CN1963612B - Active light emitting and passive reflection type display and manufacturing method thereof - Google Patents
Active light emitting and passive reflection type display and manufacturing method thereof Download PDFInfo
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- CN1963612B CN1963612B CN200510120147A CN200510120147A CN1963612B CN 1963612 B CN1963612 B CN 1963612B CN 200510120147 A CN200510120147 A CN 200510120147A CN 200510120147 A CN200510120147 A CN 200510120147A CN 1963612 B CN1963612 B CN 1963612B
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Abstract
本发明为一种主动发光与被动反射型显示器及其制造方法，以解决在不同场合中无法利用单一显示元件来显示画面的问题，本发明不仅利用现有技术结合主动发光元件及被动反射型元件以简化工艺且可减少消耗功率及产品大小。
The present invention is an active light-emitting and passive reflective display and a manufacturing method thereof to solve the problem that a single display element cannot be used to display images in different occasions. The present invention not only utilizes the existing technology to combine active light-emitting elements and passive reflective elements to simplify the process but also can reduce power consumption and product size.
Description
Technical field
The present invention relates to a kind of display and manufacture method thereof, particularly a kind of active illuminating and passive reflective display and manufacture method thereof.
Background technology
The common system relevant with electronic information, display is essential man-machine interface, relative display for the soft electronic system also is indispensable.Because the electron capacitance of ultra-thin soft electronic system itself is very limited, thus can be based on reflective liquid-crystal display, yet in many application scenarios, the display that need can be luminous.In flexible substrate, therefore Organic Light Emitting Diode has the flexible base plate technology of Organic Light Emitting Diode as can luminous display being to be acknowledged as best selection, is the core technology of the essential foundation of ultra-thin soft electronic institute of system.
Case is delivered before having many OLED to use patent documentation, as U.S. Pat 6,541, No. 908 " in conjunction with the electronics light emission display (Electronic lightemissive displays incorporating transparent and conductive zine oxide thinfilm) that penetrates and conduct zinc-oxide film ", the open N type zinc-oxide film of common covering that utilizes is applied to Organic Light Emitting Diode as chemically stable and low work functions electrode, EED and microelectronic vacuum display equipment.
In addition, as U.S. Pat 6,744,197 and U.S. Patent Publication No. 2003/0205969A1 number, it discloses a kind of organic electroluminescence display device and method of manufacturing same and manufacture method thereof.U.S. Patent Publication No. 2003/0227582A1 number and 2004/0090569A1, U.S. Patent number 6734930B2 and U.S. Patent number 6738113B2 disclose a kind of organic light emitting film transistor LCD structure and preparation method thereof for another example.
U.S. Patent Publication No. discloses a kind of LCD of low power consumption for 2002/0033908A1 number, U.S. Pat 6,777, No. 710, disclose a kind of organic LED panel, be formed at substrate and this Organic Light Emitting Diode is sealed between substrate and covers partly by an Organic Light Emitting Diode.A kind of pixelation organic light emitting diode display that can read under daylight is disclosed for 2003/0063231A1 number as U.S. Patent Publication No..
Summary of the invention
The purpose of this invention is to provide a kind of active illuminating and passive reflective display and manufacture method thereof, this type of bi-stable display is applied to that it can reduce consumed power and product size on the display of various products.
To achieve the above object, the invention provides a kind of active illuminating and passive reflective display manufacture method, comprise upper substrate and infrabasal plate are provided; Form conductive layer on this infrabasal plate; Form a plurality of wall constructions on this conductive layer; Insert a plurality of liquid crystal display media at least the first space, wherein said first space is formed by described wall construction; Form a plurality of organic materials at least the second space, wherein said second space is formed by described wall construction; Make a plurality of frame glue on this conductive layer; Form protective seam on described liquid crystal; And the combination of carrying out this upper substrate and this infrabasal plate is moved.
According to the manufacture method of active illuminating of the present invention and passive reflective display, wherein this upper substrate and this infrabasal plate are plastic base or glass substrate.The material of this plastic base is polyethylene terephthalate, polyethers Feng, heat-resisting transparent resin, photo-hardening type resin or thermmohardening type resin.Also comprise and form chromatic filter layer on this upper substrate.
According to the manufacture method of active illuminating of the present invention and passive reflective display, wherein should form a plurality of wall constructions in the last step of this conductive layer, comprise the following steps: to form photographic layer on this conductive layer; Form photoresist layer on this photographic layer; And use light shield to define the zone of described wall construction. this photographic layer is formed with coating method; This photoresist layer is formed with coating method. and described wall construction is formed with etching mode.
According to the manufacture method of active illuminating of the present invention and passive reflective display, wherein this inserts mode for directly splashing into (one-drop-filling).Described organic material is formed in the distillation mode.Described organic material is Organic Light Emitting Diode (OLED).This protective seam by macromolecule after via ultraviolet exposure form.This integrating step is direct pressing.This integrating step is finished by ultraviolet exposure technology.
According to a kind of active illuminating of the present invention and passive reflective display, comprising: infrabasal plate; Conductive layer is formed on this infrabasal plate; A plurality of wall constructions are formed at this conductive layer; A plurality of liquid crystal display media fill in the first space at least, and wherein said first space is formed by described wall construction; A plurality of organic materials are formed in the second space at least, and wherein said second space is formed by described wall construction; A plurality of frame glue are made on this conductive layer; Protective seam is formed on the described liquid crystal; And upper substrate, be incorporated into this infrabasal plate.Wherein this upper substrate and this infrabasal plate are plastic base or glass substrate.Also comprising chromatic filter layer is formed on this upper substrate.This conductive layer contains driving circuit.
According to active illuminating of the present invention and passive reflective display, wherein said wall construction also comprises: photographic layer is formed on this conductive layer; Photoresist layer is formed on this photographic layer; And light shield, in order to define described wall construction zone.Wherein this photographic layer is formed with coating method.This photoresist layer is formed with coating method.Described wall construction is formed with etching mode.
According to active illuminating of the present invention and passive reflective display, wherein said organic material is the material that is formed with OLED.The pattern of this Organic Light Emitting Diode is top-emission polar form or bottom emission polar form.The pattern of this Organic Light Emitting Diode is the top-emission polar form, and its negative electrode is designed to transparency electrode.If the pattern bottom emission polar form of this Organic Light Emitting Diode, then that described organic material is required driving circuit is arranged in the driving circuit of described liquid crystal display medium.
Description of drawings
Fig. 1 is an infrabasal plate process schematic representation of the present invention;
Fig. 2 is a wall construction process schematic representation of the present invention;
Fig. 3 is a passive reflection-type element process schematic representation of the present invention;
Fig. 4 is an active illuminating type element process schematic representation of the present invention;
Fig. 5 is a frame adhesive process synoptic diagram of the present invention; And
Fig. 6 is a combined process synoptic diagram of the present invention.
Wherein, description of reference numerals is as follows:
Liquid crystal display medium 16 first spaces 18 organic materials 20
22 frame glue 24 the 3rd space 26, second space
Upper substrate 28 protective seams 30
Embodiment
Reach technology, method and the effect that set purpose is taked in order further to understand the present invention, see also following about detailed description of the present invention and accompanying drawing, believe purpose of the present invention, feature and characteristics, go deep into and concrete understanding when getting one thus, yet accompanying drawing only provides reference and explanation usefulness, is not to be used for the present invention is limited.
The present invention proposes with simple and easy technology active illuminating element and passive reflection-type element to be formed the display with active illuminating and reflection-type bifurcation, as the first embodiment process schematic representation of Fig. 1 to Fig. 6 for active illuminating of the present invention and passive reflective display, it comprises the following steps:
Please refer to Fig. 1, the first embodiment infrabasal plate process schematic representation for active illuminating of the present invention and passive reflective display, comprise infrabasal plate 10 is provided, wherein this infrabasal plate can be plastic base or glass substrate, and the material of this plastic base can be polyethylene terephthalate, polyethers Feng, heat-resisting transparent resin, photo-hardening type resin or thermmohardening type resin.Then on this infrabasal plate 10, form chromatic filter layer (not shown), this chromatic filter layer is in technological process, can be provided with according to the demand of display or not be provided with, on this infrabasal plate 10, form a conductive layer 12, this conductive layer 12 can utilize existing low temperature polycrystalline silicon (LTPS) and related process technology thereof to form, this conductive layer 12 can be tft layer (TFT) and includes driving circuit, can be used as the circuit that drives this passive reflection-type element and active illuminating element.
Please refer to Fig. 2, the first embodiment wall construction process schematic representation for active illuminating of the present invention and passive reflective display, on this conductive layer 12, form a plurality of wall constructions 14, this formation step further comprises utilizes coating method to form photographic layer on this conductive layer 12 earlier, then utilize coating method to form photoresist layer on this photographic layer equally, utilize light shield at last to define the regional of described wall construction 14 and to utilize etching method that the zone of described wall construction is stayed.
Please refer to Fig. 3, the passive reflection-type element of first embodiment process schematic representation for active illuminating of the present invention and passive reflective display, insert a plurality of liquid crystal display media 16 at least the first space 18 (being shown in Fig. 2), wherein said first space 18 is formed by described wall construction 14, this inserts mode for directly splashing into (one-drop-filling), forms the substrate with passive reflection-type element area like this.
Please refer to Fig. 4, the first embodiment active illuminating type element process schematic representation for active illuminating of the present invention and passive reflective display, the substrate that will contain passive reflection-type element moves on the board of Organic Light Emitting Diode, the action that vacuumizes earlier, utilize the mode of evaporation to form a plurality of organic materials 20 at least the second space 22 then, wherein said organic material 20 is Organic Light Emitting Diode (OLED), described second space 22 is formed by described wall construction 14, covering in shady shielding (shadow mask) design and passive reflection-type element area will covered, so the material of evaporation just can not be cross over passive reflection-type element area, this organic material 20 also must have the design of covering shady shielding on negative electrode simultaneously, this is different with general Organic Light Emitting Diode technology, can form the substrate with active illuminating element area like this.
Please refer to Fig. 5, be the first embodiment frame adhesive process synoptic diagram of active illuminating of the present invention and passive reflective display, make a plurality of frame glue 24 and at least the three space 26 on this conductive layer 12.
Please refer to Fig. 6, the first embodiment combined process synoptic diagram for active illuminating of the present invention and passive reflective display, follow the infrabasal plate that upper substrate 28 direct pressings (or ultraviolet illumination) are finished in above-mentioned steps with bistable state display element, wherein this upper substrate 28 is plastic base or glass substrate, and the material of this plastic base can be polyethylene terephthalate, polyethers Feng, heat-resisting transparent resin, photo-hardening type resin or thermmohardening type resin.When carrying out direct pressing action; described liquid crystal display medium 16 unnecessary parts in this passive reflection-type element area will flow in described the 3rd space 26; after utilizing the ultraviolet light irradiation at last; the macromolecule that described liquid crystal display medium 16 is included will be separated; and be solidificated on described liquid crystal display medium 16 surfaces; to form a protective seam 30; this protective seam 30 can be sealed described liquid crystal display medium 16; described liquid crystal display medium 16 just can not be cross in the active illuminating element area when practical application, can be made into active illuminating and passive reflective display through integrating step thus.
In the above embodiments, the pattern of this Organic Light Emitting Diode is top-emission polar form (topemitter) or bottom emission polar form (bottom emitter), if the pattern top-emission polar form of this Organic Light Emitting Diode wherein, its negative electrode is designed to transparency electrode, so produced display does not need backlight, the function that can have semi-reflection and semi-transparent like this, certainly at present at thickness, weight, if yet will provide very big improvement in the assembling. the pattern bottom emission polar form of this Organic Light Emitting Diode, then that described organic material is required design of drive circuit is in the driving circuit of described liquid crystal display medium, two independent images of this one side can be used in mobile phone faceplate, drive system by two groups of independent runnings can reach minimizing weight, reduce the purpose of thickness, the design of drive circuit that organic material is required is in the driving circuit of described liquid crystal display medium, the aperture opening ratio of the organic material of bottom emission polar form can be increased, organic material can be reached as the top-emission polar form.
The present invention can simplify its technology and can reduce consumed power and the product size when make active illuminating and passive reflective display, and is disclosed as above-mentioned embodiment.
But above-mentioned disclosed accompanying drawing, explanation only are embodiments of the invention, and those skilled in the art can do other various improvement according to above-mentioned explanation, and these change and still to belong in the scope that invention spirit of the present invention and appended claims define.
Claims (26)
1. the manufacture method of an active illuminating and passive reflective display is characterized in that, comprising:
Upper substrate and infrabasal plate are provided;
Form conductive layer on this infrabasal plate;
Form a plurality of wall constructions on this conductive layer;
Insert a plurality of liquid crystal display media at least the first space, wherein said first space is formed by described wall construction;
Form a plurality of organic materials at least the second space, wherein said second space is formed by described wall construction;
Make a plurality of frame glue and at least the three space on this conductive layer;
Form protective seam on described liquid crystal display medium; And
Carry out the combination action of this upper substrate and this infrabasal plate.
2. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein this upper substrate and this infrabasal plate are plastic base or glass substrate.
3. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display, it is characterized in that wherein the material of this plastic base is polyethylene terephthalate, polyethers Feng, heat-resisting transparent resin, photo-hardening type resin or thermmohardening type resin.
4. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, also comprises to form chromatic filter layer on this upper substrate.
5. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display wherein should form a plurality of wall constructions in the last step of this conductive layer, it is characterized in that, comprised the following steps:
Form photographic layer on this conductive layer;
Form photoresist layer on this photographic layer; And
Use light shield to define the zone of described wall construction.
6. the manufacture method of active illuminating as claimed in claim 5 and passive reflective display is characterized in that, wherein this photographic layer is formed with coating method.
7. the manufacture method of active illuminating as claimed in claim 5 and passive reflective display is characterized in that, wherein this photoresist layer is formed with coating method.
8. the manufacture method of active illuminating as claimed in claim 5 and passive reflective display is characterized in that, wherein said wall construction is formed with etching mode.
9. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein this inserts mode for directly splashing into.
10. as the manufacture method of claim 1 a described active illuminating and passive reflective display, it is characterized in that wherein said organic material is formed in the distillation mode.
11. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein said organic material is the material that is formed with OLED.
12. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein this protective seam by macromolecule after via ultraviolet exposure form.
13. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein this integrating step is direct pressing.
14. the manufacture method of active illuminating as claimed in claim 1 and passive reflective display is characterized in that, wherein this integrating step is finished by ultraviolet exposure technology.
15. an active illuminating and passive reflective display is characterized in that, comprising:
Infrabasal plate;
Conductive layer is formed on this infrabasal plate;
A plurality of wall constructions are formed at this conductive layer;
A plurality of liquid crystal display media fill in the first space at least, and wherein said first space is formed by described wall construction;
A plurality of organic materials are formed in the second space at least, and wherein said second space is formed by described wall construction;
A plurality of frame glue are made on this conductive layer;
Protective seam is formed on the described liquid crystal; And
Upper substrate is incorporated into this infrabasal plate.
16. active illuminating as claimed in claim 15 and passive reflective display is characterized in that, wherein this upper substrate and this infrabasal plate are plastic base or glass substrate.
17. active illuminating as claimed in claim 15 and passive reflective display is characterized in that, also comprise chromatic filter layer and are formed on this upper substrate.
18. active illuminating as claimed in claim 15 and passive reflective display is characterized in that wherein this conductive layer contains driving circuit.
19. active illuminating as claimed in claim 15 and passive reflective display is characterized in that, wherein said wall construction also comprises:
Photographic layer is formed on this conductive layer;
Photoresist layer is formed on this photographic layer; And
Light shield is in order to define described wall construction zone.
20. active illuminating as claimed in claim 19 and passive reflective display is characterized in that wherein this photographic layer is formed with coating method.
21. active illuminating as claimed in claim 19 and passive reflective display is characterized in that wherein this photoresist layer is formed with coating method.
22. active illuminating as claimed in claim 19 and passive reflective display is characterized in that wherein said wall construction is formed with etching mode.
23. active illuminating as claimed in claim 15 and passive reflective display is characterized in that, wherein said organic material is the material that is formed with OLED.
24. active illuminating as claimed in claim 23 and passive reflective display is characterized in that, wherein the pattern of this Organic Light Emitting Diode is top-emission polar form or bottom emission polar form.
25. active illuminating as claimed in claim 23 and passive reflective display is characterized in that, wherein the pattern of this Organic Light Emitting Diode is the top-emission polar form, and its negative electrode is designed to transparency electrode.
26. active illuminating as claimed in claim 24 and passive reflective display, it is characterized in that, if the pattern bottom emission polar form of this Organic Light Emitting Diode wherein, then that described organic material is required driving circuit is arranged in the driving circuit of described liquid crystal display medium.
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| Application Number | Priority Date | Filing Date | Title |
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| CN200510120147A CN1963612B (en) | 2005-11-07 | 2005-11-07 | Active light emitting and passive reflection type display and manufacturing method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN200510120147A CN1963612B (en) | 2005-11-07 | 2005-11-07 | Active light emitting and passive reflection type display and manufacturing method thereof |
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| CN1963612A CN1963612A (en) | 2007-05-16 |
| CN1963612B true CN1963612B (en) | 2010-05-12 |
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| FR2969391B1 (en) * | 2010-12-17 | 2013-07-05 | Saint Gobain | METHOD FOR MANUFACTURING OLED DEVICE |
| CN103488020A (en) * | 2013-08-09 | 2014-01-01 | 京东方科技集团股份有限公司 | Display panel, driving method of display panel and display device with display panel |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6542145B1 (en) * | 1999-04-13 | 2003-04-01 | Mannesmann Vdo Ag | Self-illuminating LCD display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6542145B1 (en) * | 1999-04-13 | 2003-04-01 | Mannesmann Vdo Ag | Self-illuminating LCD display device |
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