CN201347410Y - Vertical etching mechanism - Google Patents
Vertical etching mechanism Download PDFInfo
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- CN201347410Y CN201347410Y CNU2009200046334U CN200920004633U CN201347410Y CN 201347410 Y CN201347410 Y CN 201347410Y CN U2009200046334 U CNU2009200046334 U CN U2009200046334U CN 200920004633 U CN200920004633 U CN 200920004633U CN 201347410 Y CN201347410 Y CN 201347410Y
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Abstract
Description
技术领域 technical field
本实用新型为一种直立式蚀刻机构,即关于一种蚀刻装置,尤指一种装置或其部件的制造或处理的直立式蚀刻机构。The utility model relates to a vertical etching mechanism, which relates to an etching device, especially a vertical etching mechanism for manufacturing or processing the device or its parts.
背景技术 Background technique
已知的蚀刻机构中,其输送机构多为水平式输送机构,如图1A~C所示,所谓的水平式输送机构,泛指所有将玻璃基板1以水平方式输送者,如藉由输送带2(图1A)、辊柱或滚轮3(图1B)、机械手臂4(图1C)以水平的方式传送,水平式输送有其优点,例如,可以不必将玻璃基板1予以夹置,仅需于单侧具有输送动力即可输送玻璃基板1(如图1A、B所示),然则此种具水平式输送机构的蚀刻机构,其蚀刻方式亦需将玻璃基板水平置放以进行蚀刻,但此种蚀刻方式中,蚀刻液会积聚于该玻璃基板上,使得玻璃基板无法被均匀蚀刻。Among the known etching mechanisms, most of the conveying mechanisms are horizontal conveying mechanisms, as shown in FIGS. 2 (FIG. 1A), rollers or rollers 3 (FIG. 1B), and mechanical arm 4 (FIG. 1C) are conveyed in a horizontal manner. Horizontal conveying has its advantages. For example, it is not necessary to clamp the
因此,如何创作出一种直立式蚀刻机构,将玻璃基板以直立式的方式输送并蚀刻,进而使蚀刻均匀,将是本实用新型所欲积极揭露之处。Therefore, how to create a vertical etching mechanism to transport and etch the glass substrate in a vertical manner, so as to make the etching uniform, will be actively disclosed by the present invention.
发明内容 Contents of the invention
有鉴于已知蚀刻机构的缺憾,创作人有感其未臻于完善,遂竭其心智悉心研究克服,凭其从事该项产业多年的累积经验,进而研发出一种直立式蚀刻机构,以期达到将玻璃基板以直立式的方式输送并蚀刻,进而达到使蚀刻均匀的目的。In view of the shortcomings of the known etching mechanism, the creator felt that it was not perfect, so he exhausted his mind to study and overcome it. Based on his accumulated experience in this industry for many years, he developed a vertical etching mechanism in order to achieve The glass substrate is conveyed and etched in a vertical manner, so as to achieve the purpose of uniform etching.
为达上述目的,本实用新型一实施例的一种直立式蚀刻机构,用以蚀刻一玻璃基板,包括有:一蚀刻室;一电动机,设置于该蚀刻室下方;复数个传动滚轮,藉由一传动杆而与该电动机连接,所述传动滚轮的中心处具有一凹陷部,以容置该玻璃基板;复数个第一辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的一侧处,并以固定间距配置;复数个第二辅助导轮,垂直枢设于该蚀刻室的上方,对应所述传动滚轮中心的另一侧处,并以固定间距且相对所述第一辅助导轮而交错配置;复数个第一喷管,设置于该蚀刻室中,所述第一辅助导轮同侧处,且与所述第一辅助导轮互相垂直,其上设置有复数个第一喷嘴,朝向该玻璃基板所置放处;及复数个第二喷管,设置于该蚀刻室中,所述第二辅助导轮同侧处,且与所述第二辅助导轮互相垂直,其上设置有复数个第二喷嘴,朝向该玻璃基板所置放处。In order to achieve the above purpose, a vertical etching mechanism according to an embodiment of the present invention is used to etch a glass substrate, including: an etching chamber; an electric motor, which is arranged below the etching chamber; A transmission rod is connected with the motor, and the center of the transmission roller has a concave part to accommodate the glass substrate; a plurality of first auxiliary guide wheels are vertically pivoted above the etching chamber, corresponding to the transmission One side of the center of the roller, and arranged at a fixed distance; a plurality of second auxiliary guide wheels, vertically pivoted above the etching chamber, corresponding to the other side of the center of the driving roller, and arranged at a fixed distance and opposite to the The first auxiliary guide wheels are arranged in a staggered manner; a plurality of first nozzles are arranged in the etching chamber, on the same side as the first auxiliary guide wheels, and perpendicular to the first auxiliary guide wheels, on which There are a plurality of first nozzles facing the place where the glass substrate is placed; and a plurality of second nozzles are arranged in the etching chamber on the same side as the second auxiliary guide wheel, and are connected to the second auxiliary guide wheel. The wheels are perpendicular to each other, and a plurality of second nozzles are arranged on them, facing the place where the glass substrate is placed.
藉此,本实用新型的直立式蚀刻机构,可将玻璃基板以直立式的方式输送并蚀刻,进而达到使蚀刻均匀的目的。Thereby, the vertical etching mechanism of the present invention can convey and etch the glass substrate in a vertical manner, thereby achieving the purpose of uniform etching.
附图说明 Description of drawings
图1A、图1B、图1C为已知水平式输送机构的实施例的示意图;Fig. 1A, Fig. 1B, Fig. 1C are the schematic diagrams of the embodiment of known horizontal conveying mechanism;
图2A为本实用新型一实施例的直立式蚀刻机构的正视图;2A is a front view of a vertical etching mechanism according to an embodiment of the present invention;
图2B为本实用新型一实施例的直立式蚀刻机构的侧视图;Fig. 2B is a side view of a vertical etching mechanism according to an embodiment of the present invention;
图3为本实用新型一实施例的直立式蚀刻机构中,第一喷管和第二喷管的作动示意图。FIG. 3 is a schematic diagram of the operation of the first nozzle and the second nozzle in the vertical etching mechanism according to an embodiment of the present invention.
具体实施方式 Detailed ways
为充分了解本实用新型的目的、特征及功效,兹藉由下述具体的实施例,并配合所附的图式,对本实用新型做一详细说明,说明如后:In order to fully understand the purpose, features and effects of the present utility model, the utility model is described in detail through the following specific embodiments and accompanying drawings, as follows:
请参见图2A及图2B,图2A及图2B为本实用新型一实施例的直立式蚀刻机构的正视图及侧视图。如图所示,本实用新型一实施例的一种直立式蚀刻机构,用以蚀刻一玻璃基板1,包括有一蚀刻室10、一电动机20、复数个传动滚轮30、复数个第一辅助导轮40、复数个第二辅助导轮50、复数个第一喷管60及复数个第二喷管70。该蚀刻室10是用以容纳输送装置及该玻璃基板1于其中,并蚀刻该玻璃基板1。该电动机20是设置于该蚀刻室10下方处,用以提供动力,以输送该玻璃基板1。所述传动滚轮30是藉由一传动杆32而与该电动机20连接,所述传动滚轮30的中心处具有一凹陷部34,以容置该玻璃基板1,藉此,当电动机20发动进而带动传动滚轮30转动时,容置于该凹陷部34的玻璃基板1受到摩擦力的作用而产生移动。所述第一辅助导轮40,是垂直枢设于该蚀刻室10的上方,对应所述传动滚轮30中心的一侧处,并以固定间距配置。所述第二辅助导轮50,是垂直枢设于该蚀刻室10的上方,对应所述传动滚轮30中心的另一侧处,并以固定间距且相对所述第一辅助导轮40而交错配置,藉此,所述第一辅助导轮40及所述第二辅助导轮50可夹置该玻璃基板1,当玻璃基板1受到所述传动滚轮30带动时,可辅助导引玻璃基板1。所述第一喷管60,是设置于该蚀刻室10中,所述第一辅助导轮40同侧处,且与所述第一辅助导轮40互相垂直,其上设置有复数个第一喷嘴62,是朝向该玻璃基板1所置放处,用以均匀喷洒蚀刻液于该玻璃基板1的一侧。所述第二喷管70,是设置于该蚀刻室10中,所述第二辅助导轮50同侧处,且与所述第二辅助导轮50互相垂直,其上设置有复数个第二喷嘴72,是朝向该玻璃基板1所置放处,用以均匀喷洒蚀刻液于该玻璃基板1的另一侧。Please refer to FIG. 2A and FIG. 2B . FIG. 2A and FIG. 2B are a front view and a side view of a vertical etching mechanism according to an embodiment of the present invention. As shown in the figure, a vertical etching mechanism according to an embodiment of the present invention is used to etch a
藉此,本实用新型的一种直立式蚀刻机构,利用将玻璃基板采直立式输送并蚀刻的方式,达到避免发生蚀刻液积聚于玻璃基板上而造成不均匀蚀刻的功效。Thereby, a vertical etching mechanism of the present invention utilizes the method of vertically conveying and etching the glass substrate to avoid uneven etching caused by the accumulation of etching liquid on the glass substrate.
本实用新型的另一实施例中,于所述第一辅助导轮40上,更设置有至少一第一突起部42;及于所述第二辅助导轮50上,更设置有至少一第二突起部52,其中该第一突起部42及该第二突起部52是彼此对应,藉由该第一突起部42和该第二突起部52的相互对应设置,可以点接触的方式夹置该玻璃基板1,以满足某些特殊环境的需求。In another embodiment of the present utility model, at least one
本实用新型的另一实施例中,所述第一喷管60及所述第二喷管70是可作上下各45度的转动,如图3所示,如此一来,可使蚀刻液喷洒得更加均匀。In another embodiment of the present utility model, the
如上所述,本实用新型完全符合专利三要件:新颖性、创造性和产业上的可利用性。以新颖性和创造性而言,本实用新型是藉由将玻璃基板以直立式输送并蚀刻的方式,进而达到使蚀刻均匀的目的;就产业上的可利用性而言,利用本实用新型所衍生的产品,当可充分满足目前市场的需求。As mentioned above, the utility model fully meets the three requirements of a patent: novelty, creativity and industrial applicability. In terms of novelty and creativity, the utility model achieves the purpose of uniform etching by vertically conveying and etching the glass substrate; in terms of industrial applicability, the utility model derives The products should fully meet the needs of the current market.
本实用新型在上文中已以较佳实施例揭露,然熟习本项技术者应理解的是,该实施例仅用于描绘本实用新型,而不应解读为限制本实用新型的范围。应注意的是,举凡与该实施例等效的变化与置换,均应设为涵盖于本实用新型的范畴内。因此,本实用新型的保护范围当以下文的权利要求范围所界定者为准。The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and replacements equivalent to this embodiment should be included in the scope of the present utility model. Therefore, the protection scope of the present utility model should be defined by the scope of the following claims.
Claims (3)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009200046334U CN201347410Y (en) | 2009-02-09 | 2009-02-09 | Vertical etching mechanism |
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| Application Number | Priority Date | Filing Date | Title |
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| CNU2009200046334U CN201347410Y (en) | 2009-02-09 | 2009-02-09 | Vertical etching mechanism |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102923936A (en) * | 2011-08-11 | 2013-02-13 | 富泰华工业(深圳)有限公司 | Etching device |
| CN104321465A (en) * | 2012-02-10 | 2015-01-28 | 迪勒公司 | Machine and method to chemically engrave a plate of stainless steel |
| CN107039658A (en) * | 2017-03-08 | 2017-08-11 | 同济大学 | A kind of method of low cost batch production metal polar plate |
| CN108212889A (en) * | 2018-01-09 | 2018-06-29 | 业成科技(成都)有限公司 | Vertical type washing equipment |
| CN111182736A (en) * | 2020-03-16 | 2020-05-19 | 佛山市恒灏科技有限公司 | Etching method and device |
-
2009
- 2009-02-09 CN CNU2009200046334U patent/CN201347410Y/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102923936A (en) * | 2011-08-11 | 2013-02-13 | 富泰华工业(深圳)有限公司 | Etching device |
| CN102923936B (en) * | 2011-08-11 | 2014-12-10 | 富泰华工业(深圳)有限公司 | Etching device |
| CN104321465A (en) * | 2012-02-10 | 2015-01-28 | 迪勒公司 | Machine and method to chemically engrave a plate of stainless steel |
| CN104321465B (en) * | 2012-02-10 | 2017-05-03 | 迪勒公司 | Machine and method to chemically engrave a plate of stainless steel |
| CN107039658A (en) * | 2017-03-08 | 2017-08-11 | 同济大学 | A kind of method of low cost batch production metal polar plate |
| CN107039658B (en) * | 2017-03-08 | 2020-07-28 | 同济大学 | A low-cost method for mass production of metal plates |
| CN108212889A (en) * | 2018-01-09 | 2018-06-29 | 业成科技(成都)有限公司 | Vertical type washing equipment |
| CN111182736A (en) * | 2020-03-16 | 2020-05-19 | 佛山市恒灏科技有限公司 | Etching method and device |
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Granted publication date: 20091118 Termination date: 20130209 |