CN203178991U - Capacitive touch screen - Google Patents
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- CN203178991U CN203178991U CN 201320145411 CN201320145411U CN203178991U CN 203178991 U CN203178991 U CN 203178991U CN 201320145411 CN201320145411 CN 201320145411 CN 201320145411 U CN201320145411 U CN 201320145411U CN 203178991 U CN203178991 U CN 203178991U
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Abstract
The utility model relates to a capacitive touch screen which comprises a substrate. A polymer layer is arranged on the substrate, first grid-shaped directional conductive patterns and second grid-shaped directional conductive patterns are embedded in the polymer layer, the first directional conductive patterns are arranged continuously, and the second directional conductive patterns are divided into conductive units which are not connected by the first directional conductive patterns. The capacitive touch screen further comprises an insulation layer arranged above the first directional conductive patterns and conductive bridges which are arranged in the second direction and used for connecting two adjacent conductive units. Each conductive bridge comprises a grid-shaped bridge wire in the middle and two conductive blocks which are arranged at two ends and connected with the bridge wires. The bridge wires are embedded on the surface of the insulation layer, two conductive blocks penetrate through the insulation layer to be connected with one conductive unit respectively, and the conductive bridges are separated from the first directional conductive patterns by the insulation layer. The conductive bridges are of grid structures so as to guarantee transparency and avoid effect on product appearance.
Description
Technical field
The utility model relates to the touch-control field, particularly relates to a kind of capacitance touch screen.
Background technology
Touch-screen is the inductive arrangement that can receive touch input signal.Touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.Nesa coating is to have satisfactory electrical conductivity, and has a kind of film of high transmission rate at visible light wave range.Nesa coating has been widely used in fields such as flat pannel display, photovoltaic device, contact panel and electromagnetic screen at present, has extremely vast market space.
Tradition OGS technology adopts at plating ITO on glass, obtains the sensor patterns of required X, Y-direction after etching, adopts MoAlMo (molybdenum aluminium molybdenum) to put up a bridge at last.Yet, adopt MoAlMo to put up a bridge, the bridging of formation is opaque, and the metal wire that metal is put up a bridge can appear in product appearance, and it is attractive in appearance to influence product.
The utility model content
Based on this, be necessary to propose a kind of capacitance touch screen with transparent bridging structure.
A kind of capacitance touch screen, comprise substrate, it is characterized in that, described substrate is provided with polymeric layer, be embedded with a plurality of latticed first direction conductive pattern and a plurality of latticed second direction conductive patterns that arrange along second direction that arrange along first direction in the described polymeric layer, described first direction and second direction are intersected mutually, described first direction conductive pattern arranges continuously, described second direction conductive pattern serves as to be divided into some disconnected conductive units each other at interval with described first direction conductive pattern, also comprise the insulation course that is arranged on the described first direction conductive pattern and the conduction bridging that connects adjacent two conductive units in second direction, two conducting blocks that described conduction is latticed bridging lead and is positioned at two ends and is communicated with the bridging lead in the middle of putting up a bridge and comprising, described bridging lead is embedded in described surface of insulating layer, described two conducting blocks penetrate described insulation course and are communicated to a conductive unit respectively, described conduction put up a bridge with described first direction conductive pattern between separate by described insulation course.
Among embodiment, described substrate is sillico aluminate glass or calcium soda-lime glass therein.
Therein among embodiment, described first direction conductive pattern and described second direction conductive pattern are to obtain by the coat of metal etching that is attached to described substrate surface, and described first direction conductive pattern and second direction conductive pattern are embedded at described polymeric layer near a side of described substrate.
Among embodiment, the thickness of the described coat of metal is 5～20nm therein.
Among embodiment, the described coat of metal is silvering therein, and the transmittance of described silvering is greater than 80%.
Therein among embodiment, described polymeric layer comprises the first surface of fitting with this substrate and the second surface of fitting with this insulation course, this second surface is provided with latticed groove, and described first direction conductive pattern and second direction conductive pattern are contained in the described latticed groove.
Among embodiment, the ratio of the degree of depth of the latticed groove on the described polymeric layer and width is greater than 1 therein.
Among embodiment, the thickness of described bridging lead is less than the thickness of described insulation course therein.
Therein among embodiment, described surface of insulating layer has been provided with latticed groove, described bridging lead is formed by the conductive material that is filled in the described latticed groove, described conductive material is selected from metal, metal alloy, conducting polymer, at least a in Graphene, carbon mitron and the conductive ink.
Among embodiment, the width of described conducting block on second direction is 1～20 μ m therein.
Among embodiment, the width of described conducting block on first direction is 2～10 μ m therein.
Among embodiment, described bridging lead is the metal grill lead therein.
Therein among embodiment, on described first direction, described a plurality of second direction conductive pattern each intervals.
Above-mentioned capacitance touch screen, conduction are put up a bridge and are adopted network, therefore can guarantee transparency, do not influence product appearance.
Description of drawings
Fig. 1 is the structural representation of the capacitance touch screen of an embodiment;
Fig. 2 is the first direction conductive pattern of capacitance touch screen of an embodiment and the distribution schematic diagram of second direction conductive pattern;
Fig. 3 is the synoptic diagram of occupied state of the conductive material of conductive pattern;
Fig. 4 to Figure 11 is the constitutional diagram of each step of capacitance touch screen preparation method.
Embodiment
Please refer to Fig. 1, Fig. 2 and Figure 11, the capacitance touch screen 100 of an embodiment comprises substrate 110, be arranged on polymeric layer 120 in the substrate 110, be embedded on the polymeric layer 120 same surfaces and a plurality of latticed first direction conductive pattern 130 that arranges along first direction Y respectively and a plurality of latticed second direction conductive pattern 140 that arranges along second direction X.First direction Y and second direction X intersect mutually, and first direction Y and second direction X quadrature arrange in the present embodiment.First direction conductive pattern 130 and second direction conductive pattern 140 have constituted the conductive layer of capacitance touch screen 100.
First direction conductive pattern 130 arranges continuously, is communicated with.Each second direction conductive pattern 140 serves as to be divided into some conductive units 142 at interval with first direction conductive pattern 130.Also be provided with insulation course 150 on first direction conductive pattern 130 and the second direction conductive pattern 140.Be embedded with the conduction bridging 160 that connects adjacent two conductive units 142 at second direction X in the insulation course 150.Latticed bridging lead 162 in the middle of conduction bridging 160 comprises is communicated to a conductive unit 142 respectively with 164, two conducting blocks 164 of two conducting blocks that are positioned at two ends and be communicated with bridging lead 162.Like this, conduction puts up a bridge 160 just with adjacent two conductive units, 142 connections.Put up a bridge 160 by a plurality of conductions are set, second direction conductive pattern 140 is connected, and conduction bridging 160 is separated by insulation course 150 and first direction conductive pattern 130.
In the present embodiment, substrate 110 is clear glass, and its material is sillico aluminate glass or calcium soda-lime glass.The thickness of substrate 110 is generally 0.3mm-1.2mm, is preferably 0.5mm-0.7mm, to adapt to electronics miniaturization, lightening requirement.
First direction conductive pattern 130 and second direction conductive pattern 140 are embedded in the inside of polymeric layer 120.First direction conductive pattern 130 is continuous distribution, is conducting at first direction Y.And second direction conductive pattern 140 is divided into some conductive units 142 at interval by first direction conductive pattern 130, and putting up a bridge in conduction 160 is not conducting before connecting, and on first direction Y, a plurality of second direction conductive patterns 140 are not communicated with each other.First direction conductive pattern 130 and second direction conductive pattern 140 all are latticed, and the basic configuration of grid can be regular polygon, as square, rhombus, regular hexagon, also can be irregular figures.The formation of first direction conductive pattern 130 and second direction conductive pattern 140 is by impressing out the latticed groove of the pattern that needs at polymeric layer 120, again filled conductive material and solidifying to form in the latticed groove.The ratio of the degree of depth of latticed groove and width is greater than 1, and the conductive material of Tian Chonging can remain in the latticed groove preferably like this.At length, polymeric layer 120 comprises the first surface (not label) of fitting with substrate 110 and the second surface (not label) of fitting with insulation course, this second surface is provided with latticed groove, and first direction conductive pattern 130 is contained in the latticed groove with second direction conductive pattern 140.In the present embodiment, the width of the mesh lines of first direction conductive pattern 130 and second direction conductive pattern 140 is 0.2 μ m-5 μ m, is preferably 0.5 μ m-2 μ m.Distance between two adjacent mesh lines is 50 μ m-800 μ m.The metal thickness of filling in the mesh lines is 1 μ m-10 μ m, is preferably 2 μ m-5 μ m.As shown in Figure 5, the ratio scope of the thickness h of metal filled mesh lines and width w is 0.5～2, preferred 1～2.Need to prove that the thickness of the density of mesh lines and filling metal can design according to transmitance and the square resistance of materials demand.
Bridging lead 162 is the latticed grooves that need by printing off in insulation course 150 surface pressure, and the filled conductive material makes in the grid groove again.The mesh-density of bridging lead 162 generally is not more than the mesh lines density of first direction conductive pattern 130 and second direction conductive pattern 140.The mesh lines width of bridging lead 162 is 0.2 μ m-5 μ m, is preferably 0.5 μ m-2 μ m.Distance between two adjacent mesh lines is 50 μ m-500 μ m.The thickness of mesh lines is 1 μ m-10 μ m, is preferably 2 μ m-5 μ m.Equally, the basic configuration of the grid of bridging lead 162 can be regular polygon, as square, rhombus, regular hexagon, also can be irregular figure.The thickness of bridging lead 162 makes insulation course 150 bridging lead 162 and first direction conductive pattern 130 can be isolated less than the thickness of insulation course 150.
Two conducting blocks 164 at bridging lead 162 two ends are communicated with bridging lead 162 with discontinuous second direction conductive pattern 140, play the effect of perforation, and the lead 162 of can avoiding putting up a bridge is communicated with first direction conductive pattern 130.The shape of conducting block 164 can be linear pattern or irregular curve.In order to guarantee visually-clear, conducting block 164 is 1 μ m-20 μ m at the width a of second direction X, is preferably 2～10 μ m.The length b of conducting block 164 only need guarantee on first direction Y, and conducting block 164 is not communicated with the conductive unit 142 of adjacent second direction conductive pattern 140 and gets final product.
Bridging lead 162 can be identical with the conductive material of first direction conductive pattern 130 and second direction conductive pattern 140 with conducting block 164 employed conductive materials, also can be different, it is selected from least a in metal, metal alloy, carbon nano-tube, Graphene and the conducting polymer composites such as gold, silver, copper.
As Fig. 4 to 11, a kind of preparation method of capacitance touch screen also is provided, comprise the steps:
Step 1, at the surperficial coated polymeric layer of substrate.Please refer to Fig. 4, in the present embodiment, select for use the thick silico-aluminate tempered glass of 0.7mm as substrate 110, be coated with the transparent impression glue of UV type that thickness is 5 μ m in one surface, obtain polymeric layer 120.For the surface of reinforcing glass panel and the bounding force of UV glue-line, before the gluing, processing can also be bombarded with beam-plasma in the surface of this glass plate, its role is to: it is dirty that (1) removes greasy dirt of glass surface etc., prevents because of the dirty adhesion variation that causes; (2) make the face glass ionization, thereby increase the adhesion of UV glue.
Step 2, patterning forms latticed groove on described polymeric layer.Please refer to Fig. 5, utilize the template that is nested with the conductive layer pattern that needs to impress out the grid groove at polymeric layer 120, please in conjunction with reference to figure 1, the grid groove comprises a plurality of first direction grooves 122 and a plurality of second direction groove that arranges along first direction Y, and first direction groove 122 is continuous; The second direction groove then is discontinuous, and it serves as to be divided into a plurality of chase units 1242 at second direction X at interval with first direction groove 122.The ratio of the degree of depth of latticed groove and width is greater than 1 on the polymeric layer 120, and the conductive material of Tian Chonging can remain in the latticed groove preferably like this.
Step 3, in the described latticed groove filled conductive material and solidifying, formation is along latticed a plurality of first direction conductive patterns of first direction setting and the latticed a plurality of second direction conductive patterns that arrange along second direction, described first direction and second direction are intersected mutually, and described second direction conductive pattern serves as to be divided into some conductive units at interval with described first direction conductive pattern.Please refer to Fig. 6, filled conductive material and solidifying in the grid groove that forms to step 2, can obtain as shown in Figure 1 first direction conductive pattern 130 and second direction conductive pattern 140, wherein second direction conductive pattern 140 is partitioned into a plurality of conductive units 142 by first direction conductive pattern 130, and on first direction Y, a plurality of second direction conductive patterns 140 are not communicated with each other.First direction conductive pattern 130 and second direction conductive pattern 140 are latticed, can utilize the blade coating technology to grid groove filled conductive material during the filled conductive material, as the Nano Silver ink, sintering then is to form first direction conductive pattern 130 and second direction conductive pattern 140.
Step 4, at the surface of described polymeric layer coating photoresist layer, the recycling mask plate exposes to photoresist layer, and by developing, obtains photoresist respectively at adjacent two conductive unit places and cover layer.Please refer to Fig. 7, photoresist is covered the position of the corresponding conductive unit 142 in position of layer 170, plays the effect of stopper when the conductive material that follow-up filled conductive is put up a bridge.
Step 5, cover the surface of polymeric layer of layer and be coated with one deck impression glue again as insulation course to the described photoresist that has.Please refer to Fig. 8, above polymeric layer 120, be coated with last layer impression glue again, obtain insulation course 150.Photoresist is covered layer 170 and is embedded in the insulation course 150, and this time the impression glue thickness of coating is covered the thickness of layer 170 less than photoresist.Coating can be adopted the mode of roller coat.In this process, photoresist cover layer 170 top may be also can more residual impression glue, follow-uply cover layer and will remove in the lump in 170 o'clock removing photoresist, do not influence subsequent step.Generally speaking, this time impression glue thickness of coating is covered the thickness of layer 170 less than photoresist, and purpose is to guarantee that photoresist covers the top of layer 170 and be exposed to insulation course 150 tops, is convenient to the follow-up photoresist of removing and covers layer 170.Certainly, if the thickness that impression glue thickness is covered layer 170 greater than photoresist also is fine, cover layer 170 o'clock at follow-up removal photoresist, remove earlier and cover photoresist and cover the part impression glue of layer 170 and get final product.
Step 6, on described insulation course, the position of covering between the layer in adjacent two photoresists impresses out latticed bridging wire grooves.Please refer to Fig. 9, cover the position of layer between 170 at two photoresists, just the position between two conductive units 142 impresses out latticed bridging wire grooves 152.
Step 7, described photoresist is covered layer remove, with the conducting block groove on the surface that form to be communicated with surface of insulating layer and polymeric layer.Please refer to Figure 10, the photoresist that plays the stopper effect is covered layer 170 remove, just obtain being communicated with the bridging wire grooves 152 on insulation course 150 surfaces and the conducting block groove 154 of the conductive unit 142 on polymeric layer 120 surfaces.Conducting block groove 154 is 1～20 μ m at the width of second direction X, is preferably 2～10 μ m, to obtain being fit to the conducting block of width and length behind the filled conductive material.
Step 8, in described bridging wire grooves and the described conducting block groove filled conductive material and solidifying, the conduction that obtains being communicated with adjacent two conductive units is put up a bridge.Please refer to Figure 11, simultaneously in conjunction with Fig. 1, in bridging wire grooves 152 and the conducting block groove 154 the filled conductive material and solidify after, latticed bridging lead 162 and two ends conducting block 164 in the middle of just obtaining put up a bridge 160 thereby obtain conduction.Conducting block 164 plays the perforation effect, and discontinuous second direction conductive pattern 140 is connected.Similarly, can utilize blade coating technology filled conductive material in bridging wire grooves 152 and the conducting block groove 154, as the Nano Silver ink, sintering then is to form the conducting block 164 at bridging lead 162 and two ends.
In above-mentioned capacitance touch screen and preparation method thereof, first direction conductive pattern 130, second direction conductive pattern 140 and bridging lead 162 all adopt the impression mode to obtain.It may be noted that, first direction conductive pattern 130 and second direction conductive pattern 140 can also be for obtaining by the coat of metal etching that is attached to substrate 110 surfaces, and first direction conductive pattern 130 and second direction conductive pattern 140 are embedded at polymeric layer 120 near a side of substrates 110.For example, the coat of metal can be that thickness is 5～20nm, and transmittance obtains the metal grill lead greater than 80% silvering by exposure-development-etching.
The preparation method of above-mentioned capacitance touch screen and the capacitance touch screen that utilizes said method to make have the following advantages:
(1) the bridging lead of conduction bridging adopts network, can guarantee transparency, does not influence product appearance;
(2) the suprabasil conductive layer of capacitance touch screen and conduction are put up a bridge and are all adopted network, therefore all can adopt imprint process manufacturing in the production run, compared to the technology of traditional ITO film as conductive layer, mesh shape can one step forming, and technology is simple, does not need expensive device such as sputter, evaporation, the yield height, be fit to large tracts of land, production in enormous quantities, and owing to do not need to use etching technics, can not cause the waste of conductive;
(3) conductive layer and conduction put up a bridge to adopt network, are convenient to adopt blade coating technology, and produce agglomeration effect when preventing sintering and cause wire fracture.
(4) conductive layer and conduction are put up a bridge and all can be adopted the mode of metal formation grid lead to obtain, and need not to use ITO, make material cost reduce greatly, can also solve large-scale contact panel because of the excessive problems such as low-response that cause of ITO side's resistance;
(5) because conductive material is embedded in the polymeric layer, the lead scratch that can avoid conductive layer and conduction to put up a bridge.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model claim.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the utility model design, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (13)
1. capacitance touch screen, comprise substrate, it is characterized in that, described substrate is provided with polymeric layer, be embedded with a plurality of latticed first direction conductive pattern and a plurality of latticed second direction conductive patterns that arrange along second direction that arrange along first direction in the described polymeric layer, described first direction and second direction are intersected mutually, described first direction conductive pattern arranges continuously, described second direction conductive pattern serves as to be divided into some disconnected conductive units each other at interval with described first direction conductive pattern, also comprise the insulation course that is arranged on the described first direction conductive pattern and the conduction bridging that connects adjacent two conductive units in second direction, two conducting blocks that described conduction is latticed bridging lead and is positioned at two ends and is communicated with the bridging lead in the middle of putting up a bridge and comprising, described bridging lead is embedded in described surface of insulating layer, described two conducting blocks penetrate described insulation course and are communicated to a conductive unit respectively, described conduction put up a bridge with described first direction conductive pattern between separate by described insulation course.
2. capacitance touch screen according to claim 1 is characterized in that, described substrate is sillico aluminate glass or calcium soda-lime glass.
3. capacitance touch screen according to claim 2, it is characterized in that, described first direction conductive pattern and described second direction conductive pattern are to obtain by the coat of metal etching that is attached to described substrate surface, and described first direction conductive pattern and second direction conductive pattern are embedded at described polymeric layer near a side of described substrate.
4. capacitance touch screen according to claim 3 is characterized in that, the thickness of the described coat of metal is 5～20nm.
5. capacitance touch screen according to claim 4 is characterized in that, the described coat of metal is silvering, and the transmittance of described silvering is greater than 80%.
6. capacitance touch screen according to claim 1, it is characterized in that, described polymeric layer comprises the first surface of fitting with this substrate and the second surface of fitting with this insulation course, this second surface is provided with latticed groove, and described first direction conductive pattern and second direction conductive pattern are contained in the described latticed groove.
7. the preparation method of capacitance touch screen according to claim 6 is characterized in that, the ratio of the degree of depth of the latticed groove on the described polymeric layer and width is greater than 1.
8. capacitance touch screen according to claim 1 is characterized in that, the thickness of described bridging lead is less than the thickness of described insulation course.
9. capacitance touch screen according to claim 1, it is characterized in that, described surface of insulating layer has been provided with latticed groove, described bridging lead is formed by the conductive material that is filled in the described latticed groove, described conductive material is selected from metal, metal alloy, conducting polymer, at least a in Graphene, carbon mitron and the conductive ink.
10. capacitance touch screen according to claim 1 is characterized in that, the width of described conducting block on second direction is 1～20 μ m.
11. capacitance touch screen according to claim 10 is characterized in that, the width of described conducting block on first direction is 2～10 μ m.
12. capacitance touch screen according to claim 1 is characterized in that, described bridging lead is the metal grill lead.
13. capacitance touch screen according to claim 1 is characterized in that, on described first direction, and described a plurality of second direction conductive pattern each intervals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320145411 CN203178991U (en) | 2013-03-27 | 2013-03-27 | Capacitive touch screen |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201320145411 CN203178991U (en) | 2013-03-27 | 2013-03-27 | Capacitive touch screen |
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| CN203178991U true CN203178991U (en) | 2013-09-04 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108958546A (en) * | 2018-06-30 | 2018-12-07 | 云谷（固安）科技有限公司 | A kind of touch-control structure and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108958546A (en) * | 2018-06-30 | 2018-12-07 | 云谷（固安）科技有限公司 | A kind of touch-control structure and preparation method thereof |
| CN108958546B (en) * | 2018-06-30 | 2021-10-12 | 广州国显科技有限公司 | Touch structure and preparation method thereof |
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