CN207908856U - A double-sided exposure machine - Google Patents

Abstract

The utility model relates to a film equipment technical field, concretely relates to two-sided exposure machine, including first exposure mechanism, second exposure mechanism and tilting mechanism, first exposure mechanism includes that first exposure device and slip set up in the first exposure platform of first exposure device below, first exposure platform is provided with first aligning device that makes a video recording, second exposure mechanism includes that second exposure device and slip set up in the second exposure platform of second exposure device below, second exposure platform is provided with the second aligning device that makes a video recording. The utility model relates to a two-sided exposure machine adopts the aligning device that makes a video recording to treat the exposure material and exposes, counterpoints for traditional manual, and the counterpoint is more accurate.

Description

A double-sided exposure machine

technical field

The utility model relates to the technical field of film equipment, in particular to a double-sided exposure machine.

Background technique

At present, an exposure machine refers to a machine device that transfers image information on a film or other transparent body to a surface coated with a photosensitive substance by turning on the light source to emit light. The exposure machine has a single-side exposure machine and a double-side exposure machine. Compared with the single-side exposure machine, the double-side exposure machine adds a flip mechanism to turn the photosensitive material to the back for exposure. However, whether it is a single-side exposure machine or a double-side exposure machine, alignment is required. The traditional operation is to manually align the mark points of the exposure material with the mark points of the film, and then use double-sided tape to bond the two and place them in the exposure position. camera exposure. The accuracy of this operation method is not high, and there is a large displacement. At the same time, the efficiency of manual alignment is slow, which greatly reduces the production efficiency.

Utility model content

The purpose of this utility model is to provide a double-sided exposure machine for the above-mentioned shortcomings in the prior art, which uses a camera alignment device to expose the material to be exposed. Compared with the traditional manual alignment, the alignment is more accurate.

The purpose of this utility model is achieved through the following technical solutions:

A double-sided exposure machine, comprising a first exposure mechanism for exposing one side of a material, a second exposure mechanism for exposing the other side of a material, and a surface for turning over the material processed by the first exposure mechanism The turning mechanism of the first exposure mechanism includes a first exposure device and a first exposure platform slidingly arranged under the first exposure device, the first exposure platform is provided with a first camera alignment device, and the second exposure The mechanism includes a second exposure device and a second exposure platform slidingly arranged under the second exposure device, and the second exposure platform is provided with a second camera alignment device.

Wherein, the first exposure platform includes a first bearing seat for carrying external induction materials, and a first drive assembly for driving the first bearing base to move, and the first bearing base includes a first mobile base, which is movably arranged on The first exposure plate of the first mobile base and the first adjustment mechanism for adjusting the angle and position of the first exposure plate, the first camera alignment device is arranged on the first mobile base, and the first drive assembly is used to drive the first The mobile base moves; the second exposure platform includes a second bearing seat for carrying external induction materials, a second drive assembly for driving the second bearing base to move, and the second bearing base includes a second mobile base, a movable The second exposure plate set on the second mobile base and the second adjustment mechanism for adjusting the angle and position of the second exposure plate, the second camera alignment device is set on the second mobile base, and the second drive assembly is used to drive The second mobile base moves.

Wherein, the first exposure device includes a first exposure assembly for mounting film, a first exposure light source for exposing the first exposure assembly, and the first exposure assembly includes a first exposure frame plate, a card The first loading plate set on the first exposure frame plate and the first suction nozzle for absorbing the external film close to the lower surface of the first loading plate, the first loading plate is provided with a first passage communicating with the first suction nozzle hole; the second exposure device includes a second exposure assembly for mounting film, a second exposure light source for exposing the second exposure assembly, and the second exposure assembly includes a second exposure frame plate, a card The second loading plate arranged on the second exposure frame plate and the second suction nozzle for absorbing the external film close to the lower surface of the second loading plate, the second loading plate is provided with a second passage communicating with the second suction nozzle hole.

Wherein, the first exposure assembly also includes a first vacuum nozzle for vacuuming, the second exposure assembly also includes a second vacuum nozzle for vacuuming, the first loading plate and the first exposure The plate forms a first space for accommodating the external film and the base material, and the first loading plate and the second exposure plate form a second space for accommodating the external film and the base material.

Wherein, the first exposure assembly and the second exposure assembly also include an alignment light source for exposure alignment, and the alignment light source includes an alignment lamp and a driving cylinder for driving the alignment lamp to extend or retract .

Wherein, the first exposure assembly and the second exposure assembly also include an energy detection device for detecting the energy intensity of the exposure light source. The light source is connected to the second exposure light source.

Wherein, both the first exposure device and the second exposure device further include a cleaning device for cleaning the substrate, and the cleaning device includes two cleaning rollers arranged side by side.

Wherein, the double-sided exposure machine also includes a feeding mechanism, and the feeding mechanism includes a feeding bracket, a feeding seat slidably arranged on the feeding bracket, and an ejection assembly for ejecting the materials in the feeding seat , the feeding seat includes a feeding frame slidably arranged on the feeding bracket and a feeding baffle slidably arranged on the feeding bracket, the feeding frame is provided with an adjustment groove, and the feeding baffle is slidingly arranged in the adjustment slot.

Wherein, the turning mechanism includes a turning bracket, a first turning carrier for carrying and transporting the materials processed by the first exposure mechanism, a turning motor for driving the first turning carrier to turn over, and a turning motor for receiving the first turning The second inverting carrier plate for the materials conveyed by the transfer plate, the first inverting carrier plate is provided with adsorption holes for absorbing materials.

Beneficial effects of the utility model: a double-sided exposure machine of the utility model uses a camera alignment device to expose the material to be exposed, and compared with the traditional manual alignment, the alignment is more accurate.

Description of drawings

Utilize accompanying drawing to further illustrate the utility model, but the embodiment in the accompanying drawing does not constitute any restriction to the present utility model, for those of ordinary skill in the art, under the premise of not paying creative work, also can obtain according to following accompanying drawing Additional drawings.

Fig. 1 is the structural representation of the utility model.

Fig. 2 is a schematic structural view of the first exposure platform of the present invention.

FIG. 3 is a schematic structural view of the first exposure device of the present invention.

Fig. 4 is a partial structural schematic diagram of the first exposure device of the present invention.

Fig. 5 is a partial structural schematic diagram of the first exposure assembly of the present invention.

Fig. 6 is a schematic structural view of the first loading plate of the present invention.

FIG. 7 is a schematic diagram of the assembly structure of the second exposure device and the second exposure platform of the present invention.

Fig. 8 is a schematic structural view of the second bearing seat of the present invention.

FIG. 9 is a schematic structural view of the second exposure mechanism of the present invention.

Fig. 10 is a partial structural schematic diagram of the second exposure mechanism of the present invention.

Fig. 11 is a schematic structural view of the second loading plate of the present invention.

Fig. 12 is a structural schematic diagram of the turning mechanism of the utility model.

Fig. 13 is a structural schematic diagram of the feeding mechanism of the utility model.

Reference signs include:

1 - the first exposure agency;

11—the first exposure device; 111—the first exposure assembly; 1111—the first exposure frame plate; 1112—the first loading plate; 11121—the first through hole; 1113—the first suction nozzle; 1114 ——First vacuum nozzle; 1115——Alignment lamp; 1116——Drive cylinder; 1117——Energy detection device; 112——First exposure light source; 113——Cleaning device; 12——First exposure platform; 121—the first camera alignment device; 122—the first bearing seat; 1221—the first mobile base; 1222—the first exposure plate; 1223—the first adjustment mechanism; 123—the first drive assembly;

2 - the second exposure agency;

21—the second exposure device; 211—the second exposure assembly; 2111—the second exposure frame plate; 2112—the second loading plate; 21121—the second through hole; 2113—the second suction nozzle; 2114 - the second vacuum nozzle; 212 - the second exposure light source;

22—the second exposure platform; 221—the second camera alignment device; 222—the second bearing seat; 2221—the second moving base; 2222—the second exposure plate; 2223—the second adjustment mechanism; 223——the second drive assembly;

3——turning mechanism; 31——turning bracket; 32——turning motor; 33——first turning carrier; 331——adsorption hole; 34——second turning carrier;

5——feeding mechanism; 51——feeding bracket; 52——feeding seat; 521——feeding frame; 5211——regulating groove; 522——feeding baffle.

Detailed ways

The utility model will be further described in conjunction with the following embodiments and accompanying drawings.

As shown in Fig. 1, Fig. 2, Fig. 3, Fig. 7 and Fig. 8, a kind of double-sided exposure machine of the present embodiment comprises a first exposure mechanism 1 for exposing one side of the material, another for exposing the material The second exposure mechanism 2 for exposure on one side and the turning mechanism 3 for turning over the material processed by the first exposure mechanism 1. The first exposure mechanism 1 includes a first exposure device 11 and is slidably arranged on the first exposure The first exposure platform 12 below the device 11, the first exposure platform 12 is provided with a first camera alignment device 121, the second exposure mechanism 2 includes a second exposure device 21 and is slidably arranged under the second exposure device 21 The second exposure platform 22 is provided with a second camera alignment device 221 . When performing exposure, the substrate is placed on the first exposure platform 12, and the first camera alignment device 121 performs the first alignment on the substrate, so that the marking point of the substrate appears in the center of the field of view of the first camera alignment device 121, The first exposure platform 12 slides to directly below the first exposure device 11, and the first camera alignment device 121 performs a second alignment on the substrate, so that the marking points on the film in the first exposure device 11 coincide with the marking points on the substrate, The first exposure device 11 exposes the substrate to complete the double-side exposure operation of the substrate.

As shown in FIG. 2 , FIG. 7 and FIG. 8 , the first exposure platform 12 of this embodiment includes a first bearing seat 122 for carrying external sensing materials, and a first driving assembly 123 for driving the first bearing base 122 to move. The first bearing seat 122 includes a first moving base 1221, a first exposure plate 1222 movably arranged on the first moving base 1221, and a first adjustment mechanism 1223 for adjusting the angle and position of the first exposure plate 1222, the first The camera alignment device 121 is arranged on the first mobile base 1221, the first driving assembly 123 is used to drive the first mobile base 1221 to move; the second exposure platform 22 includes a second bearing seat 222 for carrying external sensing materials . The second driving assembly 223 for driving the second bearing base 222 to move, the second bearing base 222 includes a second moving base 2221, a second exposure plate 2222 movably arranged on the second moving base 2221 and a second exposure plate 2222 for adjusting the second The second adjustment mechanism 2223 for the angle and position of the second exposure plate 2222 , the second camera alignment device 221 is arranged on the second moving base 2221 , and the second driving component 223 is used to drive the second moving base 2221 to move. Specifically, the first driving assembly 123 drives the first moving seat to move and slide out, the substrate is placed on the surface of the first exposure plate 1222, the first camera alignment device 121 performs the first alignment on the substrate, and the first adjustment mechanism 1223 adjusts the first exposure plate 1222 so that the marking point on the substrate placed on the first exposure plate 1222 appears in the center of the field of view of the first camera alignment device 121, and the first drive assembly 123 drives the first moving base to move to the second Directly below the exposure device 11, the first camera alignment device 121 performs a second alignment on the substrate, so that the marks on the film in the first exposure device 11 coincide with the marks on the substrate placed on the first exposure plate 1222, The first exposure device 11 exposes the base material to complete one-side exposure treatment of the base material. Similarly, the substrate processed by the first exposure mechanism 1 is turned over by the turnover mechanism 3. Specifically, the second driving assembly 223 drives the second moving seat to move and slide out, and the substrate is placed on the side of the second exposure plate 2222. On the surface, the second camera alignment device 221 performs the first alignment on the base material, and the second adjustment mechanism 2223 adjusts the second exposure plate 2222 so that the marking points on the base material placed on the second exposure plate 2222 appear at the first In the center of the field of view of the second camera alignment device 221, the second drive assembly 223 drives the second moving seat to move to the right below the second exposure device 21, so that the film marking point in the second exposure device 21 is aligned with the second exposure flat plate 2222. The marking points on the substrate are overlapped, and the second exposure device 21 exposes the substrate to complete the double-sided exposure process of the substrate.

As shown in FIGS. 4 to 11 , the first exposure device 11 of this embodiment includes a first exposure assembly 111 for mounting a film, and a first exposure light source 112 for exposing the first exposure assembly 111 . The first exposure assembly 111 includes a first exposure frame plate 1111, a first loading plate 1112 clamped on the first exposure frame plate 1111, and a first suction nozzle 1113 for sucking the external film close to the lower surface of the first loading plate 1112 , the first loading plate 1112 is provided with a first through hole 11121 communicating with the first suction nozzle 1113; the second exposure device 21 includes a second exposure assembly 211 for mounting a film, for exposing the second exposure The second exposure light source 212 for exposure by the component 211, the second exposure component 211 includes a second exposure frame plate 2111, a second loading plate 2112 clamped on the second exposure frame plate 2111 and a film for absorbing the outside world The second suction nozzle 2113 on the lower surface of the second loading plate 2112 is provided with a second through hole 21121 communicating with the second suction nozzle 2113 . Before exposure, the film is adsorbed by the first suction nozzle 1113 and adhered to the lower surface of the first loading plate 1112, and the first exposure platform 12 carrying the substrate is slid to directly below the first exposure device 11, and the first The exposure light source 112 exposes the first exposure platform 12 to complete the exposure on one side of the substrate. The first shaking platform slides out to replace the substrate, and continues to slide directly under the first exposure device 11. Repeat the operation in this way. Multiple substrates are exposed. The substrate exposed on one side is turned over and placed in the second exposure mechanism 2, the second exposure platform 22 carrying the substrate slides to directly below the second exposure device 21, and the second exposure light source 212 exposes the second exposure platform 22 , to complete the double-sided exposure of the substrate, the second exposure platform 22 slides out, and unloads the substrate that has completed the double-sided exposure, the second exposure platform 22 continues to slide to the right below the second exposure device 21, and repeats the operation , to expose multiple substrates. Preferably, the first exposure platform 12 and the second exposure platform 22 work together to greatly shorten the exposure time for multiple substrates and increase work efficiency.

As shown in Figure 3, Figure 5, Figure 7 and Figure 10, the first exposure assembly 111 of this embodiment also includes a first vacuum suction nozzle 1114 for vacuuming, and the second exposure assembly 211 also includes a vacuum suction nozzle 1114 for vacuuming. The second vacuum suction nozzle 2114 for vacuum, the first loading plate 1112 and the first exposure flat plate 1222 form a first space for accommodating the external film and the substrate, and the first loading plate 1112 and the second exposure flat plate 2222 form a space for accommodating A second space is provided for the external film and the base material. When the first exposure device 11 is exposing, the first vacuum suction nozzle 1114 vacuums the first space where the external film is accommodated, so that the film and the substrate are tightly bonded, so that the exposure accuracy is higher and the distortion rate is lower. Similarly, when the second exposure device 21 performs exposure, the second vacuum suction nozzle 2114 vacuums the second space where the external film is accommodated, so that the film and the substrate are tightly bonded, so that the exposure accuracy is higher and the distortion degree is lower. less.

As shown in Fig. 2, Fig. 4, Fig. 7, Fig. 9, and Fig. 10, the first exposure assembly 111 and the second exposure assembly 211 of this embodiment also include an alignment light source for exposure alignment, and the alignment The light source includes an alignment light 1115 and a driving cylinder 1116 for driving the alignment light 1115 to extend or retract. When performing the second alignment, since the marking point in the substrate needs to be moved to the center of the field of view, clearer light is needed to provide the field of view, the drive cylinder 1116 drives the alignment light 1115 to extend, and the first camera alignment device 121 and the second camera alignment device 221 perform the second alignment under clear light, so that the marking point in the substrate can be moved to the center of the field of view quickly and accurately, increasing exposure accuracy and reducing distortion.

As shown in FIG. 3, FIG. 4, FIG. 9 and FIG. 10, the first exposure assembly 111 and the second exposure assembly 211 of this embodiment also include an energy detection device 1117 for detecting the energy intensity of the exposure light source. The energy detection device 1117 is slidably disposed on the first exposure frame plate 1111 , and the energy detection device 1117 is respectively connected with the first exposure light source 112 and the second exposure light source 212 . Different substrates require different exposure times, and the exposure energy intensity tends to be weakened after the exposure light source is exposed for a long time. The energy detection device 1117 can detect the energy intensity of the first exposure light source 112 and the second exposure light source 212 respectively, and the first The exposure light source 112 and/or the second exposure light source 212 are adjusted to ensure consistent exposure intensity, effectively ensure exposure accuracy, and reduce distortion.

As shown in Fig. 3, Fig. 4, Fig. 7 and Fig. 10, the first exposure device 11 and the second exposure device 21 of this embodiment also include a cleaning device 113 for cleaning the substrate, and the cleaning device 113 includes two Cleaning rollers arranged side by side. When the first exposure platform 12 and the second exposure platform 22 slide directly below the first exposure device 11 and the second exposure device 21, they all pass through the cleaning device 113 respectively, so that they are placed on the first exposure platform 12 and the second exposure platform 22. The upper surface of the substrate is cleaned, and the cleaning device 113 includes two cleaning rollers arranged side by side, one of which is in direct contact with the upper surface of the substrate, and cleans the upper surface of the substrate when the first exposure platform 12 passes by. The two cleaning rollers abut against the first cleaning roller, and the second cleaning roller has better viscosity and can adhere to impurities on the surface of the first exposure platform 12, thereby cleaning the first cleaning roller and avoiding the first cleaning roller Decreased cleanliness after prolonged use.

As shown in Fig. 1, Fig. 2, Fig. 3 and Fig. 13, the double-sided exposure machine of this embodiment also includes a feeding mechanism 5. The material loading seat 52 and the ejection assembly for ejecting the material in the material loading seat 52, the material loading seat 52 includes a material loading frame 521 which is slidably arranged on the material loading bracket 51 and a material loading frame 521 which is slidably arranged on the material loading bracket 51. The feeding baffle 522, the feeding frame 521 is provided with an adjustment groove 5211, and the feeding baffle 522 is slidably arranged in the adjustment groove 5211. The first exposure device 11 is also provided with a first material transfer arm for transferring the material conveyed by the feeding mechanism 5 to the first exposure mechanism 1. The substrate to be exposed is placed in the loading seat 52, and the substrate is placed in the ejection assembly. Ejected under the action of the first material transfer arm and moved to the first exposure platform 12 . At the same time, since the substrates placed on the loading seat 52 are different in size, the feeding baffle 522 can slide according to the size of the substrates, so that the substrates are firmly accommodated in the loading seat 52 . Specifically, the base material is placed close to the material loading frame 521, the material loading baffle 522 moves along the adjustment groove 5211, and is in close contact with the other end of the base material, so that the base material is properly installed on the material loading seat 52, and the top The output component is ejected from the bottom of the loading seat 52, and the first material transfer arm transfers the substrate to the first exposure platform 12, so that the substrate is completely loaded.

As shown in Fig. 2 and Fig. 11, the turning mechanism 3 of this embodiment includes a turning bracket 31, a first turning carrier plate 33 for carrying and transporting the materials processed by the first exposure mechanism 1, and a first turning carrier plate 33 for driving the first turning carrier. An inversion motor 32 for inverting the board 33 and a second inversion carrier 34 for accepting the materials conveyed by the first inversion carrier 33 , the first inversion carrier 33 is provided with adsorption holes 331 for absorbing materials. After the first exposure platform 12 completes the single-sided exposure of the substrate, the first exposure platform 12 slides out, the first material transfer arm sucks the substrate that has completed the single-sided exposure and transports it to the first turning carrier 33, and the vacuum pump rotates the first turning The suction hole 331 of the transfer plate 33 is vacuumed, so that the material is close to the first turning carrier 33, the turning motor 32 works, the first turning carrier 33 is turned over 180 degrees, and the material is turned close to the first turning carrier 33 When the second inverting carrier 34 is reached, the vacuum pump stops working, and the material is separated from the first inverting carrier 33 under the action of gravity and placed on the upper surface of the second inverting carrier 34 to complete the inversion of the material.

Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present utility model, rather than limiting the protection scope of the present utility model. Although the utility model has been described in detail with reference to the preferred embodiments, those skilled in the art Personnel should understand that the technical solution of the utility model can be modified or equivalently replaced without departing from the essence and scope of the technical solution of the utility model.

Claims (9)

1. A double-sided exposure machine, characterized in that: it includes a first exposure mechanism for exposing one side of the material, a second exposure mechanism for exposing the other side of the material, and a second exposure mechanism for processing the first exposure mechanism A turning mechanism for turning over the surface of the finished material, the first exposure mechanism includes a first exposure device and a first exposure platform slidably arranged under the first exposure device, and the first exposure platform is provided with a first camera alignment device , the second exposure mechanism includes a second exposure device and a second exposure platform slidably disposed under the second exposure device, and the second exposure platform is provided with a second camera alignment device. 2. A double-sided exposure machine according to claim 1, characterized in that: the first exposure platform includes a first carrier for carrying externally induced materials, and a first carrier for driving the first carrier to move. The drive assembly, the first bearing seat includes a first mobile base, a first exposure plate movably arranged on the first mobile base, a first adjustment mechanism for adjusting the angle and position of the first exposure plate, and a first camera alignment device Set on the first mobile base, the first drive assembly is used to drive the first mobile base to move; the second exposure platform includes a second bearing seat for carrying external induction materials, and a second bearing base for driving the second bearing base to move. The second drive assembly, the second bearing seat includes a second mobile base, a second exposure flat plate movably arranged on the second mobile base, and a second adjustment mechanism for adjusting the angle and position of the second exposure flat plate, the second camera pair The positioning device is arranged on the second mobile base, and the second driving assembly is used to drive the second mobile base to move. 3. A double-sided exposure machine according to claim 1, characterized in that: the first exposure device includes a first exposure assembly for loading and cutting film, a second exposure assembly for irradiating and exposing the first exposure assembly. An exposure light source, the first exposure assembly includes a first exposure frame plate, a first loading plate clamped on the first exposure frame plate, and a first suction nozzle for absorbing the external film to be close to the lower surface of the first loading plate, The first loading plate is provided with a first through hole communicating with the first suction nozzle; the second exposure device includes a second exposure component for mounting film, a first exposure component for exposure to the second exposure component. Two exposure light sources, the second exposure assembly includes a second exposure frame plate, a second loading plate clamped on the second exposure frame plate, and a second suction nozzle for absorbing the external film and sticking to the lower surface of the second loading plate, The second loading plate is provided with a second through hole communicating with the second suction nozzle. 4. A double-sided exposure machine according to claim 3, characterized in that: the first exposure assembly also includes a first vacuum nozzle for vacuuming, and the second exposure assembly also includes a suction nozzle for vacuuming. The second vacuum suction nozzle for vacuum, the first loading plate and the first exposure plate form a first space for accommodating the external film and the substrate, the first loading plate and the second exposure plate form a space for accommodating the external film and the substrate material's second space. 5. A double-sided exposure machine according to claim 3, characterized in that: the first exposure assembly and the second exposure assembly also include an alignment light source for exposure alignment, and the alignment light source includes Alignment lights and drive cylinders for driving the alignment lights to extend or retract. 6. A double-sided exposure machine according to claim 3, characterized in that: the first exposure assembly and the second exposure assembly also include an energy detection device for detecting the energy intensity of the exposure light source, and the energy detection The device is slidably arranged on the first exposure frame plate, and the energy detection device is respectively connected with the first exposure light source and the second exposure light source. 7. A double-sided exposure machine according to claim 1, characterized in that: the first exposure device and the second exposure device also include a cleaning device for cleaning the substrate, and the cleaning device includes two Cleaning rollers arranged side by side. 8. A double-sided exposure machine according to claim 1, characterized in that: the double-sided exposure machine also includes a feeding mechanism, the feeding mechanism includes a feeding bracket, which is slidably arranged on the upper side of the feeding bracket A material seat and an ejection assembly for ejecting the material in the material loading seat, the material loading seat includes a material loading frame slidably arranged on the material loading support and a material feeding baffle slidably provided on the material loading support, the The feeding frame is provided with an adjustment groove, and the feeding baffle is slidably arranged in the adjustment groove. 9. A double-sided exposure machine according to claim 1, characterized in that: the turning mechanism comprises a turning bracket, a first turning carrier plate for carrying and transporting the materials processed by the first exposure mechanism, An inversion motor that drives the first inversion carrier to invert, and a second inversion carrier for accepting the materials conveyed by the first inversion carrier, and the first inversion carrier is provided with adsorption holes for absorbing materials.