CN1839471B - Integrated circuit package with improved resistance and inductance of semiconductor components - Google Patents
Integrated circuit package with improved resistance and inductance of semiconductor components Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及一种集成电路封装,特别涉及一种用于功率半导体装置,像是金属氧化物半导体场效晶体管(MOSFET)装置的集成电路(IC)封装,可减少封装电阻,电感及热阻抗,以使得此装置更有效率并且释放更多功率。The present invention relates to an integrated circuit package, in particular to an integrated circuit (IC) package for power semiconductor devices, such as metal oxide semiconductor field effect transistor (MOSFET) devices, which can reduce package resistance, inductance and thermal impedance, To make the device more efficient and release more power.
背景技术Background technique
目前较先进的硅技术是允许非常低阻抗功率的MOSFET装置,致使小芯片的使用可以以相当高的功率密度来操作。在许多情况下,封装阻抗可能可以等于硅阻抗,这对于以硅为主体作为装置来说,事实上是非常不经济的使用方式,而藉由减少封装阻抗来降低成本则是目前不变的趋势。由于在愈高的功率密度下,就需要愈低的热阻抗封装。封装寄生电感之所以会在如同在电源供应转换模式中,对于MOSFET在高频率转换应用模式中常导致浪费大多数的功率,而当以更低的装置阻抗并且改进的技术为于相同的封装尺寸中允许更高的操作电流时会变得更严重。State-of-the-art silicon technology is a MOSFET device that allows very low impedance power, resulting in the use of small chips that can be operated at relatively high power densities. In many cases, the package impedance may be equal to the silicon impedance, which is actually a very uneconomical way to use silicon as the main body of the device, and it is a constant trend to reduce the cost by reducing the package impedance . Due to the higher power density, the lower thermal impedance package is required. The reason why package parasitic inductance will be in the power supply switching mode, for MOSFET in the high frequency switching application mode often leads to wasting most of the power, while in the same package size with lower device impedance and improved technology It becomes more severe when higher operating currents are allowed.
请参考图1所示的仰视图,说明了一传统半导体封装1包含一导线架8和一塑料体16所封装而成的晶粒10。在此已知技术当中,此晶粒10具体的描述一MOSFET装置以及其导线架8包括一源极端11、一栅极端12及一漏极端13。导线架8中的源极端11包括复数个分离的源极导线架指状物或是向外延伸至塑料体16的引线11b,和复数个与接合线14接合的分离内部源极接合区域11a。漏极端13包括连接在导线架平台13a上的复数个分离的漏极导线架指状物或是引线13b。栅极端12包括连接至一内部栅极接合区域12a的一外部栅极引线12b,此内部栅极接合区域12a通过导线15与栅极平台17连接。Please refer to the bottom view shown in FIG. 1 , illustrating a conventional semiconductor package 1 including a die 10 encapsulated by a lead frame 8 and a plastic body 16 . In this prior art, the die 10 specifically describes a MOSFET device and its lead frame 8 includes a source terminal 11 , a gate terminal 12 and a drain terminal 13 . Source terminal 11 in leadframe 8 includes a plurality of separate source leadframe fingers or leads 11 b extending outward to plastic body 16 , and a plurality of separate inner source bonding regions 11 a bonded to bond wires 14 . The drain terminal 13 includes a plurality of separate drain lead frame fingers or leads 13b connected to the lead frame platform 13a. The gate terminal 12 includes an external gate lead 12b connected to an internal gate bonding region 12a connected to the gate land 17 by a wire 15 .
图2是另一传统半导体封装19的仰视图。在这个已知技术中,如同图1所显示的,在复数个分离源极接合区域11a的场所中,把源极端21中的源极接合区域21a加入以形成对于接合线24至晶粒20中的一单一源极接合区域21a。如同于上述图1所述的已知技术,分离的源极导线架指状物或是引线21b,以及漏极端23的分离的漏极导线架指状物或是引线23b,皆从塑料体26向外部放射出分离的狭窄金属条,并且适用于如图1中所描述的装置,可插入个人计算机主机板上相配的插孔位置。FIG. 2 is a bottom view of another
与图1的已知技术类似,导线架平台23a上设置有晶粒20,并且提供狭窄边缘框架围绕晶粒20的周边。除此之外,栅极22的结合区域22a通过导线25连接到位于最靠近角落的栅极平台27。在已知技术中,源极和栅极接合区域11a,21a和12a,22a分享晶粒10及20的相同的左侧面。同样地,源极引线21b和栅极引线22b从相同的左侧面放射出去。Similar to the known technique of FIG. 1 , the die 20 is disposed on the
请参考图3所示的一传统双重晶粒半导体封装29的仰视图。此双重晶粒半导体封装29有一塑料体36封装含布署在一第一导线架平台33a上的一第一晶粒30和布署在一第二导线架平台43a上的一第二晶粒40。第一源极端31至少包括一源极导线架引线31b和一沿着第一晶粒30的左侧面分布的源极接合区域31a。此源极接合区域31a通过接合线34与第一晶粒30相互连接。第一栅极端32包含一共享第一晶粒30左侧面的栅极结合区域32a,及一栅极导线架引线32b。此栅极接合区域32a通过接合线35连接至栅极平台上。第一漏极端33包括复数个与第一导线架平台33a结合的分离漏极导线架引线33b。Please refer to the bottom view of a conventional dual die semiconductor package 29 shown in FIG. 3 . The dual die semiconductor package 29 has a plastic body 36 encapsulating a first die 30 disposed on a first lead frame platform 33a and a second die 40 disposed on a second lead frame platform 43a . The first source terminal 31 at least includes a source lead frame lead 31 b and a source bonding region 31 a distributed along the left side of the first die 30 . The source bonding region 31 a is connected to the first die 30 through bonding wires 34 . The first gate terminal 32 includes a gate bonding region 32a sharing the left side of the first die 30, and a gate lead frame lead 32b. The gate bonding region 32 a is connected to the gate platform by a bonding wire 35 . The first drain terminal 33 includes a plurality of separate drain lead frame leads 33b combined with the first lead frame platform 33a.
与第一晶粒30相类似,第二源极41至少包括一源极导线架引线41b和一沿着第二晶粒40的左侧面分布的源极接合区域41a。这个源极接合区域41a通过接合线44与第二晶粒40相互连接。第二栅极端42具有一共享第二晶粒40左侧面的栅极接合区域42a和一栅极导线架引线42b。接合线45用以相互连接。第二漏极端43包括复数个与第二导线架平台43a结合的分离漏极导线架引线43b。Similar to the first die 30 , the second source 41 at least includes a source lead frame lead 41 b and a source bonding region 41 a distributed along the left side of the second die 40 . This source bonding region 41 a is interconnected with the second die 40 via a bonding wire 44 . The second gate terminal 42 has a gate bonding region 42 a sharing the left side of the second die 40 and a gate lead frame lead 42 b. Bonding wires 45 are used for interconnection. The second drain terminal 43 includes a plurality of separate drain lead frame leads 43b combined with the second lead frame platform 43a.
如同上述说明,为使一装载高电流的金属氧化物半导体场效晶体管(MOSFET)装置提升其功率耗散,确实有必要减少其封装电阻、电感以及设计一新的导线架和封装。As explained above, in order to improve the power dissipation of a MOSFET device carrying high current, it is necessary to reduce the package resistance, inductance and design a new lead frame and package.
对此,藉由利用封装塑料体中的一些实体,通过减少晶粒和导线架平台的尺寸以增加接合区域而增加源极端及此晶粒之间的相互连接,以便能够减少封装的电阻和电感。阻抗的减少是来自于有更多的导线并联,尽管改进电感不仅来自于有更多的导线并联,并且可藉由导线的散布使其更分开,进而减少导线间的互相耦合电感效应。In this regard, the source terminal and the interconnection between the die can be reduced by reducing the size of the die and the lead frame platform to increase the bonding area by utilizing some of the entities in the package plastic body, so that the resistance and inductance of the package can be reduced . The reduction in impedance comes from having more wires connected in parallel, although the improved inductance not only comes from having more wires connected in parallel, but also by spreading the wires further apart, thereby reducing the mutual coupling inductance effect between the wires.
除此之外,增加外部源极和漏极的引线表面积,使其更大表面积暴露在空气当中,更可有效减少外部终端阻抗并且使其加快散热效率。In addition, increasing the lead surface area of the external source and drain, so that a larger surface area is exposed to the air, can effectively reduce the external terminal impedance and speed up the heat dissipation efficiency.
发明内容Contents of the invention
本发明提供的改良的集成电路封装是以直接和简单的模式,有效的解决上述背景技术中长久以来存在的问题。The improved integrated circuit package provided by the present invention effectively solves the long-standing problems in the above-mentioned background art in a direct and simple manner.
大体而言,本发明提供一种改进半导体封装的方法,藉由舍弃预留予硅或者晶粒的一些实体位置,重新分配一接合区域,比如对于源极或者其它的加载高电流终端来说,在晶粒的角落和邻近的侧面附近增加这个接合区域和晶粒顶端传导表面之间的相互联接,进而减少电阻和电感。In general, the present invention provides a method of improving semiconductor packaging by redistributing a bonding area, such as for a source or other high current-carrying terminal, by discarding some physical locations reserved for silicon or die, Increased interconnection between this bonding region and the conductive surface at the top of the die near the corners and adjacent sides of the die reduces resistance and inductance.
本发明提供一“L”形接合区域、一“C”形接合区域、一“J”形接合区域和/或一“I”形接合区域,或者是任何根据整合于封装中的晶粒数目的结合。The present invention provides an "L" shaped bonding area, a "C" shaped bonding area, a "J" shaped bonding area and/or an "I" shaped bonding area, or any number of dies integrated into the package combined.
此外,本发明提供一增加外部源极表面积和漏极的终端区域面积,以更快速达到散热及减少外部终端阻抗的方法。换句话说,增加导线架金属化的面积以改进封装的热阻抗。此举,可包括熔合一全部或部分终端的所有或是一些引线来达成。In addition, the present invention provides a method for increasing the surface area of the external source and the terminal area of the drain to achieve faster heat dissipation and reduce external terminal resistance. In other words, increasing the area of leadframe metallization improves the thermal resistance of the package. This may include fusing all or some of the leads of a terminal or a portion thereof.
附图说明Description of drawings
图1是一传统半导体封装中的第一实施例范例的仰视图;1 is a bottom view of an example of a first embodiment in a conventional semiconductor package;
图2是一传统半导体封装中的第二实施例范例的仰视图;2 is a bottom view of a second embodiment example in a conventional semiconductor package;
图3是一传统双晶粒半导体封装中的第三实施例范例的仰视图;3 is a bottom view of a third embodiment example in a conventional dual-die semiconductor package;
图4是描述本发明的第一实施例而构成的半导体封装范例的仰视图;4 is a bottom view of an exemplary semiconductor package for describing the first embodiment of the present invention;
图5是描述本发明的第二实施例而构成的半导体封装范例的仰视图;5 is a bottom view of an exemplary semiconductor package for describing a second embodiment of the present invention;
图6是描述本发明的第三实施例而构成的半导体封装范例的仰视图;6 is a bottom view of an exemplary semiconductor package for describing a third embodiment of the present invention;
图7是描述本发明的第四实施例的对于双晶粒含有双平台的半导体封装设计范例的仰视图;FIG. 7 is a bottom view of a design example of a semiconductor package with dual platforms for dual dies describing the fourth embodiment of the present invention;
图8是描述本发明的第五实施例的对于多晶粒含有双平台的半导体封装设计范例的仰视图;8 is a bottom view illustrating a design example of a semiconductor package with dual platforms for multiple dies according to a fifth embodiment of the present invention;
图9是描述本发明的第六实施例的对于多晶粒含有单一平台的半导体封装设计范例的仰视图;9 is a bottom view illustrating a design example of a semiconductor package with a single platform for multiple dies according to the sixth embodiment of the present invention;
图10是描述本发明的第七实施例的对于多晶粒含有单一平台的半导体封装设计范例的仰视图;FIG. 10 is a bottom view illustrating a design example of a semiconductor package with a single platform for multiple dies according to the seventh embodiment of the present invention;
图11是描述本发明的第八实施例的对于双晶粒含有双平台的半导体封装设计范例的仰视图;FIG. 11 is a bottom view illustrating an example design of a semiconductor package with dual platforms for dual dies according to the eighth embodiment of the present invention;
图12是描述本发明的第九实施例的对于双晶粒含有单平台的半导体封装设计范例的仰视图;12 is a bottom view illustrating a design example of a semiconductor package with a single platform for a dual die according to the ninth embodiment of the present invention;
图13是描述本发明的第十实施例的对于单一晶粒含有单一平台的半导体封装设计范例的仰视图;13 is a bottom view of an exemplary semiconductor package design including a single platform for a single die, illustrating a tenth embodiment of the present invention;
图14是描述本发明的第十一实施例的对于双晶粒含有单一平台的半导体封装设计范例的仰视图;FIG. 14 is a bottom view illustrating a design example of a semiconductor package with a single platform for a dual die according to an eleventh embodiment of the present invention;
图15是描述本发明的第十二实施例的对于双晶粒含有单一平台的半导体封装设计范例的仰视图;15 is a bottom view illustrating a design example of a semiconductor package with a single platform for a dual die according to a twelfth embodiment of the present invention;
图16是描述本发明的第十三实施例的对于多晶粒含有单一平台的半导体封装设计范例的仰视图;16 is a bottom view illustrating a design example of a semiconductor package with a single platform for multiple dies according to a thirteenth embodiment of the present invention;
图17是描述本发明的第十四实施例的对于多晶粒含有双大平台的半导体封装设计范例的仰视图;FIG. 17 is a bottom view illustrating a design example of a semiconductor package with dual large platforms for multiple dies according to the fourteenth embodiment of the present invention;
图18是描述本发明的第十五实施例的对于多晶粒的半导体封装设计范例的仰视图,和18 is a bottom view illustrating a design example of a semiconductor package for multi-die of the fifteenth embodiment of the present invention, and
图19是描述本发明的第十六实施例的对于多晶粒的半导体封装设计范例的仰视图。FIG. 19 is a bottom view illustrating an exemplary design of a semiconductor package for multi-die according to the sixteenth embodiment of the present invention.
具体实施方式Detailed ways
请参考图4,以标号99来表示本发明的半导体集成电路(IC)封装。一般来说,此半导体集成电路(IC)封装99包括一设置在一导线架平台103a上的半导体晶粒100,并且两者成型在一塑料体106当中。此封装99还包含已知技术中必要的相互连接,藉此,可结合晶粒100于导线架平台103a和/或导线架108中。具体描述如下:Referring to FIG. 4 , the semiconductor integrated circuit (IC) package of the present invention is denoted by
如同基于以下所提供的任何描述,本发明可应用于许多相关的半导体装置。换句话说,任何第三人描述本发明的任何应用性都应该是被禁止的。比如,在本实施例中的图4的仰视图显示的是至少有三个终端(如:一源极端101、一栅极端102和一漏极端103)可被应用整合至导线架108的金属氧化半导体场效晶体管装置的半导体集成电路封装99。As with any description provided below, the present invention is applicable to many related semiconductor devices. In other words, any third person describing any applicability of the invention should be prohibited. For example, the bottom view of FIG. 4 in this embodiment shows that at least three terminals (such as: a
下面描述本发明的半导体的相互连接。藉由减少晶粒100和导线架平台103a的尺寸大约至少等于此晶粒100上面的一部分长度,并且增加在其角落附近的源极端101的金属接合区域101a的尺寸,可实现本发明所述的目的。The interconnection of the semiconductors of the present invention is described below. By reducing the size of the
源极的金属接合区域101a的“L”形的覆盖区可增加源极的接合面积,并且多于已知技术中的接合面积。在本实施例中,其部分长度大约等于晶粒上面长度的一半。但是,如同在下面的其它实施例中,此长度亦可完全等于其封装后上面的整个长度。不过,此源极的接合区域101a的增加也使得相互连接源极端101与晶粒100的源极接合线104的数量增加。此外,接合线104之间的距离并无导致接合线104的数量增加。取而代之的是,增加其导线距离确实可以改进电感。例如,估计源极接合线104的数目与已知的导线架设计相比能增加30%到40%,如图1及图2所示。这些接合于晶粒的传导表面顶部的源极接合线104的增加为相互连接提供了一个较低的接合回路。如此,封装的阻抗和电感便降低了。The "L" shaped footprint of the source
此外,在此实施例中,因为第一个接脚101aa比第二个接脚101ab更短,所以“L”形的覆盖区显示转动大约为180度。但是,在其它的实施例或者设计中,因不同的配置,第一个接脚101aa可以是较长的。例如,如同图7所示, “L”形的覆盖区表示出“L”形转动大约为90度,因其第二个接脚201ab看来比第一个接脚201aa更短。Furthermore, in this embodiment, since the first leg 101aa is shorter than the second leg 101ab, the "L" shaped footprint exhibits a rotation of approximately 180 degrees. However, in other embodiments or designs, the first pin 101aa may be longer due to different configurations. For example, as shown in FIG. 7, the footprint of the "L" shape shows that the "L" shape is rotated approximately 90 degrees because the second leg 201ab appears to be shorter than the first leg 201aa.
在图4所示的实施例中,藉由将导线架平台103b的沿着减少的晶粒100底面的那一部分,来实现接合线104数目的增加。一般来说,因其金属氧化物半导体场效晶体管装置的栅极处理一个相对较小的电流,一接合线105对于相互连接晶粒100和栅极端102已足够。此栅极端102的栅极接合区域102a沿着晶粒100的一部分底面或其导线架平台103a而伸展出去。在本实施例当中,栅极的接合区域102a稍微地伸展出少于封装99底面的一半长度。沿着晶粒100的底面,在晶粒100的中心充分地提供了栅极平台107。沿着晶粒100底面的一部分长度的栅极接合区域102a的分布为接合线105的连接提供了一个直接路径。此栅极引线102b是从塑料体106的左侧面伸出的。In the embodiment shown in FIG. 4 , the increase in the number of
栅极平台107的移动,远离底部左边角落,释出了包括栅极平台107相对应的底部左边角落的左面,如此一来,源极接合线104才可以充分地沿着左面均匀地接合,包括往下直到晶粒100的底部左边角落。除此之外,对于源极端101的“L”形接合区域101a允许源极接合线104接合第一个接脚101aa以相互连接至晶粒100的顶面,并且紧密分布于晶粒100的顶部右边角落。The movement of the
在塑料体106内,晶粒100使用传导银(Ag)环氧树脂而附着于导线架平台103a的上面,其为漏极的金属终端103的一部分。在塑料体106内,导线架平台103a沿着紧接源极接合区域101a与栅极接合区域102a的第一接脚101aa的晶粒100顶面和底面,伸展至塑料体106的实体区域。因此,导线架平台103a被熔合或者整合于晶粒100右面漏极外部的导线架部分103b的面积则通常没有减少。Within the
在本实施例中,导线架平台103a的覆盖区并没有局限于晶粒100的一般形状,如此一来可在周围造成窄宽度边缘。晶粒100的关于塑料体106边缘的周长已经减少为源极“L”形的接合区域101a的第一个接脚101aa和栅极接合区域102a的置放提供了必要之空间。因此,对于“L”形状的参考可定义为上述之两个实施例。In this embodiment, the footprint of the lead frame platform 103a is not limited to the general shape of the
源极外部的导线架终端部分101b和向外延伸至塑料体106的漏极外部导线架终端部分103b,二者基本上皆连续、充分地完整的习用已知技术中的个别导线架接线或者引线,如同图1及图2所示。更特别地是,源极的导线架终端部分101b及漏极的导线架终端部分103b所扩大的表面积会增加曝露在空气中的表面积,此表面积几乎是个别导线架接线或者引线11b和13b的习用封装的两倍,如同在图1中所示。因此,扩大的外部导线架终端部分101b和103b将可更快速的进行散热,尤其是在电流加载期间所产生的热量。除此之外,其扩大的源极及漏极的导线架终端部分101b和103b将可减少封装热阻抗。The source outer lead
在本实施例中,增加了源极端101及漏极端103的外部表面积。在图4中的实施例,源极端101及漏极端103的外部表面积藉由为每一沿着塑料体106的左面和右面提供一个单一完整的外部导线架终端而使其最大化。然而,个人计算机主机板(图中未显示)的传统设计是用与导线架接线或者引线的模式及数目相符合的孔洞,如此一来此封装才能安装于表面。因此,个人计算机主机板(图中未显示)需要修正,以适应本发明的源极端101、栅极端102及漏极端103的设计。In this embodiment, the external surface areas of the
请参考图5显示的另一个集成电路封装109的实施例。图5所示的实施例与图4的实施例相类似,对此,只详尽描述其差别。为排除上述修改个人计算机主机板连接方式的需要,可分开设置导线架底部111bb及113bb,使其分别地附加于源极端111及漏极端113的底部部分。然而,源极端111及漏极端113的上面部分保持不断延伸并且基本上固定,如此一来,对于源极端111的单一金属条111ba可从塑料体116的左面放射出去,并且对于漏极端113的单一金属条113ba则可从塑料体106的右面放射出去。源极端111包含一“L”形金属接合区域111a,其接脚111aa及111ab可熔合至此单一金属条111ba,并且通过接合线114接合至晶粒110。Please refer to another embodiment of the integrated circuit package 109 shown in FIG. 5 . The embodiment shown in FIG. 5 is similar to that of FIG. 4, and only the differences will be described in detail here. In order to eliminate the above-mentioned need to modify the connection method of the PC main board, the bottom parts 111bb and 113bb of the lead frame can be separately provided and attached to the bottom parts of the source terminal 111 and the drain terminal 113 respectively. However, the upper portions of the source terminal 111 and the drain terminal 113 remain continuously extended and substantially fixed, such that a single metal strip 111ba for the source terminal 111 can radiate from the left side of the plastic body 116, and a single metal strip 111ba for the drain terminal 113 The metal strip 113ba can radiate from the right side of the
本发明的另一实施例如图6所示。因图6所示的实施例与图4及图5所述的实施例相类似,在此,仅详尽描述其差别。如图6所示的实施例,描述一集成电路封装119,其含一不连续“L”形状的接合区域121a。更特别地是,其“L”形接合区域121a的第二条接脚由完全沿着晶粒120左面的整个长度分布的复数个且分开设置的金属部分所构成。但是,可见第一接脚121aa是连续的,并且可熔合或者整合于不连续的第二个接脚121ab的最高部分。Another embodiment of the present invention is shown in FIG. 6 . Since the embodiment shown in FIG. 6 is similar to the embodiments described in FIGS. 4 and 5 , only the differences are described in detail here. The embodiment shown in FIG. 6 depicts an integrated circuit package 119 including a discontinuous "L" shaped bonding area 121a. More particularly, the second leg of the "L"-shaped bonding region 121 a is formed by a plurality of separate metal portions distributed along the entire length of the left side of the die 120 . However, it can be seen that the first leg 121aa is continuous and may be fused or integrated to the highest portion of the discontinuous second leg 121ab.
除此之外,本实施例中,源极及漏极的外部终端部分可分别包括源极端121及漏极端123的分开设置的导线架接线或者引线121b和123b。第二不连续接脚121ab的每一金属部分都以此联系向外延伸至塑料体126的分别的导线架接线或者引线121b。在导线架平台123a上可设置此晶粒120。In addition, in this embodiment, the external terminal portions of the source and the drain may include separate lead frame wires or leads 121 b and 123 b for the source terminal 121 and the drain terminal 123 , respectively. Each metal portion of the second discontinuous leg 121 ab is associated therewith with a respective lead frame wire or lead 121 b that extends outwardly to the plastic body 126 . The die 120 may be disposed on a leadframe platform 123a.
不连续第二接脚121ab的每一金属部分皆通过接合线124与晶粒120相互连接。 虽然,图6所示的实施例提供一不连续“L”形接合区域121a,但是,此接合区域121a的表面积充分增大到超过在已知技术中如图3所示的接合区域。Each metal portion of the discontinuous second pin 121 ab is connected to the die 120 through the bonding wire 124 . Although, the embodiment shown in FIG. 6 provides a discontinuous "L"-shaped joint area 121a, the surface area of this joint area 121a is sufficiently increased to exceed the joint area shown in FIG. 3 in the prior art.
