[go: up one dir, main page]

CN201347410Y - Vertical etching mechanism - Google Patents

Vertical etching mechanism Download PDF

Info

Publication number
CN201347410Y
CN201347410Y CNU2009200046334U CN200920004633U CN201347410Y CN 201347410 Y CN201347410 Y CN 201347410Y CN U2009200046334 U CNU2009200046334 U CN U2009200046334U CN 200920004633 U CN200920004633 U CN 200920004633U CN 201347410 Y CN201347410 Y CN 201347410Y
Authority
CN
China
Prior art keywords
etching
auxiliary guide
glass substrate
guide wheel
etching chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNU2009200046334U
Other languages
Chinese (zh)
Inventor
胡崑源
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xinhungyuen Technology Co ltd
Original Assignee
Xinhungyuen Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xinhungyuen Technology Co ltd filed Critical Xinhungyuen Technology Co ltd
Priority to CNU2009200046334U priority Critical patent/CN201347410Y/en
Application granted granted Critical
Publication of CN201347410Y publication Critical patent/CN201347410Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Surface Treatment Of Glass (AREA)

Abstract

The utility model relates to a vertical etching mechanism for etch a glass substrate, including an etching chamber, a motor, a plurality of transmission gyro wheel, a plurality of first supplementary guide pulley, a plurality of second supplementary guide pulley, a plurality of first spray tube and a plurality of second spray tube. By the arrangement of the structure, the glass substrate can be conveyed into the etching chamber in a vertical mode, and the first spray pipe and the second spray pipe are used for uniformly spraying the etching solution, so that the problem that the etching solution is accumulated on the glass substrate in the conventional horizontal etching mechanism, and the glass substrate cannot be uniformly etched is solved.

Description

直立式蚀刻机构 Vertical etching mechanism

技术领域 technical field

本实用新型为一种直立式蚀刻机构,即关于一种蚀刻装置,尤指一种装置或其部件的制造或处理的直立式蚀刻机构。The utility model relates to a vertical etching mechanism, which relates to an etching device, especially a vertical etching mechanism for manufacturing or processing the device or its parts.

背景技术 Background technique

已知的蚀刻机构中,其输送机构多为水平式输送机构,如图1A~C所示,所谓的水平式输送机构,泛指所有将玻璃基板1以水平方式输送者,如藉由输送带2(图1A)、辊柱或滚轮3(图1B)、机械手臂4(图1C)以水平的方式传送,水平式输送有其优点,例如,可以不必将玻璃基板1予以夹置,仅需于单侧具有输送动力即可输送玻璃基板1(如图1A、B所示),然则此种具水平式输送机构的蚀刻机构,其蚀刻方式亦需将玻璃基板水平置放以进行蚀刻,但此种蚀刻方式中,蚀刻液会积聚于该玻璃基板上,使得玻璃基板无法被均匀蚀刻。Among the known etching mechanisms, most of the conveying mechanisms are horizontal conveying mechanisms, as shown in FIGS. 2 (FIG. 1A), rollers or rollers 3 (FIG. 1B), and mechanical arm 4 (FIG. 1C) are conveyed in a horizontal manner. Horizontal conveying has its advantages. For example, it is not necessary to clamp the glass substrate 1, only The glass substrate 1 can be conveyed with conveying power on one side (as shown in Figure 1A, B), but the etching mechanism of this kind of horizontal conveying mechanism also needs to place the glass substrate horizontally for etching, but In this etching method, etchant will accumulate on the glass substrate, so that the glass substrate cannot be etched uniformly.

因此,如何创作出一种直立式蚀刻机构,将玻璃基板以直立式的方式输送并蚀刻,进而使蚀刻均匀,将是本实用新型所欲积极揭露之处。Therefore, how to create a vertical etching mechanism to transport and etch the glass substrate in a vertical manner, so as to make the etching uniform, will be actively disclosed by the present invention.

发明内容 Contents of the invention

有鉴于已知蚀刻机构的缺憾,创作人有感其未臻于完善,遂竭其心智悉心研究克服,凭其从事该项产业多年的累积经验,进而研发出一种直立式蚀刻机构,以期达到将玻璃基板以直立式的方式输送并蚀刻,进而达到使蚀刻均匀的目的。In view of the shortcomings of the known etching mechanism, the creator felt that it was not perfect, so he exhausted his mind to study and overcome it. Based on his accumulated experience in this industry for many years, he developed a vertical etching mechanism in order to achieve The glass substrate is conveyed and etched in a vertical manner, so as to achieve the purpose of uniform etching.

为达上述目的,本实用新型一实施例的一种直立式蚀刻机构,用以蚀刻一玻璃基板,包括有:一蚀刻室;一电动机,设置于该蚀刻室下方;复数个传动滚轮,藉由一传动杆而与该电动机连接,所述传动滚轮的中心处具有一凹陷部,以容置该玻璃基板;复数个第一辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的一侧处,并以固定间距配置;复数个第二辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的另一侧处,并以固定间距且相对所述第一辅助导轮而交错配置;复数个第一喷管,设置于该蚀刻室中,所述第一辅助导轮同侧处,且与所述第一辅助导轮互相垂直,其上设置有复数个第一喷嘴,朝向该玻璃基板所置放处;及复数个第二喷管,设置于该蚀刻室中,所述第二辅助导轮同侧处,且与所述第二辅助导轮互相垂直,其上设置有复数个第二喷嘴,朝向该玻璃基板所置放处。In order to achieve the above purpose, a vertical etching mechanism according to an embodiment of the present invention is used to etch a glass substrate, including: an etching chamber; an electric motor, which is arranged below the etching chamber; A transmission rod is connected with the motor, and the center of the transmission roller has a concave part to accommodate the glass substrate; a plurality of first auxiliary guide wheels are vertically pivoted above the etching chamber, corresponding to the transmission One side of the center of the roller, and arranged at a fixed distance; a plurality of second auxiliary guide wheels, vertically pivoted above the etching chamber, corresponding to the other side of the center of the driving roller, and arranged at a fixed distance and opposite to the The first auxiliary guide wheels are arranged in a staggered manner; a plurality of first nozzles are arranged in the etching chamber, on the same side as the first auxiliary guide wheels, and perpendicular to the first auxiliary guide wheels, on which There are a plurality of first nozzles facing the place where the glass substrate is placed; and a plurality of second nozzles are arranged in the etching chamber on the same side as the second auxiliary guide wheel, and are connected to the second auxiliary guide wheel. The wheels are perpendicular to each other, and a plurality of second nozzles are arranged on them, facing the place where the glass substrate is placed.

藉此,本实用新型的直立式蚀刻机构,可将玻璃基板以直立式的方式输送并蚀刻,进而达到使蚀刻均匀的目的。Thereby, the vertical etching mechanism of the present invention can convey and etch the glass substrate in a vertical manner, thereby achieving the purpose of uniform etching.

附图说明 Description of drawings

图1A、图1B、图1C为已知水平式输送机构的实施例的示意图;Fig. 1A, Fig. 1B, Fig. 1C are the schematic diagrams of the embodiment of known horizontal conveying mechanism;

图2A为本实用新型一实施例的直立式蚀刻机构的正视图;2A is a front view of a vertical etching mechanism according to an embodiment of the present invention;

图2B为本实用新型一实施例的直立式蚀刻机构的侧视图;Fig. 2B is a side view of a vertical etching mechanism according to an embodiment of the present invention;

图3为本实用新型一实施例的直立式蚀刻机构中,第一喷管和第二喷管的作动示意图。FIG. 3 is a schematic diagram of the operation of the first nozzle and the second nozzle in the vertical etching mechanism according to an embodiment of the present invention.

具体实施方式 Detailed ways

为充分了解本实用新型的目的、特征及功效,兹藉由下述具体的实施例,并配合所附的图式,对本实用新型做一详细说明,说明如后:In order to fully understand the purpose, features and effects of the present utility model, the utility model is described in detail through the following specific embodiments and accompanying drawings, as follows:

请参见图2A及图2B,图2A及图2B为本实用新型一实施例的直立式蚀刻机构的正视图及侧视图。如图所示,本实用新型一实施例的一种直立式蚀刻机构,用以蚀刻一玻璃基板1,包括有一蚀刻室10、一电动机20、复数个传动滚轮30、复数个第一辅助导轮40、复数个第二辅助导轮50、复数个第一喷管60及复数个第二喷管70。该蚀刻室10是用以容纳输送装置及该玻璃基板1于其中,并蚀刻该玻璃基板1。该电动机20是设置于该蚀刻室10下方处,用以提供动力,以输送该玻璃基板1。所述传动滚轮30是藉由一传动杆32而与该电动机20连接,所述传动滚轮30的中心处具有一凹陷部34,以容置该玻璃基板1,藉此,当电动机20发动进而带动传动滚轮30转动时,容置于该凹陷部34的玻璃基板1受到摩擦力的作用而产生移动。所述第一辅助导轮40,是垂直枢设于该蚀刻室10的上方,对应所述传动滚轮30中心的一侧处,并以固定间距配置。所述第二辅助导轮50,是垂直枢设于该蚀刻室10的上方,对应所述传动滚轮30中心的另一侧处,并以固定间距且相对所述第一辅助导轮40而交错配置,藉此,所述第一辅助导轮40及所述第二辅助导轮50可夹置该玻璃基板1,当玻璃基板1受到所述传动滚轮30带动时,可辅助导引玻璃基板1。所述第一喷管60,是设置于该蚀刻室10中,所述第一辅助导轮40同侧处,且与所述第一辅助导轮40互相垂直,其上设置有复数个第一喷嘴62,是朝向该玻璃基板1所置放处,用以均匀喷洒蚀刻液于该玻璃基板1的一侧。所述第二喷管70,是设置于该蚀刻室10中,所述第二辅助导轮50同侧处,且与所述第二辅助导轮50互相垂直,其上设置有复数个第二喷嘴72,是朝向该玻璃基板1所置放处,用以均匀喷洒蚀刻液于该玻璃基板1的另一侧。Please refer to FIG. 2A and FIG. 2B . FIG. 2A and FIG. 2B are a front view and a side view of a vertical etching mechanism according to an embodiment of the present invention. As shown in the figure, a vertical etching mechanism according to an embodiment of the present invention is used to etch a glass substrate 1, and includes an etching chamber 10, a motor 20, a plurality of driving rollers 30, and a plurality of first auxiliary guide wheels 40. A plurality of second auxiliary guide wheels 50, a plurality of first nozzles 60 and a plurality of second nozzles 70. The etching chamber 10 is used for accommodating the conveying device and the glass substrate 1 therein, and etching the glass substrate 1 . The motor 20 is disposed under the etching chamber 10 to provide power to transport the glass substrate 1 . The transmission roller 30 is connected with the motor 20 by a transmission rod 32, and the center of the transmission roller 30 has a recess 34 to accommodate the glass substrate 1, whereby when the motor 20 starts to drive When the driving roller 30 rotates, the glass substrate 1 accommodated in the recessed portion 34 is moved due to frictional force. The first auxiliary guide wheel 40 is vertically pivoted above the etching chamber 10 , on one side corresponding to the center of the driving roller 30 , and arranged at a fixed distance. The second auxiliary guide wheels 50 are vertically pivoted above the etching chamber 10 , corresponding to the other side of the center of the driving roller 30 , and are staggered relative to the first auxiliary guide wheels 40 at a fixed distance. configuration, whereby the first auxiliary guide wheel 40 and the second auxiliary guide wheel 50 can sandwich the glass substrate 1, and when the glass substrate 1 is driven by the driving roller 30, it can assist in guiding the glass substrate 1 . The first nozzle 60 is arranged in the etching chamber 10, on the same side as the first auxiliary guide wheel 40, and is perpendicular to the first auxiliary guide wheel 40, on which a plurality of first The nozzle 62 is directed toward the place where the glass substrate 1 is placed, and is used for uniformly spraying the etching solution on one side of the glass substrate 1 . The second nozzle 70 is arranged in the etching chamber 10, on the same side as the second auxiliary guide wheel 50, and is perpendicular to the second auxiliary guide wheel 50, and a plurality of second auxiliary guide wheels are arranged on it. The nozzle 72 is directed toward the place where the glass substrate 1 is placed, and is used for uniformly spraying the etching solution on the other side of the glass substrate 1 .

藉此,本实用新型的一种直立式蚀刻机构,利用将玻璃基板采直立式输送并蚀刻的方式,达到避免发生蚀刻液积聚于玻璃基板上而造成不均匀蚀刻的功效。Thereby, a vertical etching mechanism of the present invention utilizes the method of vertically conveying and etching the glass substrate to avoid uneven etching caused by the accumulation of etching liquid on the glass substrate.

本实用新型的另一实施例中,于所述第一辅助导轮40上,更设置有至少一第一突起部42;及于所述第二辅助导轮50上,更设置有至少一第二突起部52,其中该第一突起部42及该第二突起部52是彼此对应,藉由该第一突起部42和该第二突起部52的相互对应设置,可以点接触的方式夹置该玻璃基板1,以满足某些特殊环境的需求。In another embodiment of the present utility model, at least one first protrusion 42 is further provided on the first auxiliary guide wheel 40; and at least one first protrusion 42 is further provided on the second auxiliary guide wheel 50. Two protruding parts 52, wherein the first protruding part 42 and the second protruding part 52 are corresponding to each other, through the corresponding setting of the first protruding part 42 and the second protruding part 52, they can be sandwiched in a point contact manner The glass substrate 1 meets the requirements of some special environments.

本实用新型的另一实施例中,所述第一喷管60及所述第二喷管70是可作上下各45度的转动,如图3所示,如此一来,可使蚀刻液喷洒得更加均匀。In another embodiment of the present utility model, the first nozzle 60 and the second nozzle 70 can be rotated 45 degrees up and down, as shown in Figure 3, so that the etching solution can be sprayed more evenly.

如上所述,本实用新型完全符合专利三要件:新颖性、创造性和产业上的可利用性。以新颖性和创造性而言,本实用新型是藉由将玻璃基板以直立式输送并蚀刻的方式,进而达到使蚀刻均匀的目的;就产业上的可利用性而言,利用本实用新型所衍生的产品,当可充分满足目前市场的需求。As mentioned above, the utility model fully meets the three requirements of a patent: novelty, creativity and industrial applicability. In terms of novelty and creativity, the utility model achieves the purpose of uniform etching by vertically conveying and etching the glass substrate; in terms of industrial applicability, the utility model derives The products should fully meet the needs of the current market.

本实用新型在上文中已以较佳实施例揭露,然熟习本项技术者应理解的是,该实施例仅用于描绘本实用新型,而不应解读为限制本实用新型的范围。应注意的是,举凡与该实施例等效的变化与置换,均应设为涵盖于本实用新型的范畴内。因此,本实用新型的保护范围当以下文的权利要求范围所界定者为准。The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and replacements equivalent to this embodiment should be included in the scope of the present utility model. Therefore, the protection scope of the present utility model should be defined by the scope of the following claims.

Claims (3)

1、一种直立式蚀刻机构,用以蚀刻一玻璃基板,其特征在于,包括有:1. A vertical etching mechanism for etching a glass substrate, characterized in that it includes: 一蚀刻室;an etching chamber; 一电动机,设置于该蚀刻室下方;A motor is arranged below the etching chamber; 复数个传动滚轮,藉由一传动杆而与该电动机连接,所述传动滚轮的中心处具有一凹陷部,以容置该玻璃基板;A plurality of transmission rollers are connected to the motor through a transmission rod, and the center of the transmission rollers has a recess to accommodate the glass substrate; 复数个第一辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的一侧处,并以固定间距配置;A plurality of first auxiliary guide wheels are vertically pivoted above the etching chamber, corresponding to one side of the center of the driving roller, and arranged at fixed intervals; 复数个第二辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的另一侧处,并以固定间距且相对所述第一辅助导轮而交错配置;A plurality of second auxiliary guide wheels are vertically pivoted above the etching chamber, corresponding to the other side of the center of the driving roller, and are staggered with fixed intervals relative to the first auxiliary guide wheels; 复数个第一喷管,设置于该蚀刻室中,所述第一辅助导轮同侧处,且与所述第一辅助导轮互相垂直,其上设置有复数个第一喷嘴,朝向该玻璃基板所置放处;及A plurality of first nozzles are arranged in the etching chamber, on the same side as the first auxiliary guide wheel, and are perpendicular to the first auxiliary guide wheel, on which a plurality of first nozzles are arranged, facing the glass the place where the substrate is placed; and 复数个第二喷管,设置于该蚀刻室中,所述第二辅助导轮同侧处,且与所述第二辅助导轮互相垂直,其上设置有复数个第二喷嘴,朝向该玻璃基板所置放处。A plurality of second nozzles are arranged in the etching chamber, on the same side as the second auxiliary guide wheel, and are perpendicular to the second auxiliary guide wheel, and a plurality of second nozzles are arranged on it, facing the glass Where the substrate is placed. 2、如权利要求1所述的直立式蚀刻机构,其特征在于,于所述第一辅助导轮上,更设置有至少一第一突起部;及于所述第二辅助导轮上,更设置有至少一第二突起部,其中该第一突起部及该第二突起部彼此对应。2. The vertical etching mechanism according to claim 1, characterized in that, on the first auxiliary guide wheel, at least one first protrusion is further provided; and on the second auxiliary guide wheel, there is further At least one second protrusion is provided, wherein the first protrusion and the second protrusion correspond to each other. 3、如权利要求1或2所述的直立式蚀刻机构,其特征在于,其中,所述第一喷管及所述第二喷管可作上下各45度的转动。3. The vertical etching mechanism according to claim 1 or 2, wherein, the first nozzle and the second nozzle can rotate 45 degrees up and down.
CNU2009200046334U 2009-02-09 2009-02-09 Vertical etching mechanism Expired - Fee Related CN201347410Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2009200046334U CN201347410Y (en) 2009-02-09 2009-02-09 Vertical etching mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2009200046334U CN201347410Y (en) 2009-02-09 2009-02-09 Vertical etching mechanism

Publications (1)

Publication Number Publication Date
CN201347410Y true CN201347410Y (en) 2009-11-18

Family

ID=41366884

Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2009200046334U Expired - Fee Related CN201347410Y (en) 2009-02-09 2009-02-09 Vertical etching mechanism

Country Status (1)

Country Link
CN (1) CN201347410Y (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102923936A (en) * 2011-08-11 2013-02-13 富泰华工业(深圳)有限公司 Etching device
CN104321465A (en) * 2012-02-10 2015-01-28 迪勒公司 Machine and method to chemically engrave a plate of stainless steel
CN107039658A (en) * 2017-03-08 2017-08-11 同济大学 A kind of method of low cost batch production metal polar plate
CN108212889A (en) * 2018-01-09 2018-06-29 业成科技(成都)有限公司 Vertical type washing equipment
CN111182736A (en) * 2020-03-16 2020-05-19 佛山市恒灏科技有限公司 Etching method and device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102923936A (en) * 2011-08-11 2013-02-13 富泰华工业(深圳)有限公司 Etching device
CN102923936B (en) * 2011-08-11 2014-12-10 富泰华工业(深圳)有限公司 Etching device
CN104321465A (en) * 2012-02-10 2015-01-28 迪勒公司 Machine and method to chemically engrave a plate of stainless steel
CN104321465B (en) * 2012-02-10 2017-05-03 迪勒公司 Machine and method to chemically engrave a plate of stainless steel
CN107039658A (en) * 2017-03-08 2017-08-11 同济大学 A kind of method of low cost batch production metal polar plate
CN107039658B (en) * 2017-03-08 2020-07-28 同济大学 A low-cost method for mass production of metal plates
CN108212889A (en) * 2018-01-09 2018-06-29 业成科技(成都)有限公司 Vertical type washing equipment
CN111182736A (en) * 2020-03-16 2020-05-19 佛山市恒灏科技有限公司 Etching method and device

Similar Documents

Publication Publication Date Title
CN201347410Y (en) Vertical etching mechanism
WO2012118651A3 (en) Glass substrate surface cleaning apparatus and glass substrate surface cleaning method
WO2019218511A1 (en) Flexible panel fitting device and flexible panel fitting method
JP2012211667A (en) Suction cup and wall surface moving machine
JP5790494B2 (en) Etching method of glass substrate
CN1326757C (en) Conveying mechanism and its wet processing equipment
CN103991674A (en) Automatic deviation correcting device of belt conveyor
JP2005067899A (en) Transport system
CN201530618U (en) Substrate conveying device for wet process
CN106829475A (en) Glass substrate transmission equipment
CN102751185B (en) Solar battery sheet selective etch device and method
CN203991466U (en) A kind of touch-screen cleaning device
CN205151125U (en) Send mould to turn to device
CN206298118U (en) A kind of strength jacking roller-way for ultra thin glass substrates conveying
CN218286167U (en) Glass breaks disconnected device and glass breaks disconnected system off with fingers and thumb
CN103317510A (en) Robot equipment
CN203974990U (en) A kind of two Athey wheel parallel caterpillars for climbing robot
CN104229191A (en) Touch screen automatic wiping film pasting machine
CN203974989U (en) A kind of driving wheel for climbing robot
CN101146410B (en) Substrate cleaning device
CN201140902Y (en) Conveyor system
CN205151126U (en) Send mould to turn to device
CN105478391A (en) Wafer cleaning apparatus
CN205645780U (en) Solar energy silicon chip conveyer
CN205328034U (en) Industrial automatic turn -back conveying belt

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20091118

Termination date: 20130209