DE10008483A1 - High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network - Google Patents
High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching networkInfo
- Publication number
- DE10008483A1 DE10008483A1 DE2000108483 DE10008483A DE10008483A1 DE 10008483 A1 DE10008483 A1 DE 10008483A1 DE 2000108483 DE2000108483 DE 2000108483 DE 10008483 A DE10008483 A DE 10008483A DE 10008483 A1 DE10008483 A1 DE 10008483A1
- Authority
- DE
- Germany
- Prior art keywords
- frequency air
- capacitor according
- frequency
- metal
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000605 extraction Methods 0.000 title 1
- 239000003990 capacitor Substances 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 9
- 239000010953 base metal Substances 0.000 claims description 8
- 238000009792 diffusion process Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 5
- 239000010970 precious metal Substances 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 241000530268 Lycaena heteronea Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Abstract
Description
Die vorliegende Erfindung betrifft einen verlustarmen Hochfrequenz- Luftkondensator, d. h. einen Kondensator ohne Dielektrikum, der als kapazitive Komponente in elektrischen Schaltkreisen Verwendung findet.The present invention relates to a low-loss high-frequency Air condenser, d. H. a capacitor without dielectric, which is called capacitive Component is used in electrical circuits.
Um die ohmschen Leistungsverluste zu vermindern, benutzt man als Leiter materialien Werkstoffe mit sehr hoher Leitfähigkeit, vorzugsweise Kupfer oder Kupferlegierungen. Ist die Oberfläche des Leiters dem Einfluß von Sauerstoff oder Stickstoff, z. B. aus der Atmosphäre, ausgesetzt, so können sich an der Leiter oberfläche die entsprechenden Oxide oder Nitride ausbilden, die im allgemeinen sehr schlecht leitfähig sind. Weil sich bei hochfrequenten Ströme aufgrund des sogenannten Skin-Effektes der Stromfluß nicht mehr über den gesamten Leiter querschnitt verteilt, sondern nur noch über einen nur wenige Mikrometer dicken Bereich an der Oberfläche, ergeben sich durch diese Oxid- oder Nitrid-Schichten weitere ohmsche Verluste. Derartige Kondensatoren sind somit mit erheblichen Leistungsverlusten behaftet.To reduce the ohmic power losses, use as a conductor materials Materials with very high conductivity, preferably copper or Copper alloys. Is the surface of the conductor under the influence of oxygen or Nitrogen, e.g. B. from the atmosphere, exposed to the ladder Form the corresponding oxides or nitrides, in general are very poorly conductive. Because at high frequency currents due to the the so-called skin effect, the current flow no longer over the entire conductor cross-section, but only a few microns thick Area on the surface result from these oxide or nitride layers further ohmic losses. Such capacitors are therefore considerable Loss of performance.
Der Erfindung liegt die Aufgabe zugrunde, einen verlustarmen Hochfrequenz- Luftkondensator, vorzugsweise für den Einsatz im Hochstrombereich (ca. 10 bis 500 A), bereitzustellen, der dauerhaft eine hohe elektrische Leitfähigkeit aufweist.The invention has for its object to provide a low-loss high-frequency Air condenser, preferably for use in the high current range (approx. 10 to 500 A), which has a permanently high electrical conductivity.
Die Lösung der Aufgabe durch die Erfindung besteht in einem Hochfrequenz- Luftkondensator aus einem unedlen Metall mit geringem elektrischen Widerstand, der an der Oberfläche mit einer Schicht eines chemisch-inerten Metalls mit hohen Leitwerten versehen ist. Damit wird vermieden, daß sich aufgrund des Einflusses von Reaktivgasen wenig leitfähige Schichten an der Oberfläche des Hochfrequenz- Luftkondensators ausbilden. Das chemisch-inerte Metall ist vorzugsweise ein Edel metall, insbesondere Silber, Gold oder ein Platinmetall, z. B. Platin. Das unedle Metall des Kondensators besteht vorteilhafterweise aus Kupfer, Eisen, Zink, Aluminium oder deren Legierungen wie z. B. Messing.The solution to the problem by the invention consists in a high-frequency Base metal air condenser with low electrical resistance, the surface with a layer of chemically inert metal with high Is provided. This avoids that due to the influence of reactive gases little conductive layers on the surface of the high-frequency Form air condenser. The chemically inert metal is preferably a noble metal, especially silver, gold or a platinum metal, e.g. B. platinum. The base Metal of the capacitor advantageously consists of copper, iron, zinc, Aluminum or their alloys such as B. brass.
Werden Edelmetalle, z. B. Gold oder Platin, auf unedle Metalle, z. B. Kupfer oder Messing, aufgebracht, so besteht die Gefahr, daß das Edelmetall in das Träger material oder das Trägermaterial in das Edelmetall hineindiffundiert. Das hat zur Folge, daß die Leitfähigkeit an der Oberfläche aus den für das unedle Metall genannten Gründen abnimmt. Der Diffusionsvorgang kann mittels einer Diffusions sperre, z. B. einer hauchdünnen Schicht aus Nickel verhindert werden, die vor dem Aufbringen der chemisch-inerten Metallschicht auf das unedle Metall aufgetragen wird. Somit ist die Langzeitstabilität der äußeren Metallschicht sichergestellt. Beide Schichten können plasmachemisch oder galvanisch und vorzugsweise als geschlossene Schicht einer Dicke von 10 nm bis 10 µm, vorzugsweise 1 µm, aufgebracht sein.Are precious metals, e.g. As gold or platinum, on base metals, for. B. copper or Brass, applied, there is a risk that the precious metal in the carrier material or the carrier material diffuses into the precious metal. That has to Consequence that the surface conductivity from that for the base metal reasons mentioned decreases. The diffusion process can be done by means of a diffusion lock, e.g. B. a wafer-thin layer of nickel can be prevented before the Applying the chemically inert metal layer to the base metal becomes. This ensures the long-term stability of the outer metal layer. Both Layers can be plasma chemical or galvanic and preferably as closed layer with a thickness of 10 nm to 10 µm, preferably 1 µm, be upset.
Der Hochfrequenz-Luftkondensator kann als Plattenkondensator, Zylinder kondensator oder Kugelkondensator ausgebildet sein. Zudem kann er als Trimmer ausgebildet sein, z. B. als Differential-Luftplattentrimmer insbesondere mit einer multi-linearen Kennlinie wie er in der gleichzeitig mit dieser Anmeldung eingereichten Patentanmeldung "Differential-Luftplattentrimmer mit multi-linearer Kennlinie" mit dem internen Aktenzeichen 179/00 der Firma CCR GmbH Beschichtungstechnologie beschrieben ist. Ein solcher Differential-Luftplatten trimmer, mit dem aufgrund der multi-linearen Kennlinie einfache funktionale Abhängigkeiten besser angepaßt werden können, weist im Gegensatz zu herkömm lichen Luftplattentrimmern segmentierte Stator- und/oder Rotorplatten auf Vorzugs weise liegt den segmentierten Rotorplatten nur eine Statorseite gegenüber. Den segmentierten Statorplatten braucht keine Statorseite gegenüberliegen. Die Stator platten und/oder die Rotorplatten können als herkömmliche 180°-Segmente ausgebildet sein.The high frequency air capacitor can be used as a plate capacitor, cylinder capacitor or spherical capacitor can be formed. It can also be used as a trimmer be trained, e.g. B. as a differential air trimmer in particular with a multi-linear characteristic as in the same with this registration Patent application filed "Differential air plate trimmer with multi-linear Characteristic curve "with the internal file number 179/00 from CCR GmbH Coating technology is described. Such a differential air plate trimmer with which simple functional due to the multi-linear characteristic Dependencies can be better adjusted, unlike conventional preferred air plate trimmers segmented stator and / or rotor plates the segmented rotor plates are only opposite one stator side. The segmented stator plates need not face each other on the stator. The stator plates and / or the rotor plates can be used as conventional 180 ° segments be trained.
Bei herkömmlichen, also linearen Differential-Luftplattentrimmern werden nur Stator- und Rotorplatten eingesetzt, die einem 180°-Kreissegment oder einem Rechteck mit Seitenverhältnis 2 : 1 ähnlich sind. Der erfindungsgemäße multi-lineare Differential-Luftplattentrimmer wird zusätzlich auch aus kreis- oder rechteck förmigen Segmenten mit Winkeln < 180° bestückt. Er erhält dadurch eine multi lineare Kennlinie, d. h. die Kennlinie setzt sich aus Teilgeraden unterschiedlicher Steigung zusammen. Somit kann die Kennlinie des multi-linearen Differential- Luftplattentrimmers sehr gut an einfache funktionale Abhängigkeiten angepaßt werden. With conventional, i.e. linear differential air plate trimmers only Stator and rotor plates used, which are a 180 ° circular segment or a Rectangle with 2: 1 aspect ratio are similar. The multi-linear according to the invention Differential air plate trimmer is also made of circular or rectangular shaped segments with angles <180 °. This gives him a multi linear characteristic, d. H. the characteristic curve is made up of partial straight lines that differ Slope together. The characteristic curve of the multi-linear differential Air plate trimmers are very well adapted to simple functional dependencies become.
Der erfindungsgemäße Hochfrequenz-Luftkondensator eignet sich besonders gut als Bauteil in einem Hochfrequenz-Anpaßnetzwerk wie es in der gleichzeitig mit dieser Anmeldung eingereichten Patentanmeldung "Hochfrequenz-Anpaßnetzwerk" mit dem internen Aktenzeichen 174/00 der Firma CCR GmbH Beschichtungstechnologie beschrieben ist. Er kann auch in einer Hochfrequenz-Plasma- oder -Ionenquelle eingesetzt werden wie es in der gleichzeitig mit dieser Anmeldung eingereichten Patentanmeldung "Hochfrequenz-Plasmaquelle" mit dem internen Aktenzeichen 169/99 der Firma CCR GmbH Beschichtungstechnologie beschrieben ist.The high-frequency air capacitor according to the invention is particularly suitable as Component in a high-frequency matching network as it is in the same with this Application submitted patent application "radio frequency matching network" with the internal file number 174/00 of the company CCR GmbH coating technology is described. It can also be in a high frequency plasma or ion source be used as it is in the application submitted simultaneously with this application Patent application "high-frequency plasma source" with the internal file number 169/99 from CCR GmbH coating technology.
Im folgenden wird die Erfindung beispielhaft anhand von Zeichnungen verdeutlicht:The invention is illustrated below by way of example with reference to drawings:
Fig. 1 zeigt den Aufbau der chemisch-inerten Oberflächen-Beschichtung; Fig. 1 shows the structure of chemically-inert surface coating;
Fig. 2 zeigt herkömmliche Stator- oder Rotorplatten; Fig. 2 shows conventional stator or rotor plates;
Fig. 3 zeigt segmentierte Stator- oder Rotorplatten. Fig. 3 shows segmented stator or rotor disks.
Fig. 1 zeigt den Schichtaufbau eines Hochfrequenz-Luftkondensators. Das Basis material des Kondensators (14) ist mit einer geschlossenen als Diffusionssperre dienenden Nickelschicht (13) versehen. Auf diese Schicht ist eine Schicht (12) aus Gold aufgebracht. Fig. 1 shows the layer structure of a high-frequency air capacitor. The base material of the capacitor ( 14 ) is provided with a closed nickel layer ( 13 ) serving as a diffusion barrier. A layer ( 12 ) of gold is applied to this layer.
In Fig. 2 sind schematisch herkömmliche Stator- bzw. Rotor-Platten abgebildet, wie sie allgemein in Luftplatten-Trimmem Verwendung finden. Rotorplatten sind in der Regel einem 180°-Kreissegment (1) ähnlich, während Stator-Platten zusätzlich auch einem Rechteck mit Seitenverhältnis 2 : 1 (2) ähnlich sein können.In FIG. 2, a conventional stator and rotor disks are schematically illustrated as they are generally used in air plate Trimmem use. Rotor plates are usually similar to a 180 ° circular segment ( 1 ), while stator plates can also be similar to a rectangle with an aspect ratio of 2: 1 ( 2 ).
Fig. 3 zeigt eine erfindungsgemäße Auswahl segmentierter Trimmer-Platten: 135°-Segmente (3, 4), 90°-Segmente (5, 6), 45°-Segmente (7, 8), die zur Darstellung einer multi-linearen Abhängigkeit zusätzlich zu den herkömmlichen Trimmer-Platten erforderlich sind. Fig. 3 shows an inventive selection of segmented trimmer discs 135 ° segments (3, 4), 90 ° segments (5, 6), 45 ° segments (7, 8) for representing a multi-linear dependence in addition to the conventional trimmer plates are required.
11
herkömmliche Stator- bzw. Rotor-Platte (180°-Kreissegment)
conventional stator or rotor plate (180 ° circle segment)
22
herkömmliche Stator-Platte (Rechteck mit Seitenverhältnis 2 : 1)
conventional stator plate (rectangle with aspect ratio 2: 1)
33rd
segmentierte Trimmer-Platte (135°-Kreissegment)
segmented trimmer plate (135 ° circle segment)
44
segmentierte Trimmer-Platte (135°-Rechtecksegment)
segmented trimmer plate (135 ° rectangular segment)
55
segmentierte Trimmer-Platte (90°-Kreissegment)
segmented trimmer plate (90 ° circle segment)
66
segmentierte Trimmer-Platte (90°-Rechtecksegment)
segmented trimmer plate (90 ° rectangular segment)
77
segmentierte Trimmer-Platte (45°-Kreissegment)
segmented trimmer plate (45 ° circle segment)
88th
segmentierte Trimmer-Platte (45°-Rechtecksegment)
segmented trimmer plate (45 ° rectangular segment)
1212th
chemisch-inerte Metallschicht
chemically inert metal layer
1313
Diffusionssperre
Diffusion barrier
1414
Basismaterial des Hochfrequenz-Luftkondensators
Base material of the high-frequency air condenser
Claims (23)
Priority Applications (21)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2000108483 DE10008483A1 (en) | 2000-02-24 | 2000-02-24 | High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| JP2001562065A JP5000061B2 (en) | 2000-02-24 | 2001-02-21 | RF plasma source |
| JP2001562066A JP4874488B2 (en) | 2000-02-24 | 2001-02-21 | High frequency matching network |
| AU52139/01A AU5213901A (en) | 2000-02-24 | 2001-02-21 | High-frequency matching network |
| AU39269/01A AU3926901A (en) | 2000-02-24 | 2001-02-21 | High frequency plasma source |
| EP01925347A EP1410698B1 (en) | 2000-02-24 | 2001-02-21 | High-frequency matching network |
| PT01925347T PT1410698E (en) | 2000-02-24 | 2001-02-21 | High-frequency matching network |
| DE50115111T DE50115111D1 (en) | 2000-02-24 | 2001-02-21 | HIGH FREQUENCY ANPANETZWERK |
| CA002401251A CA2401251C (en) | 2000-02-24 | 2001-02-21 | High frequency matching network |
| US10/204,743 US7276816B2 (en) | 2000-02-24 | 2001-02-21 | High-frequency matching network |
| CN 01808088 CN1423916A (en) | 2000-02-24 | 2001-02-21 | High frequency plasma source |
| KR1020027011115A KR100733564B1 (en) | 2000-02-24 | 2001-02-21 | High frequency plasma element |
| CN01808498A CN1426671A (en) | 2000-02-24 | 2001-02-21 | High Frequency Matching Network |
| EP01913824.7A EP1290926B1 (en) | 2000-02-24 | 2001-02-21 | High frequency plasma source |
| PCT/EP2001/001952 WO2001063981A1 (en) | 2000-02-24 | 2001-02-21 | High frequency plasma source |
| PCT/EP2001/001953 WO2001063982A1 (en) | 2000-02-24 | 2001-02-21 | High-frequency matching network |
| ES01925347T ES2333300T3 (en) | 2000-02-24 | 2001-02-21 | HIGH FREQUENCY ADAPTATION NETWORK. |
| CA002401220A CA2401220C (en) | 2000-02-24 | 2001-02-21 | High frequency plasma beam source |
| AT01925347T ATE443429T1 (en) | 2000-02-24 | 2001-02-21 | HIGH FREQUENCY ANPA NETWORK |
| KR1020027011116A KR100740892B1 (en) | 2000-02-24 | 2001-02-21 | High frequency matching network |
| US10/204,686 US6936144B2 (en) | 2000-02-24 | 2001-02-21 | High frequency plasma source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2000108483 DE10008483A1 (en) | 2000-02-24 | 2000-02-24 | High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10008483A1 true DE10008483A1 (en) | 2001-09-27 |
Family
ID=7632131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2000108483 Withdrawn DE10008483A1 (en) | 2000-02-24 | 2000-02-24 | High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE10008483A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10359367A1 (en) * | 2003-12-18 | 2005-07-21 | Inficon Gmbh | Four pole filter for use in a mass spectrometer has capacitor circuit with a feedback loop control operation |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1942088A1 (en) * | 1969-03-20 | 1970-09-03 | Coq Nv | Cylinder capacitor |
| DE3517631A1 (en) * | 1984-11-07 | 1986-05-07 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR PRODUCING ELECTRICAL PLASMAPOLYMER MULTILAYER CAPACITORS |
| US5077635A (en) * | 1990-05-22 | 1991-12-31 | Robert Bosch Gmbh | Capacitive position sensor |
| US5210466A (en) * | 1989-10-03 | 1993-05-11 | Applied Materials, Inc. | VHF/UHF reactor system |
| DE19730140A1 (en) * | 1996-07-19 | 1998-01-29 | Murata Manufacturing Co | Variable capacitor for LC module |
-
2000
- 2000-02-24 DE DE2000108483 patent/DE10008483A1/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1942088A1 (en) * | 1969-03-20 | 1970-09-03 | Coq Nv | Cylinder capacitor |
| DE3517631A1 (en) * | 1984-11-07 | 1986-05-07 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR PRODUCING ELECTRICAL PLASMAPOLYMER MULTILAYER CAPACITORS |
| US5210466A (en) * | 1989-10-03 | 1993-05-11 | Applied Materials, Inc. | VHF/UHF reactor system |
| US5077635A (en) * | 1990-05-22 | 1991-12-31 | Robert Bosch Gmbh | Capacitive position sensor |
| DE19730140A1 (en) * | 1996-07-19 | 1998-01-29 | Murata Manufacturing Co | Variable capacitor for LC module |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10359367A1 (en) * | 2003-12-18 | 2005-07-21 | Inficon Gmbh | Four pole filter for use in a mass spectrometer has capacitor circuit with a feedback loop control operation |
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