to reduce the evaporation temperature, whereby the area without temperature increase of the heat-absorbing medium relative to the other areas of overheating and preheating significantly decreases , To adapt to the steadily decreasing temperature curve of the gas turbine exhaust gas, a multi-pressure process is provided in the binary mixture. However, at least the intended two-substance mixture ammonia / water for the intended temperature range (maximum 510 ° C) as unsuitable, because the stability limit of ammonia is far exceeded (in solutions with water 180 to 200 ° C, as steam to 300 ° C).

In DE 40 03 446 A1 a process for power generation in the low temperature range is called: By means of a washing condenser, the condensate heat of a lower-boiling substance by means of heat and mass transfer to the evaporation of a higher-boiling substance to be transferred. Without external supply of higher-grade heat, the heat of condensation should be pumped up again after evaporation of the vapor to evaporate before the relaxation. It is doubted that the method can be implemented in practice.

• a) Vor allem Zyklen mit niedrigen Anteilen des Arbeitsmittels in der reichen Lösung produzieren arbeitsmittelarme Dämpfe (z.B. Ammoniakanteil um 85 %). Um übermäßige Nässe in der Expansion zu vermeiden, muss eine Rektifikation hinter die Verdampfung geschaltet oder der Dampf auf Spitzenaustreibungstemperaturen überhitzt werden. Letzteres be deutend eine Abweichung von einer engen Anpassung an den Fall der stetig fallenden Temperatur, wenn nicht kostspielige Zwischenerhitzungen zusätzlich eingebaut werden.
• b) Obwohl der Ausdampfungsvorgang aus dem Flüssigkeitsgemisch über einen großen Temperaturbereich stattfindet, ist er nicht linear: Es wird mehr Wärme am kalten Ende als am warmen Ende benötigt. Gleichzeitig könnte im Austreiber im wärmeren Entgasungsbereich mehr Wärme als im kälteren Entgasungsbereich zur Verdampfung verarbeitet werden. Eine thermodynamisch optimale Ausnutzung der Wärmequelle bedingt eine Abnahme der auszudampfenden Flüssigkeitsmenge im Fall der stetig fallenden Temperatur.
• c) Die enge Anpassung der Verdampfung an den Fall der stetig fallenden Temperatur ist selber eine Funktion der Prozessführung geführt wird. Mit Gleichstromverdampfung ist die Anpassung begrenzt auf die Differenz zwischen Siede- und Taupunkt.
• d) Das untere Temperaturende des Austreibungsvorganges ist gewöhnlich so warm, dass eine beachtliche Wärmemenge in der Quelle verbleibt, selbst bei Aufwärmung des Flüssigkeitsgemisches vor Eintritt in den Austreibungsvorgang. Es sind besondere Kreislaufschaltungen erforderlich, um solche Wärme mitnutzen zu können.
• e) Die Absorptionswärmeabfuhr ist ebenso nicht-linear. Sie benötigt einen höheren Durchfluss des Kühlmittels verglichen mit linearen Abfuhrszenarien.
• f) Zumindest bei Kreisläufen mit Ammoniak und Wasser kann bei der Wahl eines geringeren Anteils von Ammoniak in den Lösungen die gleiche Wärmequelle bis auf ein Temperaturniveau ausgenutzt werden, indem ein niedrigerer Ein- und Ausgangsdruck gewählt wird. (z.B. 10 bar auf 1 bar statt 30 bar auf 3 bar). Damit kann grundsätzlich mehr Arbeit aus der Wärmequelle entnommen werden. Allerdings steigt gegenläufig der Anteil des mitausgetriebenen Wasserdampfes und damit die Rückkühlwärme für die Rektifikation.
• g) Zumindest bei Kreisläufen mit Ammoniak und Wasser kann bei Wahl eines geringeren Anteils von Ammoniak in den Lösungen mehr Kälte aus dem Dampf nach der Entspannung mittels eines Dampfkühlers entnommen werden.
• h) Zyklen, die einen merklichen Anteil des Arbeitsmittels im ausgetriebenen Dampf produzieren, können mit einem Rektifikator versehen werden. In ihm wird nahezu reiner Arbeitsmitteldampf erzeugt. Der Rückkühlwärmebedarf aus einem Rektifikationsprozess kann die gewinnbare Arbeit erheblich negativ beeinflussen. Für die Nutzung der Rückkühlwärme müssen geeignete Lösungen gefunden werden. Bekannt ist eine Übertragung der Rückkühlwärme an die aufzuwärmende reiche Lösung. Das ist jedoch eine energetische Scheinlösung, da der nahezu gleiche Effekt auch durch eine Rückführung der reichen Lösung durch den Absorber erreicht werden kann.
• i) Zyklen, die das Arbeitsmittelpaar vollständig verdampfen, haben das Problem, dass lösliche Spurenelemente im heißen Teil des Verdampfers sehr konzentriert werden und dort korrosiv wirken sowie die Wärmeaustauschbedingungen schwierig gestalten.

The aforementioned absorption cycles have specific factors that limit the degree of adaptation in the event of a constantly decreasing temperature and thus the recoverable useful work:

• a) Especially cycles with low levels of working fluid in the rich solution produce ar low-medium vapors (eg ammonia content by 85%). To avoid excessive moisture in the expansion, a rectification must be switched after evaporation or the vapor overheated to peak expulsion temperatures. The latter means a deviation from a close adaptation to the case of constantly falling temperature, if not costly Zwischenerhitzungen be additionally installed.
• b) Although the evaporation process takes place from the liquid mixture over a wide temperature range, it is not linear: more heat is needed at the cold end than at the warm end. At the same time more heat could be processed in the expeller in the warmer degassing than in the colder degassing for evaporation. A thermodynamically optimal utilization of the heat source causes a decrease in the amount of liquid to be evaporated in the case of constantly falling temperature.
• c) The close adaptation of the evaporation to the case of the constantly falling temperature is itself a function of the process control is led. With DC evaporation, the adjustment is limited to the difference between boiling and dew point.
• d) The lower temperature end of the expulsion process is usually so warm that a considerable amount of heat remains in the source even when the liquid mixture is heated before entering the expulsion process. There are special circulation circuits required to share such heat can.
• e) The absorption heat removal is also non-linear. It requires a higher flow of coolant compared to linear discharge scenarios.
• f) At least in circuits with ammonia and water can be used in the choice of a lower proportion of ammonia in the solutions, the same heat source to a temperature level by a lower input and output pressure is selected. (eg 10 bar to 1 bar instead of 30 bar to 3 bar). This basically allows more work to be taken from the heat source. However, the proportion of co-expelled water vapor and thus the recooling heat for rectification increases in opposite directions.
• g) At least in circuits with ammonia and water can be removed with a smaller proportion of ammonia in the solutions more cold from the steam after relaxation by means of a steam cooler.
• h) Cycles that produce a significant proportion of the working fluid in the expelled steam can be provided with a rectifier. In it almost pure working medium vapor is generated. The recooling heat requirement from a rectification process can significantly negatively affect the work that can be recovered. For the use of the Rückkühlwärme suitable solutions must be found. A transfer of the recooling heat to the rich solution to be heated is known. However, this is an energetic sham solution, since the almost same effect can also be achieved by recycling the rich solution through the absorber.
• i) Cycles that completely vaporize the pair of working materials have the problem that soluble trace elements in the hot part of the evaporator become very concentrated and corrosive, and make the heat exchange conditions difficult.

The absorption-force cycle avoids, among other things, the circulation-specific reduction factor listed under item i). To this cycle belong the circuit circuits according to US Pat. No. 6,269,644 and US Pat. No. 6,715,290 B1 , The circuit according to US Pat. No. 6,269,644 It also makes it possible to exploit a heat source to a low level by using higher temperature heat in a common expeller and, in the lower temperature range, first to a highly enriched solution (> 90% NH ₃ ), then to a medium pressure expander. From the warmer part of the low-pressure absorber, heat is transferred indirectly via a solution to the intermediate pressure expeller and the vapor generated in it by expulsion from a substream of the rich solution is transferred to a second absorber. There, the steam is converted to the highly enriched solution. By taking advantage of the low boiling temperature of this highly enriched solution, high pressure steam can be generated below the temperature range of a conventional expeller (with significantly less of the working fluid in its rich solution). The repeated heat transfer requires increased equipment costs. The principle borrowed from the refrigeration technology of the overflow temperatures of expeller and absorber also has the advantage that for the rich solution that is introduced into the usual expeller, a high proportion of work equipment (eg 55%) can be selected. This makes a rectification superfluous. Due to the heat recovery from the absorber, however, the relaxation at low pressures is dispensed with. For the range of lower working medium proportions, working medium steam could be absorbed at low pressure levels, but then the heat dissipation takes place at a lower temperature level. The requirements of points a, d, i are well met, those of point h are bypassed, but the requirements of points f and g are not. In a circuit according to US Pat. No. 6,715,290 B1 the entire poor solution is enriched in a medium pressure analogue absorber. As a result, the heat absorption in the first expeller is shifted to lower temperatures.

A Solution, as mentioned under point b) Circulation-specific reduction factor can be bypassed is not in the known proposals contain.

has the external heat source to be exploited a constant temperature or low temperature spread, so is not a big one Entgasungsbreite between rich and poor solution necessary. The circulation can in the range of relatively high proportion of working medium (for example 50% ammonia in the rich solution) or lower working agent content (e.g., 35% ammonia in the rich solution) operate. In the latter case would be with a high rectification effort and correspondingly high return heat to be expected and this represents a loss size in the prior art, Such a choice is not recommended so far. In this case, step the factors listed under points b) to d) and h) are not on or are little relevant.

These However, statement does not apply when in the absorption force cycle relaxed ammonia vapor for use of cold (by its heating) used (Review by Feng Xu, et al .: "A combined power / cooling cycle" in Energy 25 (2000) Pp. 233-246). Here, the cold low-pressure steam by means of a steam cooler, the Cold ready. A condenser and evaporator are not provided. This circuit circuit is in particular on the use of a heat source with only limited Temperature spread provided. The use of cold is only possible if the relaxation with low pressure ends. This is with high ammonia levels in the rich solution unavailable. This requires a rectification, where the recooling heat one noticeable order of magnitude assumes and according to the prior art noticeably negative affects the efficiency of the system.

It is also proposed an alternative power or refrigeration (Erickson et al., supra). In this case is as a main aggregate a heat recovery unit, an expeller, a heat exchanger, an absorber, a turbine plus generator, a condenser and a Evaporator provided. In both proposals mentioned above an overheating provided the almost pure working medium vapor.

As an important application of the absorption force cycle, the use of heat from gases is considered. For them, there are usually strict limitations on the allowable pressure loss in heat transfer. The transfer geometry of an effective expulsion, however, is less suitable for this purpose. A direct transfer of heat from the flue gas to the sorbent would be very large and expensive. An intermediate transmission circuit requires a twofold temperature difference between flue gas heat and sorption solution in the expeller. As a proposed solution, the use of a so-called heat recovery vapor generator is known. With him, a vapor / liquid mixture is generated by external heat transfer to a sorption. The mixture is separated in an internal separation apparatus into steam and poor liquid. It is advantageous that in the heat transfer no large pressure losses occur in the heat-emitting flue gas. It is after US Pat. No. 6,584,801 and US Pat. No. 6,715,290 B1 have been proposed to pass the poor liquid together with the steam in countercurrent to the rich solution by an internal expeller. Here, on the one hand, the separated steam is rectified, on the other hand, steam expelled from the rich solution. In order to extend the range of application via the temperature difference between boiling and dew point of the two-component mixture used in each case, is in US Pat. No. 6,715,290 B1 proposed to use a vapor / liquid separator and a second heat recovery vapor generator, wherein the separator from the steam to the center of the internal expeller is passed and only from the separator effluent at higher temperature steam is expelled. As an additional advantage is called that the technically problematic estimated full evaporation - as it is applied in the so-called Kalinaverfahren - is avoided.

Becomes Ammonia used as a working medium, can be used to relax steam turbines be used. These must only slightly be adjusted. Such turbines are often called back pressure turbines with the previous removal or tapping of a vapor stream (e.g. used as heating turbines). This technique is easier to do than the turbine to supply steam in different pressures for relaxation. Ammonia-water vapor mixtures tend in relaxation to the condensation of water. Such turbines can handle but only a limited amount of liquid water. It is advantageous To design the circuit so that the turbine almost pure ammonia vapor supplied becomes. This may require a rectification of the expelled vapor become. This is especially true when down to low pressures (to Near ambient pressure) should be relaxed. With the rectification process According to the prior art would be this with considerable efficiency losses of the total absorption Power Cycle connected.

For many the above cycle-specific reduction factors would be a rectification of the expelled fumes a suitable circumvention measure, if that did not create a new loss size.

The Rectification device has the task of vapor and liquid to contact: Usually this happens in a rectification column. The mixture to be separated will over abandoned an inlet, which is located in any column height. From refrigeration is known for that in the absorption-force cycle suitable two-substance mixture ammonia and water in the so-called stripping section - below the feed point located - essential favorable Exchange conditions are given as in the so-called reinforcement part. The reason is the much higher amount of liquid in the reinforcement section to watch. Technically, this has the effect that in the stripping section cost-effective single-stage packing columns can be used in the reinforcement section however, more expensive Columns with more floors necessary. In the reinforcing column is in several contact floors in countercurrent of a liquid Return current with the rising vapor stream a gradual enrichment of lower boiling fraction reaches the top. This countercurrent sets a return generation preceded by partial condensation. As a rule, the return cooler (steam cooler, gas cooler) is above the Reinforcing column arranged. It may also be a partial stream of the condensate of the generated working medium vapor in the column head as reflux serve. In younger Time the rectification is carried out in horizontal pressure vessels. Of the returns makes, as it were, always a self-contained cycle between expeller, gain column and return cooler through, and the refrigerant contained in it goes for the Use of cooling capacity lost.

at Two-component mixtures with their own vapor pressure of the sorbent are available those of the heating surfaces rising vapors - from the Type of binary mixture or even of the type of expeller dependent - only after they are the stripping column have gone through in phase equilibrium with the boiling rich solution. Increases the proportion of the solvent in the rich solution As the proportion of the solvent in the expelled increases Mixed steam on. This increases the needed Return quantity. Characteristic is - at least for the Combination ammonia and water - that the required return flow relative to a medium concentration in the rich solution remains low, but then with decreasing concentration of the rich solution rises quickly. According to the state of the art, for example, the in the return heat generation accumulating condensation heat considered as a loss size become. True, she becomes common for warming the rich solution used, this warming can but approximately with the same effect by recycling the rich solution passed through the absorber become.

By release-side Connected in series of two absorbers can be two different Serve evaporation pressure levels from a heat source. this has the advantage that the working medium vapor of the lower evaporation level, too on condition of higher Evaporation stage with their lower reflux requirement in the rectifier is produced. The disadvantage is that this property only up to a load distribution 50/50 is present, in addition, the heat sink conditions again. Furthermore the lower evaporation temperature should only be between 10 to 30 K are below the top.

In the refrigeration technology are cycles known to have a two-time expulsion and a two-time absorption have a big one Temperature stroke to be carried out in two stages. The two times external heat is only a one-time use of cold across from. However, the area of minor work equipment in the rich solution avoided. Thus, the Rückkühlwärme a sinks Rectification.

It is known that with the so-called overlap of the temperatures of expeller and absorber the rich solution with a relatively small share of the solvent enters the process of expulsion and thus a relatively small one Return produce is required. However, the equipment required for the heat exchange is considerable.

A further loss size of the sorption plant is due to the different inlet and outlet temperatures of poor and rich solution effected in expeller and absorber. These losses can in principle by a return of the rich solution be reduced by the exporter. A return of the poor solution by Although the expeller is also known leads to the state of the art however, no further reduction of the outside process in the exporter supplied Warmth. This is due to that arranged in the process engineering between expeller and absorber Solution heat exchanger the amount and thus the heat capacity of the heat-emitting poor solution is smaller than that of the warming up rich solution.

Recooler work in the field of steam cooling with very poor heat transfer, the return generation leads therefore too elaborate technical solutions. It has been proposed, the partial condensation of the working medium vapor within the rectifier in a cooled liquid bath (with significant better conditions for the heat transfer). A However, process efficiency improvement does not occur at the same time.

The same also applies to another suggestion, in a bypass return resorber - i. on High pressure level - one Partial flow of the rich solution highly saturated by means of absorbed working fluid vapor and as a return to the rectifier (DD WP 251 195). It is reported in this proposal that the Heat transfer coefficients in the return absorber considerably higher - 3 to 4.2 times higher as a dephlegmator and the construction costs accordingly cheaper fail.

It Another method is known in which also enriched solution is introduced into the rectifier, that in freezers leads to a significant increase in process efficiency (High Temperature-Lift Ammonia-Water Heat Pumps at www.glue.umd.edu/~herold/projects/prosumaw.html): The enriched solution is formed in an absorber based on medium pressure. In him is absorbed working medium vapor, which is separated by the Working fluid on Medium pressure is throttled. This agent vapor does not contribute for cooling at. The absorbing solution will be on Low pressure level - in one Reverse reverse formed by a partial flow of rich solution after heating in the solution heat exchanger while processing a portion of the low pressure steam under external heat is enriched further. The processed low-pressure steam is formed in (low pressure) evaporator with cooling and increased thereby the overall efficiency of the plant. The disadvantage is that several additional ones Apparatus and two additional solution pump required are. Here, a reverse rectifier is unusual. The process circuit is on the production of cold aligned at a uniform temperature level.

The Design of the expeller can influence the solvent content in the expelled mixed steam and thus also have an influence on the size of the resulting Re-cooling heat in the rectification process. In this regard, and for the size of the external heat is the cheapest a countercurrent flow from heat source on the one hand and mixed steam and solution on the other hand. This is e.g. achieved by means of sprinkled tube bundle carrier. Have plate heat exchanger Although lower construction costs and a very good heat transfer at countercurrent flow of solution and heat source on, however, then it is for the mixed vapor and the solution a DC guide given with a higher Solvent content in mixed steam. With a rectification, the demand for recooling would be correspondingly higher and adversely affect the efficiency of an absorption-force cycle impact.

In the heat pump technology is known by means of Resorberkreislauf or heat transformation cycle supplied Heat up medium temperature level partially raise to a higher temperature level.

task The invention is to provide a working method in which the under the points a) to i) reduction factors of an absorption-force cycle avoided or their negative effects are diminished and here the construction costs for the for to keep the process used sorption limited.

The solution The task can be found in several independent claims. advantageous Further developments are formulated in the respective subclaims.

