CN1803321B - Liquid knife mechanism - Google Patents
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- CN1803321B CN1803321B CN 200610005057 CN200610005057A CN1803321B CN 1803321 B CN1803321 B CN 1803321B CN 200610005057 CN200610005057 CN 200610005057 CN 200610005057 A CN200610005057 A CN 200610005057A CN 1803321 B CN1803321 B CN 1803321B
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- 239000007788 liquid Substances 0.000 title claims abstract description 76
- 238000004140 cleaning Methods 0.000 claims abstract description 54
- 239000012530 fluid Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 description 31
- 239000011521 glass Substances 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Abstract
Description
技术领域technical field
本发明涉及一种液刀机构,特别是涉及一种用来清洗一玻璃基板的液刀机构。The invention relates to a liquid knife mechanism, in particular to a liquid knife mechanism for cleaning a glass substrate.
背景技术Background technique
由于液晶显示面板具有外型轻薄、耗电量少以及无辐射污染等特性,因此被广泛地应用在笔记型计算机、个人数字助理等携带式信息产品上,甚至已有逐渐取代传统桌上型计算机的CRT监视器的趋势。在液晶显示面板中,玻璃基板(glass substrate)为构成液晶显示面板的关键元件,除了攸关液晶显示面板的成本外,对于液晶显示面板的合格率更有举足轻重的影响。近年来,玻璃基板也随着液晶显示面板尺寸的增加而增大。以目前第五代的液晶显示面板来说,其玻璃基板已经到达1300厘米乘以1500厘米的尺寸,第六代更达到1500厘米乘以1850厘米的尺寸。Due to the characteristics of thin and light appearance, low power consumption and no radiation pollution, liquid crystal display panels are widely used in portable information products such as notebook computers and personal digital assistants, and have even gradually replaced traditional desktop computers. CRT Monitor Trends. In the liquid crystal display panel, the glass substrate is a key component of the liquid crystal display panel. In addition to being related to the cost of the liquid crystal display panel, it also has a decisive impact on the yield of the liquid crystal display panel. In recent years, glass substrates have also increased in size along with increases in the size of liquid crystal display panels. Taking the current fifth-generation liquid crystal display panel as an example, its glass substrate has reached a size of 1300 cm by 1500 cm, and the sixth generation has reached a size of 1500 cm by 1850 cm.
随着玻璃基板大型化后,增加了许多较关键性的制作工艺,例如湿式蚀刻制作工艺等,进而加重了对最终产品的影响。其中在制作液晶显示面板的扫描线时所进行的蚀刻制作工艺,主要是使用由磷酸(H3PO4)、醋酸(CH3COOH)以及硝酸(HNO3)所组成的混合液体对金属进行蚀刻,并于蚀刻完成后先使用一液刀机构进行初步清洗,然后再使用大量的清水来清洗玻璃基板。然而,当玻璃基板大型化之后,玻璃基板的传送时间也相对增长,因此从液刀机构清洗完至开始使用大量清水来进行清洗的时间进而相对增加。换言之,在此一时间内残酸的均匀度,对后续产品的影响变的更加重要。As the size of the glass substrate increases, many more critical manufacturing processes, such as wet etching manufacturing processes, etc., are added, which in turn aggravates the impact on the final product. Among them, the etching process performed when making the scanning lines of the liquid crystal display panel mainly uses a mixed liquid composed of phosphoric acid (H 3 PO4 ), acetic acid (CH 3 COOH) and nitric acid (HNO 3 ) to etch the metal, After the etching is completed, a liquid knife mechanism is used for preliminary cleaning, and then a large amount of clean water is used to clean the glass substrate. However, when the size of the glass substrate increases, the transfer time of the glass substrate also increases relatively, so the time from the cleaning of the liquid knife mechanism to the use of a large amount of clean water for cleaning is relatively increased. In other words, the uniformity of residual acid in this period of time becomes more important for subsequent products.
请参照图1,图1为现有一液刀机构10的示意图。如图1所示,现有的液刀机构10包括有一结构主体20与至少一固定构件22。其中,结构主体20包括一上板24与一下板26,上板24与下板26之间限定有一清洗液内流道28,且上板24与下板26的接合处具有一连接清洗液内流道28的清洗液喷射口30。同时,固定构件22为至少一螺丝所构成,固定构件22同时穿透并固锁上板24与下板26,且固定构件22的尾端暴露于下板26之外。Please refer to FIG. 1 , which is a schematic diagram of a conventional liquid knife mechanism 10 . As shown in FIG. 1 , the conventional liquid knife mechanism 10 includes a structural body 20 and at least one fixing member 22 . Wherein, the structural main body 20 includes an upper plate 24 and a lower plate 26, and a cleaning liquid internal flow channel 28 is defined between the upper plate 24 and the lower plate 26, and the junction of the upper plate 24 and the lower plate 26 has a connecting cleaning liquid inner channel. The cleaning fluid injection port 30 of the flow channel 28 . Meanwhile, the fixing member 22 is formed by at least one screw. The fixing member 22 simultaneously penetrates and locks the upper board 24 and the lower board 26 , and the tail end of the fixing member 22 is exposed outside the lower board 26 .
一般而言,由于固定构件22的尾端暴露于下板26之外,因此当使用者使用液刀机构10清洗一玻璃基板时,清洗液便会由固定构件22与下板26连接的缝隙流出并滴落至玻璃基极上,进而使液刀水幕无法均匀的清洁玻璃基板而导致水滴痕(Mura)的产生。由于水滴痕会改变玻璃基板上方残酸的浓度并影响蚀刻的状态以及降低最终面板的品质,因此如何于使用液刀机构清洗玻璃基板时有效改善液刀滴水的状况即为当今一重要课题。Generally speaking, since the tail end of the fixing member 22 is exposed outside the lower plate 26, when the user uses the liquid knife mechanism 10 to clean a glass substrate, the cleaning liquid will flow out from the gap connecting the fixing member 22 and the lower plate 26. And drip onto the glass substrate, and then the liquid knife water curtain cannot clean the glass substrate uniformly, resulting in the generation of water drop marks (Mura). Since the water drop marks will change the concentration of residual acid on the glass substrate, affect the etching state and reduce the quality of the final panel, how to effectively improve the water dripping of the liquid knife when cleaning the glass substrate with the liquid knife mechanism is an important issue today.
发明内容Contents of the invention
本发明的主要目的在于提供一种液刀机构,来解决上述现有的问题。The main purpose of the present invention is to provide a liquid knife mechanism to solve the above existing problems.
根据本发明的目的,揭露一种液刀机构,包括有一结构主体与至少一固定构件。其中,该结构主体包括有一上板与一下板,上板与下板之间限定有一清洗液内流道,且上板与下板的接合处具有一清洗液喷射口并连接该清洗液内流道。此外,固定构件穿透该上板,用以固锁并连接该上板与该下板,且固定构件的一尾端位于该下板中而不曝露于该下板之外。According to the purpose of the present invention, a liquid knife mechanism is disclosed, which includes a structural main body and at least one fixing component. Wherein, the main body of the structure includes an upper plate and a lower plate, and a cleaning liquid inner flow channel is defined between the upper plate and the lower plate, and the junction of the upper plate and the lower plate has a cleaning liquid injection port and connects the cleaning liquid internal flow channel. road. In addition, the fixing member penetrates the upper board for locking and connecting the upper board and the lower board, and a tail end of the fixing member is located in the lower board and is not exposed outside the lower board.
根据本发明的目的,另揭露一种液刀机构,包括有一结构主体、一固定构件与一导流板。其中,该结构主体包括有一上板与一下板,该上板与该下板之间限定有一清洗液内流道,且该上板与该下板的接合处具有一清洗液喷射口并连接该清洗液内流道。此外,固定构件固锁并连接该上板与该下板,而导流板则设置于该下板上。According to the purpose of the present invention, another liquid knife mechanism is disclosed, which includes a structural main body, a fixing component and a deflector. Wherein, the main body of the structure includes an upper plate and a lower plate, and a cleaning liquid inner flow channel is defined between the upper plate and the lower plate, and the junction of the upper plate and the lower plate has a cleaning liquid injection port connected to the Cleaning fluid inner channel. In addition, the fixing component locks and connects the upper board and the lower board, and the deflector is arranged on the lower board.
由于本发明利用至少一固定构件,例如螺丝等穿透并固锁连接液刀机构的上板与下板,且该固定构件的一尾端位于该下板中而不暴露于该下板之外,并设置一导流板液刀机构的下板上,用来承接清洗时所滴落的清洗液,因此当使用者利用液刀机构清洗玻璃基板时,本发明可有效避免清洗液由固定构件尾端与下板之间的间隙流出并滴落至玻璃基板上,并同时防止清洗液由液刀机构的后端滴落至玻璃基板上,进而降低玻璃基板产生水滴痕的机率。Because the present invention utilizes at least one fixing member, such as a screw, etc. to penetrate and securely connect the upper plate and the lower plate of the liquid knife mechanism, and a tail end of the fixing member is located in the lower plate and is not exposed outside the lower plate , and set a deflector on the lower plate of the liquid knife mechanism to receive the cleaning liquid dripped during cleaning. Therefore, when the user uses the liquid knife mechanism to clean the glass substrate, the present invention can effectively prevent the cleaning liquid from being released from the fixed member The gap between the tail end and the lower plate flows out and drips onto the glass substrate, and at the same time prevents the cleaning liquid from dripping onto the glass substrate from the rear end of the liquid knife mechanism, thereby reducing the probability of water drop marks on the glass substrate.
附图说明Description of drawings
图1为现有一液刀机构的示意图;Fig. 1 is the schematic diagram of existing one liquid knife mechanism;
图2为本发明较佳实施例的一液刀机构示意图;Fig. 2 is a schematic diagram of a liquid knife mechanism of a preferred embodiment of the present invention;
图3为图2沿着A2及A2’的剖面示意图;Fig. 3 is a schematic sectional view along A2 and A2' of Fig. 2;
图4为本发明另一实施例的一液刀机构示意图;Fig. 4 is a schematic diagram of a liquid knife mechanism according to another embodiment of the present invention;
图5为图4沿着A4及A4’的剖面示意图。Fig. 5 is a schematic cross-sectional view along A4 and A4' of Fig. 4 .
主要元件符号说明:Description of main component symbols:
10 液刀机构 20 结构主体10 Liquid knife mechanism 20 Structural main body
22 固定构件 24 上板22 Fixed member 24 Upper plate
26 下板 28 清洗液内流道26 Lower plate 28 Cleaning fluid inner channel
30 清洗液喷射口 40 液刀机构30 Cleaning
42 结构主体 44 固定构件42 Structural
46 上板 48 下板46
50 清洗液内流道 52 清洗液喷射口50 Cleaning fluid inner flow channel 52 Cleaning fluid injection port
54 挡板 60 液刀机构54 baffle 60 liquid knife mechanism
62 结构主体 64 固定构件62 Structural main body 64 Fixed components
66 上板 68 下板66 upper plate 68 lower plate
70 清洗液内流道 72 清洗液喷射口70 Cleaning liquid inner flow channel 72 Cleaning liquid injection port
74 挡板 76 导流板74 baffle 76 deflector
78 导管78 Catheter
具体实施方式Detailed ways
请参照图2与图3,图2为本发明较佳实施例的一液刀机构40示意图,而图3为图2沿着A2及A2’的剖面示意图。如图2与图3所示,本发明的液刀机构40包括有一结构主体42与至少一固定构件44。其中,结构主体42包括有一上板46与一下板48,上板46与下板48之间限定有一清洗液内流道50,且上板46与下板48的接合处具有一连接清洗液内流道50的清洗液喷射口52。如图中所示,固定构件44可为多个螺丝,并穿透上板46,用以固锁上板46与下板48,且固定构件44的一尾端位于下板48中而不暴露于下板48之外。Please refer to FIG. 2 and FIG. 3 , FIG. 2 is a schematic diagram of a
值得注意的是,由于本发明是将固定构件44的一尾端设置于下板48内并不暴露于下板48外,因此当使用者利用液刀机构40清洗玻璃基板时,本发明可避免清洗玻璃基板的清洗液,例如清水等,由固定构件44的尾端与下板48连接的间隙中流出,进而降低基板产生水滴痕的机率。此外,本发明又可同时于结构主体42的上板46上设置一挡板54突出于上板46的前端。因此当使用者清洗玻璃基板时,本发明可同时避免清洗液由固定构件44的尾端与下板48连接之间隙流出,以及防止清洗液由固定构件44的顶端与上板46连接之间隙溢出并由上板46的前端滴落至清洗的玻璃基板上。It should be noted that, since the present invention arranges a tail end of the
请参照图4与图5,图4为本发明另一实施例的一液刀机构60示意图而图5为图4沿着A4及A4’的剖面示意图。如图4与图5所示,本发明的另一液刀机构60包括有一结构主体62、至少一固定构件64与一导流板76。其中,结构主体62包括有一上板66与一下板68,上板66与下板68之间限定有一清洗液内流道70,且上板66与下板68的接合处具有一连接清洗液内流道70的清洗液喷射口72。同时,固定构件64可为多个螺丝,并穿透上板66,用以固锁上板66与下板68,且导流板76设置于下板68上,用来承接清洗时滴落的清洗液。此外,液刀机构60可另包括一导管78连接导流板76,以于导流板76承接清洗液后将清洗液导至一容置装置(图未示)以进行后续处理。Please refer to FIG. 4 and FIG. 5 , FIG. 4 is a schematic diagram of a liquid knife mechanism 60 according to another embodiment of the present invention, and FIG. 5 is a schematic cross-sectional view along A4 and A4' of FIG. 4 . As shown in FIGS. 4 and 5 , another liquid knife mechanism 60 of the present invention includes a structural body 62 , at least one fixing member 64 and a deflector 76 . Wherein, the structure main body 62 includes an upper plate 66 and a lower plate 68, and a cleaning liquid internal flow channel 70 is defined between the upper plate 66 and the lower plate 68, and the junction of the upper plate 66 and the lower plate 68 has a connecting cleaning liquid inner channel. The cleaning fluid injection port 72 of the flow channel 70 . At the same time, the fixing member 64 can be a plurality of screws, and penetrates the upper plate 66 to securely lock the upper plate 66 and the lower plate 68, and the deflector 76 is arranged on the lower plate 68 to receive dripping water during cleaning. Cleaning fluid. In addition, the liquid knife mechanism 60 may further include a conduit 78 connected to the deflector 76 to guide the cleaning liquid to a receiving device (not shown) for subsequent processing after the deflector 76 receives the cleaning liquid.
如同先前所述的实施例,本实施例也可在结构主体62的上板66上设置一挡板74突出于上板66的前端。因此当使用者清洗玻璃基板时,本发明除了可避免清洗液由固定构件64的尾端与下板68连接的间隙流出、以及防止清洗液由固定构件64的顶端与上板66连接处溢出并由上板66前端滴落至玻璃基板上外,并可同时利用导流板76接纳由液刀机构60后端缝隙所流出的清洗液,以避免清洗液由液刀机构60后端滴落至玻璃基板上。Like the previous embodiments, in this embodiment, a baffle 74 protruding from the front end of the upper plate 66 can also be provided on the upper plate 66 of the structural main body 62 . Therefore, when the user cleans the glass substrate, the present invention can prevent the cleaning liquid from flowing out from the gap between the tail end of the fixed member 64 and the lower plate 68, and prevent the cleaning liquid from overflowing from the connection between the top of the fixed member 64 and the upper plate 66. The front end of the upper plate 66 drips onto the glass substrate, and at the same time, the deflector 76 can be used to receive the cleaning liquid flowing out from the gap at the rear end of the liquid knife mechanism 60, so as to prevent the cleaning liquid from dripping from the rear end of the liquid knife mechanism 60 to the glass substrate. on a glass substrate.
综上所述,相比较于现有用来清洗玻璃基板的液刀机构,本发明利用至少一固定构件,例如螺丝等穿设并固锁连接液刀机构的上板与下板,且该固定构件的一尾端位于该下板中而不暴露于该下板之外。此外,本发明可另设置一导流板液刀机构的下板上,用来承接清洗时所滴落的清洗液。因此,当使用者利用液刀机构清洗玻璃基板时,本发明可有效避免清洗液由固定构件尾端与下板之间的间隙流出并滴落至玻璃基板上,并同时防止清洗液由液刀机构的后端滴落至玻璃基板上,进而降低玻璃基板产生水滴痕的机率。In summary, compared with the existing liquid knife mechanism for cleaning glass substrates, the present invention utilizes at least one fixing member, such as a screw, to pass through and securely connect the upper plate and the lower plate of the liquid knife mechanism, and the fixing member A tail end of is located in the lower plate and is not exposed outside the lower plate. In addition, the present invention can additionally set a lower plate of the deflector liquid knife mechanism to receive the cleaning liquid dropped during cleaning. Therefore, when the user uses the liquid knife mechanism to clean the glass substrate, the present invention can effectively prevent the cleaning liquid from flowing out from the gap between the tail end of the fixing member and the lower plate and dripping onto the glass substrate, and at the same time prevent the cleaning liquid from being released by the liquid knife. The rear end of the mechanism drops onto the glass substrate, thereby reducing the chance of water drop marks on the glass substrate.
以上所述仅为本发明的较佳实施例,凡依本发明权利要求所做的均等变化与修饰,都应属本发明的涵盖范围。The above descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made according to the claims of the present invention shall fall within the scope of the present invention.
Claims (5)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610005057 CN1803321B (en) | 2006-01-17 | 2006-01-17 | Liquid knife mechanism |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610005057 CN1803321B (en) | 2006-01-17 | 2006-01-17 | Liquid knife mechanism |
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| CN1803321A CN1803321A (en) | 2006-07-19 |
| CN1803321B true CN1803321B (en) | 2010-05-12 |
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| CN 200610005057 Expired - Fee Related CN1803321B (en) | 2006-01-17 | 2006-01-17 | Liquid knife mechanism |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101311834B (en) * | 2008-07-11 | 2010-12-01 | 友达光电股份有限公司 | Liquid knife equipment that provides a uniform fluid curtain to the substrate |
| CN105842998B (en) * | 2014-01-27 | 2019-10-18 | 北京京东方显示技术有限公司 | A liquid knife and a developer cleaning device with the liquid knife |
| CN106111587B (en) * | 2016-06-23 | 2018-09-11 | 武汉华星光电技术有限公司 | Liquid cutter |
| CN107552445A (en) * | 2017-08-31 | 2018-01-09 | 昆山龙腾光电有限公司 | A kind of liquid crystal panel cleaning device |
| CN110109271B (en) * | 2019-04-16 | 2022-02-22 | Tcl华星光电技术有限公司 | Liquid knife |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005048336A1 (en) * | 2003-11-14 | 2005-05-26 | Sumitomo Precision Products Co., Ltd | Liquid removing device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005048336A1 (en) * | 2003-11-14 | 2005-05-26 | Sumitomo Precision Products Co., Ltd | Liquid removing device |
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