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CN203281546U - Silicon wafer bubble washing device - Google Patents

Silicon wafer bubble washing device Download PDF

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Publication number
CN203281546U
CN203281546U CN2013203126924U CN201320312692U CN203281546U CN 203281546 U CN203281546 U CN 203281546U CN 2013203126924 U CN2013203126924 U CN 2013203126924U CN 201320312692 U CN201320312692 U CN 201320312692U CN 203281546 U CN203281546 U CN 203281546U
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CN
China
Prior art keywords
silicon wafer
breather pipe
tube connector
cleaning device
air pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2013203126924U
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Chinese (zh)
Inventor
王帅
李立宏
段盟盟
朱玲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHEJIANG KINGLEX SOLAR TECHNOLOGY Co Ltd
Original Assignee
ZHEJIANG KINGLEX SOLAR TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZHEJIANG KINGLEX SOLAR TECHNOLOGY Co Ltd filed Critical ZHEJIANG KINGLEX SOLAR TECHNOLOGY Co Ltd
Priority to CN2013203126924U priority Critical patent/CN203281546U/en
Application granted granted Critical
Publication of CN203281546U publication Critical patent/CN203281546U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

本实用新型提供一种硅片鼓泡清洗装置,包括清洗槽、托盘、通气管、连接管、止回阀和气泵,所述清洗槽的内壁设有环形凸起,所述托盘安装在所述环形凸起上,所述通气管安装在所述清洗槽的底部,所述通气管绕成螺旋形,所述通气管的表面开设有通气孔,所述通气管的一端密封且另一端连接所述连接管,所述连接管连接所述气泵,所述止回阀串接在所述连接管上。本实用新型硅片鼓泡清洗装置,清洗效果好且效率高,减少了清洗时间,节约了水的使用量,且在清洗过程中能防止杂质进入。

Figure 201320312692

The utility model provides a silicon wafer bubbling cleaning device, which comprises a cleaning tank, a tray, a ventilation pipe, a connecting pipe, a check valve and an air pump. The inner wall of the cleaning tank is provided with an annular protrusion, and the tray is installed on the On the annular protrusion, the ventilation pipe is installed at the bottom of the cleaning tank, the ventilation pipe is wound into a spiral shape, and a ventilation hole is opened on the surface of the ventilation pipe, one end of the ventilation pipe is sealed and the other end is connected to the The connecting pipe is connected to the air pump, and the check valve is connected in series on the connecting pipe. The silicon wafer bubbling cleaning device of the utility model has good cleaning effect and high efficiency, reduces cleaning time, saves water consumption, and can prevent impurities from entering during the cleaning process.

Figure 201320312692

Description

Silicon wafer bubbling cleaning device
Technical field
The utility model relates to a kind of silicon chip cleaning device, particularly a kind of silicon wafer bubbling cleaning device.
Background technology
In silicon substrate manufacture of solar cells process, need to use the matrix material of silicon chip as battery,, in order to increase the absorption to solar energy, need to carry out matte to silicon chip surface and process, thereby namely utilize Acidic Liquid or alkalies to corrode and form matte silicon chip surface.After matte forms, also need silicon chip surface is cleaned, traditional cleaning device cleaning performance is poor, and easily impurity is brought into.
The utility model content
The technical problem that (one) will solve
The technical problems to be solved in the utility model is to provide the good and difficult silicon wafer bubbling cleaning device that impurity is brought into of a kind of cleaning performance.
(2) technical scheme
for solving the problems of the technologies described above, the utility model provides a kind of silicon wafer bubbling cleaning device, comprise rinse bath 1, pallet 2, breather pipe 5, tube connector 7, check-valves 8 and air pump 10, the inwall of described rinse bath 1 is provided with annular protrusion 3, described pallet 2 is arranged on described annular protrusion 3, described breather pipe 5 is arranged on the bottom of described rinse bath 1, described breather pipe 5 spirally-wounds, the surface of described breather pipe 5 offers passage 6, one end sealing and the other end of described breather pipe 5 connect described tube connector 7, described tube connector 7 connects described air pump 10, described check-valves 8 is serially connected on described tube connector 7.
Further, also comprise filter 9, described filter 9 is serially connected on described tube connector 7, and described filter 9 is between described air pump 10 and described check-valves 8.
Further, the diameter of described passage 6 is more than or equal to 2mm and less than or equal to 3mm.
(3) beneficial effect
The utility model silicon wafer bubbling cleaning device, cleaning performance is good and efficiency is high, has reduced scavenging period, has saved the use amount of water, and can prevent that in cleaning process impurity from entering.
Description of drawings
Fig. 1 is the structural representation of the utility model silicon wafer bubbling cleaning device;
Fig. 2 is the structural representation of the breather pipe of the utility model silicon wafer bubbling cleaning device.
The specific embodiment
consult Fig. 1~Fig. 2, the utility model provides a kind of silicon wafer bubbling cleaning device, comprise rinse bath 1, pallet 2, breather pipe 5, tube connector 7, check-valves 8 and air pump 10, inwall at rinse bath 1 is provided with annular protrusion 3, pallet 2 is arranged on annular protrusion 3, breather pipe 5 is arranged on the bottom of rinse bath 1, these breather pipe 5 spirally-wounds, offer passage 6 on the surface of breather pipe 5, in the present embodiment, the diameter of this passage 6 is more than or equal to 2mm and less than or equal to 3mm, 2.5mm preferably, one end sealing and the other end of breather pipe 5 connect tube connector 7, tube connector 7 connects air pump 10, check-valves 8 is serially connected on tube connector 7, in order to prevent that impurity from entering, also comprise filter 9 in the present embodiment, this filter 9 is serially connected on tube connector 7, and between air pump 10 and check-valves 8.
The utility model silicon wafer bubbling cleaning device, cleaning performance is good and efficiency is high, has reduced scavenging period, has saved the use amount of water, and can prevent that in cleaning process impurity from entering.
The above is only preferred embodiment of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.

Claims (3)

1. silicon wafer bubbling cleaning device, it is characterized in that: comprise rinse bath (1), pallet (2), breather pipe (5), tube connector (7), check-valves (8) and air pump (10), the inwall of described rinse bath (1) is provided with annular protrusion (3), described pallet (2) is arranged on described annular protrusion (3), described breather pipe (5) is arranged on the bottom of described rinse bath (1), described breather pipe (5) spirally-wound, the surface of described breather pipe (5) offers passage (6), one end sealing and the other end of described breather pipe (5) connect described tube connector (7), described tube connector (7) connects described air pump (10), described check-valves (8) is serially connected on described tube connector (7).
2. silicon wafer bubbling cleaning device as claimed in claim 1, it is characterized in that: also comprise filter (9), described filter (9) is serially connected on described tube connector (7), and described filter (9) is positioned between described air pump (10) and described check-valves (8).
3. silicon wafer bubbling cleaning device as claimed in claim 1, it is characterized in that: the diameter of described passage (6) is more than or equal to 2mm and less than or equal to 3mm.
CN2013203126924U 2013-05-31 2013-05-31 Silicon wafer bubble washing device Expired - Fee Related CN203281546U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2013203126924U CN203281546U (en) 2013-05-31 2013-05-31 Silicon wafer bubble washing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2013203126924U CN203281546U (en) 2013-05-31 2013-05-31 Silicon wafer bubble washing device

Publications (1)

Publication Number Publication Date
CN203281546U true CN203281546U (en) 2013-11-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2013203126924U Expired - Fee Related CN203281546U (en) 2013-05-31 2013-05-31 Silicon wafer bubble washing device

Country Status (1)

Country Link
CN (1) CN203281546U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103878141A (en) * 2014-03-24 2014-06-25 安徽安芯电子科技有限公司 Semiconductor wafer washing device
CN105195476A (en) * 2015-09-09 2015-12-30 瓮福达州化工有限责任公司 Phase separation tank cleaning device and method
CN107470260A (en) * 2017-09-27 2017-12-15 界首市皖俊轴承有限公司 A kind of bearing soaking and washing device based on bearing mnanufacture
CN107838111A (en) * 2016-09-21 2018-03-27 苏州润桐专利运营有限公司 Bubble rinsing device for engine cylinder head
CN108246704A (en) * 2018-03-13 2018-07-06 成都菲斯普科技有限公司 A kind of medical vessels cleaning and sterilizing equipment
CN110773505A (en) * 2019-10-31 2020-02-11 西安奕斯伟硅片技术有限公司 A silicon wafer cleaning device and method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103878141A (en) * 2014-03-24 2014-06-25 安徽安芯电子科技有限公司 Semiconductor wafer washing device
CN105195476A (en) * 2015-09-09 2015-12-30 瓮福达州化工有限责任公司 Phase separation tank cleaning device and method
CN105195476B (en) * 2015-09-09 2018-08-14 瓮福达州化工有限责任公司 A kind of split-phase tub cleaning method
CN107838111A (en) * 2016-09-21 2018-03-27 苏州润桐专利运营有限公司 Bubble rinsing device for engine cylinder head
CN107470260A (en) * 2017-09-27 2017-12-15 界首市皖俊轴承有限公司 A kind of bearing soaking and washing device based on bearing mnanufacture
CN108246704A (en) * 2018-03-13 2018-07-06 成都菲斯普科技有限公司 A kind of medical vessels cleaning and sterilizing equipment
CN110773505A (en) * 2019-10-31 2020-02-11 西安奕斯伟硅片技术有限公司 A silicon wafer cleaning device and method

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20131113

Termination date: 20170531

CF01 Termination of patent right due to non-payment of annual fee