[go: up one dir, main page]

CN1830491A - Hydrogen peroxide filling system of plasma sterilization device - Google Patents

Hydrogen peroxide filling system of plasma sterilization device Download PDF

Info

Publication number
CN1830491A
CN1830491A CN 200610043602 CN200610043602A CN1830491A CN 1830491 A CN1830491 A CN 1830491A CN 200610043602 CN200610043602 CN 200610043602 CN 200610043602 A CN200610043602 A CN 200610043602A CN 1830491 A CN1830491 A CN 1830491A
Authority
CN
China
Prior art keywords
hydrogen peroxide
vaporizer
filling system
plasma
storage tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200610043602
Other languages
Chinese (zh)
Inventor
舒建山
王俊杰
王衍魁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinva Medical Instrument Co Ltd
Original Assignee
Shinva Medical Instrument Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinva Medical Instrument Co Ltd filed Critical Shinva Medical Instrument Co Ltd
Priority to CN 200610043602 priority Critical patent/CN1830491A/en
Publication of CN1830491A publication Critical patent/CN1830491A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

A hydrogen peroxide filling system for the plasma sterilizer is composed of supporting frame, liquid storage tank, evaporator with nozzle, delivering pipeline between said liquid storage tank, and the high-precision metering pump with step motor, which is installed to said delivering pipeline.

Description

等离子体灭菌装置过氧化氢加注系统Plasma sterilizer hydrogen peroxide filling system

技术领域technical field

本发明涉及一种等离子体灭菌装置过氧化氢加注系统,用于给等离子体灭菌装置加注过氧化氢。The invention relates to a hydrogen peroxide filling system for a plasma sterilizing device, which is used for filling hydrogen peroxide into the plasma sterilizing device.

背景技术Background technique

消毒灭菌是卫生防病的重要环节,也是贯彻预防为主方针的重要组成部分。特别是在传染病控制中,消毒灭菌已成为切断传播途径的关键手段之一。自1968年Menashi首次使用氩等离子体杀灭玻璃瓶表面细菌以来,利用离子化气体——等离子体的杀菌消毒技术正不断替代常规技术,广泛应用于各个行业,并展现出巨大的优势。Disinfection and sterilization is an important part of sanitation and disease prevention, and it is also an important part of implementing the principle of prevention first. Especially in the control of infectious diseases, disinfection and sterilization have become one of the key means to cut off the transmission route. Since Menashi first used argon plasma to kill bacteria on the surface of glass bottles in 1968, the sterilization and disinfection technology using ionized gas-plasma is constantly replacing conventional technology, widely used in various industries, and has shown great advantages.

等离子体灭菌技术是消毒学领域近年来出现的一项新的物理灭菌技术。随着医学和生物高新技术的发展,现有的灭菌技术已不能满足某些特殊需要,一些不耐高温的精密医疗仪器,如纤维窥镜和其它畏热材料都需要低温灭菌技术。等离子体灭菌技术是继甲烷、环氧乙烷、戊二醛等灭菌技术之后,又一新的低温灭菌技术。等离子体灭菌技术克服了上述方法时间长、有毒性的特点,增添了新的医疗器械低温灭菌方法。Plasma sterilization technology is a new physical sterilization technology that has emerged in the field of disinfection in recent years. With the development of medical and biological high-tech, the existing sterilization technology can no longer meet some special needs. Some precision medical instruments that are not resistant to high temperatures, such as fiber speculum and other heat-resistant materials, require low-temperature sterilization technology. Plasma sterilization technology is another new low-temperature sterilization technology after methane, ethylene oxide, glutaraldehyde and other sterilization technologies. Plasma sterilization technology overcomes the long-time and toxic characteristics of the above methods, and adds a new low-temperature sterilization method for medical devices.

等离子体是指不断从外部对物质施加能量而使其离解成阴、阳电荷粒子的物质状态。由于按照能级顺序,物质状态依次为固态、液态、气态、等离子体,因此等离子体习惯上又称为第四态。除存在于自然界外,等离子体也能通过人工方式获得。通常是对气体施加电场,使荷电粒子加速。由于离子较重,所以被加速的都是电子。通过电子与较重粒子碰撞而引起电离,最终形成等离子体。Plasma refers to the state of matter in which energy is continuously applied to matter from the outside to dissociate it into negatively charged and positively charged particles. According to the order of energy levels, the states of matter are solid, liquid, gas, and plasma, so plasma is customarily called the fourth state. In addition to existing in nature, plasma can also be obtained artificially. Usually an electric field is applied to the gas to accelerate the charged particles. Since ions are heavier, all that are accelerated are electrons. Ionization is caused by electrons colliding with heavier particles, eventually forming a plasma.

在上述的低温等离子体消毒系统中,用来供应过氧化氢的装置有的采用卡匣系统,其容纳一定量的过氧化氢溶液。容纳在其中的过氧化氢溶液由一注射泵输送到溶液输送管,并且通过蒸发器将送入的液态过氧化氢溶液汽化,然后送入消毒灭菌室,但是这种系统非常复杂并且昂贵。另外有的采用液位检测技术来控制注入的液体容量,缺点是精确度较差。In the above-mentioned low-temperature plasma disinfection system, some devices for supplying hydrogen peroxide adopt a cartridge system, which contains a certain amount of hydrogen peroxide solution. The hydrogen peroxide solution contained therein is delivered to the solution delivery pipe by a syringe pump, and the liquid hydrogen peroxide solution sent in is vaporized by the evaporator, and then sent into the sterilization chamber, but this system is very complicated and expensive. In addition, some use liquid level detection technology to control the injected liquid capacity, but the disadvantage is that the accuracy is poor.

将过氧化氢气体注入灭菌室内,以便进行扩散渗透到灭菌物体表面。过氧化氢的浓度一般为0.05到10mg/公升,当过氧化氢在合适的浓度下注射时,可以将诸如氧气、氮气、氩气或者类似的辅助气体加入反应腔。因此,如果施加最佳能量,可以获得灭菌的最佳效果。由于每次注入的容量仅在2mL左右,所以要求过氧化氢的注入要准确,最低精确度要在0.05mL。精确加入非常不容易。Hydrogen peroxide gas is injected into the sterilization chamber to diffuse and penetrate the surface of the sterilized object. The concentration of hydrogen peroxide is generally 0.05 to 10 mg/liter. When hydrogen peroxide is injected at a suitable concentration, an auxiliary gas such as oxygen, nitrogen, argon or similar can be added to the reaction chamber. Therefore, if the optimal energy is applied, the best effect of sterilization can be obtained. Since the volume of each injection is only about 2mL, the injection of hydrogen peroxide is required to be accurate, with a minimum accuracy of 0.05mL. Accurate addition is not easy.

发明内容Contents of the invention

本发明的目的在于提供一种结构简单,价格低廉,精确度高,便于推广应用的等离子体灭菌装置过氧化氢加注系统。The object of the present invention is to provide a hydrogen peroxide filling system for a plasma sterilizing device that is simple in structure, low in price, high in accuracy, and convenient for popularization and application.

本发明所述的等离子体灭菌装置过氧化氢加注系统,包括支架、储液箱、汽化器和输送管路,储液箱和汽化器由输送管路连通,汽化器上连接有气体喷头,其特征在于输送管路上连接有高精度计量泵,配合计量泵安装有步进电机。The hydrogen peroxide filling system of the plasma sterilization device according to the present invention includes a bracket, a liquid storage tank, a vaporizer and a delivery pipeline, the liquid storage tank and the vaporizer are connected by a delivery pipeline, and a gas nozzle is connected to the vaporizer. A high-precision metering pump is connected to the delivery pipeline, and a stepping motor is installed with the metering pump.

本发明结构简单,价格低廉,便于推广应用,并且通过高精度计量泵进行供应,精确度高。The invention is simple in structure, low in price, easy to popularize and apply, and is supplied by a high-precision metering pump with high precision.

在储液箱的底部设半导体制冷器,使过氧化氢处于较低的温度环境,一方面保证过氧化氢的自身性能,另一方面避免氧化性强、挥发性大的过氧化氢的挥发,保护环境,安全可靠。A semiconductor refrigerator is installed at the bottom of the liquid storage tank to keep hydrogen peroxide in a lower temperature environment. On the one hand, it can ensure the performance of hydrogen peroxide itself, and on the other hand, it can avoid the volatilization of hydrogen peroxide with strong oxidation and high volatility. Protect the environment, safe and reliable.

汽化器设计为电加热汽化器,结构简单,容易实现自动控制。The vaporizer is designed as an electric heating vaporizer with simple structure and easy automatic control.

在储液箱上面增设对应的包装瓶刺破器,方便过氧化氢的添加。A corresponding packaging bottle piercer is added on the liquid storage tank to facilitate the addition of hydrogen peroxide.

在汽化器和气体喷头之间设控制电磁阀,利于实现自动控制,汽化器最好包括两级,电磁阀设在两级汽化器之间的连接管路上,第二级汽化器上连接气体喷头。在汽化器中设测温计,如热电偶等,配合温度继电器将温度控制在过氧化氢液体汽化温度之中。A control solenoid valve is set between the vaporizer and the gas nozzle, which is beneficial to realize automatic control. The vaporizer preferably includes two stages, the solenoid valve is arranged on the connecting pipeline between the two-stage vaporizers, and the gas nozzle is connected to the second stage vaporizer. Install a thermometer in the vaporizer, such as a thermocouple, etc., and cooperate with a temperature relay to control the temperature at the vaporization temperature of the hydrogen peroxide liquid.

在储液箱中配装有液位探针,便于监测过氧化氢液体余量,及时提醒用户添加过氧化氢液体以避免灭菌失败。Equipped with a liquid level probe in the liquid storage tank, it is convenient to monitor the residual hydrogen peroxide liquid, and remind the user to add hydrogen peroxide liquid in time to avoid sterilization failure.

本发明中,汽化器、液位探针、高精度计量泵、步进电机和半导体制冷器等,都有市售产品,直接购买使用即可。配用自动控制装置,可实现自动加注。In the present invention, the vaporizer, the liquid level probe, the high-precision metering pump, the stepper motor and the semiconductor refrigerator etc. all have commercially available products, which can be directly purchased and used. Equipped with an automatic control device, it can realize automatic filling.

本发明能自动地将极少的固定量过氧化氢溶液供给灭菌室。在过氧化氢溶液首先充满储液箱之后,半导体制冷器可使储液箱恒定在一定的温度之内以减少或降低过氧化氢液体的挥发,液位探针监测过氧化氢液体余量,及时提醒用户添加过氧化氢液体以避免灭菌失败。需要注入过氧化氢时,通过步进电机控制电路来控制步进电机的步距,进而控制过氧化氢进入到计量泵的容量,由于计量泵精度可以达到1μL,从而实现精确供应。这样,因此供液量的多少和精度即取决于步进电机控制的精度。上述动作完成之后,再将计量泵内的液体注入到一级汽化筒中加热汽化,配合温度继电器将温度控制在过氧化氢液体汽化温度之中,再通过控制电磁阀的开启和关闭,将过氧化氢气体通过输送管路输送至二级汽化筒,进行再次汽化后经气体喷头进入灭菌室中进行扩散为等离子体化做好气体的准备。The invention can automatically supply a very small fixed amount of hydrogen peroxide solution to the sterilization chamber. After the hydrogen peroxide solution fills the liquid storage tank first, the semiconductor refrigerator can keep the liquid storage tank at a certain temperature to reduce or reduce the volatilization of the hydrogen peroxide liquid, and the liquid level probe monitors the remaining amount of the hydrogen peroxide liquid. Timely remind users to add hydrogen peroxide liquid to avoid sterilization failure. When hydrogen peroxide needs to be injected, the step distance of the stepping motor is controlled by the stepping motor control circuit, and then the capacity of hydrogen peroxide entering the metering pump is controlled. Since the accuracy of the metering pump can reach 1μL, accurate supply can be realized. In this way, the amount and precision of the liquid supply depends on the precision of the stepper motor control. After the above actions are completed, inject the liquid in the metering pump into the first-stage vaporization cylinder to heat and vaporize, and cooperate with the temperature relay to control the temperature at the vaporization temperature of the hydrogen peroxide liquid, and then control the opening and closing of the solenoid valve to reduce the peroxide The hydrogen gas is transported to the secondary vaporization cylinder through the delivery pipeline, and after being vaporized again, it enters the sterilization chamber through the gas nozzle for diffusion to prepare the gas for plasmaization.

本发明等离子体灭菌装置过氧化氢加注系统,结构简单,价格低廉,并且能够将极少量的液体精确供给灭菌室,精确度高,便于推广应用。The hydrogen peroxide filling system of the plasma sterilizing device of the present invention has simple structure and low price, and can accurately supply a very small amount of liquid to the sterilizing chamber, has high precision, and is convenient for popularization and application.

附图说明Description of drawings

图1、本发明一实施例结构示意图。Fig. 1 is a schematic structural diagram of an embodiment of the present invention.

图中:1、气体喷头  2、二级汽化筒  3、热电偶  4、保温输送管路  5、液位探针6、包装瓶刺破器  7、储液箱  8、半导体制冷器  9、高精度计量泵  10、计量泵固定支架  11、组件支架  12、电磁阀  13、一级汽化筒  14、热电偶。In the figure: 1. Gas nozzle 2. Secondary vaporization cylinder 3. Thermocouple 4. Insulation delivery pipeline 5. Liquid level probe 6. Bottle piercer 7. Liquid storage tank 8. Semiconductor refrigerator 9. High precision Metering pump 10. Metering pump fixing bracket 11. Component bracket 12. Solenoid valve 13. Primary vaporizer 14. Thermocouple.

具体实施方式Detailed ways

结合上述实施例附图对本发明作进一步说明。The present invention will be further described in conjunction with the accompanying drawings of the above-mentioned embodiments.

如图所示,本发明所述的等离子体灭菌装置过氧化氢加注系统,包括支架、储液箱、汽化器和输送管路,储液箱和汽化器由输送管路连通,汽化器为电加热汽化筒,储液箱中配装有液位探针5,汽化筒和气体喷头1之间设有控制电磁阀12,汽化筒包括两级,电磁阀12设在两级汽化筒之间的连接管路上,第二级汽化筒2上连接气体喷头1,汽化筒中设有测温热电偶3、14,输送管路4上连接有高精度计量泵9,配合计量泵安装有步进电机,储液箱7的底部设有半导体制冷器8,储液箱7上面设有对应的包装瓶刺破器6。As shown in the figure, the plasma sterilization device hydrogen peroxide filling system according to the present invention includes a bracket, a liquid storage tank, a vaporizer and a delivery pipeline, the liquid storage tank and the vaporizer are connected by a delivery pipeline, and the vaporizer is electrically heated The vaporization cylinder is equipped with a liquid level probe 5 in the liquid storage tank, and a control solenoid valve 12 is provided between the vaporization cylinder and the gas nozzle 1. The vaporization cylinder includes two stages, and the solenoid valve 12 is located at the connection between the two stages of vaporization cylinders. On the pipeline, the gas nozzle 1 is connected to the second-stage vaporization cylinder 2, the temperature measuring thermocouple 3, 14 is installed in the vaporization cylinder, the high-precision metering pump 9 is connected to the delivery pipeline 4, and a stepping motor is installed to cooperate with the metering pump. The bottom of the liquid tank 7 is provided with a semiconductor refrigerator 8, and the liquid storage tank 7 is provided with a corresponding bottle piercer 6 above.

当灭菌装置需要注入过氧化氢时,将气体喷头对准等离子体灭菌装置的过氧化氢加入口进行加注。通过步进电机控制电路来控制步进电机的步距,进而控制过氧化氢进入到计量泵的容量,实现精确供应。计量泵内的液体到一级汽化筒中加热汽化,配合温度继电器将温度控制在过氧化氢液体汽化温度之中,再通过控制电磁阀的开启和关闭,将过氧化氢气体通过输送管路输送至二级汽化筒,进行再次汽化后经气体喷头进入灭菌室中。When the sterilizing device needs to inject hydrogen peroxide, align the gas nozzle with the hydrogen peroxide inlet of the plasma sterilizing device for filling. The step distance of the stepper motor is controlled by the stepper motor control circuit, and then the capacity of the hydrogen peroxide entering the metering pump is controlled to realize accurate supply. The liquid in the metering pump is heated and vaporized in the first-stage vaporization cylinder, and the temperature is controlled at the vaporization temperature of the hydrogen peroxide liquid with the temperature relay, and then the hydrogen peroxide gas is transported to the The secondary vaporization cylinder enters the sterilization chamber through the gas nozzle after re-vaporization.

Claims (8)

1、一种等离子体灭菌装置过氧化氢加注系统,包括支架、储液箱、汽化器和输送管路,储液箱和汽化器由输送管路连通,汽化器上连接有气体喷头,其特征在于输送管路上连接有高精度计量泵,配合计量泵安装有步进电机。1. A hydrogen peroxide filling system for a plasma sterilization device, comprising a bracket, a liquid storage tank, a vaporizer and a delivery pipeline, the liquid storage tank and the vaporizer are connected by a delivery pipeline, and a gas nozzle is connected to the vaporizer, which is characterized in that A high-precision metering pump is connected to the delivery pipeline, and a stepping motor is installed with the metering pump. 2、根据权利要求1所述的等离子体灭菌装置过氧化氢加注系统,其特征在于储液箱的底部设有半导体制冷器。2. The hydrogen peroxide filling system of the plasma sterilization device according to claim 1, characterized in that a semiconductor refrigerator is provided at the bottom of the liquid storage tank. 3、根据权利要求1所述的等离子体灭菌装置过氧化氢加注系统,其特征在于汽化器为电加热汽化器。3. The hydrogen peroxide filling system for the plasma sterilization device according to claim 1, characterized in that the vaporizer is an electrically heated vaporizer. 4、根据权利要求1、2或3所述的等离子体灭菌装置过氧化氢加注系统,其特征在于储液箱上面设有对应的包装瓶刺破器。4. The hydrogen peroxide filling system for a plasma sterilizing device according to claim 1, 2 or 3, characterized in that the liquid storage tank is provided with a corresponding bottle piercer. 5、根据权利要求4所述的等离子体灭菌装置过氧化氢加注系统,其特征在于汽化器和气体喷头之间设有控制电磁阀。5. The hydrogen peroxide filling system of the plasma sterilizing device according to claim 4, characterized in that a control solenoid valve is set between the vaporizer and the gas nozzle. 6、根据权利要求5所述的等离子体灭菌装置过氧化氢加注系统,其特征在于汽化器包括两级,电磁阀设在两级汽化器之间的连接管路上,第二级汽化器上连接气体喷头。6. The hydrogen peroxide filling system of the plasma sterilization device according to claim 5, characterized in that the vaporizer includes two stages, the solenoid valve is set on the connecting pipeline between the two stage vaporizers, and the gas vaporizer is connected to the second stage. nozzle. 7、根据权利要求6所述的等离子体灭菌装置过氧化氢加注系统,其特征在于汽化器中设有测温计。7. The hydrogen peroxide filling system for a plasma sterilizing device according to claim 6, characterized in that a thermometer is installed in the vaporizer. 8、根据权利要求7所述的等离子体灭菌装置过氧化氢加注系统,其特征在于储液箱中配装有液位探针。8. The hydrogen peroxide filling system of the plasma sterilization device according to claim 7, characterized in that a liquid level probe is installed in the liquid storage tank.
CN 200610043602 2006-04-12 2006-04-12 Hydrogen peroxide filling system of plasma sterilization device Pending CN1830491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200610043602 CN1830491A (en) 2006-04-12 2006-04-12 Hydrogen peroxide filling system of plasma sterilization device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200610043602 CN1830491A (en) 2006-04-12 2006-04-12 Hydrogen peroxide filling system of plasma sterilization device

Publications (1)

Publication Number Publication Date
CN1830491A true CN1830491A (en) 2006-09-13

Family

ID=36993091

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200610043602 Pending CN1830491A (en) 2006-04-12 2006-04-12 Hydrogen peroxide filling system of plasma sterilization device

Country Status (1)

Country Link
CN (1) CN1830491A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101138641B (en) * 2007-10-11 2010-08-11 天津凯斯普科技有限公司 Plasma body sterilizer quantitative priming device
CN101843912A (en) * 2010-05-27 2010-09-29 北京白象新技术有限公司 Clip type hydrogen peroxide injecting device
CN101890176A (en) * 2010-06-04 2010-11-24 山东威高集团医用高分子制品股份有限公司 Hydrogen peroxide quantitative filling system for low temperature plasma sterilizer
CN101641120B (en) * 2007-02-23 2013-06-05 互曼迈迪泰克公司 Quantitative liquid injection device of plasma sterilizer
CN103383578A (en) * 2013-07-09 2013-11-06 北京航天发射技术研究所 Redundant low-temperature filling system and method
CN105879801A (en) * 2016-06-06 2016-08-24 苏州工业园区鸿基洁净科技有限公司 VHP plasma aerosol generation method and device
CN107469116A (en) * 2017-09-15 2017-12-15 山东新华医疗器械股份有限公司 A kind of formalin automatic filling system
CN108686241A (en) * 2017-04-10 2018-10-23 莎罗雅株式会社 Sterilizing methods and bactericidal unit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101641120B (en) * 2007-02-23 2013-06-05 互曼迈迪泰克公司 Quantitative liquid injection device of plasma sterilizer
CN101138641B (en) * 2007-10-11 2010-08-11 天津凯斯普科技有限公司 Plasma body sterilizer quantitative priming device
CN101843912A (en) * 2010-05-27 2010-09-29 北京白象新技术有限公司 Clip type hydrogen peroxide injecting device
CN101890176A (en) * 2010-06-04 2010-11-24 山东威高集团医用高分子制品股份有限公司 Hydrogen peroxide quantitative filling system for low temperature plasma sterilizer
CN101890176B (en) * 2010-06-04 2013-06-12 山东威高集团医用高分子制品股份有限公司 Low temperature hydrogen preoxide quantitative filling system of plasma sterilizer
CN103383578A (en) * 2013-07-09 2013-11-06 北京航天发射技术研究所 Redundant low-temperature filling system and method
CN103383578B (en) * 2013-07-09 2016-01-20 北京航天发射技术研究所 A kind of redundancy cryogenic loading system and method
CN105879801A (en) * 2016-06-06 2016-08-24 苏州工业园区鸿基洁净科技有限公司 VHP plasma aerosol generation method and device
CN108686241A (en) * 2017-04-10 2018-10-23 莎罗雅株式会社 Sterilizing methods and bactericidal unit
CN108686241B (en) * 2017-04-10 2021-03-26 山东新华医疗器械股份有限公司 Sterilization method and sterilization device
CN107469116A (en) * 2017-09-15 2017-12-15 山东新华医疗器械股份有限公司 A kind of formalin automatic filling system

Similar Documents

Publication Publication Date Title
CN101618226B (en) Hydrogen peroxide plasma sterilizer and sterilizing method thereof
CN100502951C (en) Method of sterilization and apparatus therefor
CN102363045B (en) Composite disinfecting and sterilizing device and method
CN104302328B (en) Nitrogen oxide-based sterilization method and sterilization device
CA2693660C (en) Hydrogen peroxide sterilization process and device
CA2522509C (en) Sterilization system and method and orifice inlet control apparatus therefor
CN1830491A (en) Hydrogen peroxide filling system of plasma sterilization device
JP2010194301A (en) Sterilizing substance supply device and isolator
BR0306725A (en) Sterilization apparatus equipped with plasma treatment module and sterilization method
CN202699655U (en) Low-temperature plasma sterilizing device
CN113195007B (en) Sterilization method and sterilization device
NO20064957L (en) Process and apparatus for low energy evaporation of liquid oxidizing agents or solutions
CN103127538B (en) Multi-purpose sterilization method and multifunctional sterilizer thereof
EP2139527B1 (en) Quantitative liquid injection device of plasma sterilizer
CN2885257Y (en) Plasma Sterilization Device Hydrogen Peroxide Filling System
CA2433728C (en) Sterilization system and method with temperature-controlled condensing surface
Shi et al. Research on the inactivation effect of low-temperature plasma on Candida albicans
JP2014529430A (en) Decontamination of isolation enclosure
CN201272809Y (en) Microorganism resistance test apparatus for plasma sterilizing validation
CN215585472U (en) Evaporation device for hydrogen peroxide plasma sterilizer
CN205814733U (en) Hydrogen peroxide filling mechanism
CN219538981U (en) Low-temperature steam sterilization equipment
CN221950282U (en) A liquid supply system for a low temperature sterilizer
EP1884250A1 (en) Low temperature steriliser using hydrogen peroxide vapour
CN201768189U (en) Hydrogen peroxide dual temperature vaporizing device of low-temperature plasma sterilizer

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication