CN201397821Y - Graphite carrier - Google Patents
Graphite carrier Download PDFInfo
- Publication number
- CN201397821Y CN201397821Y CN2009200136082U CN200920013608U CN201397821Y CN 201397821 Y CN201397821 Y CN 201397821Y CN 2009200136082 U CN2009200136082 U CN 2009200136082U CN 200920013608 U CN200920013608 U CN 200920013608U CN 201397821 Y CN201397821 Y CN 201397821Y
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- CN
- China
- Prior art keywords
- graphite
- hook
- metal
- solar cell
- silicon chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 37
- 239000010439 graphite Substances 0.000 title claims abstract description 37
- 239000002184 metal Substances 0.000 claims abstract description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 27
- 239000010703 silicon Substances 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Photovoltaic Devices (AREA)
Abstract
本实用新型公开了一种在太阳能电池生产过程的镀膜工序中使用的石墨载板,它包括石墨承载板,在石墨承载板上均布有多个硅片承载方孔,在硅片承载方孔内的二个平行的相对面上对称设有金属挂钩,在硅片承载方孔内另二个平行的相对面上对称设有定位钩,在石墨承载板底面两侧设有石墨滑道条,所述的石墨承载板下表面高于金属挂钩的挂钩顶端0.5-1.5mm,金属挂钩的厚度为0.4-0.5mm。该石墨载板能够明显提升太阳电池的电参数和转化效率,减小工艺点面积,改善太阳电池外观,提高产品质量。
The utility model discloses a graphite carrier plate used in the coating process of the solar cell production process. Metal hooks are arranged symmetrically on the two parallel opposite surfaces inside, positioning hooks are arranged symmetrically on the other two parallel opposite surfaces in the silicon chip carrying square hole, graphite slide rails are arranged on both sides of the bottom surface of the graphite carrying plate, The lower surface of the graphite bearing plate is 0.5-1.5 mm higher than the hook top of the metal hook, and the thickness of the metal hook is 0.4-0.5 mm. The graphite support plate can significantly improve the electrical parameters and conversion efficiency of the solar cell, reduce the area of the process point, improve the appearance of the solar cell, and improve product quality.
Description
技术领域 technical field
本实用新型涉及在太阳电池生产过程中使用的一种辅助工具,特别涉及一种石墨载板。The utility model relates to an auxiliary tool used in the production process of solar cells, in particular to a graphite carrier plate.
背景技术 Background technique
太阳能电池生产工艺一般包括清洗制绒、扩散、刻蚀、去磷硅玻璃、镀膜、印刷电极、烧结和测试分选工序,其中在镀膜工序中硅片是装在石墨载板上、再放在镀膜设备上进行镀膜加工。硅片在加工前平放在石墨载板中,石墨载板通过四个金属挂钩承载硅片两侧边缘位置,另外两侧用金属直钩对硅片定位。现有的石墨载板下表面高于金属挂钩顶端5mm,金属挂钩厚度为1mm,因此硅片上表面到载板下表面有一定距离,导致在工艺腔等离子体成膜的过程中会在硅片背面边缘形成一层很薄的膜,严重影响后面太阳能电池的电参数;而且在硅片背面镀膜后在四个金属挂钩处会出现四个工艺点(没有成膜)的固有缺陷。The solar cell production process generally includes cleaning and texturing, diffusion, etching, dephosphorous silicon glass, coating, printing electrodes, sintering and testing and sorting processes. Coating processing is carried out on the coating equipment. The silicon wafer is placed flat on the graphite carrier plate before processing, and the graphite carrier plate carries the edges of both sides of the silicon wafer through four metal hooks, and the other two sides use metal straight hooks to position the silicon wafer. The lower surface of the existing graphite carrier is 5mm higher than the top of the metal hook, and the thickness of the metal hook is 1mm. Therefore, there is a certain distance between the upper surface of the silicon wafer and the lower surface of the carrier, which will cause a certain distance between the upper surface of the silicon wafer and the lower surface of the carrier. A very thin film is formed on the edge of the back, which seriously affects the electrical parameters of the solar cell behind; and after the back of the silicon wafer is coated, there will be inherent defects of four process points (no film formation) at the four metal hooks.
发明内容 Contents of the invention
本实用新型的目的是要提供一种能够明显提升太阳能电池电参数和转化效率,减小工艺点面积,改善太阳能电池外观,提高产品质量的石墨载板。The purpose of the utility model is to provide a graphite carrier plate that can significantly improve the electrical parameters and conversion efficiency of solar cells, reduce the area of process points, improve the appearance of solar cells, and improve product quality.
本实用新型是这样实现的:它有一块石墨承载板,在石墨承载板上均布有多个硅片承载方孔,在硅片承载方孔内的二个平行的相对面上对称设有金属挂钩,在硅片承载方孔内另二个平行的相对面上对称设有定位钩,在石墨承载板底面两侧设有石墨滑道条,其特殊之处是:所述的石墨承载板下表面高于金属挂钩的挂钩顶端0.5-1.5mm,金属挂钩的厚度为0.4-0.5mm。The utility model is realized in the following way: it has a graphite bearing plate, on which a plurality of silicon chip bearing square holes are evenly distributed, and two parallel opposite surfaces in the silicon chip bearing square holes are symmetrically provided with metal The hooks are symmetrically provided with positioning hooks on the other two parallel opposite surfaces in the silicon wafer carrying square hole, and graphite slide rails are provided on both sides of the bottom surface of the graphite carrying plate. The surface is 0.5-1.5mm higher than the hook top of the metal hook, and the thickness of the metal hook is 0.4-0.5mm.
上述的石墨载板,所述的石墨承载板下表面高于金属挂钩的挂钩顶端1mm。For the above-mentioned graphite carrier plate, the lower surface of the graphite carrier plate is 1mm higher than the hook top of the metal hook.
本实用新型的优点是:石墨承载板下表面高于金属挂钩的挂钩顶端0.5-1.5mm,降低了挂钩的高度,直接缩短了硅片上表面到石墨承载板下表面的距离,解决了硅片背面边缘成膜的问题,太阳电池的电参数和转化效率都有明显的提升;金属挂钩的厚度减薄为0.4-0.5mm,直接减小了工艺点的面积,太阳电池的外观得到改善,提高了产品质量。The utility model has the advantages that the lower surface of the graphite bearing plate is 0.5-1.5mm higher than the top of the metal hook, which reduces the height of the hook, directly shortens the distance from the upper surface of the silicon wafer to the lower surface of the graphite bearing plate, and solves the problem of silicon wafer The problem of film formation on the back edge, the electrical parameters and conversion efficiency of the solar cell have been significantly improved; the thickness of the metal hook is reduced to 0.4-0.5mm, which directly reduces the area of the process point, and the appearance of the solar cell is improved. product quality.
附图说明 Description of drawings
图1是本实用新型的结构示意图;Fig. 1 is the structural representation of the utility model;
图2是图1的仰视图;Fig. 2 is the bottom view of Fig. 1;
图3是图1的局部放大图;Fig. 3 is a partially enlarged view of Fig. 1;
图4是图3的A-A剖视图;Fig. 4 is A-A sectional view of Fig. 3;
图5是图3的B-B剖视图。Fig. 5 is a B-B sectional view of Fig. 3 .
图中:石墨承载板1,硅片承载方孔2,金属挂钩3,定位钩4,石墨滑道条5,垫块6。In the figure: graphite bearing plate 1, silicon chip bearing
具体实施方式 Detailed ways
如图所示,本实用新型有一块采用石墨制成的矩形石墨承载板1,在石墨承载板1上均布加工有多个与硅片相配合的硅片承载方孔2,本实施例硅片承载方孔2共有六行六列共三十六个,其数量不受本实施例的限制。在每个硅片承载方孔2内的二个平行的相对面上对称固定有二对金属挂钩3,在硅片承载方孔2内与上述相对面相垂直的另一对平行的相对面上对称固定有二对金属定位钩4,所述的金属挂钩3和定位钩4分别有两种,即一种分别为单侧挂钩和单侧定位钩、另一种为两侧挂钩和两侧定位钩,单侧挂钩和单侧定位钩位于石墨承载板1四周的硅片承载方孔2的外侧。在石墨承载板1的上下表面对应金属挂钩3和定位钩4处分别设有垫块6,以便于固定金属挂钩3和定位钩4,在石墨承载板1下表面两侧设有石墨滑道条5。所述的石墨承载板1下表面高于金属挂钩3的挂钩顶端0.5-1.5mm,其优选值a为1mm,金属挂钩3的厚度b为0.4-0.5mm,本实施例中金属挂钩3的厚度b以0.5mm为例。在加工时,将硅片平放在硅片承载方孔2中,通过二对金属挂钩3承载硅片两侧边缘位置,另外两侧用定位钩4对硅片定位,再将该装满硅片的石墨载板放到镀膜设备上即可镀膜。As shown in the figure, the utility model has a rectangular graphite bearing plate 1 made of graphite, and a plurality of silicon wafer bearing
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200136082U CN201397821Y (en) | 2009-05-07 | 2009-05-07 | Graphite carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009200136082U CN201397821Y (en) | 2009-05-07 | 2009-05-07 | Graphite carrier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201397821Y true CN201397821Y (en) | 2010-02-03 |
Family
ID=41620348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009200136082U Expired - Fee Related CN201397821Y (en) | 2009-05-07 | 2009-05-07 | Graphite carrier |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201397821Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101826483A (en) * | 2010-03-29 | 2010-09-08 | 常州亿晶光电科技有限公司 | Quickly-dismounted silicon wafer coating symmetrical hanging hook subassembly and mounting method thereof |
| CN101892465A (en) * | 2010-03-29 | 2010-11-24 | 常州亿晶光电科技有限公司 | Quickly-changed silicon chip film-coated single-faced hanging hook assembly and mounting method thereof |
| CN103177999A (en) * | 2011-12-20 | 2013-06-26 | 浚鑫科技股份有限公司 | Graphite frame for deposition antireflective film process |
| CN103805965A (en) * | 2012-11-08 | 2014-05-21 | 上海神舟新能源发展有限公司 | Hook assembly for film plating of plate type PECVD graphite block |
-
2009
- 2009-05-07 CN CN2009200136082U patent/CN201397821Y/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101826483A (en) * | 2010-03-29 | 2010-09-08 | 常州亿晶光电科技有限公司 | Quickly-dismounted silicon wafer coating symmetrical hanging hook subassembly and mounting method thereof |
| CN101892465A (en) * | 2010-03-29 | 2010-11-24 | 常州亿晶光电科技有限公司 | Quickly-changed silicon chip film-coated single-faced hanging hook assembly and mounting method thereof |
| CN103177999A (en) * | 2011-12-20 | 2013-06-26 | 浚鑫科技股份有限公司 | Graphite frame for deposition antireflective film process |
| CN103805965A (en) * | 2012-11-08 | 2014-05-21 | 上海神舟新能源发展有限公司 | Hook assembly for film plating of plate type PECVD graphite block |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100203 Termination date: 20120507 |