CN203909771U - Touch substrate - Google Patents
Touch substrate Download PDFInfo
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- CN203909771U CN203909771U CN201420287604.4U CN201420287604U CN203909771U CN 203909771 U CN203909771 U CN 203909771U CN 201420287604 U CN201420287604 U CN 201420287604U CN 203909771 U CN203909771 U CN 203909771U
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- axial
- touch
- photosensitive resin
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- resin layer
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Abstract
A touch substrate comprises a transparent substrate body, a transparent conductive photosensitive resin layer, multiple second axial wires and multiple insulating blocks. The transparent conductive photosensitive resin layer comprises a solidified transparent photosensitive resin matrix and nano conductive wires embedded in the solidified transparent photosensitive resin matrix. The nano conductive wires are connected in a staggered mode to form conductive grids to achieve conduction. The transparent conductive photosensitive resin layer is patterned to form multiple first axial touch electrodes and multiple axial second conductive units. The second axial conductive units are connected through the second axial wires, and first axial wires and the second axial wires are insulated from each other through the insulating blocks. The first axial touch electrodes and the second axial conductive units are formed in the mode that the transparent photosensitive resin matrix is filled with the nano conductive wires, so that resistivity is relatively low compared with an ITO conductive layer, and conductivity is good.
Description
Technical field
The utility model relates to touch technology field, particularly relates to a kind of touch base plate.
Background technology
Touch-screen is the inductive arrangement that can receive the input signals such as touch.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photoelectricity industry is a dark horse.
At present, ITO conductive layer is vital ingredient in touch-screen module.Although the develop rapidly at a tremendous pace of the manufacturing technology of touch-screen.But taking projecting type capacitor screen as example, there is not too large change in the basic manufacturing process of ITO layer in recent years.Always inevitably need ITO plated film, ITO is graphical.
But the resistivity of ITO conductive layer is larger, cause its electric conductivity poor, limit its application on the larger equipment of pad, AIO (All in one), Notebook equidimension.
Utility model content
Based on this, be necessary the problem poor for electric conductivity, provide a kind of electric conductivity good touch base plate.
A kind of touch base plate, comprising:
Transparent substrates;
Electrically conducting transparent photosensitive resin layer, be arranged at the surface of described transparent substrates, described electrically conducting transparent photosensitive resin layer comprises curing transparent feel photopolymer resin matrix and is filled in the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, described electrically conducting transparent photosensitive resin layer is patterned and forms the multiple first axial touch-control electrode and multiple the second axial conduction unit, the described first axial touch-control electrode comprises multiple the first axial conduction unit of arranging along the first axially spaced-apart and multiple the first axial lead of arranging along the first axially spaced-apart, described in each, the two ends of the first axial lead connect respectively along the first axially spaced-apart arrangement and adjacent two described the first axial conduction unit, multiple described the second axial conduction unit intervals are arranged, adjacent two described the second axial conduction unit of arranging along the second axially spaced-apart lay respectively at the described first axial touch-control electrode both sides,
Multiple the second axial leads, described in each, the second axial lead connects along the second axially spaced-apart arrangement and two adjacent described the second axial conduction unit; And
Multiple collets, described in each, collets are arranged between described the first axial lead and described the second axial lead, so that described the first axial lead and the axial mutual insulating of described the second axial lead;
Wherein, multiple described the second axial conduction unit and described the second axial lead form the second axial touch-control electrode.
In an embodiment, described the second axial lead is less than described collets along the first axial width along the first axial width therein.
In an embodiment, the described first axial touch-control electrode and the described second axial touch-control electrode are orthogonal therein.
In an embodiment, the thickness range of described transparent substrates is 0.02mm～0.5mm therein.
In an embodiment, the thickness range of described transparent substrates is 0.05mm～0.2mm therein.
In an embodiment, the thickness range of described electrically conducting transparent photosensitive resin layer is 0.05 μ m～10 μ m therein.
In an embodiment, the thickness range of described electrically conducting transparent photosensitive resin layer is 0.08 μ m～2 μ m therein.
In an embodiment, the diameter range of described electrical-conductive nanometer silk thread is 10nm～1000nm therein, and the length range of described electrical-conductive nanometer silk thread is 20nm～50 μ m, and the square Standard resistance range of described electrically conducting transparent photosensitive resin layer is 0.1 Ω/～200 Ω/.
In an embodiment, the square Standard resistance range of described electrically conducting transparent photosensitive resin layer is 10 Ω/～100 Ω/ therein.
Above-mentioned touch base plate at least comprises following advantage:
In above-mentioned touch base plate, electrically conducting transparent photosensitive resin layer comprises curing transparent feel photopolymer resin matrix and is filled in the electrical-conductive nanometer silk thread in curing transparent feel photopolymer resin matrix, electrical-conductive nanometer silk thread is cross-linked to form conductive grid and realizes conduction, its electric conductivity has lower resistivity with respect to ITO conductive layer, and electric conductivity is better.Owing to adopting transparent feel photopolymer resin matrix, can carry out patterning by exposure-developing process easily, without the process of the required coating of conventional lithography process and stripping photoresist, technique is simpler simultaneously, and efficiency is higher.
Conductive grid is cross-linked to form by electrical-conductive nanometer silk thread, and electrical-conductive nanometer silk thread is filled in curing transparent feel photopolymer resin matrix, thus make above-mentioned to conductive grid can avoid preferably scratch, be not easy damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make the above-mentioned first axial touch-control electrode and the second axial conduction unit be not easy oxidized.And electrical-conductive nanometer silk thread with respect to ITO more cheaply, softer, thereby make above-mentioned touch base plate there is good bending resistance folding endurance.In addition, the conductive grid that electrical-conductive nanometer silk thread is cross-linked to form, taking transparent feel photopolymer resin matrix as carrier, in the time of the above-mentioned touch base plate of preparation, directly can obtain by exposure imaging, without coating required in existing photoetching process and the process of stripping photoresist, can simplify technique.
Brief description of the drawings
Fig. 1 is the structural representation of touch base plate in an embodiment;
Fig. 2 is the structural representation at another visual angle of touch base plate shown in Fig. 1;
Fig. 3 is the schematic diagram of electrical-conductive nanometer silk thread in Fig. 1;
Fig. 4 is the partial schematic diagram of touch base plate shown in Fig. 1;
Fig. 5 is the preparation flow figure of touch base plate in an embodiment.
Embodiment
For above-mentioned purpose of the present utility model, feature and advantage can be become apparent more, below in conjunction with accompanying drawing, embodiment of the present utility model is described in detail.A lot of details are set forth in the following description so that fully understand the utility model.But the utility model can be implemented to be much different from alternate manner described here, and those skilled in the art can do similar improvement without prejudice to the utility model intension in the situation that, and therefore the utility model is not subject to the restriction of following public concrete enforcement.
Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement just for illustrative purposes, do not represent it is unique embodiment.
Unless otherwise defined, all technology that use are herein identical with the implication that belongs to the common understanding of those skilled in the art of the present utility model with scientific terminology.The term using in instructions of the present utility model herein, just in order to describe the object of specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
Refer to Fig. 1 to Fig. 4, the touch base plate 10 in an embodiment comprises transparent substrates 100, electrically conducting transparent photosensitive resin layer 200, multiple the second axial lead 300 and multiple collets 400.Two-dimensional coordinate system is set up as reference field in surface taking transparent substrates 100, and first is axially along Y direction, and second is axially along X-direction.
The material of transparent substrates 100 can be glass, polymethylmethacrylate (Poly methyl Methacrylate, PMMA), polycarbonate (Polycarbonate, PC), polyethylene terephthalate (polyethylene terephthalate, PET), cyclic olefine copolymer (COC) or cyclic olefin polymer (COP).The thickness range of transparent substrates 100 can be 0.02mm～0.05mm.Further, in the present embodiment, considering after the processing complexity of transparent substrates 100 and the integral thickness of touch base plate 10, the thickness of transparent substrates 100 is preferably 0.05mm～0.2mm.
Refer to Fig. 3, electrically conducting transparent photosensitive resin layer 200 is arranged at the surface of transparent substrates 100.Electrically conducting transparent photosensitive resin layer 200 comprises curing transparent feel photopolymer resin matrix and is filled in the electrical-conductive nanometer silk thread 200a in curing transparent feel photopolymer resin matrix.Electrical-conductive nanometer silk thread 200a is cross-linked to form conductive grid.In present embodiment, the thickness range of electrically conducting transparent photosensitive resin layer 200 can be 0.05 μ m～10 μ m.Consider that when can adhesion between electrically conducting transparent photosensitive resin layer 200 and transparent substrates 100 and electrical-conductive nanometer silk thread 200a be filled in curing transparent feel photopolymer resin matrix preferably, the thickness of electrically conducting transparent photosensitive resin layer 200 is preferably 0.08 μ m～2 μ m.
The diameter range of electrical-conductive nanometer silk thread 200a can be 10nm～1000nm, and the length range of electrical-conductive nanometer silk thread 200a can be 20nm～50 μ m, and the diameter of electrical-conductive nanometer silk thread 200a is less than the visual width of human body naked eyes, thereby ensures visually-clear.Electrical-conductive nanometer silk thread 200a can be easy to prepare and have for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. the conductive thread of better electric conductivity.
The square Standard resistance range of electrically conducting transparent photosensitive resin layer 200 can be 0.1 Ω/～200 Ω/.There is better electric conductivity compared to ITO conductive layer, be more suitable for for making as panel computer (pad), all-in-one (All in one, AIO), touch-control product that notebook (Notebook) equidimension is larger.
The electric conductivity of electrically conducting transparent photosensitive resin layer 200 is relevant to diameter and the electrical-conductive nanometer silk thread 200a distribution density of electrical-conductive nanometer silk thread 200a, and diameter is larger, and distribution density is larger, and electric conductivity is better, and sheet resistance is lower.But the diameter of electrical-conductive nanometer silk thread 200a is larger, distribution density is larger, the transmitance of electrically conducting transparent photosensitive resin layer 200 is lower.Therefore,, in order to ensure the balance of transmitance and electric conductivity, in the present embodiment, the sheet resistance of electrically conducting transparent photosensitive resin layer 200 is preferably 10 Ω/～100 Ω/.
Refer to Fig. 1, Fig. 2 and Fig. 4, electrically conducting transparent photosensitive resin layer 200 forms the multiple first axial touch-control electrode 210 and multiple the second axial conduction unit 220 after graphical.The first axial touch-control electrode 210 comprises multiple the first axial conduction unit 211 of arranging along the first axially spaced-apart and multiple the first axial lead 212 of arranging along the first axially spaced-apart.The two ends of each the first axial lead 212 connect respectively along the first axially spaced-apart arranges and two adjacent the first axial conduction unit 211, realizes the electric conductivity of the first axial touch-control electrode 210.In present embodiment, the first axial conduction unit 211 can be rhombus, and the first axial lead 212 can be rectangle.Certainly,, in other embodiment, the first axial conduction unit 211 also can triangle, square or rectangle etc.
Multiple the second axial conduction unit 220 are spaced, and adjacent two second axial unit 200 of arranging along the second axially spaced-apart lay respectively at the first axial touch-control electrode 210 both sides.Each second axial lead 300 connects along the second axially spaced-apart to be arranged and adjacent two the second axial conduction unit 220.The material of the second axial lead 300 can be metal or electrically conducting transparent macromolecule.Can be for example Mo-Al-Mo or PEDOT etc., PEDOT be the polymkeric substance of EDOT (3,4-ethylene dioxythiophene monomer).Multiple the second axial conduction unit 220 and the second corresponding axial lead 300 form the second axial touch-control electrode.Particularly, the first axial touch-control electrode 210 and the second axial touch-control electrode are orthogonal.
Refer to Fig. 4, each collets 400 is arranged between the first axial lead 212 and the second axial lead 300, so that the first axial lead 212 and the second axial lead 300 mutual insulatings, thereby ensure mutually insulated between the first axial touch-control electrode 210 and the second axial touch-control electrode.Wherein, the second axial lead 300 is less than collets 400 along the first axial width b along the first axial width a, can further ensure mutually insulated between the first axial lead 212 and the second axial lead 300.Collets 400 are greater than the first axial lead 212 along the second axial width along the second axial width.Certainly,, in other embodiment, can also equal collets along the first axial width along the first axial width by the second axial lead.The material of collets 400 can be silicon dioxide or transparent resin, can certainly be other transparent insulating material.
Above-mentioned touch base plate 10 at least comprises following advantage:
In above-mentioned touch base plate 10, electrically conducting transparent photosensitive resin layer 200 comprises curing transparent feel photopolymer resin matrix and is filled in the electrical-conductive nanometer silk thread 200a in curing transparent feel photopolymer resin matrix, electrical-conductive nanometer silk thread 200a is cross-linked to form conductive grid and realizes conduction, its electric conductivity has lower resistivity with respect to ITO conductive layer, and electric conductivity is better.Owing to adopting transparent feel photopolymer resin matrix, can carry out patterning by exposure-developing process easily, without the process of the required coating of conventional lithography process and stripping photoresist, technique is simpler simultaneously, and efficiency is higher.
Conductive grid is cross-linked to form by electrical-conductive nanometer silk thread 200a, and electrical-conductive nanometer silk thread 200a is filled in curing transparent feel photopolymer resin matrix, thus make above-mentioned to conductive grid can avoid preferably scratch, be not easy damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make the above-mentioned first axial touch-control electrode 210 and the second axial conduction unit 220 be not easy oxidized.And electrical-conductive nanometer silk thread 200a with respect to ITO more cheaply, softer, thereby make above-mentioned touch base plate 10 there is good bending resistance folding endurance.
Referring to Fig. 5, is the preparation method of touch base plate in an embodiment, specifically comprises the following steps:
Step S110, provides transparent conductive body.Transparent conductive body comprises transparent substrates and is arranged at the electrically conducting transparent photosensitive resin layer of the semi-solid preparation on transparent substrates surface.The electrically conducting transparent photosensitive resin layer of semi-solid preparation comprises the transparent feel photopolymer resin matrix of semi-solid preparation and is filled in electrical-conductive nanometer silk thread in the transparent feel photopolymer resin matrix of semi-solid preparation, and electrical-conductive nanometer silk thread is cross-linked to form conductive grid.
In present embodiment, the preparation method of transparent conductive body specifically comprises the following steps:
Transparent feel photopolymer resin matrix, electrical-conductive nanometer silk thread and the transparent substrates of flow-like are provided.In the present embodiment, the transparent feel photopolymer resin matrix of described flow-like is negative photoresist, specifically comprise each component of following parts by weight: 30～50 parts of film-forming resins, 1～10 part of emulsion, 10～40 parts of organic solvents, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent and 0.1～5 part of defoamer, the umber of each component and be 100.
Film-forming resin is at least one in polymethylmethacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ether and M Cr.Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, fragrant salt compounded of iodine and ferrocene salt.Organic solvent is tetrahydrofuran, methyl ethyl ketone, cyclohexanone, propylene glycol, N, dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1, at least one in 6-hexanediol methoxyl mono acrylic ester and ethoxylation neopentyl glycol methoxyl mono acrylic ester.Stabilizing agent is at least one in p-dihydroxy-benzene, p methoxy phenol, 1,4-benzoquinone, 2,6 one di-t-butyl cresols, phenothiazine and anthraquinone.Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral.Defoamer is at least one in phosphate, fatty acid ester and organosilicon.
The diameter range of electrical-conductive nanometer silk thread is 10nm～1000nm.The length range of electrical-conductive nanometer silk thread is 20nm～50 μ m.The material of transparent substrates can be glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer.The thickness range of transparent substrates can be 0.02mm～0.5mm.Preferably, the thickness range of transparent substrates is 0.05mm～0.2mm.
By electrical-conductive nanometer silk thread uniform filling, in the transparent feel photopolymer resin matrix of flow-like, electrical-conductive nanometer silk thread is cross-linked to form conductive grid, obtains electrically conducting transparent photosensitive resin.
Electrically conducting transparent photosensitive resin is coated in a side of transparent substrates, and makes transparent feel photopolymer resin matrix semi-solid preparation through solidifying processing, thereby obtain transparent conductive body.It is to be noted, transparent feel photopolymer resin matrix has photosensitive property in the time of fluid state or semi-cured state, thereby can it is exposed-development operation make its patterning, and when transparent feel photopolymer resin matrix is during in complete solid state, or else it does not have photosensitive property.
Step S120, carries out graphical treatment to the electrically conducting transparent photosensitive resin layer of semi-solid preparation: to the electrically conducting transparent photosensitive resin layer exposure of semi-solid preparation, and the electrically conducting transparent photosensitive resin layer of the semi-solid preparation after overexposure is developed.Form the multiple first axial touch-control electrode and multiple the second axial conduction unit, the first axial touch-control electrode comprises multiple the first axial conduction unit of arranging along the first axially spaced-apart and multiple the first axial lead of arranging along the first axially spaced-apart, and the two ends of each the first axial lead connect respectively along the first axially spaced-apart arranges and two adjacent the first axial conduction unit.Multiple the second axial conduction unit intervals are arranged, and adjacent two the second axial conduction unit of arranging along the second axially spaced-apart lay respectively at the first axial touch-control electrode both sides.
In present embodiment, in the process of the electrically conducting transparent photosensitive resin layer exposure to semi-solid preparation, the mask plate that exposure adopts is selected according to the shape of the first axial touch-control electrode and the second axial conduction unit.Exposure wavelength is 300nm～400nm, and exposure energy is 50mj/cm
2～500mj/cm
2.In the process that the curing electrically conducting transparent photosensitive resin layer of plate after overexposure is developed, adopt the weak base salt solution that massfraction is 0.5%～5% to develop, for example, can select sodium carbonate, sal tartari or sodium bicarbonate etc.
Step S130, solidifies the multiple first axial touch-control electrode and multiple the second axial conduction unit, to form curing electrically conducting transparent photosensitive resin layer.In present embodiment, can adopt the curing mode of heat curing or UV:
While adopting heat curing mode to solidify, the temperature of heat curing is 80 DEG C～150 DEG C, admittedly the roasting time is 10min～60min.While adopting UV curing mode to solidify, it is 200mj/cm that UV solidifies energy
2～2000mj/cm
2.
Step S140, arranges collets in the surface of transparent substrates dorsad at the first axial lead.The object that collets are set is in order to make the first axial lead and the second axial lead mutually insulated, and then ensures the first axial touch-control electrode and the second axial touch-control electrode mutually insulated.In present embodiment, comprise the following steps:
The surface that electrically conducting transparent photosensitive resin layer is set in transparent substrates applies transparent photomask glue.Photoresist is exposed.Photoresist after exposure is developed, obtain collets.Because the photosensitive resin matrix of the first axial touch-control electrode and the second axial conduction unit is negative photoresist, after overcuring, exposure in the time that collets are set, develop on it without affecting.The material of collets can be silicon dioxide or transparent resin, can certainly be other transparent insulating material.
Step S150, arranges the second axial lead in the surface of the first axial lead dorsad at collets, the second axial lead is connected along the second axially spaced-apart and arrange and two adjacent the second axial conduction unit.In present embodiment, can get off as the mode of PEDOT by inkjet printing electrically conducting transparent macromolecule, form the second axial lead in relevant position.Certainly, can also be by be provided with the plated surface last layer Mo-Al-Mo coat of metal of electrically conducting transparent photosensitive resin layer in transparent substrates, and then obtain the second axial lead of visually-clear through etch process.
The preparation method of above-mentioned touch base plate at least comprises following advantage:
The conductive grid that electrical-conductive nanometer silk thread is cross-linked to form is using transparent feel photopolymer resin matrix as carrier, directly can obtain the first axial touch-control electrode and the second axial conduction unit by exposure imaging, form again collets and the second axial lead can form touch base plate, without coating required in existing photoetching process and the process of stripping photoresist, simplify preparation technology.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (9)
1. a touch base plate, is characterized in that, comprising:
Transparent substrates;
Electrically conducting transparent photosensitive resin layer, be arranged at the surface of described transparent substrates, described electrically conducting transparent photosensitive resin layer comprises curing transparent feel photopolymer resin matrix and is filled in the electrical-conductive nanometer silk thread in described curing transparent feel photopolymer resin matrix, described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, described electrically conducting transparent photosensitive resin layer is patterned and forms the multiple first axial touch-control electrode and multiple the second axial conduction unit, the described first axial touch-control electrode comprises multiple the first axial conduction unit of arranging along the first axially spaced-apart and multiple the first axial lead of arranging along the first axially spaced-apart, described in each, the two ends of the first axial lead connect respectively along the first axially spaced-apart arrangement and adjacent two described the first axial conduction unit, multiple described the second axial conduction unit intervals are arranged, adjacent two described the second axial conduction unit of arranging along the second axially spaced-apart lay respectively at the described first axial touch-control electrode both sides,
Multiple the second axial leads, described in each, the second axial lead connects along the second axially spaced-apart arrangement and two adjacent described the second axial conduction unit; And
Multiple collets, described in each, collets are arranged between described the first axial lead and described the second axial lead, so that described the first axial lead and the axial mutual insulating of described the second axial lead;
Wherein, multiple described the second axial conduction unit and described the second axial lead form the second axial touch-control electrode.
2. touch base plate according to claim 1, is characterized in that, described the second axial lead is less than described collets along the first axial width along the first axial width.
3. touch base plate according to claim 1, is characterized in that, the described first axial touch-control electrode and the described second axial touch-control electrode are orthogonal.
4. touch base plate according to claim 1, is characterized in that, the thickness range of described transparent substrates is 0.02mm～0.5mm.
5. touch base plate according to claim 4, is characterized in that, the thickness range of described transparent substrates is 0.05mm～0.2mm.
6. touch base plate according to claim 1, is characterized in that, the thickness range of described electrically conducting transparent photosensitive resin layer is 0.05 μ m～10 μ m.
7. touch base plate according to claim 6, is characterized in that, the thickness range of described electrically conducting transparent photosensitive resin layer is 0.08 μ m～2 μ m.
8. touch base plate according to claim 1, it is characterized in that, the diameter range of described electrical-conductive nanometer silk thread is 10nm～1000nm, and the length range of described electrical-conductive nanometer silk thread is 20nm～50 μ m, and the square Standard resistance range of described electrically conducting transparent photosensitive resin layer is 0.1 Ω/～200 Ω/.
9. touch base plate according to claim 8, is characterized in that, the square Standard resistance range of described electrically conducting transparent photosensitive resin layer is 10 Ω/～100 Ω/.
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| CN104020889A (en) * | 2014-05-30 | 2014-09-03 | 南昌欧菲光科技有限公司 | Touch substrate and manufacturing method thereof |
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