CN211907401U - Wafer carrier loading and unloading device - Google Patents
Wafer carrier loading and unloading device Download PDFInfo
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- CN211907401U CN211907401U CN202020184656.4U CN202020184656U CN211907401U CN 211907401 U CN211907401 U CN 211907401U CN 202020184656 U CN202020184656 U CN 202020184656U CN 211907401 U CN211907401 U CN 211907401U
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Abstract
Description
技术领域technical field
本实用新型是有关晶圆载盘的置卸载装置,尤指一种可快速、简便且效率地在载盘上取放晶圆的装置。The utility model relates to a device for placing and unloading a wafer carrier, in particular to a device that can quickly, simply and efficiently pick up and place wafers on the carrier.
背景技术Background technique
一般的集成电路(integrated circuit,IC)的制造过程主要可分为:硅晶圆制造、集成电路制作以及集成电路封装等三大部分;当硅晶棒切割成晶圆后,还需要经过黄光、长晶、蚀刻、机械研磨等多道手续繁杂的流程,方能完成集成电路的制作,而在上述的制造过程中,晶圆在进行测试、清洗、蒸镀、干燥或浸泡有机溶剂等流程时,为能有效固定晶圆以便于加工,皆需将各晶圆先分别固定于一晶圆盘上,由各该晶圆盘分别承载各晶圆进行上述各流程的加工作业。The general integrated circuit (IC) manufacturing process can be mainly divided into three parts: silicon wafer manufacturing, integrated circuit manufacturing and integrated circuit packaging; when the silicon ingot is cut into wafers, it needs to pass through yellow light , crystal growth, etching, mechanical grinding and other complicated procedures to complete the production of integrated circuits, and in the above manufacturing process, the wafer is tested, cleaned, evaporated, dried or soaked in organic solvents and other processes In order to effectively fix the wafers to facilitate processing, each wafer needs to be fixed on a wafer tray first, and each wafer tray carries each wafer to perform the processing operations in the above-mentioned processes.
现有技术的晶圆盘基本结构,乃为一面积略大于晶圆外径的盘体,在该盘体上方设有一可分离的环形框体,定义出一容置晶圆的位置,且于该盘体的周缘设有至少二扣合机构,利用该等扣合机构可夹固该环形框体,以压制于该晶圆周缘形成定位。The basic structure of the wafer disk in the prior art is a disk body with an area slightly larger than the outer diameter of the wafer, a separable annular frame body is arranged above the disk body, a position for accommodating the wafer is defined, and the The periphery of the disk body is provided with at least two buckling mechanisms, and the annular frame body can be clamped by the buckling mechanisms so as to be pressed on the periphery of the wafer to form a positioning.
在实际应用时,为能同时处理较大量的晶圆,大多会将至少二晶圆盘设置于一大面积的载盘上,利用该载盘可容置多个晶圆盘并同时移至各不同的加工程序,以有效增加晶圆加工处理的效率。In practical applications, in order to process a larger number of wafers at the same time, at least two wafer trays are usually arranged on a large-area carrier tray, which can accommodate multiple wafer trays and move them to each Different processing procedures to effectively increase the efficiency of wafer processing.
随着自动化加工的逐渐普及,利用机械臂执行各晶圆与该载盘中各晶圆盘之间的取放动作,不但可节省大量人力,并可降低生产成本、增进加工效率,已为必然的趋势,而由于一般晶圆本身极为脆弱,且对于加工精密度的要求极高,因此,如何能在利用机械臂取放各晶圆的作业需求下,克服晶圆本身材料特性及精准度等要求及限制,乃为各相关业者所亟待努力的课题。With the gradual popularization of automated processing, it is inevitable to use a robotic arm to perform the pick-and-place action between each wafer and each wafer tray in the tray, which not only saves a lot of manpower, but also reduces production costs and improves processing efficiency. Since the general wafer itself is extremely fragile and has extremely high requirements for processing precision, how can the material characteristics and accuracy of the wafer itself be overcome under the operational requirements of using a robotic arm to pick and place each wafer? Requirements and restrictions are issues that all relevant businesses need to work on urgently.
有鉴于现有技术将晶圆由载盘上卸载的作业有上述缺点,发明人乃针对该些缺点研究改进之道,终于有本实用新型产生。In view of the above-mentioned disadvantages of the prior art for unloading the wafers from the carrier tray, the inventors have researched and improved methods for these disadvantages, and finally the present invention is produced.
实用新型内容Utility model content
本实用新型的主要目的在于提供一种晶圆载盘之置卸载装置,主要是在一第一机械臂上设有一影像攫取组件及一晶圆定位件装卸机构,再一第二机械臂上设有一晶圆取放机构,且在该第一、二机械臂活动范围内分别建置一载盘、一主校正机构、一晶圆校正机构及一置料机构,利用该第一机械臂驱动该影像攫取组件至该主校正机构上,校正其取像范围的准确度,再驱动该晶圆定位件装卸机构至该主校正机构上,校正其作业位置,并记忆该晶圆定位件装卸机构与该影像攫取组件取像范围之间的相对位置坐标,再将该影像攫取组件移至该载盘上方,取得该载盘上其中一晶圆盘的影像,并调整至正确对应的位置,然后该第一机械臂参考该相对位置坐标,驱动该晶圆定位件装卸机构对准该晶圆盘,将该晶圆盘周缘预先固定的晶圆定位件取下,由该第二机械臂驱动该晶圆取放机构至该主校正机构上,校正该晶圆取放机构的作业位置,再至该置料机构中取出待加工的晶圆,放置于该晶圆校正机构上,以取得该晶圆的编码,并将该晶圆的缺口调整至正确的角度,由该晶圆取放机构将该待加工的晶圆移置于该晶圆盘上,以该第一机械臂驱动该影像攫取组件至该载盘上,确认该晶圆盘上的晶圆是否完整,再驱动该晶圆定位件装卸机构将该晶圆定位件结合于该晶圆盘上,以该晶圆定位件可压合于该晶圆周缘形成定位;待晶圆完成加工后,以该第一机械臂驱动该影像攫取组件至该载盘上方,取得该载盘上其中一晶圆盘的影像,并调整至正确对应的位置,然后该晶圆定位件装卸机构对准该晶圆盘,将该晶圆盘上固定完成加工晶圆的晶圆定位件取下,再由该第二机械臂驱动该晶圆取放机构将该晶圆盘上的晶圆移至该晶圆校正机构上,由该晶圆校正机构取得该晶圆的编码之后,再将该完成加工的晶圆移至置料机构中,用以完成一将各晶圆由载盘上正确且快速地取放移置的自动化加工作业。The main purpose of the present invention is to provide a wafer loading and unloading device, which mainly includes an image grabbing component and a wafer positioning member loading and unloading mechanism on a first robotic arm, and a second robotic arm with a mounting and unloading mechanism. There is a wafer pick-and-place mechanism, and a carrier plate, a main calibration mechanism, a wafer calibration mechanism and a material loading mechanism are respectively built within the movable range of the first and second robotic arms, and the first robotic arm is used to drive the The image grabbing assembly is attached to the main calibration mechanism to correct the accuracy of its imaging range, and then the wafer positioning member loading and unloading mechanism is driven to the main calibration mechanism to correct its operating position, and the wafer positioning member loading and unloading mechanism and memory are stored. The relative position coordinates between the image capture ranges of the image-grabbing component, and then move the image-grabbing component to the top of the carrier tray to obtain an image of one of the wafer trays on the carrier tray, and adjust it to the correct corresponding position, and then the Referring to the relative position coordinates, the first robotic arm drives the wafer positioning member loading and unloading mechanism to align the wafer tray, removes the wafer positioning member pre-fixed on the periphery of the wafer tray, and drives the wafer positioning member by the second robotic arm. The circular pick-and-place mechanism is placed on the main calibration mechanism to correct the working position of the wafer pick-and-place mechanism, and then the wafer to be processed is taken out from the loading mechanism and placed on the wafer calibration mechanism to obtain the wafer. and adjust the notch of the wafer to the correct angle, the wafer to be processed is placed on the wafer tray by the wafer pick-and-place mechanism, and the image grabbing assembly is driven by the first robotic arm On the carrier tray, confirm whether the wafers on the wafer tray are complete, and then drive the wafer positioning member loading and unloading mechanism to combine the wafer positioning member on the wafer tray, so that the wafer positioning member can be pressed together Positioning is formed on the periphery of the wafer; after the wafer is processed, the first robotic arm drives the image grabbing component to the top of the carrier, obtains an image of one of the wafer trays on the carrier, and adjusts to the correct corresponding Then, the wafer positioning member loading and unloading mechanism is aligned with the wafer tray, and the wafer positioning member that is fixed on the wafer tray to complete the processing of the wafer is removed, and then the second robotic arm drives the wafer to pick and place. The mechanism moves the wafer on the wafer tray to the wafer calibration mechanism. After the wafer calibration mechanism obtains the code of the wafer, the processed wafer is moved to the loading mechanism for use. An automated processing operation for correctly and quickly picking and placing each wafer from the carrier is completed.
为达成上述目的及功效,本实用新型所实行的技术手段包括:一第一机械臂,连结并受一控制模块驱动,在该第一机械臂的活动端上至少设有一影像攫取组件;一第二机械臂,连结并受该控制模块驱动,在该第二机械臂的活动端上设有一晶圆取放机构;一载盘,设置于该第一、二机械臂的活动范围内,且连结并受该控制模块驱动,该载盘上设有至少一承置晶圆的晶圆盘;一晶圆校正机构,设置于该第二机械臂的活动范围内,且连结并受该控制模块驱动,以供读取置入的晶圆的编码及调整该晶圆的缺口;一主校正机构,设置于该第一、二机械臂之活动范围内,且连结并受该控制模块驱动,以供分别校正该影像攫取组件及晶圆取放机构的位置;一置料机构,设置于该第二机械臂的活动范围内。In order to achieve the above objects and effects, the technical means implemented by the present invention include: a first mechanical arm, connected and driven by a control module, at least one image grabbing component is arranged on the movable end of the first mechanical arm; a first mechanical arm Two manipulators are connected and driven by the control module, a wafer pick-and-place mechanism is arranged on the movable end of the second manipulator; and driven by the control module, the carrier plate is provided with at least one wafer plate for holding wafers; a wafer calibration mechanism is arranged in the movable range of the second robot arm, and is connected and driven by the control module , for reading the code of the inserted wafer and adjusting the gap of the wafer; a main calibration mechanism is arranged within the movable range of the first and second robotic arms, and is connected and driven by the control module for The positions of the image grabbing component and the wafer pick-and-place mechanism are respectively corrected; and a material loading mechanism is arranged within the movable range of the second mechanical arm.
依上述结构,其中各晶圆分别通过一可锁掣的晶圆定位件固定于该晶圆盘上,且该第一机械臂的活动端上另设有一可装卸该晶圆定位件的晶圆定位件装卸机构。According to the above structure, each wafer is respectively fixed on the wafer tray by a lockable wafer positioning member, and the movable end of the first robot arm is further provided with a wafer capable of attaching and detaching the wafer positioning member Positioning part loading and unloading mechanism.
依上述结构,其中该影像攫取组件具有一可产生照明光线的上取像组件,该主校正机构具有一下取像组件,在该下取像组件上方设有一透明片,在该透明片上设有一作为定位基准的标准刻度;该晶圆定位件装卸机构具有一定位面,在该定位面上设有一定位刻度;该晶圆取放机构具有可吸取晶圆的晶圆吸盘,在该晶圆吸盘上设有一指示刻度。According to the above structure, wherein the image-grabbing component has an upper image-capturing component that can generate illumination light, the main correction mechanism has a lower image-capturing component, a transparent sheet is arranged above the lower image-taking component, and a The standard scale of the positioning reference; the wafer positioning member loading and unloading mechanism has a positioning surface, and a positioning scale is arranged on the positioning surface; the wafer pick-and-place mechanism has a wafer suction cup that can suck wafers, There is an indicator scale.
依上述结构,其中该晶圆定位件装卸机构在该定位面外旁侧设有至少二雷射光源。According to the above structure, the wafer positioning member loading and unloading mechanism is provided with at least two laser light sources outside the positioning surface.
依上述结构,其中该主校正机构在该下取像组件旁侧设有一测距雷射光源。According to the above structure, the main calibration mechanism is provided with a distance-measuring laser light source beside the lower image pickup assembly.
依上述结构,其中该置料机构为一内部具有收容空间的置料匣,该置料匣设置于一升降机构上,该升降机构连结并受该控制模块驱动,以调整该置料匣的高度。According to the above structure, wherein the feeding mechanism is a feeding box with a receiving space inside, the feeding box is arranged on a lifting mechanism, and the lifting mechanism is connected and driven by the control module to adjust the height of the feeding box .
依上述结构,其中该载盘设置于一滑移机构上,该滑移机构具有一滑移座,该滑移座可沿至少二平行延伸的滑移导轨移动,在该滑移座上设有一承置该载盘的枢转座。According to the above structure, wherein the carrier plate is arranged on a sliding mechanism, the sliding mechanism has a sliding seat, the sliding seat can move along at least two parallel extending sliding guide rails, and a sliding seat is provided on the sliding seat A pivot seat for holding the carrier plate.
依上述结构,其中该载盘上方设有一外罩,该外罩上设有一凹缺口,可使该载盘上的局部晶圆盘对外裸露。According to the above structure, a cover is provided above the carrier, and a recess is formed on the cover, so that part of the wafer on the carrier can be exposed to the outside.
依上述结构,其中该晶圆校正机构具有一可供放置晶圆的承置座,在该承置座上方设有一取像单元。According to the above structure, the wafer calibration mechanism has a support seat for placing the wafer, and an imaging unit is arranged above the support seat.
为使本实用新型的上述目的、功效及特征可获致更具体的了解,兹依下列附图说明如下。In order to obtain a more specific understanding of the above-mentioned objects, functions and features of the present invention, the following descriptions are given with reference to the following drawings.
附图说明Description of drawings
第1图为本实用新型将载盘局部分解的完整立体结构图。Figure 1 is a complete three-dimensional structural diagram of the utility model partially disassembling the carrier plate.
第2图为本实用新型的主校正机构的局部放大示意图。Fig. 2 is a partial enlarged schematic view of the main calibration mechanism of the present invention.
第3图为本实用新型的影像攫取组件在主校正机构上方校正位置的状态示意图。FIG. 3 is a schematic diagram of the state of the image grabbing assembly of the present invention calibrating the position above the main calibrating mechanism.
第4图为本实用新型的晶圆定位件装卸机构在主校正机构上方校正位置的状态示意图。FIG. 4 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention calibrates the position above the main calibration mechanism.
第5图为本实用新型的影像攫取组件在载盘上方正确对应于晶圆盘的状态示意图。FIG. 5 is a schematic diagram of the state where the image grabbing assembly of the present invention is correctly corresponding to the wafer tray above the carrier tray.
第6图为本实用新型的晶圆定位件装卸机构移至晶圆盘上抓取晶圆定位件的状态示意图。FIG. 6 is a schematic diagram of the state in which the wafer positioning member loading and unloading mechanism of the present invention moves to the wafer tray to grab the wafer positioning member.
第7图为本实用新型的晶圆定位件装卸机构取下晶圆定位件的状态示意图。FIG. 7 is a schematic diagram of the state of removing the wafer positioning member by the wafer positioning member loading and unloading mechanism of the present invention.
第8图为第7图的A部位的局部放大示意图。FIG. 8 is a partially enlarged schematic view of the portion A in FIG. 7 .
第9图为本实用新型的晶圆取放机构在主校正机构上方校正位置的状态示意图。FIG. 9 is a schematic diagram of the state of the wafer pick-and-place mechanism of the present invention calibrating the position above the main calibration mechanism.
第10图为本实用新型的晶圆取放机构由供料机构中取出晶圆的状态示意图。FIG. 10 is a schematic diagram of the state of the wafer pick-and-place mechanism of the present invention taking out the wafers from the feeding mechanism.
第11图为本实用新型的晶圆取放机构将晶圆置在晶圆校正机构上的状态示意图。FIG. 11 is a schematic diagram of the state in which the wafer pick-and-place mechanism of the present invention places the wafer on the wafer calibration mechanism.
第12图为本实用新型的晶圆校正机构校正晶圆的状态示意图。FIG. 12 is a schematic diagram of the state of the wafer calibration mechanism of the present invention calibrating the wafer.
第13图为本实用新型的晶圆取放机构将晶圆移置于晶圆盘上的状态示意图。FIG. 13 is a schematic diagram of the state in which the wafer pick-and-place mechanism of the present invention transfers the wafer onto the wafer tray.
第14图为本实用新型的影像攫取组件确认载盘上晶圆位置的状态示意图。FIG. 14 is a schematic diagram of the state of the image grabbing assembly of the present invention for confirming the position of the wafer on the carrier plate.
第15图为本实用新型的晶圆定位件装卸机构移至晶圆盘上装设晶圆定位件的状态示意图。FIG. 15 is a schematic diagram of the state in which the wafer positioning member loading and unloading mechanism of the present invention is moved to the wafer tray to install the wafer positioning member.
第16图为本实用新型的晶圆定位件装卸机构移回初始位置且晶圆定位件固定于晶圆盘上的状态示意图。FIG. 16 is a schematic diagram of the state in which the wafer positioning member loading and unloading mechanism of the present invention is moved back to the initial position and the wafer positioning member is fixed on the wafer tray.
第17图为本实用新型的影像攫取组件在载盘上方正确对应于晶圆盘的状态示意图。FIG. 17 is a schematic diagram of the state where the image grabbing assembly of the present invention is correctly corresponding to the wafer tray above the carrier tray.
第18图为本实用新型的晶圆定位件装卸机构移至晶圆盘上抓取晶圆定位件的状态示意图。FIG. 18 is a schematic diagram of the state in which the wafer positioning member loading and unloading mechanism of the present invention moves to the wafer tray to grab the wafer positioning member.
第19图为本实用新型的晶圆定位件装卸机构取下晶圆定位件的状态示意图。FIG. 19 is a schematic diagram of the state of removing the wafer positioning member by the wafer positioning member loading and unloading mechanism of the present invention.
第20图为本实用新型的晶圆取放机构将晶圆由晶圆盘上取下的状态示意图。FIG. 20 is a schematic diagram of the state in which the wafer pick-and-place mechanism of the present invention removes the wafer from the wafer tray.
第21图为本实用新型的晶圆校正机构读取晶圆编码的状态示意图。FIG. 21 is a schematic diagram of the state of the wafer calibration mechanism of the present invention reading the wafer code.
第22图为本实用新型的晶圆取放机构将晶圆置入置料机构的状态示意图。FIG. 22 is a schematic diagram showing the state of the wafer pick-and-place mechanism of the present invention placing the wafer into the material-placement mechanism.
附图标记说明。Description of reference numbers.
1 第一机械臂1 The first robotic arm
11 影像攫取组件11 Image capture component
111 上取像组件111 Upper image acquisition unit
12 晶圆定位件装卸机构12 Wafer positioner loading and unloading mechanism
121 定位面121 Positioning surface
122 定位刻度122 Positioning scale
123 夹持件123 Clamps
124 雷射光源124 Laser light source
2 第二机械臂2 Second robotic arm
21 晶圆取放机构21 Wafer pick and place mechanism
211 指示刻度211 Indication scale
3 载盘3 trays
31 晶圆盘31 Wafer tray
311 晶圆定位件311 Wafer Positioner
32 外罩32 cover
321 凹缺口321 Notch
33 滑移机构33 Sliding mechanism
331 滑移座331 Sliding seat
332 滑移导轨332 Sliding rails
333 枢转座333 Pivot seat
4 主校正机构4 Main Correction Mechanism
41 测距雷射光源41 Ranging laser light source
411 激光束411 Laser beam
42 下取像组件42 lower acquisition unit
43 透明片43 Transparencies
431 标准刻度431 standard scale
5 晶圆校正机构5 Wafer Correction Mechanism
51 承置座51 Holder
52 取像单元52 Acquisition unit
53 吸头53 tips
54 转置机构54 Transpose mechanism
6 置料机构6 feeding mechanism
60 晶圆60 wafers
61 升降机构61 Lifting mechanism
具体实施方式Detailed ways
请参第1、2图所示,可知本实用新型的主要结构包括:第一机械臂1、第二机械臂2、载盘3、主校正机构4及晶圆校正机构5等部分;其中该第一机械臂1连结并受一控制模块(可为一具运算功能的计算机,未绘出)驱动,该第一机械臂1的活动端上设有一影像攫取组件11及一晶圆定位件装卸机构12。Please refer to Figures 1 and 2, it can be seen that the main structure of the present invention includes: a
在一个可行的实施例中,该影像攫取组件11具有一可产生照明光线的上取像组件111(可为一CCD摄影机);该晶圆定位件装卸机构12上设有一定位面121,该定位面121(中央)设有一定位刻度122(可为一孔洞),在该定位面121外周侧至少设有二相对的夹持件123,该晶圆定位件装卸机构12周侧设有至少二均匀分布的雷射光源124,该至少二雷射光源124分别设置于该定位面121外旁侧至少三点。In a feasible embodiment, the
该第二机械臂2连结并受该控制模块驱动,该第二机械臂2的活动端上设有一可吸附晶圆60的晶圆取放机构21(可为一晶圆吸盘);在一个可行的实施例中,该晶圆取放机构21上设有一指示刻度211。The
该载盘3设置于该第一、二机械臂1、2的活动范围内,且连结并受该控制模块驱动,在该载盘3上不同位置设有至少二晶圆盘31,在各晶圆盘31上分别设有可锁掣的晶圆定位件311(可为一压环)。The
在一个可行的实施例中,该载盘3设置于一滑移机构33上,该滑移机构33具有一滑移座331,该滑移座331设置于至少二平行延伸的滑移导轨332上,在该滑移座331上设有一承置该载盘3的枢转座333;而在该载盘3上方固定设有一外罩32,该外罩32上设有一凹缺口321,可使该载盘3上的局部晶圆盘31对外裸露,利用该控制模块操作该滑移机构33,可使该滑移座331带动该枢转座333在该滑移导轨332二端之间滑移,并可通过该枢转座333驱动该载盘3枢转。In a feasible embodiment, the
该主校正机构4设置于该第一、二机械臂1、2的活动范围内,且连结并受该控制模块驱动,以供分别校正该影像攫取组件11、晶圆定位件装卸机构12及晶圆取放机构21,使其分别保持在正确的位置。The
在一个可行的实施例中,该主校正机构4具有一可产生照明光线的下取像组件42以及至少一具测距功能的测距雷射光源41;该下取像组件42系可为一CCD摄影机,在该下取像组件42上方设有一透明片43,在该透明片43中央设有一标准刻度431。In a feasible embodiment, the
该晶圆校正机构5设置于该第二机械臂2的活动范围内,且连结并受该控制模块驱动;在本实施例中,该晶圆校正机构5具有一供放置晶圆60的承置座51,承置座51中央设有一贯通孔,在该承置座51上方设有一取像单元52,在该贯通孔下方设有一具真空吸孔(可吸附晶圆60)的吸头53,该吸头53可受一转置机构54驱动而执行升降及枢转等动作。The
另可依需要在该第二机械臂2的活动范围内设置一置料机构6,该置料机构6可为一置料匣(或外接的置料装置),其内部具有可供收容晶圆60的承料空间与机制。In addition, a
在本案各图所揭露的实施例中,在该置料机构6(置料匣)下方可依需要设置一升降机构61,该升降机构61可驱动该置料机构6升高或降低位置。In the embodiments disclosed in the figures of this application, a
请参第3至22图所示,可知本实用新型的上述结构在操作时,首先使该滑移机构33的滑移座331沿该滑移导轨332向外移出,将承载有至少二晶圆盘31的载盘3置于该滑移机构33的枢转座333上;Please refer to FIGS. 3 to 22, it can be seen that when the above structure of the present invention is in operation, the sliding
然后,该滑移座331沿该滑移导轨332向内移至该外罩32下方,并使其中一晶圆盘31位于该凹缺口321下方形成裸露。Then, the sliding
再由该第一机械臂1驱动该影像攫取组件11移至该主校正机构4上(如第3图所示),以调整校正该影像攫取组件11取得影像范围至正确位置。Then, the first
当该第一机械臂1驱动该影像攫取组件11靠近该主校正机构4上方时,该下取像组件42直接取得该透明片43上标准刻度431的位置,且该主校正机构4系利用测距雷射光源41所产生的激光束411投射至该影像攫取组件11上,用以测量该影像攫取组件11的距离,以调整该下取像组件42的镜头焦距;而该影像攫取组件11通过该上取像组件111取得该透明片43上的标准刻度431的位置,由该控制模块比对该下取像组件42取得该标准刻度431的位置与该影像攫取组件11取得该标准刻度431的位置之间差异,通过该第一机械臂1调整该影像攫取组件11的位置,使该下取像组件42取得的标准刻度431位置与该上取像组件111取得的标准刻度431影像相叠合,再由该控制模块记忆该影像攫取组件11的正确取像范围的坐标,用以达到校正该影像攫取组件11取像范围的目的。When the first robotic arm 1 drives the image-grabbing assembly 11 to approach above the main calibration mechanism 4, the lower image-capturing assembly 42 directly obtains the position of the standard scale 431 on the transparent sheet 43, and the main calibration mechanism 4 uses the measurement The laser beam 411 generated from the laser light source 41 is projected onto the image grabbing element 11 to measure the distance of the image grabbing element 11 to adjust the lens focal length of the lower image capturing element 42; and the image grabbing element 11 passes through The upper image capturing element 111 obtains the position of the standard scale 431 on the transparent sheet 43, and the control module compares the position of the standard scale 431 obtained by the lower image capturing element 42 with the position of the standard scale 431 obtained by the image capturing element 11 The position of the image grabbing unit 11 is adjusted by the first robotic arm 1 so that the position of the standard scale 431 obtained by the lower image capturing unit 42 and the image of the standard scale 431 obtained by the upper image capturing unit 111 are superimposed , and then the control module memorizes the coordinates of the correct image capturing range of the image grabbing component 11 , so as to achieve the purpose of correcting the image capturing range of the image grabbing component 11 .
该第一机械臂1驱动该晶圆定位件装卸机构12的定位面121移至该主校正机构4上(如第4图所示),以调整校正该晶圆定位件装卸机构12的作业位置,且该控制模块可比对记忆该晶圆定位件装卸机构12作业位置与该影像攫取组件11取得影像范围之间的相对位置坐标。The
当该第一机械臂1驱动该晶圆定位件装卸机构12靠近该主校正机构4上方时,该主校正机构4利用测距雷射光源41所产生的雷射光投射至该定位面121上,用以测量该晶圆定位件装卸机构12的距离,以调整该下取像组件42的镜头焦距;而该下取像组件42则可观视该透明片43上标准刻度431与该定位面121上该定位刻度122(或孔洞)之间的位置差异,并由该控制模块通过该第一机械臂1驱动该晶圆定位件装卸机构12调整位置,使该定位面121上该定位刻度122(或孔洞)与该标准刻度431位置重叠,即可使该晶圆定位件装卸机构12的作业位置可被校正至正确位置。When the first
该第一机械臂1驱动该影像攫取组件11移至该载盘3上方(如第5图所示),以确认该晶圆盘31的位置并检视该未承置晶圆60的晶圆盘31上的状况(是否有残留的晶圆60碎屑或破片)。The
该控制模块参考该相对位置坐标,经该第一机械臂1驱动该晶圆定位件装卸机构12接近该晶圆盘31,利用该控制模块通过该第一机械臂1驱动该晶圆定位件装卸机构12调整位置,使该至少二(至少三个)雷射光源124所产生相同长度的激光束,可共同投射于该晶圆盘31上,藉以使该定位面121对准(平行于)该晶圆盘31(如第6图所示),再将该晶圆盘31周缘预先设置之晶圆定位件311解除锁掣之后,利用该夹持件123取出该晶圆定位件311,并维持夹持状态(如第7、8图所示)。The control module refers to the relative position coordinates, drives the wafer positioner loading and
该第二机械臂2驱动该晶圆取放机构21移至该主校正机构4上(如第9图所示,为便于检视该主校正机构4,并未绘出该晶圆校正机构5),以校正该晶圆取放机构21的位置。The
当该第二机械臂2驱动该晶圆取放机构21靠近该主校正机构4上方时,该主校正机构4系利用测距雷射光源41所产生的雷射光投射至该晶圆取放机构21上,用以测量该晶圆取放机构21的距离,以调整该下取像组件42的镜头焦距;而该下取像组件42则可观视该透明片43上标准刻度431与该晶圆取放机构21上该指示刻度211之间的位置差异,并由该控制模块通过该第二机械臂2驱动该晶圆取放机构21调整位置,使该晶圆取放机构21上的该指示刻度211与该标准刻度431得以重叠,使该晶圆取放机构21的作业位置可被校正至正确位置。When the second
该第二机械臂2驱动该晶圆取放机构21移至该供料机构6中取出待加工的晶圆60(如第10图所示),并将该晶圆60放置于该晶圆校正机构5的承置座51上(如第11图所示)。The second
该晶圆校正机构5的取像单元52先取得该待加工晶圆60的编码及缺口位置(如第12图所示),再由该控制模块依据该欲置入晶圆盘31的缺口位置计算该晶圆60所需调整的角度,由该转置机构54驱动该吸头53吸附该晶圆60上升(脱离该承置座51),并转动该晶圆60,以将该晶圆60的缺口调整至正确的角度;然后该转置机构54带动该吸头53吸附该晶圆60下降,以将该晶圆60回置于该承置座51上。The
该第二机械臂2驱动该晶圆取放机构21将该具有正确缺口角度的晶圆60由该晶圆校正机构5的承置座51上取出,并放置于该载盘3之该晶圆盘31上(如第13图所示)。The
该第一机械臂1驱动该影像攫取组件11移至该载盘3上(如第14图所示),并取得前一步骤所放置的晶圆60的影像,以确认该晶圆60是否完整且是否被放置于正确位置。The
该第一机械臂1驱动该晶圆定位件装卸机构12将该夹持件123所夹持的该晶圆定位件311结合于该晶圆盘31上(如第15图所示),据此该晶圆定位件311压合于该晶圆60周缘形成定位(如第16图所示)。The
然后,该枢转座333驱动该载盘3转动,使该已承载晶圆60的该晶圆盘31转至该外罩32下方,且另一未放置晶圆60的晶圆盘31移至该外罩32的凹缺口321下方形成裸露,以便于依序重复上述步骤,将不同待加工晶圆60分别固定于各晶圆盘31上;最后,当该载盘3的各晶圆盘31皆已承载待加工晶圆60之后,该滑移机构33的滑移座331沿该滑移导轨332向外滑动,以便于将该载盘3移至下一工序。Then, the
当各待加工晶圆60完成加工后,该滑移机构33的滑移座331沿该滑移导轨332向外移出,将承载有至少二晶圆盘31的载盘3置于该滑移机构33的枢转座333上,且在各晶圆盘31上分别通过晶圆定位件311固定有已加工完成的晶圆60;然后,该滑移座331沿该滑移导轨332向内移至该外罩32下方,并使其中一晶圆盘31位于该凹缺口321下方形成裸露。After the processing of each
该第一机械臂1驱动该影像攫取组件11移至该载盘3上方(如第17图所示),以确认该晶圆盘31的位置并检视该晶圆盘31上的状况(晶圆60是否完整无破碎)。The
该控制模块参考该相对位置坐标,经该第一机械臂1驱动该晶圆定位件装卸机构12接近该晶圆盘31,利用该控制模块通过该第一机械臂1驱动该晶圆定位件装卸机构12调整位置,使该至少二(至少三个)雷射光源124所产生相同长度的雷射光,可共同投射在该晶圆盘31上,用以使该定位面121对准(平行于)该晶圆盘31(如第18图所示),再将该晶圆盘31周缘预先设置之晶圆定位件311解除锁掣之后,利用该夹持件123取出该晶圆定位件311,并维持夹持状态(如第19图所示)。The control module refers to the relative position coordinates, drives the wafer positioner loading and
该第二机械臂2驱动该晶圆取放机构21移至该载盘3(裸露于凹缺口321下方)的晶圆盘31上,以吸取晶圆60(如第20图所示);并将该晶圆60移置于该晶圆校正机构5的承置座51上,通过该取像单元52读取该晶圆60的编码(如第21图所示),并由该控制模块记录该已加工晶圆60的编码。The second
该第二机械臂2驱动该晶圆取放机构21将该晶圆60由承置座51上取下,配合该升降机构61驱动该置料机构6升降动作,可将该已加工晶圆60放入该置料机构6的承料空间中(如第22图所示)。The second
然后,该枢转座333驱动该载盘3转动,使该已取出晶圆60的晶圆盘31转至该外罩32下方,且另一承载有晶圆60的晶圆盘31移至该外罩32的凹缺口321下方形成裸露,以便于依序重复上述步骤,以将不同晶圆盘31上的已加工晶圆60分别移至该置料机构6中;最后,当该载盘3的各已加工晶圆60皆已取出之后,该滑移机构33之滑移座331沿该滑移导轨332向外滑动,以便于将该清空之载盘3取出,并将另一具有已加工晶圆60的载盘3置于该枢转座333上。Then, the
综合以上所述,本实用新型晶圆载盘的置卸载装置确可达成降低人力成本并提升晶圆由晶圆盘上取放的移置效率等功效,实为一具新颖性及进步性的实用新型,因此依法提出申请新型专利;惟上述说明的内容,仅为本实用新型的较佳实施例说明,举凡依本实用新型的技术手段与范畴所延伸的变化、修饰、改变或等效置换者,亦皆应落入本实用新型的专利申请范围内。To sum up the above, the device for placing and unloading the wafer tray of the present invention can indeed achieve the functions of reducing labor costs and improving the displacement efficiency of wafers on the wafer tray, which is novel and progressive. Therefore, it is proposed to apply for a new type patent according to the law; only the content of the above description is only the description of the preferred embodiment of the present invention, citing any changes, modifications, changes or equivalent replacements extended by the technical means and scope of the present invention All of them should also fall within the scope of the patent application of the present invention.
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| CN113284831A (en) * | 2020-02-19 | 2021-08-20 | 总督科技股份有限公司 | Unloading device and unloading method for wafer carrying disc |
| WO2021164664A1 (en) * | 2020-02-19 | 2021-08-26 | 宋茂炎 | Loading/unloading device of wafer carrying disc and loading/unloading method therefor |
| CN115621172A (en) * | 2021-07-15 | 2023-01-17 | 总督科技股份有限公司 | Unloading device and method for pre-cured wafer carrier |
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| CN113284831A (en) * | 2020-02-19 | 2021-08-20 | 总督科技股份有限公司 | Unloading device and unloading method for wafer carrying disc |
| WO2021164664A1 (en) * | 2020-02-19 | 2021-08-26 | 宋茂炎 | Loading/unloading device of wafer carrying disc and loading/unloading method therefor |
| CN113284831B (en) * | 2020-02-19 | 2025-07-04 | 总督科技股份有限公司 | Wafer carrier unloading device and unloading method |
| CN115621172A (en) * | 2021-07-15 | 2023-01-17 | 总督科技股份有限公司 | Unloading device and method for pre-cured wafer carrier |
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