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CN1966279A - Laser induced thermal imaging apparatus with plate copying device - Google Patents

Laser induced thermal imaging apparatus with plate copying device Download PDF

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CN1966279A
CN1966279A CNA2006101465548A CN200610146554A CN1966279A CN 1966279 A CN1966279 A CN 1966279A CN A2006101465548 A CNA2006101465548 A CN A2006101465548A CN 200610146554 A CN200610146554 A CN 200610146554A CN 1966279 A CN1966279 A CN 1966279A
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film donor
substrate support
magnetic
layer
liti
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CN100577440C (en
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鲁硕原
金茂显
成镇旭
李相奉
金善浩
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Samsung Display Co Ltd
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Samsung SDI Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/18Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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Abstract

本发明公开了一种激光诱导热成像(LITI)装置及使用该LITI装置制造电子器件的方法。LITI装置包括腔体、基底支撑件、晒版器件和激光源或振荡器。LITI装置将可转印层从膜供体器件转印到中间电子器件的表面上。LITI装置利用磁力来提供可转印层和中间器件表面之间的紧密接触。在LITI装置的彼此分隔地置于可转印层和中间器件表面之间的两个组件中形成的磁性材料产生磁力。磁体或磁性材料形成在下面的LITI装置的两个组件中:1)中间器件和膜供体器件;2)中间器件和晒版器件;3)基底支撑件和膜供体器件;4)基底支撑件和晒版器件。

Figure 200610146554

The invention discloses a laser-induced thermal imaging (LITI) device and a method for manufacturing electronic devices using the LITI device. A LITI device includes a cavity, a substrate support, a printing device, and a laser source or oscillator. The LITI apparatus transfers a transferable layer from a film donor device onto the surface of an intermediate electronic device. The LITI device utilizes magnetic force to provide intimate contact between the transferable layer and the intermediate device surface. The magnetic force is generated by the magnetic material formed in two components of the LITI device spaced apart from each other, between the transferable layer and the intermediate device surface. The magnet or magnetic material is formed in the following two components of the LITI apparatus: 1) intermediate device and film donor device; 2) intermediate device and printing device; 3) substrate support and film donor device; 4) substrate support software and printing equipment.

Figure 200610146554

Description

具有晒版器件的激光诱导热成像装置Laser-induced thermal imaging device with printing device

                         技术领域Technical field

本发明涉及一种电子器件的生产,更具体地讲,涉及利用激光诱导热成像(LITI)技术在电子器件中形成有机材料层。The present invention relates to the production of electronic devices, and more particularly to the formation of organic material layers in electronic devices using laser induced thermal imaging (LITI) technology.

                        背景技术 Background technique

某些电子器件包括有机层。例如,有机发光器件(OLED)包括多个有机层。已经采用各种方法来形成这些有机层。例如,这些方法包括沉积法、喷墨法和激光诱导热成像(LITI)法。Certain electronic devices include organic layers. For example, an organic light emitting device (OLED) includes multiple organic layers. Various methods have been employed to form these organic layers. For example, these methods include deposition methods, ink jet methods, and laser induced thermal imaging (LITI) methods.

在LITI法中,膜供体(film donor)器件用来提供可转印层。膜供体器件放置在已经局部构造好的电子器件(中间器件)上,使得可转印层接触中间器件的将被转印上可转印层的表面(接收表面)。然后,对供体器件的选择的区域施加激光束,这使得在所选择的区域中在供体器件中产生热。这个热量导致可转印层的期望的部分脱层。当移走供体器件时,可转印膜的脱层的部分留在中间器件的表面上。In the LITI process, a film donor device is used to provide the transferable layer. The film donor device is placed on the already partially structured electronic device (intermediate device) such that the transferable layer contacts the surface of the intermediate device on which the transferable layer is to be transferred (receiving surface). A laser beam is then applied to selected regions of the donor device, which causes heat to be generated in the donor device in the selected regions. This heat causes the desired partial delamination of the transferable layer. When the donor device is removed, delaminated portions of the transferable film remain on the surface of the intermediate device.

通常的LITI装置利用抽气来使得在这个过程中可转印层接触中间器件的表面并保持这种状态。图1是LITI装置100的剖视图。LITI装置100包括腔体110、基底支撑件120和激光源或振荡器130。基底支撑件120包括:中间器件容纳凹槽121,用以在其中容纳中间电子器件140;供体器件容纳凹槽123,用以在其中容纳膜供体器件150。Typical LITI setups use pumping to bring and hold the transferable layer in contact with the surface of the intermediate device during the process. FIG. 1 is a cross-sectional view of a LITI device 100 . The LITI device 100 includes a cavity 110 , a substrate support 120 and a laser source or oscillator 130 . The substrate support 120 includes: an intermediate device receiving groove 121 to accommodate an intermediate electronic device 140 therein; and a donor device receiving groove 123 to accommodate a film donor device 150 therein.

为了以高的精确度和较少的缺陷将有机材料部分转印到中间器件,需要可转印层和接收表面之间紧密接触。LITI装置100包括用于形成这样的紧密接触的抽气机械装置。该抽气机械装置包括管161、163和真空泵P。通过管161的抽气使得放置在凹槽121中的中间器件(未示出)向下并且保持这种状态。通过管163的抽气使得放置在凹槽123中的供体器件(未示出)向下且与中间器件接触,并保持这种状态。为了执行这些抽气过程,在腔体内需要空气或其它气体介质。In order to partially transfer organic materials to intermediate devices with high precision and fewer defects, intimate contact between the transferable layer and the receiving surface is required. LITI device 100 includes an air pumping mechanism for forming such intimate contact. The pumping mechanism comprises pipes 161 , 163 and a vacuum pump P. The suction through the tube 161 brings down an intermediate device (not shown) placed in the groove 121 and keeps it that way. The suction through the tube 163 brings the donor device (not shown) placed in the groove 123 down and into contact with the intermediate device, and remains so. In order to perform these pumping processes, air or another gaseous medium is required inside the cavity.

然而,在LITI工艺之前或之后执行的工艺通常在真空气氛下进行。因此,利用上述抽气的LITI工艺需要打破前面和后续工艺之间的真空。However, processes performed before or after the LITI process are generally performed under a vacuum atmosphere. Therefore, the LITI process utilizing the aforementioned pumping needs to break the vacuum between the previous and subsequent processes.

在该部分中的讨论在于提供相关技术的背景信息,而不构成对现有技术的陈述。The discussions in this section are intended to provide background information of related art and do not constitute representations of prior art.

                       发明内容Contents of invention

本发明的一方面提供了一种用于激光诱导热成像(LITI)的装置,该装置包括:基底支撑件,构造成支撑中间电子器件和膜供体器件;激光源;晒版器件,位于所述基底支撑件和所述激光源之间,所述晒版器件在第一位置和第二位置之间相对于所述基底支撑件是可移动的,所述第一位置距离所述基底支撑件第一距离,所述第二位置距离所述基底支撑件第二距离,所述第二距离大于所述第一距离,所述晒版器件被构造成在所述第一位置附近将所述膜供体器件压向所述中间器件,所述晒版器件包含从由永磁体和电磁体组成的组中选择的至少一种磁性材料。An aspect of the present invention provides an apparatus for laser-induced thermal imaging (LITI), the apparatus comprising: a substrate support configured to support an intermediate electronic device and a film donor device; a laser source; a printing device positioned at the Between the substrate support and the laser source, the printing device is movable relative to the substrate support between a first position and a second position, the first position being a distance from the substrate support a first distance, the second location is a second distance from the substrate support, the second distance is greater than the first distance, the printing device is configured to place the film in the vicinity of the first location A donor device is pressed against said intermediate device, said printing device comprising at least one magnetic material selected from the group consisting of permanent magnets and electromagnets.

所述电磁体可以与外部电源电连接,并可以被构造成被有选择性地励磁。所述至少一种磁性材料可包括从由板、片、块、杆和颗粒组成的组中选择的一个或多个形式。所述晒版器件可包括磁性部分和非磁性部分,所述磁性部分可包含至少一种磁性材料。所述磁性部分可被布置成比所述非磁性部分通常更靠近所述基底支撑件。所述基底支撑件包含从由永磁体、电磁体和磁性可吸引材料组成的组中选择的至少一种磁性材料。The electromagnet can be electrically connected to an external power source and can be configured to be selectively energized. The at least one magnetic material may include one or more forms selected from the group consisting of plates, sheets, blocks, rods, and particles. The printing device may comprise a magnetic part and a non-magnetic part, the magnetic part may comprise at least one magnetic material. The magnetic portion may be arranged generally closer to the substrate support than the non-magnetic portion. The substrate support includes at least one magnetic material selected from the group consisting of permanent magnets, electromagnets, and magnetically attractable materials.

该装置还可包括:中间器件,包括接收表面,并被放置在所述基底支撑件的上方;膜供体器件,包括可转印膜层,并被放置在所述中间器件的上方。可布置所述中间器件和所述膜供体器件,使得所述接收表面和所述可转印膜层接触。在所述接收表面和所述可转印膜层之间会基本上没有气泡。所述膜供体器件还可包括光热转化层。所述膜供体器件可不包括含有永磁体或电磁体的磁性层。所述中间电子器件可包含从由永磁体、电磁体和磁性可吸引材料组成的组中选择的至少一种磁性材料。The apparatus may further comprise: an intermediate device comprising a receiving surface and positioned over said substrate support; a film donor device comprising a transferable film layer and positioned over said intermediate device. The intermediate means and the film donor means may be arranged such that the receiving surface is in contact with the transferable film layer. There will be substantially no air bubbles between the receiving surface and the transferable film layer. The film donor device may also include a light-to-heat conversion layer. The film donor device may not include a magnetic layer containing permanent magnets or electromagnets. The intermediate electronic device may comprise at least one magnetic material selected from the group consisting of a permanent magnet, an electromagnet, and a magnetically attractable material.

本发明的另一方面提供了一种利用该装置来制造电子器件的方法,所述方法包括:将中间器件放置在所述基底支撑件上,所述中间器件包括第一表面和第二表面,所述第一表面面对所述晒版器件,所述第二表面接触所述基底支撑件;将膜供体器件放置在所述中间器件的第一表面上,所述膜供体器件包括第三表面和第四表面,所述第三表面面对所述晒版器件,所述第四表面面对所述基底支撑件;移动所述晒版器件以使其接触所述膜供体器件的第三表面,使得所述膜供体器件的第四表面接触所述中间器件的第一表面;将所述膜供体器件压向所述中间器件。Another aspect of the present invention provides a method of manufacturing an electronic device using the apparatus, the method comprising: placing an intermediate device on the substrate support, the intermediate device comprising a first surface and a second surface, The first surface faces the printing device, the second surface contacts the substrate support; placing a film donor device on the first surface of the intermediate device, the film donor device comprising a first Three surfaces and a fourth surface, the third surface facing the printing device, the fourth surface facing the substrate support; moving the printing device so that it contacts the film donor device a third surface such that the fourth surface of the film donor device contacts the first surface of the intermediate device; pressing the film donor device against the intermediate device.

所述晒版器件可包括开口,所述方法还可包括将激光束通过所述晒版器件的开口照射到所述膜供体器件上。可以在真空气氛下执行所述方法。所述晒版器件可包含电磁体,引发所述磁力包括激励所述电磁体。挤压所述膜供体器件可包括将所述晒版器件的重力施加到所述膜供体器件。挤压所述膜供体器件还可包括使得所述至少一种磁性材料与在所述中间器件的第一表面下面的磁体或磁性可吸引材料相互发生磁力作用。所述中间器件可包含所述磁体或磁性可吸引材料。所述基底支撑件可包含所述磁体或磁性可吸引材料。The printing device may include an opening, and the method may further include irradiating a laser beam onto the film donor device through the opening of the printing device. The method may be performed under a vacuum atmosphere. The printing device may comprise an electromagnet, inducing the magnetic force comprising energizing the electromagnet. Squeezing the film donor device may comprise applying the gravity of the printing device to the film donor device. Pressing the film donor device may further comprise causing the at least one magnetic material to magnetically interact with a magnet or magnetically attractable material underlying the first surface of the intermediate device. The intermediate device may comprise the magnet or magnetically attractable material. The substrate support may contain the magnet or magnetically attractable material.

                        附图说明Description of drawings

从以下结合附图的描述中,本发明的方面和优点将变得清楚并更易于理解。Aspects and advantages of the present invention will become apparent and better understood from the following description taken in conjunction with the accompanying drawings.

图1示出了激光诱导热成像装置的示意性剖视图。Fig. 1 shows a schematic cross-sectional view of a laser-induced thermal imaging device.

图2示出了根据本发明一个实施例的激光诱导热成像装置的示意性剖视图。Fig. 2 shows a schematic cross-sectional view of a laser-induced thermal imaging device according to an embodiment of the present invention.

图3示出了根据本发明一个实施例的激光诱导热成像装置的示意性分解透视图。Fig. 3 shows a schematic exploded perspective view of a laser induced thermal imaging device according to an embodiment of the present invention.

图4A和图4B示出了根据本发明实施例的局部构造好的电子器件的示意性剖视图。4A and 4B show schematic cross-sectional views of partially constructed electronic devices according to embodiments of the present invention.

图4C示出了根据本发明一个实施例的局部构造好的电子器件的示意性俯视平面图。Figure 4C shows a schematic top plan view of a partially constructed electronic device according to one embodiment of the present invention.

图5A示出了根据本发明一个实施例的基底支撑件的示意性透视图。Figure 5A shows a schematic perspective view of a substrate support according to one embodiment of the present invention.

图5B示出了沿着线I-I’截取的图5A中的基底支撑件的示意性剖视图。Fig. 5B shows a schematic cross-sectional view of the substrate support in Fig. 5A taken along line I-I'.

图6A-图6C示出了根据本发明实施例的供体器件的示意性局部剖视图。6A-6C show schematic partial cross-sectional views of a donor device according to an embodiment of the present invention.

图7示出了根据本发明一个实施例的晒版器件(contanct frame)的示意性透视图。Figure 7 shows a schematic perspective view of a contact frame according to one embodiment of the present invention.

图8是根据本发明一个实施例的激光诱导热成像方法的流程图。FIG. 8 is a flowchart of a laser induced thermal imaging method according to an embodiment of the present invention.

图9A-9F示出了根据本发明一个实施例的激光诱导热成像方法。9A-9F illustrate a laser-induced thermal imaging method according to one embodiment of the present invention.

图10A-10D示出了根据本发明一个实施例的激光诱导热成像方法。10A-10D illustrate a laser-induced thermal imaging method according to one embodiment of the present invention.

图11示出了根据本发明一个实施例的激光振荡器的示意性透视图。Fig. 11 shows a schematic perspective view of a laser oscillator according to one embodiment of the present invention.

                     具体实施方式 Detailed ways

将参照附图来详细描述本发明的多个实施例。在附图中,相同的标号表示相同或功能相似的部件或元件。Various embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, identical reference numerals indicate identical or functionally similar parts or elements.

激光诱导热成像装置Laser Induced Thermal Imaging Device

在实施例中,LITI装置利用磁力来提供膜供体器件和中间器件之间的紧密接触。与图1中的LITI装置的抽气不同,磁力不需要腔体内部的空气或流体。在实施例中,利用磁力使膜供体器件和中间器件接触既可以在真空条件下进行也可以在非真空条件下进行。In an embodiment, the LITI device utilizes magnetic force to provide intimate contact between the film donor device and the intermediate device. Unlike the pumping of the LITI device in Figure 1, the magnetic force does not require air or fluid inside the cavity. In embodiments, magnetically contacting the film donor device and the intermediate device can be performed under vacuum or non-vacuum conditions.

图2示出了根据一个实施例的LITI装置200。示出的LITI装置包括:腔体210、基底支撑件260、晒版器件230、激光源或振荡器220。腔体210提供了用膜供体器件241来加工中间(或局部构造的)电子器件250的空间。基底支撑件260被构造成支撑中间器件250和膜供体器件241。晒版器件230可移动地连接到腔体210,用于在膜供体器件241上方提供向下的重力。在一些实施例中,晒版器件230可以省略。膜供体器件241包括可转印层(未示出)。通过激光将可转印层转印到中间器件上。激光振荡器220位于晒版器件230的上方。激光振荡器220被构造成通过晒版器件230来将激光照射到膜供体器件241上。Figure 2 shows a LITI device 200 according to one embodiment. The illustrated LITI apparatus includes: a cavity 210 , a substrate support 260 , a printing device 230 , and a laser source or oscillator 220 . Cavity 210 provides space for processing intermediate (or partially constructed) electronic device 250 with film donor device 241 . The substrate support 260 is configured to support the intermediate device 250 and the film donor device 241 . The printing device 230 is movably connected to the cavity 210 for providing a downward gravitational force over the film donor device 241 . In some embodiments, the printing device 230 may be omitted. The film donor device 241 includes a transferable layer (not shown). The transferable layer is transferred to the intermediate device by laser. The laser oscillator 220 is located above the printing device 230 . The laser oscillator 220 is configured to irradiate laser light onto the film donor device 241 through the printing device 230 .

在一个实施例中,LITI装置200的操作如下。首先,将中间器件250引入腔体210中,并放置在基底支撑件260上。然后,将膜供体器件241放置在中间器件250的上方。膜供体器件241至少部分接触中间器件250。利用磁力将膜供体器件241压向中间器件250。在这个步骤中,可转印层与中间器件紧密地接触。激活激光振荡器220,以将激光照射到膜供体器件241上。然后,可转印层从膜供体器件241转印到中间器件250上。In one embodiment, LITI device 200 operates as follows. First, the intermediate device 250 is introduced into the cavity 210 and placed on the substrate support 260 . A film donor device 241 is then placed over the intermediate device 250 . The film donor device 241 at least partially contacts the intermediate device 250 . The film donor device 241 is pressed against the intermediate device 250 using magnetic force. In this step, the transferable layer is in intimate contact with the intermediate device. The laser oscillator 220 is activated to irradiate laser light onto the film donor device 241 . The transferable layer is then transferred from the film donor device 241 onto the intermediate device 250 .

图3示出了LITI装置200的示意性分解图。用虚线示出的是腔体210。在所示的实施例中,激光振荡器220、晒版器件230和基底支撑件260在垂直方向上彼此对齐。在LITI工艺中,将中间器件250放置在基底支撑件260上,将膜供体器件241放置在中间器件250的上方。在另一实施例中,前述的组件可以具有不同的布置,例如相反地构造。在一些实施例中,基底支撑件可以被构造为从顶部支持中间器件。这种基底支撑件可以称作基底夹持件(holder)。FIG. 3 shows a schematic exploded view of a LITI device 200 . Shown in dashed lines is cavity 210 . In the illustrated embodiment, the laser oscillator 220, printing device 230 and substrate support 260 are vertically aligned with each other. In the LITI process, the intermediate device 250 is placed on the substrate support 260 and the film donor device 241 is placed over the intermediate device 250 . In another embodiment, the aforementioned components may have a different arrangement, eg reverse configuration. In some embodiments, the substrate support may be configured to support the intermediate device from the top. Such substrate supports may be referred to as substrate holders.

腔体210提供了用于LITI工艺的反应空间。腔体210可以是任何合适的可以执行LITI工艺的密闭空间。腔体210容纳晒版器件230和基底支撑件260。腔体还包括通道,用于引入或移去中间器件250和膜供体器件241。在一个实施例中,腔体210可以被构造为提供真空气氛。The chamber 210 provides a reaction space for the LITI process. The cavity 210 may be any suitable enclosed space in which LITI process can be performed. The cavity 210 houses a printing device 230 and a substrate support 260 . The cavity also includes channels for introducing or removing the intermediate device 250 and the film donor device 241 . In one embodiment, cavity 210 may be configured to provide a vacuum atmosphere.

在示出的实施例中,激光振荡器220在晒版器件230的上方,位于腔体210的顶部中心部分,但是不限于此。激光振荡器220被构造成将激光束照射到膜供体器件241上。图11示出了激光振荡器220的一个实施例。示出的激光振荡器220可以是CW ND:YAG激光器(1604nm)。激光振荡器220具有两个检流式扫描仪(galvanometer scanner)221、222。激光振荡器220还具有扫描透镜223和柱面透镜224。技术人员将理解,各种类型的激光振荡器可以用来提供用于膜供体器件的激光。In the illustrated embodiment, the laser oscillator 220 is located above the printing device 230 at the top central portion of the cavity 210, but it is not limited thereto. The laser oscillator 220 is configured to irradiate a laser beam onto the film donor device 241 . One embodiment of a laser oscillator 220 is shown in FIG. 11 . The illustrated laser oscillator 220 may be a CW ND:YAG laser (1604 nm). The laser oscillator 220 has two galvanometer scanners (galvanometer scanner) 221,222. The laser oscillator 220 also has a scanning lens 223 and a cylindrical lens 224 . The skilled person will appreciate that various types of laser oscillators can be used to provide laser light for the film donor device.

在示出的实施例中,晒版器件230位于基底支撑件260的上方,但不限于此。晒版器件230通过传动单元231可移动地连接到腔体210的顶部中心部分。晒版器件230具有接触板232,接触板232被构造成在膜供体器件241上方提供重力。接触板232被图案化为暴露下面的膜供体器件241的部分而阻挡其它部分。为了暴露膜供体器件241的部分,接触板232包括多个开口233。开口233使得激光束能够导向膜供体器件241的部分。这种构造使得能够将可转印层的部分转印到中间器件250上,如下面将详细描述的。在一些实施例中,LITI装置可以没有晒版器件。In the illustrated embodiment, the printing device 230 is positioned above the substrate support 260, but is not limited thereto. The printing device 230 is movably connected to the top center portion of the cavity 210 through a transmission unit 231 . The printing device 230 has a contact plate 232 configured to provide gravity over the film donor device 241 . The contact plate 232 is patterned to expose portions of the underlying film donor device 241 while blocking other portions. In order to expose parts of the film donor device 241 , the contact plate 232 includes a plurality of openings 233 . The opening 233 enables the laser beam to be directed to part of the film donor device 241 . This configuration enables the transfer of portions of the transferable layer onto the intermediate device 250, as will be described in detail below. In some embodiments, a LITI device may be free of a printing device.

在示出的实施例中,基底支撑件260位于反应腔体210的底部,但是不限于此。示出的基底支撑件260具有凹陷263,用于容纳中间器件250。基底支撑件260也支撑膜供体器件241。此外,基底支撑件260容纳下面的基底顶杆265和膜供体器件顶杆266。基底支撑件260具有通孔261和262,基底顶杆265和膜供体器件顶杆266通过通孔261和262在垂直方向上移动。In the illustrated embodiment, the substrate support 260 is located at the bottom of the reaction chamber 210, but is not limited thereto. The illustrated substrate support 260 has a recess 263 for receiving the intermediate device 250 . The substrate support 260 also supports the membrane donor device 241 . In addition, the substrate support 260 houses the underlying substrate ejector pins 265 and film donor device ejector pins 266 . The substrate supporter 260 has through holes 261 and 262 through which a substrate ejector pin 265 and a film donor device ejector pin 266 move in a vertical direction.

在LITI工艺中,将中间器件250放置在基底支撑件260上。术语“中间器件”指任何具有利用LITI工艺来形成有机材料的表面的器件。通常,这种器件是局部构造好的电子器件。在一个实施例中,中间器件250是局部构造好的有机发光器件。中间器件250包括将被转印上可转印层的表面。In the LITI process, the intermediate device 250 is placed on the substrate support 260 . The term "intermediate device" refers to any device having a surface formed of organic material using a LITI process. Typically, such devices are partially constructed electronic devices. In one embodiment, the intermediate device 250 is a partially structured organic light emitting device. Intermediate device 250 includes a surface to which a transferable layer is to be transferred.

在LITI工艺中,将膜供体器件241放置在中间器件250的上方。在一个实施例中,膜供体器件241包括底基板、光热转化层、可转印层,这些将在随后进一步描述。示出的膜供体器件241还包括环绕膜供体器件241的膜供体器件座240。膜供体器件座240用作保持膜供体器件241的形状的框架。在LITI工艺中,可转印层被布置成面向中间层的表面。In the LITI process, a film donor device 241 is placed over the intermediate device 250 . In one embodiment, the film donor device 241 includes a base substrate, a light-to-heat conversion layer, and a transferable layer, which will be further described later. The illustrated film donor device 241 also includes a film donor device seat 240 surrounding the film donor device 241 . The film donor device holder 240 serves as a frame that holds the shape of the film donor device 241 . In the LITI process, the transferable layer is arranged to face the surface of the intermediate layer.

图3中的LITI装置200用磁力来提供膜供体器件241和中间器件250之间的紧密接触。磁力保持器件241和250紧密接触,基本上在器件241和250之间没有气隙或者气泡。The LITI device 200 in FIG. 3 uses magnetic force to provide intimate contact between the film donor device 241 and the intermediate device 250 . The magnetic force keeps the devices 241 and 250 in intimate contact with substantially no air gaps or bubbles between the devices 241 and 250 .

在一个实施例中,可通过两个或多个彼此分隔的磁性材料来产生磁力。在实施例中,在LITI装置的两个组件中形成磁性材料,这两个组件彼此分隔且可转印层和将被转印上可转印层的表面置于这两个组件之间,也就是说,一个组件位于可转印层的上方,另一个组件位于所述表面的下方。这里,术语“组件”指在LITI工艺中使用的部件和器件,包括中间器件250、膜供体器件241、晒版器件230和基底支撑件260。在实施例中,磁体或磁性材料形成在LITI装置的两个下面的组件中,但是不限于此:1)中间器件250和膜供体器件241;2)中间器件250和晒版器件230;3)基底支撑件260和膜供体器件241;或4)基底支撑件260和晒版器件230。In one embodiment, the magnetic force can be generated by two or more magnetic materials separated from each other. In an embodiment, the magnetic material is formed in two components of the LITI device, the two components are separated from each other and the transferable layer and the surface to be transferred with the transferable layer are placed between the two components, also That is, one component is located above the transferable layer and the other component is located below the surface. Here, the term "component" refers to components and devices used in the LITI process, including the intermediate device 250 , the film donor device 241 , the printing device 230 and the substrate support 260 . In an embodiment, the magnet or magnetic material is formed in two following components of the LITI device, but not limited thereto: 1) the intermediate device 250 and the film donor device 241; 2) the intermediate device 250 and the printing device 230; 3 ) a substrate support 260 and a film donor device 241 ; or 4) a substrate support 260 and a printing device 230 .

可选地,磁性材料可以设置在LITI装置的组件的下面的组合中的一个中:5)基底支撑件260、中间器件250和晒版器件230;6)基底支撑件260、中间器件250和膜供体器件241;7)基底支撑件260、膜供体器件241和晒版器件230;或8)中间器件250、膜供体器件241和晒版器件230。在另一实施例中,磁性材料可以设置在9)基底支撑件260、中间器件250、膜供体器件241和晒版器件230中。技术人员应该理解,根据LITI装置的设计,磁性材料可以设置在特定的其它的组件中。Alternatively, the magnetic material may be provided in one of the following combinations of components of the LITI device: 5) substrate support 260, intermediate device 250, and printing device 230; 6) substrate support 260, intermediate device 250, and membrane Donor device 241 ; 7) substrate support 260 , film donor device 241 and printing device 230 ; or 8) intermediate device 250 , film donor device 241 and printing device 230 . In another embodiment, magnetic material may be provided in 9) the substrate support 260 , the intermediate device 250 , the film donor device 241 and the printing device 230 . The skilled person will understand that, depending on the design of the LITI device, the magnetic material may be provided in certain other components.

在成对的组件中的磁性材料被构造成相互吸引,使得膜供体器件241和中间器件250在可转印层和将被转印上该可转印层的表面之间形成紧密接触。术语“磁性材料”,如这里所使用的,表示磁体或磁性可吸引材料。除非另外指出,否则“磁体”通常会表示永磁体或电磁体。术语“磁性可吸引材料”,如这里所使用的,表示不是磁体但是可以被磁体吸引的材料。在一些实施例中,两个LITI组件中的一个可以包含磁体,而另一个可以包含不是磁体的磁性可吸引材料。在其它实施例中,两个LITI组件都可以包含磁体。在某些实施例中,包含磁体的组件还可以包含磁性可吸引材料。在所有的实施例中,组件包含磁性材料的量可以产生足够的磁力来提供膜供体器件241和中间器件250之间的紧密接触。The magnetic materials in the paired assemblies are configured to attract each other such that the film donor device 241 and the intermediate device 250 form intimate contact between the transferable layer and the surface to which the transferable layer is to be transferred. The term "magnetic material", as used herein, means a magnet or a magnetically attractable material. Unless otherwise indicated, "magnet" generally means a permanent magnet or an electromagnet. The term "magnetically attractable material", as used herein, means a material that is not a magnet but can be attracted by a magnet. In some embodiments, one of the two LITI assemblies may contain a magnet, while the other may contain a magnetically attractable material that is not a magnet. In other embodiments, both LITI assemblies may contain magnets. In some embodiments, a magnet-containing assembly may also contain a magnetically attractable material. In all embodiments, the assembly contains magnetic material in an amount that generates sufficient magnetic force to provide intimate contact between the film donor device 241 and the intermediate device 250 .

与抽气不同,磁力可以在真空气氛中产生。因此,在一些实施例中,LITI工艺可以利用膜供体器件241和中间器件250之间的磁感应接触在真空中进行,而不破坏真空。此外,在其它实施例中,磁力装置也可以与抽气装置一起使用,以改进LITI工艺。将在下面详细描述各组件中的磁体或磁性可吸引材料的位置和构造。Unlike pumping, magnetic force can be generated in a vacuum atmosphere. Thus, in some embodiments, the LITI process can be performed in a vacuum without breaking the vacuum using magnetically inductive contact between the film donor device 241 and the intermediate device 250 . Additionally, in other embodiments, a magnetic device may also be used in conjunction with an air extraction device to improve the LITI process. The location and configuration of the magnets or magnetically attractable material in each component will be described in detail below.

在一个实施例中,在可转印层下面的磁性材料位于中间器件250中。图4A和图4B示出了中间器件400A和400B的实施例的剖视图。示出的中间器件400A和400B是局部构造好的有机发光器件(OLED)。中间器件400A和400B中的每个包括基底401、缓冲层402、薄膜晶体管440、钝化层409、电极420和像素隔墙430。薄膜晶体管440包括绝缘层403和404、半导体层405、源电极406、漏电极407和栅电极408。像素隔墙430形成在钝化层409和电极420的部分的上方,暴露了电极420的顶面的相当大的部分。电极420将用作有机发光二极管的阴极或阳极。可转印层将形成在电极420的暴露的顶表面的上方。In one embodiment, the magnetic material underlying the transferable layer is located in the intermediate device 250 . 4A and 4B illustrate cross-sectional views of embodiments of intermediate devices 400A and 400B. The illustrated intermediate devices 400A and 400B are partially structured organic light emitting devices (OLEDs). Each of the intermediate devices 400A and 400B includes a substrate 401 , a buffer layer 402 , a thin film transistor 440 , a passivation layer 409 , an electrode 420 and a pixel partition wall 430 . The thin film transistor 440 includes insulating layers 403 and 404 , a semiconductor layer 405 , a source electrode 406 , a drain electrode 407 , and a gate electrode 408 . Pixel partition walls 430 are formed over passivation layer 409 and portions of electrode 420 , exposing a substantial portion of the top surface of electrode 420 . The electrode 420 will serve as a cathode or an anode of the organic light emitting diode. A transferable layer will be formed over the exposed top surface of the electrode 420 .

在图4A中,磁性层410a附于基底401的底表面。在图4B示出的另一实施例中,磁性层410b位于基底401和缓冲层402之间。磁性层410a、410b包含磁性材料,将在下面详细描述这些磁性材料。在一个实施例中,磁性层410a或410b的厚度在大约5,000和大约10,000之间。In FIG. 4A , a magnetic layer 410 a is attached to the bottom surface of a substrate 401 . In another embodiment shown in FIG. 4B , the magnetic layer 410 b is located between the substrate 401 and the buffer layer 402 . The magnetic layers 410a, 410b contain magnetic materials, which will be described in detail below. In one embodiment, the thickness of the magnetic layer 410a or 410b is between about 5,000 Ȧ and about 10,000 Ȧ.

在某些实施例中,根据器件的设计,中间器件可以包含埋在电极420下面的任何组件中的磁性材料,所述任何组件例如基底401、缓冲层402、绝缘层403、404和/或钝化层409。在任何情况下,中间器件包含的磁性材料的量足以使得膜供体器件和中间器件之间紧密接触。In some embodiments, depending on the design of the device, the intermediate device may contain magnetic material buried in any component below the electrode 420, such as the substrate 401, the buffer layer 402, the insulating layers 403, 404, and/or the passivation layer. Layer 409. In any event, the intermediate device contains an amount of magnetic material sufficient to allow intimate contact between the film donor device and the intermediate device.

在又一实施例中,中间器件可包含在中间器件的特定区域中的磁性材料带。图4C示出了中间器件400C的一个实施例的俯视平面图。示出的器件是局部构造好的有机发光器件400C。器件400C包括显示区460、数据驱动器430、扫描驱动器440和电源连接器415和420。显示区460包括成矩阵形式的多个像素470。示出的器件400C包含磁性材料带450a和450b。在示出的实施例中,带450a位于显示区460外部的外围区中。此外,带450b形成在显示区460中。示出的带450b基本上相互平行。在其它实施例中,磁性材料带形成在像素区中,而不形成在外围区中。技术人员应该理解,带的各种不同构造可以用于提供磁力。In yet another embodiment, the intermediate device may contain strips of magnetic material in specific regions of the intermediate device. Figure 4C illustrates a top plan view of one embodiment of an intermediate device 400C. The device shown is a partially structured organic light emitting device 400C. The device 400C includes a display area 460 , a data driver 430 , a scan driver 440 and power connectors 415 and 420 . The display area 460 includes a plurality of pixels 470 in a matrix. The illustrated device 400C includes strips of magnetic material 450a and 450b. In the illustrated embodiment, band 450a is located in a peripheral region outside display region 460 . In addition, a band 450 b is formed in the display area 460 . The strips 450b are shown substantially parallel to one another. In other embodiments, the strips of magnetic material are formed in the pixel region but not in the peripheral region. The skilled artisan will appreciate that various configurations of straps can be used to provide the magnetic force.

在一个实施例中,磁性材料可以是包括永磁体或电磁体的磁体。永磁体可以是铝镍钴合金(alnico)磁体、铁氧体磁体、稀土磁体、橡胶磁体或塑料磁体。永磁体可以采用从板、片、块、杆和颗粒中选择的至少一种形式。在一个实施例中,永磁体可以是纳米尺寸的磁性颗粒、板、片、块或杆。利用旋涂、电子束沉积或喷墨沉积,这种纳米尺寸的颗粒可以沉积在中间器件的组件的表面上。在其它实施例中,板、片、块、杆和颗粒可以大于纳米尺寸。In one embodiment, the magnetic material may be a magnet including a permanent magnet or an electromagnet. The permanent magnets may be alnico magnets, ferrite magnets, rare earth magnets, rubber magnets or plastic magnets. The permanent magnet may take at least one form selected from plates, sheets, blocks, rods and pellets. In one embodiment, the permanent magnets may be nano-sized magnetic particles, plates, sheets, blocks or rods. Such nano-sized particles can be deposited on the surface of the components of the intermediate device using spin coating, electron beam deposition or ink jet deposition. In other embodiments, plates, sheets, blocks, rods and particles may be larger than nanometer dimensions.

永磁体可以大致均匀地分布在磁性层410a或410b中。在另一实施例中,磁性层410a和410b可以只在将被转印可转印层上方的区域中具有永磁体部分。在又一实施例中,磁性层可以是由永磁体形成的单板。The permanent magnets may be substantially evenly distributed in the magnetic layer 410a or 410b. In another embodiment, the magnetic layers 410a and 410b may have permanent magnet portions only in the region above the transferable layer to be transferred. In yet another embodiment, the magnetic layer may be a single plate formed of permanent magnets.

在又一实施例中,磁性材料可以是电磁体。电磁体可以具有从螺线管或环状线圈中选择的至少一种形式。螺线管指形成直管形状的线圈。环状线圈指形成圆环形状的线圈。通常,环状线圈是弯曲成端部相连的螺线管。在一些实施例中,螺线管或环状线圈可以包括在线圈内部的顺磁体或铁磁体材料(例如铁)的磁芯。因为铁磁体需要电流来被磁化,所以电磁体通过导线连接到外部电源。在一个实施例中,中间器件的非显示区可包括电连接成指派给电磁体的一个或多个电极。电极被构造成从外部电源接收电源。此外,电极通过导线与电磁体连接。在实施例中,电极可以形成在合并有电磁体的器件或本体的外表面上,以形成与外部电源的电连接。在其它实施例中,电极可以突出到合并有铁磁体的器件或本体的外部。在由中间器件形成的成品电子器件中,电极可以是无源的且被埋入介电材料中。与永磁体类似地,根据中间器件的设计,电磁体可以基本均匀地分布也可以是不均匀地分布。In yet another embodiment, the magnetic material may be an electromagnet. The electromagnet may have at least one form selected from a solenoid or a toroid. A solenoid refers to a coil of coils formed into the shape of a straight tube. A toroidal coil refers to a coil formed into a ring shape. Typically, a toroid is a solenoid bent into a connected end. In some embodiments, a solenoid or toroid coil may include a magnetic core of paramagnetic or ferromagnetic material (eg, iron) inside the coil. Because ferromagnets require electrical current to be magnetized, electromagnets are connected to an external power source by wire. In one embodiment, the non-display area of the intermediate device may include one or more electrodes electrically connected to be assigned to the electromagnet. The electrodes are configured to receive power from an external power source. In addition, the electrodes are connected to the electromagnet by wires. In embodiments, electrodes may be formed on the outer surface of the device or body incorporating the electromagnet to form an electrical connection to an external power source. In other embodiments, the electrodes may protrude outside of the device or body incorporating the ferromagnet. In a finished electronic device formed from an intermediate device, the electrodes may be passive and buried in a dielectric material. Similar to the permanent magnets, the electromagnets can be distributed substantially uniformly or non-uniformly, depending on the design of the intermediate device.

在又一实施例中,磁性材料可以是磁性可吸引材料而不是磁体。磁性可吸引材料包括,但不限于:Fe、Ni、Cr、Fe2O3、Fe3O4、CoFe2O4、MnFeO4、它们的合金以及上述材料中的两种或更多种的混合物。磁性可吸引材料的其它示例还可包含塑料和陶瓷磁性材料。与永磁体类似地,磁性可吸引材料可以是从板、片、块、杆和颗粒中选择的至少一种形式。这些可以是纳米尺寸的颗粒或者更大的颗粒。磁性可吸引材料可以均匀分布在磁性层410中。在另一实施例中,磁性层410可以仅在可转印层将被转印到其上方的区域中具有磁性可吸引材料。在又一实施例中,磁性层可以是由磁性可吸引材料形成的单板。In yet another embodiment, the magnetic material may be a magnetically attractable material rather than a magnet. Magnetically attractable materials include, but are not limited to: Fe, Ni, Cr, Fe 2 O 3 , Fe 3 O 4 , CoFe 2 O 4 , MnFeO 4 , alloys thereof, and mixtures of two or more of the foregoing . Other examples of magnetically attractable materials may also include plastic and ceramic magnetic materials. Similar to the permanent magnet, the magnetically attractable material may be in at least one form selected from plates, sheets, blocks, rods and particles. These can be nano-sized particles or larger particles. The magnetically attractable material may be uniformly distributed in the magnetic layer 410 . In another embodiment, the magnetic layer 410 may have a magnetically attractable material only in the region over which the transferable layer is to be transferred. In yet another embodiment, the magnetic layer may be a single plate formed of a magnetically attractable material.

在又一实施例中,可转印层下面的磁性材料可以位于基底支撑件中。图5A和图5B示出了磁性材料的基底支撑件260的一个实施例。示出的基底支撑件260包括在凹陷下方的区域263(用虚线表示)中的电磁体264。示出的电磁体264在垂直方向上对齐。然而,根据基底支撑件的设计,电磁体可以布置成各种不同的构造。电磁体还可以具有如上对于中间器件的所述的各种形状和构造。在某些实施例中,磁性材料可以是如上对于中间器件的所述的永磁体或磁性可吸引材料。In yet another embodiment, the magnetic material underlying the transferable layer may be located in the substrate support. 5A and 5B illustrate one embodiment of a substrate support 260 of magnetic material. The illustrated substrate support 260 includes an electromagnet 264 in a region 263 (shown in phantom) below the recess. Electromagnets 264 are shown aligned in a vertical direction. However, depending on the design of the substrate support, the electromagnets can be arranged in various configurations. The electromagnet can also have various shapes and configurations as described above for the intermediate device. In some embodiments, the magnetic material may be a permanent magnet or a magnetically attractable material as described above for the intermediate device.

在一个实施例中,可转印层上方的磁性材料可以位于膜供体器件中。图6A至图6C是根据实施例的膜供体器件600A~600C的局部剖视图。膜供体器件600A~600C中的每个包括:底基板601;光热转化层602,在底基板601上面;中间层603,在光热转化层602上面;可转印层604,在中间层603上面。可选地,膜供体器件可以包括缓冲层(未示出),缓冲层在中间层603和转印层604之间。In one embodiment, the magnetic material above the transferable layer may be located in a film donor device. 6A to 6C are partial cross-sectional views of film donor devices 600A to 600C according to an embodiment. Each of the film donor devices 600A-600C includes: a base substrate 601; a light-to-heat conversion layer 602 on the base substrate 601; an intermediate layer 603 on the light-to-heat conversion layer 602; a transferable layer 604 on the intermediate layer 603 above. Optionally, the film donor device may include a buffer layer (not shown) between the intermediate layer 603 and the transfer layer 604 .

底基板601用于提供具有膜结构的膜供体器件。底基板601可以由透明聚合物制成。透明聚合物的示例包括,但是不限于:聚乙烯、聚酯、teleptalrate、聚丙烯酸酯(polyacryl)、聚环氧树脂、聚乙烯和聚苯乙烯。底基板601的厚度在大约10μm和大约500μm之间,可选地在大约100μm和大约400μm之间。The base substrate 601 is used to provide a film donor device having a film structure. The base substrate 601 may be made of transparent polymer. Examples of transparent polymers include, but are not limited to: polyethylene, polyester, teleptalrate, polyacryl, polyepoxy, polyethylene, and polystyrene. The thickness of the base substrate 601 is between about 10 μm and about 500 μm, optionally between about 100 μm and about 400 μm.

将光热转化层602构造成吸收激光并且将激光转换为热。转化层602包含吸光材料。吸光材料可以具有大于0.1至大约0.4的光密度。吸光材料可包括金属、金属氧化物和/或有机材料。金属/金属氧化物的示例包括,但是不限于:铝、银、铬、钨、锡、镍、钛、钴、锌、金、铜、钨、钼、铅和前述金属的氧化物。有机材料可包括光合材料。有机材料的示例包括由(甲基)丙烯酸酯单体或者低聚物制成的聚合物,例如,由丙烯醛基(甲基)丙烯酸酯低聚物、酯(甲基)丙烯酸酯低聚物、环氧(甲基)丙烯酸酯低聚物、氨基甲酸乙酯(甲基)丙烯酸酯低聚物等制成的聚合物,或者由两种或者两种以上上述物质的混合物制成的聚合物。另外,转化层602还可包含其它添加物比如碳黑、石墨或者红外染料等。The light-to-heat conversion layer 602 is configured to absorb laser light and convert the laser light to heat. The conversion layer 602 includes a light absorbing material. The light absorbing material may have an optical density of greater than 0.1 to about 0.4. Light absorbing materials may include metals, metal oxides and/or organic materials. Examples of metals/metal oxides include, but are not limited to: aluminum, silver, chromium, tungsten, tin, nickel, titanium, cobalt, zinc, gold, copper, tungsten, molybdenum, lead, and oxides of the foregoing metals. Organic materials may include photosynthetic materials. Examples of organic materials include polymers made from (meth)acrylate monomers or oligomers, for example, from acryl-based (meth)acrylate oligomers, ester (meth)acrylate oligomers , epoxy (meth)acrylate oligomers, urethane (meth)acrylate oligomers, etc., or polymers made of a mixture of two or more of the above substances . In addition, the conversion layer 602 may also contain other additives such as carbon black, graphite or infrared dyes.

光热转化层602的厚度可根据吸光材料和制造方法而改变。例如,当采用真空沉积法、激光束沉积法或者溅射法时,转化层可具有大约100至大约5000的厚度。在另一实施例中,当采用挤压涂覆法、照相凹板式涂敷法、旋涂法和刮涂法时,转化层可具有大约0.1μm至大约2μm的厚度。The thickness of the light-to-heat conversion layer 602 can vary depending on the light-absorbing material and manufacturing method. For example, when a vacuum deposition method, a laser beam deposition method, or a sputtering method is used, the conversion layer may have a thickness of about 100 Ȧ to about 5000 Ȧ. In another embodiment, the conversion layer may have a thickness of about 0.1 μm to about 2 μm when extrusion coating, gravure coating, spin coating, and blade coating are employed.

中间层603起到保护光热转化层602的作用。在一个实施例中,中间层603具有高的耐热性。中间层603可由有机材料或者无机材料例如聚酰亚胺制成。中间层603的厚度在大约1μm和大约1.5μm之间。在某些实施例中,可省略中间器件。The middle layer 603 plays a role of protecting the light-to-heat conversion layer 602 . In one embodiment, the intermediate layer 603 has high heat resistance. The intermediate layer 603 may be made of an organic material or an inorganic material such as polyimide. The thickness of the intermediate layer 603 is between about 1 μm and about 1.5 μm. In some embodiments, intermediate devices may be omitted.

可转印层604是将被转印到中间器件上的层。可转印层604可由有机材料形成。在电子器件为有机发光器件的一个实施例中,所述材料可为有机发光材料。然而,所述材料也可为用于形成有机发光器件的其它有机元件的其它有机材料。所述其它元件包括但是不限于:空穴注入层(HIL)、空穴传输层(HTL)、电子注入层(EIL)和电子传输层(ETL),。在其它电子器件中,适于形成目标组件的任何材料都可用作可转印层的材料。可转印层604的厚度在大约200和大约1,000之间。可采用任何合适的方法,例如挤压涂覆法、照相凹板式涂敷法、旋涂法、刮涂法、真空沉积或者化学气相沉积(CVD)来形成可转印层604。The transferable layer 604 is the layer that will be transferred onto the intermediate device. The transferable layer 604 may be formed from an organic material. In one embodiment where the electronic device is an organic light emitting device, the material may be an organic light emitting material. However, the material may also be other organic materials used to form other organic elements of an organic light emitting device. The other elements include, but are not limited to: hole injection layer (HIL), hole transport layer (HTL), electron injection layer (EIL), and electron transport layer (ETL). In other electronic devices, any material suitable for forming the target component can be used as the material for the transferable layer. The thickness of the transferable layer 604 is between about 200 Ȧ and about 1,000 Ȧ. The transferable layer 604 may be formed using any suitable method, such as extrusion coating, gravure coating, spin coating, blade coating, vacuum deposition, or chemical vapor deposition (CVD).

缓冲层(未示出)用来改进可转印层604的转印性质。缓冲层可包含金属氧化物、金属硫化物、非金属无机化合物和有机材料中的一种或者多种。无机化合物的示例包括Al和Au。有机材料的示例包括聚酰亚胺。A buffer layer (not shown) is used to improve the transfer properties of the transferable layer 604 . The buffer layer may contain one or more of metal oxides, metal sulfides, non-metallic inorganic compounds and organic materials. Examples of inorganic compounds include Al and Au. Examples of organic materials include polyimide.

参照图6A,光热转化层602包含磁性材料。例如,光热转化层602可包含永磁体和/或电磁体。在其它实施例中,转化层602可包含磁性可吸引材料。磁性材料可具有如上对于中间器件的所述的各种结构。在其它实施例中,磁性材料可被埋入底基板601或者中间层603中。在某些实施例中,磁性材料可被埋入底基板601、光热转化层602和中间层603中的至少两个中。在其它实施例中,磁性材料可仅被埋入层601至603中的一个或多个中的特定部分中,而不是埋入整个层中。例如,层601至603中的一个或多个可仅在可转印层将被转印到中间器件的部分下面包含磁性材料。Referring to FIG. 6A, the light-to-heat conversion layer 602 includes a magnetic material. For example, the light-to-heat conversion layer 602 may contain permanent magnets and/or electromagnets. In other embodiments, conversion layer 602 may include a magnetically attractable material. The magnetic material may have various structures as described above for the intermediate device. In other embodiments, the magnetic material may be buried in the base substrate 601 or the intermediate layer 603 . In some embodiments, magnetic materials may be embedded in at least two of the base substrate 601 , the light-to-heat conversion layer 602 and the intermediate layer 603 . In other embodiments, the magnetic material may only be buried in certain portions of one or more of the layers 601-603, rather than the entire layer. For example, one or more of layers 601 to 603 may contain magnetic material only under the portion of the transferable layer that is to be transferred to the intermediate device.

参照图6B和图6C,膜供体器件600B和600C包括磁性层605。磁性层605包含磁性材料例如永磁体、电磁体和/或磁性可吸引材料。磁性材料可具有如上对于中间器件的所述的各种结构。Referring to FIGS. 6B and 6C , film donor devices 600B and 600C include a magnetic layer 605 . The magnetic layer 605 includes magnetic materials such as permanent magnets, electromagnets, and/or magnetically attractable materials. The magnetic material may have various structures as described above for the intermediate device.

在图6B中,膜供体器件600B包括位于底基板601和光热转化层602之间的磁性层605。在图6C中,膜供体器件600C包括位于光热转化层602和中间层603之间的磁性层605。在另一实施例中,膜供体器件可包括位于中间层603和可转印层604之间的磁性层。在又一实施例中,膜供体器件可包括位于底基板601的底表面上的磁性层,该磁性层背离光转换层602。在一些实施例中,膜供体器件可具有位于层601至604中的两个连续层之间的两个或多个磁性层。在这种实施例中,磁性材料还可埋入底基板601、光热转化层602和中间层603中的至少一个中。技术人员应该理解,磁性层的构造和组合可根据膜供体器件的设计而改变。In FIG. 6B , the film donor device 600B includes a magnetic layer 605 between the base substrate 601 and the light-to-heat conversion layer 602 . In FIG. 6C , film donor device 600C includes magnetic layer 605 between light-to-heat conversion layer 602 and intermediate layer 603 . In another embodiment, the film donor device may include a magnetic layer between the intermediate layer 603 and the transferable layer 604 . In yet another embodiment, the film donor device may comprise a magnetic layer on the bottom surface of the base substrate 601 facing away from the light converting layer 602 . In some embodiments, the film donor device may have two or more magnetic layers positioned between two consecutive ones of layers 601-604. In such an embodiment, the magnetic material may also be embedded in at least one of the base substrate 601 , the light-to-heat conversion layer 602 and the intermediate layer 603 . The skilled artisan will appreciate that the configuration and combination of magnetic layers may vary depending on the design of the film donor device.

在另一实施例中,可转印层上方的磁性材料可位于晒版器件中。图7示出了晒版器件230的一个实施例。示出的晒版器件230包含埋入晒版器件中的磁性材料。磁性材料可为如上对于中间器件的所述的永磁体或者电磁体。在其它实施例中,磁性材料可为磁性可吸引材料,如上所述。In another embodiment, the magnetic material above the transferable layer may be located in the printing device. FIG. 7 shows an embodiment of a printing device 230 . The photolithography device 230 is shown comprising magnetic material embedded in the photolithography device. The magnetic material may be a permanent magnet or an electromagnet as described above for the intermediate device. In other embodiments, the magnetic material may be a magnetically attractable material, as described above.

在一些实施例中,晒版器件230可包括单独磁性层。磁性层包含如上对于中间器件的所述的磁性材料。磁性层可附于晒版器件230的顶面和底面中的至少一个上。在另一实施例中,磁性层可被埋入晒版器件230中。在这些实施例中,所述层被图案化,以具有与晒版器件的开口对应的开口。晒版器件和磁性层的开口使得激光束能够被导到膜供体器件241的部分上。这种构造将可转印膜选择性地转印到中间器件250上。在另一实施例中,晒版器件本身可由磁性材料形成。在所有的前述实施例中,晒版器件包含的磁性材料的量足以提供用来将膜供体器件压向中间器件的磁力。In some embodiments, the printing device 230 may include a single magnetic layer. The magnetic layer comprises the magnetic material as described above for the intermediate device. A magnetic layer may be attached to at least one of the top and bottom surfaces of the printing device 230 . In another embodiment, the magnetic layer may be buried in the printing device 230 . In these embodiments, the layer is patterned to have openings corresponding to the openings of the printing device. The openings of the printing device and the magnetic layer enable the laser beam to be directed onto the portion of the film donor device 241 . This configuration selectively transfers the transferable film onto the intermediate device 250 . In another embodiment, the printing device itself may be formed from a magnetic material. In all of the foregoing embodiments, the printing device comprises magnetic material in an amount sufficient to provide a magnetic force for pressing the film donor device against the intermediate device.

激光诱导热成像工艺Laser Induced Thermal Imaging Process

根据实施例的激光诱导热成像(LITI)工艺采用磁力来提供膜供体器件和中间器件之间的紧密接触。图8是示出LITI工艺的一个实施例的流程图。A Laser Induced Thermal Imaging (LITI) process according to an embodiment uses magnetic force to provide intimate contact between the film donor device and the intermediate device. Figure 8 is a flow diagram illustrating one embodiment of the LITI process.

首先,在步骤810中,将中间器件250放置在基底支撑件260上。在该步骤中,中间器件250可通过任何适合的移动装置(例如机器人装置)移动。接着,在步骤820中,将膜供体器件241放置在中间器件250上方。首先,膜供体器件241以其可转印层朝下的方式与中间器件250在垂直方向上对齐。接着,膜供体器件241向下移动到中间器件250上。可转印层的至少一部分接触中间器件250。与步骤810相似,可通过移动装置来移动膜供体器件241。First, in step 810 , intermediate device 250 is placed on substrate support 260 . During this step, the intermediate device 250 may be moved by any suitable moving means, such as robotic means. Next, in step 820 , the film donor device 241 is placed over the intermediate device 250 . First, the film donor device 241 is vertically aligned with the intermediate device 250 with its transferable layer facing downwards. Next, the film donor device 241 is moved down onto the intermediate device 250 . At least a portion of the transferable layer contacts the intermediate device 250 . Similar to step 810, the film donor device 241 may be moved by a moving device.

在步骤830中,提供磁力以将膜供体器件241压向中间器件250。可通过如上所述的位于LITI组件中的两个组件中的磁性材料来产生磁力,在这两个组件中,一个位于可转印层上方,另一个位于可转印层将要转印到其上的表面的下面。在一些实施例中,两个LITI组件中的一个可包含磁体,而另一个可包含不是磁体的磁性可吸引材料。在其它实施例中,两个LITI组件均可包含磁体。磁体可包括永磁体和/或电磁体。在磁体包括电磁体的一个实施例中,可根据LITI工艺的需要选择时间来产生磁力。在一些实施例中,包含磁体的组件也可包含磁性可吸引材料。In step 830 , a magnetic force is provided to press the film donor device 241 against the intermediate device 250 . The magnetic force can be generated by the magnetic material as described above in two components of the LITI component, one above the transferable layer and the other on which the transferable layer is to be transferred. below the surface. In some embodiments, one of the two LITI components may contain a magnet, while the other may contain a magnetically attractable material that is not a magnet. In other embodiments, both LITI assemblies may contain magnets. The magnets may include permanent magnets and/or electromagnets. In one embodiment where the magnet comprises an electromagnet, the time to generate the magnetic force can be selected according to the needs of the LITI process. In some embodiments, a component that includes a magnet may also include a magnetically attractable material.

在该步骤中,磁力使得膜供体器件241推向中间器件250,这使得可转印层更紧密地接触将被转印可转印层的表面。在该工艺中,可去除膜供体器件241和中间器件250之间所有的或者至少一些气隙或者气泡。该步骤便于将可转印层转印到中间器件250上。In this step, the magnetic force causes the film donor device 241 to be pushed towards the intermediate device 250, which brings the transferable layer into closer contact with the surface to which the transferable layer is to be transferred. During this process, all or at least some air gaps or bubbles between the film donor device 241 and the intermediate device 250 may be removed. This step facilitates the transfer of the transferable layer onto the intermediate device 250 .

在步骤840中,激光照射到膜供体器件241上。激光提供将可转印层转印到中间器件250上所需的热能。在该步骤中,激光振荡器220被激活,以将激光照射到膜供体器件241的顶面上。在采用具有开口的晒版器件230的一个实施例中,激光穿过开口,到达膜供体器件241的顶面。在这个工艺中,激光被导向膜供体器件241的选择区域。激光穿过底基板到达膜供体器件241的光热转化层。光热转化层将光能转化为热能,产生热。所述热被传递到可转印层的选择部分。采用这种工艺,从膜供体器件241释放了部分可转印层,并且这部分可转印层被转印到中间器件250。在不采用晒版器件的另一实施例中,激光选择性地照射在膜供体器件241的顶面的特定部分上。In step 840 , laser light is irradiated onto the film donor device 241 . The laser provides the thermal energy required to transfer the transferable layer onto the intermediate device 250 . In this step, the laser oscillator 220 is activated to irradiate laser light onto the top surface of the film donor device 241 . In one embodiment employing a printing device 230 having openings, the laser light passes through the openings to the top surface of the film donor device 241 . In this process, laser light is directed to selected areas of the film donor device 241 . The laser light passes through the base substrate to the light-to-heat conversion layer of the film donor device 241 . The light-to-heat conversion layer converts light energy into thermal energy to generate heat. The heat is transferred to selected portions of the transferable layer. With this process, part of the transferable layer is released from the film donor device 241 and this part is transferred to the intermediate device 250 . In another embodiment that does not use a printing device, the laser is selectively irradiated on specific portions of the top surface of the film donor device 241 .

随后,在步骤850中,从中间器件250上方去除膜供体器件241,将部分可转印层留在中间器件250的顶面上。可利用与在步骤820中使用的移动装置相同的装置来移走膜供体器件241。Subsequently, in step 850 , the film donor device 241 is removed from above the intermediate device 250 , leaving part of the transferable layer on the top surface of the intermediate device 250 . The film donor device 241 may be removed using the same means as the moving means used in step 820 .

参照图9A至图9F,中间器件250被引入到转移腔体900中。将中间器件250放置在转移腔体900中的机器臂920的末端执行器910上。随后,中间器件250被传输到LITI腔体210中,如图9B中所示。接着,将中间器件250放置在基底支撑件260上,如图9C中所示。Referring to FIGS. 9A to 9F , the intermediate device 250 is introduced into the transfer chamber 900 . Intermediate device 250 is placed on end effector 910 of robotic arm 920 in transfer chamber 900 . Subsequently, the intermediate device 250 is transferred into the LITI cavity 210, as shown in FIG. 9B. Next, the intermediate device 250 is placed on the substrate support 260, as shown in Figure 9C.

接着,将膜供体器件241放置在末端执行器910上,如图9C中所示。随后,将膜供体器件241引入LITI腔体210中,如图9D中所示。膜供体器件241与中间器件250在垂直方向上对齐。接着,将膜供体器件241向下移动到中间器件250上,如图9E中所示。然后从LITI腔体210收回末端执行器910。随后,关闭闸阀930,以提供密闭的反应室。在一个实施例中,在这些步骤中,在整个转移腔体和LITI腔体中,可保持真空气氛。Next, the film donor device 241 is placed on the end effector 910, as shown in Figure 9C. Subsequently, a film donor device 241 is introduced into the LITI cavity 210, as shown in Figure 9D. The film donor device 241 is vertically aligned with the intermediate device 250 . Next, the film donor device 241 is moved down onto the intermediate device 250, as shown in Figure 9E. The end effector 910 is then withdrawn from the LITI lumen 210 . Subsequently, the gate valve 930 is closed to provide a sealed reaction chamber. In one embodiment, a vacuum atmosphere may be maintained throughout the transfer chamber and LITI chamber during these steps.

可选地,晒版器件可设置在膜供体器件上方。在图9F中,晒版器件230向下移动到膜供体器件241上方。晒版器件230在膜供体器件241上方提供重力。晒版器件230可有助于膜供体器件241和中间器件250之间的紧密接触。在其它实施例中,可省略晒版器件。Optionally, a printing device may be positioned above the film donor device. In FIG. 9F , the printing device 230 is moved down over the film donor device 241 . The printing device 230 provides gravity over the film donor device 241 . The printing device 230 may facilitate intimate contact between the film donor device 241 and the intermediate device 250 . In other embodiments, the printing device may be omitted.

接着,提供磁力,以使中间器件和膜供体器件之间紧密接触。可通过位于LITI装置组件中的两个组件中的磁性材料来产生磁力,在两个组件中,一个位于可转印层下面,另一个位于可转印层上方,如上所述。技术人员应该理解,可根据LITI装置的设计来在一些其它组件中设置磁性材料。在所有的前述实施例中,在中间器件和膜供体器件之间施加足够强度的磁力,以使在中间器件和膜供体器件之间的接触没有气隙或气泡。磁性材料的位置和构造的细节如上对于LITI装置的所述位置和构造。Next, a magnetic force is applied to bring an intimate contact between the intermediate device and the film donor device. The magnetic force can be generated by magnetic material located in two of the LITI device components, one below and one above the transferable layer, as described above. The skilled person will understand that magnetic material may be provided in some other components depending on the design of the LITI device. In all of the preceding embodiments, a magnetic force of sufficient strength is applied between the intermediate device and the film donor device such that there are no air gaps or air bubbles in contact between the intermediate device and the film donor device. The details of the location and configuration of the magnetic material are as described above for the LITI device.

图10A至图10D是示出可转印层是如何转印到中间器件上的剖视图。示出的中间器件是局部构造好的有机发光器件400。在示出的实施例中,磁性材料位于中间器件和膜供体器件中。在其它实施例中,磁性材料可设置在LITI装置的其它组件中,如上所述。10A to 10D are cross-sectional views showing how the transferable layer is transferred onto the intermediate device. The intermediate component shown is a partially structured organic light-emitting component 400 . In the illustrated embodiment, the magnetic material is located in the intermediate device and the film donor device. In other embodiments, the magnetic material may be provided in other components of the LITI device, as described above.

参照图10A,中间器件400包括薄膜晶体管(TFT)结构411、磁性层410、电极420和像素分隔层430。电极420的一部分412通过像素分隔层430暴露。有机层将形成在暴露部分412上,从后面的描述中将更好地理解。Referring to FIG. 10A , the intermediate device 400 includes a thin film transistor (TFT) structure 411 , a magnetic layer 410 , an electrode 420 and a pixel separation layer 430 . A portion 412 of the electrode 420 is exposed through the pixel separation layer 430 . An organic layer will be formed on the exposed portion 412, as will be better understood from the following description.

接着,如图10B中所示,将膜供体器件600放置在中间器件400上方。膜供体器件600包括如相对于图6B所述的底基板601、磁性层605、光热转化层602、中间层603和可转印层604。可转印层604至少部分地接触像素分隔层430的顶面,如图10B中所示。在这个步骤中,在膜供体器件600和中间器件400之间施加磁力。Next, the film donor device 600 is placed over the intermediate device 400 as shown in FIG. 10B . The film donor device 600 comprises a base substrate 601 , a magnetic layer 605 , a light-to-heat conversion layer 602 , an intermediate layer 603 and a transferable layer 604 as described with respect to FIG. 6B . The transferable layer 604 at least partially contacts the top surface of the pixel separation layer 430, as shown in FIG. 10B. In this step, a magnetic force is applied between the film donor device 600 and the intermediate device 400 .

接着,激光照射到膜供体器件600的选择部分上。选择部分位于电极420的暴露部分412上方。激光穿过底基板和磁性层605,到达光热转化层602。光热转化层602将光能转化为热能,产生热。所述热通过中间层603被传递到可转印层604。Next, laser light is irradiated onto selected portions of the film donor device 600 . The selected portion is located over the exposed portion 412 of the electrode 420 . The laser light passes through the base substrate and the magnetic layer 605 to reach the light-to-heat conversion layer 602 . The light-to-heat conversion layer 602 converts light energy into thermal energy to generate heat. The heat is transferred to the transferable layer 604 through the intermediate layer 603 .

接着,基于接收的热,可转印层604的一部分从膜供体器件600脱层,并开始接触电极420的暴露部分412,如图10C中所示。在示出的实施例中,转化层602、中间层603和可转印层604的一部分与磁性层605分开。在其它实施例中,可以仅仅可转印层604与膜供体器件600分开。Next, based on the heat received, a portion of the transferable layer 604 delaminates from the film donor device 600 and comes into contact with the exposed portion 412 of the electrode 420, as shown in FIG. 1OC. In the illustrated embodiment, conversion layer 602 , intermediate layer 603 , and a portion of transferable layer 604 are separated from magnetic layer 605 . In other embodiments, only the transferable layer 604 may be separated from the film donor device 600 .

随后,如图10D中所示,从中间器件400上方去除膜供体器件600。这个步骤之后,仅可转印层的一部分604a留在中间器件400上。Subsequently, the film donor device 600 is removed from above the intermediate device 400 as shown in FIG. 10D . After this step, only a portion 604a of the transferable layer remains on the intermediate device 400 .

在上述实施例中,利用磁力来提供膜供体器件和中间器件之间的紧密接触。与抽气不同,这种结构不需要LITI腔体中的气压。因此,可以在真空气氛中执行LITI工艺。由于LITI工艺之前进行或随后进行的工艺通常也在真空气氛中进行,所以可以执行LITI工艺而在整个工艺中不破坏真空。可以从沉积空穴注入层(HIL)的工艺到沉积第二电极层的工艺中保持真空氛围。另外,LITI工艺减少了供体膜和中间器件之间的杂质或间隙的出现。这提高了所得电子器件的寿命、产量和可靠性。In the above embodiments, magnetic force is used to provide intimate contact between the film donor device and the intermediate device. Unlike pumping, this configuration does not require air pressure in the LITI cavity. Therefore, the LITI process can be performed in a vacuum atmosphere. Since processes performed before or after the LITI process are also generally performed in a vacuum atmosphere, the LITI process can be performed without breaking vacuum throughout the process. The vacuum atmosphere may be maintained from a process of depositing a hole injection layer (HIL) to a process of depositing a second electrode layer. Additionally, the LITI process reduces the occurrence of impurities or gaps between the donor film and intermediate devices. This improves the lifetime, yield and reliability of the resulting electronic devices.

尽管已经示出和描述了本发明的各种实施例,但是本领域技术人员应该理解,在不脱离由权利要求及其等同物限定的范围的本发明的原理和精神的情况下,可以对这些实施例作改变。While various embodiments of the present invention have been shown and described, it should be understood by those skilled in the art that changes may be made to these without departing from the principles and spirit of the invention, within the scope of the claims and their equivalents. Example changes.

Claims (20)

1, a kind of device that is used for laser induced thermal imaging comprises:
The substrate support part is configured to support intermediate electronic device and film donor device;
Lasing light emitter;
Plate copying device, between described substrate support part and described lasing light emitter, described plate copying device is movably with respect to described substrate support part between the primary importance and the second place, described substrate support part first distance of described primary importance distance, the described substrate support part second distance of described second place distance, described second distance is greater than described first distance, described plate copying device is pressed to described intermediary device with described film donor device near being formed at described primary importance, and described plate copying device comprises at least a magnetic material of selecting from the group of being made up of permanent magnet and electromagnet.
2, device as claimed in claim 1, wherein, described electromagnet is electrically connected with external power source, and is configured to by excitation selectively.
3, device as claimed in claim 1, wherein, described at least a magnetic material comprises one or more forms of selecting from the group of being made up of plate, sheet, piece, bar and particle.
4, device as claimed in claim 1, wherein, described plate copying device comprises magnetic part and nonmagnetic portion, wherein, described magnetic part comprises at least a magnetic material.
5, device as claimed in claim 4, wherein, described magnetic part is arranged to usually than the more close described substrate support part of described nonmagnetic portion.
6, device as claimed in claim 1, wherein, but described substrate support part comprises at least a magnetic material of selecting from the group of being made up of permanent magnet, electromagnet and magnetic attractive material.
7, device as claimed in claim 1 also comprises:
Intermediary device comprises receiving surface, and is placed on the top of described substrate support part;
The film donor device, but comprise the transfer printing rete, and be placed on the top of described intermediary device.
8, device as claimed in claim 7 wherein, is arranged described intermediary device and described film donor device, but makes described receiving surface contact with described transfer printing rete.
9, device as claimed in claim 8 wherein, but does not have bubble basically between described receiving surface and described transfer printing rete.
10, device as claimed in claim 7, wherein, described film donor device also comprises the photo-thermal conversion coating.
11, device as claimed in claim 7, wherein, described film donor device does not comprise the magnetosphere that contains permanent magnet or electromagnet.
12, device as claimed in claim 7, wherein, but described intermediate electronic device comprises at least a magnetic material of selecting from the group of being made up of permanent magnet, electromagnet and magnetic attractive material.
13, a kind of device that utilizes claim 1 is made the method for electronic device, and described method comprises:
Intermediary device is placed on the described substrate support part, and described intermediary device comprises first surface and second surface, and described first surface is in the face of described plate copying device, and described second surface contacts described substrate support part;
The film donor device is placed on the first surface of described intermediary device, described film donor device comprises the 3rd surface and the 4th surface, and described the 3rd surface is in the face of described plate copying device, and described the 4th surface is in the face of described substrate support part;
Move described plate copying device so that it contacts the 3rd surface of described film donor device, make the 4th surface of described film donor device contact the first surface of described intermediary device;
Described film donor device is pressed to described intermediary device.
14, method as claimed in claim 13, wherein, described plate copying device comprises opening, wherein, described method also comprises the opening of laser beam by described plate copying device is shone on the described film donor device.
15, method as claimed in claim 13 wherein, is carried out described method under vacuum atmosphere.
16, method as claimed in claim 13, wherein, described plate copying device comprises electromagnet, wherein, causes described magnetic force and comprises the described electromagnet of excitation.
17, method as claimed in claim 13 wherein, is pushed described film donor device and is comprised that the gravity with described plate copying device is applied to described film donor device.
18, method as claimed in claim 13 wherein, also comprises and makes described at least a magnetic material and magnet or magnetic attractive material below the first surface of described intermediary device that magneticaction take place mutually but push described film donor device.
19, method as claimed in claim 18, wherein, but described intermediary device comprises described magnet or magnetic attractive material.
20, method as claimed in claim 18, wherein, but described substrate support part comprises described magnet or magnetic attractive material.
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