CN2312945Y - Multi-purpose column-like vacuum plasma film-plating source - Google Patents
Multi-purpose column-like vacuum plasma film-plating source Download PDFInfo
- Publication number
- CN2312945Y CN2312945Y CN 97228628 CN97228628U CN2312945Y CN 2312945 Y CN2312945 Y CN 2312945Y CN 97228628 CN97228628 CN 97228628 CN 97228628 U CN97228628 U CN 97228628U CN 2312945 Y CN2312945 Y CN 2312945Y
- Authority
- CN
- China
- Prior art keywords
- column
- magnetic core
- source
- film
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007747 plating Methods 0.000 title claims abstract description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 9
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 abstract description 6
- 238000010891 electric arc Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000013077 target material Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000009504 vacuum film coating Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model relates to a multi-purpose column-shaped vacuum plasma film-plating source which is composed of a column-shaped source target seat, a column-shaped source target material, magnetic cores, a magnetic core rotating mechanism, a water inlet pipe, a water outlet pipe, a shielding hood, etc. A film-plating machine is only provided with a column-shaped source, two magnetic cores with different magnetic field strength and two types of power. According to the needs of film-plating, the utility model can plate titanium nitride with the magnetic core which is used for arc discharge, and plate metal film on low melting basic components with the magnetic core which is used for magnetron sputtering. The film-plating machine provided with the column-shaped source can become a multi-purpose vacuum film-plating machine with the advantages of simple structure and easy operation.
Description
The utility model relates to a kind of multi-usage vacuum plasma coating source, is applied to the plasma gas phase deposition field.Be applicable to titanium-nitride film, metallic membrane.
At present, the column controlled sputtering source is used by wide model in the known plasma gas phase deposition technology, and the sputter effect that the argon ion bombardment target cathode that it relies on glow discharge to produce produces obtains needed rete particle.The patent that column arc source is disclosed has CN1139158A, ZL94218432.7.It is to obtain required rete particle because the awkward silence at a meeting that post arc source produces causes arc discharge.Its application characteristic all is a kind of column sources of only installing in a vacuum plating unit.CN97225988.0 discloses a kind of multi-usage vacuum plating unit and has been characterized in both having adorned a post arc source in a vacuum plating unit, can adorn a column magnetic controlling target again.Change this two kinds of column sources according to producing needs, carry out the coating process of different discharge.Still do not have column source of a kind of usefulness, only need change the multi-usage column source that a key part just can carry out different coating process as required.
The purpose of this utility model provides a kind of multi-usage column vacuum plasma coating source.Only need to change a magnetic core and just can use as column arc source as required, mix arc power and carry out multi-arc ion plating film, compound coats such as depositing titanium nitride.Also can mix the magnetron sputtering power supply and carry out magnetron sputtering plating.
The purpose of this utility model is to realize like this.The multi-usage column vacuum plasma coating source that is installed in vacuum film coating chamber central authorities is made up of column source target stand (1), column source target (2), magnetic core (3), magnetic core rotating mechanism (4), water inlet pipe and water outlet pipe (5), shielding case (6).Be characterized in that the parts except that magnetic core and power supply are shared entirely, just join the strong and weak different magnetic core of two magnetic properties.Whole coating equipment joined two dissimilar power supplys, change arc source magnetic core when using as post arc source, open arc power with the striking pin and carry out arc discharge titanium-nitride film: when using as controlled sputtering source, change the magnetron sputtering magnetic core, open the magnetron sputtering power supply and carry out glow discharge, can be on parts such as plastics, pottery plated film.Only join a column source target stand in the coating equipment, but can satisfy two kinds of plated film needs.Complete machine can reduce by a cover column origin system.
Another characteristics of the present utility model are that the permanent magnet of installing in two kinds of magnetic cores all is bar shaped, and rotate.After producing arc discharge or glow discharge, arc spot track or glow discharge track on the target surface are bar shaped or curved shape.
Figure is an embodiment sketch of the present utility model.Below in conjunction with drawings and Examples the utility model is further specified.
Be installed in the central authorities of coating chamber more than of the present utility model with column way vacuum plasma coating source, also be provided with workpiece rotating mechanism (7), prebake conditions source (8), inlet system (9), striking pin (10), arc power (11), magnetron sputtering power supply (12) in the coating chamber.When the needs deposited titanium nitride film, the arc discharge magnetic core of packing in the target pipe of column source with the arc discharge of igniting of striking pin, if target is the titanium pipe, feeds nitrogen, again just can obtain titanium nitride film at workpiece surface.When needs carried out magnetron sputtering plating, the magnetron sputtering magnetic core of packing in the target pipe in column source started the magnetron sputtering power supply and makes magnetic controlling target generation glow discharge carry out plated film.
The utility model makes a vacuum plating unit can carry out two kinds of plated film productions easily, the few magnetic core of facility investment is changed conveniently, makes complete machine become a multi-usage coating equipment that degree of being practical is very high.
Claims (2)
1. multi-usage column vacuum plating source; form by column source target stand, column source target, magnetic core, magnetic core rotating mechanism, water inlet pipe and water outlet pipe, shielding case; join the strong and weak different magnetic core of two magnetic properties; the power supply that two classes are different; it is characterized in that the permanent magnet of installing in two kinds of magnetic cores all is bar shaped; and rotate, arc spot track or glow discharge track on the target surface are bar shaped or curved shape.
2. a kind of multi-usage column vacuum plasma coating source according to claim 1, it is characterized in that only installing in the coating equipment column source, form by column source target stand, column source target, magnetic core, magnetic core rotating mechanism, water inlet pipe and water outlet pipe, shielding case.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 97228628 CN2312945Y (en) | 1997-10-06 | 1997-10-06 | Multi-purpose column-like vacuum plasma film-plating source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 97228628 CN2312945Y (en) | 1997-10-06 | 1997-10-06 | Multi-purpose column-like vacuum plasma film-plating source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2312945Y true CN2312945Y (en) | 1999-04-07 |
Family
ID=33941748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 97228628 Expired - Fee Related CN2312945Y (en) | 1997-10-06 | 1997-10-06 | Multi-purpose column-like vacuum plasma film-plating source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2312945Y (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
| CN102102188A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Novel magnetron sputtering and multi-arc evaporation compatible tubular cathode source |
-
1997
- 1997-10-06 CN CN 97228628 patent/CN2312945Y/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102102178A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Tubular cathode controlled arc plasma evaporation and ionization source |
| CN102102188A (en) * | 2009-12-22 | 2011-06-22 | 王殿儒 | Novel magnetron sputtering and multi-arc evaporation compatible tubular cathode source |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C57 | Notification of unclear or unknown address | ||
| DD01 | Delivery of document by public notice |
Addressee: Wang Fuzhen Document name: payment instructions |
|
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |