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CN1892265A - Method for making colour-filter - Google Patents

Method for making colour-filter Download PDF

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Publication number
CN1892265A
CN1892265A CNA2005100359161A CN200510035916A CN1892265A CN 1892265 A CN1892265 A CN 1892265A CN A2005100359161 A CNA2005100359161 A CN A2005100359161A CN 200510035916 A CN200510035916 A CN 200510035916A CN 1892265 A CN1892265 A CN 1892265A
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manufacturing
color filter
black matrix
filter according
photoresist layer
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CN100394221C (en
Inventor
周景瑜
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongchuang Technology Co ltd
Hongfujin Precision Industry Shenzhen Co Ltd
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Priority to CNB2005100359161A priority Critical patent/CN100394221C/en
Priority to US11/432,969 priority patent/US7537867B2/en
Priority to JP2006188555A priority patent/JP4512950B2/en
Priority to KR1020060064435A priority patent/KR100868398B1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

本发明涉及一种彩色滤光片制造方法，其包括下列步骤：在透明基板上形成有机黑矩阵光阻层；通过光罩对该有机黑矩阵光阻层曝光显影去除不必要的有机黑矩阵光阻层；在该有机黑矩阵光阻层上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。

Figure 200510035916

The invention relates to a method for manufacturing a color filter, which comprises the following steps: forming an organic black matrix photoresist layer on a transparent substrate; exposing and developing the organic black matrix photoresist layer through a photomask to remove unnecessary organic black matrix light resisting layer; forming a positive photoresist layer on the organic black matrix photoresist layer and exposing from the back; developing the positive photoresist layer to make a plurality of barriers; injecting ink between the barriers by inkjet method ; Cures the ink.

Figure 200510035916

Description

彩色滤光片制造方法Color filter manufacturing method

【技术领域】【Technical field】

本发明涉及一种彩色滤光片制造方法。The invention relates to a method for manufacturing a color filter.

【背景技术】【Background technique】

被动式显示装置，如液晶显示器，需利用彩色滤光片将通过的白光转化为红、绿、蓝三原色光束达成显示不同色彩影像的效果。彩色滤光片主要包括黑矩阵和着色层，该着色层是由交替排列的红、绿、蓝三色颜色层(ColorArea)组成。Passive display devices, such as liquid crystal displays, need to use color filters to convert passing white light into red, green, and blue primary color light beams to achieve the effect of displaying different color images. The color filter mainly includes a black matrix and a coloring layer, and the coloring layer is composed of red, green, and blue color layers (ColorArea) arranged alternately.

一种现有技术的彩色滤光片制造方法如图1所示，其是以喷墨技术制造彩色滤光片的方法，主要包括下列步骤：在透明基板上依次形成黑矩阵层和第一光阻层；通过光罩对该第一光阻层曝光和显影；对该黑矩阵层进行蚀刻并在之后完全去除该第一光阻层；在该黑矩阵层上形成第二光阻层并由背面进行曝光；显影该第二光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。A kind of manufacturing method of color filter of prior art is shown in Figure 1, and it is the method for manufacturing color filter with ink-jet technology, mainly comprises the following steps: Form black matrix layer and first light layer successively on transparent substrate The first photoresist layer is exposed and developed through a photomask; the black matrix layer is etched and then completely removed from the first photoresist layer; the second photoresist layer is formed on the black matrix layer and formed by Exposing the back side; developing the second photoresist layer to make a plurality of barrier walls; injecting ink between the barrier walls by inkjet method; curing the ink.

以下结合图2至图9对该彩色滤光片制造方法进行概要说明。The method for manufacturing the color filter will be briefly described below with reference to FIG. 2 to FIG. 9 .

如图2所示，提供透明基板100，在透明基板100的上表面上依次形成黑矩阵层102和第一光阻层104。该黑矩阵层102一般是以蒸镀或者溅镀的方式形成的铬或者铬合金的薄膜。As shown in FIG. 2 , a transparent substrate 100 is provided, and a black matrix layer 102 and a first photoresist layer 104 are sequentially formed on the upper surface of the transparent substrate 100 . The black matrix layer 102 is generally a thin film of chromium or chromium alloy formed by evaporation or sputtering.

