CN214211176U - 卫生器具 - Google Patents
卫生器具 Download PDFInfo
- Publication number
- CN214211176U CN214211176U CN201920020034.5U CN201920020034U CN214211176U CN 214211176 U CN214211176 U CN 214211176U CN 201920020034 U CN201920020034 U CN 201920020034U CN 214211176 U CN214211176 U CN 214211176U
- Authority
- CN
- China
- Prior art keywords
- coating
- plumbing fixture
- deposition
- fixture
- appearance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000576 coating method Methods 0.000 claims abstract description 96
- 239000011248 coating agent Substances 0.000 claims abstract description 90
- 238000009428 plumbing Methods 0.000 claims abstract description 67
- 239000000463 material Substances 0.000 claims abstract description 61
- 230000000873 masking effect Effects 0.000 claims abstract description 28
- 230000007704 transition Effects 0.000 claims abstract description 19
- 239000011247 coating layer Substances 0.000 claims description 11
- 238000000151 deposition Methods 0.000 description 27
- 238000000034 method Methods 0.000 description 25
- 238000005240 physical vapour deposition Methods 0.000 description 17
- 230000008021 deposition Effects 0.000 description 14
- 230000008569 process Effects 0.000 description 11
- 239000007921 spray Substances 0.000 description 10
- 239000002253 acid Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910052582 BN Inorganic materials 0.000 description 7
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000010943 off-gassing Methods 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- 229910000906 Bronze Inorganic materials 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 239000010974 bronze Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- 230000009977 dual effect Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 239000000440 bentonite Substances 0.000 description 2
- 229910000278 bentonite Inorganic materials 0.000 description 2
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000010939 rose gold Substances 0.000 description 2
- 229910001112 rose gold Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920006169 Perfluoroelastomer Polymers 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000010957 pewter Substances 0.000 description 1
- 229910000498 pewter Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007741 pulsed electron deposition Methods 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
- B05D1/322—Removable films used as masks
- B05D1/327—Masking layer made of washable film
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/065—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects having colour interferences or colour shifts or opalescent looking, flip-flop, two tones
- B05D5/066—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects having colour interferences or colour shifts or opalescent looking, flip-flop, two tones achieved by multilayers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/067—Metallic effect
- B05D5/068—Metallic effect achieved by multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0647—Boron nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/028—Including graded layers in composition or in physical properties, e.g. density, porosity, grain size
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/01—Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
-
- E—FIXED CONSTRUCTIONS
- E03—WATER SUPPLY; SEWERAGE
- E03C—DOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
- E03C1/00—Domestic plumbing installations for fresh water or waste water; Sinks
- E03C1/02—Plumbing installations for fresh water
- E03C1/04—Water-basin installations specially adapted to wash-basins or baths
- E03C1/0404—Constructional or functional features of the spout
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
本实用新型涉及一种卫生器具，其包括：第一部分；第二部分；以及布置在所述第一部分和所述第二部分之间的过渡区域，其中第一涂层在所述卫生器具的第一部分上，并且掩模材料在所述卫生器具的第二部分上；或者第一涂层在所述卫生器具的第一部分上，并且第二涂层在所述卫生器具的第二部分上，其中所述第一涂层的厚度在100nm至2000nm的范围内变化，所述掩模材料的厚度在10μm至100μm的范围内，所述第二涂层的厚度在100nm至2000nm的范围内变化。
Description
相关申请的交叉引用
本申请要求2018年1月6日提交的美国临时申请No.62/614,385的权益和优先权，其全部公开内容通过引用并入本文。
技术领域
本申请涉及一种卫生器具。
背景技术
尽管在纺织品和美发行业中最常使用渐变效果，但它们还未被用于具有不规则图案或形状的表面，特别是未被用于需要弹性饰面(resilient finish)的卫生器具，该弹性饰面旨在这样的环境中经得起普通使用
实用新型内容
本实用新型涉及一种卫生器具，其包括：第一部分；第二部分；以及布置在所述第一部分和所述第二部分之间的过渡区域，其中第一涂层在所述卫生器具的第一部分上，并且掩模材料在所述卫生器具的第二部分上；或者第一涂层在所述卫生器具的第一部分上，并且第二涂层在所述卫生器具的第二部分上，其中所述第一涂层的厚度在100nm至2000nm的范围内变化，所述掩模材料的厚度在10μm至100μm的范围内，所述第二涂层的厚度在100nm至2000nm 的范围内变化。
附图说明
图1是示出根据示例性实施例的将多色饰面应用于卫生器具的方法的流程图。
图2示出了根据示例性实施例的包括掩模材料和第一涂层的卫生器具。
图3示出了根据另一示例性实施例的包括掩模材料和第一涂层的卫生器具。
图4示出了根据示例性实施例的具有最终渐变色外观的龙头卫生器具。
图5示出了根据示例性实施例的用于遮蔽卫生器具的一部分的过程。
图6示出了根据另一示例性实施例的用于在真空室中沉积涂层的无掩模配置。
图7示出了根据另一示例性实施例的用于在真空室中沉积涂层的无掩模配置。
具体实施方式
在以下详细描述中参考了附图，其形成了本发明的一部分。在附图中，除非上下文另有指示，否则类似的符号通常标识类似的组件。在具体实施方式、附图和权利要求中描述的说明性实施例不意味着是限制性的。在不脱离本文展现的主题的精神或范围的情况下，可以利用其他实施例，并且可以进行其他改变。容易理解的是，如本文一般描述的并且在附图中示出的本公开的方面可以以各种不同的配置来安排、替换、组合和设计，所有这些都是明确预期和成为本公开的一部分。
如在本公开中使用的，术语“渐变”可以用于描述其中颜色、阴影或亮度从一个区域逐渐过渡到另一个区域视觉效果。例如，颜色可以从一个区域到下一个区域由较暗到较亮渐变。实际的渐变可以是从较暗的颜色到较亮的颜色，从一种阴影到另一种阴影，或颜色或阴影的任何组合。
提供一种用于将多色饰面应用于卫生器具的新颖方法以及生产采用这种饰面的产品，以提供这种产品的独特且迄今未使用的饰面，将是有利的。这些和其他有利特征对于审阅本公开的人员将是显而易见的。
本公开提供了一种对卫生器具形成多色饰面的方法，以及具有这种饰面的卫生器具。参考图1的示例性实施例，所公开的方法的第一步骤100包括提供卫生器具，如卫生器具10所示，作为基底，在其上施用多色饰面。卫生器具并不意味着受到限制，可以是与输送和排出水相关的任何家用卫生器具。卫生器具可以是用于水槽、浴盆、漩涡浴缸、淋浴喷头、水疗、给皂器等的龙头中的至少一个；龙头把手；龙头配件，如流体管道(如水管、软管等)；或水容器或容器，如水槽、浴盆、漩涡浴缸、水疗等。在另一个实施例中，多色饰面也可以应用于其他卫生器具，例如浴室或厨房卫生器具，如毛巾架、照明装置或通风装置。此外，表面饰面可以应用于卫生器具的表面，其由低腐蚀性金属或金属合金(例如，钨、钛、铬、铅锡锑合金(pewter)、铜、青铜、黄铜、不锈钢、锌合金)，陶瓷(例如瓷)，玻璃，塑料或其组合。
根据图1的实施例的方法的第二步骤200，包括在卫生器具10上沉积第一涂层20以获得具有第一外观的第一饰面。在一个实施例中，沉积第一涂层的步骤包括将第一涂层沉积在卫生器具的整个表面区域上。在另一个实施例中，仅卫生器具的一部分表面区域涂覆有第一饰面。第一饰面可以是抛光金属、拉丝金属、镀金、油擦金属、缎面金属或其组合中的至少一种。第一饰面的非限制性实例包括抛光铬、拉丝铬、抛光法国金、抛光钛、拉丝钛、抛光玫瑰金、抛光现代金、抛光钨、抛光现代黄铜、缎面钛、抛光缎面铬、缎面青铜、抛光黄铜、缎面黄铜、油擦青铜、抛光镍、拉丝镍或哑光黑等。
可以使用真空沉积(物理气相沉积，PVD；化学气相沉积，CVD；原子层沉积，ALD)，电镀，浸涂或喷涂工艺中的至少一种来进行沉积第一涂层的步骤。在一个实施例中，PVD用作用于在卫生器具上形成第一涂层的沉积技术。
PVD真空沉积方法是有利的，因为其不含水性组分并且比湿化学方法更环保且经济。PVD涂层通常比通过电镀涂覆的涂层更硬且更耐腐蚀。大多数PVD 涂层具有高温和良好的冲击强度，优异的耐磨性，并且耐用，使得保护性面漆是可选的。PVD沉积工艺包括阴极电弧蒸发、电子束(e-beam)PVD、蒸发沉积、脉冲激光沉积、溅射沉积、离子电镀或脉冲电子沉积中的至少一种。在典型的PVD工艺中，材料从固体源蒸发并在真空环境中作为蒸汽输送到基板，在该处它凝结形成涂层。真空环境被配置成使得颗粒之间的用于碰撞的平均自由程在处理室尺寸的量级上或者通过气体或等离子体(电离气体)的低压环境。
在一些实施方案中，第一涂层的PVD工艺是反应沉积工艺，由此沉积物质与处理环境中的气体物质反应以在沉积之前形成化合物(例如，氮与沉积钛反应形成化合物TiN涂层(具有金的外观))。用于卫生器具的装饰/磨损PVD涂层包括TiN(具有金的外观)、ZrN(具有黄铜状外观)、TiC(具有黑色外观)、TiCN (具有“无烟煤灰”外观)、ZrCN(具有镍样外观)、ZrCrCN(具有黄铜状外观) 和ZrCrN(具有金或玫瑰金的外观)。在一个实施方案中，第一涂层的厚度可以在约100nm至约2000nm的范围内变化。在一些实施例中，在PVD沉积之前，可以在卫生器具上沉积至少一个薄的种子层或底漆层，以实现与随后的PVD涂层的增强的结合特性。对于非平面的表面，卫生器具可以设置在转盘上，当施用第一涂层时，该转盘手动或自动旋转。
在一些实施方案中，使用真空蒸发进行第一涂层的真空沉积，由此蒸发材料源从电加热或通过电子束加热的容器中热蒸发。进行蒸发使得蒸发材料的轨迹为视线(line-of-sight)。真空环境减少了沉积环境中的污染。典型的气体压力在10-5托至10-6托的范围内。在其他实施例中，使用溅射沉积进行真空沉积，由此通过用加速离子轰击从待沉积材料的固体“靶”移除原子。动量转移导致表面原子的喷射，然后表面原子沉积在基板上。溅射发生在小于5×10-3托的情况下，其中颗粒不会与靶和基板之间的体积中的气体分子发生碰撞。溅射沉积包括二极管、磁控管和离子束溅射。
在其他实施例中，使用高脉冲功率磁控溅射(HIPIMS)进行真空沉积，由此将高功率的短脉冲以kW/cm2的数量级施用到目标。在这些功率水平下，溅射材料的电离产生基于金属的等离子体。由HIPIMS制成的涂层非常致密且光滑。在其他实施方案中，在沉积期间使用通过高能离子轰击的离子电镀进行真空沉积，以使沉积物致密化并控制涂层的性质，例如应力和微结构。通过将离子从等离子体直接加速到固体材料源或通过使用单独的离子源(例如，“离子枪”) 来进行沉积期间的离子轰击。
根据图1的实施例的方法的第三步骤300包括掩模30卫生器具10的一部分。通常，进行掩模步骤以选择性地保护已经包括第一涂层20的卫生器具10 的一部分。掩模30可限定卫生器具10的第二外观，其不同于第一涂层的第一外观。在随后的沉积过程中(即，图1的步骤400)，第二涂层直接沉积在卫生器具受保护和未受保护的部分上，以限定具有不同于第一外观的第二外观的第二饰面。因此，掩模材料的选择基于其在沉积清洗(即，图1的步骤500)后选择性地分离的能力，其随之带走沉积在掩模层上的第二涂层的一部分，同时留下部分第一层涂层完整地沉积在掩模层下面。此外，选择掩模材料的另一个因素是其除气性能。类似于形成第一涂层的方法，在一些实施方案中，第二涂层也沉积在真空环境中。在真空环境中，一个常见问题是从位于真空室中的大部分材料中的气体的释放。这种除气增加了腔室中的压力负荷并影响膜沉积速率并将污染引入沉积的膜中。例如，对于具有高除气率的掩模材料可能导致第二涂层被脱气元素污染(不利地影响所得膜的美观性)，以及由于用于沉积材料与靶和基板之间的其他气态颗粒之间的碰撞的平均自由程减小而降低第二涂层的沉积速率。因此，为了使污染最小化并降低第二涂层的沉积速率，申请人有利地使用具有低的除气率的掩模材料。
真空相容的掩模材料可选自金属、塑料、玻璃、陶瓷、润滑液或粘合剂中的至少一种。金属掩模的非限制性实例包括：奥氏体不锈钢、低碳钢、铝和铝合金、铝青铜、镍和镍合金、铍、无氧铜、铟、金、铂、锆、钛、钨、钼、钽、铌和焊锡(例如，锡-银共晶(95％Sn，5％Ag))。塑料掩模的非限制性实例包括：含氟聚合物(例如，聚偏二氟乙烯、聚四氟乙烯)、vespel聚酰亚胺、聚碳酸酯、聚苯乙烯、聚醚醚酮(PEEK)、Kapton和人造橡胶(例如丁腈橡胶、氟化人造橡胶、全氟人造橡胶化合物)。玻璃和陶瓷的非限制性实例包括：硼硅酸盐玻璃、氧化铝陶瓷和硼硅酸盐玻璃基质中的氟金云母。润滑油的非限制性实例包括真空润滑脂(例如，Ramsey润滑脂、基于氟代醚的润滑脂、聚苯醚润滑脂)和干润滑剂(例如、二硫化钼、二硫化钨、氮化硼、石墨)，这些材料尽管为固相，但仍可有效减少两个接触表面之间的摩擦而无需液体油介质。在一个实施例中，真空相容的掩模材料是包含氮化硼的混合物。
在一个实施方案中，真空相容的掩模材料是通过选自印刷、粉末涂覆、涂漆、喷涂、浸涂、刷涂和干粉翻滚的方法制造的干润滑剂。例如，干燥的润滑剂材料最初作为添加剂分散在溶剂中，例如有机溶剂、水或油脂。然后可以用含添加剂的溶剂选择性地喷涂基材(例如卫生器具)，然后使其固化直至溶剂蒸发，留下固体干燥的润滑剂。在一个实施方案中，掩模材料的厚度可以大于第一涂层或第二涂层的厚度，例如，在约10μm至约100μm的范围内。在使用氮化硼作为掩模材料的一个实施方案中，每层在约60℃至约250℃(例如，80℃) 的范围内进行约15分钟至约120分钟(例如，20分钟)的固化。
对于非平面的表面，卫生器具可以设置在转盘上，当施用掩模材料时，该转盘手动或自动360°旋转。以任何所需的预定图案喷涂材料，但以渐变的方式限定渐变。例如，如图2的实施例中所示，卫生器具202的一端可以基本上完全 (即，约100％)覆盖有掩模材料204，并且随着施用喷涂涂层离100％涂覆的端部进一步远离，直到卫生器具202基本上没有掩模施用在第一涂层206上，从而形成梯度(即，第一涂层大部分是可见的)。在另一个示例性实施例中，如图3所示，卫生器卫生器具302的中间部分基本上完全被掩模材料304覆盖，并且随着施用喷涂涂层在每个方向上离基本上100％涂覆的中间部分进一步远离，直到卫生器具302基本上没有掩模施用在第一涂层306上，从而形成梯度。应该注意，根据各种示例性实施例，可以采用任何所需的掩模材料图案。
图5示出了根据示例性实施例的用于遮蔽卫生器具的一部分的方法。卫生器具500定位在可旋转的转盘502的顶上，并临时固定到位于中心的杆504，杆 504从转盘的顶表面向上延伸。卫生器具500可以使用任何紧固装置(例如夹子、栓、粘合剂等)固定到杆504，使得旋转时卫生器具保持固定以实现掩模材料 508的预定图案化，使用喷枪506(例如，加压容器等)进行喷涂。可以根据掩模材料508沉积在其上的卫生器具的类型来修改杆504。例如，杆的延伸长度和 /或宽度可以根据卫生器具的尺寸而改变，以使卫生器具在旋转时的稳定性最大化。
在一些示例性实施例中，喷枪506由使用者手动保持来施用掩模材料508。在其他示例性实施例中，当转盘502旋转时，喷枪506由机械臂保持。转盘以约5rpm至约15rpm范围内的预定每分钟转数旋转。在一个示例中，转盘可以以大约10rpm的速度旋转。喷枪506无论是手动保持还是通过机械臂保持，其距离旋转夹具的距离在约6英寸至约24英寸的范围内。在一个示例中，喷枪可以保持在距旋转夹具约12英寸的距离处。还可以考虑无论是手动保持还是通过机械臂保持，喷枪506围绕卫生器具500旋转，其中卫生器具是静止的。当掩模材料508喷涂到固定目标上时，喷射流的强度沿着其离开喷枪506的角度变化。换句话说，卫生器具500经历喷射流中心的部分将比卫生器具500经历喷射流边缘的部分(即，不完全覆盖)具有更大密度的掩模材料(即，更完全的覆盖)。掩模材料图5使用虚线描述了离开喷枪506的掩模材料508的这种现象。
喷枪506可以沿着卫生器具的长度线性地上下移动，以实现所需的覆盖范围，使得在卫生器具的一定长度之下(例如，在位置“a”下方)至卫生器具接触转盘502的顶表面上，在卫生器具上基本上完全覆盖掩模材料(例如，约100％)。在位置“a”的上方为具有掩模材料梯度涂于其上的卫生器具的部分。继续旋转直到实现预定的掩模材料图案。
根据图1的实施例的方法的第四步骤400，包括在卫生器具10上沉积第二涂层40，第二涂层40在涂有掩模材料30的受保护部分和仅由第一涂层20涂覆的未受保护部分的顶上。在一个实施例中，第二涂层的厚度可在约100nm至约 2000nm的一定范围内变化。如上所述，可以使用沉积技术沉积第二涂层，该沉积技术与用于制造第一涂层的沉积技术相同或不同。
根据图1的实施例的方法的第五步骤500，包括从卫生器具10移除掩模30 以实现最终的渐变外观(即，双涂层、渐变外观)，由此卫生器具10包括具有第一外观的第一涂层20，具有不同于第一外观的第二外观的第二涂层40和表示第一涂层20逐渐过渡到第二涂层40的过渡区域50，反之亦然。在一个示例性实施例中，过渡区域50包括第一百分比的第一涂层和第二百分比的第二涂层。第一个百分比处于约5％至约95％的范围，剩余量作为第二百分比。在一个示例性实施例中，过渡区域50包括多个百分比的第一涂层和多个百分比的第二涂层。
图4示出了具有最终渐变外观的龙头卫生器具的一个示例，其中第一涂层朝向龙头的第一端定位，第二涂层朝向龙头的第二端定位，并且过渡区域位于其间。
在一个实施例中，去除步骤包括化学分离过程，由此在掩蔽卫生器具的一部分的第三步骤300以及在涂覆有掩模材料的受保护部分和仅由第一涂层涂覆的未保护部分的顶上沉积第二涂层的第四步骤400之后，牺牲性(sacrificial) 掩模材料与第二涂层的上覆部分一起被洗掉，以留下被掩模保护的第一涂层的暴露部分。评估化学溶剂的选择以选择性地去除掩模材料。换句话说，必须选择溶剂以选择性地使掩模材料与第一涂层脱离，而基本上不会侵蚀第一涂层或第二涂层。
在一个示例性实施方案中，其中使用氮化硼作为掩模材料，进行酸洗，其包含水和混合酸，例如硫酸(H2SO4)和氟硅酸(HFC)。可以包括在混合中的其他酸包括无机酸(例如，硝酸(HNO3)、盐酸(HCl)、氢氟酸(HF)和磷酸 (H3PO4))和有机酸(乙酸(CH3COOH)和甲酸(CH2O2))。酸洗的酸组分通过影响残留的悬浮粘合剂(例如膨润土、氧化铝膨润土或氧化铝)相或通过稍微溶解基板以使氮化硼层释放而有助于除去氮化硼。酸洗溶液的pH可以在1至5的范围内。考虑的一个酸洗的实例是在约40℃下包含3.5％浓硫酸和23％氟硅酸溶液的混合物的水溶液。在另一个示例性实施方案中，基于水或基于有机溶剂的氮化硼涂层可分别通过暴露于水或溶剂(例如乙醇、丙酮或其组合)而除去。
在另一个示例性实施方案中，还可以使用摩擦机械技术除去掩模材料，例如轻砂纸、钢丝刷、喷砂或喷丸、CO2(干冰)喷射或超声波清洗浴。尽管本申请讨论了从一个涂层到另一个涂层的表面过渡的示例，但是可以根据其他示例性实施例提供额外的过渡(例如，可以使用三种或更多种颜色，每种颜色之间的渐变过渡使用类似的如本文所述的掩模和沉积方法)。
在另一个实施方案中，也可以在没有如本文所述的掩模材料的情况下实现渐变外观。例如，考虑第二涂层的梯度定位在第一涂层上，而不必在沉积第一涂层之后从真空室移除卫生器具。如图6所示，在沉积第一涂层之后，卫生器具600保留在真空室中，并且部分地覆盖有护罩602，使得第一部分604完全暴露于真空环境以沉积第二涂层。第一部分604(即，在a线下方)将经历用第二涂层的基本完全(即，约100％)的覆盖。在完成第一部分604的涂覆之后，护罩602逐渐且连续地向上移动，直到一定量的第二涂层沿着卫生器具600到达预定位置b。在a和b之间的卫生器具部分表示过渡区域606(例如，也参见图 1)，其中从第二涂层到第一涂层逐渐过渡。位置b'表示沿着卫生器具可以移动的最大高度，护罩602可移动到该卫生器具，并且沿着与包括用第一涂层基本完全(即约100％)覆盖的卫生器具的部分608相同的水平面。换句话说，在位置b之上(且因此b')，卫生器具基本上不包括(即，约0％)第二涂层的覆盖 (并且第一涂层的覆盖率约为100％)。护罩可以以恒定或变化的线速度移动，其移动速率取决于所需的渐变外观图案。在一些示例性实施例中，卫生器具可在沉积期间在真空室内旋转。
在又一个实施方案中，也可以在没有如本文所述的掩模材料的情况下实现渐变外观。例如，可以考虑使用单个连续PVD工艺来应用渐变外观，其中随着护罩逐渐移过卫生器具的维度，包括第一涂层的第一材料流逐渐过渡到包括第二涂层的第二材料流。非常类似于图6的实施例，护罩可以以恒定或变化的线速度移动，其中移位速率取决于所需的渐变外观图案。在一些示例性实施例中，卫生器具可在沉积期间在真空室内旋转。
图7示出了单个连续PVD工艺的一个示例性实施例，其中卫生器具700放置在PVD腔室内并且覆盖708以仅暴露卫生器具700的第一部分702，其中期望基本上完全覆盖第一涂层。包含第一涂层的第一材料流进入腔室，并且用第一涂层涂覆暴露的第一部分702(即，约100％)。在完成第一部分702的涂覆后，第一部分702被遮盖，同时，第一流动逐渐减小，而包括第二涂层的第二材料流逐渐增加。即，作为过渡段并且与第一部分702相邻定位的第二部分704 暴露于第一和第二双重流。例如，第二部分704可以被划分为预定数量的区域，每个后续区域逐渐远离第一部分702定位(例如，与第一部分702相邻的第一区域704a，与第一区域704a相邻且被第一区域704a与第一区域702隔开的第二区域704b，第三区域与第二区域相邻，并且被第一区域和第二区域与第一部分分开等)。在第二部分704的涂覆过程中，仅第二部分704的第一区域704a 暴露于双重流，其将主要包括第一材料和少量的第二材料。在涂覆第一区域704a 之后，如在第一区域704a中那样，第一区域704a被遮盖并且第二区域704b暴露于双重流，这次具有减少量的第一材料和增加量的第二材料。该过程继续，直到第二部分704的最后区域704n经历双重流，该双重流主要包括第二材料和少量的第一材料。在第二部分704(即，过渡段)完成之后，第一部分702和第二部分704都被遮盖，并且卫生器具的第三部分706(其中期望基本上完全覆盖第二涂层)被暴露于包含第二涂层的第二材料流，以用第二涂层实现基本上完全覆盖(即，约100％)。
本公开描述了一种用于形成多色饰面的新方法。本文所述的制造方法的益处包括形成具有过渡区域(从第一外观涂层到第二外观涂层)的双涂层渐变外观，而没有任何明显的浑浊或漫射饰面变形或过渡区域缺陷。此外，在形成第一和第二涂层中使用PVD沉积使得在几乎任何所需纯度下的坚固持久的饰面，以实现卫生器具的预定美学标准。
如本文所使用的，术语“大约”、“约”，“基本上”和类似的术语旨在具有广泛的含义，以与本公开的主题涉及领域的普通技术人员共同和公认的用法相协调。本领域技术人员应当理解，本发明人认为这些术语旨在允许描述和要求保护的某些特征而不将这些特征的范围限制于所提供的精确数值范围。因此，这些术语应被解释为表明所描述和要求保护的主题的非实质性或不重要的修改或变更被认为是在所附权利要求中所述的本发明的范围内。
这里对元件位置的引用(例如，“顶部”、“底部”、“上方”、“下方”等)仅用于描述附图中各种元件的方向。应当注意，根据其他示例性实施例，各种元件的取向可以不同，并且这些变形旨在被本公开所涵盖。
如示例性实施例中所示的用于卫生器具的多色饰面的元件的构造和布置及其制造方法仅是说明性的。尽管仅详细描述了本公开的一些实施例，但是阅读本公开的本领域技术人员将容易理解，可以进行许多修改(例如，各种元件的尺寸、规格、结构、形状和比例的变化、参数值、安装布置、材料的使用、颜色、取向等)，而实质上不脱离所述主题的新的教导和优点。例如，示出为整体形成的元件可以由多个部件或元件构成，元件的位置可以颠倒或以其他方式变化，并且可以改变或更改分立元件或位置的性质或数量。
另外，词语“示例性”用于表示用作示例、实例或说明。本文中描述为“示例性”的任何实施例或设计不必被解释为比其它实施例或设计更优选或更具优势(并且这样的术语并不旨在意味着这些实施例必然是非凡的或最高级的示例)。相反，使用词语“示例性”旨在以具体方式呈现概念。因此，所有这些修改旨在包括在本公开的范围内。在不脱离所附权利要求的范围的情况下，可以在优选和其他示例性实施例的设计、操作条件和布置中进行其他替换、修改、改变和省略。
在不脱离本发明的范围的情况下，还可以在各种示例性实施例的设计、操作条件和布置中进行其他替换、修改、改变和省略。例如，在一个实施例中公开的任何元件可以与本文公开的任何其他实施例结合或共同使用。而且，例如，根据替代实施例，可以改变或重新排序任何过程或方法步骤的顺序或序列。任何装置加功能条款旨在覆盖此处描述的执行所述功能的结构，并且不仅包括结构等同物而且包括等同结构。在不脱离所附权利要求的范围的情况下，可以在优选和其他示例性实施例的设计、操作配置和布置中进行其他替换、修改、改变和省略。
尽管本说明书包含许多具体的示例性实施例细节，但这些不应被解释为对任何发明或可要求保护的范围的限制，而是作为特定于特定发明的特定实施例的特征的描述。在单独实施例的上下文中在本说明书中描述的某些特征也可以在单个实施例中组合实现。相反，在单个实施例的上下文中描述的各种特征也可以单独地或以任何合适的子组合在多个实施例中实现。此外，尽管上面的特征可以描述为以某些组合起作用并且甚至最初如此声明，但是在某些情况下可以从组合中剔除来自所要求保护的组合的一个或多个特征，并且所要求保护的组合可以针对子组合，或子组合的变形。
类似地，虽然在附图中以特定顺序描述了操作，但是这不应该被理解为要求以所示的特定顺序或按连续顺序执行这样的操作，或者执行所有示出的操作，以实现期望的结果。在某些情况下，多任务处理和并行处理可能是有利的。此外，上述实施例中的各种系统组件的分离不应被理解为在所有实施例中都需要这种分离，并且应该理解，所描述的程序组件和系统通常可以集成在单个软件产品中或打包成多种软件产品。
因此，已经描述了本主题的特定实施例。在一些情况下，本文所述的活动可以以不同的顺序执行并且仍然实现期望的结果。另外，附图中描绘的过程不一定需要按所示的特定顺序或连续顺序来实现期望的结果。在某些示例性实施例中，多任务和并行处理可能是有利的。
Claims (1)
1.一种卫生器具，其特征在于，所述卫生器具包括：
第一部分；
第二部分；以及
布置在所述第一部分和所述第二部分之间的过渡区域，
其中第一涂层在所述卫生器具的第一部分上，并且掩模材料在所述卫生器具的第二部分上；或者
第一涂层在所述卫生器具的第一部分上，并且第二涂层在所述卫生器具的第二部分上，
其中所述第一涂层的厚度在100nm至2000nm的范围内变化，所述掩模材料的厚度在10μm至100μm的范围内，所述第二涂层的厚度在100nm至2000nm的范围内变化。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862614385P | 2018-01-06 | 2018-01-06 | |
| US62/614,385 | 2018-01-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214211176U true CN214211176U (zh) | 2021-09-17 |
Family
ID=64959245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920020034.5U Active CN214211176U (zh) | 2018-01-06 | 2019-01-07 | 卫生器具 |
Country Status (3)
| Country | Link |
|---|---|
| US (3) | US11065642B2 (zh) |
| EP (1) | EP3508612B1 (zh) |
| CN (1) | CN214211176U (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110521304B (zh) * | 2019-09-02 | 2022-09-06 | 中机智能装备创新研究院(宁波)有限公司 | 一种具有梯度耐磨涂层的刀具及其制备方法和旋耕机 |
| CN114250436B (zh) * | 2020-09-25 | 2024-03-29 | 中微半导体设备(上海)股份有限公司 | 耐腐蚀涂层制备方法、半导体零部件和等离子体反应装置 |
| DE202020107410U1 (de) * | 2020-12-18 | 2022-03-21 | Liebherr-Aerospace Lindenberg Gmbh | Metallisches Bauteil |
| DE102021106078A1 (de) * | 2021-03-12 | 2022-09-15 | Grohe Ag | Sanitärkomponente mit einer Beschichtung und Verfahren zum Beschichten einer Sanitärkomponente |
| US12508834B2 (en) | 2021-05-25 | 2025-12-30 | Lacks Enterprises, Inc. | Multi-colored decorative component and method |
| CN119016312B (zh) * | 2024-10-29 | 2025-02-11 | 连云港东睦新材料有限公司 | 一种活塞杆表面金属涂层喷涂加工工艺 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474008A (en) | 1966-05-25 | 1969-10-21 | Standard Screw | Method of surface finishing a metallic part |
| US3707445A (en) | 1971-04-29 | 1972-12-26 | Modern Metallics Inc | Method of producing a decorative finish on metal objects |
| FR2375398A1 (fr) | 1976-12-23 | 1978-07-21 | Denis Eviers | Procede de fabrication d'eviers en acier inoxydable avec cuves ou paillasses colorees et les eviers obtenus |
| CH664377A5 (de) | 1986-01-16 | 1988-02-29 | Balzers Hochvakuum | Dekorative schwarze verschleissschutzschicht. |
| US4988424A (en) * | 1989-06-07 | 1991-01-29 | Ppg Industries, Inc. | Mask and method for making gradient sputtered coatings |
| JPH03240942A (ja) | 1990-02-15 | 1991-10-28 | Inax Corp | 水栓器具の表面処理方法 |
| US5443032A (en) * | 1992-06-08 | 1995-08-22 | Air Products And Chemicals, Inc. | Method for the manufacture of large single crystals |
| JPH06139845A (ja) * | 1992-10-27 | 1994-05-20 | Matsushita Electric Ind Co Ltd | パターン化した透明導電膜の形成方法 |
| US6410086B1 (en) | 1999-11-26 | 2002-06-25 | Cerel (Ceramic Technologies) Ltd. | Method for forming high performance surface coatings and compositions of same |
| US6737148B1 (en) | 1999-12-02 | 2004-05-18 | Walls Across Texas, Inc. | Camouflaged perforated panel and method of forming |
| KR100599640B1 (ko) | 2001-12-28 | 2006-07-12 | 시티즌 도케이 가부시키가이샤 | 백색 피막을 갖는 장신구 및 그 제조 방법 |
| US6803133B2 (en) * | 2002-11-27 | 2004-10-12 | Vapor Technologies, Inc. | Coated article |
| US20070026205A1 (en) * | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
| WO2008078078A1 (en) * | 2006-12-22 | 2008-07-03 | Colormatrix Holdings, Inc. | Polymer compositions and aricles having improved reheat characteristics |
| ITMI20072038A1 (it) | 2007-10-19 | 2009-04-20 | Daniel Rubinetterie S P A | Procedimento per la decorazione di oggetti metallici, in particolare elementi di rubinetteria |
| WO2015102830A1 (en) * | 2013-12-30 | 2015-07-09 | Dow Global Technologies Llc | Processes for using flux agents to form polycrystalline group iii-group v compounds from single source organometallic precursors |
-
2018
- 2018-12-21 US US16/230,546 patent/US11065642B2/en active Active
-
2019
- 2019-01-03 EP EP19150244.2A patent/EP3508612B1/en active Active
- 2019-01-07 CN CN201920020034.5U patent/CN214211176U/zh active Active
-
2021
- 2021-07-19 US US17/379,406 patent/US12018398B2/en active Active
-
2024
- 2024-06-24 US US18/752,338 patent/US12366006B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3508612A1 (en) | 2019-07-10 |
| US12366006B2 (en) | 2025-07-22 |
| US12018398B2 (en) | 2024-06-25 |
| US20190210062A1 (en) | 2019-07-11 |
| US20240344225A1 (en) | 2024-10-17 |
| US20210346910A1 (en) | 2021-11-11 |
| US11065642B2 (en) | 2021-07-20 |
| EP3508612B1 (en) | 2022-07-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN214211176U (zh) | 卫生器具 | |
| JP7507766B2 (ja) | 耐食性カーボンコーティング | |
| CN104451549B (zh) | 金属工件及金属工件的外表面喷涂加工方法 | |
| EP2463031B1 (en) | Method of preparing sandwich composite coating on engineering plastic surface | |
| US20020102416A1 (en) | Corrosion resistant coating giving polished effect | |
| CN103953772B (zh) | 碳化钨氮化铬复合涂层的超硬耐磨阀门 | |
| CN208415414U (zh) | 一种具有纳米涂层的不锈钢水槽 | |
| CN102443763A (zh) | 具有抗指纹涂层的被覆件及其制备方法 | |
| TW201641742A (zh) | 用來清潔沉積設備的方法 | |
| US20120308810A1 (en) | Coated article and method for making the same | |
| CN116657095A (zh) | 一种防变色炊具的制备方法及其制得的防变色炊具 | |
| US20120077009A1 (en) | Coating, article coated with coating, and method for manufacturing article | |
| JP4999264B2 (ja) | 薄膜製造装置及びその製造方法 | |
| KR20140126567A (ko) | 금속계 소재의 도장방법 | |
| CN109097736A (zh) | 表面带有镀层的贵金属制品及其制备方法 | |
| CN104647854B (zh) | 一种可以代替电镀的材料表面装饰防护层及其制备方法 | |
| CN100510157C (zh) | 塑料基材上镀覆金属膜的物理镀膜前处理方法 | |
| CN208440686U (zh) | 表面带有镀层的贵金属制品 | |
| Vergason et al. | PVD chromium coatings replacing decorative chromium electroplated coatings on plastics | |
| CN104775094A (zh) | 塑料制品表面镀金属方法 | |
| EP2574686A1 (en) | Stainless steel and silver colored PVD coatings | |
| CN101457358A (zh) | 基底上的金属涂层 | |
| Munz et al. | TiAlN based PVD coatings tailored for dry cutting operations | |
| EP0757114A1 (fr) | Revêtement en matériau quasi-cristallin et son procédé de dépÔt | |
| JP6318430B2 (ja) | 複合硬質皮膜部材及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |