CN205303465U - Array substrate and organic electroluminescence display device - Google Patents

Abstract

The utility model provides an array substrate and an organic electroluminescence display device, belonging to the display technology field, which can solve the problem that the existing grid line and data line metal have high reflectivity, which causes the display device to easily produce reflected images. The array substrate of the present invention includes a substrate and a first dielectric layer and a second dielectric layer with different refractive indices formed on the same side of the substrate, and the ratio of the refractive index of the first dielectric layer to the second dielectric layer is 0.4-0.6 , wherein the first dielectric layer is closer to the light-emitting surface than the second dielectric layer. The low-refractive-index first medium layer and the high-refractive-index second medium layer perform coherent and destructive effects on light entering from the outside, reducing reflection of light entering from the outside, thereby improving display contrast and display quality. The array substrate of the utility model is suitable for various display devices, especially suitable for bottom-emitting organic electroluminescent display devices.

Description

An array substrate and an organic electroluminescent display device

technical field

The utility model belongs to the field of display technology, in particular to an array substrate and an organic electroluminescent display device.

Background technique

Bottom emission type AMOLED (ActiveMatrix/OrganicLightEmittingDiode active matrix organic electroluminescent display device) generally means that the light emitted by the display device is emitted through one side of the substrate.

The inventors have found that at least the following problems exist in the prior art: when bottom-emission AMOLED array substrates use bottom-gate thin-film transistors, the gate lines and data line metals generally have high reflectivity, which easily causes the display device A strong reflection image is generated in the dark state, even in the display state, the reflection image is also generated, which reduces the picture quality and viewing effect of the display device. In order to solve this problem, a common method is to stick a polarizer on the light-emitting surface of the display panel. This method can effectively reduce the reflection, but it also causes a large loss of light emitted from the pixel area, which increases the power of the display device. consumption.

Utility model content

The utility model provides an array substrate and an organic electroluminescence display device for the problem that the existing grid lines and data line metals have high reflectivity, which causes the display device to easily produce reflected images.

The technical scheme adopted to solve the utility model technical problem is:

An array substrate, comprising a substrate, and a first dielectric layer and a second dielectric layer formed on the same side of the substrate, the ratio of the refractive index of the first dielectric layer to the second dielectric layer is 0.4-0.6, wherein The first medium layer is closer to the light-emitting surface than the second medium layer.

Preferably, the array substrate is an array substrate of a bottom-emitting organic electroluminescent display device, the first dielectric layer is disposed adjacent to the substrate, and the second dielectric layer is disposed on a side of the first dielectric layer away from the substrate. side.

Preferably, the thickness of the first dielectric layer is 1/4 of the wavelength sensitive to human eyes; the thickness of the second dielectric layer is 1/4 of the wavelength sensitive to human eyes.

Preferably, the human eye sensitivity wavelength is 550nm.

Preferably, the first dielectric layer is made of any one of silicon oxide (SiO _x ), lithium fluoride (LiF), magnesium fluoride (MgF) or magnesium oxide (MgO).

Preferably, the second dielectric layer is made of silicon nitride (SiN _x ), cadmium sulfide (CdS), cerium oxide (CeO ₂ ), hafnium hydroxide (HfO ₂ ), niobium pentoxide (Nb ₂ O ₅ ) , lead chloride (PbCl ₃ ) or antimony trisulfide (Sb ₂ S ₃ ).

Preferably, the array substrate is an array substrate of a bottom-emitting organic electroluminescent display device, and the array substrate further includes gate lines and data lines, and a first light-absorbing layer is provided on the side of the gate lines close to the substrate, The side of the data line close to the substrate is provided with a second light absorbing layer.

Preferably, the first light-absorbing layer is made of metal oxynitride; the second light-absorbing layer is made of metal oxynitride.

Preferably, the thickness of the first light-absorbing layer is 10nm-100nm; the thickness of the second light-absorbing layer is 10nm-100nm.

The utility model also provides a bottom-emitting organic electroluminescent display device, which includes an array substrate and a light-emitting layer, and the array substrate is the above-mentioned array substrate.

The array substrate of the present invention includes a substrate and a first dielectric layer and a second dielectric layer with different refractive indices formed on the same side of the substrate, and the ratio of the refractive index of the first dielectric layer to the second dielectric layer is 0.4 -0.6, where the first dielectric layer is closer to the light-emitting surface than the second dielectric layer. The low-refractive-index first medium layer and the high-refractive-index second medium layer perform coherent and destructive effects on light entering from the outside. Reduce the reflection of light entering from the outside, thereby improving the contrast of the display and improving the display quality. The array substrate of the utility model is suitable for various display devices, especially suitable for bottom-emitting organic electroluminescent display devices.

Description of drawings

FIG. 1 is a schematic structural view of an array substrate according to Embodiment 1 of the present invention;

FIG. 2 is a schematic structural view of the array substrates of Embodiments 2 and 3 of the present invention;

3 is a schematic structural diagram of an array substrate according to Embodiment 4 of the present invention;

Fig. 4 is the reflectivity curve of the array substrate of the embodiment of the present invention;

Wherein, reference signs are: 1. first medium layer; 2. second medium layer; 3. substrate; 4. gate line; 5. data line; 61. first light-absorbing layer; 62. second light-absorbing layer; 7. Color filter; 8. Light emitting layer.

detailed description

In order to enable those skilled in the art to better understand the technical solution of the utility model, the utility model will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

Example 1:

As shown in Figure 1, this embodiment provides an array substrate, including a substrate 3, and a first dielectric layer 1 and a second dielectric layer 2 formed on the same side of the substrate 3, the first dielectric layer 1 and the second dielectric layer The ratio of the refractive index of the medium layer 2 is 0.4-0.6, wherein the first medium layer 1 is closer to the light emitting surface than the second medium layer 2 .

The low-refractive-index first medium layer 1 and the high-refractive-index second medium layer 2 in this embodiment perform coherent and destructive effects on light entering from the outside, reducing the reflection of light entering from the outside, thereby improving the contrast of the display. Improve display quality. The array substrate of the utility model is suitable for various display devices, especially suitable for bottom-emitting organic electroluminescent display devices.

Example 2:

This embodiment provides an array substrate, as shown in FIG. 2 , including a substrate 3, and a first dielectric layer 1 and a second dielectric layer 2 formed on the same side of the substrate 3. The ratio of the refractive index of the medium layer 2 is 0.4-0.6, wherein the first medium layer 1 is closer to the light emitting surface than the second medium layer 2 .

That is to say, a medium layer with alternating high and low refractive indices is introduced below the grid lines 4, so as to form coherent and destructive effects on the incident light from the outside and reduce the reflection of the outside light. Wherein, the ratio n ₁ /n ₂ of the refractive index of the first medium layer 1 with a low refractive index and the second medium layer 2 with a high refractive index can be selected as 0.4 to 0.6, which can ensure that the reflectivity on the surface of the metal layer will be reduced, The problem that the surface reflectance of the metal layer of the grid lines 4 increases or remains unchanged due to improper selection of the refractive index ratio of the low refractive index first medium layer 1 and the high refractive index second medium layer 2 will not be caused.

Preferably, the array substrate is an array substrate of a bottom emission organic electroluminescent display device, and the first dielectric layer 1 is located between the substrate 3 and the second dielectric layer 2 .

That is to say, when the array substrate is used in a bottom-emitting organic electroluminescent display device, a layer of low-refractive-index dielectric thin film with a refractive index of n ₁ is first deposited on the substrate 3, that is, the first dielectric layer 1, and then Then deposit a layer of dielectric thin film with high refractive index n ₂ , that is, the second dielectric layer 2 .

Although the two dielectric layers are located on the same side and adjacent to each other as an example in Figure 2, it should be understood that to achieve the purpose of reflection, the two sides are not necessarily adjacent or on the same side, as long as the above first dielectric layer 1 ratio is satisfied. The condition that the second dielectric layer 2 is closer to the light-emitting surface is sufficient.

Preferably, the thickness of the first dielectric layer 1 is 1/4 of the wavelength sensitive to human eyes; the thickness of the second dielectric layer 2 is 1/4 of the wavelength sensitive to human eyes.

Preferably, the human eye sensitivity wavelength is 550nm.

Preferably, the first dielectric layer 1 is made of any one of silicon oxide (SiO _x ), lithium fluoride (LiF), magnesium fluoride (MgF) or magnesium oxide (MgO).

Preferably, the second dielectric layer 2 is made of silicon nitride (SiN _x ), cadmium sulfide (CdS), cerium oxide (CeO ₂ ), hafnium hydroxide (HfO ₂ ), niobium pentoxide (Nb ₂ O ₅ ), Either of lead chloride (PbCl ₃ ) or antimony trisulfide (Sb ₂ S ₃ ).

Preferably, the array substrate further includes a plurality of bottom-gate thin film transistors, a gate line 4 formed synchronously with the gate of the thin film transistor, a data line 5 formed synchronously with the source and drain of the thin film transistor, and the gate line 4 is close to the substrate 3 A first light absorbing layer 61 is provided on one side, and a second light absorbing layer 62 is provided on a side of the data line 5 close to the substrate 3 .

Among them, the light-absorbing layer is introduced under the grid line 4 and the data line 5, which can further reduce the reflection of the grid line 4 and the data line 5 to the external light without increasing the difficulty of the process, so that the first light that is not alternated by high and low refractive indices can be absorbed. The external incident light that is suppressed by the medium layer 1 and the second medium layer 2 . Wherein, FIG. 2 shows the color filter 7 , the light-emitting layer 8 , and other functional layers such as encapsulation protection layer, etc., which are not shown in FIG. 2 .

Preferably, the first light absorbing layer 61 is made of metal oxynitride; the second light absorbing layer 62 is made of metal oxynitride.

Preferably, the thickness of the first light absorbing layer 61 is 10 nm-100 nm; the thickness of the second light absorbing layer 62 is 10 nm-100 nm.

That is to say, the light-absorbing layer can adopt the method of reactive magnetron sputtering to deposit a layer of black light-absorbing conductive metal oxynitride film, which is passed into _N2 and _O2 when sputtering metal Realize, the thickness of the light-absorbing layer is preferably The scheme is from 10nm to 100nm.

Example 3:

This embodiment provides an array substrate of a bottom emission type organic electroluminescence display device, as shown in FIG. 2 , comprising a substrate 3, and a first dielectric layer 1 and a second dielectric layer formed on the same side of the substrate 3 2. The ratio of the refractive index of the first dielectric layer 1 to the second dielectric layer 2 is 0.4-0.6, and the first dielectric layer 1 is located between the substrate 3 and the second dielectric layer 2 .

The array substrate also includes a plurality of bottom-gate thin film transistors, a gate line 4 formed synchronously with the gate of the thin film transistor, and a data line 5 formed synchronously with the source and drain of the thin film transistor, and the side of the gate line 4 close to the substrate 3 is arranged There is a first light-absorbing layer 61 , and a second light-absorbing layer 62 is provided on the side of the data line 5 close to the substrate 3 .

Example 4:

This embodiment provides an array substrate of a bottom-emission organic electroluminescent display device. As shown in FIG. The source and drain of the thin film transistor are synchronously formed with the data line 5 , the side of the gate line 4 close to the substrate 3 is provided with a first light absorbing layer 61 , and the side of the data line 5 close to the substrate 3 is provided with a second light absorbing layer 62 .

Both the first light-absorbing layer 61 and the second light-absorbing layer 62 are made of metal oxynitride, and the thickness of the first light-absorbing layer 61 and the second light-absorbing layer 62 is 10nm-100nm.

Comparative example 1:

A comparative example provides an array substrate, the array substrate is an array substrate of a bottom-emission organic electroluminescent display device, the array substrate also includes a plurality of bottom-gate thin-film transistors, gate lines 4 formed synchronously with the gates of the thin-film transistors, and The data line 5 is formed synchronously with the source and drain electrodes of the thin film transistor.

Comparative example 2 is a glass substrate.

The substrates of Example 2, Example 3, and Comparative Examples 1 and 2 were tested for reflective performance, and the reflectivity curve of the substrates was tested. The test results are shown in FIG. 4 . It can be seen from FIG. 4 that the reflectances of the array substrates of Examples 2 and 3 are lower than those of Comparative Example 1 and Comparative Example 2.

Example 5:

This embodiment provides a bottom emission type organic electroluminescence display device, which includes the array substrate and the light emitting layer 8 of the embodiment 2.

Obviously, many changes can be made to the specific implementation of the above-mentioned embodiments; for example, the thickness of the dielectric layer and the light-absorbing layer can be adjusted according to specific conditions, and the specific refractive index ratio of the high and low refractive index dielectric layers can be adjusted according to specific conditions. Make adjustments.

Embodiment 6:

This embodiment provides a display device, which includes any one of the above-mentioned array substrates. The display device can be: liquid crystal display panel, electronic paper, OLED panel, mobile phone, tablet computer, television, monitor, notebook computer, digital photo frame, navigator and any other product or component with display function.

It can be understood that, the above embodiments are only exemplary embodiments adopted to illustrate the principles of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present utility model, and these variations and improvements are also regarded as the protection scope of the present utility model.

Claims (10)

1. An array substrate, characterized in that it comprises a substrate, and a first dielectric layer and a second dielectric layer formed on the same side of the substrate, the ratio of the refractive index of the first dielectric layer to the second dielectric layer 0.4-0.6, wherein the first dielectric layer is closer to the light-emitting surface than the second dielectric layer. 2. The array substrate according to claim 1, wherein the array substrate is an array substrate of a bottom emission type organic electroluminescent display device, the first dielectric layer is arranged adjacent to the substrate, and the second dielectric layer is adjacent to the substrate. The second dielectric layer is arranged on the side of the first dielectric layer away from the substrate. 3. The array substrate according to claim 1, wherein the thickness of the first dielectric layer is 1/4 of the wavelength sensitive to human eyes; the thickness of the second dielectric layer is 1/4 of the wavelength sensitive to human eyes. 4. The array substrate according to claim 3, wherein the wavelength sensitive to human eyes is 550 nm. 5. The array substrate according to claim 1, wherein the first dielectric layer is made of any one of silicon oxide, lithium fluoride, magnesium fluoride, or magnesium oxide. 6. The array substrate according to claim 1, wherein the second dielectric layer is made of silicon nitride, cadmium sulfide, cerium dioxide, hafnium hydroxide, niobium pentoxide, lead chloride or disulfide Any one of antimony. 7. The array substrate according to claim 2, wherein the array substrate is an array substrate of a bottom-emitting organic electroluminescent display device, and the array substrate further includes gate lines and data lines, and the gate lines A first light-absorbing layer is provided on a side close to the substrate, and a second light-absorbing layer is provided on a side close to the substrate of the data lines. 8 . The array substrate according to claim 7 , wherein the first light absorbing layer is made of metal oxynitride; the second light absorbing layer is made of metal oxynitride. 9. The array substrate according to claim 7, wherein the thickness of the first light absorbing layer is 10 nm-100 nm; the thickness of the second light absorbing layer is 10 nm-100 nm. 10. A bottom-emitting organic electroluminescent display device, comprising an array substrate and a light-emitting layer, characterized in that the array substrate is the array substrate according to any one of claims 1-9.