如图3所示，通过光罩对该第一光阻层104曝光和显影，形成多个图案化的光阻矩阵1041。通过此步骤，将光罩上所具有的图案转移到该光阻矩阵1041上。As shown in FIG. 3 , the first photoresist layer 104 is exposed and developed through a photomask to form a plurality of patterned photoresist matrixes 1041 . Through this step, the pattern on the photomask is transferred to the photoresist matrix 1041 .

如图4所示，对该黑矩阵层102进行蚀刻，得到图案化的黑矩阵1021，并在之后完全去除剩余的光阻矩阵1041。As shown in FIG. 4 , the black matrix layer 102 is etched to obtain a patterned black matrix 1021 , and then the remaining photoresist matrix 1041 is completely removed.

如图5所示，在由该黑矩阵层制得的黑矩阵1021上形成第二光阻层106，并利用紫外光曝光源112由该透明基板100的与其上表面相对的背面进行曝光。As shown in FIG. 5 , a second photoresist layer 106 is formed on the black matrix 1021 made of the black matrix layer, and exposed from the back surface of the transparent substrate 100 opposite to the upper surface by an ultraviolet light exposure source 112 .

如图6所示，显影该曝光后的第二光阻层106，制得多个挡墙1061，每相邻的两挡墙1061之间形成空间。As shown in FIG. 6 , the exposed second photoresist layer 106 is developed to form a plurality of barrier walls 1061 , and a space is formed between every two adjacent barrier walls 1061 .

如图7所示，利用喷墨装置，例如热泡式喷墨装置(ThermalBubble Ink Jet Printing Apparatus)或者压电式喷墨装置(Piezoelectric Ink Jet Printing Apparatus)，将需要的颜色的墨水以微液体108注入挡墙1061之间的空间内。如图8所示，该多个微液体108在该空间内融合成墨水110。As shown in Figure 7, using an inkjet device, such as a thermal bubble inkjet device (ThermalBubble Ink Jet Printing Apparatus) or a piezoelectric inkjet device (Piezoelectric Ink Jet Printing Apparatus), the ink of the required color is used as a micro-liquid 108 Inject into the space between the retaining walls 1061. As shown in FIG. 8 , the plurality of micro-fluids 108 fuse into ink 110 in the space.

如图9所示，利用固化装置，例如加热装置或者发光装置，将该墨水110烘干或交连或二者兼有的，以形成平坦的颜色层114，该颜色层114可以为红色，相应地，其它的蓝颜色层和绿颜色层依次形成在该红颜色层114的一侧。As shown in Figure 9, utilize curing device, for example heating device or light-emitting device, this ink 110 is dried or cross-linked or both, to form flat color layer 114, and this color layer 114 can be red, corresponding Accordingly, other blue and green layers are sequentially formed on one side of the red layer 114 .

在该彩色滤光片制造方法中，为将光罩的图案转移到该黑矩阵1021上，须经过两道制程，即首先利用光罩曝光第一光阻层104，将该光罩的图案转移到该光阻矩阵1041上，然后再以该图案化的光阻矩阵1041做保护，对不需要的黑矩阵层102进行蚀刻去除，得到图案化的黑矩阵1021。该种制程由于涉及的制程过多，光罩的图案最终转移到该黑矩阵1041后，难免影响所需黑矩阵1021的图案的精确度，这进一步会影响到后续的挡墙1061和颜色层114等的精确度。In the manufacturing method of the color filter, in order to transfer the pattern of the photomask to the black matrix 1021, two processes are required, that is, firstly, the first photoresist layer 104 is exposed using a photomask, and the pattern of the photomask is transferred. on the photoresist matrix 1041 , and then use the patterned photoresist matrix 1041 as protection to etch and remove the unnecessary black matrix layer 102 to obtain a patterned black matrix 1021 . Because this kind of process involves too many processes, after the pattern of the photomask is finally transferred to the black matrix 1041, it will inevitably affect the accuracy of the required pattern of the black matrix 1021, which will further affect the subsequent barrier wall 1061 and color layer 114 etc. accuracy.

【发明内容】【Content of invention】

以下，将以实施例说明一种可提高黑矩阵的图案的精确度的彩色滤光片制造方法。Hereinafter, a method for manufacturing a color filter that can improve the accuracy of the pattern of the black matrix will be described with an embodiment.

为实现上述实施例内容提供一种彩色滤光片制造方法，该彩色滤光片制造方法包括下列步骤：在透明基板上形成有机黑矩阵光阻层；通过光罩对该有机黑矩阵光阻层曝光显影去除不必要的有机黑矩阵光阻层；在该有机黑矩阵光阻层上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。In order to realize the content of the above-mentioned embodiments, a method for manufacturing a color filter is provided, and the method for manufacturing a color filter includes the following steps: forming an organic black matrix photoresist layer on a transparent substrate; Exposing and developing to remove unnecessary organic black matrix photoresist layer; forming a positive photoresist layer on the organic black matrix photoresist layer and exposing from the back; developing the positive photoresist layer to make a plurality of barrier walls; Inking injects ink between the walls; cures the ink.

以及，提供又一种彩色滤光片制造方法，该彩色滤光片制造方法包括下列步骤：通过光罩或精密对位装置在透明基板的表面上形成自该透明基板表面凹入的多个沟槽；在该沟槽内形成有机黑矩阵；在该有机黑矩阵上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。And, there is provided yet another color filter manufacturing method, which includes the following steps: forming a plurality of grooves recessed from the surface of the transparent substrate on the surface of the transparent substrate through a photomask or a precision alignment device groove; form an organic black matrix in the groove; form a positive photoresist layer on the organic black matrix and expose it from the back; develop the positive photoresist layer to make a plurality of barrier walls; Inject between the barriers; cure the ink.

上述实施例所提供彩色滤光片制造方法均因是将黑矩阵直接与光罩对应制得，可提高黑矩阵的图案的精确度。而且，由于制得黑矩阵的材料为有机材料，避免使用现有技术的有害金属铬，使得上述实施例制得的彩色滤光片具环保性能。The method for manufacturing the color filter provided in the above-mentioned embodiments can improve the accuracy of the pattern of the black matrix because the black matrix is directly corresponding to the photomask. Moreover, since the material for making the black matrix is an organic material, the use of harmful metal chromium in the prior art is avoided, so that the color filter made in the above embodiment is environmentally friendly.

另外，当将黑矩阵设置在自透明基板表面凹入的沟槽内时，因注入挡墙之间的墨水不会接触到该黑矩阵，当该黑矩阵的材料存有孔洞时，还可避免不同颜色的颜色层的混色。In addition, when the black matrix is arranged in the groove recessed from the surface of the transparent substrate, the ink injected between the retaining walls will not touch the black matrix, and when there are holes in the material of the black matrix, it can also avoid Color blending of color layers of different colors.

【附图说明】【Description of drawings】

图1是一种现有技术彩色滤光片制造方法的流程图。FIG. 1 is a flowchart of a manufacturing method of a color filter in the prior art.

图2至图9是该现有技术彩色滤光片制造方法的示意图。2 to 9 are schematic diagrams of the manufacturing method of the color filter in the prior art.

图10是本发明第一实施例的彩色滤光片制造方法的流程图。FIG. 10 is a flow chart of the color filter manufacturing method according to the first embodiment of the present invention.

图11至图15是该第一实施例的彩色滤光片制造方法的示意图。11 to 15 are schematic diagrams of the manufacturing method of the color filter of the first embodiment.

图16是本发明第二实施例的彩色滤光片制造方法的流程图。FIG. 16 is a flowchart of a color filter manufacturing method according to a second embodiment of the present invention.

图17至图21是该第二实施例的彩色滤光片制造方法的示意图。17 to 21 are schematic diagrams of the manufacturing method of the color filter of the second embodiment.

【具体实施方式】【Detailed ways】

如图10所示，是本发明第一实施例彩色滤光片制造方法的流程图，其主要包括下列步骤：在透明基板上形成有机黑矩阵光阻层；通过光罩对该有机黑矩阵光阻层曝光显影去除不必要的有机黑矩阵光阻层；在该有机黑矩阵光阻层上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。As shown in Figure 10, it is a flow chart of the method for manufacturing a color filter according to the first embodiment of the present invention, which mainly includes the following steps: forming an organic black matrix photoresist layer on a transparent substrate; Exposing and developing the resist layer to remove unnecessary organic black matrix photoresist layer; forming a positive photoresist layer on the organic black matrix photoresist layer and exposing from the back; developing the positive photoresist layer to make a plurality of barrier walls; Ink is injected between the retaining walls by an inkjet method; the ink is cured.

以下结合图11至图15对该彩色滤光片制造方法进行说明。The manufacturing method of the color filter will be described below with reference to FIG. 11 to FIG. 15 .

如图11所示，提供透明基板300，例如玻璃基板，在透明基板300的上表面上形成有机黑矩阵光阻层304。该有机黑矩阵光阻层304的材料一般是碳黑树脂。As shown in FIG. 11 , a transparent substrate 300 is provided, such as a glass substrate, and an organic black matrix photoresist layer 304 is formed on the upper surface of the transparent substrate 300 . The organic black matrix photoresist layer 304 is generally made of carbon black resin.

如图12所示，通过光罩对该有机黑矩阵光阻层304曝光，并经过显影去除不必要的有机黑矩阵光阻层，形成多个图案化的黑矩阵3041。通过此步骤，将光罩上所具有的图案转移到该黑矩阵3041上。As shown in FIG. 12 , the organic black matrix photoresist layer 304 is exposed through a photomask, and the unnecessary organic black matrix photoresist layer is removed through development to form a plurality of patterned black matrixes 3041 . Through this step, the pattern on the photomask is transferred to the black matrix 3041 .

如图13所示，在该黑矩阵3041上形成正型光阻层306，并利用紫外光曝光源312由该透明基板300的与其上表面相对的背面进行曝光。此时，由于该黑矩阵3041的存在，该黑矩阵3041以光罩的作用使未被其遮挡的正型光阻层306曝光，而被其遮挡的正型光阻层306免于紫外光的照射。As shown in FIG. 13 , a positive photoresist layer 306 is formed on the black matrix 3041 , and exposed from the back surface of the transparent substrate 300 opposite to the upper surface by using an ultraviolet light exposure source 312 . At this time, due to the existence of the black matrix 3041, the black matrix 3041 exposes the positive photoresist layer 306 that is not blocked by the black matrix 3041, and the positive photoresist layer 306 that is blocked by it is protected from the ultraviolet light. irradiated.

如图14所示，显影该曝光后的正型光阻层306，显影后制得多个位于黑矩阵3041上的挡墙3061，每相邻的两挡墙3061之间形成空间。As shown in FIG. 14 , the exposed positive photoresist layer 306 is developed, and a plurality of barrier walls 3061 on the black matrix 3041 are formed after development, and a space is formed between every two adjacent barrier walls 3061 .

如图15所示，利用喷墨装置，例如热泡式喷墨装置或者压电式喷墨装置，将需要的颜色的墨水注入挡墙3061之间的空间内，并利用固化装置，例如加热装置或者发光装置，将该墨水烘干或交连或二者兼有的，以形成平坦的颜色层310，该颜色层310可以为红色，相应地，其它的蓝颜色层和绿颜色层依次形成在该红颜色层310的一侧。As shown in Figure 15, use an inkjet device, such as a thermal bubble inkjet device or a piezoelectric inkjet device, to inject ink of a desired color into the space between the retaining walls 3061, and use a curing device, such as a heating device Or a light-emitting device, the ink is dried or cross-linked or both to form a flat color layer 310, which can be red, and correspondingly, other blue color layers and green color layers are sequentially formed on the One side of the red color layer 310 .

该彩色滤光片制造方法因是将黑矩阵3041直接与光罩对应制得，可提高黑矩阵3041的图案的精确度。而且，由于制得黑矩阵3041的材料为有机材料，避免使用现有技术的有害金属铬，使得本方法制得的彩色滤光片具环保性能。Because the color filter manufacturing method directly corresponds to the black matrix 3041 and the photomask, the accuracy of the pattern of the black matrix 3041 can be improved. Moreover, since the material for making the black matrix 3041 is an organic material, the use of harmful metal chromium in the prior art is avoided, so that the color filter made by this method has environmental performance.

再如图16所示，是本发明第二实施例彩色滤光片制造方法的流程图，其主要包括下列步骤：在透明基板的表面上形成自该透明基板表面凹入的多个沟槽；在该沟槽内形成有机黑矩阵；在该有机黑矩阵上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。As shown in FIG. 16 , it is a flow chart of the method for manufacturing a color filter according to the second embodiment of the present invention, which mainly includes the following steps: forming a plurality of grooves recessed from the surface of the transparent substrate on the surface of the transparent substrate; Form an organic black matrix in the groove; form a positive photoresist layer on the organic black matrix and expose it from the back; develop the positive photoresist layer to make a plurality of barriers; inject ink into the organic black matrix by inkjet method Between barriers; cure the ink.

以下结合图17至图21对该彩色滤光片制造方法进行说明。The manufacturing method of the color filter will be described below with reference to FIGS. 17 to 21 .

如图17所示，提供透明基板500，例如玻璃基板，通过光罩进行激光、喷砂或者蚀刻的方式，或者通过其它精密对位装置进行激光或者喷砂的方式在该透明基板500的上表面上形成自该透明基板500上表面凹入的多个图案化的沟槽504。通过此步骤，将所需的图案转移到该沟槽504上。As shown in FIG. 17, a transparent substrate 500, such as a glass substrate, is provided on the upper surface of the transparent substrate 500 by laser, sandblasting or etching through a photomask, or by laser or sandblasting through other precision alignment devices. A plurality of patterned grooves 504 recessed from the upper surface of the transparent substrate 500 are formed on the top. Through this step, the desired pattern is transferred onto the trench 504 .

如图18所示，利用喷墨装置，例如热泡式喷墨装置或者压电式喷墨装置，将有机黑矩阵光阻材料，例如碳黑树脂，注入该多个沟槽504内，该有机黑矩阵光阻材料在该沟槽504形成有机黑矩阵5041。As shown in Figure 18, using an inkjet device, such as a thermal bubble inkjet device or a piezoelectric inkjet device, an organic black matrix photoresist material, such as carbon black resin, is injected into the plurality of grooves 504, the organic The black matrix photoresist material forms an organic black matrix 5041 in the groove 504 .

如图19所示，将正型光阻材料涂覆在该透明基板500的形成有黑矩阵5041的表面上，形成正型光阻层506，并利用紫外光曝光源512由该透明基板500的与其上表面相对的背面进行曝光。此时，由于该黑矩阵5041的存在，该黑矩阵5041以光罩的作用使未被其遮挡的正型光阻层506曝光，而被其遮挡的正型光阻层506免于紫外光的照射。As shown in FIG. 19 , a positive photoresist material is coated on the surface of the transparent substrate 500 on which the black matrix 5041 is formed to form a positive photoresist layer 506 , and an ultraviolet exposure source 512 is used to expose the transparent substrate 500 to the surface of the transparent substrate 500. The backside opposite to its upper surface is exposed. At this time, due to the existence of the black matrix 5041, the black matrix 5041 exposes the positive photoresist layer 506 that is not blocked by the black matrix 5041, and the positive photoresist layer 506 that is blocked by the black matrix 5041 is protected from the ultraviolet light. irradiated.

如图20所示，显影该曝光后的正型光阻层506，制得多个位于黑矩阵5041上的挡墙5061，每相邻的两挡墙5061之间形成空间。As shown in FIG. 20 , the exposed positive photoresist layer 506 is developed to form a plurality of barrier walls 5061 on the black matrix 5041 , and a space is formed between every two adjacent barrier walls 5061 .

如图21所示，利用喷墨装置，例如热泡式喷墨装置或者压电式喷墨装置，将需要的颜色的墨水注入挡墙5061之间的空间内，并利用固化装置，例如加热装置或者发光装置，将该墨水烘干或交连或二者兼有的，以形成平坦的颜色层510，该颜色层510可以为红色，相应地，其它的蓝颜色层和绿颜色层依次形成在该红颜色层510的一侧。As shown in Figure 21, use an inkjet device, such as a thermal bubble inkjet device or a piezoelectric inkjet device, to inject the ink of the required color into the space between the retaining walls 5061, and use a curing device, such as a heating device Or a light-emitting device, the ink is dried or cross-linked or both to form a flat color layer 510, which can be red, and correspondingly, other blue color layers and green color layers are sequentially formed on the One side of the red color layer 510 .

该第二实施例的彩色滤光片制造方法具有与第一实施例的彩色滤光片制造方法相同的效果，并且，由于是将黑矩阵5041设置在自透明基板500表面凹入的沟槽504内，当该黑矩阵5041的材料存有孔洞时，注入挡墙5061之间的墨水不会接触到该黑矩阵5041，从而避免不同颜色的颜色层的混色。The color filter manufacturing method of the second embodiment has the same effect as the color filter manufacturing method of the first embodiment, and because the black matrix 5041 is arranged in the groove 504 recessed from the surface of the transparent substrate 500 Inside, when the material of the black matrix 5041 has holes, the ink injected between the retaining walls 5061 will not touch the black matrix 5041, thereby avoiding the color mixing of the color layers of different colors.

Claims (23)

1.一种彩色滤光片制造方法，包括下列步骤：在透明基板上形成有机黑矩阵光阻层；通过光罩对该有机黑矩阵光阻层曝光显影去除不必要的有机黑矩阵光阻层；在该有机黑矩阵光阻层上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。1. A method for manufacturing a color filter, comprising the following steps: forming an organic black matrix photoresist layer on a transparent substrate; removing unnecessary organic black matrix photoresist layer by exposure and development of the organic black matrix photoresist layer through a photomask ; forming a positive photoresist layer on the organic black matrix photoresist layer and exposing from the back; developing the positive photoresist layer to make a plurality of barriers; injecting ink between the barriers by inkjet method; curing The ink. 2.如权利要求1所述的彩色滤光片制造方法，其特征在于：该透明基板为玻璃基板。2. The method for manufacturing a color filter according to claim 1, wherein the transparent substrate is a glass substrate. 3.如权利要求1所述的彩色滤光片制造方法，其特征在于：该有机黑矩阵光阻层的材料为有机树脂。3. The method for manufacturing a color filter according to claim 1, wherein the organic black matrix photoresist layer is made of organic resin. 4.如权利要求3所述的彩色滤光片制造方法，其特征在于：该有机树脂为碳黑树脂。4. The method for manufacturing a color filter according to claim 3, wherein the organic resin is carbon black resin. 5.如权利要求1所述的彩色滤光片制造方法，其特征在于：该由背面进行的曝光是以紫外光作为光源。5. The method for manufacturing a color filter according to claim 1, wherein the exposure from the back uses ultraviolet light as a light source. 6.如权利要求1所述的彩色滤光片制造方法，其特征在于：该喷墨法是通过喷墨装置将墨水注入该挡墙之间。6. The method for manufacturing a color filter according to claim 1, wherein in the inkjet method, ink is injected between the retaining walls through an inkjet device. 7.如权利要求6所述的彩色滤光片制造方法，其特征在于：该喷墨装置是选择自热泡式喷墨装置或者压电式喷墨装置。7. The method of manufacturing a color filter according to claim 6, wherein the inkjet device is selected from a thermal bubble inkjet device or a piezoelectric inkjet device. 8.如权利要求1所述的彩色滤光片制造方法，其特征在于：其是通过加热装置固化各个挡墙之间的墨水。8. The method for manufacturing a color filter according to claim 1, wherein the ink between the retaining walls is cured by a heating device. 9.如权利要求1所述的彩色滤光片制造方法，其特征在于：其是通过加热装置和抽真空装置固化各个挡墙之间的墨水。9. The method for manufacturing a color filter according to claim 1, wherein the ink between the retaining walls is solidified by a heating device and a vacuum device. 10.如权利要求1所述的彩色滤光片制造方法，其特征在于：其是通过发光装置固化各个挡墙之间的墨水。10 . The manufacturing method of the color filter according to claim 1 , wherein the ink between the retaining walls is solidified by a light emitting device. 11 . 11.一种彩色滤光片制造方法，包括下列步骤：通过光罩或精密对位装置在透明基板的表面上形成自该透明基板表面凹入的多个沟槽；在该沟槽内形成有机黑矩阵；在该有机黑矩阵上形成正型光阻层并由背面进行曝光；显影该正型光阻层制得多个挡墙；通过喷墨法将墨水注入该挡墙之间；固化该墨水。11. A method for manufacturing a color filter, comprising the following steps: forming a plurality of grooves recessed from the surface of the transparent substrate on the surface of the transparent substrate through a photomask or a precision alignment device; black matrix; forming a positive photoresist layer on the organic black matrix and exposing from the back; developing the positive photoresist layer to make a plurality of barriers; injecting ink between the barriers by inkjet method; curing the ink. 12.如权利要求11所述的彩色滤光片制造方法，其特征在于：该透明基板的表面上的沟槽是通过光罩进行激光、喷砂或者蚀刻的方式形成，或者通过精密对位装置进行激光或者喷砂的方式形成。12. The method for manufacturing a color filter according to claim 11, wherein the grooves on the surface of the transparent substrate are formed by laser, sandblasting or etching through a photomask, or are formed by a precision alignment device Formed by laser or sandblasting. 13.如权利要求11所述的彩色滤光片制造方法，其特征在于：该沟槽内的有机黑矩阵是以喷墨装置喷入。13. The method for manufacturing a color filter according to claim 11, wherein the organic black matrix in the groove is injected by an inkjet device. 14.如权利要求13所述的彩色滤光片制造方法，其特征在于：该喷墨装置是选择自热泡式喷墨装置或者压电式喷墨装置。14. The method of manufacturing a color filter according to claim 13, wherein the inkjet device is selected from a thermal bubble inkjet device or a piezoelectric inkjet device. 15.如权利要求11所述的彩色滤光片制造方法，其特征在于：其是通过喷墨装置将墨水注入该挡墙之间。15. The method for manufacturing a color filter according to claim 11, wherein ink is injected between the retaining walls by an inkjet device. 16.如权利要求15所述的彩色滤光片制造方法，其特征在于：该喷墨装置是选择自热泡式喷墨装置或者压电式喷墨装置。16. The manufacturing method of a color filter according to claim 15, wherein the inkjet device is selected from a thermal bubble inkjet device or a piezoelectric inkjet device. 17.如权利要求11所述的彩色滤光片制造方法，其特征在于：其是通过加热装置固化各个挡墙之间的墨水。17. The method for manufacturing a color filter according to claim 11, wherein the ink between the retaining walls is cured by a heating device. 18.如权利要求11所述的彩色滤光片制造方法，其特征在于：其是通过加热装置和抽真空装置固化各个挡墙之间的墨水。18. The manufacturing method of the color filter according to claim 11, characterized in that: the ink between the retaining walls is solidified by a heating device and a vacuum device. 19.如权利要求11所述的彩色滤光片制造方法，其特征在于：其是通过发光装置固化各个挡墙之间的墨水。19. The method for manufacturing a color filter according to claim 11, wherein the ink between the retaining walls is solidified by a light emitting device. 20.如权利要求11所述的彩色滤光片制造方法，其特征在于：该透明基板为玻璃基板。20. The method for manufacturing a color filter according to claim 11, wherein the transparent substrate is a glass substrate. 21.如权利要求11所述的彩色滤光片制造方法，其特征在于：该有机黑矩阵的材料为有机树脂。21. The method for manufacturing a color filter according to claim 11, wherein the material of the organic black matrix is organic resin. 22.如权利要求21所述的彩色滤光片制造方法，其特征在于：该有机树脂为碳黑树脂。22. The method for manufacturing a color filter as claimed in claim 21, wherein the organic resin is carbon black resin. 23.如权利要求11所述的彩色滤光片制造方法，其特征在于：该由背面进行的曝光是以紫外光作为光源。23. The method for manufacturing a color filter according to claim 11, wherein the exposure from the back uses ultraviolet light as a light source.
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