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CN201563336U - Supporting structure of uniform temperature radiator - Google Patents

Supporting structure of uniform temperature radiator Download PDF

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Publication number
CN201563336U
CN201563336U CN200920270274.7U CN200920270274U CN201563336U CN 201563336 U CN201563336 U CN 201563336U CN 200920270274 U CN200920270274 U CN 200920270274U CN 201563336 U CN201563336 U CN 201563336U
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CN
China
Prior art keywords
base
cover plate
uniform temperature
temperature radiator
support structure
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Expired - Fee Related
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CN200920270274.7U
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Chinese (zh)
Inventor
吴传亿
徐仓颉
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ISYSTEMS TECHNOLOGY Inc
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ISYSTEMS TECHNOLOGY Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Cooling Or The Like Of Electrical Apparatus (AREA)

Abstract

The utility model discloses bearing structure of samming radiator, its samming radiator encloses the accommodation chamber who becomes a vacuum airtight space by a base and an apron, and this accommodation space intussuseption is filled with the heat dissipation liquid, and the apron sets up the capillary structure that has a plurality of slotted holes in relative accommodation space one side, and this a plurality of slotted holes correspond to the bearing structure who sets up in the accommodation space, and its focus lies in: the supporting structure is respectively supported between the base and the cover plate and integrally extends from the base to one side of the cover plate. So that the support structure and the slot can be effectively positioned when vacuuming, injecting heat dissipation liquid or other operations are carried out.

Description

均温散热器的支撑结构 Supporting structure for uniform temperature radiator

技术领域technical field

本实用新型有关一种均温散热器,尤指一种能使有效定位的均温散热器。The utility model relates to a uniform temperature radiator, in particular to a uniform temperature radiator capable of effective positioning.

背景技术Background technique

按,现今由于时代进度神速科技发展快速,所以现今电子设备而言采用了多种电子零件,而该电子零件于操作中即产生热源。By the way, due to the rapid progress of the times and the rapid development of science and technology, various electronic components are used in electronic equipment today, and the electronic components generate heat sources during operation.

再着,现今电子设备更追求操作快速及附有多功能等需求下,CPU或其它零件的发热量越来越大,故如何解决散热问题时为显其重要。Furthermore, the current electronic equipment is pursuing fast operation and multi-functional requirements, and the heat generated by the CPU or other components is increasing, so how to solve the heat dissipation problem is very important.

然,如图1所示,为一种习的的均温板1a,该均温板1a由一本体11a及一盖体12a相互结合并形成为一中空体,而本体11a及盖体12a相互对应的一侧分别设有毛细组织(wick structure)13a,且于本体11a及盖体12a间放置有复数个支撑体14a,以使将工作流体(working fluid)灌入中空体中后内部进行抽真空(或称除气作业),而当进行抽真空时可由支撑体14a分别支撑本体11a及盖体12a,以避免造成本体11a及盖体12a的变形或凹陷。However, as shown in Figure 1, it is a conventional temperature chamber 1a, which is formed by combining a body 11a and a cover 12a to form a hollow body, and the body 11a and the cover 12a are connected to each other. The corresponding side is respectively provided with capillary tissue (wick structure) 13a, and a plurality of supports 14a are placed between the body 11a and the cover 12a, so that the working fluid (working fluid) can be poured into the hollow body and the interior can be pumped. Vacuum (or degassing operation), and when vacuuming, the main body 11a and the cover 12a can be respectively supported by the support body 14a, so as to avoid deformation or depression of the main body 11a and the cover 12a.

而该均温板1a的支撑体14a,仅放置于本体11a及盖体12a间,并无任何足以提供支撑体14a定位的结构以致当将工作流体(working fluid)灌入中空体中或内部进行抽真空作业时,支撑体14a因无法被有效定位而产生位移以造成本体11aa及盖体12a的变形或凹陷。The support body 14a of the chamber 1a is only placed between the body 11a and the cover body 12a, without any structure sufficient to provide the positioning of the support body 14a so that when the working fluid (working fluid) is poured into the hollow body or inside the hollow body During the vacuuming operation, the supporting body 14a is displaced due to being unable to be effectively positioned to cause deformation or depression of the main body 11aa and the cover body 12a.

实用新型内容Utility model content

本实用新型所解决的技术问题在于提供一种该支撑结构由基座朝向盖板一侧一体延伸的结构体。以使,于当进行抽真空或散热液体注入或其它作业时,能使支撑结构及槽孔间能有效定位。The technical problem solved by the utility model is to provide a structure in which the supporting structure integrally extends from the base toward the side of the cover plate. In order to enable effective positioning between the supporting structure and the slot hole when vacuuming or cooling liquid injection or other operations are performed.

本实用新型的技术方案为:一种均温散热器的支撑结构,其均温散热器由一基座以及一盖板所形成一真空密闭空间的容置腔室,该容置空间内填充有散热液体,且于容置空间内设置有复数个支撑结构,该支撑结构是分别抵持于基座及盖板间,且其由基座朝向盖板一侧一体延伸。The technical solution of the utility model is: a supporting structure of a temperature-equalizing radiator, the housing chamber of a vacuum-tight space formed by a base and a cover plate of the uniform-temperature radiator, and the housing space is filled with The liquid is dissipated, and a plurality of support structures are arranged in the accommodating space. The support structures are held between the base and the cover respectively, and extend integrally from the base toward the side of the cover.

一种均温散热器的支撑结构,其均温散热器由一基座以及一盖板所形成一真空密闭空间的容置腔室,该容置空间内填充有散热液体,而盖板于相对容置空间一侧设置具有复数个槽孔的毛细结构,该复数个槽孔对应于容置空间内设置的支撑结构,该支撑结构是分别抵持于基座及盖板间,且其由基座朝向盖板一侧一体延伸。A supporting structure of a uniform temperature radiator, the uniform temperature radiator is formed by a base and a cover plate to form a vacuum-tight accommodating chamber, the accommodating space is filled with heat dissipation liquid, and the cover plate is opposite to A capillary structure with a plurality of slots is arranged on one side of the accommodating space, and the plurality of slots correspond to the support structure provided in the accommodating space. The seat integrally extends toward one side of the cover plate.

其中,设有另一毛细结构,该毛细结构批覆于基座内壁面。Wherein, another capillary structure is provided, and the capillary structure is coated on the inner wall surface of the base.

该基座一体延伸的支撑结构由模具成型。The integrally extending support structure of the base is molded.

该基座一体延伸的支撑结构,以先将基座成型后,再以冲压方式将支撑结构制作而成。The support structure extending integrally from the base is first formed by molding the base, and then the support structure is produced by stamping.

该散热液体为纯水。The cooling liquid is pure water.

该基座以及盖板由具高导热性材质所制成。The base and the cover are made of high thermal conductivity material.

本实用新型的有益效果为:藉由本实用新型均温散热器的支撑结构由基座朝向盖板一侧一体延伸的结构体。以使,毛细结构的槽孔对应于支撑结构,亦不会有无法对准而造成位移现象,再者,于当进行抽真空或散热液体注入或其它作业时,能使支撑结构及槽孔间能有效定位。盖板于相对容置空间一侧设置具有复数个槽孔的毛细结构,该复数个槽孔对应于容置空间内设置的支撑结构,藉以支撑结构由基座朝向盖板一侧一体延伸的结构体,故支撑结构与槽孔对应于容置空间内的位置不会因为位移而改变。The beneficial effect of the utility model is: the support structure of the utility model uniform temperature radiator extends integrally from the base toward the side of the cover plate. So that the slots of the capillary structure correspond to the support structure, and there will be no displacement phenomenon caused by misalignment. Moreover, when vacuuming or cooling liquid injection or other operations are performed, the gap between the support structure and the slots can be adjusted. Can effectively locate. The cover plate is provided with a capillary structure with a plurality of slots on the side opposite to the accommodating space, and the plurality of slots correspond to the support structure provided in the accommodating space, so that the support structure extends integrally from the base to the side of the cover plate body, so the positions of the supporting structure and the slot corresponding to the accommodating space will not change due to displacement.

附图说明Description of drawings

图1为本实用新型中习知均温板的结构示意图;Fig. 1 is the structural representation of the known uniform temperature plate in the utility model;

图2为本实用新型中均温散热器的立体分解图;Fig. 2 is the three-dimensional exploded view of the uniform temperature radiator in the utility model;

图3为本实用新型中均温散热器的分解图;Fig. 3 is an exploded view of the uniform temperature radiator in the utility model;

图4为本实用新型中均温散热器的剖视图;Fig. 4 is the sectional view of the uniform temperature radiator in the utility model;

图5为本实用新型中均温散热器另一实施例的剖视图。Fig. 5 is a cross-sectional view of another embodiment of the temperature equalizing radiator of the present invention.

【图号说明】【Description of figure number】

1a-均温板     11a-本体1a-Vapor plate 11a-Body

12a-盖体      13a-毛细组织12a-lid 13a-capillary

14a-支撑体    10-均温散热器14a-support body 10-uniform temperature radiator

11-基座       111-支撑结构11-base 111-support structure

12-盖板       13-注入孔12-Cover plate 13-Injection hole

14-毛细结构   141-槽孔14-capillary structure 141-slotted hole

具体实施方式Detailed ways

本实用新型均温散热器的支撑结构,如图2所示,为本实用新型的立体分解示意图,其均温散热器10由一基座11以及一盖板12所构成,而本实用新型均温散热器10的基座11以及盖板12由具高导热性材质所制成,例如:铜材或铝材或其它高导热性材质所制成,并形成一真空密闭空间的容置腔室,如图3所示,均温散热器10设有一注入孔13,散热液体得以藉由注入孔13将其注入于容置空间内,使该容置空间内填充有散热液体(本实施例中的为纯水),后再进行抽真空(或称除气作业),而盖板12于相对容置空间一侧设置具有复数个槽孔141的毛细结构14(例如:铜网)、该复数个槽孔141对应于容置空间内设置的支撑结构111,且该其毛细结构14的槽孔141的孔径得以随者支撑结构111的大小而改变,其重点在于:该支撑结构111分别抵持于基座11及盖板12间,且其该支撑结构111由基座11朝向盖板12一侧一体延伸的结构体。The supporting structure of the uniform temperature radiator of the present utility model, as shown in Fig. The base 11 and the cover plate 12 of the heat sink 10 are made of materials with high thermal conductivity, such as: copper or aluminum or other high thermal conductivity materials, and form a vacuum-tight accommodating chamber , as shown in Figure 3, the uniform temperature radiator 10 is provided with an injection hole 13, and the cooling liquid can be injected into the accommodating space through the injection hole 13, so that the accommodating space is filled with the cooling liquid (in this embodiment pure water), and then carry out vacuuming (or degassing operation), and the cover plate 12 is provided with a capillary structure 14 (for example: copper mesh) with a plurality of slots 141 on the side opposite to the accommodating space. The four slots 141 correspond to the supporting structures 111 arranged in the accommodating space, and the diameter of the slots 141 of the capillary structure 14 can be changed with the size of the supporting structures 111. Between the base 11 and the cover 12 , the supporting structure 111 is a structural body integrally extending from the base 11 toward the cover 12 .

而该基座11一体延伸的支撑结构111其制作方式甚多,例如,于基座11成形的模具设计时及可将支撑结构111一并于该模具中呈现,以使得以模具制造该基座11及一体延伸的支撑结构111,而就本实施例中,其制作方式以先将基座11成型后,再以冲压方式将支撑结构111制作而成。The support structure 111 extending integrally of the base 11 can be manufactured in many ways, for example, when designing the mold for forming the base 11, the support structure 111 can be presented in the mold together, so that the base can be manufactured by the mold 11 and the integrally extending supporting structure 111 , and in this embodiment, the manufacturing method is to form the base 11 first, and then make the supporting structure 111 by stamping.

在具体实施时,如图4所示该基座11一体延伸的支撑结构111,而其毛细结构14放置且批覆于盖板12内壁面,并由毛细结构14的槽孔141对应于支撑结构111,再将基座11与盖板12加以接合,其中接合方式可为焊接或扩散接合等,再将散热液体由注入孔13将其注入于容置空间内,使该容置空间内填充有散热液体,后再进行抽真空作业,以完成整体均温散热器10。In practice, as shown in FIG. 4, the support structure 111 of the base 11 is integrally extended, and its capillary structure 14 is placed and covered on the inner wall of the cover plate 12, and the slot 141 of the capillary structure 14 corresponds to the support structure 111. , and then join the base 11 and the cover plate 12, wherein the joining method can be welding or diffusion bonding, etc., and then inject the cooling liquid into the accommodating space through the injection hole 13, so that the accommodating space is filled with heat dissipation liquid, and then carry out the vacuuming operation to complete the overall uniform temperature radiator 10.

而在于本实用新型的实施例中其毛细结构14批覆于盖板12内壁面,然其可进一步设有另一毛细结构14并使其批覆于基座11内壁面,如图5所示。In the embodiment of the present invention, the capillary structure 14 is applied to the inner wall of the cover plate 12 , but another capillary structure 14 can be further provided and applied to the inner wall of the base 11 , as shown in FIG. 5 .

如此藉由本实用新型均温散热器的支撑结构由基座朝向盖板一侧一体延伸的结构体。以使,毛细结构14的槽孔141对应于支撑结构111,亦不会有无法对准而造成位移现象,再者,于当进行抽真空或散热液体注入或其它作业时,能使支撑结构及槽孔间能有效定位。In this way, the supporting structure of the uniform temperature radiator of the present invention is a structure that integrally extends from the base toward the side of the cover plate. So that the slot 141 of the capillary structure 14 corresponds to the support structure 111, and there will be no displacement caused by misalignment. Moreover, when vacuuming or cooling liquid injection or other operations are performed, the support structure and Effective positioning between slots.

Claims (7)

1.一种均温散热器的支撑结构,其均温散热器由一基座以及一盖板所形成一真空密闭空间的容置腔室,该容置空间内填充有散热液体,且于容置空间内设置有复数个支撑结构,其特征在于:该支撑结构是分别抵持于基座及盖板间,且其由基座朝向盖板一侧一体延伸。1. A supporting structure of a uniform temperature radiator, the uniform temperature radiator is formed by a base and a cover plate to form a vacuum-tight accommodating chamber, the accommodating space is filled with heat dissipation liquid, and A plurality of support structures are arranged in the space, and the feature is that the support structures are held between the base and the cover respectively, and extend integrally from the base toward the cover. 2.一种均温散热器的支撑结构,其均温散热器由一基座以及一盖板所形成一真空密闭空间的容置腔室,该容置空间内填充有散热液体,而盖板于相对容置空间一侧设置具有复数个槽孔的毛细结构,该复数个槽孔对应于容置空间内设置的支撑结构,其特征在于:该支撑结构是分别抵持于基座及盖板间,且其由基座朝向盖板一侧一体延伸。2. A supporting structure of a uniform temperature radiator, the uniform temperature radiator is formed by a base and a cover plate to form a vacuum-tight accommodating chamber, the accommodating space is filled with heat dissipation liquid, and the cover plate A capillary structure with a plurality of slots is arranged on the side opposite to the accommodating space, and the plurality of slots correspond to the support structure provided in the accommodating space, and the feature is that the support structure is respectively held against the base and the cover plate space, and it integrally extends from the base toward the side of the cover plate. 3.如权利要求1或2所述,其特征在于:设有另一毛细结构,该毛细结构批覆于基座内壁面。3. As claimed in claim 1 or 2, characterized in that another capillary structure is provided, and the capillary structure is coated on the inner wall of the base. 4.如权利要求1或2所述,其特征在于:该基座一体延伸的支撑结构由模具成型。4. As claimed in claim 1 or 2, characterized in that: the support structure extending integrally from the base is formed by a mould. 5.如权利要求1或2所述,其特征在于:该基座一体延伸的支撑结构,以先将基座成型后,再以冲压方式将支撑结构制作而成。5. As claimed in claim 1 or 2, characterized in that: the support structure extending integrally from the base is formed by molding the base first, and then stamping the support structure. 6.如权利要求1或2所述,其特征在于:该散热液体为纯水。6. As claimed in claim 1 or 2, characterized in that: the cooling liquid is pure water. 7.如权利要求1或2所述,其特征在于:该基座以及盖板由具高导热性材质所制成。7. As claimed in claim 1 or 2, characterized in that: the base and the cover are made of a material with high thermal conductivity.
CN200920270274.7U 2009-11-27 2009-11-27 Supporting structure of uniform temperature radiator Expired - Fee Related CN201563336U (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102155858A (en) * 2011-04-07 2011-08-17 大连金三维科技有限公司 Radiator
CN103826412A (en) * 2012-11-16 2014-05-28 奇鋐科技股份有限公司 heat sink
CN103846366A (en) * 2012-11-30 2014-06-11 象水国际股份有限公司 Vapor chamber and manufacturing method thereof
CN104006689A (en) * 2013-02-27 2014-08-27 象水国际股份有限公司 Plate heat pipe and manufacturing method thereof
CN104053335A (en) * 2013-03-13 2014-09-17 联想(北京)有限公司 Heat radiation device of electronic equipment
TWI476361B (en) * 2011-06-30 2015-03-11 Chin Wen Wang Method for forming capillary of vapor chamber and structure of the same
EP3136038A1 (en) * 2015-06-30 2017-03-01 HS Marston Aerospace Limited Heat exchanger
CN107830757A (en) * 2017-09-22 2018-03-23 东莞市钧成实业有限公司 Vapor chamber structure and its production process

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102155858A (en) * 2011-04-07 2011-08-17 大连金三维科技有限公司 Radiator
TWI476361B (en) * 2011-06-30 2015-03-11 Chin Wen Wang Method for forming capillary of vapor chamber and structure of the same
CN103826412A (en) * 2012-11-16 2014-05-28 奇鋐科技股份有限公司 heat sink
CN103846366A (en) * 2012-11-30 2014-06-11 象水国际股份有限公司 Vapor chamber and manufacturing method thereof
CN104006689A (en) * 2013-02-27 2014-08-27 象水国际股份有限公司 Plate heat pipe and manufacturing method thereof
CN104053335A (en) * 2013-03-13 2014-09-17 联想(北京)有限公司 Heat radiation device of electronic equipment
EP3136038A1 (en) * 2015-06-30 2017-03-01 HS Marston Aerospace Limited Heat exchanger
US10544991B2 (en) 2015-06-30 2020-01-28 Hs Marston Aerospace Ltd. Heat exchangers
CN107830757A (en) * 2017-09-22 2018-03-23 东莞市钧成实业有限公司 Vapor chamber structure and its production process

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Granted publication date: 20100825

Termination date: 20151127