[go: up one dir, main page]

CN1791184A - Active pixel sensor and image sensing module with simplified transistor structure - Google Patents

Active pixel sensor and image sensing module with simplified transistor structure Download PDF

Info

Publication number
CN1791184A
CN1791184A CNA2004101007803A CN200410100780A CN1791184A CN 1791184 A CN1791184 A CN 1791184A CN A2004101007803 A CNA2004101007803 A CN A2004101007803A CN 200410100780 A CN200410100780 A CN 200410100780A CN 1791184 A CN1791184 A CN 1791184A
Authority
CN
China
Prior art keywords
transistor
signal
light
sensor
active pixel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004101007803A
Other languages
Chinese (zh)
Inventor
黄建章
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pixart Imaging Inc
Original Assignee
Pixart Imaging Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pixart Imaging Inc filed Critical Pixart Imaging Inc
Priority to CNA2004101007803A priority Critical patent/CN1791184A/en
Publication of CN1791184A publication Critical patent/CN1791184A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Transforming Light Signals Into Electric Signals (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

Compared with the traditional active pixel sensor with a 3T or 4T structure, the active pixel sensor has better light transmittance and light sensing capability because the transistor structure is simplified.

Description

简化晶体管结构的主动式像素传感器及图像传感模块Active pixel sensor and image sensing module with simplified transistor structure

技术领域technical field

本发明涉及一种像素传感器,特别是涉及一种以互补型金属氧化物半导体(Complementary Metal-Oxide Semiconductor;CMOS)工艺制作的主动式像素传感器及具有该等像素传感器的图像传感模块。The present invention relates to a pixel sensor, in particular to an active pixel sensor made with a complementary metal-oxide semiconductor (Complementary Metal-Oxide Semiconductor; CMOS) process and an image sensing module with the pixel sensors.

背景技术Background technique

目前图像传感装置的种类,除了有发展较久的CCD图像传感技术,也有以互补型金属氧化物半导体(CMOS)方式制成的CMOS图像传感技术,而CMOS图像传感技术除了可应用在光学式鼠标上,也大量应用在包括数码相机、可视电话、第三代手机系统等各方面,因此已成为图像科技发展的主流。At present, the types of image sensing devices, in addition to the long-developed CCD image sensing technology, also have CMOS image sensing technology made of complementary metal oxide semiconductor (CMOS), and CMOS image sensing technology can be applied in addition to The optical mouse is also widely used in various aspects including digital cameras, videophones, third-generation mobile phone systems, etc., so it has become the mainstream of image technology development.

现有的CMOS图像传感技术是以像素阵列(Pixel Array)的形式组成CMOS图像传感器(Image sensor),而像素阵列则是由许多像素(Pixel)单元排列而成,一般像素单元主要可区分为被动式像素传感器(Passive Pixel Sensor)或主动式像素传感器(Active Pixel Sensor),分别介绍如下:The existing CMOS image sensing technology is composed of a CMOS image sensor (Image sensor) in the form of a pixel array (Pixel Array), and the pixel array is composed of many pixel (Pixel) units arranged, and the general pixel units can be mainly divided into Passive Pixel Sensor or Active Pixel Sensor are introduced as follows:

如图1所示,显示一被动式像素传感器8,其具有一光电二极管(Photo diode)81及一晶体管(Transfer gate)82,由于只具有一个晶体管,可简称为1T结构的被动式像素传感器8。其传感原理是由光电二极管81受外部光线7激发而对应产生光电荷,而透过一列输出信号801可控制晶体管82的开关与否,当晶体管82开启(ON)时,则各像素传感器8输出一行输出信号802,最后再读取各行输出信号802,则经过信号放大及模数转换等过程,便可得到像素阵列整体的图像信号。As shown in FIG. 1 , a passive pixel sensor 8 is shown, which has a photodiode (Photo diode) 81 and a transistor (Transfer gate) 82. Since there is only one transistor, it can be referred to as a passive pixel sensor 8 with a 1T structure. The sensing principle is that the photodiode 81 is excited by the external light 7 and correspondingly generates photocharges, and the switching of the transistor 82 can be controlled through a column of output signals 801. When the transistor 82 is turned on (ON), each pixel sensor 8 A row of output signals 802 is output, and finally the output signals 802 of each row are read, and then the overall image signal of the pixel array can be obtained through processes such as signal amplification and analog-to-digital conversion.

然而,在1T结构的被动式像素传感器8中,由于其感应信号极小,且其所具有的读出线路易产生寄生电容,导致有较高的噪声输出,未有广泛的应用,因此有了主动式像素传感器的发展。However, in the passive pixel sensor 8 with 1T structure, since its induction signal is extremely small, and its readout line is prone to generate parasitic capacitance, resulting in high noise output, it has not been widely used, so there is an active development of pixel sensors.

如图2所示,说明了一种主动式图像传感模块9,具有一像素阵列91、一列寻址电路92、一行解码器93、一时序产生电路94及一放大器95。其中,像素阵列91具有M*N的像素传感器911;列寻址电路92用以缓冲输出列选择信号901、重置信号902,来控制每一列的该等像素传感器911,用以不断将接收到的外部光线(图未示)转换为电荷输出及更新;行解码器93则接收每一行电荷输出的行扫描信号903进行解码后,由放大器95加以输出;至于时序产生电路94则是对于列寻址电路92的列选择信号901、重置信号902的输出,以及对于行解码器93的行扫描信号903作时序的控制。As shown in FIG. 2 , an active image sensor module 9 is illustrated, which has a pixel array 91 , a column addressing circuit 92 , a row decoder 93 , a timing generating circuit 94 and an amplifier 95 . Wherein, the pixel array 91 has M*N pixel sensors 911; the column addressing circuit 92 is used to buffer and output the column selection signal 901 and the reset signal 902 to control the pixel sensors 911 of each column, so as to continuously receive The external light (not shown) is converted into charge output and updated; the row decoder 93 receives the row scan signal 903 of each row of charge output for decoding, and then outputs it from the amplifier 95; as for the timing generation circuit 94, it is for the column search The column selection signal 901 of the address circuit 92, the output of the reset signal 902, and the timing control of the row scanning signal 903 of the row decoder 93.

如图3、4所示,分别显示了目前主动式像素传感器的两种类型,兹分别依其具有的晶体管的数量区分为3T结构及4T结构的像素传感器3、4,并介绍如下:As shown in Figures 3 and 4, the two types of current active pixel sensors are shown respectively. They are divided into pixel sensors 3 and 4 with 3T structure and 4T structure respectively according to the number of transistors they have, and are introduced as follows:

如图3所示,说明3T结构的像素传感器3,具有一光电二极管PD3及三个晶体管,该等晶体管依其作用分别称为一重置(Reset)晶体管T31、一源极跟随器(Source follower)晶体管T32及一列选择(Row select)晶体管T33As shown in FIG. 3 , a pixel sensor 3 with a 3T structure has a photodiode PD 3 and three transistors. These transistors are respectively called a reset (Reset) transistor T 31 and a source follower ( Source follower) transistor T 32 and a row selection (Row select) transistor T 33 .

像素传感器3运作的原理,是在晶体管T31接收一高电平的重置信号301时,晶体管T31呈开启(ON)状态,并将前次由光电二极管PD3收集的光电荷清除;接着,晶体管T31接收低电平的重置信号301使其呈关闭(OFF)状态,光电二极管PD3仍受外部光线7的激发而对应产生光电荷,并将光电荷转换为电压输出,且开始放电使VA值降低;接着由晶体管T32使电压电平平移,使晶体管T33开启而接收一列选择信号302后输出,如此一来,便可借由每次读取各像素传感器3的行输出信号303,再以重置信号301输入来更新储存电荷以不断得到新的信号。The principle of operation of the pixel sensor 3 is that when the transistor T31 receives a high-level reset signal 301, the transistor T31 is turned on (ON), and the photocharge collected by the photodiode PD 3 last time is cleared; then , the transistor T 31 receives a low-level reset signal 301 to make it in an OFF state, and the photodiode PD 3 is still excited by the external light 7 to generate photocharges correspondingly, convert the photocharges into voltage outputs, and start The discharge reduces the value of VA; then the transistor T32 shifts the voltage level, and the transistor T33 is turned on to receive a column selection signal 302 and output it. In this way, the row of each pixel sensor 3 can be read each time The output signal 303 is then input with the reset signal 301 to update the stored charge to continuously obtain new signals.

其中,开启晶体管T31的方式,是对晶体管T31的栅极输入一高逻辑电平的重置信号301以给予光电二极管PD3逆向偏压,如此光电二极管PD3中会形成一耗尽区(Depletion Region),借由光照可使该耗尽区内吸收光子而产生电流。Wherein, the way to turn on the transistor T31 is to input a high logic level reset signal 301 to the gate of the transistor T31 to give the photodiode PD3 a reverse bias, so that a depletion region will be formed in the photodiode PD3 (Depletion Region), photons can be absorbed in the depletion region by illumination to generate current.

当在曝光期间,晶体管T31关闭时,光电二极管PD3因接受外部光线7照射而产生一与其光源强度呈一定比例的电子空穴对,且该电子空穴对会分别移动至光电二极管PD3的二端,使逆向偏压降低,而在晶体管T33开启时,由其源极可得到一终止曝光电压V2;其后,仍保持晶体管T33的开启,且再使晶体管T31开启,并也由晶体管T33的源极得到一起始曝光电压V1,若将终止曝光电压V2与起始曝光电压V1二者相减,便可换算为实际的曝光电压值。When the transistor T 31 is turned off during the exposure period, the photodiode PD 3 generates an electron-hole pair that is proportional to the intensity of the light source due to the photodiode PD 3 being irradiated by the external light 7, and the electron-hole pair will move to the photodiode PD 3 respectively. The two terminals of the transistor T33 are turned on to reduce the reverse bias voltage, and when the transistor T33 is turned on, a termination exposure voltage V2 can be obtained from its source; thereafter, the transistor T33 is still turned on, and the transistor T31 is turned on again, An initial exposure voltage V 1 is also obtained from the source of the transistor T 33 , and can be converted into an actual exposure voltage value by subtracting the termination exposure voltage V 2 from the initial exposure voltage V 1 .

由于3T结构的像素传感器3以重置晶体管T31的方式更新及读取信号,由于晶体管T32可防止读出的行输出信号303与VA相互干扰,因此与被动式的像素传感器8以重置信号801直接重置的情况相比较,噪声更低。Since the pixel sensor 3 of the 3T structure updates and reads the signal in the manner of resetting the transistor T31 , and since the transistor T32 can prevent the readout row output signal 303 from interfering with V A , it is reset with the passive pixel sensor 8 Compared with the case where the signal 801 is directly reset, the noise is lower.

如图4所示,4T结构的像素传感器4具有一光电二极管PD4、一电容Cf及四个晶体管,该等晶体管依其作用分别称为一转移晶体管T41、一重置晶体管T42、一源极跟随晶体管T43及一列选择晶体管T44,其中,晶体管T42、T43及T44的作用因为与3T结构的像素传感器3所具有的晶体管T31、T32及T33的功能类似,不再赘述。As shown in FIG. 4 , the pixel sensor 4 with a 4T structure has a photodiode PD 4 , a capacitor C f and four transistors. These transistors are called a transfer transistor T 41 , a reset transistor T 42 , and A source follower transistor T 43 and a column selection transistor T 44 , wherein the functions of the transistors T 42 , T 43 and T 44 are similar to those of the transistors T 31 , T 32 and T 33 of the pixel sensor 3 with a 3T structure ,No longer.

4T结构与3T结构的不同处在于,4T结构的像素传感器4多了晶体管T41及电容Cf,且光电二极管PD4连接到晶体管T41的一端,晶体管T41的另一端则与晶体管T42、T43及电容Cf并联;另外,4T结构具有的光电二极管PD4的结构与3T结构具有的光电二极管PD3不同,因为是PNP结构,所以光电二极管PD4具有箝制电压的作用,可以使光电二极管PD3的起始曝光电压得以维持而不致受到噪声干扰,因此4T结构的像素传感器4对抗噪声的效果更好。The difference between the 4T structure and the 3T structure is that the pixel sensor 4 of the 4T structure has an extra transistor T 41 and a capacitor C f , and the photodiode PD 4 is connected to one end of the transistor T 41 , and the other end of the transistor T 41 is connected to the transistor T 42 , T 43 and capacitor C f are connected in parallel; in addition, the structure of the photodiode PD 4 of the 4T structure is different from the photodiode PD 3 of the 3T structure. Because it is a PNP structure, the photodiode PD 4 has the function of clamping the voltage, which can make The initial exposure voltage of the photodiode PD 3 can be maintained without being disturbed by noise, so the pixel sensor 4 with 4T structure has a better anti-noise effect.

当像素传感器4在运作时,是对晶体管T41的栅极输入一高逻辑信号VDD以给予光电二极管PD4适当的逆向偏压,如此在光电二极管PD4中便会形成耗尽区,由于光电二极管PD4是PNP结构,使得耗尽区因为增加电压而变大,最后导致耗尽区占满整个N型区,电压因此不能够再进入而有了箝制电压的效果,且借由光照可使该耗尽区内吸收光子而产生电荷累积。When the pixel sensor 4 is in operation, a high logic signal V DD is input to the gate of the transistor T 41 to give the photodiode PD 4 an appropriate reverse bias voltage, so that a depletion region will be formed in the photodiode PD 4 , because The photodiode PD 4 has a PNP structure, which makes the depletion region larger due to the increase in voltage, and finally causes the depletion region to occupy the entire N-type region, so the voltage cannot re-enter and has the effect of clamping the voltage. Photons are absorbed in the depletion region to generate charge accumulation.

当要计算像素传感器4的曝光量时,是先开启晶体管T41及晶体管T42,使光电二极管PD4箝制在一固定的电压电平上,其后,晶体管T41关闭,使光电二极管PD4开始经由接收外部光线7而进行曝光;欲读出数据时,则开启晶体管T42,将电容Cf的电平充电至起始的一固定电平VB’,并先读出该电平为VB’的行输出信号403;接着,再将晶体管T41打开,该光电二极管PD4便借由电荷井深设计,由晶体管T41传至电容Cf,而由于电容Cf可蓄积电压,因此可得到一新的电平VB”,电平VB’-VB”即是曝光电压值。如此透过对晶体管T42输入重置信号401使其不断更新,以及由晶体管T43的电压电平平移作用,输出列选择信号402使晶体管T44开启,如此一来,便可借由每次读取各像素传感器3的行输出信号303,再以重置信号301输入来更新储存电荷以不断得到新的信号。When calculating the exposure of the pixel sensor 4, the transistor T 41 and the transistor T 42 are first turned on, so that the photodiode PD 4 is clamped at a fixed voltage level, and then the transistor T 41 is turned off, so that the photodiode PD 4 Exposure begins by receiving external light 7; when data is to be read out, the transistor T42 is turned on to charge the level of the capacitor C f to an initial fixed level V B ', and the level is first read out as The horizontal output signal 403 of V B '; then, the transistor T41 is turned on, and the photodiode PD 4 is transmitted from the transistor T41 to the capacitor C f through the design of the charge well depth, and since the capacitor C f can accumulate voltage, therefore A new level V B ” can be obtained, and the level V B ′-V B ” is the exposure voltage value. In this way, by inputting the reset signal 401 to the transistor T42 to make it continuously updated, and by the voltage level shifting effect of the transistor T43 , the output column selection signal 402 turns on the transistor T44 , so that the transistor T44 can be turned on every time. The row output signal 303 of each pixel sensor 3 is read, and then the reset signal 301 is input to update the stored charge to continuously obtain new signals.

整体而言,目前主动式像素传感器具有下述缺点:Overall, current active pixel sensors have the following disadvantages:

1.在3T结构中,由于光电二极管PD3是电连接至晶体管T31的源极,并透过此晶体管T31而被重新设定其逆向偏压,因此,当该晶体管T31或光电二极管PD3有漏电流(Leakage current)的状况发生时,就会影响该起始曝光电压V1及终止曝光电压V2的电压电平。另外,逆向偏压经过重置晶体管T31所引发的体效应(Body effect)而产生的压降及其本身的障壁电位的衰减,也会降低起始曝光电压V1,而相对地减少图像动态范围,影响图像品质。1. In the 3T structure, since the photodiode PD 3 is electrically connected to the source of the transistor T31 , and its reverse bias voltage is reset through the transistor T31 , therefore, when the transistor T31 or the photodiode When the PD 3 has leakage current, it will affect the voltage levels of the initial exposure voltage V 1 and the termination exposure voltage V 2 . In addition, the voltage drop caused by the body effect (Body effect) caused by the reset transistor T 31 and the attenuation of the barrier potential of the reverse bias voltage will also reduce the initial exposure voltage V 1 and relatively reduce the image dynamics. range, which affects image quality.

2.在4T结构中,主要是利用晶体管T41隔离光电二极管PD4及重置晶体管T42的源极以减少漏电流,但是由于需要4个晶体管,使得其开口率(Aperture ratio),也就是透光比率会降低,这是因为在像素传感器4的单位面积之中,若愈多晶体管则其所占面积比例增加,导致可透光的面积比例相对降低,因此使得像素阵列整体所能透光的面积也随之降低。2. In the 4T structure, the transistor T 41 is mainly used to isolate the photodiode PD 4 and reset the source of the transistor T 42 to reduce the leakage current, but since 4 transistors are required, the aperture ratio (Aperture ratio), that is The light transmittance ratio will decrease, this is because in the unit area of the pixel sensor 4, if there are more transistors, the proportion of its area will increase, resulting in a relatively lower proportion of the area that can transmit light, so that the entire pixel array can transmit light area is also reduced.

3.晶体管本身的特性容易产生KTC噪声,难以消除。3. The characteristics of the transistor itself are prone to KTC noise, which is difficult to eliminate.

4.光照射在光电二极管时,在光电二极管中的PN结的耗尽区会分离出电子空穴对而产生光电流,而不同波长的光线会在不同深度的PN结被吸收。例如:短波长的光会在接近表面的耗尽区吸收,长波长的光会在较深的耗尽区吸收,由于PN结的耗尽区多在光电二极管的较深处,因此相较于波长较长的红光,目前的像素传感器对于波长较短的蓝光的探测灵敏度较为不佳。4. When light is irradiated on the photodiode, the depletion region of the PN junction in the photodiode will separate electron-hole pairs to generate photocurrent, and light of different wavelengths will be absorbed at the PN junction at different depths. For example: short-wavelength light will be absorbed in the depletion region close to the surface, and long-wavelength light will be absorbed in the deeper depletion region. Since the depletion region of the PN junction is mostly in the deeper part of the photodiode, compared with For red light with a longer wavelength, the current pixel sensor has poor detection sensitivity for blue light with a shorter wavelength.

附图简述Brief description of the drawings

下面结合附图及实施例对本发明进行详细说明:Below in conjunction with accompanying drawing and embodiment the present invention is described in detail:

图1是一电路图,说明目前的被动式像素传感器;FIG. 1 is a circuit diagram illustrating a current passive pixel sensor;

图2是一电路方块图,说明目前的主动式图像传感模块,具有一由多个主动式像素传感器所组成的像素阵列;FIG. 2 is a circuit block diagram illustrating a current active image sensing module having a pixel array composed of a plurality of active pixel sensors;

图3是一电路图,说明目前主动式像素传感器的两种类型之一:3T结构的像素传感器;FIG. 3 is a circuit diagram illustrating one of two types of current active pixel sensors: a pixel sensor with a 3T structure;

图4是一电路图,说明目前主动式像素传感器的另一种类型:4T结构的像素传感器;FIG. 4 is a circuit diagram illustrating another type of current active pixel sensor: a pixel sensor with a 4T structure;

图5是一电路图,说明本发明简化晶体管结构的主动式像素传感器的第一优选实施例;5 is a circuit diagram illustrating the first preferred embodiment of the active pixel sensor with simplified transistor structure of the present invention;

图6是一示意图,说明第一优选实施例中,重置二极管的元件结构,是由光敏元件21的n型掺杂区中所形成一p型势井;FIG. 6 is a schematic diagram illustrating the element structure of the reset diode in the first preferred embodiment, which is a p-type potential well formed in the n-type doped region of the photosensitive element 21;

图7是一示意图,说明本发明的图像传感模块,其具有多个简化晶体管结构的主动式像素传感器;7 is a schematic diagram illustrating an image sensing module of the present invention, which has a plurality of active pixel sensors with simplified transistor structures;

图8是一电路图,说明本发明简化晶体管结构的主动式像素传感器的第二优选实施例;8 is a circuit diagram illustrating a second preferred embodiment of the active pixel sensor with simplified transistor structure of the present invention;

图9是一示意图,说明第二优选实施例中的光敏元件是一PNPN的三势井结构。Fig. 9 is a schematic diagram illustrating that the photosensitive element in the second preferred embodiment is a PNPN triple-well structure.

具体实施方式Detailed ways

有关本发明的前述及其他技术内容、特点与功效,在以下配合参考附图的二个优选实施例的详细说明中,将可清楚的呈现。The foregoing and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of two preferred embodiments with reference to the accompanying drawings.

如图5所示,为本发明简化晶体管结构的主动式像素传感器2的第一优选实施例,该优选实施例包含一光敏(Photosensitive)元件21、一重置二极管22、一第一晶体管23、一第二晶体管24。As shown in FIG. 5 , it is a first preferred embodiment of the active pixel sensor 2 with a simplified transistor structure in the present invention. This preferred embodiment includes a photosensitive (Photosensitive) element 21, a reset diode 22, a first transistor 23, a second transistor 24 .

其中,光敏元件21及重置二极管22均为光电二极管(Photo diode)的结构,其适于在一曝光时段间,将一外部光线7转换为一电气信号;光敏元件21是与重置二极管22相并联,且依据一重置信号201的电压电平的大小控制曝光时段的起始与终止;第一晶体管23用以将电气信号放大并转换为一输出信号,在本优选实施例中,第一晶体管23是一源极跟随器(Source follower),具有输入阻抗大、输出阻抗小、电流增益大及电压增益接近1等特性。第一晶体管23主要是利用NMOS晶体管的漏极接收一高电平电压VDD,栅极与光敏元件21、重置二极管22耦合连接,而源极则与第二晶体管24耦合连接。Wherein, the photosensitive element 21 and the reset diode 22 are photodiode (Photo diode) structures, which are suitable for converting an external light 7 into an electrical signal during an exposure period; the photosensitive element 21 is connected with the reset diode 22 are connected in parallel, and control the start and end of the exposure period according to the voltage level of a reset signal 201; the first transistor 23 is used to amplify and convert the electrical signal into an output signal. In this preferred embodiment, the first transistor 23 A transistor 23 is a source follower (Source follower), which has the characteristics of large input impedance, small output impedance, large current gain, and voltage gain close to 1. The first transistor 23 mainly uses the drain of the NMOS transistor to receive a high-level voltage V DD , the gate is coupled to the photosensitive element 21 and the reset diode 22 , and the source is coupled to the second transistor 24 .

第二晶体管24是电连接第一晶体管23并依一列选择信号202的逻辑电平的大小,控制是否送出行输出信号203。其中,第二晶体管24在本优选实施例中是为一NMOS晶体管,其漏极与第一晶体管23的源极电连接,栅极则用以接收列选择信号202,源极则用以送出行输出信号203。The second transistor 24 is electrically connected to the first transistor 23 and controls whether to send the row output signal 203 according to the logic level of a column selection signal 202 . Wherein, the second transistor 24 is an NMOS transistor in this preferred embodiment, its drain is electrically connected to the source of the first transistor 23, its gate is used to receive the column selection signal 202, and its source is used to send the row selection signal 202. output signal 203 .

主动式像素传感器2是依下列方式操作的:首先,由重置二极管22的阳极,输入高电平的重置信号201以给予光敏元件21逆向偏压,如此光敏元件21中的PN结会形成耗尽区,借由光照可使该耗尽区内吸收光子而产生电流,此外,由于重置二极管22本身也是光电二极管,因此也会因光照而产生电流,可于输出端Sout得到一起始曝光电压V1The active pixel sensor 2 operates in the following manner: first, a high-level reset signal 201 is input from the anode of the reset diode 22 to give the photosensitive element 21 a reverse bias, so that the PN junction in the photosensitive element 21 will form In the depletion region, light can be used to absorb photons in the depletion region to generate current. In addition, because the reset diode 22 itself is also a photodiode, it will also generate current due to light, and an initial state can be obtained at the output terminal S out exposure voltage V 1 .

接着,输入低电压电平的重置信号201,光敏元件21与重置二极管22开始曝光,接受外部光线7所照射而产生一与该光源强度呈一定比例的电荷;当第二晶体管24的栅极,得到一高(High)逻辑电平的列选择信号202而开启时,则经由第一晶体管23的放大,而由输出端Sout得到一终止曝光电压V2输出,若将起始曝光电压V1与终止曝光电压V2两电压相减而得到电压差,即完成一次曝光周期。Then, a reset signal 201 of a low voltage level is input, and the photosensitive element 21 and the reset diode 22 start to be exposed, and receive the irradiation of the external light 7 to generate a charge that is proportional to the intensity of the light source; when the gate of the second transistor 24 pole, when the column selection signal 202 of a high logic level is obtained and turned on, then through the amplification of the first transistor 23, a terminal exposure voltage V2 output is obtained from the output terminal S out , if the initial exposure voltage The voltage difference is obtained by subtracting the two voltages of V 1 and the termination exposure voltage V 2 , that is, one exposure cycle is completed.

如图6所示,重置二极管22的元件结构,是由光敏元件21的n型掺杂区中,形成一p型势井,因此其所形成的耗尽区,可吸收更多光子,进而增加了光敏元件21的感光能力,更相对地提高了起始曝光电压V1,而增加了图像动态范围,并提高了图像灵敏度。As shown in Figure 6, the element structure of the reset diode 22 is to form a p-type potential well in the n-type doped region of the photosensitive element 21, so the depletion region formed by it can absorb more photons, and then The photosensitivity of the photosensitive element 21 is increased, and the initial exposure voltage V 1 is relatively increased, thereby increasing the image dynamic range and image sensitivity.

如图7所示,是一图像传感模块200,其中,图像传感模块200具有多个主动式像素传感器2,各像素传感器2呈矩阵式排列,且各列的像素传感器2共用传送重置信号201的传输线;各列的像素传感器2也共用传送列选择信号201的传输线,该等传输线并与各第二晶体管24的栅极耦合连接;至于各行的像素传感器2则共用传送行输出信号203的传输线将信号加以输出,至于其控制方式可参考图2的说明。As shown in FIG. 7 , it is an image sensing module 200, wherein the image sensing module 200 has a plurality of active pixel sensors 2, and each pixel sensor 2 is arranged in a matrix, and the pixel sensors 2 of each column share the transmission reset The transmission line of the signal 201; the pixel sensors 2 of each column also share the transmission line for transmitting the column selection signal 201, and these transmission lines are coupled and connected with the gates of the second transistors 24; as for the pixel sensors 2 of each row, they share the transmission line output signal 203 The signal is output by the transmission line, as for its control method, please refer to the description in Figure 2.

如图8所示,为本发明简化晶体管结构的主动式像素传感器5的第二优选实施例,该优选实施例包含一光敏元件51、一源极跟随晶体管52及一列选择晶体管53,其中,除了光敏元件51的元件结构与第一优选实施例不同外,由于其它的源极跟随晶体管52及列选择晶体管53构件,与重置信号501、列选择信号502及行输出信号的作用原理,均与第一优选实施例所述的第一晶体管23及第二晶体管24相同,所以在此不再予以赘述。As shown in FIG. 8 , it is the second preferred embodiment of the active pixel sensor 5 with simplified transistor structure of the present invention. This preferred embodiment includes a photosensitive element 51, a source follower transistor 52 and a column selection transistor 53, wherein, in addition to The element structure of the photosensitive element 51 is different from that of the first preferred embodiment, because other source follower transistors 52 and column selection transistor 53 components, and reset signal 501, column selection signal 502 and the action principle of the row output signal are all the same as The first transistor 23 and the second transistor 24 described in the first preferred embodiment are the same, so they will not be repeated here.

如图9所示,显示光敏元件51是一PNPN的三势井(Triple well)结构,除了可降低各像素传感器之间的交互干扰(Cross Talk),其内部的PNPN结形成的耗尽区,可增加光子的吸收效率,进而增加了光敏元件51的感光能力,更相对地提高了起始曝光电压V1,而增加了图像动态范围,并提高了图像灵敏度,而借由PNPN的一端,也可简单地对光敏元件51予以充电。As shown in FIG. 9 , the display photosensitive element 51 is a PNPN triple well (Triple well) structure. In addition to reducing the cross talk between the pixel sensors, the depletion region formed by the PNPN junction inside it, It can increase the absorption efficiency of photons, thereby increasing the photosensitivity of the photosensitive element 51, relatively increasing the initial exposure voltage V 1 , increasing the dynamic range of the image, and improving the image sensitivity. The photosensitive element 51 can be easily charged.

归纳上述,本发明简化晶体管结构的主动式像素传感器2、5较一般习用的3T及4T结构的像素传感器具有下述优点:To sum up the above, the active pixel sensors 2 and 5 with a simplified transistor structure in the present invention have the following advantages over the commonly used pixel sensors with 3T and 4T structures:

1.由于主动式像素传感器2中,该重置二极管22是于光敏元件21的n型掺杂区中产生的p型势井而形成的,所以将形成一类PNP结构,经由内建的PN二极管导通可容易给予适当的逆向偏压至光电二极管,也因此可消除3T及4T结构中晶体管的体效应,及提高了起始曝光电压V1,并增加了图像动态范围,提高了图像灵敏度。1. Since in the active pixel sensor 2, the reset diode 22 is formed by the p-type potential well generated in the n-type doped region of the photosensitive element 21, a type of PNP structure will be formed, through the built-in PN The conduction of the diode can easily give an appropriate reverse bias to the photodiode, and therefore can eliminate the body effect of the transistor in the 3T and 4T structure, and increase the initial exposure voltage V 1 , increase the dynamic range of the image, and improve the image sensitivity .

2.由于是以重置二极管22取代晶体管的使用,因此可避免一般晶体管在开启/关闭时会产生的KTC噪声。2. Since the reset diode 22 is used instead of the transistor, the KTC noise generated when the general transistor is turned on/off can be avoided.

3.由于主动式像素传感器2的重置二极管22是于光敏元件21中形成,而主动式像素传感器5更只需一组光敏元件51,且各主动式像素传感器2、5均只具有两个晶体管23、24及52、53,所以其单位面积的透光率,将更较3T、4T结构的像素单位面积透光率增大许多,即此像素2的感光面积有效的增加,更为提升了其灵敏度。3. Since the reset diode 22 of the active pixel sensor 2 is formed in the photosensitive element 21, the active pixel sensor 5 only needs one set of photosensitive elements 51, and each active pixel sensor 2, 5 only has two Transistors 23, 24 and 52, 53, so the light transmittance per unit area will be much higher than the light transmittance per unit area of pixels with 3T and 4T structures, that is, the light-sensitive area of the pixel 2 is effectively increased and further improved its sensitivity.

4.光敏元件21的PN结12由于较接近主动式像素传感器2的表面,将可更为有效的感应波长较短的蓝光,而更为灵敏。4. Since the PN junction 12 of the photosensitive element 21 is closer to the surface of the active pixel sensor 2 , it can sense blue light with a shorter wavelength more effectively and thus is more sensitive.

Claims (6)

1, a kind of active pixel sensor of simplifying transistor structure is characterized in that: this element sensor comprises:
One light-sensitive element in order to after the sensitization light signal being converted to an electric signal, and upgrades this electric signal after reading a reset signal;
One the first transistor is electrically connected this light-sensitive element, is in order to this electric signal is amplified and be converted to an output signal; And
One transistor seconds is electrically connected this first transistor, and complies with the output of this output signal of selection signal controlling.
2, the active pixel sensor of simplifying transistor structure as claimed in claim 1 is characterized in that:
This light-sensitive element is the photodiode of a PNPN three gesture well constructions.
3, the active pixel sensor of simplifying transistor structure as claimed in claim 1 is characterized in that:
This element sensor also comprises a replacement diode, and this replacement diode is in order to export this reset signal to upgrade the electric signal of this light-sensitive element.
4, the active pixel sensor of simplifying transistor structure as claimed in claim 3 is characterized in that:
This replacement diode is a photodiode.
5, the active pixel sensor of simplifying transistor structure as claimed in claim 3 is characterized in that:
This replacement diode is the p type gesture well that produces in the n of this light-sensitive element type doped region and the class positive-negative-positive structure that forms.
6, a kind of image sensing module, comprise a plurality of active pixel sensors, respectively this element sensor is the matrix form arrangement, and the transmission line of shared this reset signal of transmission of element sensor of each row, the element sensor of each row also coupled in common connects one in order to transmit the row transmission line of this array selecting signal, element sensor of each row then coupled in common connect delegation's transmission line with signal in order to transmit this line output signal, it is characterized in that:
Respectively this element sensor has a light-sensitive element, a first transistor and a transistor seconds, wherein, this light-sensitive element is converted to an electric signal with a light signal after in order to sensitization, and after reading a reset signal, upgrade this electric signal, this the first transistor is electrically connected this light-sensitive element, be in order to this electric signal being amplified and be converted to an output signal, this transistor seconds is electrically connected this first transistor, and according to the output of array selecting signal control delegation output signal.
CNA2004101007803A 2004-12-14 2004-12-14 Active pixel sensor and image sensing module with simplified transistor structure Pending CN1791184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNA2004101007803A CN1791184A (en) 2004-12-14 2004-12-14 Active pixel sensor and image sensing module with simplified transistor structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNA2004101007803A CN1791184A (en) 2004-12-14 2004-12-14 Active pixel sensor and image sensing module with simplified transistor structure

Publications (1)

Publication Number Publication Date
CN1791184A true CN1791184A (en) 2006-06-21

Family

ID=36788635

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004101007803A Pending CN1791184A (en) 2004-12-14 2004-12-14 Active pixel sensor and image sensing module with simplified transistor structure

Country Status (1)

Country Link
CN (1) CN1791184A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101644587B (en) * 2009-02-19 2011-08-10 友达光电股份有限公司 Sensor element, photosensitive matrix, touch panel and touch sensing method
CN101193203B (en) * 2006-11-29 2011-09-14 全视科技有限公司 Image sensors with output noise reduction mechanisms
CN102401906A (en) * 2010-09-19 2012-04-04 同方威视技术股份有限公司 Radiation detector and its imaging device, electrode structure and method for acquiring images
CN102420946A (en) * 2011-11-10 2012-04-18 深港产学研基地 CMOS image sensor pixel unit with high filling factor and pixel array work method thereof
CN102447851A (en) * 2011-12-26 2012-05-09 深港产学研基地 High-filling-coefficient double CMOS image sensor pixel unit and working method
CN102487436A (en) * 2010-12-01 2012-06-06 英属开曼群岛商恒景科技股份有限公司 Sensing pixel array and sensing apparatus
CN102957880A (en) * 2012-11-22 2013-03-06 北京思比科微电子技术股份有限公司 Active pixel, high-dynamic range image sensor and method for operating active pixel
CN105789202A (en) * 2016-05-20 2016-07-20 京东方科技集团股份有限公司 Active pixel sensor circuit, driving method and image sensor
CN106375687A (en) * 2016-07-07 2017-02-01 友达光电股份有限公司 pixel sensing device and control method
CN112333404A (en) * 2020-11-17 2021-02-05 京东方科技集团股份有限公司 Photosensitive unit, photosensitive device, driving method and display device
CN114323270A (en) * 2021-12-23 2022-04-12 武汉华星光电半导体显示技术有限公司 Active pixel sensor

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101193203B (en) * 2006-11-29 2011-09-14 全视科技有限公司 Image sensors with output noise reduction mechanisms
CN101644587B (en) * 2009-02-19 2011-08-10 友达光电股份有限公司 Sensor element, photosensitive matrix, touch panel and touch sensing method
CN102401906A (en) * 2010-09-19 2012-04-04 同方威视技术股份有限公司 Radiation detector and its imaging device, electrode structure and method for acquiring images
CN102401906B (en) * 2010-09-19 2014-03-12 同方威视技术股份有限公司 Radiation detector as well as imaging device, electrode structure and image acquiring method thereof
CN102487436A (en) * 2010-12-01 2012-06-06 英属开曼群岛商恒景科技股份有限公司 Sensing pixel array and sensing apparatus
CN102420946A (en) * 2011-11-10 2012-04-18 深港产学研基地 CMOS image sensor pixel unit with high filling factor and pixel array work method thereof
CN102420946B (en) * 2011-11-10 2013-11-06 深港产学研基地 CMOS image sensor pixel unit with high filling factor and pixel array work method thereof
CN102447851B (en) * 2011-12-26 2014-07-30 深港产学研基地 Dual complementary metal oxide semiconductor (CMOS) image sensor pixel unit with high filling factor, and working method
CN102447851A (en) * 2011-12-26 2012-05-09 深港产学研基地 High-filling-coefficient double CMOS image sensor pixel unit and working method
CN102957880B (en) * 2012-11-22 2015-08-05 北京思比科微电子技术股份有限公司 A kind of method of active pixel, high dynamic range image sensor and operation active pixel
CN102957880A (en) * 2012-11-22 2013-03-06 北京思比科微电子技术股份有限公司 Active pixel, high-dynamic range image sensor and method for operating active pixel
CN105789202A (en) * 2016-05-20 2016-07-20 京东方科技集团股份有限公司 Active pixel sensor circuit, driving method and image sensor
WO2017197969A1 (en) * 2016-05-20 2017-11-23 京东方科技集团股份有限公司 Active pixel sensor circuit, driving method and image sensor
CN105789202B (en) * 2016-05-20 2018-09-14 京东方科技集团股份有限公司 Circuit for active pixel sensor, driving method and imaging sensor
US10187597B2 (en) 2016-05-20 2019-01-22 Boe Technology Group Co., Ltd. Active pixel sensor circuit, driving method and image sensor
CN106375687A (en) * 2016-07-07 2017-02-01 友达光电股份有限公司 pixel sensing device and control method
CN106375687B (en) * 2016-07-07 2019-05-10 友达光电股份有限公司 pixel sensing device and control method
CN112333404A (en) * 2020-11-17 2021-02-05 京东方科技集团股份有限公司 Photosensitive unit, photosensitive device, driving method and display device
CN114323270A (en) * 2021-12-23 2022-04-12 武汉华星光电半导体显示技术有限公司 Active pixel sensor
CN114323270B (en) * 2021-12-23 2023-12-05 武汉华星光电半导体显示技术有限公司 Active pixel sensor

Similar Documents

Publication Publication Date Title
US12177584B2 (en) Solid-state imaging device, method of driving the same, and electronic apparatus
US10608101B2 (en) Detection circuit for photo sensor with stacked substrates
US9967472B2 (en) Image sensor combining high dynamic range techniques
CN1144295C (en) CMOS photosensitive device
CN101562707B (en) Solid-state imaging device, driving method of solid-state imaging device, and electronic device
US10659709B2 (en) Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus
CN1833429A (en) Dual conversion gain imagers
CN1897640A (en) Pixel circuit with low noise for in image sensor
JP2003202264A (en) Photodetector, optoelectronic image sensor and method for detecting electromagnetic radiation
CN101044749A (en) Pixel for boosting pixel reset voltage
CN1791184A (en) Active pixel sensor and image sensing module with simplified transistor structure
US20120267695A1 (en) Solid state imaging device
US20060108507A1 (en) Active pixel sensor and image sensing module
CN113840103A (en) A high dynamic range image sensor
JP5112685B2 (en) CMOS image sensor
CN1185865C (en) Semi-conductor camera device
KR20090117230A (en) Pixel Circuit and Driving Method of Solid State Imaging Device
CN1708099A (en) Active pixel sensor with improved signal to noise ratio
JP5051994B2 (en) Solid-state imaging device, driving method of solid-state imaging device, and imaging device
JP2006238444A (en) Active pixel image sensor
CN114071037A (en) Pixel and Global Shutter Image Sensors
US7977716B2 (en) CMOS image sensor with improved fill-factor and reduced dark current
US20240406595A1 (en) Solid-state imaging device, method for driving solid-state imaging device, and electronic apparatus
Miyatake et al. Transversal-readout cmos active pixel image sensor
KR20240014960A (en) Image sensor and operation method thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication