CN202405277U - 一种采用应变azo层用于阳极-吸收剂界面的薄膜太阳能器件 - Google Patents
一种采用应变azo层用于阳极-吸收剂界面的薄膜太阳能器件 Download PDFInfo
- Publication number
- CN202405277U CN202405277U CN2011200879773U CN201120087977U CN202405277U CN 202405277 U CN202405277 U CN 202405277U CN 2011200879773 U CN2011200879773 U CN 2011200879773U CN 201120087977 U CN201120087977 U CN 201120087977U CN 202405277 U CN202405277 U CN 202405277U
- Authority
- CN
- China
- Prior art keywords
- layer
- interface
- anode
- absorber
- azo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 39
- 239000002250 absorbent Substances 0.000 title claims description 5
- 230000002745 absorbent Effects 0.000 title claims description 5
- 239000006096 absorbing agent Substances 0.000 claims abstract description 68
- 230000005684 electric field Effects 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 230000003313 weakening effect Effects 0.000 claims description 5
- 239000005361 soda-lime glass Substances 0.000 claims description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract description 49
- 239000011787 zinc oxide Substances 0.000 abstract description 24
- 239000002019 doping agent Substances 0.000 abstract description 4
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 abstract description 3
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 160
- 210000004027 cell Anatomy 0.000 description 54
- 239000000463 material Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 20
- 230000004888 barrier function Effects 0.000 description 11
- 230000005641 tunneling Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- 230000008859 change Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000002301 combined effect Effects 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000002178 crystalline material Substances 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- -1 solar energy Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002028 Biomass Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 210000004692 intercellular junction Anatomy 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 239000003348 petrochemical agent Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 description 2
- XXUXXCZCUGIGPP-ACAGNQJTSA-N 2-Hydroxy-3,5-dinitro-N-[(1Z)-(5-nitrofuran-2-yl)methylidene]benzene-1-carbohydrazonic acid Chemical compound C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C(O)=C1C(=O)N\N=C/C1=CC=C([N+]([O-])=O)O1 XXUXXCZCUGIGPP-ACAGNQJTSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- XIMIGUBYDJDCKI-UHFFFAOYSA-N diselenium Chemical compound [Se]=[Se] XIMIGUBYDJDCKI-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 239000003502 gasoline Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000003209 petroleum derivative Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/251—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising zinc oxide [ZnO]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/167—Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
- H10F77/1694—Thin semiconductor films on metallic or insulating substrates the films including Group I-III-VI materials, e.g. CIS or CIGS
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
- H10F77/1696—Thin semiconductor films on metallic or insulating substrates the films including Group II-VI materials, e.g. CdTe or CdS
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
Landscapes
- Photovoltaic Devices (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31955710P | 2010-03-31 | 2010-03-31 | |
| US61/319,557 | 2010-03-31 | ||
| US13/049,190 US20110220198A1 (en) | 2010-03-31 | 2011-03-16 | Method and Device Utilizing Strained AZO Layer and Interfacial Fermi Level Pinning in Bifacial Thin Film PV Cells |
| US13/049,190 | 2011-03-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202405277U true CN202405277U (zh) | 2012-08-29 |
Family
ID=44558800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011200879773U Expired - Fee Related CN202405277U (zh) | 2010-03-31 | 2011-03-29 | 一种采用应变azo层用于阳极-吸收剂界面的薄膜太阳能器件 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20110220198A1 (zh) |
| CN (1) | CN202405277U (zh) |
| DE (1) | DE102012203830A1 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113624370A (zh) * | 2021-07-28 | 2021-11-09 | 东莞市万科建筑技术研究有限公司 | 建筑外墙监测模块及建筑 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8981207B1 (en) | 2012-01-05 | 2015-03-17 | Magnolia Solar, Inc. | High efficiency quantum dot sensitized thin film solar cell with absorber layer |
| WO2014058726A1 (en) * | 2012-10-08 | 2014-04-17 | Corning Incorporated | Sputtered transparent conductive aluminum doped zinc oxide films |
| CN102903766A (zh) * | 2012-10-12 | 2013-01-30 | 华中科技大学 | 一种无镉铜铟镓硒薄膜太阳能电池及其制备方法 |
| WO2014123806A2 (en) * | 2013-02-07 | 2014-08-14 | First Solar, Inc. | Photovoltaic device with protective layer over a window layer and method of manufacture of the same |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG43266A1 (en) * | 1990-07-05 | 1997-10-17 | Asahi Glass Co Ltd | A low emissivity film |
| US6951689B1 (en) * | 1998-01-21 | 2005-10-04 | Canon Kabushiki Kaisha | Substrate with transparent conductive layer, and photovoltaic element |
| US6787692B2 (en) * | 2000-10-31 | 2004-09-07 | National Institute Of Advanced Industrial Science & Technology | Solar cell substrate, thin-film solar cell, and multi-junction thin-film solar cell |
| JP4556407B2 (ja) * | 2002-10-04 | 2010-10-06 | 住友金属鉱山株式会社 | 酸化物透明電極膜とその製造方法、透明導電性基材、太陽電池および光検出素子 |
| US7235736B1 (en) * | 2006-03-18 | 2007-06-26 | Solyndra, Inc. | Monolithic integration of cylindrical solar cells |
| US20100117070A1 (en) * | 2008-09-18 | 2010-05-13 | Lumenz Llc | Textured semiconductor light-emitting devices |
| US20110100446A1 (en) * | 2009-11-05 | 2011-05-05 | Guardian Industries Corp. | High haze transparent contact including ion-beam treated layer for solar cells, and/or method of making the same |
| US20110108115A1 (en) * | 2009-11-11 | 2011-05-12 | International Business Machines Corporation | Forming a Photovoltaic Device |
| JP6021281B2 (ja) * | 2012-03-13 | 2016-11-09 | 日本碍子株式会社 | 酸化亜鉛単結晶の製造方法 |
-
2011
- 2011-03-16 US US13/049,190 patent/US20110220198A1/en not_active Abandoned
- 2011-03-29 CN CN2011200879773U patent/CN202405277U/zh not_active Expired - Fee Related
-
2012
- 2012-03-12 DE DE102012203830A patent/DE102012203830A1/de not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113624370A (zh) * | 2021-07-28 | 2021-11-09 | 东莞市万科建筑技术研究有限公司 | 建筑外墙监测模块及建筑 |
| CN113624370B (zh) * | 2021-07-28 | 2023-08-04 | 东莞市万科建筑技术研究有限公司 | 建筑外墙监测模块及建筑 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110220198A1 (en) | 2011-09-15 |
| DE102012203830A1 (de) | 2012-09-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20110259395A1 (en) | Single Junction CIGS/CIS Solar Module | |
| US8563850B2 (en) | Tandem photovoltaic cell and method using three glass substrate configuration | |
| US8889468B2 (en) | Method and structure for thin film tandem photovoltaic cell | |
| KR101372536B1 (ko) | 탠덤형 박막 태양전지 및 그의 제조방법 | |
| US20110168245A1 (en) | Four Terminal Multi-Junction Thin Film Photovoltaic Device and Method | |
| KR20140109530A (ko) | 박막 태양전지 | |
| CN202405277U (zh) | 一种采用应变azo层用于阳极-吸收剂界面的薄膜太阳能器件 | |
| JP2010287607A (ja) | タンデム型薄膜太陽電池 | |
| CN103840020A (zh) | 太阳能电池及其制备方法 | |
| CN107068779B (zh) | 一种太阳电池结构及其制备方法 | |
| KR20090034079A (ko) | 이셀렌화몰리브덴층을 포함하는 태양전지 및 그의 제조방법 | |
| JP2017059656A (ja) | 光電変換素子および太陽電池 | |
| CN102544134A (zh) | 薄膜太阳能电池堆叠制造方法及其薄膜太阳能电池 | |
| Myong | Recent patent issues on intermediate reflectors for high efficiency thin-film silicon photovoltaic devices | |
| KR20120043315A (ko) | 화합물 반도체 광 흡수층을 구비한 태양전지 | |
| US9349901B2 (en) | Solar cell apparatus and method of fabricating the same | |
| KR101283174B1 (ko) | 태양전지 및 이의 제조방법 | |
| KR101305603B1 (ko) | 태양전지 및 이의 제조방법 | |
| KR101382943B1 (ko) | 태양전지 및 이의 제조방법 | |
| JP2011091249A (ja) | 太陽電池 | |
| KR101628365B1 (ko) | 태양전지 및 이의 제조방법 | |
| US20130029451A1 (en) | Method for making a solar cell | |
| KR101326968B1 (ko) | 태양전지 및 이의 제조방법 | |
| KR101372026B1 (ko) | 태양전지 및 이의 제조방법 | |
| KR20130074701A (ko) | 태양전지 및 이의 제조방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: DEVELOPMENT EXPERT COMPANY Free format text: FORMER OWNER: CM MANUFACTURING INC. Effective date: 20150209 Owner name: HETF SOLAR INC. Free format text: FORMER OWNER: DEVELOPMENT EXPERT COMPANY Effective date: 20150209 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| C56 | Change in the name or address of the patentee |
Owner name: STION CORP. Free format text: FORMER NAME: HETF SOLAR INC. Owner name: CM MANUFACTURING INC. Free format text: FORMER NAME: STION CORP. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: California, USA Patentee after: STION Corp. Address before: California, USA Patentee before: HETF solar |
|
| CP03 | Change of name, title or address |
Address after: California, USA Patentee after: CM manufacturing Co. Address before: American California Patentee before: Stion Corp. |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20150209 Address after: California, USA Patentee after: HETF solar Address before: California, USA Patentee before: Development Specialist Effective date of registration: 20150209 Address after: California, USA Patentee after: Development Specialist Address before: California, USA Patentee before: CM manufacturing Co. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120829 Termination date: 20160329 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |