CN201381279Y - Etching apparatus - Google Patents
Etching apparatus Download PDFInfo
- Publication number
- CN201381279Y CN201381279Y CN200920006951U CN200920006951U CN201381279Y CN 201381279 Y CN201381279 Y CN 201381279Y CN 200920006951 U CN200920006951 U CN 200920006951U CN 200920006951 U CN200920006951 U CN 200920006951U CN 201381279 Y CN201381279 Y CN 201381279Y
- Authority
- CN
- China
- Prior art keywords
- liquid medicine
- etching
- soaking tank
- soaking
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005530 etching Methods 0.000 title claims abstract description 55
- 238000002791 soaking Methods 0.000 claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 239000007921 spray Substances 0.000 claims abstract description 19
- 238000007599 discharging Methods 0.000 claims abstract description 9
- 235000014347 soups Nutrition 0.000 claims 4
- 238000003466 welding Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 48
- 239000003814 drug Substances 0.000 abstract description 46
- 239000011521 glass Substances 0.000 abstract description 25
- 238000005507 spraying Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000007654 immersion Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
技术领域 technical field
本实用新型涉及一种蚀刻设备,特别涉及一种蚀刻设备的蚀刻室改良,以解决玻璃基板的两端因进行蚀刻与接受冲洗的时间不同,所产生蚀刻均匀性不佳的情形。The utility model relates to an etching device, in particular to an improvement of an etching chamber of the etching device, so as to solve the situation that the etching uniformity is not good due to the different times of etching and rinsing at both ends of a glass substrate.
背景技术 Background technique
参考图2,为现有技术中的一种蚀刻设备,该蚀刻设备包含有一送料区A、一蚀刻室B、一初步洗净室C、一主洗净室D、一干燥室E、一出料区F,工作室之间设有一连续的送料导轮G,该送料导轮G是由一外部电控室(图未示)控制。其中该蚀刻室包含一浸泡槽B1,该浸泡槽B1还外接一药液工作槽H,该药液工作槽H基本上包含一浸泡泵H1做为动力源供给药液至浸泡槽B1,以及电阻侦测计H3、酸碱度侦测计H2、温度侦测器H4、加热器H5、冷却盘管H6等控制药液的构件。玻璃基板I是由送料区A藉由输送导轮G输送进入蚀刻室B浸泡槽B1,滚轮停止运行,浸泡泵H1打入药液至浸泡槽B1,使浸泡槽B1内的药液覆盖玻璃基板I,玻璃基板I浸泡一段时间后,送料导轮G启动,将玻璃基板I运送至初步洗净室C。玻璃基板I一端(以下称首端)先进入初步洗净室C清洗,尔后另一端(以下称末端)被送料导轮G带动也进入初步洗净室C接受清洗,将残留在基板上的药液及副生成物初步冲掉。With reference to Fig. 2, it is a kind of etching equipment in the prior art, and this etching equipment comprises a feeding area A, an etching chamber B, a preliminary cleaning chamber C, a main cleaning chamber D, a drying chamber E, an outlet A continuous feeding guide wheel G is arranged between the material area F and the working room, and the feeding guide wheel G is controlled by an external electric control room (not shown). Wherein the etching chamber includes a soaking tank B1, and the soaking tank B1 is also externally connected to a liquid medicine working tank H, which basically includes a soaking pump H1 as a power source to supply the medicine liquid to the soaking tank B1, and a resistor Detector H3, pH detector H2, temperature detector H4, heater H5, cooling coil H6 and other components for controlling liquid medicine. The glass substrate I is transported from the feeding area A to the soaking tank B1 of the etching chamber B by means of the conveying guide wheel G, the rollers stop running, and the soaking pump H1 injects the liquid medicine into the soaking tank B1, so that the liquid medicine in the soaking tank B1 covers the glass substrate I. After the glass substrate I soaks for a period of time, the feeding guide wheel G is started, and the glass substrate I is transported to the preliminary cleaning chamber C. One end of the glass substrate I (hereinafter referred to as the first end) first enters the preliminary cleaning chamber C for cleaning, and then the other end (hereinafter referred to as the end) is driven by the feeding guide wheel G and enters the preliminary cleaning chamber C for cleaning, and the drug remaining on the substrate is cleaned. Fluid and by-products are initially washed away.
由于现有技术中蚀刻过程是等待基板完全进入浸泡槽,并静置于送料导轮上,才供给药液至浸泡槽,如此便延长了基板在蚀刻阶段的时间;另一方面,蚀刻过程,是基板全面同步接受浸泡槽的药液浸泡,浸泡后由基板首端先离开浸泡槽,同时末端还浸泡于槽内,这样的传输运作会造成玻璃基板首、末两端接触药液的时间不同,而导致蚀刻程度不同,使蚀刻结果不均匀。又,在浸泡过程中,必须不断的更新药液方能维持药液的浓度。Since the etching process in the prior art is to wait for the substrate to completely enter the soaking tank and rest on the feeding guide wheel, the liquid medicine is supplied to the soaking tank, which prolongs the time of the substrate in the etching stage; on the other hand, the etching process, The substrate is fully and synchronously soaked in the chemical solution of the soaking tank. After soaking, the first end of the substrate leaves the soaking tank first, and the end is still immersed in the tank. This kind of transmission operation will cause different contact times between the first and last ends of the glass substrate. , resulting in different etching degrees, resulting in uneven etching results. Also, in the soaking process, the medicinal liquid must be constantly updated to maintain the concentration of the medicinal liquid.
实用新型内容Utility model content
在现有技术的蚀刻制程,需待玻璃基板完全静置于浸泡槽后,方开始进行蚀刻作业,会造成蚀刻阶段的工时过长问题,因此本实用新型主要目的,是提供一种能节省蚀刻时间的蚀刻设备。In the etching process of the prior art, the etching operation needs to be started after the glass substrate is completely placed in the soaking tank, which will cause the problem of too long working hours in the etching stage. Therefore, the main purpose of the utility model is to provide a method that can save etching Etching equipment of the time.
在玻璃基板在被蚀刻的过程中,基板首、末端接触药液的时间不同,会导致蚀刻不均的情形,因此本实用新型另一目的是提供一种能使基板被均匀蚀刻的蚀刻设备。During the etching process of the glass substrate, the contact time between the head and the end of the substrate is different, which will lead to uneven etching. Therefore, another object of the present invention is to provide an etching device that can uniformly etch the substrate.
在玻璃基板在浸泡药液的过程中,完全未更换药液,蚀刻下所产生的物质可能影响药液浓度,药液温度也会随蚀刻时间增长而受影响,因此本实用新型又一目的是使板表面各处能同时且均匀的接触新药液。In the process of soaking the glass substrate in the liquid medicine, the liquid medicine is not replaced at all, the substances produced by etching may affect the concentration of the liquid medicine, and the temperature of the liquid medicine will also be affected as the etching time increases. Therefore, another purpose of the utility model is to All parts of the surface of the plate can be in contact with the new liquid medicine simultaneously and evenly.
为了达到上述目的,本实用新型提供了一种蚀刻设备,该设备包含:In order to achieve the above object, the utility model provides a kind of etching equipment, and this equipment comprises:
一浸泡槽,其内面两侧分别设有一入料浮动轮及一出料浮动轮;A soaking tank, the two sides of the inner surface are respectively provided with a feeding floating wheel and a discharging floating wheel;
一送料导轮,用以承载一基板,使该基板可通过该入料浮动轮而进入该浸泡槽;a feeding guide wheel, used to carry a substrate, so that the substrate can pass through the feeding floating wheel and enter the soaking tank;
一喷洒统,其为该浸泡槽的外接系统,包含有一药液工作槽以及接受该药液工作槽供应药液的多个喷源,喷源是平均设置并相应于该浸泡槽上方,该药液工作槽与该浸泡槽之间以管路相连以补给或回收药液;A spraying system, which is an external system of the soaking tank, includes a liquid medicine working tank and a plurality of spray sources that accept the supply of liquid medicine from the liquid medicine working tank. The spray sources are evenly arranged and correspond to the top of the soaking tank. The liquid working tank and the soaking tank are connected by pipelines to supply or recover the liquid medicine;
该喷洒统与该送料导轮受蚀刻设备中的一电控部所控制。The spraying system and the feeding guide wheel are controlled by an electric control unit in the etching equipment.
所述浸泡槽的外侧设置两个分别相应于所述入料浮动轮及该出料浮动轮的出气装置。Two air outlet devices respectively corresponding to the feeding floating wheel and the discharging floating wheel are arranged on the outside of the soaking tank.
该出气装置为具有狭长缝隙,能释放出压缩空气的风刀。The air outlet device is an air knife with narrow and long slits that can release compressed air.
所述入料浮动轮及所述出料浮动轮是重迭于一平台上,且可相对于该平台纵向移动微小距离。The feeding floating wheel and the discharging floating wheel are overlapped on a platform and can move a small distance longitudinally relative to the platform.
本实用新型蚀刻程序,是使基板进入浸泡槽的同时便接触了药液,故可节省蚀刻时间。又,配合着送料导轮的运行,使基板的首端先进入浸泡槽接触到药液,蚀刻结束时,也是由基板的首端先离开浸泡槽,如此便能使基板首、末两端接触药液的时间相同,可得到均匀的蚀刻度。再者,在浸泡槽的蚀刻过程中,送料导轮带动机板前、后移动,配合着喷源不断喷出新的药液,使基板表面的各处能同时接触新的药液且可使基板表面的光学膜均匀的被蚀刻。The etching procedure of the utility model is to make the substrate contact the liquid medicine while entering the soaking tank, so the etching time can be saved. In addition, in conjunction with the operation of the feeding guide wheel, the first end of the substrate enters the soaking tank first to contact the liquid medicine. When the etching is completed, the first end of the substrate also leaves the soaking tank first, so that the first and last ends of the substrate can be in contact with each other. The time of the chemical solution is the same, and a uniform etching degree can be obtained. Furthermore, during the etching process of the immersion tank, the feeding guide wheel drives the motor plate to move forward and backward, coordinating with the spray source to continuously spray out new liquid medicine, so that all places on the surface of the substrate can contact the new liquid medicine at the same time and the substrate can be kept clean. The optical film on the surface is uniformly etched.
附图说明 Description of drawings
图1为本实用新型实施例中蚀刻设备的示意图。FIG. 1 is a schematic diagram of an etching device in an embodiment of the present invention.
图2为现有技术中的一种蚀刻设备。Fig. 2 is an etching device in the prior art.
具体实施方式 Detailed ways
以下配合图式对本实用新型的实施方式做更详细的说明,使熟悉本领域的技术人员在研读本说明书后能据以实施。The implementation of the present utility model will be described in more detail below in conjunction with the drawings, so that those skilled in the art can implement it after studying this specification.
参考图1,为本实用新型蚀刻设备的较佳实施例示意图。蚀刻室10接设一通至内部的抽气装置1。蚀刻室10内部设有一浸泡槽2,该浸泡槽2两侧分别设有一入料浮动轮31与一出料浮动轮32,两浮动轮分别重迭于一平台3上,且可相对于该平台3纵向移动微小距离,浸泡槽2两边外侧分别设置对应于该入料浮动轮31及该出料浮动轮32的一出气装置4,该出气装置可为一种具有狭长缝隙能喷出气体的风刀,出气装置4是与一压缩空气源(图未示)连结。浸泡槽2底部有一连续的送料导轮5的其中一段部通过。浸泡槽2外接一喷洒系统6,其包含有以管路相连的一排喷源61与一药液工作槽62,该喷源61是指喷嘴,喷嘴是平均设置在浸泡槽2上方,并分别相应于浸泡槽2各处。该药液工作槽62是接设于蚀刻室10外部,并与浸泡槽2之间有管路相连以回收或供给药液,药液工作槽内部包含有一浸泡泵621控制浸泡槽2内的药液量,以及一喷洒泵627,做为动力源供给药液至各喷源61;药液工作槽62尚包含有一电阻侦测计623、一酸碱度侦测计622、一温度侦测器624、一加热器625、一冷却盘管626、..等控制药液温度或浓度的构件。Referring to FIG. 1 , it is a schematic diagram of a preferred embodiment of the etching equipment of the present invention. The
蚀刻设备的运作,是浸泡泵621先供给药液至蚀刻槽2,由一电控室(图未示)来控制驱动送料导轮5使玻璃基板7随送料导轮5进入蚀刻室10,玻璃基板7通过浸泡槽2将入料浮动轮31往上推,同时邻近的出气装置4强力的喷出气体,以限制浸泡槽2内的药液因入料浮动轮31的上升而溢出浸泡槽2,玻璃基板7首、末两端先后进入浸泡槽2并接触药液,待玻璃基板7完全进入浸泡槽2,入料浮动轮31便下降至接触平台3位置,形成类似一阻挡墙,防止浸泡槽2内药液流出,玻璃基板7浸泡药液的同时,喷洒泵627被开启控制喷源61喷洒出药液,控制室则控制送料导轮5前、后反复移动,在送料导轮5上的玻璃基板7必随着送料导轮5微幅的前、后往复移动,使玻璃基板7不但浸泡在槽内,还一边接受喷源61喷洒药液,使基板表面能充分均匀的接触新的药液,维持玻璃基板7表面的药液浓度,可使玻璃基板7表面的光学膜均匀的被蚀刻;所述抽气装置1则会使蚀刻室10内保持负压,药气不会溢漏至浸泡槽2外。蚀刻达一预定时间后,电控室控制送料导轮5往出料浮动轮32方向运转,玻璃基板7通过出料浮动轮32,另一出气装置4对应出料浮动轮32喷出气体,一方面限制浸泡槽2内的药液因浮动轮的上升而溢出浸泡槽2,另一方面可将基板上的残留药液吹除,待玻璃基板7完全离开浸泡槽2,出料浮动轮32便下降至接触平台3形成类似一阻挡墙,防止浸泡槽2内药液流出,玻璃基板7即进入蚀刻设备的初步冲洗程序。基板离开浸泡槽2后,浸泡槽2内的药液经过过滤处理后便回流至药液工作槽62。The operation of the etching equipment is that the
本实用新型蚀刻设备的设计,是使玻璃基板首端先进入浸泡槽接触药液,也是由首端先离开浸泡槽,如此玻璃基板首、末两端(全面)接触药液的总时间便相同,可以产生均匀的蚀刻度。且是使基板进入浸泡槽的同时便接触了药液,能节省蚀刻阶段的时间。又,在浸泡槽的蚀刻过程中,送料导轮带动机板前、后移动,配合着喷源不断喷出新的药液,使基板表面的各处能同时均匀的接触新药液,保持基板表面的药液浓度。The design of the etching equipment of the utility model is that the first end of the glass substrate enters the soaking tank to contact the liquid medicine, and the first end leaves the soaking tank first, so that the total time for the first and last two ends (full surface) of the glass substrate to contact the liquid medicine is the same , can produce a uniform etch degree. Moreover, the substrate is contacted with the chemical solution when it enters the soaking tank, which can save time in the etching stage. In addition, during the etching process of the soaking tank, the feeding guide wheel drives the motor plate to move forward and backward, and cooperates with the spray source to continuously spray out new liquid medicine, so that all places on the surface of the substrate can be in contact with the new liquid medicine evenly at the same time, keeping the surface of the substrate clean. concentration of the drug solution.
以上所述仅为用以解释本实用新型的较佳实施例,并非企图据以对本实用新型做任何形式上的限制,因此,凡有在相同的实用新型精神下所作有关本实用新型的任何修饰或变更,皆仍应包括在本实用新型意图保护的范畴。The above descriptions are only preferred embodiments for explaining the utility model, and are not intended to limit the utility model in any form. Therefore, any modifications made under the spirit of the same utility model Or changes, all should still be included in the category that the utility model intends to protect.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200920006951U CN201381279Y (en) | 2009-03-16 | 2009-03-16 | Etching apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200920006951U CN201381279Y (en) | 2009-03-16 | 2009-03-16 | Etching apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201381279Y true CN201381279Y (en) | 2010-01-13 |
Family
ID=41524755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200920006951U Expired - Fee Related CN201381279Y (en) | 2009-03-16 | 2009-03-16 | Etching apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201381279Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102730956A (en) * | 2011-04-11 | 2012-10-17 | 诺发光电股份有限公司 | Processing method of protective glass |
| WO2013033932A1 (en) * | 2011-09-09 | 2013-03-14 | 深圳市华星光电技术有限公司 | Wet etching device and method |
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| CN106830696A (en) * | 2016-12-30 | 2017-06-13 | 重庆重玻节能玻璃有限公司 | The infuser device of flame resistant glass |
| CN108282962A (en) * | 2018-01-26 | 2018-07-13 | 江西鼎峰电子科技股份有限公司 | Tin machine is moved back in a kind of etching of integrated circuit board processing |
-
2009
- 2009-03-16 CN CN200920006951U patent/CN201381279Y/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102730956A (en) * | 2011-04-11 | 2012-10-17 | 诺发光电股份有限公司 | Processing method of protective glass |
| CN102730956B (en) * | 2011-04-11 | 2015-08-26 | 诺发光电股份有限公司 | The working method of protective glass |
| WO2013033932A1 (en) * | 2011-09-09 | 2013-03-14 | 深圳市华星光电技术有限公司 | Wet etching device and method |
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| CN106830696A (en) * | 2016-12-30 | 2017-06-13 | 重庆重玻节能玻璃有限公司 | The infuser device of flame resistant glass |
| CN108282962A (en) * | 2018-01-26 | 2018-07-13 | 江西鼎峰电子科技股份有限公司 | Tin machine is moved back in a kind of etching of integrated circuit board processing |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN201381279Y (en) | Etching apparatus | |
| KR101073340B1 (en) | Substrate cleaning apparatus | |
| CN103409752B (en) | A kind of wet-method etching equipment and wet etching method | |
| CN205270226U (en) | Full self - cleaning equipment | |
| JP4836997B2 (en) | Filter cleaning device and filter cleaning system including the same | |
| KR20110095133A (en) | Slit nozzle cleaning device and applicator | |
| JP2009148699A (en) | Substrate processing equipment | |
| CN103177986B (en) | Apparatus for coating | |
| KR101485980B1 (en) | Coating Apparatus | |
| KR20160106831A (en) | Apparatus for cleaning nozzle | |
| CN201381280Y (en) | Etching equipment | |
| KR102483981B1 (en) | Cleaning system for pipe | |
| KR101484272B1 (en) | Pre-dispensing device | |
| KR200482106Y1 (en) | Automatic coating machine in the shoe industry and automatic coating production line | |
| CN106340473A (en) | Waterjet cutter, substrate processing device and substrate processing method | |
| CN101303968B (en) | Substrate processing equipment | |
| CN104550157A (en) | Cleaning device | |
| US20080196748A1 (en) | System and Method for Cleaning Process Trays | |
| CN103301992B (en) | Treatment device and treatment method | |
| KR101696826B1 (en) | Apparatus for removing polluter | |
| CN201381281Y (en) | Etching apparatus | |
| KR101992987B1 (en) | Fluid spray apparatus using pulse signal | |
| KR20140139749A (en) | Washing apparatus for mat | |
| KR20130132057A (en) | A display circuit board cleaning equipment | |
| JP2017092462A5 (en) | Liquid supply apparatus, imprint apparatus and article manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100113 Termination date: 20180316 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |