CN2609940Y - Magnetic field rotation outside cylindrical target - Google Patents
Magnetic field rotation outside cylindrical target Download PDFInfo
- Publication number
- CN2609940Y CN2609940Y CN 02277300 CN02277300U CN2609940Y CN 2609940 Y CN2609940 Y CN 2609940Y CN 02277300 CN02277300 CN 02277300 CN 02277300 U CN02277300 U CN 02277300U CN 2609940 Y CN2609940 Y CN 2609940Y
- Authority
- CN
- China
- Prior art keywords
- permanent magnet
- pole shoe
- target
- magnetic field
- magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000126 substance Substances 0.000 claims description 5
- 230000005465 channeling Effects 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 15
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 4
- 239000000696 magnetic material Substances 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model relates to magnetron sputtering vacuum coater equipment, in particular to a novel magnetic field rotating cylindrical column target, which consists of a pole shoe (2), a permanent magnet (3), a round target pipe (5) and stopping rings (7) which are made of non-magnetic material, wherein the pole shoe (2) is provided with four positioning grooves which are used for installing the permanent magnet (3) and the permanent magnet is arranged in the four positioning grooves, which forms four paths of bar magnets. The stopping rings (7) are arranged on the two ends of the pole shoe (2). The combination mode of the permanent magnet (3) is characterized in that the orientation of each path of bar magnet is the same, all the S poles are inward and all the N poles are outward. Because of the utilization of the above design, compared with the prior art, the utility model has the advantages of large sputtering area, much sputtering amount, high film-forming speed and target utilization rate, simple magnetic path, even sputtering and the like.
Description
Technical field
The utility model relates to a kind of magnetic control sputtering vacuum coating machine equipment, particularly a kind of novel magnetic field rotation outside cylinder target.
Background technology
, on target (cloudy plate), apply a negative high voltage under certain condition, form the glow discharge of argon gas, energetic ion bombardment target surface, atom, the molecule of target material surface splashed to shoot out, and moves on the workpiece to be plated that is placed on target opposite or circumference, Here it is common vacuum sputtering coating.
So-called magnetron sputtering, except that on target, applying an electric field (power line is perpendicular to the target surface) exactly, reproduce a magnetic field, requirement is parallel to the magnetic induction density component on target surface in 30-50 milli tesla (mT), the glow discharge that under this condition, forms, by magnetically confined near in the plasma body zone of target surface, electronics is subjected to the influence of Lorentz lorentz (Lorentz) power, make the compound motion of cycloid and zigzag shape, the path prolongs greatly, and the plasma density of discharge improves greatly, the quantity of positive ion also increases greatly thereupon, thereby sputter output strengthens, and has improved the production efficiency of plated film.
The structure such as the accompanying drawing 3 of magnetic field rotation outside cylinder target of the prior art, 4, shown in 5, it comprises water-cooled tube (1), pole shoe (2), permanent magnet (3), magnet ring (4), circular pipe (5) and the block made from nonmagnetic substance (6), pole shoe (2) is sleeved on the water-cooled tube (1), be useful on the locating slot that permanent magnet (3) or block (6) are installed on it, permanent magnet (3) or block (6) are installed in the interior channeling bar magnet (being 4 travel permit shape magnet among the figure) of locating slot of pole shoe (2), magnet ring (4) is installed in the two ends of pole shoe (2), and the array mode of permanent magnet (3) is that the polarity of adjacent travel permit shape magnet is towards on the contrary.Its weak point is:
1, sputter area is little, efficient is low: magnetic circuit forms closed magnetic line of force arcuation ＂ runway ＂ on the surface of circular pipe, and every travel permit shape magnet has only 1 sputtering zone, and sputtering yield is low;
2, the etching speed at target pipe two ends is fast, and target utilization is low, the magnetic circuit complexity: owing to individual magnet ring is respectively arranged, make the etching speed at target pipe two ends faster, promptly can not consume target by same rate, cause target utilization low than the centre at the two ends of pole shoe, and the magnetic circuit complexity.
Technology contents
The purpose of this utility model is to overcome the above-mentioned deficiency of prior art and a kind of novel magnetic field rotation outside cylinder target is provided.
The technical solution of the utility model is: novel magnetic field rotation outside cylinder target comprises pole shoe, permanent magnet, circular pipe and the baffle ring made from nonmagnetic substance, be useful on the locating slot that permanent magnet is installed on the pole shoe, permanent magnet is installed in the interior channeling bar magnet of locating slot of pole shoe, baffle ring is installed in the two ends of pole shoe, and the array mode of permanent magnet is that the polarity of every travel permit shape magnet is towards identical.
The utility model compared with prior art, has following advantage owing to adopt as above design:
1, the sputter area area is big, and sputtering yield is many, the rate of film build height: magnetic circuit constitutes closed magnetic force line length round arch shape ＂ runway ＂ on the surface of circular pipe, the sputter area of target pipe is big, and every travel permit shape magnet has two sputtering zones, and the sputter area area is big, sputtering yield is many, the rate of film build height;
2, target utilization ratio height, magnetic circuit is simple, and sputter is even: owing to have only the surface of target pipe that magnetic line of force is arranged, when the center of rotation pole shoe, make it with respect to the rotation of target pipe, then sputtering zone is present on whole 360 degree cylindrical surface, not only sputter is more even, and target utilization also improves greatly.
Description of drawings
Accompanying drawing 1 is a structural representation of the present utility model;
Accompanying drawing 2 is the A-A sectional view of accompanying drawing 1;
Accompanying drawing 3 is the structural representation of existing magnetic field rotation outside cylinder target;
Accompanying drawing 4 is the B-B sectional view of accompanying drawing 3;
Accompanying drawing 5 is the C-C sectional view of accompanying drawing 3.
Describe structure of the present utility model in detail below in conjunction with drawings and Examples.
Embodiment
Shown in accompanying drawing 1,2: novel magnetic field rotation outside cylinder target is made up of pole shoe (2), permanent magnet (3), circular pipe (5) and the baffle ring (7) made with nonmagnetic substance, be useful on 4 locating slots that permanent magnet (3) is installed on the pole shoe (2), permanent magnet (3) is installed in the interior 4 travel permit shape magnet of forming of locating slot of pole shoe (2), baffle ring (7) is installed in the two ends of pole shoe (2), the array mode of permanent magnet (3) be every travel permit shape magnet towards identical, the S that promptly is installed in the permanent magnet (3) in pole shoe (2) locating slot extremely all inwardly, N is extremely all outwardly.
Magnetic line of force passes the target pipe (5) that nonmagnetic substance is made from the N utmost point, returns pole shoe (1), i.e. the S utmost point has constituted the magnetic force line length round arch shape ＂ way ＂ of 8 closures like this on target pipe (3) cylindrical surface.Select suitable material, make parallel magneticinduction B11 arrive more than 30 teslas in the least, vacuum tightness at several handkerchiefs to zero point under a few handkerchief conditions, target pipe (3) adds 350 volts to 600 volts above voltages over the ground, then produce glow discharge, form the sputter coating mechanism under the magnetically confined, i.e. magnetron sputtering.4 bar magnets form 8 ＂ runway ＂, that is to say, form 8 banded glow discharge sputtering districts, and the ion bombardment region area is big, and sputtering yield is many, the rate of film build height; When rotating pole shoe (2), make it with respect to target pipe (5) rotation, then sputtering zone is present on whole 360 degree cylindrical surface, and not only sputter is more even, and target utilization also improves greatly.The utility model has wide practical use in even plated film of big area and high efficiency vacuum plating production.
Along with the expansion of magnetron sputtering plating Application Areas, the exploitation larger diameter or more the cylindrical target of minor diameter then can increase or reduce the quantity of bar magnet, the principle unanimity, it also is feasible putting into practice.
Claims (2)
1, a kind of novel magnetic field rotation outside cylinder target, it comprises pole shoe, permanent magnet and circular pipe ring, be useful on the locating slot that permanent magnet is installed on the pole shoe, permanent magnet is installed in the interior channeling bar magnet of locating slot of pole shoe, it is characterized in that also comprising the baffle ring made from nonmagnetic substance, baffle ring is installed in the two ends of pole shoe, and the array mode of permanent magnet is that the polarity of every travel permit shape magnet is towards identical.
2, be to ask 1 described novel magnetic field rotation outside cylinder target according to right, the S that it is characterized in that being installed in the permanent magnet in the pole shoe locating slot extremely all inwardly, N is extremely all outwardly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02277300 CN2609940Y (en) | 2002-09-18 | 2002-09-18 | Magnetic field rotation outside cylindrical target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02277300 CN2609940Y (en) | 2002-09-18 | 2002-09-18 | Magnetic field rotation outside cylindrical target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2609940Y true CN2609940Y (en) | 2004-04-07 |
Family
ID=34150488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02277300 Expired - Fee Related CN2609940Y (en) | 2002-09-18 | 2002-09-18 | Magnetic field rotation outside cylindrical target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2609940Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102340921A (en) * | 2010-07-16 | 2012-02-01 | 财团法人工业技术研究院 | Electron cyclotron resonance magnetic module and electron cyclotron resonance device |
| CN101636521B (en) * | 2007-03-16 | 2013-07-24 | 国立大学法人东北大学 | Magnetron sputtering device |
| CN101652499B (en) * | 2007-04-06 | 2013-09-25 | 国立大学法人东北大学 | Magnetron sputtering device |
| CN105256284A (en) * | 2015-11-17 | 2016-01-20 | 肇庆市科润真空设备有限公司 | Environment-friendly aluminum mirror vacuum coating equipment |
| CN111826623A (en) * | 2020-06-30 | 2020-10-27 | 浙江上方电子装备有限公司 | Magnetron for performing magnetron sputtering |
-
2002
- 2002-09-18 CN CN 02277300 patent/CN2609940Y/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101636521B (en) * | 2007-03-16 | 2013-07-24 | 国立大学法人东北大学 | Magnetron sputtering device |
| CN101652499B (en) * | 2007-04-06 | 2013-09-25 | 国立大学法人东北大学 | Magnetron sputtering device |
| CN102340921A (en) * | 2010-07-16 | 2012-02-01 | 财团法人工业技术研究院 | Electron cyclotron resonance magnetic module and electron cyclotron resonance device |
| CN105256284A (en) * | 2015-11-17 | 2016-01-20 | 肇庆市科润真空设备有限公司 | Environment-friendly aluminum mirror vacuum coating equipment |
| CN111826623A (en) * | 2020-06-30 | 2020-10-27 | 浙江上方电子装备有限公司 | Magnetron for performing magnetron sputtering |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |