CN203909751U - touch screen - Google Patents
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- CN203909751U CN203909751U CN201420287657.6U CN201420287657U CN203909751U CN 203909751 U CN203909751 U CN 203909751U CN 201420287657 U CN201420287657 U CN 201420287657U CN 203909751 U CN203909751 U CN 203909751U
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- Position Input By Displaying (AREA)
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Abstract
一种触摸屏，包括：触控基板，包括透明衬底及设于透明衬底一侧的第一导电层；保护基板，包括面板本体及设于面板本体一侧的第二导电层；透明光学胶层，设于触控基板与保护基板具有第二导电层的一侧之间；其中，第一导电层与第二导电层中的至少一者包括基质及嵌入基质中的导电纳米丝线，导电纳米丝线交错连接形成导电网格，基质为固化的透明感光树脂；第一导电层被图案化而形成多条平行间隔排列的第一触控电极；第二导电层被图案化而形成多条平行间隔排列的第二触控电极，且第一触控电极与第二触控电极垂直设置。上述触摸屏具有较好的导电性能。
A touch screen, comprising: a touch substrate, including a transparent substrate and a first conductive layer arranged on one side of the transparent substrate; a protective substrate, including a panel body and a second conductive layer arranged on one side of the panel body; transparent optical glue Layer, arranged between the touch substrate and the side of the protective substrate with the second conductive layer; wherein, at least one of the first conductive layer and the second conductive layer includes a matrix and conductive nanowires embedded in the matrix, and the conductive nanowires The wires are interlaced to form a conductive grid, and the matrix is cured transparent photosensitive resin; the first conductive layer is patterned to form a plurality of first touch electrodes arranged in parallel and spaced; the second conductive layer is patterned to form a plurality of parallel spaced electrodes The second touch electrodes are arranged, and the first touch electrodes and the second touch electrodes are vertically arranged. The above-mentioned touch screen has good electrical conductivity.
Description
Technical field
The utility model relates to touch technology field, particularly relates to a kind of touch-screen.
Background technology
Touch-screen is to receive the inductive arrangement that touches input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of domestic and international information medium circle, has become the Chaoyang new high-tech industry that photoelectricity industry is a dark horse.
Touch-screen comprises touch base plate and is laminated in the panel body on touch base plate.The method for making of traditional touch base plate is generally:
(1) directly in transparent substrates, form conductive layer.Be example with ITO (Indium Tin Oxide, tin indium oxide) conductive layer, need to first carry out ITO plated film, then the ITO layer obtaining is carried out to graphical treatment.Because conductive layer is outside exposed, be easily scratched, and then cause the electric conductivity of conductive layer to reduce.
(2) residuite layer is set in transparent substrates, then adopt the modes such as impression on residuite layer, to form latticed groove, filled conductive material (for example, metal, Graphene etc.) in latticed groove, forms latticed conductive layer again.Because a side of latticed conductive layer is exposed to outside residuite layer, and the easily oxidation by air of a lot of conductive materials (for example, argent).And the oxidized meeting of conductive material causes the electric conductivity of latticed conductive layer to reduce.
Utility model content
Based on this, be necessary to provide a kind of touch-screen with better electric conductivity.
A kind of touch-screen, comprising:
Touch base plate, comprises transparent substrates, is located at the first conductive layer of described transparent substrates one side and is located at described transparent substrates the transparent bonding layer between described the first conductive layer;
Protective substrate, comprises panel body and is located at the second conductive layer of described panel body one side; And
Transparent optical glue-line, is located between the side that described touch base plate and described protective substrate have described the second conductive layer;
Wherein, at least one in described the first conductive layer and described the second conductive layer comprise matrix and embed the electrical-conductive nanometer silk thread in described matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, and described matrix is curing transparent feel photopolymer resin; Described the first conductive layer is patterned and forms the first touch-control electrode that many parallel interval are arranged; Described the second conductive layer is patterned and forms the second touch-control electrode that many parallel interval are arranged, and described the first touch-control electrode is with described second touch-control electrode is vertical arranges.
In an embodiment, the thickness of described transparent substrates is 0.02mm～0.5mm therein, and the thickness of described panel body is 0.1mm～2.5mm.
In an embodiment, the thickness of described transparent substrates is 0.05mm～0.2mm therein, and the thickness of described panel body is 0.3mm～0.7mm.
Therein in an embodiment, described the first conductive layer comprises matrix and embeds the electrical-conductive nanometer silk thread in described matrix, described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, and described matrix is curing transparent feel photopolymer resin, and the thickness of described the first conductive layer is 0.05 μ m～10 μ m.
In an embodiment, the thickness of described the first conductive layer is 0.08 μ m～2 μ m therein.
In an embodiment, the sheet resistance of described the first conductive layer is 0.1 Ω/～500 Ω/ therein.
In an embodiment, the sheet resistance of described the first conductive layer is 50 Ω/～200 Ω/ therein.
In an embodiment, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm therein, and length is 20nm～50 μ m.
In an embodiment, the described electrical-conductive nanometer silk thread of part exposes outside the side of described the first conductive layer away from described transparent substrates therein.
In an embodiment, the thickness of described transparent bonding layer is 0.5 μ m～50 μ m therein.
In an embodiment, also comprise adjustable refractive index layer therein; Described adjustable refractive index layer is located at described touch base plate and has a side of described the first conductive layer, and the refractive index of described adjustable refractive index layer is 1.6～2.8.
In an embodiment, also comprise protective seam therein; A side of described the first conductive layer is located at described touch base plate and has by described protective seam.
In an embodiment, described protective seam is 0.1 μ m～10 μ m away from a side and described first conductive layer of described transparent substrates away from the distance between a side of described transparent substrates therein.
The conductive grid of at least one in above-mentioned the first conductive layer and the second conductive layer is coated by transparent feel photopolymer resin matrix, thereby makes conductive layer can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, above-mentioned conductive layer is not easy oxidized.Therefore, above-mentioned touch-screen has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread of above-mentioned conductive layer realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread is better with respect to ITO pliability, thereby make above-mentioned touch-screen there is good bending resistance folding endurance.In addition, the conductive grid that electrical-conductive nanometer silk thread is cross-linked to form is taking matrix as carrier, and this matrix is solidified and formed by transparent feel photopolymer resin, in the time making conductive layer, directly can obtain by exposure imaging, without the step of extra coating, stripping photoresist, can simplify technique.
Brief description of the drawings
Fig. 1 is the structural representation of the touch-screen of an embodiment;
Fig. 2 is the exploded view of the touch-screen in Fig. 1;
Fig. 3 is the structural representation of the touch base plate in Fig. 1;
Fig. 4 is the first conductive layer in Fig. 3 and the structural representation of transparent bonding layer;
Fig. 5 is the structural representation of the touch base plate in another embodiment;
Fig. 6 is the structural representation of the touch-screen in another embodiment;
Fig. 7 is the process flow diagram of the method for making of the touch base plate of an embodiment;
Fig. 8 is the structural representation that the dry film in an embodiment is not removed diaphragm;
Fig. 9 is that dry film in Fig. 8 is in the constitutional diagram of exposure for the first time;
Figure 10 is that dry film in Fig. 9 is in the constitutional diagram of exposure for the second time;
Figure 11 is the structural representation after the dry film in Figure 10 develops;
Figure 12 is the constitutional diagram after the dry film of another embodiment develops.
Embodiment
Below in conjunction with drawings and the specific embodiments, touch-screen is further detailed.
As shown in Figures 1 and 2, the touch-screen 10 of an embodiment, comprises touch base plate 100, protective substrate 200 and transparent optical glue-line 300.
As shown in Figure 3, touch base plate 100 comprises transparent substrates 110, the first conductive layer 120, transparent bonding layer 130, adjustable refractive index layer 140 and protective seam 150.
The material of transparent substrates 110 can be glass, polymethylmethacrylate, polycarbonate, polyethylene terephthalate, cyclic olefine copolymer or cyclic olefin polymer.The thickness of transparent substrates 110 is 0.02mm～0.5mm.Further, in the present embodiment, considering after the processing complexity of transparent substrates 110 and the integral thickness of touch-screen 10, the thickness of transparent substrates 110 is preferably 0.05mm～0.2mm.
As shown in Fig. 2～4, the first conductive layer 120 is located at transparent substrates 110 1 sides.The first conductive layer 120 comprises matrix 122 and evenly embeds the electrical-conductive nanometer silk thread 124 in matrix 122.These electrical-conductive nanometer silk threads 124 are cross-linked to form conductive grid, make the overall homogeneous conductive of this first conductive layer 120.The first conductive layer 120 is patterned and forms the first touch-control electrode 126 that many parallel interval are arranged.In the present embodiment, the first touch-control electrode 126 is strip.
In the present embodiment, partially conductive nanometer silk thread 124 exposes outside the side of the first conductive layer 120 away from transparent substrates 110.Although partially conductive nanometer silk thread 124 is exposed to outside matrix 122, but the main part of the conductive grid that electrical-conductive nanometer silk thread 124 is cross-linked to form is still coated by matrix 122, therefore, above-mentioned touch base plate 100 has better anti-oxidant and scratch resistance ability with respect to traditional touch base plate.
In the present embodiment, the thickness of the first conductive layer 120 is 0.05 μ m～10 μ m.In the time of the thickness of design the first conductive layer 120, need to consider whether electrical-conductive nanometer silk thread 124 can embed in matrix 122 and the factor such as the integral thickness of touch-screen 10 preferably.After amid all these factors, the thickness of the first conductive layer 120 is preferably 0.08 μ m～2 μ m.
In the present embodiment, the diameter of electrical-conductive nanometer silk thread 124 is 10nm～1000nm, and length is 20nm～50 μ m.Because the diameter of electrical-conductive nanometer silk thread 124 is less than the visual width of human eye, thereby ensure the visually-clear of the second conductive layer 140.Electrical-conductive nanometer silk thread 124 can be easy to prepare and have for gold nanowires line, silver nanoparticle silk thread, Cu nanowire line, aluminium nanometer silk thread, carbon nanometer silk thread etc. the conductive thread of better electric conductivity.
Further, in the present embodiment, the sheet resistance of the first conductive layer 120 is 0.1 Ω/～500 Ω/, there is better electric conductivity compared to ITO conductive layer, be more suitable for for making as panel computer (pad), all-in-one (All in one, AIO), the larger touch-control product of notebook (Note Book) equidimension.
The electric conductivity of the first conductive layer 120 is relevant to diameter and electrical-conductive nanometer silk thread 124 distribution densities of electrical-conductive nanometer silk thread 124, and diameter is larger, and distribution density is larger, and electric conductivity is better, and sheet resistance is lower.But the diameter of electrical-conductive nanometer silk thread 124 is larger, distribution density is larger, the transmitance of conductive layer is lower.Therefore,, in order to ensure the balance of transmitance and electric conductivity, the sheet resistance of the first conductive layer 120 is preferably 50 Ω/～200 Ω/.
Transparent bonding layer 130 is located between transparent substrates 110 and the first conductive layer 120, thereby the first conductive layer 120 can be attached in transparent substrates 110 preferably.In the present embodiment, the thickness of transparent bonding layer 130 is 0.5 μ m～50 μ m.In the present embodiment, the thickness of transparent bonding layer 130 is greater than the thickness of the first conductive layer 120.
Further, in the present embodiment, the material of transparent bonding layer 130 is identical with the material of matrix 122, is curing transparent feel photopolymer resin, thereby is convenient to the first conductive layer 120 and transparent bonding layer 130 be carried out to patterning simultaneously.
Because being patterned, the first conductive layer 120 forms, make the first conductive layer 120 discontinuous, the part retaining forms the drafting department of touch base plate 100, removed part forms the background portion of touch base plate 100, drafting department from background portion because material is different, there is difference in reflectivity, particularly, in the time there is larger difference in height in drafting department and background portion, when light is radiated on touch base plate 100, pattern on touch base plate 100 is easily seen by user, and then is affected the visual effect of touch base plate 100.
In the present embodiment, by being set, adjustable refractive index layer 140 solves the problems referred to above.The refractive index of adjustable refractive index layer 140 is 1.6～2.8, is located on the first conductive layer 120, and simultaneously overlay pattern portion and background portion.
Further, in embodiment, the material of adjustable refractive index layer 140 is TiO
2, Nb
2o
5, 1,3,5-triazines-2, the transparent insulation materials such as 4,6-, tri-aminated compoundss.Further, the thickness of adjustable refractive index layer 140 is 20nm～10 μ m.
For prevent the first conductive layer 120 produce and use procedure in by scratch, also away from a side of transparent substrates 110, protective seam 150 is set at the first conductive layer 120, and while overlay pattern portion and background portion.In the present embodiment, the material of protective seam 150 is the insulation materials such as heat reactive resin, ultraviolet-curing resin.Protective seam 150 is 0.1 μ m～10 μ m away from a side and first conductive layer 120 of transparent substrates 110 away from the distance between a side of transparent substrates 110.
Be appreciated that in other embodiments, default adjustable refractive index layer 140 and protective seam 150 simultaneously, also can defaultly penetrate the one in rate regulating course 150 and protective seam 150.Fig. 5 is the situation of default adjustable refractive index layer 140.
Protective substrate 200 comprises panel body 210 and the second conductive layer 220.
The material of panel body 210 can be glass, sapphire, carbonic acid polyester, polyethylene terephthalate or poly-first acrylic acid formicester.The thickness of panel body 210 is 0.1mm～2.5mm.Further, in the present embodiment, the thickness of panel body 210 is preferably 0.3mm～0.7mm.
The second conductive layer 220 is located at panel body 210 1 sides.The second conductive layer 220 is patterned and forms the second touch-control electrode 222 that many parallel interval are arranged.The second touch-control electrode 22 is strip, and the first touch-control electrode 126 and the vertical setting of the second touch-control electrode 222.Work as conductor, for example when finger touch, the first touch-control electrode 126 and the second touch-control electrode 222, because capacitance variations forms touching signals, are respectively used to determine X axis coordinate and the Y-axis coordinate of touch point.
In the present embodiment, the second conductive layer 220 is ITO conductive layer.Be appreciated that in other embodiments, the second conductive layer 220 can be also metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer.The second conductive layer 220 also can have similar structure to the first conductive layer 120, comprise matrix and evenly embed the electrical-conductive nanometer silk thread in this matrix, these electrical-conductive nanometer silk threads are cross-linked to form conductive grid, make the overall homogeneous conductive of this second conductive layer 220.Now, the first conductive layer 120 can be ITO conductive layer, metal grill conductive layer, graphene conductive layer, carbon nanotube conducting layer or conducting polymer conductive layer.Be appreciated that and between the second conductive layer 220 and transparent substrates 110, also can be provided with transparent bonding layer.
Transparent optical glue-line 300 is located at touch base plate 100 and protective substrate 200 has between a side of the second conductive layer 220.In the present embodiment, transparent optical glue-line 300 is located in the side that touch base plate 100 has the first conductive layer 120.As shown in Figure 6, in other embodiments, transparent optical glue-line 300 also can be located in the side of touch base plate 100 away from the first conductive layer 120.
As shown in Figure 7, in the present embodiment, also provide a kind of method for making of touch base plate, comprise the steps:
Step S410, provides transparent substrates.
Step S420; one dry film 500 is provided; as shown in Figure 8; dry film 500 is by the transparent feel photopolymer resin precuring of flow-like and compacting and form; the transparent feel photopolymer resin of dry film 500 is semisolid, and dry film 500 is embedded in electrical-conductive nanometer silk thread and forms conductive layer 520 from the certain thickness scope of a side surface, and the region that dry film 500 does not embed electrical-conductive nanometer silk thread forms transparent bonding layer 510; conductive layer 520 surfaces are provided with diaphragm 540, and transparent bonding layer 510 surfaces are provided with diaphragm 530.
Wherein, semi-solid transparent feel photopolymer resin comprises each component of following parts by weight: 60～80 parts of film-forming resins, 1～10 part of emulsion, 5～20 parts of solvents, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent, 0.1～5 part of defoamer, the umber sum of each component is 100.
Curing transparent feel photopolymer resin comprises each component of following parts by weight: 30～50 parts of film-forming resins, 1～10 part of emulsion, 0.1～5 part of stabilizing agent, 0.1～5 part of levelling agent and 0.1～5 part of defoamer.
Film-forming resin is at least one in polymethylmethacrylate, linear phenolic resin, epoxy resin, crotonic acid, acrylate, vinyl ether and M Cr.Emulsion is at least one in diazobenzene quinone, diazo naphthoquinone ester, polyvinyl cinnamate, poly-Chinese cassia tree fork malonic acid glycol ester polyester, aromatic diazo salt, aromatic sulfonium salts, fragrant salt compounded of iodine and ferrocene salt.Solvent is tetrahydrofuran, methyl ethyl ketone, cyclohexanone, propylene glycol, N, dinethylformamide, ethyl cellosolve acetate, ethyl acetate and butyl acetate, toluene, dimethylbenzene, tripropylene glycol diacrylate, trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, dipentaerythrite six acrylate, 1, at least one in 6-hexanediol methoxyl mono acrylic ester and ethoxylation neopentyl glycol methoxyl mono acrylic ester.Stabilizing agent is at least one in p-dihydroxy-benzene, p methoxy phenol, 1,4-benzoquinone, 2,6 one di-t-butyl cresols, phenothiazine and anthraquinone.Levelling agent is at least one in polyacrylate, acetate butyrate fiber, nitrocellulose and polyvinyl butyral.Defoamer be phosphate, fatty acid ester and organosilyl at least one.
Step S430, as shown in Figure 9, removes the diaphragm 530 on transparent bonding layer 510 surfaces, dry film 500 is fitted in to transparent substrates surface, and transparent bonding layer 510 is directly attached in transparent substrates 110, and conductive layer 520 is away from transparent substrates 110.
Because diaphragm 530 need to remove prior to diaphragm 540, to dry film 500 hot pressing are fitted in transparent substrates 110.Therefore, at design protection film 530 during with diaphragm 540, make viscous force between transparent bonding layer 510 and diaphragm 530 lower than the viscous force between conductive layer 520 and diaphragm 540.
Step S440, carries out patterned process to dry film 500: dry film 500 is exposed successively and developed, form the first touch-control electrode that many parallel interval are arranged.
As shown in Fig. 9-11, in the present embodiment, the transparent feel photopolymer resin that forms this dry film 500 is radical photoinitiator initiator system negative photosensitive resin,, there is chemical polymerization and be insoluble to developer solution in illumination place, but this photosensitive resin when polymerization reaction take place, can produce oxygen inhibition effect in air, therefore needs to adopt double exposure mode to expose to dry film 500.In the time exposing for the first time; conductive layer 520 surfaces of dry film 500 are also provided with diaphragm 540, first do not remove this diaphragm 540, make the dry film 500 isolated air in surface; now because transparent bonding layer 510 has been attached in transparent substrates 110, so also isolated with oxygen.Adopt the mask plate 600 of selecting according to the shape of the first touch-control electrode to expose to dry film 500, make drafting department be produced polyreaction by illumination.Then remove mask plate 600 and be arranged at the diaphragm 540 on dry film 500 surfaces.Directly dry film 500 is exposed for the second time, now, for exposing not by the region of illumination for the first time, surface is owing to contacting with air, because making dry film 500 be exposed to airborne surface reaction, oxygen inhibition effect not exclusively can be developed liquid corrosion, and due to not with air contact, can there is chemical polymerization and not be developed liquid corrosion in the following part in surface.The energy of exposure is larger for the second time, and the region of the following generation in its surface chemical polymerization is thicker.Therefore, can, by regulating exposure energy, can make the part except the first touch-control electrode in conductive layer 520 can be developed the complete corrosion of liquid, can reduce again the difference in height of drafting department and background portion, avoid pattern to be not easy by identification.
As shown in figure 12, in other embodiments, the transparent feel photopolymer resin that forms this dry film 500 is positivity photosensitive resin matrix., illumination place is dissolved in developer solution.Before dry film 500 is exposed, also comprise the step of the diaphragm 540 of removing conductive layer 520 surfaces.Then adopt the mask board to explosure of selecting according to the shape of the first touch-control electrode.Because illumination place is dissolved in developer solution, so will retain the figure of the first touch-control electrode time, should adopt the mask board to explosure with the first touch-control electrode shape complementation.In the present embodiment, can regulate reaction depth by adjusting exposure energy, thereby reduce the drafting department retaining and the difference in height of background portion that is dissolved in developer solution, avoid pattern to be not easy by identification.
In the process that dry film 500 is exposed, exposure wavelength is 300nm～400nm, and exposure energy is 10mJ/cm
2～500mJ/cm
2.In the process that dry film after overexposure is developed, adopt the weak base salt solution that massfraction is 0.1%～10% to develop.Weak base salt can be sal tartari, sodium carbonate etc.
Step S450, solidifies dry film.
Can adopt the curing mode of heat curing or UV: while adopting heat curing mode to solidify, the temperature of heat curing is 80 DEG C～150 DEG C, admittedly the roasting time is 10min～60min.While adopting UV curing mode to solidify, it is 200mJ/cm that UV solidifies energy
2～2000mJ/cm
2.Transparent feel photopolymer resin has photosensitive property in the time of fluid state or semi-cured state, and transparent feel photopolymer resin does not have photosensitive property in the time of solid state.
Conductive layer 520 after solidifying and transparent bonding layer 510 are the first conductive layer and the transparent bonding layer of touch base plate in present embodiment.
In the present embodiment, be also included in a side that touch base plate has the first conductive layer and arrange the step of adjustable refractive index layer, adjustable refractive index layer is overlay pattern portion and background portion simultaneously.
In the present embodiment, be also included in the side that touch base plate has the first conductive layer and form the step of protective seam, protective seam is overlay pattern portion and background portion simultaneously.
Conductive grid in above-mentioned the first conductive layer 120 is coated by transparent feel photopolymer resin matrix, thereby makes above-mentioned the first conductive layer 120 can avoid preferably scratching, and is not easy to damage.Greatly reduce the chance that conductive grid contacts with air simultaneously, make above-mentioned the first conductive layer 120 be not easy oxidized.Therefore, above-mentioned touch-screen 10 has better electric conductivity.And the conductive grid that is cross-linked to form with electrical-conductive nanometer silk thread 124 of above-mentioned the first conductive layer 120 realizes conduction, with respect to ITO conductive layer, it has relatively low resistivity.And electrical-conductive nanometer silk thread 124 is better with respect to ITO pliability, thereby make above-mentioned touch-screen 10 there is good bending resistance folding endurance.In addition, the conductive grid that electrical-conductive nanometer silk thread 124 is cross-linked to form, taking matrix 122 as carrier, in the time making the first conductive layer 120, directly can obtain by exposure imaging, without the step of extra coating, stripping photoresist, can simplify technique.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (13)
1. a touch-screen, is characterized in that, comprising:
Touch base plate, comprises transparent substrates, is located at the first conductive layer of described transparent substrates one side and is located at described transparent substrates the transparent bonding layer between described the first conductive layer;
Protective substrate, comprises panel body and is located at the second conductive layer of described panel body one side; And
Transparent optical glue-line, is located between the side that described touch base plate and described protective substrate have described the second conductive layer;
Wherein, at least one in described the first conductive layer and described the second conductive layer comprise matrix and embed the electrical-conductive nanometer silk thread in described matrix, and described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, and described matrix is curing transparent feel photopolymer resin; Described the first conductive layer is patterned and forms the first touch-control electrode that many parallel interval are arranged; Described the second conductive layer is patterned and forms the second touch-control electrode that many parallel interval are arranged, and described the first touch-control electrode is with described second touch-control electrode is vertical arranges.
2. touch-screen according to claim 1, is characterized in that, the thickness of described transparent substrates is 0.02mm～0.5mm, and the thickness of described panel body is 0.1mm～2.5mm.
3. touch-screen according to claim 2, is characterized in that, the thickness of described transparent substrates is 0.05mm～0.2mm, and the thickness of described panel body is 0.3mm～0.7mm.
4. touch-screen according to claim 1, it is characterized in that, described the first conductive layer comprises matrix and embeds the electrical-conductive nanometer silk thread in described matrix, described electrical-conductive nanometer silk thread is cross-linked to form conductive grid, described matrix is curing transparent feel photopolymer resin, and the thickness of described the first conductive layer is 0.05 μ m～10 μ m.
5. touch-screen according to claim 4, is characterized in that, the thickness of described the first conductive layer is 0.08 μ m～2 μ m.
6. touch-screen according to claim 4, is characterized in that, the sheet resistance of described the first conductive layer is 0.1 Ω/～500 Ω/.
7. touch-screen according to claim 6, is characterized in that, the sheet resistance of described the first conductive layer is 50 Ω/～200 Ω/.
8. touch-screen according to claim 4, is characterized in that, the diameter of described electrical-conductive nanometer silk thread is 10nm～1000nm, and length is 20nm～50 μ m.
9. touch-screen according to claim 4, is characterized in that, the described electrical-conductive nanometer silk thread of part exposes outside the side of described the first conductive layer away from described transparent substrates.
10. touch-screen according to claim 4, is characterized in that, the thickness of described transparent bonding layer is 0.5 μ m～50 μ m.
11. touch-screens according to claim 4, is characterized in that, also comprise adjustable refractive index layer; Described adjustable refractive index layer is located at described touch base plate and has a side of described the first conductive layer, and the refractive index of described adjustable refractive index layer is 1.6～2.8.
12. touch-screens according to claim 4, is characterized in that, also comprise protective seam; A side of described the first conductive layer is located at described touch base plate and has by described protective seam.
13. touch-screens according to claim 12, is characterized in that, described protective seam is 0.1 μ m～10 μ m away from a side and described first conductive layer of described transparent substrates away from the distance between a side of described transparent substrates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420287657.6U CN203909751U (en) | 2014-05-30 | 2014-05-30 | touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420287657.6U CN203909751U (en) | 2014-05-30 | 2014-05-30 | touch screen |
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| Publication Number | Publication Date |
|---|---|
| CN203909751U true CN203909751U (en) | 2014-10-29 |
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ID=51784004
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020888A (en) * | 2014-05-30 | 2014-09-03 | 南昌欧菲光科技有限公司 | Touch screen |
| CN107636580A (en) * | 2015-05-29 | 2018-01-26 | Ｎｉｓｓｈａ株式会社 | Manufacturing method of touch sensor |
-
2014
- 2014-05-30 CN CN201420287657.6U patent/CN203909751U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020888A (en) * | 2014-05-30 | 2014-09-03 | 南昌欧菲光科技有限公司 | Touch screen |
| CN107636580A (en) * | 2015-05-29 | 2018-01-26 | Ｎｉｓｓｈａ株式会社 | Manufacturing method of touch sensor |
| CN107636580B (en) * | 2015-05-29 | 2020-07-07 | Ｎｉｓｓｈａ株式会社 | Method for manufacturing touch sensor |
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Address after: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi Patentee after: Nanchang OFilm Tech. Co.,Ltd. Patentee after: Ophiguang Group Co.,Ltd. Patentee after: SUZHOU OFILM TECH Co.,Ltd. Address before: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi Patentee before: Nanchang OFilm Tech. Co.,Ltd. Patentee before: OFilm Tech Co.,Ltd. Patentee before: SUZHOU OFILM TECH Co.,Ltd. Address after: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi Patentee after: Nanchang OFilm Tech. Co.,Ltd. Patentee after: OFilm Tech Co.,Ltd. Patentee after: SUZHOU OFILM TECH Co.,Ltd. Address before: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi Patentee before: Nanchang OFilm Tech. Co.,Ltd. Patentee before: Shenzhen OFilm Tech Co.,Ltd. Patentee before: SUZHOU OFILM TECH Co.,Ltd. |
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Effective date of registration: 20210415 Address after: 231323 Building 1, precision electronics industrial park, Hangbu Town, Shucheng County, Lu'an City, Anhui Province Patentee after: Anhui jingzhuo optical display technology Co.,Ltd. Address before: 330000 Huang Jia Hu Road, Nanchang economic and Technological Development Zone, Nanchang, Jiangxi Patentee before: Nanchang OFilm Tech. Co.,Ltd. Patentee before: Ophiguang Group Co.,Ltd. Patentee before: SUZHOU OFILM TECH Co.,Ltd. |
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Granted publication date: 20141029 |