CN1973918B - Implantable cluster-stimulating microelectrode arrays in the human nervous system - Google Patents
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Abstract
一种可植入人体神经系统的簇状刺激微电极阵列,属于医疗假体领域。本发明包括:金属丝刺激微电极、金属丝支撑微电极、金属丝刺激微电极簇、金属丝刺激微电极簇阵列、微电极基底,Q个金属丝刺激微电极粘合在金属丝支撑微电极的外壁上组成金属丝刺激微电极簇,微电极基底是三层结构,m*n个金属丝刺激微电极簇固定于微电极基底上组成金属丝刺激微电极簇阵列,从微电极基底中引出引线与外部设备相连。金属丝刺激微电极和金属丝微支撑微电极的材料是生物相容性好的金属材料。本发明能够根据人体神经系统部位的解剖学和形态学的特点,在有限空间内能更有效地刺激神经系统。
The invention relates to a cluster stimulation micro-electrode array which can be implanted into human nervous system, belonging to the field of medical prosthesis. The invention includes: metal wire stimulating microelectrode, metal wire supporting microelectrode, metal wire stimulating microelectrode cluster, metal wire stimulating microelectrode cluster array, microelectrode substrate, Q metal wire stimulating microelectrodes bonded to the metal wire supporting microelectrode Metal wire stimulation microelectrode clusters are formed on the outer wall of the microelectrode base, and the microelectrode base is a three-layer structure. m*n metal wire stimulation microelectrode clusters are fixed on the microelectrode base to form a wire stimulation microelectrode cluster array, which is drawn out from the microelectrode base. The leads are connected to external devices. The material of the metal wire stimulating microelectrode and the metal wire microsupporting microelectrode is a metal material with good biocompatibility. The present invention can more effectively stimulate the nervous system in a limited space according to the anatomical and morphological features of the human nervous system.
Description
技术领域technical field
本发明涉及的是一种医疗假体技术领域的可植入微电极,特别是一种可植入人体神经系统的簇状刺激微电极阵列。The invention relates to an implantable microelectrode in the technical field of medical prosthesis, in particular to a cluster stimulation microelectrode array which can be implanted into the human nervous system.
背景技术Background technique
神经假体领域包括运动神经假体、人工耳蜗(耳蜗植入体)和视觉神经假体等。运动神经假体是通过深部脑刺激治疗运动障碍疾病如帕金森病(PD)开发的神经系统微电子器件。深部脑刺激术多选用埋藏式电刺激系统,此系统一般由植入电极、连接导线至皮下接收器及电刺激器三部分组成。电极植入后,选择一定刺激参数和不同电极刺激触点,以观察植入效果并同时记录不同触点的参数,以供术后参考。实验过程中要保证电极不发生位移,以免影响疗效。因此电极设计是运动神经假体系统的重要部分。The field of neuroprosthetics includes motor neuroprostheses, cochlear implants (cochlear implants) and optic neuroprostheses, among others. Motor neuroprostheses are microelectronic devices of the nervous system developed through deep brain stimulation to treat movement disorders such as Parkinson's disease (PD). Deep brain stimulation often uses an embedded electrical stimulation system, which generally consists of three parts: implanted electrodes, connecting wires to the subcutaneous receiver, and an electrical stimulator. After the electrodes are implanted, select certain stimulation parameters and different electrode stimulation contacts to observe the effect of implantation and record the parameters of different contacts at the same time for postoperative reference. During the experiment, it is necessary to ensure that the electrodes do not shift, so as not to affect the curative effect. Electrode design is therefore an important part of motor neuroprosthetic systems.
人的耳蜗毛细胞是接受声音的感觉细胞。当耳蜗毛细胞损伤严重时,就会出现严重的耳聋。人工耳蜗由体外和体内装置两部分组成,体外部分包括麦克风、言语转换器、发射线圈;体内的部分包括接收线圈、处理器、刺激电极及参照电极组成。刺激电极采用的通道数目越多,电极就能对耳蜗内更多位置的听神经纤维进行刺激,最大限度地利用患者耳蜗的天然构造,建立出更完整的听觉音阶,电极形态的设计也是人工耳蜗的关键。Hair cells in the human cochlea are sensory cells that receive sound. Severe deafness occurs when the damage to the hair cells of the cochlea is severe. The cochlear implant consists of two parts: external and internal devices. The external part includes microphones, speech converters, and transmitting coils; the internal part includes receiving coils, processors, stimulating electrodes, and reference electrodes. The more channels the stimulating electrodes use, the more electrodes can stimulate the auditory nerve fibers in the cochlea, and the natural structure of the patient's cochlea can be used to the greatest extent to establish a more complete auditory scale. The design of the electrode shape is also unique to the cochlear implant The essential.
视觉神经假体是为帮助视网膜或其他视觉器官发生病变的患者重新获得光明和视觉的医用装置。其中,植入的电极阵列直接作用于中枢和周围神经系统,模拟视觉正常形成的过程,通过编码以特定的脉冲形式把电信号传递给刺激微电极阵列,作用于视皮层、视网膜或视神经。刺激电极传输的脉冲信号要足够大以便引起刺激部分发生动作电位,通过神经传递到视觉皮层,通过大脑皮层记录电极记录成像的波形。在整个神经假体系统中,刺激微电极是至关重要的,它必须具有良好生物相容性、易于加工、灵活柔韧、空间利用率高等特点。Optic nerve prosthesis is a medical device to help patients with retinal or other visual organ lesions regain light and vision. Among them, the implanted electrode array directly acts on the central and peripheral nervous systems, simulating the process of normal vision formation, and transmits electrical signals to stimulate the microelectrode array in the form of specific pulses through encoding, acting on the visual cortex, retina or optic nerve. The pulse signal transmitted by the stimulating electrode should be large enough to cause an action potential to occur in the stimulating part, which is transmitted to the visual cortex through the nerve, and the imaging waveform is recorded by the recording electrode in the cerebral cortex. In the whole neuroprosthetic system, the stimulating microelectrode is crucial, and it must have good biocompatibility, easy processing, flexibility, and high space utilization.
经对现有技术文献的检索发现,专利申请号为03159801.3,公开日期为:2005年3月30日,专利名称为:“多电极阵列及其制造方法”,该发明提供了一种易于加工的、高密度的电极阵列,由微孔真列、单电极和固定树脂组成。虽然该发明也考虑了要实现电极阵列的高密度问题,但是仅提供了四电极阵列。由于电极的长度相同,没有考虑到用于神经束上时,对不同深度的神经纤维进行刺激,没有从根本上解决对人体神经系统进行电刺激的效率和实用问题,因此这类电极的综合性能还需要进一步改进。After searching the existing technical documents, it is found that the patent application number is 03159801.3, the publication date is: March 30, 2005, and the patent name is: "multi-electrode array and its manufacturing method". This invention provides an easy-to-process , High-density electrode array, composed of microporous column, single electrode and fixed resin. Although this invention also considers the problem of achieving a high density electrode array, it only provides a four-electrode array. Since the electrodes have the same length, it does not take into account the stimulation of nerve fibers at different depths when used on nerve bundles, and does not fundamentally solve the efficiency and practical problems of electrical stimulation of the human nervous system. Therefore, the comprehensive performance of this type of electrode Still needs further improvement.
发明内容Contents of the invention
本发明的目的在于针对现有技术的不足与缺陷,提供一种能够对人体神经系统进行有效高密度电刺激的簇状微电极阵列,使其能够根据人体神经系统的解剖学和形态学的特点,在有限空间内能更有效地刺激神经系统。The object of the present invention is to address the deficiencies and defects of the prior art, to provide a clustered microelectrode array capable of effectively high-density electrical stimulation of the human nervous system, so that it can , can stimulate the nervous system more effectively in a limited space.