继续请参考图7,显示一双重晶粒集成电路封装199。由于本发明的目的,图7为一仰视图来显示二金属氧化物半导体场效晶体管装置,双重晶粒集成电路封装199中,每一晶粒皆包含其导线架208及218所提供的三个终端(如:源极端201、211,栅极端202、212及漏极端终端设备203、213)。第一源极端201含一外部导线架终端部分201b及一与外部导线架终端部分201b整合的第一“L”形金属接合区域201a。第一源极金属接合区域201a通常含有一“L”形覆盖区,其包括连接第一晶粒200及第一导线架平台203a的一部分最高面(第一个侧面)的第一个接脚201aa,和沿着第一晶粒200或者导线架平台203a的一部分左面(第二个侧面)延伸的第二个接脚201ab。这个导线204沿着第一晶粒200的最高面及沿着左面均匀地接合。Please continue to refer to FIG. 7 , which shows a dual die integrated
在此实施例中,第一晶粒200的栅极接合区域202a及第二接脚201ab可分享左面。 除此之外,接合线205对于第一晶粒200与栅极端202之间的相互联接来说已足够。在本实施例中,在第一晶粒200的底部左边角落提供了栅极平台207。栅极引线202b和212b可分享塑料体206的同一个左面。In this embodiment, the
第二源极端211含有一外部导线架终端部分211b及一与外部导线架终端部分211b整合的第二“L”形金属接合区域211a。第二源极的金属接合区域221a通常含有一个“L”形覆盖区,其包括连接第二晶粒210及第二导线架平台213a的一部分最高面(第一个侧面)的第一个接脚211aa,和沿着第二晶粒210或者导线架平台213a的一部分左面(第二个侧面)延伸的第二个接脚211ab。此连接导线214沿着第二晶粒210的最高面及沿着左面均匀地接合。The
与第一晶粒200的栅极接合区域202a类似,其栅极接合区域212a与第二接脚211ab分享左面。 除此之外,一单一接合线215对于第二晶粒210与栅极端212之间的相互联接来说已足够。在第二晶粒210的底部左边角落提供了栅极平台217。Similar to the
在本实施例中,源极接合区域201a及211a已增加到超过已知技术设计的两倍,如同图3所示。对此,本实施例不仅减少了源极相互联接线204和214的阻抗及晶粒200及210的表面传播阻抗,也减少了电感效应。In this embodiment, the source junction regions 201a and 211a have been increased to more than twice the prior art design, as shown in FIG. 3 . In this regard, this embodiment not only reduces the impedance of the
第一晶粒200附着在导线架或者铜(控制装置)平台203a,其含有复数个接触到并且向外面伸展出塑料体206外部的分开设置的漏极引线203b的上面。同样地,第二晶粒210附着在导线架或者铜(控制装置)平台213a,其含有复数个接触到并且向外面伸展出塑料体206外部的分开设置的漏极引线213b的上面。The
请参考图8显示的一多重晶粒半导体封装299的另一实施例。如图8的仰视图所示,是含有两个金属氧化物半导体场效晶体管装置的双重晶粒半导体封装299。晶粒310含有三个终端(如:源极端312、栅极端305及漏极端313)。晶粒300含有一栅极端303及一漏极端301。晶粒300的源极是通过接合线302连接至导线架平台313a。此双重晶粒半导体封装299更包含电子组件320,此电子组件可能是另一晶粒、电阻或电容等等。在本实施例当中,电子组件320是一通过接合线318结合至晶粒310的集成电路的晶粒结构。Please refer to another embodiment of a
晶粒310的源极端312含有一外部导线架终端部分或者引线312b及一与外部导线架终端部分或者引线312b整合的一“L”形金属接合区域312a。源极金属接合区域312a通常含有一个“L”形覆盖区,其包含连接晶粒310及第二导线架平台313a的一部分底面(第一个侧面)的第一个接脚312aa和沿着晶粒310或是导线架平台313a的一部分左面(第二个侧面)延伸的第二个接脚312ab。此接合线315沿着晶粒310的底面及左面充分均匀地接合。The
在本实施例中,此接合线302均匀地与晶粒300的底部和与导线架平台313a相结合。In this embodiment, the
在本实施例中,第一晶粒300的栅极接合区域303a通过接合线304a接合至晶粒300的最高右边角落的栅极平台。第二晶粒310的栅极接合区域305a通过接合线307a接合至晶粒310的最高左边角落的栅极平台。In this embodiment, the
晶粒300的漏极端301包括使漏极引线301b结合的导线架平台301a。晶粒310的漏极端313包含有漏极引线313b。漏极端301及313位于封装299的对面。除此之外,栅极端303及305与相应的栅极引线303b及305b分别地设置在封装299的对面。The
请参考图9所示,显示一多晶粒半导体封装339的一实施例。在本实施例中,至少含有三个有金属氧化物半导体场效晶体管装置的晶粒结构346a和一集成电路的晶粒354。这三个晶粒340及晶粒354分享相同的导线架平台346a。除此之外,源极端342包含不连续“L”形状的接合区域342a。更特别地是,其“L”形的接合区域342a的第二接脚由沿着塑料体350最高面的长度充分地伸展出的第一接脚342aa所构成,如此一来,晶粒340至少含有二个能够分享此第一接脚342aa,以连接接合线352及356至其各自的晶粒340。Please refer to FIG. 9 , which shows an embodiment of a
除此之外,“L”形状接合区域342a的第二接脚342ab含有复数个分开设置的金属部分,其沿着塑料体350左面的整个长度分布。但是,可见第一接脚342aa是连续的,并且可熔合或者整合于不连续的第二个接脚342ab的最高部分。第二接脚342ab的复数个分开设置的金属部分的每一个部分皆与一源极引线342b与344b接合。In addition, the second leg 342ab of the “L”-shaped
除外,在本实施例中,漏极端346含有复数个导线架接线或者引线346b与导线架平台346a结合,并且从塑料体350的右面放射出去。Besides, in this embodiment, the
栅极端348及其引线348b由晶粒340分享。使此栅极的接合区域348a通过接合线349与晶粒340的其中的一栅极平台相互连接。在本实施例中,每一晶粒340皆通过接合线351使两个栅极平台一起用来相互连接晶粒340的栅极端。此晶粒354通过接合线358可连接至晶粒340的最高面直到其左边及上面。
显而易见地,图9的实施例所提供的“L”形接合区域沿着塑料体350的最高面的长度和其左面充分地伸展出去,并由多晶粒结构分享此区域。因此,在无损害其联机阻抗及电感参数的情况下,可产生一更高的密度封装。Notably, the embodiment of FIG. 9 provides an "L" shaped junction area that extends substantially along the length of the uppermost face of
请参考图10,显示另一个多-晶粒半导体封装358的一实施例。在本实施例中,此封装含有两个很靠近的金属氧化物半导体场效晶体管装置360,其含有“L”形的源极端368及372。Referring to FIG. 10 , another embodiment of a
此源极端368含有外部导线架终端部分368b及一与外部导线架终端部分368b整合的“L”形金属接合区域368a。“L”形金属接合区域368a通过接合线366与晶粒360结合。另一源极端372含有一外部导线架终端部分372b及一与外部导线架终端部分372b整合的“L”形金属接合区域372a。每一“L”形的金属接合区域368a及372a皆设置在塑料体378的相对角落。在本实施例中,其可设置在底部角落。除外,“L”形状的接合区域368a的第二接脚368ab含有复数个分开设置的金属部分,且其充分地沿着塑料体378左面的整个长度分布。第二接脚368ab的复数个分开设置的金属部分的每一个部分皆含有一已结合的源极引线368b。同样地,第二接脚372ab的复数个分开设置的金属部分的每一个部分皆含有一已结合的源极引线372b。此“L”形接合区域372a通过接合线374与其晶粒360相结合。The
在本实施例当中,一第一晶粒360的源极引线368b可在塑料体378的对面以作为第二晶粒360的源极引线372b。此晶粒360可设置在导线架平台376的上面。导线架平台376也包含有复数个终端A和一对终端B的另一个集成电路的晶粒370。这个B终端与晶粒360的栅极平台结合。这个A终端与分布于封装358对面的引线362结合。引线362b结合至其接合线各自连接至A终端的接合区域362a。In this embodiment, the source lead 368b of a
请参考图11,显示一另一双重-晶粒半导体封装390的实施例。封装390包含二晶粒400,第一个在导线架平台410a上,另一个在导线架平台414a上。导线架平台410a有复数个漏极引线410b;并且导线架平台414a有复数个漏极引线414b。源极端402及404分别含有“L”形金属接合区域402a和404a。当其“L”形金属接合区域404a设置在塑料体408的底部左边角落,“L”形金属接合区域402a设置在塑料体408的顶部左边角落。使区域402a可通过接合线418与最高晶粒400结合;并且,使区域404a可通过接合线416与底部晶粒400相结合。Please refer to FIG. 11 , which shows another embodiment of a dual-
在本实施例中,接脚402aa充分地沿着第一晶粒400最高面的长度伸展出去;接脚404aa充分地沿着第二晶粒400最底面的长度伸展出去。In this embodiment, the pins 402aa extend substantially along the length of the topmost surface of the
栅极406及412使栅极引线分别地通过接合线420和424与栅极平台结合。栅极平台充分地位于晶粒400一个侧面的中心。这些栅极引线分别地结合在源极端402及404的源极引线402b及404b之间。
在本实施例中,每一晶粒400的左面长度比晶粒400的顶面和底面更短。由此,“L”形接合区域402a和404a含有沿着其各自晶粒的左面伸展出去的第二接脚402ab和404ab。In this embodiment, the left side of each die 400 is shorter than the top and bottom sides of the
请参考图12所示,图12的实施例不同于图11,图12中的晶粒450分享相同的导线架平台460a。由此,漏极端460的漏极引线终端460b可沿着封装440的塑料体458的一个侧面分布。Please refer to FIG. 12 , the embodiment in FIG. 12 is different from FIG. 11 , in that the die 450 in FIG. 12 shares the same lead frame platform 460 a. Thus, the drain lead terminal 460 b of the drain terminal 460 may be distributed along one side of the plastic body 458 of the package 440 .
请参考图13所示,是一单一晶粒结构封装498。晶粒结构封装498包含一配置于导线架平台510a上的晶粒500,其中导线架平台510a包含复数个漏极引线510b,而构成漏极510。晶粒500含有分别包括二个“L”形的金属接合区域502a和504a的一源极端。当“L”形金属接合区域504a设置在底部左边角落时,此“L”形金属接合区域02a可设置在塑料体508顶部左边角落。第二接脚502ab含有复数个金属部分。“L”形金属接合区域502a的第一接脚502aa及第二接脚502ab沿着此晶粒结构的最高面和左面通过接合线518与晶粒500的顶部结合。“L”形的金属接合区域504a的第一接脚504aa和第二接脚504ab沿着这个晶粒结构的最底面和左面通过接合线516与晶粒500的顶部结合。Please refer to FIG. 13 , which is a single die structure package 498 . The die structure package 498 includes a die 500 disposed on a lead frame platform 510 a , wherein the lead frame platform 510 a includes a plurality of drain leads 510 b forming the drain 510 . Die 500 includes a source terminal including two "L" shaped metal bonding regions 502a and 504a, respectively. When the "L" shaped metal joint area 504a is located at the bottom left corner, this "L" shaped metal joint area 02a can be located at the top left corner of the plastic body 508 . The second pin 502ab includes a plurality of metal parts. The first pin 502aa and the second pin 502ab of the "L"-shaped metal bonding region 502a are combined with the top of the die 500 through the bonding wire 518 along the topmost surface and the left side of the die structure. The first leg 504aa and the second leg 504ab of the "L"-shaped metal bonding region 504a are bonded to the top of the die 500 by bonding wires 516 along the bottommost and left sides of the die structure.
请参考图14所示,图14的封装530不同于图13中的源极端542及544,图14中的源极端分别包括一个顶部“J”形和一个底部“C”形金属接合区域542a和544a。“J”形的金属接合区域542a包含有从塑料体548的对面放射出的全然相反对应引线542b的顶部“C”形的金属接合区域。“C”形的金属接合区域542a包含有一单一连续最高区域542aa与垂直地整合于连续区域542aa两个末端侧面区域542ab。分别在左面和右面设置了侧面区域542ab。“J”形金属接合区域542a更包括一沿着塑料体548的左面伸展出去的金属接合区域556。金属接合区域556使源极引线542b在那里结合。使“J”形的金属接合区域542a通过均匀分布于最高面和左右二面的最高部分的接合线558与晶粒540的顶部相结合。Please refer to FIG. 14. The package 530 of FIG. 14 is different from the source terminals 542 and 544 in FIG. 13. The source terminals in FIG. 544a. The "J" shaped metal bonding area 542a includes a top "C" shaped metal bonding area radiating from the opposite side of the plastic body 548 that radiates from the exact opposite corresponding lead 542b. The "C" shaped metal bonding region 542a includes a single continuous highest region 542aa and two end side regions 542ab vertically integrated with the continuous region 542aa. Side areas 542ab are provided on the left and right, respectively. The “J” shaped metal joint area 542 a further includes a metal joint area 556 extending along the left side of the plastic body 548 . Metal bond region 556 is where source lead 542b is bonded. The "J"-shaped metal bonding region 542a is combined with the top of the die 540 by bonding wires 558 evenly distributed on the highest surface and the highest parts of the left and right sides.
“C”形的金属接合区域544a包含有一单一连续底部区域544aa和垂直地整合于连续区域544aa的两个末端侧面区域544ab。侧面区域544ab在塑料体548的左面和右面全然相反地的相对。使“C”形金属接合区域544a通过均匀分布于底面和左右二面的底面部分的接合线546与晶粒540的底部相结合。The "C" shaped metal bonding region 544a includes a single continuous bottom region 544aa and two end side regions 544ab vertically integrated with the continuous region 544aa. The side regions 544ab are diametrically opposite to the left and right of the plastic body 548 . The "C"-shaped metal bonding region 544a is combined with the bottom of the die 540 through the bonding wires 546 evenly distributed on the bottom surface and the bottom surface portions of the left and right sides.
封装530更包括一位于导线架平台550a的电子组件554,如一半导体晶粒结构、电阻或是电容等等。在本实施例中,电子组件554的晶粒结构通过接合线560结合至晶粒结构540的最高表面。The package 530 further includes an electronic component 554 on the lead frame platform 550a, such as a semiconductor die structure, a resistor or a capacitor, and the like. In this embodiment, the grain structure of the electronic component 554 is bonded to the uppermost surface of the grain structure 540 by a bonding wire 560 .
漏极端550包含有复数个置于最高源极引线542b及底部源极引线544b之间的漏极引线550b,其位于塑料体548的右面上。栅极端552,更特别地,其栅极引线552b设置在“J”形金属接合区域542a和“C”形金属接合区域544a之间的塑料体548的左面。使这个栅极接合区域552a可通过接合线557与一栅极平台相结合。 The drain terminal 550 includes a plurality of drain leads 550b disposed between the topmost source lead 542b and the bottom source lead 544b , which are located on the right side of the plastic body 548 . Gate terminal 552, and more particularly, its gate lead 552b, is disposed to the left of plastic body 548 between "J" shaped metal junction region 542a and "C" shaped metal junction region 544a. This gate bonding region 552a can be combined with a gate land via bonding wire 557 .
请参考图15所示,封装570包含有一个由一单一的“J”形金属接合区域582a构成的源极端582。“J”形金属接合区域582a包含有一个顶部“C”形的金属接合区域,其含有二对从塑料体586对面放射出的全然相反的对应引线582b。此“C”形金属接合区域582a可包含一单一连续顶部区域582aa与垂直地整合于连续区域582aa对面的两个末端侧面区域582ab。侧面区域582ab分别设置在左面和右面,但是,其并不直接连接至连续区域582aa。取而代之的是,其侧面区域582ab于最高左边和右边的角落附近是不连续的。“J”形金属接合区域582a更包括一沿着左面区域582ab下面的塑料体586的左面伸展出去的金属接合区域584。金属接合区域556使源极引线582b在那里结合。使“J”形金属接合区域582a通过均匀分布于最高面和左右二面的最高部分的接合线588与晶粒580的顶部相结合。Referring to FIG. 15, the
晶粒580设置于导线架平台590上并且有着从塑料体586的右边放射出去的漏极引线590b以形成漏极端590。漏极引线590b与源极端582的引线582b可分享右面。栅极终端592可设置在封装570的底部左边角落。使栅极的接合区域通过接合线554a与晶粒580结合,并且包含有栅极引线592b。显而易见地,漏极端590的漏极引线590b的数目已减少了,而源极端已增加了,如此一来,就有其源极引线582b在塑料体586的二面上。
封装570进一步包含有通过接合线598与晶粒结构580的顶部结合的电子组件594。
请参考图16所示,封装599与图9的封装339相类似。图16所示的实施例不同于图9的是,其源极端602的“L”形金属接合区域602a,含有二组从封装599的左右二边放射出的全然相反对应引线602b。源极引线602b由此相对的末端的第一接脚602aa伸展出去。Please refer to FIG. 16 , the
请参考图17,除了此封装增加一倍以外,封装747与图14相类似。在本实施例中,最高晶粒750含有顶部“J”形金属接合区域752a及底部“C”形金属接合区域754。 底部晶粒750含有一底部“C”形金属接合区域760及一顶部“J”形金属接合区域756。此二个“C”与“J”形的金属接合区域754及756,因其彼此很紧密地靠近,故可一起充分地熔合以造成一个大体上在中心的“I”形的金属接合区域777。此中心可分别穿过金属接合区域777接合线780和785直到晶粒750的顶部和底部。Referring to Figure 17,
请参考图18,此封装818分别包含两个晶粒800a与800b及两个设置在导线架平台820a与830a上的电子组件802a与802b,其中该电子组件可以为半导体晶粒、电容、晶体管等等。在本实施例中,电子组件802a与802b通过接合线814各自与晶粒800a与800b结合连接。Please refer to FIG. 18, the package 818 includes two dies 800a and 800b and two electronic components 802a and 802b arranged on lead frame platforms 820a and 830a respectively, wherein the electronic components can be semiconductor dies, capacitors, transistors, etc. wait. In this embodiment, the electronic components 802a and 802b are respectively bonded to the dies 800a and 800b through bonding wires 814 .
晶粒800a的源极端804包含有源极引线804b与一金属接合区域804a,其大致上延伸如晶粒800a的长度。同样地,晶粒800b的源极端808包含有源极引线808b与一金属接合区域808a,其大致上延伸如晶粒800a的长度。The source terminal 804 of the die 800a includes a source lead 804b and a metal bonding region 804a extending substantially the length of the die 800a. Likewise, source terminal 808 of die 800b includes source lead 808b and a metal bonding region 808a extending substantially the length of die 800a.
晶粒800a的栅极端806包含有栅极引线806b,其中该栅极引线806b与源极引线804b彼此间互相平行。栅极金属接合区域806a与部分金属接合区域804a平行。栅极金属接合区域806a通过接合线824接合于栅极平台。在本实施例中,栅极平台接合于晶粒800a右侧较低的角落。同样地,晶粒800b的栅极端810有一栅极引线810b与源极引线808b平行。栅极金属接合区域810a与部分金属接合区域808a平行。栅极金属接合区域810a通过接合线824接合位于晶粒800a右侧较低的角落栅极平台。The gate terminal 806 of the die 800a includes a gate lead 806b, wherein the gate lead 806b and the source lead 804b are parallel to each other. The gate metal bonding region 806a is parallel to the partial metal bonding region 804a. The gate metal bonding region 806 a is bonded to the gate mesa by bonding wire 824 . In this embodiment, the gate mesa is bonded to the right lower corner of die 800a. Likewise, the gate terminal 810 of the die 800b has a gate lead 810b parallel to the source lead 808b. The gate metal bonding region 810a is parallel to the partial metal bonding region 808a. Gate metal bonding region 810a is bonded to the lower corner gate mesa on the right side of die 800a via bonding wire 824 .
漏极820与830包含漏极引线820b与830b,而该漏极引线各自接合于导线架平台820a与830a。Drains 820 and 830 include drain leads 820b and 830b bonded to leadframe lands 820a and 830a, respectively.
请参考图19,为半导体封装888的俯视图,为一单一晶粒依照本发明的第16实施例更具体化的设计。此封装888不同与先前设计的是,源极端844包含数个各自连接至金属接合区域844a、846a与848a的引线844b、846b与848b。金属接合区域844a与848a沿着晶粒840的长度延展,并且通过接合线856接合于晶粒840上。源极引线846b位于引线844b与848b之间。然而,金属接合区域846a至少与金属接合区域844a与848a中的一部分平行。同样地,金属接合区域846a通过接合线856接合于晶粒840上。在塑料体866内部,晶粒840的尺寸沿着源极面减小。根据上述情况,源极覆盖的金属接合区域(区域844a、846a与848a)的尺寸是增加的。Please refer to FIG. 19 , which is a top view of a semiconductor package 888 , which is a more specific design of a single die according to the sixteenth embodiment of the present invention. This package 888 differs from previous designs in that the source terminal 844 includes a plurality of leads 844b, 846b, and 848b connected to metal bonding regions 844a, 846a, and 848a, respectively. Metal bond regions 844 a and 848 a extend along the length of die 840 and are bonded to die 840 by bond wire 856 . Source lead 846b is located between leads 844b and 848b. However, metal bonding region 846a is parallel to at least a portion of metal bonding regions 844a and 848a. Likewise, metal bond region 846 a is bonded to die 840 by bond wire 856 . Inside the plastic body 866, the grains 840 decrease in size along the source facet. According to the above, the size of the source capping metal junction regions (regions 844a, 846a and 848a) is increased.
栅极端850的栅极引线850b与源极引线844b、846b及848b平行。栅极金属接合区域850a通过接合线864接合于栅极平台。在本实施例中,栅极平台接合于晶粒840底部面中央的位置。Gate lead 850b of gate terminal 850 is parallel to source leads 844b, 846b, and 848b. The gate metal bonding region 850 a is bonded to the gate mesa by bonding wire 864 . In this embodiment, the gate mesa is bonded to the center of the bottom surface of the die 840 .
该漏极端880包含复数个漏极引线880b,其中该漏极引线880b接合于导线架平台880a。The drain terminal 880 includes a plurality of drain leads 880b, wherein the drain leads 880b are bonded to the lead frame platform 880a.
综上所述,虽然本发明仅已一较佳实施例描述如上,然其并非用以限定本发明,任何本领域的技术人员,在不脱离本发明的精神和范围内,均可作各种修改与润饰,因此本发明的保护范围应以权利要求书所限定的为准。In summary, although the present invention has only been described above as a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make various modifications without departing from the spirit and scope of the present invention. Modification and retouching, so the scope of protection of the present invention should be defined by the claims.
Claims (31)
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| Application Number | Priority Date | Filing Date | Title |
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| PCT/US2003/022430 WO2005017994A1 (en) | 2003-07-14 | 2003-07-14 | Integrated circuit package for semiconductor devices with improved electric resistance and inductance |
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| CN1839471B true CN1839471B (en) | 2011-03-16 |
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| KR (2) | KR100996823B1 (en) |
| CN (1) | CN1839471B (en) |
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| DE102005018941B4 (en) * | 2005-04-22 | 2010-07-08 | Infineon Technologies Ag | Semiconductor device in a standard housing and method of making the same |
| DE102006021959B4 (en) | 2006-05-10 | 2011-12-29 | Infineon Technologies Ag | Power semiconductor device and method for its production |
| US8941962B2 (en) * | 2011-09-13 | 2015-01-27 | Fsp Technology Inc. | Snubber circuit and method of using bipolar junction transistor in snubber circuit |
| US9373577B2 (en) * | 2013-05-21 | 2016-06-21 | Infineon Technologies Ag | Hybrid semiconductor package |
| JP6582678B2 (en) * | 2015-07-27 | 2019-10-02 | 三菱電機株式会社 | Semiconductor device |
| CN116913883A (en) * | 2023-08-18 | 2023-10-20 | 芯聆半导体(苏州)有限公司 | A lead frame, semiconductor packaging structure and terminal equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US5168368A (en) * | 1991-05-09 | 1992-12-01 | International Business Machines Corporation | Lead frame-chip package with improved configuration |
| US5723899A (en) * | 1994-08-30 | 1998-03-03 | Amkor Electronics, Inc. | Semiconductor lead frame having connection bar and guide rings |
| US6184585B1 (en) * | 1997-11-13 | 2001-02-06 | International Rectifier Corp. | Co-packaged MOS-gated device and control integrated circuit |
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| US5168386A (en) | 1990-10-22 | 1992-12-01 | Tencor Instruments | Flat field telecentric scanner |
| US6621140B1 (en) | 2002-02-25 | 2003-09-16 | Rf Micro Devices, Inc. | Leadframe inductors |
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2003
- 2003-07-14 KR KR1020067000918A patent/KR100996823B1/en not_active Expired - Fee Related
- 2003-07-14 KR KR1020107011144A patent/KR100993735B1/en not_active Expired - Fee Related
- 2003-07-14 AU AU2003252015A patent/AU2003252015A1/en not_active Abandoned
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5168368A (en) * | 1991-05-09 | 1992-12-01 | International Business Machines Corporation | Lead frame-chip package with improved configuration |
| US5723899A (en) * | 1994-08-30 | 1998-03-03 | Amkor Electronics, Inc. | Semiconductor lead frame having connection bar and guide rings |
| US6184585B1 (en) * | 1997-11-13 | 2001-02-06 | International Rectifier Corp. | Co-packaged MOS-gated device and control integrated circuit |
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| CN1839471A (en) | 2006-09-27 |
| KR20060110857A (en) | 2006-10-25 |
| KR100996823B1 (en) | 2010-11-26 |
| KR20100069714A (en) | 2010-06-24 |
| AU2003252015A1 (en) | 2005-03-07 |
| WO2005017994A1 (en) | 2005-02-24 |
| KR100993735B1 (en) | 2010-11-11 |
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