CN1781926A - 高纯的三邻位金属化的有机铱化合物的制备方法 - Google Patents
高纯的三邻位金属化的有机铱化合物的制备方法 Download PDFInfo
- Publication number
- CN1781926A CN1781926A CNA200510127217XA CN200510127217A CN1781926A CN 1781926 A CN1781926 A CN 1781926A CN A200510127217X A CNA200510127217X A CN A200510127217XA CN 200510127217 A CN200510127217 A CN 200510127217A CN 1781926 A CN1781926 A CN 1781926A
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- Prior art keywords
- iii
- iridium
- compound
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- aryl
- Prior art date
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Links
- 238000000034 method Methods 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 29
- 229910052741 iridium Inorganic materials 0.000 claims description 57
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 43
- -1 organo-metallic lithium compound Chemical class 0.000 claims description 23
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 14
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims description 8
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 claims description 4
- 238000005660 chlorination reaction Methods 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 238000011065 in-situ storage Methods 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 125000003367 polycyclic group Chemical group 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 150000002902 organometallic compounds Chemical class 0.000 abstract description 3
- 239000008204 material by function Substances 0.000 abstract description 2
- 239000006103 coloring component Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 25
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 23
- 239000000047 product Substances 0.000 description 15
- 238000004128 high performance liquid chromatography Methods 0.000 description 11
- BFLSGVMQYXWRCT-UHFFFAOYSA-N C(C)C(=O)C(=O)C.[Ir+3] Chemical compound C(C)C(=O)C(=O)C.[Ir+3] BFLSGVMQYXWRCT-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000000376 reactant Substances 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 238000013019 agitation Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 238000010828 elution Methods 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 229920002582 Polyethylene Glycol 600 Polymers 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 238000007872 degassing Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 3
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000005826 halohydrocarbons Chemical class 0.000 description 2
- 230000036571 hydration Effects 0.000 description 2
- 238000006703 hydration reaction Methods 0.000 description 2
- 238000005649 metathesis reaction Methods 0.000 description 2
- 229920002523 polyethylene Glycol 1000 Polymers 0.000 description 2
- 229940057847 polyethylene glycol 600 Drugs 0.000 description 2
- WCGIGOVLOFXAMG-UHFFFAOYSA-N silver;trifluoromethanesulfonic acid Chemical compound [Ag].OS(=O)(=O)C(F)(F)F WCGIGOVLOFXAMG-UHFFFAOYSA-N 0.000 description 2
- IQXJCCZJOIKIAD-UHFFFAOYSA-N 1-(2-methoxyethoxy)hexadecane Chemical compound CCCCCCCCCCCCCCCCOCCOC IQXJCCZJOIKIAD-UHFFFAOYSA-N 0.000 description 1
- PAHNEUIHKIUNGX-UHFFFAOYSA-N 2-(3,4-difluorophenyl)pyridine Chemical compound C1=C(F)C(F)=CC=C1C1=CC=CC=N1 PAHNEUIHKIUNGX-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- YOIPWAXQFHKPCQ-UHFFFAOYSA-K [Ir](Cl)(Cl)Cl.N1=CC=CC=C1 Chemical compound [Ir](Cl)(Cl)Cl.N1=CC=CC=C1 YOIPWAXQFHKPCQ-UHFFFAOYSA-K 0.000 description 1
- RCKMYZVXXQPSNC-UHFFFAOYSA-N [Ir].C(C)C(=O)C(=O)C Chemical compound [Ir].C(C)C(=O)C(=O)C RCKMYZVXXQPSNC-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 229950009789 cetomacrogol 1000 Drugs 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 230000004087 circulation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- YSWRZALBDSJANW-UHFFFAOYSA-N cyanic acid;thiocyanic acid Chemical compound OC#N.SC#N YSWRZALBDSJANW-UHFFFAOYSA-N 0.000 description 1
- 230000005595 deprotonation Effects 0.000 description 1
- 238000010537 deprotonation reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- AEDZKIACDBYJLQ-UHFFFAOYSA-N ethane-1,2-diol;hydrate Chemical compound O.OCCO AEDZKIACDBYJLQ-UHFFFAOYSA-N 0.000 description 1
- 238000006266 etherification reaction Methods 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000474 mercury oxide Inorganic materials 0.000 description 1
- UKWHYYKOEPRTIC-UHFFFAOYSA-N mercury(ii) oxide Chemical compound [Hg]=O UKWHYYKOEPRTIC-UHFFFAOYSA-N 0.000 description 1
- 125000001979 organolithium group Chemical group 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229940113116 polyethylene glycol 1000 Drugs 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002577 pseudohalo group Chemical group 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
- 229910006400 μ-Cl Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/0006—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table compounds of the platinum group
- C07F15/0033—Iridium compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
- H10K85/342—Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Pyridine Compounds (AREA)
Abstract
Description
| 参考1 | 参考2 | 参考3 | ||
| 文献 | 比较试验 | |||
| 反应物 | IrCl32-苯基吡啶 | Ir(乙酰丙酮)32-苯基吡啶 | Ir(乙酰丙酮)32-苯基吡啶 | [Ir(ppy)2Cl]22-苯基吡啶AgO3SCF3 |
| 溶剂 | 2-乙氧基乙醇/水 | 乙二醇 | 乙二醇 | 无 |
| 温度 | --- | 196-198℃ | 196-198℃ | 110℃ |
| 铱反应物浓度 | 0.03mol/l | 0.02mol/l | 0.02mol/l | --- |
| 铱反应物与2-苯基吡啶的摩尔比 | 1∶4 | 1∶6.3 | 1∶6.3 | 1∶15 |
| 反应时间 | 24h | 10h | 10h | 24h |
| 收率 | 约10%,[Ir(μ-Cl)(ppy)]2为副产物 | 45% | 39.344.0% | 75% |
| HPLC纯度 | 无数据 | 无数据 | 94.0-96.0% | 无数据 |
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10104426A DE10104426A1 (de) | 2001-02-01 | 2001-02-01 | Verfahren zur Herstellung von hochreinen, tris-ortho-metallierten Organo-Iridium-Verbindungen |
| DE10104426.7 | 2001-02-01 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028042123A Division CN100362004C (zh) | 2001-02-01 | 2002-01-30 | 高纯的三邻位金属化的有机铱化合物的制备方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1781926A true CN1781926A (zh) | 2006-06-07 |
| CN100528885C CN100528885C (zh) | 2009-08-19 |
Family
ID=7672422
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028042123A Expired - Fee Related CN100362004C (zh) | 2001-02-01 | 2002-01-30 | 高纯的三邻位金属化的有机铱化合物的制备方法 |
| CNB200510127217XA Expired - Fee Related CN100528885C (zh) | 2001-02-01 | 2002-01-30 | 高纯的三邻位金属化的有机铱化合物的制备方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028042123A Expired - Fee Related CN100362004C (zh) | 2001-02-01 | 2002-01-30 | 高纯的三邻位金属化的有机铱化合物的制备方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7084273B2 (zh) |
| EP (1) | EP1366054B1 (zh) |
| JP (1) | JP3984167B2 (zh) |
| KR (1) | KR100934147B1 (zh) |
| CN (2) | CN100362004C (zh) |
| DE (2) | DE10104426A1 (zh) |
| WO (1) | WO2002060910A1 (zh) |
Families Citing this family (128)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10104426A1 (de) * | 2001-02-01 | 2002-08-08 | Covion Organic Semiconductors | Verfahren zur Herstellung von hochreinen, tris-ortho-metallierten Organo-Iridium-Verbindungen |
| JP3969132B2 (ja) * | 2002-03-12 | 2007-09-05 | コニカミノルタホールディングス株式会社 | 有機エレクトロルミネッセンス素子及びそれを用いた表示装置 |
| DE10238903A1 (de) * | 2002-08-24 | 2004-03-04 | Covion Organic Semiconductors Gmbh | Rhodium- und Iridium-Komplexe |
| DE10249926A1 (de) * | 2002-10-26 | 2004-05-06 | Covion Organic Semiconductors Gmbh | Rhodium- und Iridium-Komplexe |
| DE10314102A1 (de) | 2003-03-27 | 2004-10-14 | Covion Organic Semiconductors Gmbh | Verfahren zur Herstellung von hochreinen Organo-Iridium-Verbindungen |
| JP5318347B2 (ja) * | 2003-04-15 | 2013-10-16 | メルク パテント ゲーエムベーハー | 発光可能な、マトリックス材料と有機半導体との混合物、その使用、ならびに前記混合物を含む電子部品 |
| DE10320103A1 (de) * | 2003-05-05 | 2004-12-02 | Basf Ag | Verfahren zur Herstellung von Phenylpyridin-Metallkomplexen und Verwendung solcher Komplexe in OLEDs |
| GB0311234D0 (en) | 2003-05-16 | 2003-06-18 | Isis Innovation | Organic phosphorescent material and organic optoelectronic device |
| US7569692B2 (en) | 2003-06-02 | 2009-08-04 | Fujifilm Corporation | Organic electroluminescent devices and metal complex compounds |
| DE10325820A1 (de) * | 2003-06-07 | 2004-12-23 | Covion Organic Semiconductors Gmbh | Verfahren zur Herstellung von hochreinen, tris- und bis-ortho-metallierten Organometall-Verbindungen |
| KR101105619B1 (ko) | 2003-07-07 | 2012-01-18 | 메르크 파텐트 게엠베하 | 유기 방출형 반도체 및 매트릭스 물질의 혼합물, 이들의용도 및 상기 물질을 함유하는 전자 부품 |
| GB0321781D0 (en) | 2003-09-17 | 2003-10-15 | Toppan Printing Company Ltd | Electroluminescent device |
| DE10345572A1 (de) | 2003-09-29 | 2005-05-19 | Covion Organic Semiconductors Gmbh | Metallkomplexe |
| DE10350606A1 (de) | 2003-10-30 | 2005-06-09 | Covion Organic Semiconductors Gmbh | Verfahren zur Herstellung heteroleptischer, ortho-metallierter Organometall-Verbindungen |
| US6870054B1 (en) | 2003-12-05 | 2005-03-22 | Eastman Kodak Company | Synthesis for organometallic cyclometallated transition metal complexes |
| DE10357315A1 (de) | 2003-12-05 | 2005-07-07 | Covion Organic Semiconductors Gmbh | Organisches Elektrolumineszenzelement |
| US7825249B2 (en) | 2004-05-19 | 2010-11-02 | Merck Patent Gmbh | Metal complexes |
| US7005522B2 (en) * | 2004-06-29 | 2006-02-28 | Eastman Kodak Company | Synthesis of organometallic cyclometallated transition metal complexes |
| DE102004034517A1 (de) | 2004-07-16 | 2006-02-16 | Covion Organic Semiconductors Gmbh | Metallkomplexe |
| TW200624435A (en) * | 2004-08-12 | 2006-07-16 | Merck Patent Gmbh | Process for preparing iridium(Ⅲ) ketoketonates |
| DE102005032332A1 (de) * | 2005-07-08 | 2007-01-11 | Merck Patent Gmbh | Metallkomplexe |
| DE102005039064A1 (de) | 2005-08-18 | 2007-03-01 | Merck Patent Gmbh | Metallkomplexe |
| EP1944308B1 (en) | 2005-09-12 | 2013-10-02 | Nippon Steel & Sumikin Chemical Co., Ltd. | Process for production of ortho-metallized 1:3 complex of iridium with homoligand |
| DE102005057963A1 (de) * | 2005-12-05 | 2007-06-06 | Merck Patent Gmbh | Verfahren zur Herstellung ortho-metallierter Metallverbindungen |
| WO2007115970A1 (de) | 2006-04-05 | 2007-10-18 | Basf Se | Heteroleptische übergangsmetall-carben-komplexe und deren verwendung in organischen leuchtdioden (oleds) |
| JP4485487B2 (ja) * | 2006-05-11 | 2010-06-23 | シャープ株式会社 | 電力増幅器 |
| WO2008031743A1 (en) | 2006-09-14 | 2008-03-20 | Ciba Holding Inc. | Heterocyclic bridged biphenyls and their use in oleds |
| US8519130B2 (en) * | 2006-12-08 | 2013-08-27 | Universal Display Corporation | Method for synthesis of iriduim (III) complexes with sterically demanding ligands |
| US9130177B2 (en) | 2011-01-13 | 2015-09-08 | Universal Display Corporation | 5-substituted 2 phenylquinoline complexes materials for light emitting diode |
| CN101657518A (zh) * | 2007-03-08 | 2010-02-24 | 通用显示公司 | 磷光材料 |
| JP5484690B2 (ja) | 2007-05-18 | 2014-05-07 | ユー・ディー・シー アイルランド リミテッド | 有機電界発光素子 |
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| US20020121638A1 (en) * | 2000-06-30 | 2002-09-05 | Vladimir Grushin | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| DE60143106D1 (de) * | 2000-07-17 | 2010-11-04 | Fujifilm Corp | Lichtemittierendes Element und Azolverbindung |
| EP1325671B1 (en) | 2000-08-11 | 2012-10-24 | The Trustees Of Princeton University | Organometallic compounds and emission-shifting organic electrophosphorescence |
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| DE10104426A1 (de) * | 2001-02-01 | 2002-08-08 | Covion Organic Semiconductors | Verfahren zur Herstellung von hochreinen, tris-ortho-metallierten Organo-Iridium-Verbindungen |
| DE10109027A1 (de) * | 2001-02-24 | 2002-09-05 | Covion Organic Semiconductors | Rhodium- und Iridium-Komplexe |
-
2001
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2002
- 2002-01-30 US US10/470,811 patent/US7084273B2/en not_active Expired - Fee Related
- 2002-01-30 WO PCT/EP2002/000920 patent/WO2002060910A1/de not_active Ceased
- 2002-01-30 DE DE50202715T patent/DE50202715D1/de not_active Expired - Lifetime
- 2002-01-30 EP EP02710817A patent/EP1366054B1/de not_active Expired - Lifetime
- 2002-01-30 KR KR1020037010096A patent/KR100934147B1/ko not_active Expired - Fee Related
- 2002-01-30 JP JP2002561478A patent/JP3984167B2/ja not_active Expired - Fee Related
- 2002-01-30 CN CNB028042123A patent/CN100362004C/zh not_active Expired - Fee Related
- 2002-01-30 CN CNB200510127217XA patent/CN100528885C/zh not_active Expired - Fee Related
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2006
- 2006-07-07 US US11/483,359 patent/US7423151B2/en not_active Expired - Fee Related
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| CN100362004C (zh) | 2008-01-16 |
| US20060252936A1 (en) | 2006-11-09 |
| DE50202715D1 (de) | 2005-05-12 |
| KR100934147B1 (ko) | 2009-12-29 |
| WO2002060910A1 (de) | 2002-08-08 |
| DE10104426A1 (de) | 2002-08-08 |
| EP1366054A1 (de) | 2003-12-03 |
| US7423151B2 (en) | 2008-09-09 |
| KR20030077599A (ko) | 2003-10-01 |
| JP2004526700A (ja) | 2004-09-02 |
| CN1527835A (zh) | 2004-09-08 |
| JP3984167B2 (ja) | 2007-10-03 |
| US20040077862A1 (en) | 2004-04-22 |
| US7084273B2 (en) | 2006-08-01 |
| EP1366054B1 (de) | 2005-04-06 |
| CN100528885C (zh) | 2009-08-19 |
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