CN1782750A - Optical component and method of manufacture of optical component - Google Patents
Optical component and method of manufacture of optical component Download PDFInfo
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- CN1782750A CN1782750A CN200510128820.XA CN200510128820A CN1782750A CN 1782750 A CN1782750 A CN 1782750A CN 200510128820 A CN200510128820 A CN 200510128820A CN 1782750 A CN1782750 A CN 1782750A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/56—Optics using evanescent waves, i.e. inhomogeneous waves
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Abstract
光学部件或光学低通滤镜，具有通过折射率不同区分2个以上的区域，在透明材料的内部形成与这些区域中最大体积即连续区域的折射率具有不同折射率的区域。该光学部件或光学低通滤镜，通过对透明材料照射或会聚照射脉冲激光，在内部形成折射率不同的区域。
An optical component or an optical low-pass filter has two or more regions distinguished by differences in refractive index, and a region having a different refractive index from that of a continuous region that is the largest volume of these regions is formed inside a transparent material. This optical component or optical low-pass filter forms a region with a different refractive index inside by irradiating or converging pulse laser light on a transparent material.
Description
The application requires Japanese patent application No. 2004-351632 number right of priority of application on Dec 3rd, 2004, and its content is incorporated into this.
Technical field
The present invention relates to use pulse laser, particularly for example take (10
-15) pulse per second (PPS) equal time width is 10
-12The optics that pulse laser below second is made.Relate in particular to suitable optics low pass filter and manufacture method thereof in the solid-state imager of video camera, digital camera, optical fiber scope etc.In addition, also be suitable for optics low pass filter in the dot matrix display elements such as liquid crystal, plasma, EL, SED display.
Background technology
In recent years, along with popularizing of digital video camera and digital camera, the miniaturization of optical system and the densification of pixel quantity are also in development.
Digital video camera, digital camera possess the solid-state imager that comprises discontinuous and regularly arranged pixel, and the picture of reference object is sampled by optical space, obtain the shooting output corresponding with each pixel of picture of reference object.
In the solid-state imager of the such picture of optical sampling reference object, the tiny degree of accessible pattern is related with sample frequency to be determined, half frequency than this sample frequency, be nyquist frequency (hereinafter referred to as: cutoff frequency) if high spatial frequency component looking like comprise by above-mentioned reference object, then because turn back the generation false signal, for example in the color video camera, the color irrelevant with the color of reference object enters in the played-back image by above-mentioned false signal.Thereby, have in the device of above-mentioned solid-state imager, the optics low pass filter of the high spatial frequency component of restriction reference object is set in image pickup optical system, the generation false signal prevents to turn back.
As above-mentioned optics low pass filter, the birefringence of former utilization crystal, at the spatial frequency component lower than cutoff frequency, the method for doing one's utmost to keep high-contrast is widely known by the people.
In addition, be considered in the past image optical system pupil function autocorrelation function to this system transter (below, its absolute value is designated as MTF) influence, having proposed this pupil function is kept aberration energetically is the phase type optics low pass filter of the optical characteristics of purpose.Promptly, because MTF represents contrast with respect to spatial frequency, in optical system, present the optics of MTF characteristic of the contrast in the high spatial frequency zone more than the cutoff frequency that attenuating determined by the A/F of pixel and pitch by insertion, the false signal that making turns back produces is as not obvious.
Such phase type optics low pass filter, for example the parts that will form the periodical configuration of striated on the transparency carrier surface of glass and resin etc. insert optical system, change the phase term of pupil function by the periodical configuration of above-mentioned striated, difference with the optical range of giving transmitted light is a phase differential, makes it to have the characteristic of optics low pass filter.
Method for making at above-mentioned phase type optics low pass filter discloses various gimmicks, for example the lithography that uses in the semiconductor processing technology.Here,, use mask, carry out mask exposure or interfere exposure and development, at the pattern of making photosensitive film on glass to the photosensitive resin film that applies on the substrates such as glass.Then, carry out dry etch process from it, the glass that the while etched surfaces is exposed and the pattern of photosensitive film, when photosensitive film disappeared as a result, the glass of exposing formed recess by etching, the whole diffraction grating of being made up of glass substrate that forms.
In addition, the pattern-making on metal and monocrystal etc. of the above-mentioned means of use is arranged, it is carried out punching press between heat as casting mold, carry out the gimmick of pattern transfer by ejection formation, perhaps light-cured resin is injected this casting mold, by irradiation ultraviolet radiation etc., resin solidification is become the photoresist method (opening flat 6-308430 communique) of casting mold shape with reference to the spy.
In addition, the spy opens flat 6-242404 communique, the spy opens in the flat 7-5395 communique, discloses the use skive, by the gimmick of cut at the concavo-convex striated structure of substrate surface fabrication cycle.
The spy opens in the clear 61-149923 communique, discloses use ion exchange process etc., forms the different part of refractive index at glass surface, makes the method for phase type diffraction grating.
On the other hand, in recent years follow the raising of compression technology of a laser pulse, the report of the processing of the transparent material of use ultra-short pulse laser is a lot, particularly pulse width is for taking the laser of second level, from the intensity of this light beam power, it is possible utilizing the three-dimensional processing of the transparent material inside of multi-photon absorption process as can be known, and the spy opens in the flat 9-311237 communique, disclose by laser radiation in inner high-refractive-index regions, the method for three-dimensional composition light-guide wave path of forming of glass.In addition, the spy opens in the 2000-56112 communique, discloses by laser radiation, makes permanent variations in refractive index distributed in three dimensions in glass inside, makes the method for diffraction optical element.
In addition, at the illuminating method that takes second laser, the pulsed light beam scioptics are assembled, processing method (above-mentioned other of swept-focus, with reference to special table 2003-506731 communique) and the spy open in the 2004-196585 communique, disclose laser beam and do not used Scan Architecture, in the transparent material inside of glass etc., form the method at the variations in refractive index position of two dimension or 3D shape together.
Use the optics low pass filter of quartzy birefringence, quartzy raw materials cost height particularly, uses in the color video camera of solid-state image pickup, owing to need multi-disc crystal, thickness increases, and has limited the miniaturization of optical system.In addition, on making, because correct optic axis closes the problem of cooperations, the distortion when bonding etc., the problem in its manufacturing is a lot, is not suitable for volume production.
On the other hand, use the optics low pass filter of traditional phase type diffraction grating of the surface acquisition of passing through rapidoprint, the viewpoint from making has following variety of issue point.
For example, use lithographic occasion, aforesaid process number is many, expends time in and causes the processing cost height.On the other hand, from the difficulty of processing, when for example making the high rectangular grid of concavo-convex difference, at vertical direction processing zanjon and be not easy, the environmental optima condition in the time of must be according to the selected dry etch of material etc. controls numerous and diversely, and the degree of freedom of material selection is low.In addition, in job operation in nature, be limited to the two dimension processing on surface, the degree of freedom of structure design is also lower.
On the other hand, when using the casting mold of making by lithography, compare,, the advantage that suppresses cost is arranged because production improves with the occasion of lithography processing direct substrate, but can be restricted at material selection face.That is, the occasion of casting between heat, machined material is limited to glass and resin.In addition, even the special occasion of opening the disclosed photoresist method of flat 6-308430 communique also is limited to photoresist.And, the occasion of casting between heat, when mould and machined material were selected, to the softening temperature of glass, the permanance of mould also became problem, and conversely, this viewpoint has limited material.
For the cut of using skive, to compare with the glass that uses casting mold and the moulding of resin, production is low, the filter pattern processing difficulties of polygonal and curve, thus low in the degree of freedom of design phase shape, and form accuracy is also low.In addition, the physical strength of material also becomes problem, and the degree of freedom that material is selected is low.
Use ion exchange process etc., in the method for glass surface formation refractive index different piece, in material surface processing, the degree of freedom of design is low basically.In addition, the occasion of ion exchange process in order to obtain desirable pattern, forms the pattern of metal mask etc. by above-mentioned photoetching process, and is immersed in and dissolves salt bath and carry out, and operation is numerous and diverse.
On the other hand, for the processing of the inside of above-mentioned ultra-short pulse laser, spy before opens in the 2004-196585 communique, illustration the light examples of members used of the optical communications made of several refractive indexes formation of becoming the zone by 3D shape.In addition, spy before opens in the 2000-56112 communique, has proposed the facture of three-D volumes type diffraction grating, has offered some clarification on the utilization as the Bragg diffraction grating that uses stratiform variations in refractive index zone.But, during any one is open, the optics of phase place of the light of control transmission is discussed, particularly at the purposes of optics low pass filter.
Summary of the invention
The purpose of this invention is to provide easy to manufacturely, select or viewpoint, the optics that design freedom is high or optics low pass filter such as structure from material.
The inventor is conceived to utilize by pulse laser in inner two dimension of transparent material or the three-dimensionally formed heterogeneous variations in refractive index zone that causes mutually, the phase place of may command light, the application of discovery on the optics of the phase place of control transmitted ray, wherein, particularly find application as optics low pass filter.
Promptly, if this processing method is a material transparent at the processing wavelength, then because the multi-photon absorption process can be carried out three-dimensional processing to material internal, even occasion for traditional processing method difficulty complicated patterns design, change by illuminating optical system etc. becomes easy, by shortening the process number and the process time of processing, can reduce the cost in the fabrication phase.In addition, find the material that suitably to select to have desired optics, machinery, thermal characteristics when for example being installed to solid-state imager, finish the present invention.
In optics of the present invention or the optics low pass filter, have the zone of being distinguished by the refractive index difference more than 2, the inside of transparent material form have with these zones in the zone of refractive index different refractivity of continuum of maximum volume.
In this instructions, the zone more than 2 that the refractive index difference is distinguished is meant, when the value of certain refractive index is made as threshold value, and the zone of distinguishing by this refractive index more than 2.Therefore, in the inside in a zone of distinguishing, refractive index is not necessarily got certain value.Transparent material before the irradiated with pulse laser has had the occasion of index distribution, and the threshold value of refractive index also can be according to a plurality of values of the set positions of transparent material.
In optics of the present invention or the optics low pass filter, have the zone of above-mentioned different refractivity, in continuous the same area, but also the cycle changes shape.
In optics of the present invention or the optics low pass filter, a plurality of zones of discontinuous formation with above-mentioned different refractivity, these form a plurality of zones also can two dimension or three-dimensional periodic arrangement.
In optics of the present invention or the optics low pass filter, zone shape cycle in continuous the same area with above-mentioned different refractivity changes, in the high spatial frequency zone of this cycle change of shape more than cutoff frequency, the also cycle change of shape of mtf value≤0.5.
In optics of the present invention or the optics low pass filter, the a plurality of zones of discontinuous formation with above-mentioned different refractivity, these form a plurality of zones and arrange with two dimension or three-dimensional periodic, this periodic arrangement, in the high spatial frequency zone more than cutoff frequency, the also periodic arrangement of mtf value≤0.5.
In optics of the present invention or the optics low pass filter, zone with above-mentioned different refractivity is in continuous the same area, the shape cycle changes, in the high spatial frequency zone of this cycle change of shape more than cutoff frequency, be the cycle change of shape of mtf value≤0.5, have function as optics low pass filter.
In optics of the present invention or the optics low pass filter, above-mentioned cycle change of shape is also carried out light to incident light wherein and is separated, in the high spatial frequency zone more than cutoff frequency, and the cycle change of shape of mtf value≤0.5.
In optics of the present invention or the optics low pass filter, discontinuous formation is a plurality of to have above-mentioned different refractivity zone, arrange with two dimension or three-dimensional periodic in a plurality of zones of these formation, this periodic arrangement also, in the high spatial frequency zone more than cutoff frequency, the periodic arrangement of mtf value≤0.5 and have the function of optics low pass filter.
In optics of the present invention or the optics low pass filter, above-mentioned periodic arrangement also can be incident light wherein to be carried out light separate, and is the periodic arrangement of mtf value≤0.5 in the high spatial frequency zone more than cutoff frequency.
In optics of the present invention or the optics low pass filter, in the zone that the inside of above-mentioned transparent material forms, for the zone with maximum volume, the refractive index in the wavelength of 0.1 μ m～2 μ m also can have the difference more than 0.0001.
In optics of the present invention or the optics low pass filter, above-mentioned transparent material can be any one of monocrystal, glass, glass ceramics, sintered body or organic resin.
In optics of the present invention or the optics low pass filter, above-mentioned transparent material is 10 expenses (10 * 10 in pulse width
-15) more than second, 10 skins (10 * 10
-12) second following pulsed laser irradiation is to the occasion of this transparent material, the transmissivity T and the relation of assembling multiplying power M of this pulse laser of above-mentioned pulse laser from the plane of incidence to the position of assembling above-mentioned pulse laser preferably satisfy note formula a and b down.
T≥100/M
2 …(a)
T≥(I
th×2×10
-4)/(I
0×M
2) …(b)
M:(π/4)
1/2* (diameter of the pulse laser during transparent material incident)/(material is assembled the cubic root of volume)
I
Th: the position of the pulse laser in assembling transparent material, formation has the spatial power density [W/cm of the regional necessary pulse laser beam of different refractivity
3]
I
0: the power density [W/cm of the pulse laser of pulsed light incident material face
2]
The low pass filter of optics of the present invention or optics, above-mentioned transparent material also can be, the transmissivity in thickness 0.5mm is 400nm to the wavelength region may of 550nm is more than 50%, and be infrared cut of light filter below 30% at 800nm to 1000nm.
In optics of the present invention or the optics low pass filter, the alpha ray amount that above-mentioned transparent material is preferably emitted is 0.02count/cm
2Below the hr.
In optics of the present invention or the optics low pass filter, above-mentioned transparent material preferably, the β quantity of X-rays X of emitting is 100count/cm
2Below the hr.
In optics of the present invention or the optics low pass filter, above-mentioned transparent material also can be the distributed refractive index optics.
In optics of the present invention or the optics low pass filter, also can surperficial part or all have convex surface part and/or concave surface portion.
Image pickup optical system of the present invention, optics or optics low pass filter with above-mentioned any one formation.
Image pickup optical system of the present invention, in the high spatial frequency zone more than cutoff frequency, best mtf value≤0.5.
The manufacture method of optics of the present invention or low pass filter for optics or the optics low pass filter of making any one above-mentioned formation, by to transparent material irradiation or convergence irradiated with pulse laser, forms the different zone of refractive index in inside.
Manufacture method of the present invention, the best pulse width of the pulse laser of irradiation are 10 expenses (10 * 10
-15) second above 10 skins (10 * 10
-12) below second.
In the manufacture method of the present invention, the pulse laser of irradiation is in the position of the convergence of above-mentioned transparent material inside, and spatial power density is preferably 0.2 * 10
11～0.9 * 10
24W/cm
3
In the manufacture method of the present invention, the pulse laser that preferably has irradiation is divided into a plurality of operations.
In the manufacture method of the present invention, be preferably in the above-mentioned transparent material, shine a plurality of positions, form the different zone of a plurality of refractive indexes together by a plurality of pulse lasers are assembled.
In the manufacture method of the present invention, also make the internal intervention of a plurality of pulse lasers, form the different zone of refractive index of the shape that depends on the light intensity distributions of interfering the pulse laser that forms in inside at above-mentioned transparent material.
In the manufacture method of the present invention, also can make the shape in the different zone of the inner refractive index that forms, the cycle changes in this continuous zone.
In the manufacture method of the present invention, also can arrange with two dimension or three-dimensional periodic in the different zone of the inner refractive index that forms.
In the manufacture method of the present invention, changed in shape cycle in this continuous zone in the different zone of the inner refractive index that forms, in the high spatial frequency zone of above-mentioned cycle change of shape more than cutoff frequency, the cycle change of shape of mtf value≤0.5 preferably.
In the manufacture method of the present invention, arrange with two dimension or three-dimensional periodic in the zone that the inner refractive index that forms is different, in the high spatial frequency zone of above-mentioned periodic arrangement more than cutoff frequency, and the periodic arrangement of mtf value≤0.5 preferably.
In the manufacture method of the present invention, the inner different zone of refractive index that forms, the refractive index in the wavelength of 0.1 μ m～2 μ m, the refractive index for the transparent material before irradiation or the convergence irradiated with pulse laser preferably has the difference more than 0.0001.
In the manufacture method of the present invention, above-mentioned transparent material is preferably to make the transmissivity T of the above-mentioned pulse laser from the above-mentioned pulse laser plane of incidence to the position of assembling above-mentioned pulse laser and the material of satisfied note formula a down of the relation of assembling multiplying power M and b.
T≥100/M
2 …(a)
T≥(I
th×2×10
-4)/(I
0×M
2) …(b)
M:(π/4)
1/2* (diameter of the pulse laser during transparent material incident)/(material is assembled the cubic root of volume)
I
Th: the position of the pulse laser in assembling transparent material, formation has the spatial power density [W/cm of the regional necessary pulse laser beam of different refractivity
3]
I
0: the power density [W/cm of the pulse laser of pulsed light incident material face
2]
Formation at optics of the present invention or optics low pass filter describes.
The present invention by, have refractive index n
0The discontinuous formation in inside and the n of transparent material
0The optics in the zone of different refractivity N or optics low pass filter constitute.Here, from the viewpoint of the efficient of manufacturing process, the zone of irradiating laser is efficient height at least as far as possible, refractive index n
0The zone be preferably in optics or the optics low pass filter and have maximum volume.
This optics or optics low pass filter utilize the light in the zone by refractive index N and pass through n
0Light between phase change, or the change of shape in the zone of refractive index N causes the variation of light path, thereby causes the phase change between the light that passes through.
And, among the present invention, shape cycle in this continuous zone in the zone of refractive index N is changed, or form the zone of a plurality of refractive index N in the inside of transparent material with two dimension or three-dimensional periodic, constitute optics or optics low pass filter by arranging.
This cycle change of shape or periodic arrangement are carried out light with incident light wherein and are separated, at the cutoff frequency r that is determined by the sampling theory of solid-state imager etc.
cIn the above high spatial frequency zone, and (spatial frequency is the 0[lines per millimeter] in mtf value be made as 1) preferably mtf value be cycle change of shape or the periodic arrangement below 0.5.Mtf value is better below 0.3, and mtf value is best below 0.1.
The periodicity of the area arrangement of this refractive index N, the two-dimentional or three-dimensional cycle can be necessarily, also can modulate.
In addition, for the light from wavelength 400nm to 700nm, above-mentioned mtf value is preferably in the above-mentioned scope.
Separate as above-mentioned light, as shown in figure 19, optical image 21 is via lens optical system 22 and optics of the present invention 23, in the optical system of the pixel faces imaging of solid-state imager 24, for example shown in Figure 20, if consider the pixel of the Pixel Dimensions x ' that arranges in a direction, then the interval of 0 light 25 and 1 light 26 and/or-1 light 27 can be equally to separate in three directions.For the light intensity of these separation, i.e. 0 time light intensity I
0, ± 1 time light intensity I
± 1(I
1, I
-1), relative intensity (R=I
± 1/ I
0) be that the scope of 0.5＜R＜2 gets final product.The method that light separates is not limited to this, and the aligning method of pixel according to the hobby of vision, can utilize the separated light of high order, and can suit to select these strength ratios.
Above-mentioned cycle change of shape or periodic arrangement preferably, by optics of the present invention or optics low pass filter, when optical system that other opticses of related realization function constitute makes up, the r of low pass filter
cAbove change of shape, the arrangement of mtf value in above-mentioned scope.In addition, as making up with optics of the present invention or optics low pass filter, the optics that constitutes optical system is, for example, lens, minute surface, prism, reflection prevent parts, dichronic mirror parts, polarisation parts, phase-plate, opening aperture, and colorized optical filtering mirror etc. are not limited to these examples.
In addition, above-mentioned periodical configuration can be that itself uses as lens, and the periodical configuration of MTF in above-mentioned scope.
The shape in the zone of refractive index N can be an arbitrary shape.The polygonal column of for example cylindric, triangle column or quadrangular prism shape etc., spherical, oval spherical, cubic, rectangular-shaped, coniform, the polygonal awl of pyrometric cone or quadrangular pyramid etc., and can be other polyhedrons.In addition, the shape in the zone of this refractive index N also can make the shape cycle in this continuous zone change.Form the zone of a plurality of refractive index N and the occasion of arranging, the zone of these arrangements shape separately also can be unified, but also the cycle changes perhaps random variation for thickness and size.
Here, the said transparent material of the present invention is meant, in order to form the zone of refractive index N, the transmissivity T and the relation of assembling multiplying power M of this pulse laser of the pulse laser of irradiation from the plane of incidence to the position that above-mentioned pulse laser is assembled satisfy following formula (a) and material (b).
T≥100/M
2 …(a)
T≥(I
th×2×10
-4)/(I
0×M
2) …(b)
M:(π/4)
1/2* (diameter of the pulse laser during transparent material incident)/(material is assembled the cubic root of volume)
I
Th: the position of the pulse laser in assembling transparent material, formation has the spatial power density [W/cm of the regional necessary pulse laser beam of different refractivity
3]
I
0: the power density [W/cm of the pulse laser of pulsed light incident material face
2].
In the processing in the zone that forms refractive index N, with respect to the Wavelength of Laser of irradiation, the material linear absorption coefficient is preferably less.Specifically, preferably satisfying above-mentioned formula (a) reaches (b).In addition, it is better to satisfy following (c) formula rather than above-mentioned literary composition (b), and satisfies following (d) formula, rather than above-mentioned formula (c) is best.
T≥(I
th×3×10
-4)/(I
0×M
2) …(c)
T≥(I
th×5×10
-4)/(I
0×M
2) …(d)
If in above-mentioned scope, the destruction of assembling zone in addition, position is diminished, can obtain good precision processing.
Here above-mentioned linear absorption coefficient is meant the absorption coefficient the when power density (laser power/irradiated area) of laser beam is enough little.
Transparent material of the present invention is monocrystal, glass, glass ceramics, sintered body or organic resin preferably.In addition, it is block that the shape of these materials needs not be, and can be the film on the bulk substrate.And these material shape do not need to be limited to parallel flat, and for example lens have the recessed and convex surface of curvature like that, can have the curved surface of high order yet.
In addition, transparent material of the present invention can be itself to have certain specific character.The front of the solid-state imager of CCD etc. for example possesses and is used to block ultrared infrared cut of light optical filtering, is used to protect the glass cover of solid-state imager.Transparent material of the present invention also can use this infrared cut of light optical filtering and/or glass cover materials with function.This infrared cut of light optical filtering is best, transmissivity in thickness 0.5mm, is more than 50% at 400nm to the wavelength region may of 550nm, and is below 30% at 800nm to the wavelength region may of 1000nm, is more than 50% at 400nm to the wavelength region may of 550nm, and is better below 10% at 800nm to the wavelength region may of 1000nm, and best is at 400nm is more than 50% to the wavelength region may of 550nm, and is below 5% at 800nm to the wavelength region may of 1000nm.
If the alpha ray amount that the glass cover of the solid-state imager former configuration of CCD etc. itself is emitted is many, then become the reason that causes noise, best Alpha-ray discharging amount is few, and this amount is preferably in 0.02count/cm
2Below the hr, 0.01count/cm
2Hr is following better.Equally, Beta-ray emitting also is the reason of noise, is preferably in 100count/cm
2Below the hr, at 50count/cm
2Hr is following better.
In addition, at transparent material of the present invention, independent respectively or compound and contain the occasion of respectively moving metal ingredient of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ag and Mo etc. on a small quantity, material itself is painted, the certain wavelengths of viewing area takes place to absorb, in visible wavelength area, use the occasion of optics of the present invention, wish that the occasion that does not in fact contain is more.In addition, owing to independent or compoundly contain each terres rares composition and painted, the tendency of the certain wavelengths of viewing area taking place to absorb, use the occasion of optics of the present invention in visible wavelength area, wishes that the occasion that does not in fact contain is more.
And, each composition of Be, Pb, Th, Cd, Tl, As, Os, S, Se, Te, Bi, F, Br, Cl, I etc., the tendency that the control use is arranged as harmful chemical in recent years, the manufacturing process of glass still not, and the processing after manufacturing procedure and the finished productization all needs to adopt the measure of necessary environmental cure, so in the occasion of paying attention to environmental impact, the occasion that does not in fact contain is more.
But, as transparent material of the present invention, have the materials with function of color optical filtering in use, particularly have the occasion of infrared cut of light optical filtering materials with function, the occasion of wishing to comprise compositions such as Cu, Ni, V, Fe, Ce, Pb, Sn in the transparent material of the present invention is more.
Traditional optics low pass filter obtains by forming the pattern with the different part of refractive index and convex-concave at substrate surface.The present invention becomes possibility by form the part of refractive index N in inside with its three-dimensional arrangement, and the low pass filter that obtains with traditional rapidoprint surface compares, and the degree of freedom that pattern forms uprises.
Here, refractive index n
0And N, the refractive index in any wavelength of expression wavelength 0.1 μ m～2 μ m makes the light that passes through produce the purpose of phase differential, n
0With N difference more than 0.0001 is arranged preferably, have the difference more than 0.001 better, have the difference more than 0.01 best.
In a plurality of zones of an optical filtering, N not necessarily has only a value, also a plurality of values can be arranged.In addition, middle N also can have a plurality of values in the continuous zone, also can be continuous variation.
Manufacture method at optics of the present invention or optics low pass filter describes.
The present invention forms heterogeneous phase by in transparent material internal irradiation or convergence irradiated with pulse laser at this material internal, and the refractive index of this heterogeneous phase constitutes by forming the different zone of refractive index from prelaser state permanent change.
Of the present inventionly heterogeneously be meant that mutually the irradiation that extensively comprises laser produces, the variation that light causes and the heterogeneous phase that forms.The variation that causes as light extensively comprises, for example, the variation of the molecular configuration of the material internal that causes owing to the high electromagnetic field of light, the redox of heat that causes with the convergence of laser and photochemical reaction, material, crystal generation that the various light effects of non-linear effect etc. cause and/or crystal growth and densification, low-densityization, phase-splitting, bubble generation etc., among the present invention, the permanent variations in refractive index of utilizing these to cause.
Material internal after laser radiation produces the occasion of distortion, or produces painted occasion, is preferably in to make the not proper temperature zone of softening degree of material, heat-treats, and reduces or removes these distortions and painted.
The pulse laser of irradiation, pulse width are preferably in 10 expenses (10 * 10
-15) second above, 10 skins (10 * 10
-12) second below, particularly material is the occasion of glass, 15 expenses that are preferably in are second above, below 500 expenses second, takes second above, 300 best below taking second 20.
In the occasion to the material internal irradiating laser, the space distribution of the convergent shape of the space distribution of the convergent point in the material internal, particularly 3D shape becomes problem, preferably stipulates irradiating laser by the notion of spatial power density.Spatial power density is as shown in the formula definition.
Spatial power density (W/cm
3The above-mentioned small volume (cm of energy (J) ÷ irradiation time (s) ÷ that drops in the small volume of)=specific
3)
Laser power when variations in refractive index zone forms among the present invention, the spatial power density that is preferably in the converged position of material internal is 0.2 * 10
11～0.9 * 10
24W/cm
3, particularly 0.2 * 10
15～0.9 * 10
20W/cm
3Better, 0.5 * 10
15～0.5 * 10
20W/cm
3Best.
In the occasion of a plurality of pulsed lights of irradiation, also can shine or assemble these light of irradiation and make it in the transparent material internal intervention, according to interfering the light intensity distributions that forms, form the variations in refractive index zone of shape.At this moment, the spatial power density in the zone of the highlight strength of this interference figure is preferably in the above-mentioned scope.In addition, the pulse width of laser preferably 100 is taken second to 10 psecs, and 300 takes second better to 1 psec, and 400 takes that second to take second to 900 best.If in above-mentioned scope, can not damage the surface of material, carry out the good processing of precision in the interference position of inside.
In the manufacture method of optics of the present invention, the operation that also can have a plurality of editing pulse laser, these a plurality of pulse lasers are assembled a plurality of positions of irradiation respectively in addition, can form the different zone of a plurality of refractive indexes at material internal together, can improve the output of processing.Above-mentionedly be to use opticses such as beam splitter, diffraction grating, microlens array to carry out a plurality of operations of cutting apart of light beam, but be not limited to these.
In addition, can have and make together or the phase place of the pulse separately of the multiple tracks pulse laser of cutting apart, amplitude, wavelength, polarisation, any one of burst length width or the operation that changes more than, carry out appropriate combination by the pulse laser with these variations, refractive index, the refractive index that can not rely on the irradiation material disperseed, the processing of the high-freedom degree of shape.
In addition, form in wider scope in order to make the inner desirable variations in refractive index zone that forms together of above-mentioned transparent material, assemble the convergent point of pulse laser, also above-mentioned material relatively moves relatively.
Optics of the present invention or low pass filter are to utilize pulsed laser irradiation in the inner variations in refractive index zone that forms of above-mentioned material, and this variations in refractive index zone also can have the effect of mechanical properties such as the bending strength raising that makes material.
Optics of the present invention or low pass filter, be to utilize pulsed laser irradiation in the inner variations in refractive index zone that forms of above-mentioned material, it is the plane that material shape during laser radiation is preferably in laser entrance face, but not necessarily be limited to the plane, also can have the recessed and convex surface of the curvature that for example resembles lens, the curved surface of high order.
In addition, the above-mentioned transparent material before the irradiated with pulse laser is optical isotropy preferably, also has birefringence, perhaps the light parts of distributed refractive index.As above-mentioned distributed refractive index light parts grin lens, microlens array, light-guide wave path, diffraction grating etc. are arranged, but not necessarily be limited to these examples.
Optics of the present invention or low pass filter, irradiating laser is processed material internal, also become to wish material shape by the cutting after for example with attrition process, for example, its shape can be to have the curved surface of recessed and convex of certain curvature and high order curved surface, polygonal section difference and ditch.
Description of drawings
Fig. 1 is at refractive index n by the present invention
0The inner desirable position of transparency carrier form the synoptic diagram of method one example of the heterogeneous phase of refractive index N.
Fig. 2 is the synoptic diagram of the optics low pass filter of expression the 1st embodiment of the present invention.
Fig. 3 is in the optics low pass filter of expression the 1st embodiment of the present invention, the performance diagram of the poor Δ L (x) of optical range.
Fig. 4 is in the optics low pass filter of expression the 1st embodiment of the present invention, the performance diagram of the poor Δ L (x) of optical range.
Fig. 5 is on the x-y plane of optics low pass filter of expression the 1st embodiment of the present invention, the synoptic diagram of an example in the zone of refractive index N.
Fig. 6 is in the optics low pass filter of expression the 1st embodiment of the present invention, the curve map of an example of MTF curve.
Fig. 7 is in the optics low pass filter of expression the 1st embodiment of the present invention, the curve map of other examples of MTF curve.
Fig. 8 is in the expression optics low pass filter of the present invention, the curve map of the 1st example of optical range difference Δ L (x) characteristic.
Fig. 9 is in the expression optics low pass filter of the present invention, the curve map of the 2nd example of optical range difference Δ L (x) characteristic.
Figure 10 is in the expression optics low pass filter of the present invention, the curve map of the 3rd example of optical range difference Δ L (x) characteristic.
Figure 11 is in the low pass filter of expression optics of the present invention, the curve map of the 4th example of optical range difference Δ L (x) characteristic.
Figure 12 is the skeleton view of the optics low pass filter of expression the 2nd embodiment of the present invention.
Figure 13 is in the optics low pass filter of expression the 2nd embodiment of the present invention, the curve map of MTF curve.
Figure 14 is the sectional view of the optics low pass filter of expression the 3rd embodiment of the present invention.
Figure 15 is the sectional view of the optics low pass filter of expression the 4th embodiment of the present invention.
Figure 16 is the sectional view of the optics low pass filter of expression the 5th embodiment of the present invention.
Figure 17 is the sectional view of an example of expression optics of the present invention.
Figure 18 is the sectional view of expression optical system of the present invention.
Figure 19 is the synoptic diagram of an example of the light separation among expression the present invention.
Figure 20 is the sectional view of an example of the light separation among expression the present invention.
Embodiment
Below, the optics of being correlated with at the present invention or the embodiment of optics low pass filter describe with reference to drawing.
Fig. 1 is illustrated in transparency carrier 1 inside, and scioptics 3 are assembled irradiation and taken pulse per second (PPS) laser 2 to refractive index n
0The inner desirable position of transparency carrier, form refractive index n with substrate
0The method synoptic diagram in the zone 4 of different refractivity N.Focus by making laser at substrate is at x, y, and z direction arbitrary scan or the method that laser is shone together to a plurality of positions perhaps and use these methods, can form the variations in refractive index zone of desirable shape.Among the present invention, utilize the areas diffract rate N that forms like this.
As the 1st embodiment of light filter, Fig. 2 represents optics low pass filter 5.Here, by gimmick shown in Figure 1, at refractive index n
0Transparency carrier inside 6, form refractive index n with this substrate
0(its width is a to different refractivity N for x, zone 7 y), cycle is p, as the effect of above-mentioned optics low pass filter, only has the structure of periodic striated in the x direction, at other direction, at reference object, as the effect of optics low pass filter with high spatial frequency component.
Among this embodiment, in the x-y plane of optics low pass filter 5, if the cross sectional shape of above-mentioned zone 7 is made as y=l (x), then only by above-mentioned refractive index n
0The light A of substrate and the optical range difference Δ L (x) of the light B by coordinate x become
Represent that with (1) formula the characteristic of above-mentioned optical range difference Δ L (x) is if (x y) is made as certain n with the refractive index N of above-mentioned zone 7
c, then change by the shape l (x) that makes above-mentioned zone 7, if perhaps the shape l of above-mentioned zone 7 (x) is made as necessarily, then by index distribution being given above-mentioned zone 7, example can be defined as triangle and sine wave shape etc. arbitrarily as shown in Figure 3 and Figure 4.
Thereby in the occasion of the characteristic of the above-mentioned optical range difference Δ L (x) that obtains triangle as shown in Figure 3, above-mentioned zone 7 can form for example arbitrary section shape l (x) shown in the 5th figure according to this index distribution.In addition, above-mentioned optics low pass filter is set Δ L (x), at the definite cutoff frequency r of the sampling theory of imaging apparatus
cIn the above high spatial frequency zone, making mtf value is below 0.5.If MTF≤0.5, then false signal can be suppressed in the scope that vision allows.If MTF≤0.3 is then seen better from the viewpoint that suppresses false signal, if MTF≤0.1 then best.Like this, in order to set Δ L (x), but the Δ L that the long p of selection cycle, width a, (2) formula are represented
Max, that is, and the Δ L of the position Xmax that heterogeneous phase is the thickest
Max, and shape.
For example, the Δ L of formula (2) expression
MaxBe made as necessarily,, width a be made as a=p to long p of cycle,, the MTF characteristic shown in the dotted line of Fig. 6 is arranged when the occasion of the characteristic that will obtain above-mentioned leg-of-mutton optical range difference Δ L (x) shown in Figure 3 by making the change of shape of above-mentioned zone 7.In addition, the occasion when the characteristic of the poor Δ L (x) that will obtain above-mentioned sinuous optical range shown in Figure 4 has the MTF characteristic shown in Fig. 6 solid line.Among Fig. 6, in the unit of transverse axis (lines per millimeter), line (1) is meant white and black line number as one group of line.
In the present embodiment, the pixel on direction is arranged as the low pass filter for the CCD of pixel wide 3 μ m, cycle 6 μ m, uses n in the transparent material
633=1.51462 borosilicate glass, with pulse width be 150 the expense second, wavelength is 800nm, toggle frequency is 250kHz, and laser power is the pulse laser of 1000mW, is that the lens of 9cm (N.A.=0.4) are assembled the depths that shines 100 μ m from the surface by focal length, by glass is relatively moved with the sweep velocity of 100mm/sec, be made into the about 10 μ m of line width, the about 12 μ m in the interval between the line, the structure in the variations in refractive index zone of striated structure as shown in Figure 2.The refringence of measuring with 633nm is approximately 0.0018 in addition.For MTF curve such as Fig. 7 of the long 633nm of this low pass filtered mirror wave, cutoff frequency r
cThe mtf value of=83 (lines per millimeters) is 0.04, at r
cIn the above high spatial frequency zone, MTF is also below 0.3.Among Fig. 7, the line in the unit of transverse axis (lines per millimeter) (1) is meant white and black line number as one group of line.
In addition, the characteristic of above-mentioned optical range Δ L (x) is made as rectangular-shaped occasion shown in Figure 8, occasion, the circular-arc as shown in figure 10 occasion or the trapezoidal as shown in figure 11 hypotenuse of trapezoidal shape are the occasion of circular arc as shown in Figure 9, can keep identical performance, can be according to the optical range difference Δ L (x) of desired acquisition, select in above-mentioned (1) formula refractive index N (x, y), shape l (x).
In addition, in the foregoing description, at refractive index n
0Substrate inside, inside at above-mentioned transparency carrier 6 forms this refractive index N (x that directions X has periodic striated, y) zone 7, but optics low pass filter of the present invention, be not limited to the foregoing description, also can, on the inner different degree of depth of same substrate forms heterogeneous structure inequality direction mutually with the foregoing description 1, have periodic structure.
In addition, also make on the z direction in the 2nd figure refractive index N (x, y, z) or shape l (x, y z) change, at above-mentioned refractive index n
0The inner two-dimensional arrangements of substrate 8 form and have periodically above-mentioned refractive index N (the low pass filter 9 corresponding to effect optics more than 2 directions can be realized in zone 10 z) for x, y.Figure 12 represents the optics low pass filter of the 2nd such embodiment.
The optics low pass filter 9 of the 2nd embodiment, above-mentioned refractive index N (zone 10 z) has periodically in x direction and z direction for x, y,
Become poor Δ L with the optical range shown in (3) formula (x, characteristic z), for more than 2 directions of the picture of reference object as the effect of optics low pass filter.
In the present embodiment, be 3 μ m, cycles 6 μ m at having pixel wide on the direction in length and breadth, have pixel wide 3 μ m on the transverse direction, the low pass filter of the CCD that the pixel of cycles 6 μ m is arranged uses refractive index n in the transparent material
633=1.51462 borosilicate glass, pulse width is that 150 expense second, wavelength 800nm, toggle frequency are 1kHz, laser power is the pulse laser of 150mW, by focal length is 9cm (N, A=0.4) lens are assembled the depths that shines 100 μ m from the surface, glass is relatively moved with the sweep velocity of 12mm/sec, make optics low pass filter.The low pass filter of this optics, spot diameter are about 10 to 12 μ m, and in the heart the interval of longitudinal direction is about 12 μ m in the consecutive point, and the interval of transverse direction is about 12 μ m, has the structure in the variations in refractive index zone of two-dimensional lattice shape as shown in figure 12.The refringence of measuring at 633nm is about 0.0015 in addition.This low pass filter represents with the dotted line of Figure 13 that at the longitudinal direction MTF of wavelength 633nm curve transverse direction MTF curve is represented with solid line.Among Fig. 9, the cutoff frequency r of all directions
cThe mtf value of=83 (lines per millimeters) is 0.02 at longitudinal direction, and transverse direction is 0.06.Even at any one direction, r
cMTF is below 0.3 in the above high spatial frequency zone.Among Figure 13, in the unit of transverse axis (lines per millimeter), line (1) is meant white and black line number as one group of line.
Refractive index n
0Substrate in the shape and the configuration of heterogeneous phase of refractive index N be not limited to above-mentioned described.
Optics low pass filter shown in Figure 14 in substrate 11, is arranged the heterogeneous phase 12 of cross sectional shape for the refractive index N of circle on grid.
Optics low pass filter shown in Figure 15, in substrate 11, arranging cross sectional shape is the heterogeneous phase 13 of the refractive index N of a plurality of round shapes that connect.
Optics low pass filter shown in Figure 16 in substrate 11, is uniformly-spaced arranged the heterogeneous phase 14 of cross sectional shape for the refractive index N of circle, the elliptical shape cyclical variation basically.
In the optics shown in Figure 17, in substrate 15, uniformly-spaced arranging phacoid basically is that cross sectional shape is the heterogeneous phase 16 of the refractive index N of circle.
With reference to Figure 18, optics shown in Figure 17 constitutes optical system by configuration lens 17,18,19 on optical axis.
The present invention can utilize the optics as the optics low pass filter of for example phase mask, polarisation filter, phase-plate, phase type diffraction grating, diffraction lens, solid-state imager etc. etc.
According to the present invention, can be provided at material internal and form heterogeneous phase with birefringence, utilize the birefringence that a kind of material self of material has and the optics low pass filter of the effect of the heterogeneous variations in refractive index that causes mutually.
Crystal that uses in the optics low pass filter material of for example traditional solid-state imager and lithium niobate monocrystal body intralamellar part form the variations in refractive index zone, the birefringence that has by these material essence, on with respect to the identical or different orientation of light detaching direction, append the light separating effect, can be with the thickness attenuation of traditional monocrystal optics low pass filter, reduce the sheet number, thereby can make the image pickup optical system miniaturization.
Optics low pass filter of the present invention is installed to the image pickup optical system with solid-state imager, and preferably the false signal that causes of turning back of the frequency component that is comprised as the higher spatial frequency zone of determining than the pixel wide that prevents solid-state imagers such as CCD and CMOS and pitch of cutoff frequency is used.Be not only to use,,, form heterogeneous phase, can add function as optics low pass filter by in the glass cover and infrared cut of light optical filtering of solid-state imagers such as CCD and CMOS according to the present invention as optics low pass filter.
In addition, in camera head etc., part or all of traditional lens combination constituted image pickup optical system as optics of the present invention, can save traditional optics low pass filter.
In addition, optics low pass filter of the present invention, it is not solid-state imager low pass filter, also can be installed to image-displaying member, the dot matrix display element of liquid crystal, plasma, EL, SED display and crystal projection etc. for example is used to remove by the pitch of the some pitch of display element and color filter lens array and the moir and the pseudo-chrominance signal that take place.
According to the present invention, owing to the degree of freedom height of processing in the manufacturing process, need in the conventional art to obtain the optics or the optics low pass filter of difficult complicated patterns design easily, also can shorten manufacturing procedure number, process time, so can reduce manufacturing cost.In addition, because the degree of freedom height that material is selected, the material that can suitably select to have desired optics, machinery, thermal characteristics when being installed to solid-state imager can obtain the optics low pass filter of these excellents.
And processed substrate can be installed to the solid camera head front and process, and also can eliminate the problem of alignment error, can improve the yield rate of product.
Claims (31)
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|---|---|---|---|
| JP2004351632 | 2004-12-03 | ||
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| JP2004-351632 | 2004-12-03 |
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|---|---|
| US (1) | US7405883B2 (en) |
| EP (1) | EP1686412A3 (en) |
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2005
- 2005-11-29 TW TW094141901A patent/TWI395978B/en not_active IP Right Cessation
- 2005-11-29 US US11/288,102 patent/US7405883B2/en not_active Expired - Fee Related
- 2005-11-30 EP EP05026125A patent/EP1686412A3/en not_active Withdrawn
- 2005-12-01 CN CN200510128820.XA patent/CN1782750B/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102001815A (en) * | 2009-08-18 | 2011-04-06 | Hoya株式会社 | Glass manufacturing method, glass melting furnace and glass manufacturing device |
| CN102001815B (en) * | 2009-08-18 | 2015-06-03 | Hoya株式会社 | Glass manufacturing method, glass melting furnace and glass manufacturing device |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060119956A1 (en) | 2006-06-08 |
| TWI395978B (en) | 2013-05-11 |
| TW200622306A (en) | 2006-07-01 |
| CN1782750B (en) | 2010-09-08 |
| US7405883B2 (en) | 2008-07-29 |
| EP1686412A3 (en) | 2006-08-16 |
| EP1686412A2 (en) | 2006-08-02 |
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