The inventive working method and associated Circuit circuits include to the type of absorption-force cycle (English: absorption power cycle). According to the invention becomes one basically according to the prior art formed cycle - in the following main cycle called or more of such circuits at least one additional circuit added.

basics Features include the fact that each circuit is designed to that they gradually through additional Features of the use of a heat source limited temperature spread to such with very high temperature spread is extended. additionally is also the aspect of alternative cold and power generation (cold-power coupling) covered.

• • Das erste Anliegen ist die Ausgestaltung des Arbeitsverfahrens mit Zusatzkreislauf, um die beim Rektifikationsvorgang anfallende Rückkühlwärme nutzstiftend in den Absorptions-Kraft-Zyklus einzubauen (Schaltungstyp I). Die grundsätzlichen Lösungen finden sich im 1. oder 2. Anspruch.
• • Das zweite Anliegen ist die vorteilhafte Weiterführung der ersten Aufgabe durch eine differenzierte externe Wärmezufuhr an Haupt- und Zusatzkreislauf (Schaltungstyp II). Die grundsätzlichen Lösungen finden sich im 4. und 5. Anspruch und den zugehörigen Unteransprüchen.
• • Das dritte Anliegen ist die vorteilhafte Weiterführung der ersten und zweiten Ausgestaltungen, wobei die Wärmeausnutzung im unteren Bereich der Temperaturspreizung der externen Wärmequelle (Schaltungstyp III) ausgenutzt wird. Die grundsätzlichen Lösungen finden sich im 13 und 14. Anspruch und den zugehörigen Unteransprüchen.

The essence of the invention can be formulated in three concerns:

• • The first concern is the design of the working process with additional circulation, in order to incorporate the recooling heat arising during the rectification process into the absorption-force cycle (circuit type I). The basic solutions can be found in the 1st or 2nd claim.
• • The second concern is the advantageous continuation of the first task by a differentiated external heat supply to main and auxiliary circuit (circuit type II). The basic solutions can be found in the 4th and 5th claim and the associated dependent claims.
• The third concern is the advantageous continuation of the first and second embodiments, wherein the heat utilization in the lower part of the temperature spread of the external heat source (circuit type III) is utilized. The basic solutions can be found in the 13th and 14th claims and the associated subclaims.

• • Das obere Druckniveau des Zusatzkreislaufs entspricht dem des Austreibers und Rektifikators des Hauptkreislaufes.
• • Das untere Druckniveau des Zusatzkreislaufs (im folgenden mit Mitteldruck bezeichnet) liegt zwischen Austreiber- und Absorberdruckniveau des Hauptkreislaufes.
• • Der Arbeitsmittelhochdruckdampf des Zusatzkreislaufs stiftet Nutzen über den Weg Entspannungsmaschine, alternativ auch über den Weg Kondensation und Verdampfung.
• • Die Nutzung des Arbeitsmittelhochdruckdampfes von Haupt- und Zusatzkreislauf beginnt auf gleichem Druck- und Temperaturniveau.
• • Der Arbeitsmittelhochdruckdampf des Zusatzkreislaufs wird der Entspannungsmaschine auf mittlerem Druckniveau entnommen.
• • Der Arbeitsmittelhochdruckdampf des Zusatzkreislaufs wird in einem ZK-Mitteldruckabsorber von dessen armer Lösung absorbiert.
• • Der Anteil des Arbeitsmittels in der reichen Lösung des Zusatzkreislaufs liegt deutlich höher als in der reichen Lösung des Hauptkreislaufes.
• • Die reiche Lösung (reich an Arbeitsmittel) des Zusatzkreislaufs wird in den kalten Teil eines Rektifikators oder einer Abtriebssäule eingeleitet, wodurch ein Wärme- und Massenaustausch mit dem Mischdampf des Hauptkreislaufes erfolgt. Hierbei wird die sonst notwendige Rückkühlung im Hauptkreislauf ersetzt.
• • Das nahezu reine Arbeitsmittelflüssigkeit des Zusatzkreislaufs wird von der entsprechenden Arbeitsmittelflüssigkeit des Hauptkreislaufs spätestens nach dem Kondensator abgetrennt.
• • Die arme Lösung des Zusatzkreislaufs wird im Bereich des mittleren oder warmen Temperaturniveaus aus dem Rektifikator entnommen oder erst nach dem Niederdruckabsorber des Hauptkreislaufes von der reichen Lösung des Hauptkreislaufes abgetrennt.
• • Im Lösungswärmeaustauscher verbessert sich die Bilanz der wärmeabgebenden armen Lösung des Hauptkreislaufes zu der wärmeaufnehmenden reichen Lösung des Hauptkreislaufes. Es muss nicht die gesamte Wärme der armen Lösung an die reiche Lösung übertragen werden. Potentiell besteht nun die Möglichkeit, durch Nutzung der Wärme der armen Lösung (des Hauptkreislaufes) die externe Wärmezufuhr zu entlasten. Dies geschieht durch die Rückführung der armen Lösung des Hauptkreislaufes durch den Hauptkreislaufaustreiber.

The first concern is the use of the recooling heat generated during rectification. According to the invention, a working method is proposed for this purpose, in which an additional circuit is added to a main circuit according to the prior art. For this purpose, the supply of the rich solution of the additional circuit in the cold end of the rectifier or a stripping column and the outfeed of the poor solution of the additional circuit from the warm end of the rectifier or a stripping column a key function and are characteristic feature of the circuit type I. For this purpose has the designed auxiliary circuit following essential features:

• • The upper pressure level of the auxiliary circuit corresponds to that of the expeller and rectifier of the main circuit.
• • The lower pressure level of the auxiliary circuit (hereinafter referred to as medium pressure) is between the generator and absorber pressure levels of the main circuit.
• • The working fluid high-pressure steam of the auxiliary circuit provides benefits over the way of expansion machine, alternatively via the way condensation and evaporation.
• • The use of the working medium high-pressure steam from the main and auxiliary circuits starts at the same pressure and temperature level.
• • The working medium high pressure steam of the additional circuit is taken from the expansion machine at medium pressure level.
• • The working medium high-pressure steam of the auxiliary circuit is absorbed in a ZK medium-pressure absorber by its poor solution.
• • The proportion of working fluid in the rich solution of the additional circuit is significantly higher than in the rich solution of the main circuit.
• • The rich solution (rich in working fluid) of the additional circuit is introduced into the cold part of a rectifier or a stripping column, whereby a heat and mass exchange with the mixing steam of the main circuit takes place. This replaces the otherwise necessary recooling in the main circuit.
• • The almost pure working fluid of the auxiliary circuit is separated from the corresponding working fluid of the main circuit at the latest after the condenser.
• • The poor solution of the additional circuit is removed from the rectifier in the range of the medium or warm temperature level or separated from the rich solution of the main circuit only after the low-pressure absorber of the main circuit.
• • In the solution heat exchanger, the balance of the heat-dissipating poor solution of the main circuit improves to the heat-absorbing rich solution of the main circuit. Not all the heat of the poor solution needs to be transferred to the rich solution. Potentially there is now the possibility, by using the heat of the poor solution (the main circuit) to relieve the external heat. This is done by the return of the poor solution of the main circuit through the Hauptkreislaufaustreiber.

• • In den Zusatzkreislauf wird mindestens ein ZK-Austreiber mit Abtriebssäule eingefügt.
• • Dieser oder diese ZK-Austreiber und der HK-Austreiber stehen unter dem gleichen Druckniveau.
• • Das Temperaturniveau der externen Wärmezufuhr an den oder die ZK-Austreiber wird niedriger als dasjenige des HK-Austreibers bestimmt.
• • Der im HK-Austreiber erzeugte Arbeitsmittelhochdruckdampf kann durch den ZK-Austreiber – zumindest durch dessen Abtriebssäule geleitet werden.
• • Die Nutzung des Arbeitsmittelhochdruckdampfes von Haupt- und Zusatzkreislauf beginnt weiterhin auf gleichem Druck- und Temperaturniveau.
• • Die reiche ZK-Lösung wird in das (jeweilige) kalte Ende der Abtriebssäule des (jeweiligen) ZK-Austreibers eingeleitet.
• • Die arme ZK-Lösung wird oberhalb des kalten Endes der Abtriebssäule des HK-Austreibers eingeleitet.

The second concern is to avoid when using a heat source with a larger temperature spread, a transformation of the heat from the upper temperature range to the lower and their lower value in the use. According to the invention, it is proposed for methods with circuits of type II that at least one own expeller is inserted in the additional circuit, this works in the range of higher working components in its solutions than the main circuit and that the amount of poor solution of the additional circuit is less than the amount of rich solution of the main circuit. These three key functions are characteristic features of the circuit type II. Thus, the additional circuit described above for the second concern receives a further embodiment by the following significant, additional features:

• • At least one ZK expeller with output column is inserted in the additional circuit.
• • This or these ZK exporters and the HK expeller are at the same pressure level.
• • The temperature level of the external heat supply to the ZK expeller (s) is determined to be lower than that of the HK expeller.
• • The working medium high-pressure steam generated in the HK-generator can be led through the ZK-generator - at least through its output column.
• • The use of the working medium high-pressure steam from the main and auxiliary circuits continues to start at the same pressure and temperature level.
• • The rich ZK solution is introduced into the (respective) cold end of the stripping column of the (respective) CC expeller.
• • The poor ZK solution is introduced above the cold end of the stripping column of the HK expeller.

For the expulsion At high pressure level, one of the set pressure and the working medium proportion the rich solution dependent Temperature level needed. The third concern is to have a heat source even below this Optimal use of temperature levels. According to the invention for the process proposed with circuits of the type III, that this by means of a ZK medium pressure drift or HK medium pressure drift happens.

• • Im Zusatzkreislauf wird ein ZK-Mitteldruckaustreiber oder es wird im Hauptkreislauf ein HK-Mitteldruckaustreiber eingefügt.
• • Für diesen zweiten ZK- oder HK-Mitteldruckaustreiber wird ein niedrigerer Druck als für die Hochdruckaustreiber des Haupt- und Zusatzkreislaufes bestimmt.
• • Das Temperaturniveau der externen Wärmezufuhr an den Mitteldruckaustreiber wird niedriger als dasjenige der Hochdruckaustreiber bestimmt.
• • Für die reiche Lösung, die dem ZK-Mitteldruckaustreiber zugeführt wird, wird dieselben Anteile von Arbeitsmittel und Lösungsmittel wie in der reichen Lösung des Hauptkreislaufes bestimmt.
• • Bei Einsatz eines HK-Mitteldruckaustreibers wird dem Hauptkreislauf zweimal externe Wärme zugeführt, mit entsprechend geringerer Konzentration von Arbeitsmittel in den zwischen Mitteldruck und Niederdruck umlaufenden HK-Lösungen im Vergleich zu den als zwischen Hoch- und Mitteldruck umlaufenden HK-Lösungen.
• • Der in den ZK- bzw. HK-Austreibern erzeugte Arbeitsmitteldampf wird in einem unter gleichem Druck stehenden ZK- bzw. HK-Mitteldruckabsorber absorbiert.
• • Die reiche Lösung, die dem ZK- bzw. HK-Mitteldruckabsorber zugeführt wird, weist einen deutlich höheren Anteil von Arbeitsmittel auf, als die reiche Lösung, die dem ZK- bzw. HK-Mitteldruckaustreiber zugeführt wird.
• • Die Entnahme von Mitteldruckdampf aus der Entspannungsmaschine und seine Absorption in einem Mitteldruckabsorber wird zugunsten der Entspannung bis auf Niederdruck und der Absorption auf Niederdruck zumindest verringert.

Its insertion and its integration into the ZK circulation or HK cycle represents the third key function and is characteristic Feature of circuit type III. Thus this additional circuit designed for the third request receives the following essential additional features:

• • In the auxiliary circuit, a ZK medium pressure actuator is inserted or an HK medium pressure actuator is inserted in the main circuit.
• • For this second ZK or HK medium pressure driver, a lower pressure is determined than for the high and low pressure actuators of the main and auxiliary circuits.
• • The temperature level of the external heat supply to the medium pressure actuator is determined to be lower than that of the high pressure compressor.
• • For the rich solution supplied to the ZK medium pressure expander, the same proportions of working fluid and solvent as in the rich solution of the main circuit are determined.
• • When using an HK medium pressure driver, the main circuit is supplied with external heat twice, with a correspondingly lower concentration of working fluid in the HK solutions circulating between medium pressure and low pressure compared to the HK solutions circulating between high and medium pressures.
• • The working medium vapor generated in the ZK or HK expeller is absorbed in a ZK or HK medium-pressure absorber under the same pressure.
• • The rich solution, which is supplied to the ZK or HK medium-pressure absorber, has a significantly higher proportion of working fluid, as the rich solution that is supplied to the ZK or HK medium pressure actuator.
• • The removal of medium-pressure steam from the expansion machine and its absorption in a medium-pressure absorber is at least reduced in favor of the relaxation to low pressure and the absorption to low pressure.

in the Following are the embodiments the invention explained with reference to drawings.

It 16 figures are attached.

The Figures show in detail:

1 a two-stage sorption plant according to the prior art with the present invention extended additional circuit for the use of the Rückkühlwärme,

2 Refrigeration in the main circuit and power generation in the auxiliary circuit,

3 Alternative cooling and power generation in the main circuit,

4 Extension of the additional circuit in such a way that its poor solution is introduced into the high-pressure main circuit driver,

5 Description of the invention in a diagram "minimum return heat vs. concentration of the rich solution",

6 External heat supply to the auxiliary circuit in a first ZK high pressure compressor,

7 Effects of the external heat supply by means of the "Heat Recovery Vapor Generator" on the auxiliary circuit,

8th Multi-stage relaxation and absorption in the additional circulation,

9 Extension of the additional circuit by a ZK medium pressure compressor,

10 Additional circuit with relaxation by means of a single pressure stage,

11 Steam overheating by means of a Resorberteilkreislaufes.

12 Steam superheating by means of a heat transformation process and alternative cooling and power generation

13 Twice external heat supply in the main circuit, one-off in the additional circuit and simplified integration of the resorb partial circuit.

14 Two external heat supply in the additional circuit at high pressure level, one time at medium pressure level

15 Two external heat supply in the additional circuit at high pressure level, one at medium pressure level and combined heat and power

16 Solution-side connection of two absorbers in the main circuit

In the 5 the energetic objective of the invention is illustrated. In the other figures, for better readability, the poor and rich solutions are shown respectively in main and auxiliary circuits with different signatures. In the following figures, the same parts of the system described in previous figures are marked with the same numbers. As far as steam or liquid of the main and auxiliary circuit overlap, the digit is preceded by a 0 (eg 017 instead of 17 ). If this happens through more than two streams, 00 is prefixed. If a steam or a liquid of the auxiliary circuit is performed alone, but with the same composition as the corre sponding steam or the liquid of the main circuit, a 2 (eg 217 instead of 17 ) prefixed. In addition, the main circuit with HK and its aggregates with the addition "HK" and the or the additional circuit circuits and their aggregates with the addition "ZK" is marked. For aggregates and solutions of a Resorberteilkreislaufes a "RK", preceded by those of a heat transformation subcircuit, a "WT". If the same unit is used in different circuits, no additional letter will be added if used in the additional circuit, and an a or b in the other cases. There are known in the prior art, different embodiments of the rectifier. As a simplification, either a rectifier always takes the form of a multi-tray reinforcing column (US Pat. 1 - 3 . 11 . 13 - 15 ) or it is the rectification only by means of output columns ( 4 . 6 - 10 ). In some cases, only one expeller will have a reinforcing column with trays ( 11 . 13 - 15 ) shown in the other output columns.

In the 1 is a absorption-force cycle according to the prior art (as already stated as the main circuit called) shown and expanded by the additional circuit according to the invention. The almost pure working medium high-pressure steam formed in the rectifier in both cycles ( 017 ) is placed in a steam superheater ( 30 ) (eg by means of a pipeline), the heat being supplied by an external heat source ( 5 ) provided. The superheated working medium high pressure steam ( 028 ) is a relaxation machine ( 31 ) and relaxed there, shown here for generating electricity by means of a generator ( 32 ).

The working medium vapors of the main circuit are from the additional circuit in the expansion machine ( 31 ) separated. The HK low-pressure steam ( 18 ) is reduced to low pressure and the HK Niederduckabsorber ( 7 ). Interposed can - as shown here according to a known proposal - a use of cold without condensation in a liquid cooler ( 33 ) respectively. The HK low-pressure steam ( 18 ) is heat released in HK-Niederdruckabsorber ( 7 ) from the poor HK solution (low in work equipment) ( 14 ). The rich HK solution ( 15 ) by means of a first HK solution pump ( 8th ) to the pressure level of the HK high pressure actuator ( 1 ) brought. The rich HK solution ( 15 ) is used for heat absorption by the HK low-pressure absorber ( 7 ), then the HK solution heat exchanger ( 19 ). Here is another warming in countercurrent to the poor solutions of both cycles. Subsequently, the rich ( 15 ) HK solution to the HK high pressure compressor ( 1 ) and there via a HK-output column ( 16 ). In the HK-Hochdruckaustreiber ( 1 ) is by a heat transfer medium from an external heat source ( 5 ) and additionally internally by the recycled ( 13 ) poor HK solution ( 14 ) Heat supplied. As a result, a mixed vapor of working fluid and solvent is generated. This mixed vapor is a reinforcing part of a rectifier ( 2 ). In several stages - here as Rectifier floors ( 3 ) - almost pure working medium high pressure steam and a reflux liquid are produced. The latter is inserted into the HK high-pressure 1 ). In the HK-Hochdruckaustreiber ( 1 ) by external heat supply ( 5 ) deprived of liquid working fluid. The resulting poor HK solution ( 14 ) is first detected by the HK high-pressure 1 ) ( 13 ), then the HK solution heat exchanger ( 19 ) and in countercurrent to the rich HK solution ( 15 ), then to the low pressure level by means of a first HK throttle ( 6 ) and finally the HK low-pressure absorber ( 7 ) and enriched there with heat release again.

The ZK medium-pressure steam ( 29 ) is only applied to medium pressure in the expansion machine ( 31 ) relaxed and removed from it by removal. This ZK medium-pressure steam ( 29 ) is the ZK medium-pressure absorber ( 22 ) and there with heat release from the poor ZK solution ( 20 ) absorbed. The in ZK medium-pressure absorber ( 22 ) formed rich ZK solution ( 24 ) by means of a first ZK solution pump ( 23 ) to the high pressure level of the HK high pressure driver ( 1 ) and the rectifier ( 2 ). This rich ZK solution ( 24 ) is first placed above the first exchange tray ( 4 ) of the rectifier. As a result of the supercooling of the rich ZK solution, it can extract heat from the rising refrigerant vapors and further rectify them. The predominant rectification takes place before. For this, the rich ZK solution ( 24 ) introduced into the upper cold part of the rectifier. This unites the liquid flows of both circuits. In the uppermost stage of the rectifier, a mass and heat exchange takes place between the rich ZK solution (introduced) and the mixture vapor fed from below, which, as is known, causes some of the mixture vapor to condense. This is delivered down and replaces the otherwise (according to the prior art) necessary supply liquid solvent. The poor CC solution ( 20 ) is calculated from the course of the last exchange stage of the rectifier ( 2 ). This can be controlled by a control valve. Thus, the liquid flows of both circuits are separated again. The poor CC solution ( 20 ) is determined by means of a first ZK throttle ( 21 ) lowered to medium pressure level and the ZK medium-pressure absorber ( 22 ). Previously, it is used to dissipate heat in countercurrent to the rich HK solution ( 15 ) by the HK solution heat exchanger ( 19 ) guided. The amount of additional cycle is meaningfully limited to the fact that they can absorb the dissipated during rectification Rückkühlwärme.

It in the following figures basically only the changes the circuit circuits opposite already described described.

In the 2 is shown as generated in the main circuit and cold in the additional circuit relaxation work is done. For this purpose, only the almost pure ZK-working medium high-pressure steam ( 217 ) in a steam superheater ( 30 ) and then overheated working medium vapor of the expansion machine ( 31 ). The heat supply for overheating is done by the poor HK solution ( 14 ). The poor HK solution ( 14 ) is then added to the HK solution heat exchanger ( 19 ). The almost pure HK-working-medium-vapor ( 17 ) is heat released in the HK capacitor ( 10 ) completely liquefied. The almost pure HK-working fluid ( 9 ) by means of the second HK throttle ( 11 ) brought to the low pressure level and with heat absorption in a HK evaporator ( 12 ) evaporates. The HK low-pressure steam ( 18 ) is the HK-low-pressure absorber ( 7 ). We conditions the limited heat absorption capacity of the steam to be overheated is expedient to heat the poor ZK solution in the rectifier limited. This is achieved by using its poor ZK solution ( 20 ) is removed from it before reaching the hot end of the rectification process. This solution is usefully applicable to larger systems and refrigeration demand only for one temperature level.

In the 3 is shown an alternative use for cooling or power generation. The refrigeration takes place as in 2 represented, the relaxation work as in 1 shown. In order to allow an alternative use of cold or power generation, shut-off valves ( 35 respectively. 36 ) provided to the two vapor streams ( 17 respectively. 017 ) to be able to control. In operating hours, in which the system should generate as much cold as possible, flows through the expansion machine ( 31 ) almost exclusively medium pressure steam, the low pressure part no steam or only a technically necessary minimum quantity.

In the following 4 and 6 to 15 the use of a heat source with linear temperature gradient is shown, starting from the 10 it is assumed that the heat source has no predetermined lower limit.

In the 4 the auxiliary circuit is extended so that its poor ZK solution in the HK-Hochdruckaustreiber ( 1 ) is initiated. Since the poor ZK solution and rich HK solution between expeller ( 1 ) and HK low-pressure absorbers ( 7 ) are guided in the opposite direction, partially cancel the amounts to be conducted in practice. The amount of this poor ZK solution is inventively less than that of the rich HK solution, so that a reduced amount of rich HK solution ( 015 ) between HK low-pressure absorbers ( 7 ) and HK high pressure expander ( 1 ).

In this type of circuit switching, the poor ZK solution ( 20 ) from the rich HK solution ( 015 ) after the HK low-pressure absorber ( 7 ) separated. Specifically, in the 4 shown that from the HK low-pressure absorber ( 7 ) the rich HK solution ( 015 ) and poor ZK solution ( 20 ) - optionally regulated by valves - is removed. The latter is carried out by means of a second ZK solution pump ( 51 ) raised to medium-pressure level and the ZK medium-pressure absorber ( 22 ). The rich ZK solution ( 24 ) is via a second HK-output column ( 47 ) first of the first HK-output column ( 16 ), then the HK high pressure actuator ( 1 ). With increasing proportion of the working medium vapor, which is at medium pressure of the expansion machine ( 31 ), the proportion of the rich ZK solution ( 24 ) at the expense of the rich HK solution ( 015 ). At the same time, the purity of the working medium high-pressure steam ( 017 ), but at a given maximum temperature of the heat source, the usable temperature range of the heat source and the recoverable power decrease. The latter is definitely higher than a single-circuit system.

The recovery of the heat required for the rectification can be further increased by using the rich HK solution ( 015 ) after the first HK solution pump ( 8th ) into a HK mainstream ( 015a ) and a HK side stream ( 015B ) and the HK mainstream ( 015a ) by the HK low-pressure absorber ( 7 ), the HK sidestream ( 015B ) by the ZK medium-pressure absorber ( 22 ) are returned for heat absorption. The division is made by a valve ( 41 ). Due to the reduced amount of the rich HK solution ( 14 ) passing through the HK solution heat exchanger ( 19 ), the heat capacity of the poor HK solution ( 14 ) free. It is determined by the known technique of recycling ( 13 ) in the HK high pressure compressor ( 1 ) are used to control the heat to be supplied from outside ( 5 ) to reduce.

In the 5 the invention is described in a diagram "minimum _{return heat} q _Rth vs. concentration _degree ξ 'of the rich solution". Due to incomplete rectification, a higher heat is needed in practice. The required minimum _{return heat} (q _Rth ) refers to 1 kg rectified steam of a single circuit. As a working medium is ammonia and as a sorbent Water subordinate. The required minimum return heat depends on the desired degree of purity of the rectified steam - here is assumed 99.8%. Since the proportion of co-expelled sorbent - here water - increases with pressure, the minimum return heat increases with the pressure. For an exemplary pressure of 10 bar, a working line is drawn. In it AP 1 and AP 2 are two working points. The operating point AP 1 should show the minimum return heat of a sorption process, which consists of only one cycle, with a low concentration of the working fluid ξ 'in the rich solution - in the example of 34%. This value is not chosen arbitrarily: As already stated, it is favorable to design the expansion process to low final pressures. The concentration of the rich solution also depends on the inlet temperature of the available cooling medium in the absorber at a given pressure. The degree of concentration of ξ '= 0.34 corresponds to a pressure of just over 1 bar and 20 ° C of the rich solution. When relaxing below the ambient pressure, make sure that no air gets into the system. In addition, the mentioned degree of concentration also represents a dividing line for the embodiment of the invention.

Of the Operating point AP 2 shows the minimum return heat in the situation of the insert the invention, ie a sorption process with main and auxiliary circuit, however, the minimum return heat is on the rectified amount of steam (1 kg) of a single circuit, whose rich solution is the the same amount of working fluid as the rich ZK solution. In the chosen one Example has the rich solution a concentration of the working fluid of 50% - both that of the auxiliary circuit as also that of the single cycle used for comparison. The otherwise present at the two operating points AP 1 and AP 2 Set minimum return heat each represents an energetic loss. In many cases, although the return heat to warming the rich solution used. In this case, the rich solution before entering the solution heat exchanger with the poor solution warmed up. However, this is not the only possibility of external heat supply. With the solution recycling by The absorber can be approximate the same effect can be achieved. In this respect, only an apparent reclamation given the return heat.

In the 5 was chosen for the working line as pressure 10 bar. Here the boiling temperature is 25 ° C and the specific evaporation trough is 1167 kJ / kg. In the expeller, further, the poor solution has to be reheated. The heat requirement is much lower. The heat to be supplied externally in the generator also increases by the recooling heat. From the comparison with the required Rückkühlwärme - as exemplified in the 5 is listed - can be estimated that added to the necessary for the evaporation of an almost pure working medium vapor external heat input to another about 20%, which are to be regarded as a loss in the prior art.

By Introduction of the rich CC solution becomes in the rectifier by substance and heat exchange the recordable heat implemented in temperature increase the ZK-working fluid and expulsion work of working medium steam from the rich ZK solution. at a single cycle would be at transition from AP 1 to AP 2 the difference of the minimum return heat only in additionally expelled Steam implemented.

This part of the invention is in all circuits - except for that of 6 and 16 - used to translate the reduced loss size into energetic benefits. The advantage gained can be different. A benefit is always given by the relaxation from high pressure to medium pressure. In the variant with cooling heat is absorbed from the outside in the evaporator of the additional circuit. As already stated, in this case the usable pressure gradient or the temperature deviation to be bridged is lower than in the main circuit. Heat can also be transferred to the rich HK solution. In this case, the heat to be recovered by cooling the poor ZK solution of the additional cycle at a higher temperature level than that from the return cooler. The heat transfer of the poor HK solution to the rich HK solution to this up to the temperature level of the HK expeller ( 1 ), is correspondingly lower. By reducing the heat output, there is the opportunity to use the amount of heat saved in the expeller positive. For this purpose, the known method of solution recycling of the poor HK solution by the HK-Hochdruckaustreiber is applied. However, it is necessary to warm up the rich HK solution prior to entering the solution heat exchanger by recirculation through the HK low pressure absorber. This is a commonly used method.

For an optimal improvement in the efficiency of the overall cycle, the additional circuit must be designed quantitatively so that it can absorb the heat difference between AP 1 and AP 2 in the rectifier. Due to the incomplete rectification, a design for a slightly higher heat absorption than the minimum return heat makes sense. If the rich ZK solution is introduced undercooled in the rectifier, so the loss size can be further reduced beyond the operating point AP 2, the additional circuit to a correspondingly greater heat absorption must be designed. This possibility is given by the rich ZK solution (after removal from the HK low-pressure absorber) is introduced without further external heat input into the rectifier. The purity of the rectified steam of 99.8% assumed in the drawing is a typical value from refrigeration technology. In the absorption force cycle, slightly lower values may be tolerated. Then both operating points move to lower values for the minimum return heat, whereby the distances between the two points decrease minimally. The selected pressure of 10 bar is suitable as inlet pressure in the expansion machine for a heat source with a relatively low maximum temperature (about <120 ° C). At higher maximum temperatures of the heat source, higher pressures are appropriate. Conversely, both operating points will travel to higher values for the minimum return heat, with the distance between the two points increasing.

If a heat source with steadily decreasing temperature gradient is to be used, another alternative is basically available: The need for rectification is at least largely circumvented by the fact that the amount of solvent remains the same across the entire degassing width, ie only the absolute size of the working medium decreases with increasing evaporation , The heat source is divided into two sections in the following consideration, with less relaxation in the higher temperature range to lower pressure and lower temperature in the lower temperature range. It is assumed that the heat source allows expelling the solution in the generator at 10 bar to ξ '= 0.18, which corresponds to a temperature of about 129 ° C. At ξ '= 0.34, theoretically a temperature of about 93 ° C would be reached and at ξ' = 0.5 a temperature of about 70 ° C is given. On absorption, the absorbed working fluid increases from 18/82 = 0.18 over about 42/82 = 0.34 to 82/82 = 0.5. Only (42-18) / (82-18) = 0.375 of heat can be used to relax to a lower pressure. As a comparison case, a circuit circuit is used, which provides a special use of the Rückkühlwärme and provides a differentiated circulation rate in the upper and lower temperature range. There is provided (129-93) / (129-70) = 0.61 of the heat at higher temperature range. From this, the Rückkühlwärme is deducted. The difference in minimum return heat between the two operating points is around 200 kJ / kg. If one sets as degassed amount of 1 kg of pure ammonia with a Verdampfungsentalpie of 1167 kJ, so are about 17% as additional necessary Rückkühlwärme in the worst case no longer be used in the higher temperature range. Overall, therefore, 0.61 × 0.83 = 0.51 of the heat supplied for the relaxation to the low pressure provided. The amount of circulation is inventively (s. 6 - 15 ) are designed accordingly, ie compared to the comparison case according to the prior art in the range of higher expeller temperature can be increased. Then this circuit circuit (with use of the Rückkühlwärme and increased fluid circulation in the range of the upper temperature of the heat source) energetically advantageous advantageous, as can be seen from the comparison of the numbers 0.51 to 0.375. The mentioned reduction factor of 17% is then a bit too high if part of the return heat is used in the described procedure to reduce the external heat input in the generator.

In the range of low proportions of working medium, no further improvement in the utilization of the high temperatures of the heat source can be achieved with the described measure: If, in the above example, the section with the lower proportion of working medium is divided into the two sections, the following calculation results: In the absorption The work equipment absorbed increases from 18/82 = 0.18 over approx. 29/82 = 0.26 to approx. 42/82 = 0.34. It can thus be used (29-18) / (42-18) = 0.458 of heat to relax to lower pressure. At 10 bar to ξ '= 0.26, the temperature is 110 ° C. It would be in the upper temperature range (129-110) / (129-93) = 0.53 of the heat ready. Like from the 5 can be estimated, the difference of the minimum return heat between the concentrations ξ '= 0.26 and ξ' = 0.34 is almost 300 kJ / kg. This would account for nearly 25% of the heat available in the higher temperature range, reducing the value of 0.53 μm from about 0.13 to about 0.4, which would be less than 0.458. If absorption is carried out in the range of small proportions of working medium, then it is preferable to provide two different evaporation pressure levels by means of a series-side connection of two absorbers without increased solution circulation. Such a circuit is in the 16 shown.

In the rectifier, a large volume of vapor with a small volume of liquid must be brought to the mass and heat exchange. Thus, the minimum return flow in the selected AP 1 is less than 1/10 of the rectified steam quantity. The introduction of the rich ZK solution into the rectifier increases the proportion of liquid compared with the prior art. Basically, this improves the exchange conditions, so that a better rectification efficiency can be expected. Quite significantly, the ratio of liquid to vapor is changed when - as described - a circuit circuit with two pressure levels and increased fluid circulation for the larger pressure level is present in order to use a heat source with a larger temperature spread. The steam generated in the upper pressure stage can through rectified the rich solution formed at the absorption of the vapor of the middle pressure stage. This amount of liquid will be more than the amount of steam to be rectified for the larger pressure stage. At least for the ammonia-water system is known that the rectification can be carried out in multi-stage rectification apparatus in single-stage output columns with a satisfactory result. Their different designs all have the advantage that they are cheaper to manufacture.

The Indian 4 illustrated cycle does not fully meet the requirement stated in the introduction under point b). According to the invention in the representations of the 6 (and in the following figures) remedied by a separate first ZK-Hochdruckaustreiber ( 39 ) is inserted. This is under the same high pressure as the HK-Hochdruckaustreiber ( 1 ). The working medium vapor flows generated in the high pressure exhausters ( 217 . 62 ) become common ( 017 ) the steam superheater ( 30 ) and the relaxation machine ( 31 ), in this case working fluid vapor from the first ZK-Hochdruckaustreiber ( 39 ) have a lower proportion of solvent than that from the HK-Ausreiber ( 1 ). As a result, under certain conditions (eg relatively low amount of steam from the HC expeller and / or low pressure) in the total flow of the working medium vapor ( 017 ) a sufficiently low proportion of the solvent can be achieved.

The circulation of the auxiliary circuit is designed as follows: The poor ZK solution ( 20 ) is the first ZK-Hochdruckaustreiber ( 39 ) and the HK-Hochdruckaustreiber ( 1 ) and in its cold part of the HK-output column ( 16 ). This must, as already for 4 described by the HK low-pressure absorber ( 7 ) to the HK high-pressure driver ( 1 ) only the difference ( 015 ) rich HK solution of the rich HK solution required for expulsion ( 15 ) minus the poor ZK solution ( 20 ). The rich ZK solution ( 24 ) is supported by the first ZK solution pump ( 23 ) via the HK / ZK solution heat exchanger ( 40 ) for the lower and middle temperature range in the first ZK high pressure compressor ( 39 ) via the associated first ZK output column ( 26 ). The rich HK solution ( 15 ) is isolated in two solution heat exchangers ( 19a . 40 ) warmed up one after the other. The poor HK solution ( 14 ) is controlled by the HK high-pressure 1 ) ( 13 ) and then to the HK solution heat exchanger ( 19a ) for the upper temperature range. It is in countercurrent to the rich HK solution ( 015 ) cooled. This is followed by a supply line to the HK / ZK solution heat exchanger ( 40 ) for the lower and middle temperature range, in which a further cooling in countercurrent now also to the rich ZK solution ( 24 ) - in addition to the rich HK solution ( 015 ) takes place.

The external heat source medium ( 5 ) is first paralleled by steam superheater ( 30 ) and HK high pressure expander ( 1 ), then through the first ZK high pressure exporter ( 39 ) led to heat dissipation.

In the 7 is shown how the circuit circuit of the circuit types II and III for use of a so-called heat recovery vapor generator ( 38 ) is modified. In this and in the steam superheater ( 30 ) the external heat supply ( 5 ). The added enriched solution ( 49 ) is used in the Heat Recovery Vapor Generator ( 38 ) into a mixture of liquid and vapor ( 037 ) transformed. This mixture is a steam drum ( 34 ), in which the states of aggregation are separated. The mixture vapor of working and absorbent is passed through a HK-Abtriebssäule ( 16 ) and pre-rectified into the first ZK high pressure expeller ( 39 ). In the lower part of said steam drum ( 34 ) collects poor HK / ZK solution ( 046 ), formed from the supplied liquid / vapor mixture and the expiry of the HK-output column ( 16 ) and is the first ZK-Hochdruckaustreiber ( 39 ) guided. It thus provides the heat for this expeller. Subsequently, the poor HK / ZK solution ( 046 ) together with the poor ZK solution ( 20 ) from the first ZK high pressure exporter ( 39 ), heat in the HK solution heat exchanger ( 19a ) of the upper temperature range to the rich HK solution ( 015 ).

Subsequently, the poor ( 046 ) HK / ZK solution the poor HK solution ( 14 ) by means of control valve ( 45 ) and via the HK / ZK solution heat exchanger ( 40 ) for the lower and middle temperature range, the HK low-pressure absorber ( 7 ). The remaining partial flow of circulating poor solution ( 48 ) is used together with the poor ZK solution ( 20 ) united ( 49 ) and the Heat Recovery Vapor Generator ( 38 ). Through this and the steam drum ( 34 ) and the first ZK high pressure exporter ( 39 ) and HK solution heat exchangers ( 19a ) In each case a partial flow of both poor solutions is recycled.

To the combined rectification provided in US Pat. No. 6,584,801 (of the steam drum (US Pat. 34 ) resulting mixed vapor of working medium and solvent) and expulsion from the rich HK solution ( 015 ) by indirect heat release of the (resulting from the steam drum) poor HK / ZK solution ( 046 ) is waived in favor of a separate rectification and expulsion. Here, both the rectification by a stripping column by means of packed layers or Raschig rings and the expulsion by hot liquid state of the art. This solution may be considered more technically feasible.

The in the 1 illustrated beneficial input coupling of Rückkühlwärme in the additional cycle begins in the 7 with the fact that the HK working medium high-pressure steam ( 62 ) from the steam drum ( 34 ) to the first ZK high pressure exporter ( 39 ) and this below its first ZK output column ( 26 ) is introduced. In it, in countercurrent to the second partial flow ( 44 ), the rectified vapors as well as the vapors largely rectified by the first ZK high pressure compressor ( 39 ) are driven out. These vapors then flow in countercurrent to the first substream ( 53 ) of the rich ZK solution nor the second ZK output column ( 27 ). The now almost pure working medium high pressure vapors ( 017 ) are the steam superheater ( 30 ).

In order to increase the purity of the rectified working medium vapor, it is additionally shown that a first partial flow ( 53 ) of the rich ZK solution undercooled in the coldest part of the here shown in two stages output column ( 27 ). This first partial flow ( 53 ) is handled by the rich ZK solution ( 24 ) after the first ZK solution pump ( 23 ) by means of valve ( 52 ) separated. The second partial flow ( 44 ) of the rich ZK solution is replaced by the ZK medium-pressure absorber ( 22 ) ( 43 ) and then through the HK / ZK solution heat exchanger ( 40 ) of the middle and lower temperature range and in countercurrent to the poor HK solution ( 14 ) and then the first ZK high-pressure 39 ) and into the cold part of the first ZK output column ( 26 ).

In the 8th In contrast to the two preceding circuit circuits, the relaxation and the absorption are extended by a further step: the absorption is carried out in the additional cycle in two pressure stages, first in a second centralized medium pressure absorber ( 59 ) of the lower pressure stage and then in the ZK medium-pressure absorber ( 22 ) higher pressure. The in the first mentioned ZK medium-pressure absorber ( 59 ) enriched ZK solution ( 61 ) is carried out by means of the third ZK solution pump ( 60 ) raised to the higher medium pressure level and the ZK medium-pressure absorber ( 22 ). For each of the two ZK medium-pressure absorbers, a ZK medium-pressure steam flow ( 63 respectively. 29 ) from the expansion machine ( 31 ) taken with each ent speaking pressure level and one of the two ZK medium-pressure absorbers ( 59 respectively. 22 ).

It is assumed that the steam at the low-pressure stage after the expansion machine ( 31 ) has a temperature level below the ambient temperature. This is done in a liquid cooler ( 33 ) is used to generate a refrigerant ( 64 ) to cool. This is then the ZK medium-pressure absorber ( 22 ). As a result, a richer solution can circulate in the additional circuit, as a result of which the heat source in the first ZK high-pressure compressor ( 39 ) can be exploited down to a lower temperature and by means of the introduction of rich ZK solution according to the invention ( 24 respectively. 44 + 53 ) in the rectifier ( 2 ) a working medium-rich working medium vapor is achieved.

Theoretically, the addition of additional absorbers and the removal of vapor streams of different pressure from the expansion machine ( 31 ) on the representation of 8th be continued until close to the Austrreiberdruck. However, this would result in several practical problems (complicated relaxation machine, large number of aggregates). In the 9 (and the following), the type III circuit is shown instead. In the additional circuit, a ZK medium pressure actuator ( 70 ) and between it and the HK / ZK low-pressure absorber ( 7a ) poor ( 73 ) and rich ( 24 ) ZK solution passed, ie a medium / low pressure additional circuit formed by the existing so far only in the main circuit low-pressure absorber ( 7a ) and the solution pump ( 8a ). Here, the amount of medium / low pressure additional circuit of the solutions of the two existing additional circuits is usually different. The absorption in the low-pressure absorber ( 7a ) yields the same amount of work equipment for the rich HK and ZK solutions. This was assumed for the poor solutions.

The current HK / ZK solution heat exchanger for the middle and lower temperature range ( 40 in the 6 to 8th ) is used for two temperature ranges ( 65 and 66 ) divided up. The HK / ZK solution heat exchanger ( 66 ) of the lower temperature range pass through increased amounts of liquid through the HK / ZK solution heat exchanger ( 65 ) of the medium temperature range run the same amount of liquid as in the circuit of 6 , The poor HK solution ( 14 ) is between high pressure and medium pressure or medium pressure and low pressure by means of the third HK throttle ( 72 ) or the first HK / ZK throttle ( 74 ) lowered. The bridging of the pressure differences between low and high or medium pressure is shown in the form that first to high pressure by means of the first HK / ZK solution pump ( 8a ) is raised, then a partial flow ( 69 ) rich ZK solution to medium pressure by means of third HK throttle ( 68 ) is lowered. This partial flow ( 69 ) of the rich ZK solution is by means of control valve ( 67 ) after the HK / ZK solution heat exchanger ( 65 ) of the medium temperature range of the rich HK solution ( 015 ) separated and in the ZK medium pressure driver ( 70 ) via the associated fourth ZK output column ( 130 ). Those from the ZK medium pressure actuator ( 70 ) removed poor ZK solution ( 73 ) is combined with that of the HK-Hochdruckaustreiber ( 1 ) coming poor HK solution ( 14 ) over the way HK / ZK solution heat exchanger ( 65 ) of the middle temperature range and the first HK / ZK throttle ( 74 ) the HK / ZK low-pressure absorber ( 7a ).

The from said ZK medium pressure driver ( 70 ) expelled ZK medium pressure steam ( 71 ) is pressurized to the same pressure ZK medium-pressure absorber ( 22 ). In the HK / ZK low-pressure absorber ( 7a ) is absorbed by absorption of nearly pure HK / ZK low pressure steam ( 18a ) and the controlled release of ZK solution ( 20 ) closed to the additional circuit, the balance of the extended additional cycle.

The external heat source ( 5 ) is first parallel through the HK-Hochdruckaustreiber ( 1 ) and the steam superheater ( 30 ), then through the first ZK high pressure exporter ( 39 ) and finally by the ZK medium pressure driver ( 70 ) led to heat dissipation.

With the circuit of the 9 becomes the heat source ( 5 ) in the centralized medium pressure compressor ( 70 ) exploited to such a low temperature level, from which steam can no longer be produced with a technically usable pressure ratio. The in ZK medium-pressure absorber ( 70 ) expelled ZK medium pressure steam ( 71 ) is used in the ZK medium-pressure absorber ( 22 ) to a rich ZK solution ( 24 ) absorbed. Thus, the removal of medium-pressure steam from the expansion machine ( 31 ) can be reduced in favor of an increased release of low-pressure steam: The recoverable work of the entire system increases.

The in heat exchange with the HK / ZK low-pressure steam ( 18a ) supercooled brine ( 64 ) differs from the illustration in 7 the HK / ZK low-pressure absorber ( 7a ). As a result, a larger HK / ZK vapor quantity ( 18a absorbed to low pressure, corresponding to a reduced amount of ZK medium-pressure steam ( 29 ), which leads to a higher performance of the entire system.

In the 10 is opposite the 9 the decoupling of medium-pressure steam from the expansion machine ( 31 ) and the ZK medium-pressure absorber absorbing it ( 59 ) Lower pressure level omitted. From the HK / ZK low-pressure absorber ( 7a ) becomes poor ZK solution ( 20 ) via the second ZK solution pump ( 51 ) directly to the now only ZK medium-pressure absorber ( 22 ) guided. This simplification, especially of the expansion machine leads in most applications to a reduction in recoverable work.

In the 11 becomes the representation of 9 extended by a Resorberkreislauf. Such a Resorberkreislauf is known from two fluid circuits - namely here a Höchstdruckaustreiber / Absorberteilkreislauf and a maximum pressure / Entgaserteilkreislauf. The integration of the resorber circuit in the main and auxiliary circuit leads to the partial superimposition of the currents and the common use of apparatuses: The absorption subcirculation is integrated to a considerable extent in the auxiliary circuit and is not highlighted in the figurative representation by special characteristics; only the RK peak pressure driver ( 80 ) and partly the solution supply and removal are independent. This is how the rich RK solution ( 81 ) of the maximum pressure expander / absorber sub-circuit after the HK / ZK solution heat exchanger ( 65 ) of the middle temperature range by means of valve ( 77 ) from the rich ZK solution ( 24 ) decoupled. The rich RK solution ( 81 ) of the maximum pressure expander / absorber sub-circuit is determined by means of its first RK solution pump ( 78 ) in the first RK maximum temperature solution heat exchanger ( 79 ) and then into the RK peak pressure 80 ) via the associated second RK output column ( 132 ) initiated for expulsion. The expulsion is designed so that a poor RK solution ( 100 ) of the maximum pressure expander / absorber sub-circuit with the same proportion of working fluid as the enriched ZK solution ( 61 ) from the ZK medium-pressure absorber ( 59 ) has the lower pressure level. The poor RK solution ( 100 ) of the RK peak pressure expander / absorber sub-circuit is measured in the first RK maximum temperature solution heat exchanger ( 79 ) in countercurrent to the rich RK solution ( 81 ) of the maximum pressure expander / absorber sub-circuit cooled and by means of the first RK throttle ( 82 ) lowered to high pressure and in the middle part of the first ZK-Hochdruckaustreibers ( 39 ). Thus, the coupling is restored in the additional circuit in such a way that the supplied poor RK solution ( 100 ) of the maximum pressure expander / absorber sub-circuit is used in the first ZK high pressure expeller ( 39 ) in addition to expel steam and in the ZK medium-pressure absorber ( 59 ) of the lower pressure stage to absorb additional steam. Thus, an increased circulation volume is achieved in the additional circuit in the region of higher expeller temperature. This is according to the explanation of 5 energetically advantageous.

The in the RK-Höchstdruckaustreiber ( 80 ) produced RK-Arbeitsmittelhigh pressure steam ( 83 ) is the RK-Höchstdruckabsorber ( 84 ) and there with heat release from the poor RK solution ( 85 ) absorbed by the resorb subcircuit. The im RK high pressure absorber ( 84 ) generated rich RK solution ( 87 ) is used in the second RK maximum temperature solution heat exchanger ( 101 ) in countercurrent to the poor RK solution ( 85 ) cooled and by means of second RK throttle ( 88 ) lowered to high pressure. The rich RK solution ( 87 ) is placed in the HK high-pressure 1 ) and thus united with the main circuit. Those from the HK-Hochdruckaustreiber ( 1 ) expiring poor HK solution ( 14 ) is by means of valve ( 102 ) divided. A first partial flow ( 107 ) of the poor HK solution is passed through the HK solution heat exchanger ( 19a ) of the upper temperature range, a second partial flow of the poor HK solution ( 108 ) by the first ZK high pressure exporter ( 39 ), then both partial streams ( 107 . 108 ) again, by means of third HK throttle ( 72 ) lowered to medium pressure of the upper pressure level and with the poor solution from the ZK-Mitteldruckaustreiber ( 73 ) and by the ZK medium pressure distributor ( 70 ) directed to heat dissipation. Subsequently, the depleted RK solution ( 121 ) of the RK-Höchstdruckabsorber / Entgaserteilkreislaufs by means of valve ( 120 ) separated by means of fourth RK throttle ( 112 ) lowered to medium pressure and into the RK degasser ( 90 ) via the associated first RK output column ( 131 ). The remaining poor ZK solution ( 73 ) is like already to 9 represented to the HK / ZK low-pressure absorber ( 7a ). Those from the RK medium pressure driver ( 90 ) running poor RK solution ( 85 ) by means of its second RK solution pump ( 86 ) and via the second RK high temperature solution heat exchanger ( 101 ) in the RK-Höchstdruckabsorber ( 84 ). By external heat supply from the RK degasser ( 90 ) Expelled medium vapor and in ZK medium-pressure absorber ( 59 ) of the lower pressure level (co-) absorbed. From the Resorberkreislauf is thus working medium vapor from RK-Mitteldruckaustreiber ( 90 ) to the ZK medium-pressure absorber ( 59 ) of the lower pressure stage, an equal amount of steam must at least from the ZK-Mitteldruckaustreiber ( 70 ) to ZK medium-pressure absorbers ( 22 ) to close the Resorberkreislauf. Optionally - according to the state of the art - in the solution circuit still a quantity balance between expeller / absorber subcircuit and absorber / degasser subcircuit produce when the exchanged between these two subcircuits vapor streams have different proportions of work equipment. The external heat source ( 5 ) is initially divided into several substreams: a first substream ( 92 ) of the external heat source is first for heat absorption by the RK-Höchsttemperaturabsorber ( 84 ) and only then passed to the heat through the steam superheater ( 30 ), a second partial flow ( 93 ) of the external heat source is controlled by the RK peak pressure 80 ), the main stream ( 89 ) of the external heat source by the HK-Hochdruckausustreiber ( 1 ) directed to heat dissipation. Subsequently, all three are united by the first ZK high pressure exporter ( 39 ), finally again by means of valve ( 103 ) divided into two sub-streams, wherein a third sub-stream ( 104 ) of the external heat source through the HK / ZK solution heat exchanger ( 65 ) of the middle temperature range, the fourth partial current of the external heat source ( 105 ) by the RK degasser ( 90 ) to be led.

In the 12 is the representation of 9 expanded by a heat transformer subcircuit instead of a resorption subcircuit as in 11 shown. Compared to the representations of 11 The following changes result: Rectified ZK high-pressure medium working steam ( 217 ), which is attributable to the additional circuit in the circuit circuit, the WT capacitor ( 54a ) and condensed there. The WT working fluid generated by the condensation ( 55a ) by means of WT working fluid pump ( 75 ) to the maximum pressure of the entire circuit and in a WT ultra-high pressure evaporator ( 127 ) evaporated under heat absorption. The heat is supplied by the external heat source, here by a valve ( 103 ) behind the first ZK high-pressure compressor ( 39 ) separated fifth substream ( 106 ) of the external heat source - ie at its low temperature level. The fourth partial flow ( 105 ) is sent to the ZK medium pressure 70 ). The in the WT high-pressure evaporator ( 127 ) produced WT-Arbeitsmittelhigh pressure steam ( 83a ) is a WT-Höchstdruckabsorber ( 84a ) and absorbed there with the release of heat. This heat is analogous to the representation in 11 to the first partial flow ( 92 ) transmitted to the external heat source. The poor WT solution required for absorption ( 85a ) is taken from the HK high pressure expeller ( 1 ) and removed by means of WT solution pump ( 86a ) the WT high-pressure absorber ( 84a ). The rich WT solution produced by the absorption process ( 87a ) by means of WT throttle ( 88a ) to the pressure level of the HK high pressure actuator ( 1 ) and sent to this. Heat exchange between these two solutions was omitted in this presentation. Above all, it would be necessary if the solutions between the first ZK high-pressure discharge driver ( 39 ) and the WT high-pressure absorber ( 84a ) should be exchanged. In the WT high-pressure absorber ( 84a ) achievable temperature level depends on the temperature level in the WT high-pressure evaporator ( 127 ) (and the thus determined pressure level) as well as the temperature deviation between WT high-pressure evaporator ( 127 ) and WT high-pressure absorbers ( 84a ). This is known to increase with the decrease of the working fluid in the solutions of the WT-Höchstdruckabsorbers ( 84a ). The RK degasser ( 90 ), the line of RK medium pressure steam ( 91 ) and the entire partial circuit between medium-pressure absorber and Hochdruckaustreibung eliminated. The use of a heat transformation subcircuit instead of egg Resorbent partial circulation is advantageous in combination with alternative power and / or cooling, because the ZK capacitor ( 54 ) is used for both processes.

In this case, the working fluid generated by means of valve ( 125 ) divided into two sub-streams ( 55a . 55b ). The WT working fluid ( 55a ) is the WT high-pressure evaporator ( 127 ), the ZK-working fluid ( 55b ) by means of second ZK throttle ( 56 ) to medium-pressure level and the ZK medium-pressure evaporator ( 57 ). There the ZK liquid ( 55b ) evaporates under heat absorption at a low temperature level. The ZK medium-pressure steam ( 63 ) of the lower pressure stage is the ZK medium-pressure absorber ( 59 ) fed to the lower pressure stage and absorbed there. The generated cold from the ZK medium-pressure evaporator ( 57 ) and the generated cold ( 64 ) from the liquid cooler ( 33 ) is mixed with a brine ( 124 ) in a cold storage ( 76 ) or fed to a cold consumer. In the additional cycle, refrigeration and power generation can alternatively take place. In times of exclusive power generation by means of shut-off valve ( 35 ) prevents the supply line to the capacitor. The refrigeration can also be inserted in the main circuit, as already in 2 is shown in principle.

The generated cold can be used internally to increase power generation. The generated cold is stored. It is temporarily from the cold storage ( 76 ) Cold are removed in order to be cooled by means of a coolant ( 124 ) to lower the absorber inlet temperatures of the low-pressure and / or medium-pressure absorber. As a result, the steam to be absorbed in each case can have a lower pressure and produce more work beforehand in the expansion machine. This circuit makes sense from the following point of view: In most climates of the earth there is a more or less pronounced daily rhythm of the ambient temperature. With suitable materials for the sorption plant - as they are, for example, ammonia and water - can always be followed by the falling ambient temperature. In particular, at low ambient temperatures with the so-called free cooling, it is also possible to provide lower cooling temperatures than with a wet cooling tower for the absorbers, which is characterized by the medium of water. However, this approach would have the disadvantage that at night in the sorption the greatest power would be delivered. However, the highest power consumption is usually not at night. This disadvantage is eliminated by the circuit shown with alternative modes of operation of the sorption: either refrigeration with reduced power or by use of cold increased power generation or power generation without the two aforementioned modes.

In the 13 For the main circuit a two times external heat supply is shown, while for the auxiliary circuit according to the representations in the 6 to 8th A single external heat supply is provided: The external heat supply to the main circuit takes place at a high temperature level in HK-Hochdruckaustreiber ( 1 ) on medium in a HK / RK degasser / medium pressure expander ( 113a ). This HK / RK Degasser / Medium Pressure Driver ( 113a ) also serves as medium pressure expander for the HK cycle. Consequently, the HK / RK deaerator / medium pressure actuator ( 113a ) running poorest solution of the entire circuit circuit - by means of valve ( 111 ) - shared: A first partial flow is called a poor RK solution ( 85 ) the RK high pressure absorber ( 84b ), a second partial flow as an additional flow of poor HK solution ( 112a ) the HK low-pressure absorber ( 7 ). This additional flow of poor HK solution ( 112a ) by means of a fourth HK throttle ( 110a ) relaxed to low pressure. The HK / RK Degasser / Medium Pressure Actuator ( 113a ), the poor HK solution ( 14 ) from the HK-Hochdruckaustreiber ( 1 ) and rich HK solution ( 15 ) from the HK low-pressure absorber ( 7 ). The amount of this rich HK solution ( 15 ) is to be designed so that both the main circuit and the Resorberkreislauf is closed. The poor HK solution ( 14 ) is replaced by the first ZK high pressure exporter ( 39 ), then through the HK / ZK solution heat exchanger ( 65 ) of the middle temperature range and to medium pressure by means of second HK / ZK throttle ( 122a ) and into the HK / RK degasser / medium pressure expeller ( 113a ) via the associated HK / ZK output column ( 133 ).

The pressure level of the HK / RK Degasser / Medium Pressure Driver ( 113a ) is lower than that of the ZK medium-pressure absorber ( 22 ). The HK / RK Degasser / Medium Pressure Actuator ( 113a ) RK medium pressure steam ( 91 ) is used in the HK / ZK medium-pressure absorber ( 59a ), both of which are at nearly the same pressure. From the HK / ZK absorber ( 59a ) enriched HK / ZK solution ( 58a ) after the HK / ZK solution pump ( 60a ) by means of valve ( 94 ) enriched HK solution ( 99a ) and the second HK solution pump ( 96a ) and HK / ZK solution heat exchangers ( 66 . 65 ) into the HK high pressure compressor ( 1 ), the remaining enriched ZK solution ( 61 ) the ZK absorber ( 22 ). From the relaxation machine ( 31 ) HK low pressure steam ( 18 ) to the HK low-pressure absorber ( 7 ) and ZK medium pressure steam ( 29 ) to the ZK-medium-pressure absorber ( 22 ). The latter ZK medium-pressure steam ( 29 ) is by heat absorption in the first ZK-Hochdruckaustreiber ( 39 ) and in the rectifier ( 2 ) has been generated.

By setting to medium pressure of the lower pressure stage and to low working agent proportions in the solutions of the HK / RK degasser / medium pressure drift ( 113a ) only a relatively low temperature level is required for expulsion. This allows a gradual cooling of the external heat source: its main stream ( 89 ) is first detected by the HK high-pressure 1 ), then through the first ZK high pressure exporter ( 39 ), then through the HK / RK Degasser / Mitteldruckaustreiber ( 113a ) and finally by the HK / ZK solution heat exchanger ( 66 ) of the lower temperature range. Like in the 11 already shown, a first partial flow ( 92 ) of the external heat source by the RK-Höchstdruckabsorber ( 84b ) and steam superheater ( 30 ). In the 13 this first partial flow ( 92 ) with the main stream ( 89 ) in front of the HK / RK degasser / medium pressure actuator ( 113a ) mixed again. A third partial flow ( 104 ) of the external heat source is by means of valve ( 103 ) after the first ZK high pressure exporter ( 39 ) and separated by the HK / ZK solution heat exchanger ( 65 ) of the middle temperature range. This third sub-stream ( 104 ) is the main stream ( 89 ) of the external heat source only before the HK / ZK solution heat exchanger ( 66 ) of the lower temperature range remixed. Deviating from the 11 is thus used in the HK / ZK solution heat exchanger ( 65 ) of the medium temperature range heat from the poor HK solution ( 14 ), in the HK / ZK solution heat exchanger ( 66 ) of the lower temperature range from the fourth partial flow ( 105 ) of the external heat source, but not from the poor HK solution ( 14 ).

The enriched HK solution ( 99a ) after the HK / ZK solution heat exchanger ( 65 ) of the mean temperature range deviating from the representation of 12 subcooled in the middle part of the output column of the rectifier ( 2 ). The HK solution heat exchanger ( 19a ) of the upper temperature range is eliminated. This makes a contribution to the rectification, whereby the first partial flow ( 53 ) rich ZK solution can be reduced if the mixed vapor has a higher proportion of solvent than it would correspond to the equilibrium state with the rich HK solution. This is for example when using a plate heat exchanger with DC of solution and steam.

For the rectification, another variant is used: The from the HK-Hochdruckaustreiber ( 1 ) leaving mixed vapors in the rectifier ( 2 ) by means of the first partial flow ( 53 ) rectified the rich ZK solution. For the ZK-agent vapor ( 217 ) from the first ZK high pressure expeller ( 39 ), a high proportion of work equipment was assumed that can be dispensed with a rectification.

In the 13 is in the resorber cycle of the RK-Höchstdruckabsorber ( 84b ) at the same pressure level as the HK high pressure compressor ( 1 ). The RK high-pressure absorber ( 84b ), a partial flow ( 116 ) in the HK high pressure actuator ( 1 ) supplied high-pressure working fluid and absorbed there. An independent expeller / absorber subcircuit does not exist. The in 11 represented RK-Höchstdruckaustreiber ( 80 ) and the associated lines omitted. The in the RK high-pressure absorber ( 84b ) generated rich RK solution ( 87 ) is used in the solution heat exchangers ( 19a . 65 . 66 ) and through the fourth RK throttle ( 109 ) to low pressure and into the HK low-pressure absorber ( 7 ).

In the 14 For the main circuit, a one-time external heat supply, for the additional circuit partly a two times, sometimes a one-time external heat supply is shown. Circuitry as in the 8th . 9 . 11 . 12 are shown around a second ZK Hochdruckausustreiber ( 119 ), which is inserted so that in the additional circuit two partial circuits each between a ZK medium-pressure absorber ( 59 respectively. 22 ) and a ZK high pressure exporter ( 119 respectively. 39 ) are formed. They overlap with each other and with the main circuit and - also shown here - Resorberkreislauf. For the second ZK high pressure compressor ( 119 ) is the same pressure level as for the HK high-pressure 1 ) and the first ZK high pressure exporter ( 39 ) certainly. The second ZK high pressure exporter ( 119 ), the poor HK solution ( 20 ) of the first ZK high-pressure driver ( 39 ) and a fourth substream ( 99 ) of the enriched solution ( 58 ) from the ZK medium-pressure absorber ( 59 ) of the lower pressure stage - supported by the fourth ZK solution pump ( 96 ) - via the third ZK output column ( 129 ). From the ZK medium-pressure absorber ( 59 ) of the lower pressure stage running cumulative flow ( 58 ) enriched ZK solutions is previously by means of valve ( 94 ) the enriched ZK solution ( 61 ) and to the ZK absorber ( 22 ). From the remaining second substream ( 95 ) is by means of valve ( 98 ) a third partial flow ( 97 ) enriched ZK solution and the ZK medium pressure ( 70 ). Those from the second ZK high pressure compressor ( 119 ) expired ZK solution ( 123 ), the HK high-pressure driver ( 1 ). In the circulation circuit, the proportion of working medium of the depleted ZK solution ( 123 ) by the rich HK solution ( 015 ), the proportion of working capital of the poor CC solution ( 20 ) by the enriched ZK solution ( 58 ). Analogous to the version for 12 is from the ZK medium-pressure absorbers ( 59 ; 22 ) in each case to the corresponding Hochdruckausustreibern ( 1 . 119 ) rich solution ( 015 . 99 ) only as a difference. From that in the second ZK-Hochdruckaustreiber ( 119 ) expelled high pressure steam is a first partial flow ( 114 ) into the RK high pressure absorber ( 84b ), a second partial flow ( 115 ) in the rectifier ( 2 ).

In the main cycle, in the area of the rich solution, there is an overlap between HK / ZK low-pressure absorbers ( 7a ) and ZK medium pressure driver ( 70 ) as already in the 12 is shown. The poor CC solution ( 73 ) of the medium pressure / low pressure circuit is controlled by the ZK medium pressure 70 ) and the additional current of poor ZK solution ( 112 ) is controlled by the ZK / RK degasser / medium pressure actuator ( 113 ) each returned to the heat and by means of fifth CC throttling ( 126 ) or fourth CC throttle ( 110 ) throttles the HK / ZK low-pressure absorber ( 7a ). In the circuit of the 14 As a rule, the work equipment of the solution ( 14 . 73 . 87 . 112 ), the HK / ZK low pressure absorber ( 7a ). The ZK / RK degasser / medium pressure actuator ( 113 ), a partial stream of rich ZK solution ( 117 ), after being disconnected from the main stream ( 0015 ) by means of control valve ( 67 ) was separated. This secondary flow must be set so high that the expulsion in the ZK / RK deaerator / medium pressure actuator ( 113 ) the poor RK solution ( 85 ) is produced.

The main current of the external heat source ( 89 ) is successively through the HK-Hochdruckaustreiber ( 1 ), the second ZK high pressure exporter ( 119 ) and the first ZK exporter ( 39 ), then by valve ( 103 ) into three parallel substreams ( 104 . 105 . 106 ), whereby one ( 104 ) through the HK / ZK solution heat exchanger ( 65 ) of the medium temperature range, a ( 105 ) by the ZK medium pressure driver ( 70 ), one ( 106 ) by the ZK / RK Degasser / Mitteldruckaustreiber ( 113 ) to be led. These partial streams are finally combined by the HK / ZK solution heat exchanger ( 66 ) of the lower temperature range.

Due to the two external heat supply to the auxiliary circuit can in the expansion machine ( 31 ) in the first ZK high pressure exporter ( 39 ) as well as by heat absorption in the rectifier ( 2 ) generated working medium vapor ( 217 ) except for low pressure, which in the second ZK high pressure compressor ( 119 ) generated working medium vapor ( 114 ) partially down to low pressure, mainly at medium pressure of the lower pressure stage, in the HK-Hochdruckaustreiber ( 1 ) can be relaxed to low pressure working medium vapor. However, it is the sizes of the heat input to the first ZK high pressure output driver ( 39 ) taking into account the heat input in the rectifier to the auxiliary circuit and to the centralized medium pressure compressor ( 70 ) in such a way that in no expeller a vapor surplus or surplus is produced.

For the rich solutions ( 15 . 58 . 24 ) is a return ( 42 . 43 . 43a ) through the absorbers ( 7 . 59 . 22 ), from which they run. As a result, the required cooling demand and the external heat supply can be reduced.

In the 15 becomes the ZK exporter ( 70 ) set to medium pressure of low pressure level; the ZK medium-pressure steam generated in it ( 71 ) is thus the corresponding ZK medium-pressure absorber ( 59 ). In the 14 illustrated supply line of a partial flow ( 97 ) enriched ZK solution ( 95 ) deleted. The RK degasser ( 90 ), no rich HK solution is supplied. For RK degasser ( 90 ) and ZK medium pressure driver ( 70 ), the same pressure is determined so that the vapor streams from both into the ZK medium-pressure absorber ( 59 ) of the lower pressure level can be initiated. From the RK high-pressure absorber ( 84b ) rich RK solution ( 87 ) is used in the RK high-temperature solution heat exchanger ( 101b ) deeper than in the circuit 14 cooled, then through the RK degasser ( 90 ), then by means of second RK throttle ( 88 ) lowered to medium pressure of the lower pressure stage and in the RK degasser ( 90 ) via the associated RK output column ( 131 ). Because the temperature of the rich RK solution ( 87 ) and usually also the first partial flow ( 92 ) of the external heat source after the steam superheater ( 30 ) is higher than the temperature of the main stream of the external heat source ( 89 ) after the first ZK high pressure exporter ( 39 ), in the RK degasser ( 90 ) a poorer RK solution ( 85 ) than in the Central Medium Pressure Compressor ( 70 ) be generated. With this circuit, the in the second ZK-Hochdruckaustreiber ( 119 ) produced high-pressure working fluid ( 115 ) in the expansion machine ( 31 ) in principle to low pressure, which in the first ZK-Hochdruckaustreiber ( 39 ) generated ZK-Arbeitsmittelhochdruckdampf ( 217 ) and by heat absorption in the rectifier ( 2 ) generated steam up to medium pressure of the higher pressure level ( 22 ) be relaxed. The extracted ZK medium-pressure steam ( 63 ) is correspondingly from the expansion machine ( 31 ) to the ZK medium-pressure absorber ( 22 ). However, it is the sizes of the heat supply to the second ZK-Hochdruckausustreiber ( 119 ) as well as the HK / RK degasser / medium pressure 113 ) and to the ZK medium pressure driver ( 70 ) in such a way that in no expeller a vapor surplus or surplus is produced.

In the 15 illustrated circuit with assignment of the ZK medium pressure driveway ( 70 ) on the lower medium pressure level is opposite to in the 9 to 12 and 14 shown circuits - there assignment of the ZK medium pressure drift ( 70 ) to the upper medium pressure stage - at higher maximum temperatures of the heat source energetically favorable: high pressure is energetically required at higher maximum temperatures of the heat source. Nevertheless, the heat source in the circuit after 15 exploited to low temperatures. In the first ZK high pressure exporter, the proportion of working fluid in its rich ZK solution ( 24 respectively. 44 and 53 ) to generate rectification-free steam (eg, 0.99% working agent content). Thus, the pressure in the ZK medium-pressure absorber ( 22 ) to carry out the heat dissipation can. Accordingly, the pressure and thus the required temperature level of the external heat supply in the corresponding medium-pressure expander of the upper pressure level increases. With external heat supply to this medium-pressure absorber, the heat source can not be cooled down to very low temperature. In addition, the pressure ratio for the first ZK-Hochdruckaustreiber ( 39 ) generated withdrawal steam ( 63 ) when absorbed in the corresponding medium-pressure absorber ( 22 ) under the condition mentioned, so also participates in the advantage of higher maximum pressure.

Those from the second ZK high pressure compressor ( 119 ) expired ZK solution ( 123 ) is different from the representation of 14 in the middle part of the output column of the rectifier ( 2 ). Thus, a contribution to the rectification is made if the mixed steam has a higher proportion of solvent than would correspond to the equilibrium state with the rich HK solution. This is for example when using a plate heat exchanger with DC of solution and steam. In the 13 shown introduction of supercooled HK solution can be done as an alternative measure. Overall, the measure is energetically more effective with two ZK high-pressure exhausts in the additional circuit than with a high-pressure expeller.

Deviating from the previous presentation, the second partial flow ( 108 ) poor HK solution not by the first ZK-Hochdruckaustreiber ( 39 ) and possibly not by the second ZK-Hochdruckaustreiber ( 119 ), but by heat to an external heat consumer ( 118 ) cooled before this partial flow through the HK / ZK solution heat exchanger ( 65 ) of the mean temperature level.

The rich solutions ( 15 . 58 . 24 ) are recycled by the absorber with the highest initial temperature for heat absorption ( 43 ): This is done for the ZK medium-pressure absorber ( 59 ) of the lower pressure level. As a result, the required cooling demand and the external heat supply are optimally reduced.

The introduction of the resorb subcircuit or heat transformation subcircuit serves to bring the working medium vapor before the expansion machine to a higher temperature level than would be possible by direct use of the heat source. If the heat source temperature is already relatively high, then the possible temperature deviation can be limited by means of this method step by stability limits of the working medium, or it can no longer be usefully applied. Both methods are effective because of the high pressure ratio according to the invention for the generation of force and in some cases also necessary to avoid impermissible moisture vapor in the expansion apparatus. Here have circuits as shown in the 13 to 15 insofar advantages as the number of additional equipment remains low, with additional cooling this applies to the circuit according to the 12 ,

In the 16 is shown to operate in the main circuit two different evaporation pressure levels from a heat source by solution-side series connection of two absorbers. Opposite the representation of the circuit in the 6 The following changes occur: In the relaxation machine ( 31 ) working fluid is depressurized to the lowest pressure and this working fluid low pressure steam ( 134 ) a low-pressure absorber ( 135 ) for absorption. The absorption takes place with release of heat by means of the supplied poor HK solution ( 14 ): The formed enriched poor HK solution ( 137 ) is carried out by means of the third HK solution pump ( 136 ) raised to low pressure and the HK-low pressure absorber ( 7 ) for absorption. The HK low-pressure steam ( 18 ) is removed from the expansion machine ( 31 ) removed by tapping or removal. The poor HK solution ( 14 ) is in the first HK throttle ( 6 ) throttled to the lowest pressure. This circuit is applicable in all circuits of types II and III, if temperatures above about 150 ° C to be exploited and a relaxation is accepted into the negative pressure. The number of absorbers increases in the circuits of 6 to 15 each at one.

Not only the embodiment of the invention in its application in the absorption-force cycle depends on the nature of the heat source, but also its advantages over the prior art:
The advantage of the invention in these circuits increases with increasing seizure of the Rückkühlwärme. This applies in principle to all three circuit types I to III. High amount of return heat is also present during use for cooling or at the center of gravity for cooling, in particular when low-temperature cold is to be generated ( 1 to 4 ).

If the absorption force cycle is used in a heat source with constantly decreasing temperature, but low temperature spread, so you can design the circuit so that the rich solution contains such a high proportion of the working fluid ammonia that the Rückkühlbedarf remains fairly low or on the Rectification can be dispensed with. The circulation circuit of the type I according to the invention brings in this case the advantage that the relaxation can be carried out with a larger pressure ratio. However, because the relaxation for the medium-pressure steam fails lower than in systems of the prior art, the energy advantage of the entire system as in the 1 and 4 are not very high if no use of cold is made. Significantly greater is the advantage if the cold low-pressure steam for cooling generation to be used in parallel with the power generation. For this purpose, a relatively low low pressure must be selected. This can only be achieved with lower proportions of working fluid in the rich solution (the main circuit). A rectification is then required and the Rückkühlwärme is then no negligible size.

A similar Situation arises in the proposed alternative use either as an absorption-force cycle or as an absorption refrigeration system. Will cold Requires a relatively low temperature, so that goes in the process low work equipment and correspondingly high return heat. Only in pure current operation, the solution concentration in the direction high proportion of work equipment, not simultaneous production of electricity and cold.

If a heat source with constantly decreasing temperature and large temperature spread is used, in which the lower effective limit still has a greater distance from the ambient temperature (eg flue gas), then the second main concern of the invention is to limit the negative effect on the efficiency of the sorption process, which is caused by the disproportionate heat absorption at the cold end of the expulsion or absorption process mentioned in the introduction under point b). That is exergetically unfavorable. In this case, Type II circuits are as described in the 6 to 8th are shown suitable. In the range of lower working agent content in the solution, according to the invention, the circulation rate is increased compared to a circuit with only a single circuit. In addition, a reduction in pressure during expulsion - along with a larger usable pressure gradient at a given temperature level of the heat source - brings a further significant improvement in the overall process.

The third main concern of the invention arises when a heat source with steadily falling temperature and very high temperature spread is to be used. This is especially the case when the heat source can be exploited to a relatively low temperature. For this purpose, the circuit of the type III comes into play, as in the 9 to 15 are shown. Here, the invention competes with US Pat. No. 6,269,644. In this single-circuit process, a heat source down to the lower temperature range is used in combination with internal heat recovery with very good efficiency. If the maximum temperature of the heat source to be used is very low (> 100 ° C), then this method is not applicable according to the explanations given there. This restriction does not apply to the absorption-force circuit with main and auxiliary circuit; In particular, in this case, the circuit corresponding to the 13 into consideration. The Circuit Type III also has advantages in terms of the exploitation of higher temperatures: The state-of-the-art mixture of ammonia and water has stability limits: it is specified for liquid mixtures at 200 ° C. The highest temperatures occur in the liquids in the (main circulation) expeller and increase with the pressure and the proportion of the solvent water. In the known circuit circuits, the proportions of the solvent are at least not lower than they will choose for a circuit according to the invention type III. The higher the temperature, the higher the pressure has to be. In the absorption force cycle with main and auxiliary circuit, the maximum pressure to be chosen for the optimum overall efficiency of the system is lower than in previously known process circuits. There is also a broad band for the choice of the maximum pressure with almost equal efficiencies for the entire system. Temperatures of 200 ° C and higher can therefore be used with a larger pressure ratio in the relaxation process - and thus a higher efficiency - in an inventive absorption-force circuit with main and auxiliary circuit than in comparison circuits.

In the US Pat. No. 6,269,644 is a sample calculation for the use of a heat source with steadily falling temperature between 168.3 ° C and 61.5 ° C listed. Here, the heat source is used up to a temperature of 105.9 ° C for expulsion. Through heat recovery from the absorber and use of the lower temperature range, a transformation process ensures that the amount of steam supplied to the expansion machine is approx. 37% higher than without this process. The steam is released from 25.5 bar to 3.91 bar. In an absorption force circuit according to the invention Run with main and auxiliary circuit is intended to exploit the high-pressure temperature range with a larger pressure range. The increase of about 37% could z. B. can be achieved with a pressure ratio of 15 to 1 bar. The upper temperature range would be finished at about 122 ° C. Of the recoverable heat between 168.3 ° C and 122 ° C, about 25% can not be used as recoverable recooling heat directly for the large pressure ratio. The lower usable limit can be set at 70 ° C in the ZK medium pressure actuator. The recooling heat and the recoverable heat between 122 ° C and 70 ° C can be used at least by a two times external heat supply by means of the scheduled relaxation of 15 bar to 1 bar. An approximate comparative calculation would result in a temperature utilization according to US Pat. No. 6,269,644 of about 62 K directly and 66 K × 0.37 = 23 K through the transformation process, in total therefore theoretically of 85 K. In the absorption-force cycle with main and auxiliary circulation would be 46 K × 0.75 = 34.5 K. to use directly, but due to the larger pressure gradient would correspond to the comparatively a temperature range of 34.5 K × 1.37 = 47 K: the remaining heat of 0.25 × 46 K + 52 K = 63.5 K would be by means of the two external Heat also with the larger pressure gradient to use. This would correspond to a reference temperature of 63.5 K × 0.5 × 1.37 = 43.5 K. Theoretically, a comparison temperature of (47 + 43.5) K = 90.5 K would result. The comparison can be expected an absorption-power circuit with main and auxiliary circuit leads to a higher yield even outside the special cases of high or low maximum temperatures of a heat source with large temperature spread, as after the circuit US Pat. No. 6,269,644 is to be expected. The energetic superiority of the invention becomes even clearer when using heat from the upper temperature range to relax in accordance with the circuit 16 to below the ambient pressure (eg 0.5 bar) to perform or / and one of the in 11 to 15 shown method for increasing the temperature of the working medium vapor is applied by means of a Resorberkreislaufes. Both methods would be applicable in the comparative example and would increase the efficiency of the circuit according to the invention. In addition, according to the invention, variants are available which, for one temperature range, lead to slightly higher overall efficiency than the others: the circuit according to FIG 13 is for relatively low, the circuit according to the 14 for middle, the circuit according to the 15 - here without heat extraction - preferable for high maximum temperature of the heat source.

Fall the cooling temperatures e.g. due to weather conditions This may be the case in the proposed conditions Circuit circuits of types II and III are used by change the concentration limits of the rich solution the proportion of the main circulation to increase and the usable temperature range in the remaining part of the additional circuit to expand down.

To use a heat source with a larger temperature spread, the use of multiple expeller and absorber is necessary when using the absorption-power circuit with main and auxiliary circuit. That seems complicated. However, both units were built in many applications of refrigeration through several, connected by pipes shell and tube heat exchanger. In this respect, the technical overhead when using the invention is low. In addition, the use of inexpensive plate heat exchangers seems appropriate, since their energetic disadvantages in the expulsion by means of in 15 described solution introduction in the rectifier largely be repealed. The expected cost reductions due to the higher efficiency of the entire system will be given much greater weight.

1

HK Hochdruckaustreiber

 2

Rektifikator

3

Rektifikatorböden

4

first Replacement bottom in the rectifier

5

external heat source

 6

first HK-throttle

7

HK low pressure absorption

 7a

HK / ZK-low pressure absorption

8th

first HK-solution pump

 8a

first HK / ZK solution pump

9

HK-working medium liquid

 10

HK Capacitor

11

second HK-throttle

 12

HK-evaporator

13

Solution recycling by expeller

 14

poor HK solution

15

rich HK solution

 015

decreased Amount of rich HK solution

0015

main power rich HK solution

16

HK-stripping column

17

rectified HK work Medium-high

pressure steam

017

rectified Working medium pressure

steam both circuits

18

HK low pressure steam

18a

HK / ZK-low pressure steam

018

Low pressure steam both circuits

 19

HK-solution heat exchanger

19a

HK-solution heat exchanger of the above

reindeer temperature range

20

poor ZK solution

 21

first DC reactor

22

ZK-medium pressure absorber

 23

first ZK-solution pump

24

rich ZK solution

24a

rich ZK / RK solution

26

first ZK-stripping column

27

second ZK-stripping column

028

overheated Working medium vapor

29

HK-working agent vapor

30

Steam superheater

31

expansion machine

 32

generator

33

Chillers

 34

steam drum

35

Shut-off valves

 36

Shut-off valves

037

mixture of liquid and steam

 38

Heat Recovery Vapor Generator

39

first ZK-Hochdruckaustreiber

 40

HK / ZK-solution heat exchanger for the

middle and lower temperature

rich

41

Valve

 42

Solution recycling by HK sublingually

about

43a

Solution recycling by ZK-sublingually

about the upper pressure level

 43

Solution recycling by ZK-sublingually

about the lower pressure level

 44

second Partial stream rich ZK solution

45

Valve

 046

poor HK / ZK solution

47

second HK-stripping column

48

encircling poor solution

49

Solution Heat Vapor Generator

 50

poor ZK solution

51

second ZK-solution pump

52

Valve

53

first Partial stream of the rich CC solution

54

ZK-capacitor

54a

WT capacitor

55a

ZK-working fluid liquid

 55b

WT-working medium liquid

56

second DC reactor

 57

ZK-medium-pressure evaporator

58

enriched ZK solution

58a

enriched HK solution

59

second ZK medium-pressure absorber the

lower pressure stage

59a

HK / ZK medium pressure absorber

60

third ZK-solution pump

60a

HK / ZK solution pump

 61

enriched ZK solution

62

HK-work means high pressure steam

63

ZK-medium pressure steam the lower one

pressure stage

64

Brine

65

HK / ZK-solution heat exchanger of

middle temperature range

66

HK / ZK-solution heat exchanger of

lower temperature range

67

Valve

68

third DC reactor

69

rich ZK solution of the middle

/ Low-pressure auxiliary circuit

70

ZK-Mitteldruckaustreiber

 71

ZK-medium pressure steam

72

third HK-throttle

73

poor ZK solution

74

first HK / DC reactor

 75

WT-working medium fluid pump

76

cold storage

77

Valve

78

first RK-solution pump

 79

first RK-high-solution-

heat exchangers

80

RK-Hochdruckaustreiber

 81

rich RK solution the maximum pressure

expeller / absorber part circuit

 82

first RK-throttle

83

RK-work means high pressure steam

83a

WT-work means high pressure steam

84

RK-high pressure absorber

 84a

WT-high pressure absorber

84b

RK-high pressure absorber

 85

poor RK solution

85a

poor WT solution

 86

second RK-solution pump

86a

WT-solution pump

87

rich RK solution

88

second RK-throttle

 88a

WT-throttle

89

main power the external heat source

90

RK degasser

91

RK-medium pressure steam

91a

HK-medium pressure steam

92

first Partial flow of external heat

source

93

second Partial flow of external heat

source

94

Valve

 95

second Partial stream enriched Lö

sung

96

fourth ZK-solution pump

96a

second HP solution pump

 97

third Partial stream enriched ZK Lö

sung

98

control valve

99

fourth Partial stream of enriched CC

solution

99a

HK partial flow enriched solution

100

poor RK solution of the RK-Höchst

druckaustreiber / Absorber pitch

barrel

 101

second RK-maximum temperature would

exchangers

 101b

RK-high temperature solution heat

exchangers

102

Valve

103

Valve

 104

third Partial flow of external heat

source

 105

fourth Partial flow of external heat

mequelle

 106

fifth partial flow the external heat

mequelle

 107

first Partial flow of poor HK solution

108

second Partial flow of poor HK solution

 109

fourth RK-throttle

110

fourth DC reactor

110a

fourth HK-throttle

111

Valve

 112

second Partial flow additional flow poorer

ZK solution

112a

additional power poor HK solution

113

ZK / RK degasser / Mitteldruckaustrei

about

113a

HK / RK degasser / Mitteldruckaustrei

about

114

partial flow of high pressure steam

 115

partial flow of ZK work resources high

pressure steam

116

partial flow of working fluid high pressure

vapor

 117

partial flow Rich ZK solution

118

external heat consumer

 119

second ZK-Hochdruckaustreiber

120

Valve

121

rich depleted RK solution of

RK-high pressure absorber / Entga

serteilkreislaufes

 122

fourth RK-throttle

122a

second HK / DC reactor

123

impoverished ZK solution

124

Refrigerating agent

125

Valve

126

fifth CC throttle

127

WT-high pressure evaporator

128

fifth RK throttle

129

third ZK-stripping column

130

fourth ZK-stripping column

 131

first RK-stripping column

132

second RK-stripping column

 135

HK-Low Pressure absorbers

136

third HK-solution pump

 137

enriched poor HK solution

217

ZK-working medium pressure steam

Claims (31)

Working method of a sorption plant for a two-substance mixture of working medium and sorbent, which essentially comprises: an HK high-pressure discharge driver ( 1 ) for the expulsion of a mixed vapor of working medium and sorbent from a rich HK solution ( 15 ), • a rectifier ( 2 ) or a HK-Abtriebssäule ( 16 ) for the formation of almost pure working medium high-pressure steam ( 17 ), • a steam superheater ( 30 ) for overheating the almost pure working medium high-pressure steam ( 17 ), • a working relaxation machine ( 31 ) for the relaxation of the working medium vapor, and a main circuit with • an HK low-pressure absorber ( 7 ) for the absorption of HK low pressure steam ( 18 ), • a HK solution heat exchanger ( 19 ) for heat exchange between poor HK solution ( 14 ) and rich HK solution ( 15 ), characterized in that an additional circuit having the following features is added to the main circuit: (a) the working medium high pressure steam flows ( 017 ) of the main and auxiliary circuits are shared by the rectifier ( 2 ) to the expansion machine used jointly by the main and auxiliary circuits ( 31 (b) with removal or tap of ZK medium-pressure steam ( 29 ) from the expansion machine ( 31 ), (c) a ZK medium-pressure absorber ( 22 ) for absorption of the ZK medium-pressure steam taken or tapped from the expansion machine ( 29 ), (d) a first ZK solution pump ( 23 ) to increase the pressure of the rich ZK solution ( 24 ) to expeller pressure, (e) a first CC throttle ( 21 ) for throttling the poor ZK solution ( 20 ) on absorption pressure, (f) where for the rich ZK solution ( 24 ) a higher proportion of the work equipment than for the rich HK solution ( 15 ) (g) wherein a feed of the rich ZK solution ( 24 ) into the cold end of the rectifier ( 2 ), (h) an outfeed of the poor CC solution ( 20 ) from the warm end of the rectifier ( 2 ) takes place in the auxiliary circuit, (i) the ZK medium-pressure steam ( 29 ) from the expansion machine ( 31 ) to the ZK medium-pressure absorber ( 22 ), (j) the poor ZK solution ( 20 ) to the ZK medium-pressure absorber ( 22 ) for the absorption of the ZK medium-pressure steam ( 29 ) by the poor ZK solution ( 20 ) via the first ZK throttle ( 21 ) for throttling the poor ZK solution ( 20 ) is directed to absorption pressure, (k) the rich ZK solution ( 24 ) supported by the first ZK solution pump ( 23 ) back to the rectifier ( 2 ), (l) the poor CC solution ( 20 ) in the HK solution heat exchanger ( 19 ) in countercurrent to the rich HK solution ( 15 ), (m) the poor HK solution ( 14 ) for heat dissipation by its HK-Hochdruckaustreiber ( 1 ) ( 13 ) and the rich HK solution ( 15 ) for heat absorption by the HK low-pressure absorber ( 7 ) ( 42 ), (n) the rectifier ( 2 ) is designed for the rectification in countercurrent to the solution of the additional circuit, (o) wherein the pressure difference between rectifier ( 2 ) and ZK medium-pressure absorbers ( 22 ) smaller than zwi rectifier ( 2 ) and HK low-pressure absorbers ( 7 ), (p) that from the HK high-pressure driver ( 1 ) coming mixed vapors by heat exchange and mass exchange with the solution of the additional circuit in the rectifier ( 2 ) is partially condensed and return liquid of the main circuit is at least largely formed, and (q) deviating from the mode of operation of a single circuit in which working fluid is supplied and evaporated, now at least from the rich ZK solution ( 24 ) Expelled working medium vapor and the solution of the additional circuit is heated. Working method of a sorption plant for a two-substance mixture of working medium and sorbent, which essentially comprises: an HK high-pressure discharge driver ( 1 ) for the expulsion of a mixed vapor of working medium and sorbent from a rich HK solution ( 15 ), • a rectifier ( 2 ) or a HK-Abtriebssäule ( 16 ) for the formation of almost pure working medium high-pressure steam ( 17 ), • a steam superheater ( 30 ) for overheating the almost pure working medium high-pressure steam, • a work-performing expansion machine ( 31 ) for the relaxation of the working medium vapor and a main circuit with • a HK low-pressure absorber ( 7 ) for the absorption of HK low pressure steam ( 18 ), • a HK solution heat exchanger ( 19 ) for heat exchange between poor HK solution ( 14 ) and rich HK solution ( 15 ), characterized in that an additional circuit having the following features is added to the main circuit: (a) the working medium high pressure steam flows ( 017 ) of the main and auxiliary circuits are shared by the rectifier ( 2 ) to the expansion machine used jointly by the main and auxiliary circuits ( 31 (b) with removal or tap of ZK medium-pressure steam ( 29 ) from the expansion machine ( 31 ), (c) a ZK medium-pressure absorber ( 22 ) for absorption from the expansion machine ( 31 ) withdrawn or tapped ZK medium pressure steam ( 29 ), whereby a pressure increase takes place such that (d1) a first ZK solution pump ( 23 ) to increase the pressure of the poor ZK solution ( 20 ) from the pressure level of the HK low-pressure absorber ( 7 ) to the pressure level of the ZK medium-pressure absorber ( 22 ), (d2) a second ZK solution pump ( 51 ) to increase the pressure of the rich ZK solution ( 24 ) to expeller pressure, and (f) where for the rich CC solution ( 24 ) a higher proportion of the work equipment than for the rich HK solution ( 15 ) (g) wherein a feed of the rich ZK solution ( 24 ) from the additional circuit into the cold end of the rectifier ( 2 ), wherein a guide of the poor ZK solution is carried out such that (h1) the poor ZK solution ( 20 ) over the rectifier ( 2 ) in the exporters ( 1 ), (h2) the mass flows of poor CC solution ( 20 ) and rich HK solution ( 15 ) from the drain of the HK low-pressure absorber ( 7 ) or after the HK low-pressure absorber ( 7 ), where (h3) are those from the HK low-pressure absorber ( 7 ) to the HK high-pressure driver ( 1 ) to be passed rich HK solution ( 015 ) is the difference of the rich HK solution required for the expulsion ( 15 ) minus the poor ZK solution ( 20 ), (i) the ZK medium pressure steam ( 29 ) from the expansion machine ( 31 ) to the ZK medium-pressure absorber ( 22 ), (j) the poor ZK solution ( 20 ) to the ZK medium-pressure absorber ( 22 ) for the absorption of the ZK medium-pressure steam ( 29 ) by the poor ZK solution ( 20 ) via the first ZK throttle ( 21 ) for throttling the poor ZK solution ( 20 ) is directed to absorption pressure, (k) the rich ZK solution ( 24 ) supported by the first ZK solution pump ( 23 ) back to the rectifier ( 2 ), (m) the poor HK solution ( 14 ) for heat release by the HK-Hochdruckaustreiber ( 1 ) ( 13 ) and the rich HK solution ( 15 ) for heat absorption by the HK low-pressure absorber ( 7 ) ( 42 ), (n) the rectifier ( 2 ) is designed for the rectification in countercurrent to the solution of the additional circuit, (o) wherein the pressure difference between rectifier ( 2 ) and ZK medium-pressure absorbers ( 22 ) smaller than between rectifier ( 2 ) and HK low-pressure absorbers ( 7 ), (p) that from the HK high-pressure driver ( 1 ) coming mixed vapors by heat exchange and mass exchange with the solution of the additional circuit in the rectifier ( 2 ) is partially condensed and return liquid of the main circuit is at least largely formed and (q) deviating from the operation of a single circuit, is supplied to the working fluid and evaporated, now at least from the rich ZK solution ( 24 ) Expelled working medium vapor and the solution of the additional circuit is heated. Working method according to one of claims 1 or 2, characterized in that the ZK-working medium high-pressure steam ( 217 ) through the poor HK solution ( 14 ) is overheated. Working method of a sorption plant for a dual-substance mixture of working medium and sorbent tel, which essentially comprises: an HK high-pressure outlet driver ( 1 ) for the expulsion of a mixed vapor of working medium and sorbent from its rich HK solution ( 15 ), • a rectifier ( 2 ) or a HK-Abtriebssäule ( 16 ) for the formation of almost pure working medium high-pressure steam ( 17 ), • a steam superheater ( 30 ) for overheating the almost pure working medium high-pressure steam, • a work-performing expansion machine ( 31 ) for the relaxation of the working medium vapor and a main circuit with • a HK low-pressure absorber ( 7 ) for the absorption of HK low pressure steam ( 18 ), characterized in that an additional circuit having the following features is added to the main circuit: (a0) a first ZK high-pressure compressor ( 39 ) with downstream first ZK output column ( 26 ), (a1) the working medium high-pressure steam flows from main ( 17 ) and additional cycle ( 217 ) are added to the expansion machine used jointly by the main and auxiliary circuits ( 31 (b) with removal or tapping of ZK medium pressure medium vapor ( 29 ) from the expansion machine ( 31 ), (c) a ZK medium-pressure absorber ( 22 ) for absorption of the ZK medium-pressure steam taken or tapped from the expansion machine ( 29 ), (d) a first ZK solution pump ( 23 ) to increase the pressure of the rich ZK solution ( 24 ) to expeller pressure, where (f) for the rich ZK solution ( 24 ) a higher proportion of the work equipment than for the rich HK solution ( 15 ), wherein a guidance of the poor ZK solution takes place in such a way that (h1) the poor ZK solution ( 20 ) into the HK high pressure compressor ( 1 ), and (h2) the streams of poor CC solution ( 20 ) and rich HK solution ( 15 ) from the drain of the HK low-pressure absorber ( 7 ) or after the HK low-pressure absorber ( 7 ), where (h3) are those from the HK low-pressure absorber ( 7 ) to the HK high-pressure driver ( 1 ) to be passed rich HK solution ( 015 ) is the difference of the rich HK solution required for the expulsion ( 15 ) minus the poor ZK solution ( 20 ), (i) the ZK medium pressure steam ( 29 ) from the expansion machine ( 31 ) to the ZK medium-pressure absorber ( 22 ), (m) the poor HK solution ( 14 ) for heat release by the HK-Hochdruckaustreiber ( 1 ) ( 13 ) and the rich HK solution ( 15 ) for heat absorption by the HK low-pressure absorber ( 7 ) (42), (o) where the pressure difference between HK high-pressure 1 ) and ZK medium-pressure absorbers ( 22 ) smaller than between HK-Hochdruckaustreiber ( 1 ) and HK low-pressure absorbers ( 7 ), (r) the first ZK high pressure exporter ( 39 ) and the HK high pressure actuator ( 1 ) are under the same pressure level, and (s) the temperature level of the external heat supply ( 5 ) to the first ZK high pressure exporter ( 39 ) lower than that of the HK high pressure compressor ( 1 ), wherein a solution heat exchange takes place in such a way that (t1) in the upper temperature range an HK solution heat exchanger ( 19a ) and (t2) in the middle and lower temperature range, a HK / ZK solution heat exchanger ( 40 ), where (t3) the poor HK solution ( 14 ) first through the HK solution heat exchanger ( 19a ) of the upper temperature range and in countercurrent to the rich HK solution ( 015 ), or a first substream ( 107 ) of the poor HK solution first through the HK solution heat exchanger ( 19a ) of the upper temperature range and a second partial flow ( 108 ) of the poor HK solution through the first ZK high pressure expeller ( 39 ) is passed to the heat release and (t4) then the poor HK solution ( 14 ) through the HK / ZK solution heat exchanger ( 40 ) for the middle and lower temperature range and countercurrent to the rich solutions ( 15 respectively. 015 . 24 respectively. 44 ) is cooled in both circuits. Working method according to claim 4, characterized in that the following features are additionally provided: (a2) the working medium high-pressure steam flows from main (a) 62 ) and additional cycle ( 217 ) are passed together through the rectifying part of a rectifier, (g) wherein a feed of the rich ZK solution ( 24 ) from the additional circuit into the cold end of the rectifier ( 2 ) and (n) the amplification part of the rectifier ( 2 ) is designed for the rectification in countercurrent to the solution of the additional circuit, (p) that from the HK-Hochdruckaustreiber ( 1 ) coming mixed vapors by heat exchange and mass exchange with the solution of the additional circuit in the rectifier ( 2 ) are partially condensed and return fluid of the main circuit is at least largely formed and (q1) deviating from the operation of a single circuit in which working fluid is supplied to the rectifier and evaporated, now at least from the rich ZK solution ( 24 ) Expelled medium vapor and the solution of the additional circuit is heated, wherein additionally (q2) the rectification is additionally supported by a first partial flow ( 53 ) of the rich ZK solution is introduced without warming into the cold end of the rectifier. Working method according to claim 5, characterized in that in addition is provided: • the rich ZK solution ( 24 ) after the first ZK solution pump ( 23 ) into two partial streams ( 44 . 53 ), where • the first partial flow ( 53 ) in the cold end of the reinforcing part of the rectifier ( 2 ) and the second sub-stream ( 44 ) via the HK / ZK solution exchanger ( 40 ) for the lower and middle temperature range in the middle part of the reinforcing part of the rectifier ( 2 ) is initiated. Working method according to one of claims 4 to 6, characterized in that • in the HK-Hochdruckaustreiber ( 1 ) produced HK-Arbeitsmittelhochdruckdampf ( 62 ) to the first ZK high pressure exporter ( 39 ) and • below the hot end of the reinforcing part of the first ZK high-pressure compressor ( 39 ) associated rectifier ( 2 ) is initiated. Working method according to one of claims 4 to 6, characterized in that in HK-Hochdruckaustreiber ( 1 ) produced HK-Arbeitsmittelhochdruckdampf ( 62 ) in the hot part of the first ZK high-pressure exhauster ( 39 ) is initiated. Working method according to claim 5, characterized in that the reinforcing part of the rectifier ( 2 ) is designed as a packed column. Working method according to one of claims 4 to 9, characterized in that • the absorption in the additional circuit in addition to the first ZK absorber ( 22 ) in further ZK medium-pressure absorbers ( 59 ) is carried out in each case with lower pressure levels, wherein • the ZK-working medium vapors to be absorbed in the additional cycle ( 29 . 63 ) of the relaxation machine ( 31 ) each at the pressure level of one of the ZK medium-pressure absorbers ( 22 . 59 ) and in each case these are fed to the absorption, and • in the additional cycle, the expiring ZK solution ( 61 ) of the respective previous ZK absorber ( 59 ) to the pressure of the subsequent ZK medium-pressure absorber operated in its solutions with higher working agent proportions ( 22 ) by means of a third ZK solution pump ( 60 ) and this ZK medium-pressure absorber ( 22 ). Working method according to one of claims 4 to 9, characterized in that • in the additional circuit, a second ZK-Hochdruckaustreiber ( 119 ), where • for this same high-pressure level as for the first HK-Hochdruckausustreiber ( 1 ) and the first ZK high pressure exporter ( 39 ) in the second ZK high pressure exporter ( 119 ) ZK high-pressure working fluid generated in total or a second partial flow ( 115 ) the HK high pressure compressor ( 1 ) with downstream rectifier or directly the rectifier ( 2 ), • the second ZK high pressure exporter ( 119 ) the poor solution ( 20 ) of the first ZK high-pressure driver ( 39 ) is fed to the expulsion, • the absorption in the additional circuit in addition to the first ZK absorber ( 22 ) in further ZK medium-pressure absorbers ( 59 ) is carried out in each case with lower pressure levels, wherein • the ZK-working medium pressure vapors to be absorbed in the additional cycle ( 29 . 63 ) of the relaxation machine ( 31 ) each at the pressure level of one of the ZK medium-pressure absorbers ( 22 . 59 ) and in each case these are fed to the absorption, • in the additional cycle, the running enriched ZK solution ( 61 ) of the respective previous ZK medium-pressure absorber ( 59 ) to the pressure of the subsequent ZK medium-pressure absorber operated in its solutions with higher working agent proportions ( 22 ) by means of a respective further ZK solution pump ( 60 ) and this ZK medium-pressure absorber ( 22 ) from one of possibly several existing intermediate-pressure medium-pressure absorbers ( 59 ) to the second ZK high pressure exporter ( 119 ) enriched ZK solution to be passed ( 99 ) as the difference between the enriched ZK solution needed for expulsion and the poor ZK solution ( 20 ) from the first ZK high pressure expeller ( 39 ) yields this difference quantity as the fourth CC subset ( 99 ) by means of a fourth inserted ZK solution pump ( 96 ) and brought to heat absorption by the HK / ZK solution heat exchangers ( 65 . 66 ) and in the middle and lower temperature range an additional HK / ZK solution heat exchanger ( 40 ) is added for the lower and middle temperature range and in the HK / ZK solution heat exchanger ( 40 ) for the lower and middle temperature range heat from the poor ( 14 ) HK solution and / or from the third substream ( 104 ) of the external heat source from its lowest temperature range to the rich HK solution ( 015 ) and rich ZK solution ( 24 . 44 ), and the poor ZK solution is managed in such a way that (h1) the depleted ZK solution ( 123 ) from the second ZK high pressure exporter ( 119 ) to the HK high-pressure driver ( 1 ) and is introduced there for expulsion, (h3) wherein the from a HK / ZK low-pressure absorber ( 7a ) to the HK high-pressure driver ( 1 ) to be passed rich HK solution ( 015 ) is the difference of the rich HK solution required for the expulsion ( 15 ) minus the depleted ZK solution ( 123 ) from the second ZK high pressure exporter ( 119 ), and the solution heat exchange takes place in such a way that (t4) the poor HK solution ( 14 ) and / or a third partial flow ( 104 ) of the external heat source from its lowest temperature range by the HK / ZK-Lö heat exchanger ( 40 ) for the middle and lower temperature range and countercurrent to the rich solutions ( 15 respectively. 015 . 24 respectively. 44 ) are cooled in both circuits. Working method according to one of claims 4 to 11, characterized in that in the main circuit on the solution side, a two absorber ( 135 ) are connected in series, and in the main circuit • a HK low-pressure absorber ( 135 ) and • a third HK solution pump ( 136 ), • the pressure level of the HK low-pressure absorber ( 135 ) lower than the HK low-pressure absorber ( 7 ), • the poor HK solution ( 14 ) becomes the HK low-pressure absorber ( 135 ), the enriched poor HK solution ( 137 ) is powered by the HK Low-Pressure Absorber ( 135 ) supported by the third HK solution pump ( 136 ) to the HK low-pressure absorber ( 7 ) to the absorption, • the poor HK solution ( 14 ) is provided by the HK 1 ) supported by the first HK throttle ( 6 ) to the HK low-pressure absorber ( 135 ) to the absorption, • the relaxation is in the relaxation machine ( 31 ) at low pressure, • working fluid low-pressure steam ( 134 ) is added to the HK low-pressure absorber ( 135 ) for absorption, • HK low-pressure steam ( 18 ) is removed or tapped from the expansion machine. Working method according to one of claims 3 to 10 and 12, characterized in that in the main circuit twice external heat supply takes place and that method compared to claim 3 substantially additionally comprises: • a HK-medium pressure ( 70a ) for the expulsion of a mixed vapor of working medium and sorbent ( 91a ) from the rich HK solution ( 15 ) derived from the HK low-pressure absorber ( 7 ), • a HK / ZK medium-pressure absorber ( 59a ) for absorption in the HK medium pressure actuator ( 70a ) generated HK medium pressure steam ( 91a ) by means of the HK solution ( 050 ) derived from the HK low-pressure absorber ( 7 ) is added, and an additional circuit is added, which is formed in each case with features of one of claims 3 to 10 and 12, and wherein • for the HK medium-pressure distributor ( 70a ) a lower pressure than for the first ZK high pressure expeller ( 39 ), • the temperature level of the external heat supply to the HK medium pressure driver ( 70a ) lower than that of the first ZK high-pressure driver ( 39 ) determined from the first HK high pressure expeller ( 1 ) expiring poor HK solution ( 14 ) after the HK / ZK solution heat exchanger ( 65 ) of the medium temperature range into the HK medium pressure driver ( 70a ), • the HK / ZK medium-pressure absorber ( 59a ) to the HK high-pressure driver ( 1 ) enriched HK solution to be passed ( 99a ) is the difference between the enriched HK solution needed for expulsion and the poor ZK solution ( 20 ) yields, • the second subset of enriched HK solution ( 99a ) by means of second HK solution pump ( 96a ) is brought to a high pressure level, and that for an absorber of possibly several existing HK / ZK medium-pressure absorbers ( 59a ) the one with the lowest pressure stage is determined, and the solution heat exchange takes place in such a way that (t4) a HK / ZK solution heat exchanger ( 65 ) for the middle and one HK / ZK solution heat exchanger ( 65 ) is provided for the lower temperature range and • the poor HK solution ( 14 ) and / or the external heat source or only a partial flow ( 104 ) of the external heat source from its low temperature range through the HK / ZK solution heat exchanger ( 65 ) for the middle temperature range and • countercurrent to the enriched HK solutions ( 99a ) and the rich ZK solution ( 24 or 44 ) and • the poor HK solution ( 14 ) and / or the external heat source ( 5 ) or only a partial flow ( 105 ) of the external heat source in its lowest temperature range through the HK / ZK solution heat exchanger ( 66 ) for the lower temperature range is passed in countercurrent to the rich HK solution ( 15 ), to the enriched HK solution ( 99a ) and the rich ZK solution ( 24 or 44 ) is cooled. Working method according to one of the preceding claims 4 to 11 and 13, characterized in that are additionally inserted in the additional circuit: a ZK medium-pressure expander ( 70 ), a HK / ZK solution heat exchanger ( 66 ) for the lower temperature range, and at least one first HK / ZK throttle ( 74 ) and a medium / low-pressure additional circuit, wherein • for this ZK medium-pressure 70 ) a lower pressure than for the first ZK high pressure expeller ( 39 ), that a heat supply to the ZK medium pressure actuator ( 70 ), wherein the temperature level of the heat supply is lower than that of the first ZK-Hochdruckausustreibers ( 39 ), whereby • the heat supply only by external heat supply ( 5 ) or only by poor HK solution ( 14 ) or by external heat supply ( 5 ) and the second partial flow of the poor HK solution ( 108 ), • the ZK medium-pressure steam ( 71 ) from the centralized ZK medium pressure driver ( 70 ) to the possibly existing multiple ZK medium-pressure absorbers ( 22 ) Trains which has the highest pressure level, • the HK / ZK low-pressure absorber ( 7a ) is integrated into both the medium / low pressure auxiliary circuit and the main circuit, • for the rich CC solution ( 69 ) of the medium / low pressure auxiliary circuit the same proportion of working fluid and solvent as in the rich solution ( 015 ) of the main circuit, • rich ZK solution ( 69 ) of the medium / low pressure auxiliary circuit from the HK / ZK low pressure absorber ( 7a ) to the centralized medium pressure compressor ( 70 ), where • the rich ZK solution ( 69 ) between the ZK / HK solution heat exchangers ( 66 and 65 ) from the rich HK solution ( 015 ) and • into the ZK medium pressure distributor ( 70 ), • the rich HK solution ( 015 ) with the rich ZK solution ( 69 ) of the medium / low pressure auxiliary circuit ( 0015 ) with a first HK / ZK solution pump ( 8a ) to the pressure level of the ZK medium pressure driver ( 70 ) and then the rich HK solution ( 015 ) by means of a second HK solution pump ( 96a ) to the pressure level of the HK high pressure actuator ( 1 ) or with the first HK / ZK solution pump ( 8a ) immediately to the pressure level of the HK high pressure actuator ( 1 ) and in this case the rich CC solution ( 69 ) of the medium / low pressure auxiliary circuit by means of third ZK throttle ( 68 ) to the pressure level of the ZK medium pressure driver ( 70 ), • the effluent solution from the centralized medium pressure compressor ( 70 ) as a poor CC solution ( 73 ) of the medium / low pressure auxiliary circuit upstream of the HK / ZK solution heat exchanger ( 66 ) of the lower temperature range with the poor HK solution ( 14 ) and • through the HK / ZK solution heat exchanger ( 66 ) to the HK / ZK low-pressure absorber ( 7a ), and • the poor HK solution ( 14 ) with the third HK throttle ( 72 ) to the pressure level of the ZK medium pressure driver ( 70 ) throttled, and then united ( 014 ) with the poor ZK solution ( 73 ) with a first HK / ZK throttle ( 74 ) is lowered to low pressure, • the mass balance is to be closed by increasing the supply of HK / ZK low-pressure steam ( 18a ) to the HK / ZK low-pressure absorber ( 7a ) with a corresponding reduction in the removal of ZK medium-pressure steam ( 63 ) from the expansion machine ( 31 ) and elevated line from solution to HK / ZK low-pressure absorber ( 7a ) from the ZK medium-pressure absorber ( 22 ) via the first ZK high-pressure expeller ( 39 ) and HK high pressure expander ( 1 ), if in the ZK medium pressure driver ( 70 ) generated ZK medium pressure steam ( 71 ) has a higher solvent content than that from the expansion machine ( 31 ) to the ZK medium-pressure absorber ( 59 ), and the solution heat exchange takes place in such a way that (t4) a HK / ZK solution heat exchanger ( 65 ) for the middle and one HK / ZK solution heat exchanger ( 65 ) is provided for the lower temperature range and • the poor HK solution ( 14 ) and / or the external heat source or only a partial flow of the external heat source from its low temperature range through the HK / ZK solution heat exchanger ( 65 ) for the middle temperature range and • countercurrent to the rich HK solutions ( 015 ) and rich ZK solution ( 24 or 44 ), optionally also to the enriched ZK solution ( 99 ) and the poor HK solution ( 14 ) and / or the external heat source or only a partial flow of the external heat source in its lowest temperature range by the HK / ZK solution heat exchanger ( 66 ) for the lower temperature range is passed in countercurrent to the rich HK solution ( 0015 ) and the rich CC solutions ( 69 . 24 or 44 ), optionally also to the enriched ZK solution ( 99 ) is cooled. Working method according to claim 14, characterized in that the ZK medium pressure actuator ( 70 ) in addition to the substream of the rich CC solution ( 69 ) of the medium / low pressure auxiliary circuit a third subset ( 97 ) in the ZK medium-pressure absorber ( 59 ) of the lower pressure stage generated enriched ZK solution ( 58 ). Working method according to one of claims 13 to 15, characterized in that at a temperature level between the first ZK-Hochdruckaustreiber ( 39 ) and the ZK medium pressure driver ( 70 ) Heat to an external heat consumer ( 118 ) is abgege ben, wherein the heat transfer from the second partial flow ( 108 ) of the poor HK solution ( 14 ) from the first HK high-pressure 1 ), or additionally from the main stream of the external heat source ( 89 ) he follows. Working method according to one of claims 4 to 16, characterized in that in the middle part of the rectifier ( 2 ): • a poor solution ( 20 or 123 ) from the ZK high-pressure compressor ( 39 or 119 ) with the least amount of working agent in the poor solution and / or • an enriched solution ( 99 or 99a ) from the HK / ZK or ZK medium-pressure absorber ( 59a or 59 ) of the lowest pressure stage, wherein • the enriched solution ( 99 or 99a ) only by HK / ZK solution heat exchangers of the lower and middle temperature range ( 65 and 66 respectively. 40 ) and an HK solution heat exchanger is not provided. Working method according to one of claims 4 to 17, characterized in that • as expeller a heat recovery vapor generator ( 38 ), from the enriched solution ( 49 ) in the HK high-pressure 1 ) and first ZK high pressure exporter ( 39 ), a liquid / vapor mixture ( 037 ), the Heat Recovery Vapor Generator ( 38 ) is combined with a steam drum ( 34 ), in which the liquid / vapor mixture ( 037 ) into a mixed vapor of working medium and solvent and a poor HK / ZK solution ( 046 ), and • the poor HK / ZK solution ( 046 ) from the steam drum ( 34 ) the first ZK print driver ( 39 ) and then the HK solution heat exchanger ( 19a ) of the upper temperature range or, initially, the second ZK high-pressure expeller ( 119 ) is supplied to the heat dissipation, • the heat supply to the first ZK-Hochdruckaustreiber ( 39 ) or in addition to the second ZK-Hochdruckaustreiber ( 119 ) through the poor HK / ZK solution ( 046 ) from the steam drum ( 34 ), and the poor HK solution ( 14 ) from the steam drum ( 34 ) running low HK / ZK solution ( 046 ) after the HK solution heat exchanger ( 19a ) of the upper temperature range, • the remaining circulating poor HK / ZK solution ( 48 ) with the poor ZK solution ( 20 ) from the first ZK high pressure expeller ( 39 ) or additionally with the depleted ZK solution ( 123 ) from the second ZK high pressure exporter ( 119 ), and • both as an enriched HK / ZK solution ( 49 ) the Heat Recovery Vapor Generator ( 38 ). Working method according to one of the preceding claims 4 to 18, characterized in that a Resorberkreislauf is added to the main and the additional circuit, which has the following features: • a RK Höchstdruckaustreiber ( 80 ) for expelling RK maximum working pressure steam ( 83 ), • an RK high-pressure absorber ( 84 ) for absorption in the RK peak pressure 80 ) expelled RK-Arbeitsmittelhigh pressure steam ( 83 ), • an RK degasser ( 90 ) for expelling RK medium pressure steam ( 91 ), • a first RK maximum temperature solution heat exchanger ( 79 ) in the RK-Höchstdruckaustreiber / Absorberteilkreislauf for heat dissipation of its poor RK solution ( 100 ) to its rich RK solution ( 81 ), • a second RK-Höchsttemperaturlösungswärmetauscher ( 101 ) in the RK-Höchstdruckabsorber / Entgaserteilkreislauf for heat dissipation of its rich RK solution ( 87 ) to its poor RK solution ( 85 ), • a first RK throttle ( 82 ) for throttling the poor RK solution ( 100 ) of the RK-Höchstdruckaustreiber / Absorberteilkreislaufes on absorption pressure, • a second RK throttle ( 88 ) for throttling the rich RK solution ( 87 ) in the RK-Höchstdruckabsorber / Entgaserteilkreislauf at high pressure level, • a fourth RK throttle ( 122 ) for throttling the depleted RK solution ( 121 ) in the RK-Höchstdruckabsorber / Entgaserteilkreislauf on medium pressure level, • a first RK-solution pump ( 78 ) to increase the pressure of the rich solution ( 81 ) in the RK-Höchstdruckaustreiber / Absorberteilkreislauf to maximum pressure level, • a second RK-solution pump ( 86 ) to increase the pressure of the poor RK solution ( 85 ) in the RK high-pressure absorber / degassing sub-circuit at maximum pressure level, whereby • for RK-Höchstdruckaustreiber ( 80 ) and absorbers ( 84 ) higher pressure than in the HK high-pressure compressor ( 1 ), • for the RK degasser ( 90 ) almost the same pressure level as the pressure in the ZK medium-pressure absorber ( 59 ) of the lower pressure level, and that • the rich RK solution ( 87 ) of the maximum pressure absorber / degassing circuit of the RK-Höchstdruckabsorber ( 84 ) to the HK high-pressure driver ( 1 ) over the second RK high temperature solution heat exchanger ( 101 ) and via the second RK throttle ( 88 ), • the depleted RK solution ( 121 ) of the high-pressure absorber / degasifier partial circuit from the HK high-pressure compressor ( 1 ) united with the poor HK solution ( 14 ) for heat release by the HK solution heat exchanger ( 19a ) of the upper temperature range and the ( 65 ) HK / ZK solution heat exchanger of the medium temperature range and then throttled alone by means of the fourth RK throttle ( 122 ) to the RK degasser ( 90 ), • the poor RK solution ( 85 ) of the high-pressure absorber / degassing circuit of the HK-Austreiber ( 1 ) supported by its second RK solution pump ( 86 ) over the second RK peak heat exchanger ( 101 ) to the RK-Höchstdruckabsorber ( 84 ), • the RK-Arbeitsmittelhöchstdruckdampf ( 83 ) from the RK peak pressure actuator ( 80 ) to the RK-Höchstdruckabsorber ( 84 ), • the RK medium-pressure steam ( 91 ) from the RK degasser ( 90 ) to the ZK medium-pressure absorber ( 59 ) of the lower pressure stage and is absorbed there, • the rich RK solution ( 81 ) in the expeller / absorber partial circuit after the HK / ZK solution heat exchanger ( 65 ) of the mean temperature range of the ZK solution ( 24 respectively. 44 ) by means of valve ( 77 ), the rich RK solution ( 81 ) of the maximum pressure expander / absorber partial circuit by means of its first RK solution pump ( 78 ) is brought to maximum pressure level and • in the first RK maximum temperature solution heat exchanger ( 79 ) and • into the RK high-pressure exporter ( 80 ) is initiated for expulsion, • the expulsion in the RK-Höchstdruckaustreiber ( 80 ) is set so that a poor RK solution ( 100 ) of the RK-Höchstdruckaustreiber / Absorberteilkreislaufes with the same proportion of working fluid is formed as the enriched solution ( 58 respectively. 61 ) from the ZK medium-pressure absorber ( 59 ) of the lower pressure stage, • the poor RK solution ( 100 ) of the RK maximum pressure expander / absorber sub-circuit in the first RK maximum temperature solution heat exchanger ( 79 ) in countercurrent to the rich RK solution ( 81 ), the poor RK solution ( 100 ) of the RK Höchstdruckaustreiber / Absorberteilkreislaufes by means of the first RK throttle ( 82 ) lowered to high pressure and in the middle part of the first ZK-Hochdruckaustreibers ( 39 ), • the mass balance of the maximum pressure actuator / medium pressure absorber partial circuit and of the maximum pressure absorber / degasifier partial circuit by the same size of the steam flows exchanged between them ( 83 and 91 ) or approximately equal dimensioning of the vapor streams exchanged between them ( 83 and 91 ) and is closed by the solution loops connecting them, • the RK-Höchstdruckaustreiber ( 80 ) external heat is supplied from its upper temperature range, • the RK degasser ( 90 ) Heat from the lower temperature range is supplied to the external heat source, • the heat removal from the RK high-pressure absorber ( 84 ) to a first partial flow ( 92 ) of the external heat source before its heat release to the sorption plant takes place and • this first partial flow ( 92 ) of the external heat source for heat emission to the working medium superheater ( 30 ), where • a first substream ( 114 ) in the HK high pressure actuator ( 1 ) or in the second ZK high pressure exporter ( 119 ) generated high pressure steam in the RK-Höchstdruckabsorber ( 84 ), and the guidance of the poor ZK solution is carried out in such a way that (h3) that from the HK / ZK low-pressure absorber ( 7a ) to the HK high-pressure driver ( 1 ) to be passed rich HK solution ( 015 ) is the difference of the rich HK solution required for the expulsion ( 15 ) minus the poor ZK solution ( 20 ) and minus the rich RT solution ( 87 ). Working method according to one of claims 4 to 18, characterized in that the sorption a Resorberkreislauf is added, which has the following features: • an RK high-pressure absorber ( 84b ) for the absorption of high-pressure steam ( 114 respectively. 116 ), • an RK degasser ( 90 ) for expelling RK medium pressure steam ( 91 ), • a RK high-temperature solution heat exchanger ( 101b ) in the RK high-pressure absorber / Entgaserteilkreislauf for heat dissipation of its rich RK solution ( 87 ) to its poor RK solution ( 85 ), • a second RK throttle ( 88 ) for throttling the rich RK solution ( 87 ) in the RK high pressure absorber / Entgaserteilkreislauf at high pressure level or a second RK throttle ( 88 ) for throttling the rich RK solution ( 87 ) in the RK high-pressure absorber / degassing sub-circuit at low pressure level, • a fifth RK throttle ( 128 ) for throttling the poor RK solution ( 85 ) in the RK high pressure absorber / degassing circuit at medium pressure level, • a second RK solution pump ( 86 ) to increase the pressure of the poor RK solution ( 85 ) in the RK high-pressure absorber / degassing sub-circuit at high pressure level, wherein • for the RK high-pressure absorber ( 84b ) the same pressure level as the pressure of the first HK high-pressure driver ( 1 ), • for the RK degasser ( 90 ) almost the same pressure level as in the ZK medium-pressure absorber ( 59 ) of the lower pressure stage and that • the rich RK solution ( 87 ) of the high-pressure absorber / Entgaserteilkreislaufes to HK / ZK low-pressure absorber ( 7a ) for heat release by the HK-solution heat exchanger ( 19a ) of the upper temperature range and the HK / ZK solution heat exchangers ( 65 . 66 ) throttled by means of the fourth RK throttle ( 109 ) or for indirect heat release by the RK degasser ( 90 ) throttled by means of second RK throttle ( 88 ) in the RK degasser ( 90 ), • the poor RK solution ( 85 ) of the high-pressure absorber / Entgaserteilkreislaufes of the degasser ( 90 ) supported by its second RK solution pump ( 86 ) over the RK high temperature solution heat exchanger ( 101b ) to the RK high-pressure absorber ( 84b ), • a partial flow of the working medium high-pressure steam ( 116 ) from the rectifier ( 2 ) or a first substream of the high-pressure steam ( 114 ) from the HK high pressure actuator ( 1 ) to the RK high-pressure absorber ( 84a ) is passed to the absorption, • the RK medium-pressure steam ( 91 ) from the RK degasser ( 90 ) to the ZK medium-pressure absorber ( 59 ) of the lower pressure stage and is absorbed there, • the mass balance of the high pressure absorber / degasser subcircuit by the same size of the exchanged with him RK vapor streams ( 83 and 91 ) or approximately the same size of the RK vapor streams exchanged with it ( 83 and 91 ) and is closed via the solution loops connecting them, • the RK degasser ( 90 ) external heat is supplied from the lower temperature range, • the heat removal from the RK high-pressure absorber ( 84b ) to a first partial flow ( 92 ) the external heat source takes place before the heat is released to the sorption plant, and this first partial flow ( 92 ) of the external heat source for heat dissipation to the working fluid steam superheater ( 30 ). Working method according to one of claims 4 to 18 and 20, characterized in that • the RK degasser ( 90 ) to a degasser / medium pressure compressor ( 113 respectively. 113a ), • a fourth HK throttle ( 110a ) or fourth CC throttle ( 110 ) for throttling the additional flow of poor HK solution ( 112a ) or the additional current of poor CC solution ( 112 ) is inserted at low pressure, • wherein the degasser / medium pressure distributor ( 113 respectively. 113a ) rich HK solution ( 15 ) or a partial stream of rich ZK solution ( 117 ) from the low-pressure absorber ( 7 respectively. 7a ) over the way first HK solution pump ( 8th ), HK / ZK solution heat exchanger ( 66 ) of the lower temperature range is additionally supplied and • an additional current of poor solution ( 112 respectively. 112a ) from the degasser / medium pressure actuator ( 113 respectively. 113a ) over the way return through the degasser / medium pressure actuator ( 113 respectively. 113a ) with indirect heat dissipation, via an inserted fourth HK throttle ( 110a ) or the fourth CC throttle ( 110 ) the low-pressure absorber ( 7 respectively. 7a ). Working method according to one of claims 4 to 18, characterized in that in addition a heat transformation subcircuit is inserted, and this subcircuit comprises • a WT capacitor ( 54a ) for the condensation of the ZK-working medium high-pressure steam ( 217 ), • a WT high-pressure evaporator ( 127 ) for producing high pressure WT ( 83a ), • a WT working fluid pump ( 75 ) for pressure increase of WT working fluid ( 55a ) at maximum pressure level, • a WT throttle ( 88a ) for throttling the rich WT solution ( 87a ) at high pressure level, • a WT solution pump ( 86a ) to increase the pressure of the poor WT solution ( 85a ) at the highest pressure level, whereby • for the WT high pressure evaporator ( 127 ) a higher pressure than the pressure in the HK-Hochdruckaustreiber ( 1 ), the rich WT solution ( 87a ) by means of WT throttle ( 88a ) lowered to high pressure level and removed from the WT high-pressure absorber ( 84a ) to the HK high-pressure driver ( 1 ) via the WT throttle ( 88a ), the poor WT solution ( 85a ) supported by the HK exporter ( 1 ) of its WT solution pump ( 86a ) to the WT high-pressure absorber ( 84a ), • a partial flow of the working medium high-pressure steam ( 217 ) from the rectifier ( 2 ) to the WT capacitor ( 54a ), • the almost pure WT working fluid ( 55a ) from the WT capacitor ( 54a ) supported by the WT working fluid pump ( 75 ) to the WT high-pressure evaporator ( 127 ), • the almost pure WT working medium maximum pressure steam ( 83a ) from the WT high-pressure evaporator ( 127 ) to the WT high-pressure absorber ( 84a ) to the absorption, • the WT-Höchstdruckabsorber ( 84a ) his poor WT solution ( 85a ) from the HK-Hochdruckaustreiber ( 1 ), • from the WT high-pressure absorber ( 84a ) rich WT solution ( 87a ) by means of the WT throttle ( 88a ) throttled to high pressure level and into the HK-Hochdruckaustreiber ( 1 ), • the WT high-pressure evaporator ( 127 ) Heat from the external heat source at a temperature level below the external heat input to the first ZK high pressure compressor ( 39 ) or at its temperature level, • the heat removal from the WT-Höchstdruckabsorber ( 84a ) to a first partial flow ( 92 ) of the external heat source takes place before its heat emission to the sorption plant, this first substream ( 92 ) of the external heat source for heat emission to the working medium superheater ( 30 ), and the guidance of the poor ZK solution is carried out in such a way that (h3) that from the HK / ZK low-pressure absorber ( 7a ) to the HK high-pressure driver ( 1 ) to be passed rich HK solution ( 015 ) is the difference of the rich HK solution required for the expulsion ( 15 ) minus the poor ZK solution ( 20 ) and minus the rich WT solution ( 87a ). Arbeitserfahren according to any one of the preceding claims 4 to 22, characterized in that in each case in one of the absorbers involved, in the low-pressure HK absorber ( 7 ), in the HK / ZK medium-pressure absorber ( 59a ), in the ZK medium-pressure absorber ( 59 ) of the lower pressure stage and in the ZK medium-pressure absorber ( 22 ) formed rich solution for heat absorption by that of these absorbers ( 7 . 59 . 59a . 22 ), which has the highest temperature level at the beginning of sorption. Working method according to one of the preceding claims, characterized in that the following apparatuses are respectively inserted into the additional circuit: • a ZK capacitor ( 54 ) for condensing the ZK high pressure working fluid vapor ( 217 ), • a ZK medium-pressure evaporator ( 57 ) for generating medium pressure pressure steam ( 29 or 63 ), • a second TC throttle ( 56 ) for throttling the almost pure ZK-working fluid ( 55b ) to evaporator pressure, • that the almost pure ZK-working medium high-pressure steam ( 217 ) from the rectifier ( 2 ) to the ZK capacitor ( 54 ) is passed to the condensation, • that the almost pure ZK-working fluid ( 55b ) from the ZK capacitor ( 54 ) to the ZK medium-pressure evaporator ( 57 ), and • the ZK medium-pressure steam ( 29 or 63 ) to the same pressure ZK medium-pressure absorber ( 22 or 59 ) is passed to the absorption. Working method according to one of the preceding claims, characterized in that in the main circuit either via the path of the HK capacitor ( 10 ) and the HK evaporator ( 12 ) Generated cold or over the way of the steam superheater ( 30 ) and the relaxation machine ( 31 ) Work is done. Working method according to one of the preceding claims, characterized in that in the main circuit only via the path of an HK capacitor ( 10 ) and a HK evaporator ( 12 ) Cold is generated. Working method according to the preceding claim, characterized in that the working medium high-pressure steam ( 217 ) of the additional cycle through the poor HK solution ( 14 ) is overheated. Working method according to one of the preceding claims 1 to 22, characterized in that the expanded HK low-pressure steam ( 18 ) by means of a liquid cooler ( 33 ) Cold is taken. Working method according to one of the preceding claims, characterized in that the sorption a cold storage ( 76 ), where • from the ZK medium-pressure evaporator ( 57 ) at least temporarily via a carrier medium ( 64 ) Cold a cold storage ( 76 ) and • from the HK liquid cooler ( 33 ) by means of the carrier medium ( 64 ) Cold the cold storage ( 76 ), and • from the cold storage ( 76 ) temporarily removed cold and thus the lower temperature level either in the HK absorber ( 7 ) or in the centralized medium pressure absorber ( 22 ) or lowered in both. Working method according to one of the preceding claims, characterized in that the removal of the poor solution ( 20 ) of the additional circulation from the rectifier ( 2 ), or their separation from the rich solution ( 15 ) of the main circuit and the separation of liquid streams by means of valves ( 35 . 36 . 41 . 45 . 52 . 67 . 77 . 94 . 98 . 102 . 103 . 111 . 120 . 125 ) is regulated. Working method according to one of the preceding claims, characterized characterized in that ammonia as a working fluid and water as a sorbent is used.