CN201345033Y - High-speed multi-beam parallel laser direct writing device - Google Patents
High-speed multi-beam parallel laser direct writing device Download PDFInfo
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- CN201345033Y CN201345033Y CN 200920067227 CN200920067227U CN201345033Y CN 201345033 Y CN201345033 Y CN 201345033Y CN 200920067227 CN200920067227 CN 200920067227 CN 200920067227 U CN200920067227 U CN 200920067227U CN 201345033 Y CN201345033 Y CN 201345033Y
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Abstract
一种适用于微纳加工的高速多光束并行激光直写装置，由刻写光源调制模块、刻写光头、离焦检测模块、照明与监控模块、样品位移台和主控模块组成，本实用新型提供多光束激光并行高速刻写，大大提高了刻写速度。可根据实际应用需要，将多光束的刻写子系统与不同运动方式的样品台组合成具有不同功能的刻写装置。
A high-speed multi-beam parallel laser direct writing device suitable for micro-nano processing, which is composed of a writing light source modulation module, a writing optical head, a defocus detection module, an illumination and monitoring module, a sample displacement stage and a main control module. The utility model provides multi-beam laser parallel high-speed writing, which greatly improves the writing speed. According to actual application needs, the multi-beam writing subsystem and the sample stage with different movement modes can be combined into a writing device with different functions.
Description
Technical field
The utility model relates to micro-nano manufacture field, particularly a kind of high-speed multi-beam parallel laser direct-writing device can be applicable to a plurality of fields such as MEMS (micro electro mechanical system) (being called for short MEMS) element manufacturing, semi-conductor chip maskless lithography, semiconductor mask making, binary optical device making.
Background technology
Nanosecond science and technology will become one of driving force that promotes the countries in the world economic development 21 century, will bring revolutionary change to industries such as medical science, manufacturing industry, material and information communications.A kind of as in numerous micro-nano manufacturing process of laser direct-writing technology, have plurality of advantages such as cost is low, the process-cycle short, use flexibly, environmental requirement is low, in microelectronics, integrated optics (DOEs), MEMS (micro electro mechanical system) (MEMs), hydrid integrated circuit, microwave integrated circuit making aspect obtain widespread use, are a kind of tool practical techniques with broad prospects for development.
Formerly in the technology, propose a kind of laser direct-writing device of micro-nano processing in the patent " modularized laser scribing device " (application number 200720072320.3), have certain advantage, but have the following disadvantages:
1. adopt the single beam pointwise to inscribe sample, inscription speed is slow excessively, needs overlong time when inscribing on a large scale sample.
2. there is not micro-monitor module, can't the observation sample surface condition.
3. samples vertical to be inscribed is subjected to gravity effect bigger in surface level, and can't clamping sample on a large scale.
4. be core controller with non real-time computing machine, control rate is slow, can't realize inscribing at a high speed.
Summary of the invention
The purpose of this utility model is to overcome the deficiency of above-mentioned technology formerly, and a kind of high-speed multi-beam parallel laser direct-writing device is provided, and require to arrive that inscription speed is fast, dirigibility is high, applied widely, the degree of modularity is high, extendability is strong characteristics.
Basic functional principle of the present utility model is: quilt is the multiple laser of separate modulation separately, after inscribing the object lens convergence, become a plurality of luminous points and focus on sample surfaces to be inscribed, intensity and the burst length of each Shu Jiguang of control directive sample surfaces when controlling the path movement that designs in advance on the sample edge are at the parallel X-Y scheme with intensity profile of inscribing out of the many luminous points of sample surfaces.
Technical solution of the present utility model is as follows:
A kind of high-speed multi-beam parallel laser direct-writing device, the composition of this device comprises:
Inscribe the modulation of source module, comprise a laser instrument, acousto-optic modulator and spectrum spectroscope;
Inscribe shaven head, form by focusing driver and inscription object lens;
The out of focus detection module is made up of semiconductor laser, first polarization spectroscope, second polarization spectroscope, cylindrical mirror, four-quadrant photo detector and temperature conditioning unit;
Illumination and monitoring module comprise lighting source, collimation lens, semi-transparent semi-reflecting lens, eyepiece and photo-sensitive cell;
The sample displacement platform comprises sample stage and sample;
Main control module comprises real-time controller and computing machine;
The position relation of above-mentioned component is as follows: described sample water level land clamping is on described sample stage, on a vertical main optical path, set gradually described photo-sensitive cell, eyepiece, semi-transparent semi-reflecting lens, second polarization spectroscope, spectrum spectroscope from top to bottom, inscribe object lens and sample, described photo-sensitive cell, eyepiece, semi-transparent semi-reflecting lens, second polarization spectroscope, spectrum spectroscope and inscribe the same optical axis of object lens; The vertical described sample surfaces of described main optical path;
Described acousto-optic modulator is positioned on the emitting light path of described laser instrument, described spectrum spectroscope is positioned on the diffracted beam light path of described acousto-optic modulator, spectroscopical reflecting surface of described spectrum and diffracted beam center angle at 45 is with main optical path angle at 45;
Described inscription object lens are fixed on the described focusing driver, and this focusing driver drives is inscribed object lens and moved the optical axis of described inscription object lens and the spectroscopical reflecting surface of described spectrum angle at 45 along the main optical path direction;
Described semiconductor laser sends the parallel laser behind collimation, successively by first polarization spectroscope, after the second polarization spectro mirror reflection, see through described spectrum spectroscope and inscribe the surface that object lens are focused at described sample along main optical path, the reflected light that is reflected by this sample surfaces returns along main optical path, see through described inscription object lens successively, the spectrum spectroscope, by the second polarization spectro mirror reflection, see through first polarization spectroscope, cylindrical mirror, finally drop on described 4 quadrant detector surface, described second polarization spectroscope, first polarization spectroscope, the same optical axis of cylindrical mirror and 4 quadrant detector, described temperature conditioning unit are wrapped in outside the semiconductor laser metal shell;
The incoherent divergent beams that described lighting source sends, behind described collimation lens collimation, by described semi-transparent semi-reflecting mirror reflection, see through second polarization spectroscope, spectrum spectroscope, inscribe object lens along main optical path, sample is inscribed the zone to throw light on, described eyepiece and described inscription object lens constitute microscope, and sample surfaces is imaged on the described photo-sensitive cell;
Described computing machine links to each other with real-time controller, described real-time controller links to each other respectively with described inscription modulation of source module, inscription shaven head, out of focus detection module, illumination and monitor module, sample stage, under the programmed control of described computing machine, drive each parts coordinated movement of various economic factors and carry out laser direct-writing.
Described laser instrument is gas laser, solid state laser or semiconductor laser,
Described focusing driver is the assembly of piezoelectric ceramic actuator, voice coil motor or displacement motor platform and piezoelectric ceramic actuator.
Described photo-sensitive cell is a charge-coupled image sensor, or CMOS (Complementary Metal Oxide Semiconductor).
Described lighting source is a LED source, or the optical fiber cold light source.
Between described acousto-optic modulator and the described spectrum spectroscope two telecentric lens groups are arranged.
The sample stage of described sample displacement platform is used for the clamping sample, drives sample along certain pre-designed path movement under programmed control.Described sample stage horizontal positioned is positioned at and inscribes the object lens below, and perpendicular with the inscription objective lens optical axis.Described sample stage is two-dimentional right angle platform, rotating disk or rotary drum, can select flexibly according to sample and graphics feature to be inscribed.
Described main control module comprises real-time controller and computing machine.Described computing machine links to each other with real-time controller, real-time controller links to each other with inscription modulation of source module, inscription shaven head, out of focus detection module, illumination and monitor module, the multiple-pulse generation of the motion of control example platform, inscription light source module and the servo focusing of inscription shaven head.Computing machine is responsible for handling man-machine interacting transaction, associative operation is converted to control command sends to real-time controller and carry out by it, and execution result is presented on the screen, checks for the user.
The course of work of utilizing above-mentioned multi-beam laser direct-writing device to process micro-nano device is as follows:
1. sample is placed on the sample stage and clamping good.
2. open lighting source, regulate the distance between sample stage and the inscription object lens, and the micro-image by show sample surface on the computer screen, observe the focusing situation, hot spot on screen hour, the interpret sample surface is basic in the depth of focus of object lens, thick focus adjustment success.
3. close lighting source, prevent to enter the out of focus detection module, influence focusing accuracy from the light of sample surfaces reflection.
4. open the power supply of semiconductor laser in the out of focus detection module, test sample surface defocusing amount, main control module elongates or shortens according to this defocusing amount FEEDBACK CONTROL focusing driver, regulates the distance of inscribing object lens and sample room, makes and inscribes object lens to the sample surfaces vernier focusing.In inscribing the sample process, focus on negative feedback and carry out always.
5. computing machine loads figure coordinate and the intensity data that the user need inscribe, and it is transferred to real-time controller.
6. real-time controller sends instruction according to graph data to be inscribed, and the control sample stage moves, and sends numeral or analog electrical pulsed modulation inscription light source synchronously, inscribes light source and sends the parallel light pulse of multi beam and be focused at sample surfaces, and sample is inscribed.
7. after inscription is finished, close semiconductor laser, open the lighting source power supply, observe the inscription situation by the image-forming information on the photo-sensitive cell that shows on the computer screen.
With respect to previous patent, the utlity model has following advantage:
1. adopt the directly parallel inscription of multiple beam, greatly improved inscription speed.
With sample plane by changing to parallelly with surface level with surface level is vertical, overcome the influence that gravity produces the sample clamping, the inplace stability of sample significantly improves, and sample that can multiple different size easy to setup.
3. increased illumination and micro-monitoring module, intuitively observation sample clamping and inscription process are avoided maloperation and blindly operation to greatest extent, prevent that mishap from taking place.
4. adopting real-time control system to replace original is the non real-time system of core with the computing machine, has greatly improved inscription speed and system reliability.
5. adopt temperature conditioning unit to stablize the semiconductor laser actuator temperature that out of focus detects usefulness, reduced the temperature drift of semiconductor laser, improved focusing accuracy.
In a word, the utility model adopts multi-beam parallel to inscribe, and the N that inscription speed is risen to single beam is (N is a number of light beams) doubly, and the N maximum can reach dozens of, has shortened the inscription time so greatly.Simultaneously, in the utility model, inscribe light source and other necessary function sub-modules and be integrated into the inscription subsystem, can select the sample displacement platform of appropriate exercise scope and precision according to actual needs for use, have very strong versatility
Description of drawings
Fig. 1 is the first example structure synoptic diagram of the utility model high-speed multi-beam parallel laser direct-writing device
Fig. 2 is the schematic diagram that the multiple beam of first embodiment is inscribed part
Fig. 3 is the second example structure synoptic diagram of the present utility model
Fig. 4 is the inscription part schematic diagram of second embodiment of the present utility model
Fig. 5 is for inscribing the first possibility schematic diagram of modulation of source module
Fig. 6 is for inscribing the second possibility schematic diagram of modulation of source module
Fig. 7 is the first possibility synoptic diagram of sample stage
Fig. 8 is the second possibility synoptic diagram of sample stage
Fig. 9 is the 3rd a possibility synoptic diagram of sample stage
Embodiment
The utility model is described in further detail below by embodiment and accompanying drawing, but should not limit protection domain of the present utility model with this.
First embodiment
See also Fig. 1 earlier, Fig. 1 is the general structure synoptic diagram of the utility model high-speed multi-beam parallel laser direct-writing device first embodiment, the ultimate principle figure that Fig. 2 inscribes for the present embodiment multiple beam.The utility model high-speed multi-beam parallel laser direct-writing device is made up of inscription modulation of source module 1, inscription shaven head 2, out of focus detection module 3, illumination and monitor module 4, sample displacement platform 5, main control module 6 six big modules.
Described inscription modulation of source module 1 comprises laser instrument 101, acousto-optic modulator 102, spectrum spectroscope 103.Described laser instrument 101 is gas, solid or semiconductor laser, is preferably semiconductor laser.The laser that 102 pairs of laser instruments 101 of spectrum spectroscope send has high reflectance, and other wavelength laser is had high-transmission rate.Described acousto-optic modulator 102 is ready-made product acousto-optic modulator 102a, and is corresponding with the carrier frequency of the radiofrequency signal that drives it from the diffraction of light angle of acousto-optic modulator 102a outgoing, and carrier frequency difference, angle of diffraction are also different.Described acousto-optic modulator 102a is driven by real-time controller 601, described real-time controller 601 can be by market purchasing, by the radio frequency signals drive acousto-optic modulator 102a that its inner Direct Digital Frequency Synthesizers (DDS) output is superimposed by a plurality of different frequencies, the light beam at the corresponding with it a plurality of different diffraction of this acousto-optic modulator 102a output angle.Modulate the amplitude of each CF signal, then can control corresponding diffracted beam intensity, regulate the frequency difference between each adjacent carrier frequency, then can change the angle of diffraction of corresponding light beam with it, and then change the spacing between each inscription point.
Described inscription shaven head 2 comprises focusing driver 201 and inscribes object lens 202,201 controls of focusing driver are inscribed object lens 202 and are moved along inscribing optical path direction, regulate the distance of inscribing between object lens 202 and the sample 501, the inscription beam focus is dropped on the sample surfaces all the time.Described focusing driver 201 can be the assembly of piezoelectric ceramic actuator (hereinafter to be referred as PZT), voice coil motor or displacement motor platform and PZT.Before a kind of range of movement less, but precision is higher, back two kinds of range of adjustment are bigger, can inscribe speed and the inscription scope is selected appropriate mode for use according to reality when specifically using.Described inscription object lens 202 have general-purpose interface, and are replaceable.
Described out of focus detection module 3 is made up of red light semiconductor laser 301, the first polarization spectro sheet 302, the second polarization spectro sheet 306, cylindrical mirror 303,4 quadrant detector 304 and temperature conditioning unit 305, this module adopts Astigmatism methord to carry out out of focus and surveys, temperature conditioning unit 305 is made up of semiconductor cooler, thermopair, feedback control circuit, be used for keeping the temperature stabilization of semiconductor laser 301, and then reduce the defocus error that causes by temperature variation, guaranteed focusing accuracy.
Described illumination and monitor module 4 are made up of lighting source 403, collimation lens 404, semi-transparent semi-reflecting lens 405, eyepiece 402, photo-sensitive cell 401, described eyepiece 402 and inscription object lens 202 constitute microscopes, with sample 501 surface imagings on photo-sensitive cell 401, and finally be presented on the display of computing machine 602, check sample clamping or inscription process for the user, to prevent unexpected the generation.Described lighting source 403 is led light source or optical fiber cold light source, and described photo-sensitive cell 401 is charge-coupled device (CCD) or CMOS (Complementary Metal Oxide Semiconductor) (CMOS).
Above-mentioned inscription Laser Modulation module 1, inscription shaven head 2, out of focus detection module 3, illumination and monitor module 4 four modules constitute inscribes subsystem, it has inscription, monitoring, three kinds of basic functions of out of focus detection, can with dissimilar sample displacement platform 5 flexible combination, realize different functions.
But described sample displacement platform 5 comprises the sample stage 502 that sample 501 and programmed control are moved, and sample stage 502 drives sample 501 and moves in perpendicular to the plane of inscribing laser beam under the control of computing machine 602.According to the difference of practical application, described sample stage 502 has following several possibility:
1) two-dimentional right angle platform, as shown in Figure 7
A) high-precision applications among a small circle, sample stage 502 adopts two-dimentional PZT platform.
B) low on a large scale precision applications, sample stage 502 adopts the planar stepping motor platform, and can add the range finding of grating chi.
C) large scale and high accuracy is used, and sample stage 502 adopts the mode of motor platform+PZT+ grating chi (or double frequency interferometer) range finding, and stepper motor is finished grand movement, and PZT finishes fine movement.
2) rotation platform, as shown in Figure 8, sample is fixed on the disk of rotation, is fit to inscribe circular pattern, as circular diffraction optical element.
3) rotary drum, as shown in Figure 9, sample is adhered on the circular drum of rotation.In the inscription process, when cylinder rotated, it was mobile gradually along the axis of cylinder to inscribe shaven head 2, then inscribes along spiral path
Described main control module 6 comprises real-time controller 601 and computing machine 602, and real-time controller 601 has following function at least:
1, in the inscription process according to the out of focus detection module) testing result carry out servo-focus control to inscribing object lens 202.
2, control sample stage 502 is along certain path movement.
3, be superimposed with the radiofrequency signal of a plurality of carrier frequency to acousto-optic modulator 102 outputs, synchro control acousto-optic modulator 102 sends the multiple beam pulse.
Described computing machine 602 is responsible for handling man-machine interacting transaction, associative operation is converted to control command sends to real-time controller 601 and allow its execution, and execution result is presented on the screen, checks for the user.
Fig. 5 is the schematic diagram of first possibility of inscription modulation of source module 1 of the present utility model, described acousto-optic modulator 102 is the acousto-optic modulator array 102b that are combined into by a plurality of acousto-optic crsytals, each acousto-optic crsytal all adopts independently, and piezoelectric crystal drives, employing has each piezoelectric crystal of radio frequency signals drive of certain frequency difference, then similar with the first optimum embodiment, also has different angle of diffraction from the acousto-optic modulator emitting laser, can regulate the intensity of each light beam by the amplitude of adjusting each CF signal, regulate frequency difference between each CF signal and regulate spacing between the adjacent inscription point.With respect to the first optimum embodiment, a little less than each interchannel phase mutual interference relatively, but acousto-optic modulator array manufacture difficulty strengthens.
Fig. 6 is second possibility inscribing modulation of source module 1.The inscription light source of inscribing in the modulation of source module 1 101 adopts a plurality of semiconductor laser array 101c that are packaged together, the divergencing laser that its each unit laser instrument sends is inscribed object lens 202 and is focused at the surface of sample 501, and the electric current of control module laser instrument can realize controlling the purpose of the laser power intensity of corresponding convergent point with it.With respect to embodiment one and possibility one, its light channel structure is simple relatively, but because the spacing between the semiconductor laser element is fixed, the spacing between the adjacent inscription point is non-adjustable.
Utilize the foregoing description device to carry out laser direct-writing, it is characterized in that comprising following operation steps:
1. sample 501 is placed on the sample stage 502 and clamping good.
2. regulate the distance between sample stage 502 and the inscription object lens 202, and the micro-image that passes through show sample 501 surfaces on computing machine 602 screens is observed the focusing situation, when the hot spot on the screen in hour basic depth of focus in interpret sample surface at object lens, thick focus adjustment success.
3. close lighting source 403, prevent that entering out of focus detection module 3 from the light of sample surfaces reflection influences focusing accuracy.
4. open the power supply of semiconductor laser 301 in the out of focus detection module 3, test sample 501 surperficial defocusing amounts, main control module 6 elongates or shortens according to this defocusing amount FEEDBACK CONTROL focusing driver 201, regulate the distance of 501 in inscription object lens 202 and sample, make and inscribe 202 pairs of samples of object lens, 501 surperficial vernier focusings.In inscribing the sample process, focus on negative feedback and carry out always.
5. computing machine 602 loads figure coordinate and the intensity data that the user need inscribe, and it is transferred to real-time controller 601.
6. real-time controller 601 sends instruction control sample stage 502 according to graph data to be inscribed and moves, and send numeral or analog electrical pulsed modulation synchronously and inscribe light source 101, inscribe light source 101 and send light pulse and be focused at sample 501 surfaces, sample 501 is inscribed.
7. after inscription is finished, close semiconductor laser 301, open the power supply of lighting source 403, observe the inscription situation by the image-forming information on the photo-sensitive cell 401 that shows on computing machine 602 display screens.
Second embodiment
The general structure synoptic diagram of second embodiment as shown in Figure 3, its principle of work is as shown in Figure 4.With respect to embodiment one, the characteristics of present embodiment are to add two telecentric lens groups 104 between described acousto-optic modulator 102 and described spectrum spectroscope 103, effect is that the light beam with the acousto-optic modulator outgoing expands bundle and is collected in the entrance pupil place that inscribes object lens 202, and make light beam be full of the entrance pupil of inscribing object lens 202, and then having littler focused light spot, the size of inscribing point is littler.
Claims (7)
1, a kind of high-speed multi-beam parallel laser direct-writing device is characterized in that the composition of this device comprises:
Inscribe modulation of source module (1), comprise a laser instrument (101), acousto-optic modulator (102) and spectrum spectroscope (103);
Inscribe shaven head (2), form by focusing driver (201) and inscription object lens (202);
Out of focus detection module (3) is made up of semiconductor laser (301), first polarization spectroscope (302), second polarization spectroscope (306), cylindrical mirror (303), four-quadrant photo detector (304) and temperature conditioning unit (305);
Illumination and monitoring module (4) comprise lighting source (403), collimation lens (404), semi-transparent semi-reflecting lens (405), eyepiece (402) and photo-sensitive cell (401);
Sample displacement platform (5) comprises sample stage (502) and sample (501);
Main control module (6) comprises real-time controller (601) and computing machine (602);
The position of above-mentioned component relation is as follows: described sample (501) flatly clamping on described sample stage (502), on a vertical main optical path, set gradually described photo-sensitive cell (401), eyepiece (402), semi-transparent semi-reflecting lens (405), second polarization spectroscope (306), spectrum spectroscope (103) from top to bottom, inscribe object lens (202) and sample (501), described photo-sensitive cell (401), eyepiece (402), semi-transparent semi-reflecting lens (405), second polarization spectroscope (306), spectrum spectroscope (103) and the same optical axis of inscription object lens (202); The vertical described sample of described main optical path (501) surface;
Described acousto-optic modulator (102) is positioned on the emitting light path of described laser instrument (101), described spectrum spectroscope (103) is positioned on the diffracted beam light path of described acousto-optic modulator (102), the reflecting surface of described spectrum spectroscope (103) and diffracted beam center angle at 45 is with main optical path angle at 45;
Described inscription object lens (202) are fixed on the described focusing driver (201), this focusing driver (201) drives inscription object lens (202) and moves the reflecting surface angle at 45 of the optical axis of described inscription object lens (202) and described spectrum spectroscope (103) along the main optical path direction;
Described semiconductor laser (301) sends the parallel laser behind collimation, successively by first polarization spectroscope (302), after second polarization spectroscope (306) reflection, see through described spectrum spectroscope (103) and inscribe the surface that object lens (202) are focused at described sample (501) along main optical path, seen through described inscription object lens (202) by the reflected light of this sample (501) surface reflection successively along main optical path, spectrum spectroscope (103), reflected by second polarization spectroscope (306), see through first polarization spectroscope (302), cylindrical mirror (303), finally drop on described 4 quadrant detector (304) surface, described second polarization spectroscope (306), first polarization spectroscope (302), cylindrical mirror (303) and the same optical axis of 4 quadrant detector (304), described temperature conditioning unit (305) are wrapped in outside semiconductor laser (301) metal shell;
The incoherent divergent beams that described lighting source (403) sends, behind described collimation lens (404) collimation, reflected by described semi-transparent semi-reflecting lens (405), see through second polarization spectroscope (306), spectrum spectroscope (103), inscribe object lens (202) along main optical path, sample (501) is inscribed the zone to throw light on, described eyepiece (402) and described inscription object lens (202) constitute microscope, with sample (501) surface imaging on described photo-sensitive cell (401);
Described computing machine (602) links to each other with real-time controller (601), described real-time controller (601) links to each other respectively with described inscription modulation of source module (1), inscription shaven head (2), out of focus detection module (3), illumination and monitor module (4), sample stage (502), under the programmed control of described computing machine (602), drive each parts coordinated movement of various economic factors and carry out laser direct-writing.
2, high-speed multi-beam parallel laser direct-writing device according to claim 1 is characterized in that described described laser instrument (101) is gas laser, solid state laser, semiconductor laser or a plurality of semiconductor laser array.
3, high-speed multi-beam parallel laser direct-writing device according to claim 1 is characterized in that described focusing driver (201) is the assembly of piezoelectric ceramic actuator, voice coil motor or displacement motor platform and piezoelectric ceramic actuator.
4, high-speed multi-beam parallel laser direct-writing device according to claim 1 is characterized in that described photo-sensitive cell (401) is a charge-coupled image sensor, or CMOS (Complementary Metal Oxide Semiconductor).
5, high-speed multi-beam parallel laser direct-writing device according to claim 1 is characterized in that described lighting source (403) is LED source, or the optical fiber cold light source.
6, high-speed multi-beam parallel laser direct-writing device according to claim 1 is characterized in that described sample stage (502) is two-dimentional right angle platform, rotating disk or rotary drum.
7,, it is characterized in that between described acousto-optic modulator (102) and described spectrum spectroscope (103), two telecentric lens groups (104) being arranged according to each described high-speed multi-beam parallel laser direct-writing device of claim 1 to 6.
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| CN101477306B (en) * | 2009-01-21 | 2011-04-06 | 中国科学院上海光学精密机械研究所 | high-speed multi-beam parallel laser direct writing device |
| CN102122118A (en) * | 2011-02-23 | 2011-07-13 | 中国科学院上海光学精密机械研究所 | Laser direct writing device |
| CN102248284A (en) * | 2011-06-03 | 2011-11-23 | 中国科学院上海光学精密机械研究所 | Raster high-speed direct writing device |
| CN102253605A (en) * | 2011-07-07 | 2011-11-23 | 中国科学院上海光学精密机械研究所 | Multiple parallel laser beam grating direct writing device and grating direct writing method |
| CN102385151A (en) * | 2010-08-30 | 2012-03-21 | 徕卡显微系统复合显微镜有限公司 | Microscope including micro and macro objectives |
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