CN201245277Y - Light shield box - Google Patents

Abstract

A mask box structure, and more particularly, to a mask box with a positioning member. The mask box is formed by combining a top cover and a base to form an inner space for accommodating a mask, the base comprises at least one positioning piece which is arranged on the upper surface of the base facing the top cover, wherein the joint end of the positioning piece and the base is provided with a first central area and at least two first side areas, and a section difference is formed between the first central area and the first side areas.

Description

Mask box

technical field

The utility model relates to a photomask box, in particular to a photomask box with positioning parts.

Background technique

The rapid development of modern semiconductor technology, in which optical lithography (Optical Lithography) plays an important role, as long as it is about the definition of graphics (pattern), it needs to rely on optical lithography. Optical lithography technology in the application of semiconductors is to make the designed circuit into a light-transmitting mask with a specific shape. Using the exposure principle, the light source is projected onto the silicon wafer (silicon wafer) through the mask to expose and display specific pattern. Since any slight damage on the mask will cause the quality of projection imaging to deteriorate, the mask used to generate graphics must be kept absolutely intact and clean, so the firmness and stability of the mask box, and whether it can indeed provide a safe It is very important to place the mask in the environment.

Generally, when the pod is operated on the machine, in order to make the robot arm operate accurately and smoothly, the photomask is placed in the pod at a specified height. However, when the positioning part of the known pod is fixed on the base, due to There is a metal sheet on the base, so when the positioning part is fixed, it will cause height error due to the relationship between it and the metal sheet, which may affect the operation of the robot arm, so that the photomask cannot be placed on the machine. If it is taken out smoothly, it may also damage the photomask due to improper removal.

At the same time, it is known that the error caused by the height of the photomask box may make the photomask placed in the box unable to be in a stable and balanced state. If the photomask is not properly protected by a good-quality photomask box during transportation or operation, the chance of damage is inevitable. It will increase or reduce the service life of the photomask, which will affect the product yield, or even make it impossible to continue to use, resulting in waste and increased use costs.

Utility model content

The purpose of this utility model is to provide a photomask box, in order to overcome the defects in the known technology.

In order to achieve the above object, the mask box provided by the utility model includes:

a top cover;

A base is used to combine with the top cover to form an inner space that can accommodate the photomask, the base includes;

At least one positioning piece is arranged on the upper surface of the base facing the top cover, wherein the joint end of the positioning piece and the base has a first central area and at least two first side areas, wherein the first central area There is a difference from the first side regions.

In the pod, the positioning member can be fixed on the base by at least one locking member.

In the photomask pod, the locking member can be a pin, rivet or screw.

In the photomask pod, the locking piece can be made of stainless steel.

In the photomask pod, the locking member can be made of PEEK.

In the pod, the step difference of the positioning member may be about 0.1 mm to about 0.5 mm.

In the pod, the positioning member can be formed of a polymer material.

In the pod, the polymer material of the positioning member can be polyether ether ketone compound or polyimide compound.

In the pod, the positioning member can be formed of a static dissipative material.

In the pod, the resistance value of the static dissipative material of the positioning member may be about 10 ⁴ to about 10 ¹¹ Ω.

In the pod, the positioning part can be a limiting part.

In the pod, the positioning part can be a fixing part.

The reticle pod, wherein the reticle pod may be a reticle transfer pod.

The pod, wherein the base has at least one first locking hole, the positioning member has a second locking hole corresponding to the first locking hole, and the locking member will pass through the first locking hole And the second locking hole, and fix the positioning piece on the base.

In the pod, the base includes at least one locking seat having the first locking hole, the locking seat is made of a first material, and the base is made of a second material.

In the pod, the first material and the second material can be different materials.

In the pod, the first material can be metal, and the second material can be polymer material.

In the photomask pod, the locking seat can be embedded in the base.

The utility model also provides a photomask box, comprising:

a top cover;

A base is used to combine with the top cover to form an inner space that can accommodate the photomask, the base includes;

At least one positioning piece is arranged on the upper surface of the base facing the top cover, wherein the positioning piece has a second central area and at least two second side areas at the end corresponding to the top cover, wherein the second central The region has a reinforced structure.

In the pod, the positioning member can be formed of a polymer material.

In the pod, the polymer material of the positioning member can be polyetheretherketone or polyimide.

In the pod, the positioning member can be formed of a static dissipative material.

In the pod, the resistance value of the static dissipative material of the positioning member may be about 10 ⁴ to about 10 ¹¹ Ω.

In the pod, the positioning part can be a limiting part.

In the pod, the positioning part can be a fixing part.

The reticle pod, wherein the reticle pod may be a reticle transfer pod.

The utility model also provides a photomask box, comprising:

a top cover;

A base is used to combine with the top cover to form an inner space that can accommodate the photomask, the base includes;

At least one positioning piece is arranged on the upper surface of the base facing the top cover, wherein at least one supporting piece is arranged on the positioning piece, and the upper end of the supporting piece has a dot-shaped protrusion for supporting the photomask.

In the pod, the support member can be a polyetheretherketone compound or a polyimide compound.

In the photomask pod, the support member can be made of static dissipative material.

In the pod, the resistance value of the static dissipative material of the support member may be about 10 ⁴ to about 10 ¹¹ Ω.

In the pod, the positioning member can be integrally formed.

In the pod, the positioning member and the supporting member may be made of different materials.

The utility model has the following effects:

The photomask pod of the present invention has a step difference, which reduces the height error when the positioning member is combined with the base, and the step difference reduces the risk of photomask damage when the photomask pod is operated on the machine.

The mask box of the utility model has a strengthening structure. These strengthening structures can make the positioning member stronger, and further properly provide complete support and protection for the photomask.

In the photomask box of the utility model, the dot-shaped protrusions can keep the photomask and the base at the minimum and necessary supporting area, avoid damage to the photomask due to unnecessary friction, and improve the service life of the photomask.

In the photomask box of the utility model, the assembling method of the positioning parts is convenient for dismantling and replacing damaged limiting parts.

In the photomask box of the utility model, the assembling method of the locating parts can avoid waste caused by partial damage or wear and lead to increased use cost.

The photomask box of the utility model has reinforced structures, and the shape design of these reinforced structures can save materials and reduce costs.

Description of drawings

FIG. 1 is a schematic diagram of a photomask pod.

Fig. 2A is a schematic diagram of an embodiment of the positioning member of the present invention.

Fig. 2B is a schematic diagram of the level difference of an embodiment of the positioning member of the present invention.

FIG. 3 is a schematic diagram of an embodiment of a pod base and a positioning member of the present invention.

Fig. 4 is a schematic diagram of another embodiment of the positioning member of the present invention.

Fig. 5 is a side view of another embodiment of the positioning member of the present invention.

Fig. 6 is a schematic diagram of another embodiment of the positioning member of the present invention.

Explanation of main component symbols in the attached drawings:

1 mask box

10 top cover

12 base

14 Positioning parts

16 First central area

18 First side area

20 steps

22 locks

24 The first locking hole

26 Second locking hole

28 Locking seat

30 Positioning parts

32 Second central area

34 Second side area

36 Strengthen the structure

38 Positioning parts

40 Supports

42 dot bumps

Detailed ways

The photomask box with a positioning part of the utility model is composed of a top cover and a base to form an inner space for accommodating a photomask. The upper surface of the cover, wherein the joint end of the positioning member and the base has a first central area and at least two first side areas, wherein there is a difference between the first central area and the first side areas, This level difference reduces height errors when the positioning member is combined with the base.

In addition, the photomask pod further includes a locating element disposed on the upper surface of the base facing the top cover, wherein the end of the locating element corresponding to the top cover has a second central area and at least two second sides region, wherein the second central region has a strengthening structure. These strengthening structures can make the positioning member stronger, and further properly provide complete support and protection for the photomask.

At the same time, at least one supporting member is arranged on the positioning member, and the upper end of the supporting member is provided with a dot-shaped protrusion for supporting the photomask. The dot-shaped bump can keep the minimum and necessary support area between the photomask and the base, and avoid damage to the photomask due to unnecessary friction.

Since the detailed manufacturing or processing process of some of the photomasks or pods used in the pod with positioning parts disclosed in the utility model is achieved by using the existing technology, it is not complete in the following description describe. Moreover, the accompanying drawings in the following are not completely drawn according to the actual relevant dimensions, and their function is only to express the schematic diagrams related to the features of the present utility model.

Please refer to FIG. 1 , which is a schematic diagram of a photomask box. A photomask box 1 is composed of a top cover 10 and a base 12 to form an inner space for accommodating a photomask (not shown), and the base includes ; At least one positioning member 14 is disposed on the upper surface of the base 12 facing the top cover 10 .

Please refer to FIG. 2A, which is a schematic diagram of a preferred embodiment of the utility model pod, wherein the joint end of the positioning member 14 and the base 12 has a first central area 16 and at least two first side areas 18, wherein There is a difference 20 between the first central area 16 and the first side areas 18 . Please refer further to FIG. 2B , which is a schematic diagram of the step difference of a preferred embodiment of the photomask box of the present invention. The step difference 20 is about 0.1 to about 0.5 mm, generally for the convenience of abutment operation, from the lowest point of the base 12 to the positioning member 14 The height before the highest point is 32mm, and the tolerance must not exceed plus or minus 0.2mm, and its function is to reduce the error of height when the positioning member 14 is combined with the base 12.

Next, see FIG. 3 , which is a schematic diagram of an embodiment of the base of the utility model and the positioning member. The above-mentioned positioning member 14 can be a limiting member or a fixing member, so at least one locking member 22 is fixed on the base 12. , wherein the positioning member 14 is embedded and fixed on the base 12, the locking member 22 can be a pin, rivet or screw, and can be made of stainless steel or PEEK (polyetheretherketone, polyether ether ketone). 22 is used to properly fix the positioning member 14 on the base 12; and the above-mentioned positioning member 14 can be formed of a polymer material, and the polymer material is a polyether ether ketone compound or a polyimide compound; the positioning The element 14 can also be a static dissipative material, and the resistance of the static dissipative material is about 10 ⁴ to about 10 ¹¹ Ω, and the above materials can be freely adjusted according to the combination.

The photomask pod 1 above can be a photomask transfer box, wherein the base has at least one first locking hole 24, the positioning member 14 has a second locking hole 26 corresponding to the first locking hole 24, and the lock The firmware will pass through the first locking hole 24 and the second locking hole 26, and fix the positioning member 14 on the base 12, the base 12 includes at least one locking seat 28, and the locking seat 28 is embedded In the base 12, it has a first locking hole 24, the locking seat 28 is formed of a first material, and the base 12 is formed of a second material, wherein the first material and the second material can be different materials , the first material can be metal, and the second material can be polymer material, and the above materials can be freely adjusted according to the needs of the combination.

Fig. 4 is a schematic diagram of another embodiment of the positioning member of the present invention, and Fig. 5 is a side view of the embodiment, which includes a photomask box 1, a top cover 10 combined with a base 12 to form an internal space that can accommodate light Cover, the base 12 includes at least one positioning piece 30, the positioning piece 30 can be a limiting piece or a fixing piece, and is arranged on the upper surface of the base 12 facing the top cover 10, the base 12 includes at least one positioning piece A member 30 is disposed on the upper surface of the base 12 facing the top cover 10, wherein the positioning member 30 has a second central area 32 and at least two second side areas 34 at the end corresponding to the top cover 10, wherein The second central region 32 has a strengthening structure 36, and these strengthening structures can make the positioning member stronger, and further properly provide complete support and protection for the photomask.

The schematic diagram of another embodiment of the present invention is shown in FIG. 6 , a photomask box 1, which includes: a top cover 10 combined with a base 12 to form an inner space for accommodating a photomask, and the base includes at least one positioning member 38 , is arranged on the upper surface of the base 12 facing the top cover 10, wherein at least one supporting member 40 is arranged on the positioning member 38, and the upper end of the supporting member 40 has a dot-shaped protrusion 42 for supporting the photomask. The dot-shaped protrusions 42 can keep the minimum and necessary support area between the mask and the base 12, avoid unnecessary friction to damage the mask, and improve the life of the mask.

The material of the support member 40 can be polyether ether ketone compound, polyimide compound or static dissipative material, and the resistance value of the static dissipative material is about 10 ⁴ to about 10 ¹¹ Ω. Meanwhile, the positioning member 38 can be Formed integrally, the positioning member 38 and the supporting member 40 can also be made of different materials.

The above description is only a preferred embodiment of the present utility model, and is not intended to limit the scope of claims of the present utility model; simultaneously, the above description should be clear and implementable for those skilled in the art, so others do not depart from the present invention. Equivalent changes or modifications accomplished under the spirit disclosed by the utility model shall be included in the scope of the claims of the application.

Claims (22)

1, a kind of box for photomask comprises:

One top cover;

One pedestal with this top cover combination, forms an inner space and can hold light shield, and this pedestal comprises;

At least one locations, be arranged at the upper surface of this seat surface to this top cover, it is characterized in that this locations and this pedestal abutting end have one first middle section and zone, at least two first sides, wherein have one section difference between this first middle section and those zones, first side.

2, box for photomask as claimed in claim 1 is characterized in that, wherein this locations is fixedly arranged on this pedestal with at least one locking part.

3, box for photomask as claimed in claim 2 is characterized in that, wherein this locking part is a latch, rivet or screw.

4, box for photomask as claimed in claim 2 is characterized in that, wherein this locking part is stainless steel or PEEK material.

5, box for photomask as claimed in claim 1 is characterized in that, wherein this of this locations section difference is 0.1～0.5mm.

6, box for photomask as claimed in claim 1 is characterized in that, wherein this locations is a High molecular material.

7, box for photomask as claimed in claim 6 is characterized in that, wherein this High molecular material is polyetheretherketone compounds or polyimide compounds.

8, box for photomask as claimed in claim 1 is characterized in that, wherein this locations is an electrostatic dissipation material.

9, box for photomask as claimed in claim 8 is characterized in that, wherein this electrostatic dissipation material resistance value is 10 ⁴～10 ¹¹Ω.

10, box for photomask as claimed in claim 1 is characterized in that, wherein this locations is limited part or connecting element.

11, box for photomask as claimed in claim 1 is characterized in that, wherein this box for photomask is that light shield transmits box.

12, box for photomask as claimed in claim 1, it is characterized in that, wherein this pedestal has at least one first locking hole, this locations has one second locking hole to should first locking hole, and this locking part can run through this first locking hole and second locking hole, and this locations is fixed in this pedestal.

13, box for photomask as claimed in claim 12 is characterized in that, this pedestal comprises at least one locking seat and has this first locking hole, and this locking seat is first material, and this pedestal is second material.

14, box for photomask as claimed in claim 13 is characterized in that, wherein this first material and second material are unlike material.

15, box for photomask as claimed in claim 14 is characterized in that, wherein this first material is a metal, and this second material is a High molecular material.

16, box for photomask as claimed in claim 13 is characterized in that, wherein this locking seat is embedded at this pedestal.

17, a kind of box for photomask comprises:

One top cover;

One pedestal with this top cover combination, forms an inner space and can hold light shield, and this pedestal comprises;

At least one locations is arranged at the upper surface of this seat surface to this top cover, it is characterized in that, wherein this locations has one second middle section and zone, at least two second sides with the corresponding end of this top cover, and wherein this second middle section has a reinforced structure.

18, a kind of box for photomask comprises:

One top cover;

One pedestal with this top cover combination, forms an inner space and can hold light shield, and this pedestal comprises;

At least one locations is arranged at the upper surface of this seat surface to this top cover, it is characterized in that, establishes at least one strut member on this locations, and this strut member upper end tool one is in order to hold the point-like projection of this light shield.

19, box for photomask as claimed in claim 18 is characterized in that, wherein this strut member is polyetheretherketone compounds or polyimide compounds.

20, box for photomask as claimed in claim 18 is characterized in that, wherein this strut member is the electrostatic dissipation material.

21, box for photomask as claimed in claim 18 is characterized in that, wherein this locations is one of the forming.

22, box for photomask as claimed in claim 18 is characterized in that, wherein this locations and this strut member are unlike material.

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