Summary of the invention
At above-mentioned deficiency, the object of the invention is to provide a kind of have coating densification, the uniform Ni-Cr nano-composite plate of composition and preparation method and application, guarantees good anti-Cl ion etching performance.
Technical scheme of the present invention is as follows:
The metal-base nano-composite cladding material of the disperse distribution Cr nano particle of anti-Cl ion etching, its composition is the combination (Ni crystal grain and Cr particle size are nano level) of sedimentary nanocrystalline metal Ni and Cr nano particle, by mass percentage, the content of Cr is 4-15%, and surplus is Ni.
Its preparation method is to be base material with Ni, adopts routine techniques, realizes the coelectrodeposition of Ni and nanometer Cr powder (median size 39nm), preparation metal Ni-Cr type nano-composite plate.By mass percentage, the content of Cr is 4-15%, and surplus is Ni.The plating bath of Ni-Cr nano-composite plate preparation is low temperature vitriol plating Ni solution (NiSO
4).Keep nano particle to be suspended in the tank liquor during plating, composite plating equipment is plate pump formula electroplanting device.
What the passive film surface of the Ni-Cr nano-composite plate of the present invention preparation easily formed hydration contains Cr oxide compound and oxyhydroxide, has good anti-Cl ion etching performance.The film formed ultimate principle of passivation is as follows: the Ni-Cr nano-composite plate of acquisition; because nanometer Cr powder is evenly distributed in the nanometer crystalline Ni; compare with the composite deposite of the micron-sized Cr that contains same amount; greatly improved the particle number of Cr in the unit surface; coating surface forms more active site like this; has higher surface active energy; principle according to optimum solvation; under the effect of current potential; these Cr active sites can be rapidly and the dissolved oxygen in aqueous medium or OH ion form Cr-O or Cr-OH bonding; formation has oxide compound and the hydroxide film of the hydration Cr of good protection, thereby suppresses the dissolving of Ni.
With traditional composite deposite and alloy phase ratio with metal-micron order metal powder preparation, advantage of the present invention is as follows:
1. the passive film surface energy forms hydrous oxide and the hydroxide film of the Cr with good protection.The present invention adopts the Ni-Cr nano-composite plate of Ni-Cr nano particle coelectrodeposition preparation.Having 1) porosity is low; 2) coating densification; Characteristics such as 3) composition is even.Particularly in containing Cl ionic medium, form the hydrous oxide of Cr and the passive film of oxyhydroxide, have good anti-Cl ion etching performance.
2. improved the coating pitting resistance greatly.Compare with single Ni coating in the prior art, show than breaking up current potential with higher spot corrosion between long passivation region, the Ni-Cr coating and the Ni-Cr alloy phase ratio of close compound micron particles with containing the Cr amount, composite deposite of the present invention shows: can form the hydrous oxide of Cr and the passive film of oxyhydroxide, has splendid corrosion-resistant ability, and the passive film that the Ni-Cr coating of Ni-Cr alloy and compound micron particles forms is mainly hydrous oxide and the oxyhydroxide of Ni, and corrosion resisting property is poor.
3. technique for preparing coating is simple, ripe, cost is low.Because electroplating is sophisticated technology, utilizes existing plating equipment, in tank liquor, add the nanometer Cr powder of aequum, and nano particle is suspended in tank liquor and be uniformly dispersed by certain technology, just can be made into this novel nano composite deposite, investment is not quite.
4. applied widely.Nano-composite plate of the present invention can be used as and the protective layer that contains the military service metallic substance that the Cl ionic medium directly contacts, can be at ocean naval vessels, job platform facility, and aspect such as pipelines and petrochemical pipelines obtains extensively to quote.
Description of drawings
Fig. 1 is the optical photograph of Ni-10.9Cr (mass percent, the as follows) nano-composite plate of one embodiment of the invention.
Fig. 2 is the stereoscan photograph of the Ni-10.9Cr nano-composite plate of one embodiment of the invention.
Fig. 3 is the transmission electron microscope photo of the Ni-10.9Cr nano-composite plate of one embodiment of the invention.
Fig. 4 is the X-ray diffraction result of the Ni-10.9Cr nano-composite plate of one embodiment of the invention.
Fig. 5 is that single Ni coating, Ni-4.5Cr and the Ni-10.9Cr nano-composite plate of one embodiment of the invention is at the molten electrokinetic potential polarization curve comparison diagram in two of 3.5%NaCl.
Fig. 6-1a is Ni-10.9Cr nano-composite plate spot corrosion pattern in 3.5%NaCl solution of one embodiment of the invention.
Fig. 6-1b is that pattern is amplified in Ni-10.9Cr nano-composite plate spot corrosion in 3.5%NaCl solution of one embodiment of the invention.
Fig. 6-2a is single Ni coating spot corrosion pattern in 3.5%NaCl solution of one embodiment of the invention.
Fig. 6-2b is that pattern is amplified in single Ni coating spot corrosion in 3.5%NaCl solution of one embodiment of the invention.
Fig. 7 is the Ni-10.9Cr nano-composite plate of one embodiment of the invention and the electrokinetic potential polarization curve comparison diagram of Ni-12.4Cr coating in 3.5%NaCl solution of compound micron particles.
Fig. 8 is the Ni-10.9Cr nano-composite plate of one embodiment of the invention and the constant potential comparison diagram of Ni-12.4Cr coating in 3.5%NaCl solution of compound micron particles.
Fig. 9 is the optical photograph of Ni-12.4Cr coating of the compound micron particles of one embodiment of the invention.
Figure 10 is the scanning electron microscope pattern of Ni-12.4Cr coating of the compound micron particles of one embodiment of the invention.
Figure 11 is the Ni-10.9Cr nano-composite plate and the electrokinetic potential polarization curve comparison diagram of Ni-10Cr alloy in 3.5%NaCl solution of one embodiment of the invention.
Figure 12 is the Ni-10.9Cr nano-composite plate and the constant potential comparison diagram of Ni-10Cr alloy in 3.5%NaCl solution of one embodiment of the invention.
Figure 13 is that the Ni-10.9Cr nano-composite plate of one embodiment of the invention is at-0.1V, the full spectrogram of the XPS of passive film in the 3.5%NaCl solution.
Figure 14 is that the Ni-12.4Cr coating of compound micron particles of one embodiment of the invention is at-0.1V, the full spectrogram of the XPS of passive film in the 3.5%NaCl solution.
Figure 15 is that the Ni-10Cr alloy of one embodiment of the invention is at-0.1V, the full spectrogram of the XPS of passive film in the 3.5%NaCl solution.
The Ni-10.9Cr nano-composite plate that Figure 16 a-Figure 16 c is respectively one embodiment of the invention is at-0.1V, the XPS of the Cr2p of passive film, Ni2p and O1s figure under the 3.5%NaCl solution.
Figure 17 a-Figure 17 c is respectively the Ni-12.4Cr coating of compound micron particles of one embodiment of the invention at-0.1V, the XPS of the Cr2p of passive film, Ni2p and O1s figure under the 3.5%NaCl solution.
The Ni-10Cr alloy that Figure 18 a-Figure 18 c is respectively one embodiment of the invention is at-0.1V, the XPS of the Cr2p of passive film, Ni2p and O1s figure under the 3.5%NaCl solution.
Table 1 is that single Ni coating, Ni-4.5Cr and the Ni-10.9Cr nano-composite plate electrokinetic potential polarization curve parameter fitting in 3.5%NaCl solution of one embodiment of the invention compares.
Table 2 is that Ni-12.4Cr coating and Ni-10Cr alloy electrokinetic potential polarization curve parameter fitting in 3.5%NaCl solution of the Ni-10.9Cr nano-composite plate of one embodiment of the invention, compound micron particles compares.
Table 3 is the Ni-12.4Cr coating of the Ni-10.9Cr nano-composite plate of one embodiment of the invention, compound micron particles and Ni-10Cr alloy at-0.1V, and the XPS quantitative result of element is relatively in the passive film under the 3.5%NaCl solution.
Table 4 is Ni-12.4Cr coating and Ni-10Cr the alloy composition in the passive film and content comparison under 3.5%NaCl solution of the Ni-10.9Cr nano-composite plate of one embodiment of the invention, compound micron particles.
Embodiment
Below in conjunction with accompanying drawing and subordinate list embodiment is described in detail the present invention.
Embodiment 1
The preparation method of Ni-Cr nano-composite plate adopts conventional coelectrodeposition technology preparation, and its flow process is:
Substrate metal Ni-surface finish is to 800# waterproof abrasive paper-surperficial ultrasonic cleaning-carry out in containing the plating Ni tank liquor of nanometer Cr powder coelectrodeposition-acquisition Ni-Cr nano-composite plate.Keep nano particle to be suspended in the tank liquor when preparation key of nano-deposit of the present invention is plating, have good dispersing property simultaneously.Preparation process of the present invention is specific as follows:
The electrolysis Ni plate of getting purity 99.96% is a base material, is processed into the small sample of 15 * 10 * 2mm size, is milled to 800 through silicon carbide paper
#, ultrasonic cleaning in acetone;
Get particle diameter in the 10nm-80nm scope, mean particle size is that the nanometer Cr powder (in by Beijing Condar Nanosolutions GmbH preparation) of 39nm is immersed in the sodium dodecyl sulfate solution earlier, so that the homodisperse of nano particle is avoided reuniting;
Electroplate liquid adopts the low temperature modification plating bath, and composition is as follows: NiSO
4.7H
2O 150g/l, NH
4Cl 15g/l, H
3BO
315g/l, C
12H
25NaO
4S 0.1g/l; The solution of preparation is placed 24h through fully stirring after-filtration; The solution pH value can use in the 5.4-5.6 scope.
Adopt plate pump formula device to stir plating bath in the electrodeposition process, to guarantee the suspension of nano particle in the plating bath, uniform deposition is at specimen surface; Bath temperature is 30 ℃, current density I=3A/dm
2, stirring velocity is 110rpm.Electroplating time is 3h, and sample mean thickness is 100 μ m.
The compounding quantity of the nanometer Cr powder in the coating increases with the increase of Cr in the plating bath.It is the experimental data of 10.9% Ni-Cr nano-composite plate that present embodiment provides compounding quantity.Fig. 1 is the optical photograph of Ni-Cr nano-composite plate.Can see even particle distribution on the coating, coating combines well with basal body interface.Fig. 2-Fig. 3 is respectively the scanning electron microscope and the transmission electron microscope photo of Ni-Cr nano-composite plate.As can be known, coating densification (no micro-crack and cavity between coating Ni intercrystalline and Ni/ nano particle interface), crystal grain is tiny.Fig. 4 is the X-ray diffraction result of Ni-10.9Cr nano-composite plate, obtains grain fineness number average out to 31nm by Scherrer (Scherrer) formula corrected Calculation.
Embodiment 2
Present embodiment has compared the corrosion resisting property of the Ni-Cr nano-composite plate (ENNC:Electrodepositednanoparticle-dispersed nanocomposite coating) of different Cr content.
Utilize EG﹠amp; M273 type potentiostat and PAR M352 electro-chemical test system that G company produces carry out the electrochemical corrosion performance test to single Ni coating (ENNC Ni-0Cr), ENNC Ni-4.5Cr and ENNC Ni-10.9Cr (mass percent, as follows) respectively.The three-electrode system of experiment employing standard: sample is that working electrode (WE), platinized platinum are that supporting electrode (AE), saturated calomel electrode (SCE) are reference electrode (RE), and all current potentials are reference with it all.Experimental data is an automatic record under micro computer monitoring, and carries out curve fitting and the kinetic parameter processing with the software that the M352 system wears.Experimental temperature is a room temperature, and corrosive medium is 3.5%NaCl solution (suitable with the salt amount of seawater).The scope of polarization test is relative open circuit potential-0.5V-0.4V, and sweep velocity is 0.5mV/s.The electrokinetic potential polarization curve comparative result of three kinds of samples as shown in Figure 5, the electrochemical parameter of software match is as shown in table 1.As seen, the spot corrosion of ENNC Ni-10.9Cr is broken up between current potential and passivation region greater than ENNC Ni-4.5Cr, and the spot corrosion of ENNC Ni-4.5Cr breaks up between current potential and passivation region greater than ENNC Ni-0Cr, and anti-Cl ion etching performance the best of ENNC Ni-10.9Cr is described; The anti-Cl ion etching performance of ENNCNi-4.5Cr is taken second place, and ENNC Ni-0Cr is the poorest; From the comparison diagram of spot corrosion pattern (Fig. 6-1a, Fig. 6-1b, Fig. 6-2a, Fig. 6-2b) as can be known, the ENNC Ni-10.9Cr surface overwhelming majority does not have spot corrosion to produce, only the defective that might be coating at indivedual some places or when electroplating Cr powder skewness (these phenomenons all can be avoided by regulating electroplating technological parameter) cause point corrosion pit, but point corrosion pit is not dark, and the ENNCNi-0Cr surface produces a large amount of some pits, many and the hole depth of the quantity in hole erodes to matrix, illustrates that the Cl ion etching speed of ENNC Ni-0Cr will be far longer than ENNC Ni-10.9Cr.From the comparative result of above-mentioned three kinds of samples as can be known, the anti-Cl ion etching performance of coating strengthens along with the increase of Cr content.
Embodiment 3
Present embodiment has compared the corrosion resisting property of the Ni-Cr coating (EMCC:Electrodeposited microparticle-dispersed composite coating) of ENNC Ni-Cr and compound micron particles.
For further studying the corrosion resisting property of ENNC, adopt above-mentioned same equipment and identical parameters and standard three-electrode system, respectively ENNC Ni-10.9Cr and EMCC Ni-12.4Cr electrokinetic potential polarization curve and constant potential I-t curve are tested, Fig. 7 is an electrokinetic potential polarization curve test result.As can be known, under the close situation of Cr content, the spot corrosion of ENNC Ni-10.9Cr is broken up current potential and passivation interval range greater than EMCC Ni-12.4Cr (table 2), thereby the pitting resistance of ENNC Ni-10.9C is better than EMCC Ni-12.4Cr.Fig. 8 is that two kinds of coating are in the I-t curve of (E=-0.1V) between passivation region.As seen, the anodic current density of ENNCNi-10.9Cr passive film is less than 4 times EMCC Ni-12.4Cr, and anodic current reaches steady state in the short period of time, and the anodic current density fluctuation of EMCC Ni-12.4 surface is bigger, anodic current needs the long relatively time to reach stable state, illustrate that the ENNCNi-10.9Cr passivation ability is stronger than EMCC Ni-12.4, thereby illustrate that also the ENNCNi-10.9C corrosion resisting property is better than EMCC Ni-12.4.Top result why occurring is because the condition of surface of coating influences anti-Cl ion etching performance.For ENNC Ni-10.9Cr, can see that particle distribution is even, crystal grain is tiny, the coating densification (Fig. 1-Fig. 3), the anodic current fluctuation that causes under the current potential effect is little, and under the competent situation of Cr content, reach passive state very soon, passivation current is low, and inactivating performance is good, and the EMCCNi-12.4 surface irregularity, coating is not fine and close, uneven components (Fig. 9,10) causes the fluctuation of bigger anodic current, and through just reaching passive state for a long time, and anodic current is much larger than ENNC Ni-10.9Cr's, inactivating performance is bad, thereby anti-Cl ion etching poor performance.
Embodiment 4
Present embodiment compares ENNC Ni-Cr and arc melting Ni-Cr corrosion resistance of alloy compares.
Adopt above-mentioned same equipment and identical parameters and standard three-electrode system, ENNC Ni-10.9Cr and Ni-10Cr alloy electrokinetic potential polarization curve are tested, as shown in figure 11.As shown in Table 2, the spot corrosion of ENNC Ni-10.9Cr is broken up between current potential height, passivation region than the length of Ni-10Cr alloy, and anti-pitting performance is better than Ni-10Cr alloy.From the I-t curve ratio of Figure 12 more as can be known: the anodic current of Ni-10Cr alloy is greater than ENNC Ni-10.9Cr, and the needed time of time ratio ENNC Ni-10.9Cr that reaches stable state is long, as seen the ENNC passivation ability obviously is better than the Ni-10Cr alloy, also be anti-Cl ion etching performance and Ni-10Cr alloy phase ratio, very big raising is arranged.This mainly is because the Cr content in the Ni-10Cr alloy is low, is not enough to form complete passive film.
The electrochemical parameter that specifies the ENNC Ni-10.9Cr that table 1 and table 2 provide in the embodiment 2-example 4 is different, may be owing to the fluctuation of room temperature and instrument causes, but the result that each group sample records obtains under same temperature, same state, has comparability.
Embodiment 5
Present embodiment is analyzed the passive film composition of ENNC Ni-Cr.
Be to determine in detail the composition of passive film, further studied three kinds of samples form passive film under-0.1V constant potential XPS test result.
The VGESCALAB MK II type photoelectron spectrograph that experimental installation adopts Britain VG company to produce.What x-ray source adopted is ALK α linear system, is 50eV by energy.The direction of illumination of specimen surface and linear system is 90 °, and the spectral line of all samples that records all adopts C1s (BE=284.5eV) standard to pollute the peak check and correction.The analysis software that the The data instrument of gained is provided for oneself is analyzed match, compares with the data of standard then, determines the composition and the composition of passive film.
The full spectrogram of XPS of Figure 13-Figure 15 passive film that to be three kinds of samples form under-0.1V constant potential, composition analysis is as shown in table 3.As can be known, all there is a large amount of O to exist in three kinds of specimen surface passive films, simultaneously, has Ni, Cr element to exist, illustrate that the passive film that forms on the two surface is Ni, Cr oxide compound at ENNC and alloy passivation film surface; And the existence of Cr is not detected on EMCC passive film surface, has only Ni, illustrates that the oxide compound that has only Ni on the surface of EMCC passive film exists.In addition, three kinds of sample passive films surface spectral lines all have the C1s peak to exist, and pollutent that hydrocarbon polymer is arranged in the passive film of specimen surface (might be because specimen surface is subjected to pollution cause) be described.Figure 16 (a-c)-Figure 18 (a-c) is three kinds of sample Cr2p, the spectrum test of the feature track of Ni2p and Ols surface-element, and the software of providing for oneself according to test result and instrument has carried out the swarming processing to Ni2p3/2, Cr2p3/2 and the O1s of three kinds of samples.Chemical displacement value that obtains and the contrast of the chemical displacement value of reference material, determine its kind, the area of each material that provides according to swarming software again with the mark of each element on total content that the ratio and the table 2 of entire area provides, is determined the ratio of each material in the passive film.The composition of each material and ratio are provided by table 4 in the passive film.As can be known from the results of Table 4, a large amount of constraint H is all arranged in the passive film of three kinds of specimen surfaces
2O exists, and that is to say that the oxide film in the passive film all exists with the form of hydration.The ENNC surface of passivation is the Cr (OH) with hydration
3Be that main mixing passive film is formed, the Ni-10Cr alloy surface of passivation is the Ni (OH) with hydration
2Be that main hybrid films exists, and the EMCC of passivation is the mixed oxide composition with the Ni of hydration.
More as can be known, ENNC Ni-10.9Cr is because passive surface forms is oxide compound and the oxyhydroxide with hydration Cr of protectiveness from the result of above-mentioned three kinds of samples, thereby has best pitting resistance.The passive film of this protectiveness form be because: the nanometer Cr powder on ENNC Ni-10.9Cr is evenly distributed in the nanometer crystalline Ni, the compound micron order Cr particulate coating identical with content is compared, greatly improved the particle number of Cr in the unit surface, make the nano-deposit surface have more active site, surface active can be higher, the Cr ion on nano-deposit surface can be rapidly and dissolved oxygen in the water or OH ionic bonding in aqueous medium, form Cr-O or Cr-OH key, generate oxide compound or the oxyhydroxide of Cr; Simultaneously, because coating grain refining, there is a large amount of crystal boundaries, the Cr atom of sublevel constantly along crystal boundary to coating surface/passive film interface rapid diffusion, competent Cr content is being provided at the interface, is forming the enrichment region of Cr, promoting oxide compound or the oxyhydroxide healing rapidly at short notice of Cr, form oxide compound or the hydroxide film of successive hydration Cr, and suppress the generation of NiO film.For the Ni-10Cr alloy, because crystal grain is thick, the Cr content that is diffused into the passive film surface by crystal boundary is low, can only form oxide compound and the oxyhydroxide of Ni, and solidity to corrosion is not as nano-deposit; And for EMCCNi-12.4Cr, then easily there is the tendency that forms the corrosion microbattery in because the defective of coating self (porosity height, coating are not fine and close, uneven components) between crystal grain and hole, oxide compound and the hydroxide film instability of the Ni that forms are so anti-Cl ion etching performance is the poorest.
Table 1
| | Corrosion current μ Acm
-2 | Corrosion potential mV | Current potential mV is broken up in spot corrosion | MV between passivation region | Tie up blunt electric current μ Acm
-2 |
| Single Ni coating | 0.217 | -196.3 | -10 | 186.3 | 1.04 |
| The Ni-4.5Cr nano-composite plate | 0.095 | -200.5 | 6 | 206.5 | 0.274 |
| The Ni-10.9Cr nano-composite plate | 0.079 | -229.1 | 49 | 278.1 | 0.266 |
Table 2
| | Corrosion current μ Acm
-2 | Corrosion potential mV | Current potential mV is broken up in spot corrosion | MV between passivation region | Tie up blunt electric current μ Acm
-2 |
| The Ni-10.9Cr nano-composite plate | 0.388 | -245.2 | 231 | 454.9 | 1.449 |
| The Ni-12.4Cr coating of compound micron particles | 5.052 | -247.1 | 14.9 | 32 | 14.690 |
| The Ni-10Cr alloy | 0.064 | -238.8 | 199 | 344.9 | 1.264 |
Table 3
| | Ni | Cr | O |
| The Ni-10.9Cr nano-composite plate | 8.99 | 16.25 | 74.76 |
| The Ni-12.4Cr coating of compound micron particles | 4.39 | - | 95.61 |
| The Ni-10Cr alloy | 11.58 | 7.78 | 80.65 |
Table 4
| | Cr
2+ | Cr
2O
3/CrO
2 | Cr(OH)
3 | CrO
3 | Ni(OH)
2 | NiO | H
2O
|
| The Ni-10.9Cr nano-composite plate | 2.02 | 3.10 | 7.15 | 3.98 | 4.79 | 4.20 | 38.94 |
| The Ni-10Cr alloy | - | 1.62 | 1.74 | 4.41 | 8.26 | 3.32 | 60.16 |
| The Ni-12.4Cr coating of compound micron particles | - | - | - | - | 0.97 | 3.42 | 88.06 |