Embodiment
(first embodiment)
At first the liquid-crystal apparatus of first embodiment of the present invention is described with Figure 1A~Fig. 7 B.
But, in the present embodiment, be that example describes to adopt permeation type liquid crystal device as the active matrix mode of thin film transistor (TFT) (Thin FilmTransistor is hereinafter referred to as the TFT) element of on-off element.
(liquid-crystal apparatus)
Figure 1A is the plane pie graph of liquid-crystal apparatus of the active matrix mode of an embodiment of the invention, the side-looking section pie graph that Figure 1B overlooks for A-A line among Figure 1A, and the symbol 60 among Figure 1A and Figure 1B is a liquid-crystal apparatus.
Shown in Figure 1A and Figure 1B, liquid-crystal apparatus 60 possesses: tft array substrate (first substrate) 10; The subtend substrate of relative configuration (second substrate) 20 with tft array substrate; Be clamped in the liquid crystal layer 50 between tft array substrate 10 and the subtend substrate 20; The sealing material 14 of sealing liquid crystal layer 50 between tft array substrate 10 and subtend substrate 20.
At this, liquid crystal layer 50 is along the medial surface of the circumference of tft array substrate 10 and subtend substrate 20 and be provided with, and sees that from vertical direction the sealing material 14 that liquid-crystal apparatus 60 slightly is the picture frame shape seals.
The size of subtend substrate 20 is more smaller than tft array substrate 10.
As subtend substrate 20, adopt and be arranged on the roughly the same substrate of profile of the sealing material 14 on the tft array substrate 10.
The sealed material of tft array substrate 10 and subtend substrate 20 14 is bonding.
Be set at the position of sealing material 14 inboards along the inboard of sealing material 14 as the photomask of picture frame.
By the viewing area of photomask area surrounded for the image of generation liquid-crystal apparatus 60.
As scheme shown in the A1, on tft array substrate 10, be formed with a plurality of splicing ears 19.
Be connected in the metal line of splicing ear 19, be connected with the pixel electrode that is formed at the viewing area.
Also can the driving circuit for the driving of controlling pixel electrode be set in the zone in the outside of the sealing material 14 of subtend substrate 20.In this case, this driving circuit and pixel electrode are electrically connected, and splicing ear 19 is connected with driving circuit.
In addition, on the outer circumferential side of sealing material 14, be formed with the mold member 30 of lining sealing material 14.
As the material of mold member 30, use polypropylene or epoxy resin etc.
Mold member 30 is bonding with tft array substrate 10 and subtend substrate 20.
Because the physical strength of mold member 30 liquid-crystal apparatus improves.
In the side-looking section shown in Figure 1B, mold member 30 is formed the part of the side end face 25a of 10a, the outer peripheral face that seals material 14 and subtend substrate 20 above outer side covers tft array substrate 10.
So, be located between tft array substrate 10 and the subtend substrate 20.
And, on inner face one side (subtend face one side) of tft array substrate 10 and subtend substrate 20, be formed with each inorganic alignment film.
As shown in Figure 6, on the 25a of the side end face of subtend substrate 20, be formed with and be roughly jagged jog 40.
In addition, on the part of the tft array substrate 10 relative, be formed with and be roughly jagged jog 41 with subtend substrate 20.
By on jog 40,41 mold member 30 being set, the interface distance of the interface distance of mold member 30 and tft array substrate 10 and mold member 30 and subtend substrate 20 is elongated.
(equivalent electrical circuit)
Fig. 2 is the synoptic diagram of the equivalent electrical circuit of liquid-crystal apparatus.
For the viewing area of the liquid-crystal apparatus 60 that constitutes infiltration type, on a plurality of each aspects of rectangular (array-like) configuration, be formed with pixel electrode 9.
On the side of pixel electrode 9, be formed with in order to carry out TFT element 27 as on-off element to the energising control of pixel electrode 9.
On the source electrode of TFT element 27, be connected with data line 6a.
By the data line driving element to each data line 6a supply with picture signal S1, S2 ..., Sn.
On the grid of TFT element 27, be connected with sweep trace 3a.
By scanning line driving element to sweep trace 3a supply with pulsedly opportunity in accordance with regulations sweep signal G1, G2 ..., Gm.
On the other hand, in the drain electrode of TFT element 27, be connected with pixel electrode 9.
In such TFT element 27, because the sweep signal G1, the G2 that supply with from sweep trace 3a ..., Gm, when the state that only TFT element 27 is in out during certain, picture signal S1, the S2 that supplies with from data line 6a ..., Sn, by pixel electrode 9 the regulation the moment be input in the liquid crystal of each point.
Be input to the prescribed level in the liquid crystal picture signal S1, S2 ..., Sn, the liquid crystal capacity between pixel electrode 9 and the common electrode (aftermentioned) of being formed on keep certain during.
But, for the picture signal S1, the S2 that prevent to be kept by the liquid crystal capacity ..., Sn leaks, between pixel electrode 9 and capacity line 3b, be formed with and accumulate capacity 17.
Accumulating capacity 17 disposes side by side with the liquid crystal capacity.
So, when to the liquid crystal applied voltages signal, change according to the state of orientation of the voltage levvl liquid crystal molecule that applies.
Therefore, inject the modulated back generation of the light source light image light of liquid crystal.
(planar configuration)
Fig. 3 is the key diagram of the planar configuration of liquid-crystal apparatus.
In the liquid-crystal apparatus of present embodiment, on tft array substrate 10, the assortment of rectangular ground is formed by the pixel electrode 9 of the rectangle of indium tin oxide transparent conductive materials such as (Indium Tin Oxide below become ITO) formation.
The profile of the dotted line 9a remarked pixel electrode 9 of Fig. 3.
Vertical and horizontal border along pixel electrode 9 is provided with data line 6a, sweep trace 3a and capacity line 3b.
In the liquid-crystal apparatus 60 of present embodiment, the rectangular area that is formed with each pixel electrode 9 is a pixel, can show with the pixel of each rectangular configuration.
TFT device 27 is formed centrally in the semiconductor layer 1a of formations such as polysilicon film being.
In the source region (aftermentioned) of semiconductor layer 1a, be connected with data line 6a by contact hole 5.
In the drain region (aftermentioned) of semiconductor layer 1a, be connected with pixel electrode 9 by contact hole 8.
On the other hand, on the semiconductor layer 1a with the relative part of sweep trace 3a on, be formed with passage area 1a`.
(profile construction of liquid-crystal apparatus)
Fig. 4 is the side-looking section correspondence of C-C alignment among the key diagram of cross-section structure of liquid-crystal apparatus 60 and Fig. 3.
As shown in Figure 4, the liquid-crystal apparatus 60 of present embodiment, based on tft array substrate 10 and with the subtend substrate 20 of tft array substrate 10 relative configurations and be clamped in tft array substrate 10 and subtend substrate 20 between liquid crystal layer 50 and constitute.
At this, the base main body 10A that tft array substrate 10 constitutes with the light transmissive material by glass or quartz etc., the TFT element 27 that is formed at the inboard of base main body 10A, pixel electrode 9, inorganic alignment film 16 etc. are that main body constitutes.
On the other hand, the base main body 20A that constitutes with the light transmissive material by glass or quartz etc. of subtend substrate 20, the common electrode 21, inorganic alignment film 22 etc. of inboard that be formed at base main body 20A are that main body constitutes.
On the surface of tft array substrate 10, be formed with the first photomask 11a described later and first interlayer dielectric 12.
On the surface of first interlayer dielectric 12, be formed with semiconductor layer 1a, being formed with semiconductor layer 1a is the TFT element 27 at center.
In semiconductor layer 1a, be formed with passage area 1a` in the part relative with sweep trace 3a, form source area and drain region in the both sides of passage area 1a`.
This TFT device 27 adopts LDD (Lightly Doped Drain) structure.
In each source area and drain region, be formed with higher relatively area with high mercury of impurity concentration and relatively low low concentration region (LDD zone).
Promptly, be formed with low concentration source area 1b and high concentration source area 1d, be formed with low concentration drain region 1c and high concentration drain region 1e in the drain region at source area.
On the surface of semiconductor layer 1a, be formed with gate insulating film 2.
And, on the surface of gate insulating film 2, being formed with sweep trace 3a, the part relative with passage area 1a` constitutes gate electrode.
In addition, on the surface of gate insulating film 2 and sweep trace 3a, be formed with second interlayer dielectric 4.
Also have, on the surface of second interlayer dielectric 4, be formed with data line 6a.
Data line 6a is by being formed on the contact hole 5 on second interlayer dielectric 4, and 1d is connected with the high concentration source area.
Moreover, on the surface of second interlayer dielectric 4 and data line 6a, be formed with the 3rd interlayer dielectric 7.
And, on the surface of the 3rd interlayer dielectric 7, being formed with pixel electrode 9, pixel electrode 9 is connected on the 1e of high concentration drain region by being formed on the contact hole 8 on second interlayer dielectric 4 and the 3rd interlayer dielectric 7.
Moreover inorganic alignment film 16 is formed and covers pixel electrode 9.
The orientation of the liquid crystal molecule when inorganic alignment film 16 restrictions apply non-selection voltage.
And, in the present embodiment, extend and semiconductor layer 1a to be set to be formed with first and to accumulate capacity electrode 1f.
In addition, extend and gate insulating film 2 is set and is formed with and lures electric body film.
The capacity electrode is accumulated in configuration capacity line 3b formation second on the surface that lures electric body film.
By first accumulating capacity electrode 1f, luring electric body film and second to accumulate the capacity electrode to constitute and accumulate capacity 17.
In addition, on the surface of the base main body 10A corresponding, form the first photomask 11a with the formation zone of TFT device 27.
The first photomask 11a prevents that the illumination of injecting liquid-crystal apparatus is mapped on passage area 1a`, the low concentration source area 1b and low concentration drain region 1c of semiconductor layer 1a.
On the other hand, on the surface of the base main body 20A of subtend substrate 20, form second photomask 23.
Second photomask 23 prevents that the illumination of injecting liquid-crystal apparatus is mapped on the passage area 1a` or low concentration source area 1b, low concentration drain region 1c of semiconductor layer 1a.
See that from vertical direction liquid-crystal apparatus 60, the second photomasks 23 are set on the zone that overlaps with semiconductor layer 1a.
On the surface of subtend substrate 20, roughly forming the common electrode 21 that constitutes by electric conductors such as ITO on whole.
Moreover, on the surface of common electrode 21, form inorganic alignment film 22.
The orientation of the liquid crystal molecule when inorganic alignment film 22 restrictions apply non-selection voltage.
Between tft array substrate 10 and subtend substrate 20, clip by liquid crystal layer 50 to formations such as row (nematic) liquid crystal.
Nematic liquid crystal molecules has positive dielectric constant anisotropy, along the substrate horizontal alignment, applies when selecting voltage vertical orientated along direction of an electric field when applying non-selection voltage.
Nematic liquid crystal molecules has positive refractive index anisotropy, and long-pending (delay) Δ nd of its birefringence and thickness of liquid crystal layer for example is 0.40 μ m (60 ℃).
In addition, the orientation controlling party that the inorganic alignment film 16 of tft array substrate 10 causes to and the orientation controlling party that causes of the inorganic alignment film 21 of subtend substrate 20 to, be set to about 90 ℃ twisted state.
Therefore, the liquid-crystal apparatus 60 of present embodiment action under distortion (twisted) nematic-mode.
In addition, in the outside of tft array substrate 10 and subtend substrate 20, disposed by admixture in polyvinyl alcohol (PVA) (PVA) Polarizer 18,28 of the formations such as material of iodine.
And each Polarizer 18,28 is preferably mounted on the supporting substrate that is made of high thermoconductivity materials such as sapphire glass or crystals, and with liquid-crystal apparatus 60 from configuration.
Each Polarizer 18,28 absorbs axial linear polarization, has to make to see through the function that axial linear polarization sees through.
The Polarizer 18 of tft array substrate 10 1 sides, it sees through axle and is configured to the orientation limitations direction of inorganic alignment film 16 roughly the same.
The Polarizer 28 of subtend substrate 20 1 sides, it sees through axle and is configured to the orientation limitations direction of inorganic alignment film 22 roughly the same.
Liquid-crystal apparatus 60 can be configured to subtend substrate 20 towards light source one side.
Have only in the light source light with the consistent linear polarization of axle that sees through of Polarizer 28 and inject liquid-crystal apparatus 60 through Polarizer 28.
In the liquid-crystal apparatus 60 when applying non-selection voltage,, be the configuration of about 90 ℃ of distortion spiral fashion laminations by thickness direction to liquid crystal layer 50 with the liquid crystal molecule of the relative horizontal alignment of substrate.
Therefore, be injected into the linear polarization of liquid-crystal apparatus 60, penetrated from liquid-crystal apparatus 60 after about 90 ℃ of optically-actives.
This linear polarization for Polarizer 18 to see through axle consistent, through Polarizer 18.
So, carry out normal white show (NormallyWhite Mode) in the liquid-crystal apparatus 60 when applying non-selection voltage.
On the other hand, in the liquid-crystal apparatus 60 when applying selection voltage, the relative substrate of liquid crystal molecule is vertical orientated.
Therefore, be injected into the linear polarization of liquid-crystal apparatus 60, do not penetrated from liquid-crystal apparatus 60 by optically-active.
This linear polarization and Polarizer 18 see through an axle square crossing, do not see through Polarizer 18.
So the liquid-crystal apparatus 60 that applies when selecting voltage carries out often black the demonstration.
(inorganic alignment film)
As mentioned above, in the inboard of tft array substrate 10 and subtend substrate 20, be formed with inorganic alignment film 16,22.
Below, be that example describes with the inorganic alignment film 22 that is arranged on subtend substrate 20 1 sides, but the inorganic alignment film 16 of tft array substrate 10 1 side settings also adopt same formation.
Inorganic alignment film 16,22 is by SiO
2With the monox of SiO etc., or Al
2O
3, ZnO, MgO and ITO etc. formation such as metal oxide, thickness is about 0.02~0.3 μ m (being preferably 0.02~0.08 μ m).
Make inorganic alignment film 16,22, can utilize the sputtering method, vapour deposition process, sol-gel process, self-organization method of ion beam sputtering or magnetron sputtering system etc. etc.
At this, for example use the ion beam sputtering device to form the occasion of described inorganic alignment film 16,22, under the effect of the ion beam of ion source irradiation, radiate the sputtering particle that becomes the formation of inorganic alignment film material from target, by sputtering particle is deposited on the substrate, can on substrate, form inorganic alignment film.
Fig. 5 is the side cutaway view that is formed with the subtend substrate 20 of inorganic alignment film 22.
By using above-mentioned ion beam sputtering device,, sputtering particle is injected among the base main body 20A that constitutes subtend substrate 20 continuously certain injecting under the angle roughly.
So sputtering particle is piled into the batter post shape, on base main body 20A, form the columnar structures 22a that forms by inorganic material.
By on the surface of base main body 20A, forming numerous this columnar structures 22a, constitute inorganic alignment film 22.
And by the angle between target and the base main body 20A on the adjustment ion beam sputtering device, angle is in accordance with regulations injected sputtering particle to base main body 20A, can pay certain angle of inclination to columnar structures 22a as shown in Figure 5.
Also have, because liquid crystal molecule is along columnar structures 22a orientation in liquid-crystal apparatus 60, under the effect of this inorganic alignment film 22, liquid crystal molecule that can be when applying non-selection voltage direction in accordance with regulations carries out orientation limitations.
In addition, can pay pre-dumping (Pretilt) to liquid crystal molecule.
And inorganic alignment film 16 and the inorganic alignment film 22 be located on the tft array substrate 10 constitute equally, can form by above-mentioned identical method, have same function.
And, as other method that forms inorganic alignment film, also can adopt and for example on the Ranvier's membrane surface of inorganic alignment film, form a plurality of dip plane in advance, on the surface of this dip plane, form inorganic alignment film with above-mentioned sputtering method, make the shape of described a plurality of dip plane be delivered to the method on the surface of inorganic alignment film.
In addition, also can be after forming inorganic alignment film with above-mentioned sputtering method, carry out ion milling (ion milling) that ion beam is injected, on the surface of inorganic alignment film, form the recess of directivity with regulation.
In addition, also can carry out ion milling to the Ranvier's membrane surface of inorganic alignment film in advance, form inorganic alignment film with above-mentioned sputtering method then, again the secondary ion milling be carried out on its surface, on the surface of inorganic alignment film, form recess.
Under any situation, can provide and positively to pay the inorganic alignment film of the pre-dumping angle of expectation to liquid crystal molecule.
As mentioned above, liquid crystal layer 50 is sealed between tft array substrate 10 and the subtend substrate 20.
Be provided with the sealing material 14 (with reference to Fig. 1) between sealing liquid crystal layer 50 and applying tft array substrate 10 and the subtend substrate 20.
In sealing material 14, for example contain gapped material.
Can realize the liquid crystal bed thickness (Cell Gap) of regulation in the liquid-crystal apparatus 60 by the gap material.
Moreover the outer circumferential side that covers sealing material 14 is equipped with the mold member 30 that is made of polypropylene or epoxy resin etc.
In the liquid-crystal apparatus 60 of present embodiment, adopt by the sealing material 14 in the liquid-crystal apparatus 60, and cover the molding structure that the outer circumferential side that seals material 14 is arranged on mold member 30 formations between tft array substrate 10 and the subtend substrate 20.
With reference to Fig. 6 this molding structure is elaborated.
In addition, Fig. 6 is the side-looking diagrammatic cross-section of the liquid-crystal apparatus 60 in the B-B` line of Fig. 1, especially the enlarged drawing of molding structure part.
(molding structure)
As shown in Figure 6, mold member 30 is set on the top part of the side end face 25a of subtend substrate 20 and sealing outer peripheral face of material 14 and tft array substrate 10.
Mold member 30 cover sealing liquid crystal layers 50 sealing material 14 outer circumferential side and dispose.
At this, on each tft array substrate 10 that sets mold member 30 and subtend substrate 20, form jog (first jog) 40,41.
Jog 40,41 forms at the full Zhou Lianxu of mold area, forms roughly zigzag as shown in Figure 6.。
From with the vertical section of continuous direction of jog 40,41, jog 40,41 forms roughly zigzag.
Specifically, as shown in Figure 6, be to be formed with jog 40 on the 25a of side end face in the mold area of the base main body 20A of subtend substrate 20.
Be formed with jog 40 on the mold area of tft array substrate 10.
The jog 40,41 that on each tft array substrate 10 and subtend substrate 20, forms, with jog is not set substrate surface is compared as the existing formation of tabular surface, the interface distance of mold member 30 and tft array substrate 10 is only elongated along the part of the surface configuration of jog 41, and the interface distance of mold member 30 and subtend substrate 20 is only elongated along the part of the surface configuration of jog 40.
Secondly, the method that forms jog 40,41 is described.
At first, for example form protective seam at substrate surface.
Secondly, carry out photoetch, form the desired groove shape of protective seam by gray scale mask.
Then, as mask substrate is carried out etching, can form section and be roughly jagged jog by the protective seam that will be formed with the groove shape.
And the formation method of jog is not limited to the use photoetch, for example, also can adopt transfer mold is given as security the method pay concaveconvex shape on base main body 10A, 20A etc.
In addition, on the face of tft array substrate 10 and subtend substrate 20 mutual subtends, be provided with inorganic alignment film 16,22 separately.
So, on the jog 41 that forms on the surface of the base main body 10A of tft array substrate 10, imitate its surface, set the inorganic alignment film 16 of roughly certain thickness.
Therefore, on the surface of inorganic alignment film 16, be formed with the recess of dark several μ m corresponding with the surface configuration of jog 41.
Promptly, in liquid-crystal apparatus 60, the jog 41 of tft array substrate 10 and the jog 40 of subtend substrate 20 are provided with mold member 30, under the effect of mold member 30, tft array substrate 10 and subtend substrate 20 are held.
But, when liquid-crystal apparatus 60 by the liquid crystal layer 50 of tft array substrate 10 and 20 clampings of subtend substrate in when immersing moisture or impurity etc., the various functions of liquid-crystal apparatus 60 are hindered, especially have when immersing the water of polarity molecule in the liquid crystal of split pole structure, it is bad that orientation takes place liquid crystal, the possibility that exists display characteristic to reduce.
Therefore, in order to obtain to have the liquid-crystal apparatus 60 of stable display characteristic and high reliability, the preferred highly moistureproof energy of realizing at the moisture that immerses from the outside of liquid-crystal apparatus 60.
To this, in the molding structure of present embodiment, in the mold area of above-mentioned tft array substrate 10 and subtend substrate 20, form jog 40,41, on jog 40,41, set mold member 30.
According to this formation, be provided with mold member 30 owing to be formed at the jog 40,41 of tft array substrate 10 and subtend substrate 20, with the substrate surface that jog can not be set is that the situation of tabular surface is compared, the interface distance of mold member 30 and tft array substrate 10 is only extended the degree of the area that contacts with the surface configuration of jog 40,41, extends with the interface distance of subtend substrate 20.
So, if moisture is under the outside immersion tft array substrate 10 and the situation between the subtend substrate 20 of liquid-crystal apparatus 60, because the interface distance of mold member 30 and tft array substrate 10, and the interface distance of mold member 30 and subtend substrate 20 is elongated separately, can lower the possibility that moisture arrives liquid crystal layer 50.
At this, in the liquid-crystal apparatus 60 of present embodiment, on the surface of the tft array substrate 10 that is provided with mold member 30, be formed with inorganic alignment film 16.
Inorganic alignment film 16 is made of the porous matter that columnar structures constitutes as shown in Figure 5.
So, the special danger that has the generation gap between mold member 30 and subtend substrate 20.
In addition, the danger that forms big gap is arranged on the interface of mold member 30 and inorganic alignment film 16.
So by these gaps, moisture or impurity etc. immerse liquid crystal layer 50 from the outside of liquid-crystal apparatus, have the danger that above-mentioned unfavorable condition takes place.
But, molding structure according to above-mentioned present embodiment, owing to pay concaveconvex shape to the inorganic alignment film 16 that is arranged on the tft array substrate 10, the interface distance of inorganic alignment film 16 and mold member 30 can be elongated, can prevent the immersion of moisture well from the outside.
So, according to the liquid-crystal apparatus 60 of present embodiment, can alleviate because moisture is sneaked into the low of display characteristic that liquid crystal layer 50 causes, the liquid-crystal apparatus 60 that can realize having stable display characteristic, high reliability.
And the height of lip- deep jog 40,41 that is formed at tft array substrate 10 and subtend substrate 20 is high more, more can the interface distance of mold member 30 and inorganic alignment film 16,22 is elongated.
In addition, as described later,, can provide the liquid crystal projection apparatus of high reliability because this liquid-crystal apparatus is adopted as optical modulator body.
And, in the first above-mentioned embodiment, on the both sides of tft array substrate 10 and subtend substrate 20, formed jog, but on either party of tft array substrate 10 and subtend substrate 20, jog is set, can extension die plastic 30 and the interface distance of substrate, improve the moisture-proof characteristic of liquid-crystal apparatus 60.
In addition, the shape of the jog 40,41 that is provided with on tft array substrate 10 and subtend substrate 20 is not limited to above-mentioned present embodiment.
For example, in the present embodiment, the jog 41 that forms on the tft array substrate 10 is to be the jog that concavity forms on the face (tabular surface) of base main body 10A, but also can is to be the jog that convex forms on the tabular surface of base main body 10A.
In addition, base main body 10A is still tabular surface, and jog 41 also can be for forming the jog of projection or groove on inorganic alignment film 16.
Also have, also can make both make up the back and form jog by on base main body 10A and inorganic alignment film 16 both sides, forming projection or groove.
In addition, in the liquid-crystal apparatus 60 of present embodiment, on whole of the subtend face separately of tft array substrate 10 and subtend substrate 20 mutual subtends, form inorganic alignment film 16,22, but also can only on the zone of clamping liquid crystal layer 50, form inorganic alignment film 16,22.
In this case, owing on mold area, do not form inorganic alignment film 16,22, so can prevent between inorganic alignment film and mold member 30, to form the gap.
Specifically, in the situation that adopts the alignment films that constitutes by organic material, or only becoming under the situation that does not optionally form inorganic alignment film on the substrate of mold area, the interface of mold member 30 and tft array substrate 10, or form the possibility step-down in big gap on the interface of mold member 30 and subtend substrate 20.
Therefore, can prevent to form the gap that moisture immerses from the outside of liquid-crystal apparatus 60.
In this constituted, by forming jog again on the surface of mold area, coating mold member 30 on the surface of jog also can be with the interface distance of mold member 30 and tft array substrate 10, or the interface distance of mold member 30 and subtend substrate 20 prolongs.
Therefore, can make gap or the gap at the interface of mold member 30 and subtend substrate 20 possibility that immerses liquid crystal layer 50 by the interface of mold member 30 and tft array substrate 10 such as moisture drop to minimumly, can improve the reliability of liquid-crystal apparatus 60.
(first variation of first embodiment)
Secondly, first variation to the liquid-crystal apparatus in first embodiment describes.
Fig. 7 A and Fig. 7 B are the key diagram of first variation of first embodiment.
Fig. 7 A is depicted as the vertical view of the liquid-crystal apparatus 60` of first variation, and Fig. 7 B is the sectional side view of the E-E alignment among Fig. 7 A.
Shown in Fig. 7 A and Fig. 7 B, in liquid-crystal apparatus 60`, on the surface of the base main body 20A of subtend substrate 20, be formed with groove 91, constitute the part of the mold area that is provided with mold member 30 by groove 91.
At this, different with liquid-crystal apparatus 60 shown in Figure 6 in liquid-crystal apparatus 60`, the tft array substrate 10 of subtend configuration and the size of subtend substrate 20 see that from vertical direction liquid-crystal apparatus 60` is roughly the same mutually.
Shown in Fig. 7 A, groove 91 forms around the full Zhou Lianxu of mold area.
The section of groove 91 is a rectangle shown in Fig. 7 B.
The surface of imitation groove 91, inorganic alignment film 22 is set by roughly certain thickness.
Therefore, on the surface of inorganic alignment film 22, form the recess (first jog) 92 of dark number μ m.
Shown in Fig. 7 A, recess 92 forms around the full Zhou Lianxu of mold area.
The section of recess 92 is a rectangle shown in Fig. 7 B.
In addition, on base main body 20A, be provided with a plurality of through holes 93.
And, in base main body 20A, on the part that through hole 93 is set, inorganic alignment film 22 is not set.
Through hole 93 is communicated with mold area.
In addition, in liquid-crystal apparatus 60`, be formed with groove 81 on the surface of the base main body 10A of tft array substrate 10, constitute the part of the mold area that mold member 30 is set by groove 81.
Groove 81 is identical with the formation of above-mentioned groove 91, and the surface of imitation groove 81 is by roughly certain thickness configuration inorganic alignment film 16.
Therefore, on the surface of inorganic alignment film 16, form recess (first jog) 82 at the full Zhou Lianxu of mold area.
The section of recess 82 is a rectangle shown in Fig. 7 B.
The recess 82 of tft array substrate 10 and the recess 92 of subtend substrate 20 by applying tft array substrate 10 and subtend substrate 20, form mold area by recess 82,92 under the state of aligned in position.
In addition, in the inboard of mold area, be provided with sealing material 14 equally with first embodiment.
Because sealing material 14, liquid crystal layer 50 is sealed between tft array substrate 10 and the subtend substrate 20.
As the method that sets mold member 30 in mold area, for example can adopt the method for injecting moulding material from through hole 93.
At this moment, the bubble that is included in air in the moulding material etc. is released to the outside by through hole 93.
Therefore, can between tft array substrate 10 and subtend substrate 20, mold member 30 be set well.
In addition, like this by being arranged on the recess 82 on the tft array substrate 10, on the mold area that is arranged on recess 92 formations on the subtend substrate 20, because be provided with a lot of mold member 30, can fit more reliably keeps tft array substrate 10 and subtend substrate 20.
Promptly, can improve the physical strength of liquid-crystal apparatus 60`.
Yet, as shown in Figure 5, because inorganic alignment film 16,22 porous matter, especially exist in the danger that forms big gap on the interface of the interface of mold member 30 and inorganic alignment film 16 or mold member 30 and inorganic alignment film 22 as described above for constituting by columnar structures.
Therefore, exist moisture or impurity etc. to immerse liquid crystal layer from the outside of liquid-crystal apparatus 60`, make the danger of the display characteristic reduction of liquid-crystal apparatus by the gap.
To this, among the liquid-crystal apparatus 60` of first variation shown in Fig. 7 A and Fig. 7 B, adopt following formation: on the surface of inorganic alignment film 16, form recess 82, on the surface of inorganic alignment film 22, form recess 92, on the surface of recess 82,92, set mold member 30.
According to this formation, compare with the situation that does not form jog, because the interface distance of mold member 30 and inorganic alignment film 16 or the interface distance of mold member 30 and inorganic alignment film 22 prolong, the immersion path of moisture etc. is elongated, can lower the possibility of immersion liquid crystal layers 50 such as moisture.
So, can realize having liquid-crystal apparatus 60 stable display characteristic, that reliability is high.
(second variation of first embodiment)
Secondly, with reference to Fig. 8 A second variation of the liquid-crystal apparatus in first embodiment is described.
In second variation, shown in Fig. 8 A, on the position that is provided with sealing material 14, form jog 40`, 41` (second jog).
Promptly, between tft array substrate 10 and subtend substrate 20, on the position that is being provided with sealing material 14, form jog 40`, 41`.
Constitute according to this, the situation about having an even surface that seals the substrate of material 14 with clamping is compared, and in the zone that forms jog 40`, 41`, can prolong sealing material 14 and tft array substrate 10, and the interface distance of sealing material 14 and subtend substrate 20.
Therefore, for example moisture immerses the situation between tft array substrate 10 and the subtend substrate 20 from the outside of liquid-crystal apparatus, by sealing material 14 and tft array substrate 10, and the interface of sealing material 14 and subtend substrate 20, the possibility that makes moisture arrive liquid crystal layer 50 reduces, and can further improve the moisture-proof characteristic energy of liquid-crystal apparatus.
(the 3rd variation of first embodiment)
Secondly, with reference to Fig. 8 B the 3rd variation of the liquid-crystal apparatus in first embodiment is described.
In the 3rd variation, shown in Fig. 8 B, replace recess 82 shown in Figure 7, on tft array substrate 10, be provided as the protuberance 82` of jog.
In this constituted, the width of the recess 92 that forms on the subtend substrate 20 was preferably wide than the width of protuberance 82`.
At this moment, shown in Fig. 8 B, the protuberance 82` of tft array substrate 10 and the recess of subtend substrate 20 92 are chimeric by mold member 30.
So, make under the chimeric state of protuberance 82` and recess 92, for example, the side by making protuberance 82` and the side butt of recess 92 can guarantee that the horizontal direction of tft array substrate 10 and subtend substrate 20 is in line.
At this moment, because be formed with recess 92 and protuberance 82`, can extension die plastic 30 and the interface distance of tft array substrate 10 or the interface distance of mold member 30 and subtend substrate 20.
Therefore, identical with above-mentioned first embodiment, first variation and second variation, can obtain to improve the effect of the moisture-proof characteristic of liquid-crystal apparatus.
And, also the inserted structure that is made of protuberance 82` and recess 92 can be formed on and for example seal between the tft array substrate 10 and subtend substrate 20 that material 14 is configured.
(second embodiment)
Secondly, with reference to Fig. 9 second embodiment of liquid-crystal apparatus of the present invention is described.
Figure 9 shows that the side cutaway view of the liquid-crystal apparatus 160 that second embodiment relates to.
In the liquid-crystal apparatus of present embodiment, for the formation identical, enclose identical symbol and describe with first embodiment, for the component part identical, simplify its explanation with first embodiment.
In addition, in the present embodiment, the tft array substrate 10 of subtend configuration and the size of subtend substrate 20 see that from vertical direction liquid-crystal apparatus is roughly the same mutually.
In the first embodiment, by on the mold area of tft array substrate 10 and subtend substrate 20, forming jog, prolong mold member 30 and the interface distance of tft array substrate 10 or the interface distance of mold member 30 and subtend substrate 20, improved the moisture-proof characteristic of liquid-crystal apparatus 60.
Relative therewith, in the liquid-crystal apparatus 160 of present embodiment, adopt the tft array substrate 10 make configuration mold member 30 and the gap between the subtend substrate 20 than the narrow structure in the tft array substrate 10 of clamping liquid crystal layer 50 and the gap between the subtend substrate 20 (below become liquid crystal bed thickness (Cell Gap)).
The liquid-crystal apparatus 160 of present embodiment possesses: relative mutually tft array substrate 10 and the subtend substrate 20 that disposes; The liquid crystal layer 50 of sealed material 14 sealings between tft array substrate 10 and subtend substrate 20; Mold member 30, its outer circumferential side that covers sealing material 14 is located between tft array substrate 10 and the subtend substrate 20.
As shown in Figure 9, in liquid-crystal apparatus 160, on the surface of the inorganic alignment film 16 of tft array substrate 10, be formed with protuberance 192, on the surface of the inorganic alignment film 22 of subtend substrate 20, be formed with protuberance 182.
Protuberance 192,182 forms at the full Zhou Lianxu of mold area, on protuberance 192,182 mold member 30 is set.
The inboard of the protuberance 192 of tft array substrate 10, and on the inboard of the protuberance 182 of subtend substrate 20, identical with liquid-crystal apparatus 60, be filled with sealing material 14, liquid crystal layer 50 is sealed.
And not shown pad can be guaranteed liquid crystal bed thickness (Cell Gap) d that expects between sealing material 14.
In addition, the clearance D of tft array substrate 10 and subtend substrate 20 in the mold area, narrower owing to form protuberance 192,182 than liquid crystal bed thickness d.
So, to compare with the situation (situation of d=D) that the gap of tft array substrate 10 that is provided with mold member 30 and subtend substrate 20 equates with the liquid crystal bed thickness, the volume that constitutes clearance D reduces, and therefore the amount of the mold member 30 in clearance D reduces.
At this, moisture immerses the situation between tft array substrate 10 and the subtend substrate 20 from the outside of liquid-crystal apparatus 60, because the mold member 30 between clearance D is few, the moisture itself that sees through in the mold member 30 of clearance D tails off.
Therefore, can lower moisture and mix the possibility that arrives in the liquid crystal layer 50, can improve the moisture-proof characteristic of liquid-crystal apparatus 160.
Constitute according to this, can alleviate because moisture is sneaked into display characteristic low of the liquid-crystal apparatus that liquid crystal layer 50 causes, the liquid-crystal apparatus 160 that can realize having stable display characteristic, high reliability.
(variation of second embodiment)
Secondly, with reference to Figure 10 the variation of the liquid-crystal apparatus in second embodiment 160 is described.
As shown in figure 10,, form each real estate of clearance D as the liquid-crystal apparatus 160` of the variation of liquid-crystal apparatus 160, inclined with respect to the real estate that liquid crystal layer 50 is configured.
At this, the real estate of so-called configuration liquid crystal layer 50 is meant in this variation shown in Figure 10, the tft array substrate 10 of clamping sealing material 14 and liquid crystal layer 50 and inner face one side of subtend substrate 20.
The real estate that forms clearance D is meant at the first maintenance face 10B that disposes mold member 30 on the tft array substrate 10 and disposes second of mold member 30 on subtend substrate 20 and keeps face 20B.
And, keep face 10B and second to keep face 20B to constitute mold area by first.
And first keeps face 10B and second to keep face 20B, tilts with respect to clamping, the real estate of tft array substrate 10 that liquid crystal layer 50 is set and the real estate of subtend substrate 20.
In other words, as shown in figure 10, base main body 10A in the tft array substrate 10, liquid crystal reserve part 10R with the real estate that constitutes clamping liquid crystal layer 50 and sealing material 14, tilt with respect to the real estate of liquid crystal reserve part 10R, and constitute with the molding maintaining part 10M of the real estate with mold member of being provided with 30 (first keeps face 10B).
In addition, the base main body 20A of subtend substrate 20 tilts with respect to the real estate of liquid crystal maintaining part 20R and liquid crystal maintaining part 20R, and constitutes with the molding maintaining part 20M of the real estate with mold member of being provided with 30 (second keeps face 20B).
So, each molding maintaining part 10M, 20M, and liquid crystal maintaining part 10R, 20R, subtend setting mutually separately.
Constitute by this, form each face that first of above-mentioned clearance D keeps the face 10B and the second maintenance face 20B, with respect to the face tilt of the substrate that disposes liquid crystal layer 50.
At this, the size in the tft array substrate of formation liquid crystal maintaining part 10R, 20R and the gap of subtend substrate 20, the thickness that is set at liquid crystal layer 50 is liquid crystal bed thickness (Cell Gap) d.
In addition, first keeps face 10B and second to keep the size of the clearance D of face 20B, and as shown in figure 10, d will approach with respect to the liquid crystal bed thickness.
And, keep face 10B and second to keep being provided with the mold member 30 that engages tft array substrate 10 and subtend substrate 20 on the face 20B first.
In the liquid-crystal apparatus 160` of this variation, because it is narrower than liquid crystal bed thickness d to be provided with each tft array substrate 10 and the clearance D between the subtend substrate 20 (first keeps face 10B and second to keep face 20B) of mold member 30, so identical with the liquid-crystal apparatus 60 of above-mentioned first embodiment, can reduce the amount of the mold member 30 in clearance D.
So moisture immerses the situation between tft array substrate 10 and the subtend substrate 20 from the outside, because the amount of the mold member 30 between described clearance D is few, can limit the amount that sees through the moisture in the mold member 30 of described clearance D.
In addition, the interface distance of the presentation of the mold area of seeing from the vertical direction of liquid-crystal apparatus 160` can be represented with distance X shown in Figure 10 1.
As mentioned above in this variation, owing to keeping second of face 10B and molding maintaining part 20M, first of the molding maintaining part 10M that sets mold member 30 keeps face 20B, real estate with respect to liquid crystal reserve part 10R, 20R tilts, interface distance between mold member 30 and the tft array substrate 10, or the interface distance between mold member 30 and the subtend substrate 20 can be represented with X2.
So the interface distance of the formation clearance D in the mold area can be longer than the interface distance X1 of presentation.
So make the interface distance of the mold area that is formed with mold member 30 elongated, can prolong the path that moisture immerses from the outside of liquid-crystal apparatus 160`, can further improve the moisture-proof characteristic of liquid-crystal apparatus 160`.
Constitute according to this, the possibility that moisture is sneaked in the liquid crystal layer 50 reduces, and can improve the moisture-proof characteristic of liquid-crystal apparatus 160`.
Therefore, can alleviate moisture and sneak into the low of display characteristic that liquid crystal layer 50 causes, promptly, can realize the liquid-crystal apparatus 160` of high reliability.
More than, the embodiment of liquid-crystal apparatus is illustrated, the present invention also goes for the electron-optical arrangement beyond the liquid-crystal apparatus, for example organic El device, electrophoretic apparatus etc.
At first, the embodiment that is suitable for electrophoretic apparatus 100 of the present invention is described.
The electrophoretic apparatus 100 of present embodiment as shown in figure 11, constitutes by purchasing electrophoretic layer (electron optics layer) 111 between first substrate 101 that disposes in subtend and second substrate 108.
And, first substrate 101 and second substrate 108, sealed member 127 is fitted, and is retained as the state with certain intervals by pad (not shown).
Containment member 127 is formed and surrounds viewing area frame shape on every side.
In the outside of containment member 127, mold member 30 is configured to surround electrophoretic layer 111.
The electrophoretic apparatus 100 of present embodiment, identical with the embodiment of the liquid-crystal apparatus that has described with Fig. 6, on the side end face of first substrate 101, be formed with section and look and be roughly jagged jog 140, on the part of second substrate 108, also be formed with section and look and be roughly jagged jog 141.
And, on jog 140,141, be provided with mold member 130.
Promptly, jog 140,141 forms in the universe in the zone that disposes mold member 30.
First substrate 101 for example is made of the substrate that clear glass or transparent membrane etc. has a light transmission.
On inner face one side (electrophoretic layer 111 1 sides) of first substrate 101, be formed with the common electrode 102 that transparent conductive material such as ITO (tin indium oxide) constitutes.
The outside of first substrate 101 is display surfaces of electrophoretic apparatus.
On the other hand, second substrate 108 there is no need must be transparent, for example outside glass substrate or the resin film substrate etc., can use the substrate that is formed with insulation course on the metal sheet surface of corrosion resistant plate etc. etc.
On second substrate 108, pixel region is rectangular (array-like) divides formation, is provided with the pixel electrode corresponding with each pixel region 107.
Though do not illustrate, on pixel electrode 107, be formed with TFT element (on-off element) for the control of switching on.
And, in the electrophoretic apparatus 100 of present embodiment, in the closed space that forms by first substrate 101 and second substrate 108 and containment member, dispose as the electrophoresis dispersion 105 of electrophoretic layer 111 and electrophoresis particle 106 by the microencapsulation 161 of the resin involucra of capsule shape lining.
Moreover, as the structure of electrophoretic layer 111, be not limited to above-mentioned microencapsulation, also can constitute electrophoretic layer by between first substrate 101 and second substrate 108, enclosing electrophoresis dispersion with dispersion medium, electrophoresis particle etc.
By applying voltage between electrode 102,107, the electrophoresis particle 106 in the microencapsulation 161 to the rapid swimming in common electrode both sides, is attached to electrode surface and carries out image and show under the effect of Coulomb force.
According to above-mentioned formation, because the jog 140,141 that forms on first substrate 101 and second substrate 108 is provided with mold member 130, with the substrate surface that jog is not set is that the situation of tabular surface is compared, the interface distance of the mold member 130 and first substrate 101, or the interface distance of the mold member 130 and second substrate 108 only prolongs the degree of the area that contacts with the surface configuration of jog 140,141.
So, if moisture immerses the situation between first substrate 101 and second substrate 108 from the outside of electrophoretic apparatus 100, because the interface distance of the mold member 130 and first substrate 101, or the interface distance of the mold member 130 and second substrate 108 prolongs separately, can reduce the possibility that moisture arrives electrophoretic layer 111.
And, also can adopt the mode of Fig. 7 A~Figure 10 that is applicable to liquid-crystal apparatus to electrophoretic apparatus of the present invention.
Secondly, with reference to Figure 12 the embodiment that the present invention is applicable to organic El device 200 is described.
As shown in figure 12, in the organic El device 200 of present embodiment, on substrate (first substrate) 211, be formed with the circuit part (not shown) that comprises for the driving usefulness TFT that drives pixel electrode 231.
In circuit part, on each a plurality of zone of being divided by interlayer 241, be provided with light-emitting component (organic EL) 244 as electron emitting layer.
This light-emitting component 244 forms in the following order and forms as lower member, that is, as the pixel electrode 231 of anodize, from positive hole transfer layer 252, the luminescent layer 251 that possesses organic EL material of one of electron optics material, the negative electrode 261 in the injection/positive hole of conveying of pixel electrode 231.
In having the luminescent device of this formation, the combination of the electronics by the positive hole injected from positive hole transfer layer and negative electrode 261 makes luminescent layer 251 luminous.
Hermetic sealing substrate (second substrate) 210 is set to covered substrate 211.
Because organic El device 200 is to take out radiative formation under the situation of so-called bottom emissive type, adopts transparent or semitransparent substrate as substrate 211.
In addition, be under the situation of so-called top emission structure at organic El device 200, adopt transparent or semitransparent substrate as hermetic sealing substrate 210.
Mold member 230 enters the inside of organic El device 200 by preventing moisture, plays the effect of protection to the more weak organic EL device 244 of moisture.
In the organic El device 200 of present embodiment, identical with the embodiment of the liquid-crystal apparatus that has illustrated with Fig. 6, on the side end face of hermetic sealing substrate 210, be formed with section and look and be roughly jagged jog 240, on the part of substrate 211, also be formed with section and look and be roughly jagged jog 242.
And jog 240,242 is provided with mold member 230.
Promptly, jog 240,242 forms in the universe in the zone that disposes mold member 230.
According to above-mentioned formation, because the jog 240 that forms on the jog 242 that forms on the substrate 211 and the hermetic sealing substrate 210 is provided with mold member 230, with the substrate surface that jog is not set is that the situation of tabular surface is compared, and the interface distance of the interface distance of mold member 230 and substrate 211 or mold member 230 and hermetic sealing substrate 210 only prolongs the degree of the area that contacts with the surface configuration of jog 240,242.
So, if moisture immerses the situation between hermetic sealing substrate 210 and the substrate 211 from the outside of organic El device 200, because the interface distance of the interface distance of mold member 230 and hermetic sealing substrate 210 or mold member 230 and substrate 211 prolongs separately, can reduce the possibility that moisture arrives the organic EL that comprises luminescent layer 251.
And, also can adopt the form of Fig. 7 A~Figure 10 that is applicable to liquid-crystal apparatus to organic El device 200 of the present invention.
(projector)
Secondly, with Figure 13 projector of the present invention is described.
Figure 13 shows that the summary pie graph of the major part of projector 800.
Projector 800 possesses the liquid-crystal apparatus of each above-mentioned embodiment as optical modulator body.
In Figure 13, symbol 810 expression light sources, symbol 813 and symbol 814 expression dichronic mirrors, symbol 815, symbol 816 and symbol 817 expression catoptrons, lens are injected in symbol 818 expressions, symbol 819 expression relay lenses, lens are penetrated in symbol 820 expressions, the optical modulator body that symbol 822, symbol 823 and symbol 824 expressions have liquid-crystal apparatus of the present invention to constitute, symbol 825 expression cross dichroic prism, symbol 826 expression projection lens (projection mechanism).
Light source 810 is made of the electric light 811 of metal halide etc. and the reflection of light device 812 of reflector lamp 811.
Dichronic mirror 813 makes the red light in the white light that is included in light source 810 ejaculations see through reflect blue light and green light.
See through the red light of dichronic mirror 813, mirror 817 reflections that are reflected are injected in the optical modulator body 822 that red light uses.
By the green light that dichronic mirror 813 reflects, injected green light with in the optical modulator body 823 after dichronic mirror 814 reflections.
Blue light by dichronic mirror 813 reflects sees through dichronic mirror 814.
The light path of blue light is longer than red light and green light.
Therefore, in order to prevent the light loss of blue light, projector 800 possesses the light-guiding mechanism 821 that comprises the relay lens system formation of injecting lens 818, relay lens 819 and penetrating lens 820.
Blue light is injected blue light with in the optical modulator body 824 by light-guiding mechanism 821.
3 coloured light by each optical modulator body 822,823,824 modulation are injected in the cross dichroic prism 825.
Cross dichroic prism 825 forms for 4 right-angle prisms are fitted, and X shape ground formation reflect red lures the electric body multilayer film of luring of electric body multilayer film and reflect blue on its interface.
Lure at these that 3 coloured light are synthesized under effect of electric body multilayer film, form the light of color display.
Light after synthetic, the projection lens 826 that is by projection optics projects on the screen 827, and image is exaggerated demonstration.
Above-mentioned projector 800 possesses any one of liquid- crystal apparatus 60,60`, 160,160` of each above-mentioned embodiment or each variation as optical modulator body.
In the liquid-crystal apparatus of each above-mentioned embodiment or each variation, moisture etc. immerse liquid crystal layer from the outside of liquid-crystal apparatus possibility is lowered, can realize highly moistureproof can, stable display characteristic and high reliability.
So, in projector 800 of the present invention,, can keep the orientation control function of the liquid crystal molecule in the liquid-crystal apparatus owing to possess above-mentioned liquid-crystal apparatus as optical modulator body, can realize high reliability and good display characteristic.
And technical scope of the present invention is not limited to above-mentioned embodiment, in the scope that does not exceed aim of the present invention, comprises the various changes that above-mentioned embodiment is applied.
For example, in the above-described embodiment, is that example is illustrated as on-off element with the liquid-crystal apparatus that possesses TFT, but also the present invention can be applicable to the possess thin film diode liquid-crystal apparatus of two ends subtype device of (Thin Film Diode) etc. as on-off element.
In addition, be that example is illustrated with the permeation type liquid crystal device in the above-described embodiment, but the present invention also go for reflective liquid crystal device.
In addition, be that example is illustrated with the liquid-crystal apparatus that acts under TN (Twisted Nematic) pattern in the above-described embodiment, but the present invention also go for the liquid-crystal apparatus that acts under VA (Vertical Alignment) pattern.
Also having, be that example is illustrated with 3 board-like projector (projection type image display apparatus) in the above-described embodiment, but the present invention also goes for the projection type image display apparatus or the direct viewing type display device of one-board.
In addition, also liquid-crystal apparatus of the present invention can be applied to projector electronic equipment in addition.
As its concrete example, can enumerate mobile phone.
The display part of mobile phone possesses each the above-mentioned embodiment or the liquid-crystal apparatus of its variation.
In addition, as other electronic equipment, the view finder, portable TV, DSP device, PDA, electronic notebook, electric light notice board, propaganda bulletin that can enumerate facsimile unit, the digital camera of for example IC-card, video camera, PC, Helmet Mounted Display and subsidiary Presentation Function is with display etc.
Secondly, as an embodiment of microdevice, the example that is applicable to DMD (DigitalMicromirror Device) is described with reference to drawing.
The optic modulating device that DMD can be used as the reflection-type in for example above-mentioned projector uses.
Figure 14 shows that the assembling exploded perspective view of the main composition key element of optic modulating device 500.
In Figure 14, optic modulating device 500 is made of mirror substrate (first substrate) 400 and cover glass substrate (second substrate) 300 haply.
Between mirror substrate 400 and cover glass substrate 300, be provided with a plurality of tiny mirror (device portion) 302.
Specifically, form recess 402 on mirror substrate 400, recess 402 is provided with a plurality of tiny mirror (device portion) 302 of rectangular (array-like) assortment.
Among these plural tiny mirror 302, along a direction for example the X-direction of Figure 14 tiny mirror 302 of arranging connected by moment of torsion (torsion) bar 304.
On the surface of tiny mirror 302, be formed with reflection horizon 302a.
And by pitch drives tiny mirror 302, the reflection of light direction that tiny mirror 302 is injected changes.
And, by the reflection direction catoptrical time of control, light is modulated to regulation.
And, in recess 402, on the relative position of the torque tube between 2 adjacent on directions X tiny mirror 302 304, be provided with a plurality of column sections 410 that form from recess 402 projections.
By anodic bonding torque tube 304 and column sections 410, tiny mirror 302 is configured in the recess 202.
Moreover, on recess 402, be formed with wiring pattern portion 412.
Wiring pattern portion 412 has first address electrode 414 and second address electrode 416 respectively on relative position, the back side of the tiny mirror 302 of the both sides that clip torque tube 104.
Each a plurality of first address electrode 414 along the Y direction is arranged is connected in the first common wiring 418.
Equally, each a plurality of second address electrode 416 along the Y direction is arranged is connected in the second common wiring 420.
When tiny mirror 302 is carried out the ON pitch drives, switch on simultaneously by 304 pairs of a plurality of tiny mirror 302 of arranging of torque tube along the directions X of Figure 14.
In addition, in tiny mirror 302 energising, make first address electrode 414 and second address electrode 416 by point in turn or line drive in turn.
Towards the Y direction of Figure 14, select torque tube 304 to switch in turn, the ON pitch drives cycle in accordance with regulations of the tiny mirror 302 of rectangular arrangement is carried out.
On the other hand, when carrying out the OFF pitch drives of tiny mirror 302, the polarity of the voltage of first address electrode 414 and second address electrode 416 will be imposed on, opposite getting final product when being made as with the ON pitch drives.
Pitch drives in the opposite direction when therefore, tiny mirror 302 is with the ON pitch drives.
Change by the inclination that makes tiny mirror 302 like this, optic modulating device drives.
On the frame shape of mirror substrate 400, as surrounding the zone (recess 402 shown in Figure 14) that is provided with tiny mirror 302, dispose mold member on 404.
As shown in figure 15, be engaged via mold member mirror substrate 400 and cover glass substrate 300.
Figure 15 shows that the summary side-looking sectional structural map of optic modulating device 500.
As shown in figure 15, mirror substrate 400 and cover glass substrate 300 are fitted by mold member 430.
Mold member 430 prevents that moisture from entering into the inside of optic modulating device 500, protection tiny mirror 302 and wiring pattern portion 412 etc.
In the optic modulating device 500 of present embodiment, identical with the embodiment of the liquid-crystal apparatus that has illustrated with Fig. 6, below cover glass substrate 300, be formed with section on the side and look and be roughly jagged jog 340, with also be formed with section above the mirror substrate 400 of jog 340 relative configurations on 404 and look and be roughly jagged jog 440.
And jog 340,440 is provided with mold member 430.
Promptly, the universe of (recess 402) forms jog 340,440 in the zone that disposes mold member 430.
In above-mentioned optic modulating device 500, because to disposing mold member 430 on the jog 340,440, with the substrate surface that jog is not set is that the situation of tabular surface is compared, and the interface distance of the interface distance of mold member 430 and cover glass substrate 300 or mold member 430 and mirror substrate 400 only prolongs the degree of the area that contacts with the surface configuration of jog 340,440.
So, if moisture is under the situation of the external-to-internal of optic modulating device 500, because the interface distance of the interface distance of mold member 430 and cover glass substrate 300 or mold member 430 and mirror substrate 400 prolongs separately, can reduce the possibility that moisture arrives tiny mirror 302 and wiring pattern portion 412.
And, also can adopt the mode of Fig. 7 A~Figure 10 that is applicable to liquid-crystal apparatus to optic modulating device 500 of the present invention.