本发明是通过以下技术方案实现的,本发明包括:金属丝刺激微电极、金属丝支撑微电极和微电极基底,Q个长度不同的金属丝微电极粘合在金属丝支撑微电极的外壁上组成金属微电极簇,微电极基底是三层结构,m*n个金属丝微电极簇固定于微电极基底上组成m*n的金属丝刺激微电极簇阵列。从微电极基底中引出引线与外部设备相连。金属丝刺激微电极和金属丝微支撑微电极的材料是生物相容性好的金属材料。m表示阵列的行数,n表示阵列的列数,Q表示每个金属丝微支撑电极上金属丝微刺激电极的数目。The present invention is achieved through the following technical solutions, and the present invention includes: a metal wire stimulating microelectrode, a metal wire supporting microelectrode and a microelectrode base, and Q metal wire microelectrodes with different lengths are bonded on the outer wall of the metal wire supporting microelectrode Metal microelectrode clusters are formed, and the microelectrode base has a three-layer structure. m*n metal wire microelectrode clusters are fixed on the microelectrode base to form m*n metal wire stimulation microelectrode cluster arrays. Lead wires are drawn from the microelectrode base to connect with external devices. The material of the metal wire stimulating microelectrode and the metal wire microsupporting microelectrode is a metal material with good biocompatibility. m represents the number of rows of the array, n represents the number of columns of the array, and Q represents the number of wire micro-stimulation electrodes on each wire micro-support electrode.
所述的生物相容性好的金属材料是指钨丝、金丝、铂铱合金丝的其中一种。The metal material with good biocompatibility refers to one of tungsten wire, gold wire and platinum-iridium alloy wire.
所述的金属丝刺激微电极和金属丝支撑微电极的杆部经过绝缘处理,尖端暴露的微电极。The rods of the metal wire stimulating microelectrode and the metal wire supporting microelectrode are subjected to insulation treatment, and the tip is exposed to the microelectrode.
所述的对金属丝刺激微电极和金属丝支撑微电极进行绝缘的材料是C型聚对二甲苯。The material for insulating the wire stimulating microelectrode and the wire supporting microelectrode is C-type parylene.
所述的对金属丝刺激微电极和金属丝支撑微电极的尖端采用强激光暴露。The tips of the metal wire stimulating microelectrode and the wire supporting microelectrode are exposed with strong laser light.
所述的金属丝刺激微电极的直径为10-20μm。The diameter of the metal wire stimulating microelectrode is 10-20 μm.
所述的金属丝刺激微电极的尖端直径约为1μm。The tip diameter of the wire stimulating microelectrode is about 1 μm.
所述的金属丝支撑微电极的直径为50-80μm。The diameter of the metal wire supporting the microelectrode is 50-80 μm.
所述的金属丝刺激微电极长度范围为300-1000μm。The length range of the metal wire stimulating microelectrodes is 300-1000 μm.
所述的金属丝刺激微电极的尖端直径约为3μm。The tip diameter of the wire stimulating microelectrode is about 3 μm.
所述的金属丝支撑微电极长度为1.2mm。The length of the metal wire supporting the microelectrode is 1.2 mm.
所述的金属丝刺激微电极簇的总直径为70-120μm。The total diameter of the metal wire stimulating microelectrode cluster is 70-120 μm.
所述的金属丝刺激微电极簇是Q个长度不同的金属丝刺激微电极按照一定长度的分布策略粘附在金属丝支撑微电极外壁上。把刺激电极的长度设计为长短不一,是为了能刺激到不同深度的神经纤维并实现多位点的刺激。把长度不一的金属丝刺激微电极按照一定次序交错排列,是为了保证整个金属丝刺激微电极簇阵列中每个金属丝刺激微电极簇的稳定性和机械强度。The metal wire stimulating microelectrode cluster is that Q metal wire stimulating microelectrodes with different lengths adhere to the outer wall of the metal wire supporting microelectrode according to a distribution strategy of a certain length. The length of the stimulating electrodes is designed to be different in length, in order to stimulate nerve fibers at different depths and realize multi-site stimulation. The wire stimulating microelectrodes with different lengths are staggered in a certain order to ensure the stability and mechanical strength of each wire stimulating microelectrode cluster in the entire wire stimulating microelectrode cluster array.
所述的用于粘合金属丝刺激微电极与金属丝支撑微电极的粘接剂是:氰基丙烯酸盐粘合剂。The adhesive used for bonding the wire stimulating microelectrode and the wire supporting microelectrode is: cyanoacrylate adhesive.
所述的金属丝刺激微电极长度的分布策略是:把金属丝刺激微电极长度设为lp=ll+(p-1)*Δl,共p个,即电极长度为从ll到lp,相邻长度差为Δl。The distribution strategy of the length of the metal wire stimulating microelectrode is: set the length of the metal wire stimulating microelectrode as l p = l l + (p-1)*Δl, a total of p, that is, the electrode length is from l l to l p , the adjacent length difference is Δl.
所述的金属丝刺激微电极簇阵列的排列策略是:设阵列为A={m*n},A的元素li,j(k)是位于金属丝刺激微电极阵列第i行,第j列金属丝微电极簇中第k个金属丝微刺激电极的长度,li,j(k)=ll+[(i-1)*m+(j-1)]*Δl+m*n*(k-1)*Δl(i=1、2...m,j=1、2…n,k=1、2…Q)。l表示金属丝微刺激电极的长度,A表示电极阵列(Array),m表示阵列的行数,n表示阵列的列数,Q表示每个金属丝微支撑电极上金属丝微刺激电极的数目,p=m*n*Q。The arrangement strategy of the described metal wire stimulation microelectrode cluster array is: set the array as A={m*n}, the element l i of A, j(k) is located in the i-th row of the wire stimulation microelectrode array, the jth The length of the kth metal wire microstimulation electrode in the row of metal wire microelectrode clusters, l i, j(k) = l l + [(i-1)*m+(j-1)]*Δl+m*n* (k-1)*Δl (i=1, 2...m, j=1, 2...n, k=1, 2...Q). l represents the length of the metal wire micro-stimulation electrode, A represents the electrode array (Array), m represents the number of rows of the array, n represents the number of columns of the array, Q represents the number of metal wire micro-stimulation electrodes on each metal wire micro-support electrode, p=m*n*Q.
所述金属丝刺激微电极簇阵列的行间距为0.35-1.2mm,列间距为0.35-1.2mm。The row spacing of the wire stimulating microelectrode cluster array is 0.35-1.2 mm, and the column spacing is 0.35-1.2 mm.
所述的三层电极基底的构成是:表层的硅橡胶层,中间的导电层,底层的硅橡胶层。The composition of the three-layer electrode base is: a silicon rubber layer on the surface, a conductive layer in the middle, and a silicon rubber layer on the bottom layer.
所述的表层的硅橡胶层厚度为0.5-1mm。The silicon rubber layer thickness of the surface layer is 0.5-1mm.
所述的中间的导电层厚度为0.5-1mm。The thickness of the middle conductive layer is 0.5-1mm.
所述的底层的硅橡胶层厚度为1-2mm。The silicon rubber layer thickness of the bottom layer is 1-2mm.
与现有技术相比,本发明主要创新点技术如下:Compared with the prior art, the main innovative point technology of the present invention is as follows:
1)充分考虑了人体神经系统的特点,针对现有神经刺激电极技术的缺陷,设计了该可植入人体神经系统的簇状刺激微电极阵列。由于本发明设计的微刺激电极的长度不同,并有规律排列组合,可以对不同深度的神经纤维进行高效刺激。同时可以设计更多的实验方案,在试验中允许更多的信息输入输出,提高实验的成功率,让人们掌握更多的外界刺激与人体神经组织反应之间的关系。1) Fully considering the characteristics of the human nervous system, aiming at the defects of the existing nerve stimulation electrode technology, the cluster stimulating microelectrode array that can be implanted into the human nervous system is designed. Since the micro-stimulation electrodes designed in the present invention have different lengths and are regularly arranged and combined, nerve fibers of different depths can be efficiently stimulated. At the same time, more experimental schemes can be designed to allow more information input and output in the experiment, improve the success rate of the experiment, and allow people to grasp more relationships between external stimuli and human nervous tissue responses.
2)充分考虑了所选电极材料的生物相容性和电特性:金属微电极具有电阻低、机械强度高、电噪声低的优点。金属微电极尤其有利于慢性植入实验的需要,是较理想的刺激电极。钨丝、金丝、铂铱合金丝等金属丝均可作为原料。钨丝生物相容性较好、强度大、价格低廉、制做方便,是在实验和科研中最早使用的也是很常用的电极材料。铂铱合金的生物相容性优异、物理化学特性稳定,尤其适合体内植入的需要,是最理想的电极材料。通过动物实验证明,不锈钢丝、钨丝、铂、铂铱合金均具有较小的毒性,铂铱合金在体内引起的组织炎症反应最小,钨丝和不锈钢丝次之。2) The biocompatibility and electrical properties of the selected electrode materials are fully considered: metal microelectrodes have the advantages of low electrical resistance, high mechanical strength, and low electrical noise. Metal microelectrodes are especially beneficial to the needs of chronic implantation experiments, and are ideal stimulating electrodes. Metal wires such as tungsten wire, gold wire, and platinum-iridium alloy wire can be used as raw materials. Tungsten wire has good biocompatibility, high strength, low price, and convenient manufacture. It is the earliest and most commonly used electrode material in experiments and scientific research. Platinum-iridium alloy has excellent biocompatibility and stable physical and chemical properties, and is especially suitable for implantation in vivo, and is the most ideal electrode material. Animal experiments have proved that stainless steel wire, tungsten wire, platinum, and platinum-iridium alloy have less toxicity, and platinum-iridium alloy causes the least tissue inflammation in the body, followed by tungsten wire and stainless steel wire.
3)对金属丝电极的绝缘问题,充分考虑了绝缘材料与组织的生物相容性问题,所选绝缘材料不引起组织反应和炎症反应并能保护植入器件不受生理环境的侵蚀,本发明所用的绝缘材料是C型聚对二甲苯(Parylene-C)。3) For the insulation problem of the metal wire electrode, the biocompatibility problem between the insulating material and the tissue has been fully considered, and the selected insulating material does not cause tissue reaction and inflammatory reaction and can protect the implant device from being eroded by the physiological environment. The insulating material used is C-type parylene (Parylene-C).
本发明的有益效果是:充分考虑了所要植入人体部分的形态和解剖学特点,本发明设计的柔韧刺激微电极阵列尤其适用于对人体神经系统进行刺激。人们利用微加工技术制做高密度电极获得较高的刺激效率,从而可为临床实验和科学研究提供有意义的数据。用于制作神经刺激器的材料具有良好的生物相容性并能够保证器件不受体内生理环境的侵蚀。电极的几何尺寸可以根据要刺激部位的大小进行控制,而且电极簇中附着于支撑微电极的刺激电极的个数、直径以及长度都可以根据实际需要而变化,所以,该电极簇可以实现精确刺激,有利于人们寻找刺激位点的不同造成不同刺激效果的关系。The beneficial effect of the invention is that the shape and anatomical characteristics of the part to be implanted into the human body are fully considered, and the flexible stimulating microelectrode array designed by the invention is especially suitable for stimulating the human nervous system. People use micro-processing technology to make high-density electrodes to obtain higher stimulation efficiency, which can provide meaningful data for clinical experiments and scientific research. The materials used to make neurostimulators have good biocompatibility and can ensure that the device is not eroded by the physiological environment in the body. The geometric dimensions of the electrodes can be controlled according to the size of the site to be stimulated, and the number, diameter and length of the stimulating electrodes attached to the supporting microelectrodes in the electrode cluster can be changed according to actual needs, so the electrode cluster can achieve precise stimulation , which is helpful for people to find the relationship between different stimulation sites and different stimulation effects.
附图说明Description of drawings
图1为金属丝刺激微电极簇的示意图Figure 1 is a schematic diagram of wire-stimulated microelectrode clusters
图2为本发明结构示意图Fig. 2 is a structural representation of the present invention
图3为电极基底三层结构的示意图Figure 3 is a schematic diagram of the three-layer structure of the electrode base
图4为电极基底中间导电层排线的示意图Figure 4 is a schematic diagram of wiring in the middle conductive layer of the electrode base
具体实施方式Detailed ways
下面结合附图对本发明的实施例作详细说明:本实施例在以本发明技术方案为前提下进行实施,给出了详细的实施方式和过程,但本发明的保护范围不限于下述的实施例。The embodiments of the present invention are described in detail below in conjunction with the accompanying drawings: the present embodiment is implemented on the premise of the technical solution of the present invention, and detailed implementation methods and processes are provided, but the protection scope of the present invention is not limited to the following implementations example.
如图1、2、3、4所示,本实施例包括:金属丝刺激微电极1、金属丝支撑微电极2、金属丝刺激微电极簇3、金属丝刺激微电极簇阵列4、微电极基底5,Q个金属丝微电极1粘合在金属丝支撑微电极2的外壁上组成金属微电极簇3,微电极基底5是三层结构,m*n个金属微电极簇3固定于微电极基底5上组成m*n的金属丝刺激微电极簇阵列4,从微电极基底5中引出引线与外部设备相连。金属丝微电极1和金属丝支撑微电极2的材料是生物相容性好的金属材料。m表示阵列的行数,n表示阵列的列数,Q表示每个金属丝微支撑电极上金属丝微刺激电极的数目。As shown in Figures 1, 2, 3, and 4, this embodiment includes: metal wire stimulating microelectrode 1, metal wire supporting microelectrode 2, metal wire stimulating microelectrode cluster 3, metal wire stimulating microelectrode cluster array 4, microelectrode Substrate 5, Q metal wire microelectrodes 1 are bonded to the outer wall of the metal wire supporting microelectrodes 2 to form metal microelectrode clusters 3, the microelectrode substrate 5 has a three-layer structure, and m*n metal microelectrode clusters 3 are fixed on the microelectrodes. The metal wires composed of m*n on the electrode substrate 5 stimulate the microelectrode cluster array 4, and lead wires are drawn from the microelectrode substrate 5 to connect with external devices. The material of the wire microelectrode 1 and the wire supporting microelectrode 2 is a metal material with good biocompatibility. m represents the number of rows of the array, n represents the number of columns of the array, and Q represents the number of wire micro-stimulation electrodes on each wire micro-support electrode.
工作时,体外设备将设置的电信号,通过导线传送到体内植入部分,将电脉冲经金属丝刺激微电极1刺激电极尖端附近的神经系统,即金属丝刺激微电极1是体内植入部分与人体神经组织的接口。由于本实施例的金属丝微刺激电极1长度不同设计,可以对不同深度的神经进行刺激,可以弥补手术技术精度上的缺陷,并且本实施例的高密度刺激位点,提高了刺激效率,是以往技术不能比拟的优势。When working, the external device transmits the set electrical signal to the implanted part in the body through the wire, and the electric pulse stimulates the nervous system near the tip of the electrode through the wire to stimulate the microelectrode 1, that is, the wire stimulates the microelectrode 1 to be the implanted part in the body. Interface with human nervous tissue. Due to the different designs of the wire micro-stimulation electrodes 1 in this embodiment, nerves of different depths can be stimulated, which can make up for the defects in surgical technique precision, and the high-density stimulation sites in this embodiment improve the stimulation efficiency, which is Advantages that cannot be compared with previous technologies.
所述的生物相容性好的金属材料是指:钨丝、金丝、铂铱合金丝的其中一种。The metal material with good biocompatibility refers to one of tungsten wire, gold wire and platinum-iridium alloy wire.
所述的金属丝刺激微电极1和金属丝支撑微电极2的杆部经过绝缘处理,尖端暴露的电极。The rods of the wire stimulating microelectrode 1 and the wire supporting microelectrode 2 are insulated, and the tips are exposed.
所述的对金属丝刺激微电极1和金属丝支撑微电极2进行绝缘的材料是C型聚对二甲苯。The material for insulating the wire stimulating microelectrode 1 and the wire supporting microelectrode 2 is C-type parylene.
所述的对金属丝刺激微电极1和金属丝支撑微电极2的尖端采用强激光暴露。The tip of the metal wire stimulating microelectrode 1 and the wire supporting microelectrode 2 is exposed with strong laser light.
所述的金属丝刺激微电极1的直径为10-20μm。The diameter of the metal wire stimulating microelectrode 1 is 10-20 μm.
所述的金属丝刺激微电极1的尖端直径约为1μm。The diameter of the tip of the wire stimulating microelectrode 1 is about 1 μm.
所述的金属丝支撑微电极2的直径为50-80μm。The diameter of the metal wire supporting the microelectrode 2 is 50-80 μm.
所述的金属丝刺激微电极1的长度范围为l=300-1000μm。The length range of the metal wire stimulating microelectrode 1 is l=300-1000 μm.
所述的金属丝刺激微电极1的尖端直径约为3μm。The diameter of the tip of the wire stimulating microelectrode 1 is about 3 μm.
所述的金属丝支撑微电极2的长度为1.2mm。The length of the metal wire supporting the microelectrode 2 is 1.2 mm.
所述的金属丝刺激微电极簇3的总直径为70-120μm。The total diameter of the wire stimulating microelectrode cluster 3 is 70-120 μm.
所述的金属丝刺激微电极簇3是Q个长度不同的金属丝刺激微电极1按照一定长度分布的策略粘附在金属丝支撑微电极2的外壁上。The metal wire stimulating microelectrode cluster 3 is that Q metal wire stimulating microelectrodes 1 with different lengths are adhered to the outer wall of the wire supporting microelectrode 2 according to a certain length distribution strategy.
所述的用于粘合金属丝刺激微电极1与金属丝支撑微电极2的粘接剂是:氰基丙烯酸盐粘合剂。The adhesive used for bonding the wire stimulating microelectrode 1 and the wire supporting microelectrode 2 is: cyanoacrylate adhesive.
所述的金属丝刺激微电极1的长度的分布策略是:把金属丝刺激微电极1的长度设为lp=ll+(p-1)*Δl,共p个即金属丝刺激微电极1的长度为从ll到lp,相邻长度差为Δl。The distribution strategy of the length of the metal wire stimulating microelectrode 1 is: set the length of the metal wire stimulating microelectrode 1 as lp =l l +(p-1)*Δl, and there are p total of metal wire stimulating microelectrodes The length of 1 is from l l to l p , and the difference between adjacent lengths is Δl.
所述的金属丝刺激微电极簇阵列4的排列为设阵列为A={m*n},A的元素li,jk是位于金属丝刺激微电极阵列4的第i行,第j列金属丝微电极簇3中的第k个金属丝微刺激电极1的长度,li,j(k)=ll+[(i-1)*m+(j-1)]*Δl+m*n*(k-1)*Δl(i=1、2...m,j=1、2…n,k=1、2…Q)。l表示金属丝微刺激电极的长度,A表示电极阵列(Array),m表示阵列的行数,n表示阵列的列数,Q表示每个金属丝微支撑电极上金属丝微刺激电极的数目,p=m*n*Q。The arrangement of the described metal wire stimulation microelectrode cluster array 4 is assuming that the array is A={m*n}, the elements l i and jk of A are located in the ith row of the metal wire stimulation microelectrode array 4, and the jth column metal The length of the kth metal wire microstimulation electrode 1 in the wire microelectrode cluster 3, l i, j(k) = l l + [(i-1)*m+(j-1)]*Δl+m*n *(k-1)*Δl (i=1, 2...m, j=1, 2...n, k=1, 2...Q). l represents the length of the metal wire micro-stimulation electrode, A represents the electrode array (Array), m represents the number of rows of the array, n represents the number of columns of the array, Q represents the number of metal wire micro-stimulation electrodes on each metal wire micro-support electrode, p=m*n*Q.
所述金属丝刺激微电极簇阵列4的行间距为0.35-1.2mm,列间距为0.35-1.2mm。The metal wire stimulating microelectrode cluster array 4 has a row spacing of 0.35-1.2mm and a column spacing of 0.35-1.2mm.
所述的金属丝刺激微电极簇阵列4上金属丝微刺激电极簇3中的金属丝微刺激电极1的直径相同,但长度各不相同;金属丝支撑微电极2的直径和长度相同。The diameters of the wire micro-stimulation electrodes 1 in the wire micro-stimulation electrode clusters 3 on the wire stimulation micro-electrode cluster array 4 are the same, but the lengths are different; the diameters and lengths of the wire support micro-electrodes 2 are the same.
所述的三层电极基底5的构成是:表层的硅橡胶层6,中间的导电层7,底层的硅橡胶层8。The composition of the three-layer electrode substrate 5 is: a
所述的表层的硅橡胶层6厚度为0.5-1mm。The
所述的中间的导电层7厚度为0.5-1mm。The thickness of the middle
所述的底层的硅橡胶层8厚度为1-2mm。The
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